CN113917800B - High-dynamic ultra-precise multi-rotor workpiece table for photoetching machine - Google Patents
High-dynamic ultra-precise multi-rotor workpiece table for photoetching machine Download PDFInfo
- Publication number
- CN113917800B CN113917800B CN202111186443.0A CN202111186443A CN113917800B CN 113917800 B CN113917800 B CN 113917800B CN 202111186443 A CN202111186443 A CN 202111186443A CN 113917800 B CN113917800 B CN 113917800B
- Authority
- CN
- China
- Prior art keywords
- stator
- rotor
- units
- unit
- micro
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000001259 photo etching Methods 0.000 title claims abstract description 29
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000000919 ceramic Substances 0.000 claims description 40
- 230000007246 mechanism Effects 0.000 claims description 19
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims description 18
- 229910052744 lithium Inorganic materials 0.000 claims description 18
- 238000001816 cooling Methods 0.000 claims description 11
- 238000001514 detection method Methods 0.000 claims description 9
- 230000005540 biological transmission Effects 0.000 claims description 8
- 238000001459 lithography Methods 0.000 claims description 7
- 239000000110 cooling liquid Substances 0.000 claims description 3
- 230000004044 response Effects 0.000 abstract description 3
- 230000033001 locomotion Effects 0.000 description 18
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- 238000003491 array Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K16/00—Machines with more than one rotor or stator
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
- H02K41/02—Linear motors; Sectional motors
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
- H02K41/02—Linear motors; Sectional motors
- H02K41/03—Synchronous motors; Motors moving step by step; Reluctance motors
- H02K41/031—Synchronous motors; Motors moving step by step; Reluctance motors of the permanent magnet type
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
- H02N15/00—Holding or levitation devices using magnetic attraction or repulsion, not otherwise provided for
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
- H02N2/00—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction
- H02N2/02—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction producing linear motion, e.g. actuators; Linear positioners ; Linear motors
- H02N2/028—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction producing linear motion, e.g. actuators; Linear positioners ; Linear motors along multiple or arbitrary translation directions, e.g. XYZ stages
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Combustion & Propulsion (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Linear Motors (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
A high-dynamic ultra-precise multi-rotor workpiece table for a photoetching machine relates to the technical field of motor application. The problems of poor positioning accuracy and poor dynamic response performance of the workpiece table caused by disturbance of a cable and a water pipe due to the fact that a moving coil type plane motor in the workpiece table is solved. The invention comprises m stator units, n rotor units and n micro-motion units; the m stator units are spliced together to form a stator module, and the stator module is used for generating a moving three-dimensional magnetic field and acting on the n rotor units to provide power for the n rotor units and enable the n rotor units to move along a preset track; the n rotor units are magnetically suspended above the stator modules formed by splicing the m stator units, and each rotor unit is fixedly provided with a micro-motion unit; each micro-motion unit is used for performing micro-motion adjustment on the tray fixed on the micro-motion unit. The invention is mainly applied to the field of photoetching machines.
Description
Technical Field
The invention relates to the technical field of motor application.
Background
With the rapid development of microelectronics, lithographic machines have gained importance as core equipment for the production of large-scale integrated circuits. High-end lithographic machines claim the most precise instruments in the world, and only a few manufacturers in the world master them. The workpiece table is one of core units of a photoetching machine and is an ultra-precise motion platform. At present, a workpiece table of a mainstream photoetching machine usually adopts a driving scheme of combining macro motion of a long-stroke permanent magnet linear synchronous motor and high-precision micro motion of a direct current linear motor to realize accurate positioning and tracking of nanometer level. Although the macro-micro combination scheme is easy to realize, the structure has a series of problems such as backlash, deformation and the like, and the positioning accuracy is difficult to reach a higher level.
The planar motor is an electromagnetic device capable of directly converting electromagnetic energy into two-dimensional planar motion, and has the advantages of high precision, low loss, large motion range and the like.
At present, foreign well-known photoetching machine manufacturers successfully apply a moving coil type plane motor to a photoetching machine workpiece table, the adoption of the moving coil type plane motor greatly improves the production rate of the photoetching machine, but the moving part of the moving coil type plane motor is a coil array, so that in order to meet the requirements of working and cooling, a large number of cables and cooling water pipes are required to be dragged by a rotor part in the moving process, the mass center of the rotor can be offset due to the weight of the cables and the water pipes, and great disturbance is caused, so that great difficulty is brought to the design and layout of the rotor. In addition, the coil array is a heating source, a large amount of cooling and heat insulation devices are needed to isolate the influence of temperature rise on the light source loop, and the weight of the devices greatly influences the dynamic response speed of the motor workpiece table, so that the problems need to be solved.
Disclosure of Invention
The invention aims to solve the problems of poor positioning precision of a workpiece table and poor dynamic response performance of the workpiece table caused by disturbance of a cable and a water pipe in a moving coil type planar motor in the workpiece table.
The high-dynamic ultraprecise multi-rotor workpiece table for the photoetching machine comprises m stator units, n rotor units and n micro units; wherein m and n are integers;
the m stator units are spliced together to form a stator module, and the stator module is used for generating a moving three-dimensional magnetic field and acting on the n rotor units to provide power for the n rotor units so that the n rotor units move along a preset track;
the n rotor units are magnetically suspended above the stator modules formed by splicing the m stator units, and each rotor unit is fixedly provided with a micro-motion unit;
the first stator of each micro-motion unit is fixed on the corresponding rotor unit, and the first rotor of the micro-motion unit is fixed with a tray for controlling the tray to micro-motion.
Preferably, each stator unit comprises a stator base, a stator support, a coil array and a water-cooled cover plate;
the stator base, the stator support, the coil array and the water-cooling cover plate are sequentially stacked and fixed together from bottom to top to form an integral piece;
cooling liquid is introduced into the stator base and the water-cooling cover plate and used for cooling the coil array;
the power supply end of the coil array is encapsulated on the stator base, the power supply end of the coil array is used for being connected with the stator power supply end of a drive control system of the photoetching machine, and the drive control system of the photoetching machine is used for controlling the current input to each coil in the coil array.
Preferably, the mover unit includes a Halbach permanent magnet array, a mover carriage and a crash cushion;
the Halbach permanent magnet array is fixed on the lower surface of the rotor bracket;
the crash cushion is sleeved on the frame of the rotor bracket.
Preferably, the high-dynamic ultraprecise multi-rotor workpiece table for the photoetching machine further comprises a position detection unit, wherein the position detection unit is fixed on the lower surface of the rotor unit.
Preferably, the position detection unit includes 4 position sensors;
the 4 position sensors are fixed on the lower surface of the rotor bracket, and the 4 position sensors are uniformly distributed around the Halbach permanent magnet array in the circumferential direction;
wherein the lower surface of the mover holder serves as the lower surface of the mover unit.
Preferably, each micro-motion unit comprises a first stator, a first rotor, a signal transmitting device, a signal receiving device and a lithium battery module; the signal transmitting device, the signal receiving device and the lithium battery module are all fixed on the upper surface of the first rotor;
the first rotor comprises 3 piezoelectric ceramics and 3 magnetostriction mechanisms;
the 3 piezoelectric ceramics and the 3 magnetostriction mechanisms are fixed on the upper surface of the first stator, and the tray is fixed on the upper surfaces of the 3 piezoelectric ceramics and the 3 magnetostriction mechanisms;
two piezoelectric ceramics in the 3 piezoelectric ceramics are used for controlling the tray to move along the X axis of the plane where the first stator is located, and the rest piezoelectric ceramics are used for controlling the tray to move along the Y axis of the plane where the first stator is located;
the 3 magnetostriction mechanisms are used for controlling the tray to move along the Z axis perpendicular to the plane where the first stator is located;
the lithium battery module is used for supplying power to the 4 position sensors, the signal transmitting device, the signal receiving device, the 3 piezoelectric ceramics and the 3 magnetostriction mechanisms;
a signal transmitting device for transmitting the position information detected by the position detecting unit to an external terminal in a wireless transmission manner;
the signal receiving device receives control instructions output by a drive control system of the photoetching machine in a wireless transmission mode to control the 3 piezoelectric ceramics and the 3 magnetostriction mechanisms, so that fine adjustment positioning control of the tray is realized.
Preferably, the two piezoelectric ceramics controlling the tray to move along the X-axis of the plane of the first stator are disposed opposite to each other, and the remaining one piezoelectric ceramic is perpendicular to the two piezoelectric ceramics.
Preferably, one ends of the 3 piezoelectric ceramics intersect at one point, and the 3 piezoelectric ceramics are uniformly distributed circumferentially.
Preferably, the first stator and the mover support are of a flat plate structure, and both radial sections are square.
Preferably, the number of the lithium battery modules on each micro-motion unit is 4, and the 4 lithium battery modules are respectively positioned at the 4 corners of the first stator.
The high-dynamic ultraprecise multi-rotor workpiece table for the photoetching machine has the advantages that the high-dynamic ultraprecise multi-rotor workpiece table for the photoetching machine comprises m stator units, n rotor units and n micro units, the structure is simple, the modularized design can be realized, the rotor units can be adjusted according to specific requirements, and the assembly is convenient; the rotor unit adopts magnetic suspension support, eliminates friction, greatly improves positioning accuracy, and can work in a vacuum environment. The rotor unit obtains energy through wireless energy transmission, and finally the rotor unit realizes wireless control and movement, thereby replacing the traditional cable framework structural design, reducing the interference of cable disturbance on six-degree-of-freedom movement of the rotor, improving the movement and positioning precision of the whole machine, reducing the control difficulty and improving the stability; the moving part gets rid of the interference of the cable and the water pipe and the air pipe, can obtain higher dynamic performance, and can greatly improve the wafer yield of the photoetching machine.
In addition, tray micro-motion on the micro-motion unit is controlled through wireless signals, wireless control and motion are further achieved, and positioning accuracy can be improved.
Drawings
FIG. 1 is a schematic diagram of a high-dynamic ultraprecise multi-rotor workpiece table for a lithography machine according to the present invention;
fig. 2 is a schematic structural view of the stator unit 1;
fig. 3 is a schematic structural view of the sub-unit 2;
fig. 4 is a schematic structural view of the jog unit 3.
Detailed Description
The following description of the embodiments of the present invention will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
It should be noted that, without conflict, the embodiments of the present invention and features of the embodiments may be combined with each other.
The first embodiment is as follows: next, referring to fig. 1, a description will be given of a high-dynamic ultraprecise multi-mover work table for a lithography machine according to the present embodiment, which includes m stator units 1, n mover units 2, and n micro units 3; wherein m and n are integers;
the m stator units 1 are spliced together to form a stator module, and the stator module is used for generating a moving three-dimensional magnetic field and acting on the n rotor units 2 to provide power for the n rotor units 2 so that the n rotor units 2 move along a preset track;
the n rotor units 2 are magnetically suspended above the stator modules formed by splicing the m stator units 1, and each rotor unit 2 is fixedly provided with a micro-motion unit 3;
the first stator 3-1 of each micro-motion unit 3 is fixed on the corresponding rotor unit 2, and the tray 4 is fixed on the first rotor 3-2 of the micro-motion unit 3 and used for controlling the tray 4 to micro-motion.
In the embodiment, in specific application, m stator units 1 can be combined into a stator module with a specific shape according to the actual requirement of a photoetching machine, the stator module can be fixed on a corresponding balance mass block, and a moving three-dimensional magnetic field generated by the stator module interacts with a rotor unit 2 to ensure that the rotor unit 2 realizes spatial six-degree-of-freedom precise movement;
the high-dynamic ultra-precise multi-rotor workpiece table for the photoetching machine has a simple structure, can realize modular design, has 2 rotor units of which the number can be adjusted according to specific requirements, and is convenient to assemble; the rotor unit 2 adopts magnetic suspension support, so that friction is eliminated, positioning accuracy is greatly improved, and the rotor unit can work in a vacuum environment; the rotor unit 2 obtains energy through wireless energy transmission, and finally the rotor unit 2 realizes wireless control and movement, thereby replacing the traditional cable framework structural design, reducing the interference of cable disturbance on six-degree-of-freedom movement of the rotor, improving the movement and positioning precision of the whole machine, reducing the control difficulty and improving the stability; the moving part gets rid of the interference of the cable and the water pipe and the air pipe, can obtain higher dynamic performance, and can greatly improve the wafer yield of the photoetching machine.
Further, referring specifically to fig. 2, each stator unit 1 includes a stator base 1-1, a stator bracket 1-2, a coil array 1-3, and a water-cooled cover plate 1-4;
the stator base 1-1, the stator support 1-2, the coil array 1-3 and the water-cooling cover plate 1-4 are sequentially stacked and fixed together from bottom to top to form an integral piece;
cooling liquid is introduced into the stator base 1-1 and the water-cooling cover plate 1-4 for cooling the coil array 1-3;
the power supply end of the coil array 1-3 is encapsulated on the stator base 1-1, the power supply end of the coil array 1-3 is used for being connected with the stator power supply end of a drive control system of the photoetching machine, and the drive control system of the photoetching machine is used for controlling the current input to each coil in the coil array 1-3.
In the preferred embodiment, a specific structure of the stator unit 1 is given, and the coil arrays 1-3 generate a moving three-dimensional magnetic field after being electrified and act on n rotor units 2 to provide power for the n rotor units 2 and provide power for six-degree-of-freedom movement of the rotor units 2.
Still further, referring specifically to FIG. 3, the mover unit 2 includes a Halbach permanent magnet array 2-1, a mover carriage 2-2 and a crash cushion 2-3;
the Halbach permanent magnet array 2-1 is fixed on the lower surface of the rotor bracket 2-2;
the crash cushion 2-3 is sleeved on the frame of the rotor bracket 2-2.
In the preferred embodiment, a specific structure of the mover unit 2 is provided, the Halbach permanent magnet array 2-1 interacting with the magnetic field generated by the coil array 1-3.
Furthermore, the high-dynamic ultra-precise multi-rotor workpiece table for the photoetching machine further comprises a position detection unit, and the position detection unit is fixed on the lower surface of the rotor unit 2.
In the preferred embodiment, in a specific application, a position detecting unit is fixed on the lower surface of each sub-unit 2, so as to detect the position of the sub-unit 2 where the position detecting unit is located.
Still further, with particular reference to fig. 3, the position detection unit comprises 4 position sensors 5; the 4 position sensors 5 are fixed on the lower surface of the rotor bracket 2-2, and the 4 position sensors 5 are uniformly distributed around the Halbach permanent magnet array 2-1 in the circumferential direction;
wherein the lower surface of the mover frame 2-2 serves as the lower surface of the mover unit 2.
Still further, referring specifically to fig. 4, each micro-motion unit 3 includes a first stator 3-1, a first mover 3-2, a signal transmitting device 3-3, a signal receiving device 3-4, and a lithium battery module 3-5; the signal transmitting device 3-3, the signal receiving device 3-4 and the lithium battery module 3-5 are all fixed on the upper surface of the first rotor 3-2;
the first rotor 3-2 comprises 3 piezoelectric ceramics 3-2-1 and 3 magnetostriction mechanisms 3-2-2;
the 3 piezoelectric ceramics 3-2-1 and the 3 magnetostriction mechanisms 3-2-2 are fixed on the upper surface of the first stator 3-1, and the tray 4 is fixed on the upper surfaces of the 3 piezoelectric ceramics 3-2-1 and the 3 magnetostriction mechanisms 3-2-2;
two piezoelectric ceramics 3-2-1 in the 3 piezoelectric ceramics 3-2-1 are used for controlling the tray 4 to move along the X axis of the plane of the first stator 3-1, and the rest piezoelectric ceramics 3-2-1 are used for controlling the tray 4 to move along the Y axis of the plane of the first stator 3-1;
3 magnetostriction mechanisms 3-2-2 for controlling the Z-axis motion of the tray 4 perpendicular to the plane of the first stator 3-1;
the lithium battery module 3-5 is used for supplying power to the 4 position sensors 5, the signal transmitting device 3-3, the signal receiving device 3-4, the 3 piezoelectric ceramics 3-2-1 and the 3 magnetostriction mechanisms 3-2-2;
signal transmitting means 3-3 for transmitting the position information detected by the position detecting unit to an external terminal in a wireless transmission manner;
the signal receiving device 3-4 receives control instructions output by a drive control system of the photoetching machine in a wireless transmission mode to control the 3 piezoelectric ceramics 3-2-1 and the 3 magnetostriction mechanisms 3-2-2, so that fine adjustment positioning control of the tray 4 is realized.
In the preferred embodiment, the stored energy of the lithium battery module 3-5 provides electric energy for the piezoelectric ceramics 3-2-1 and the magnetostriction mechanism 3-2-2 on the micro-motion unit 3, so that wireless control and large-range motion are thoroughly realized, and compared with the traditional cable framework structural design, the interference of cable disturbance on six-degree-of-freedom motion of the mover is reduced, the motion precision of the whole machine is improved, the control difficulty is reduced, and the stability is improved;
on the other hand, when the electric quantity of the lithium battery module 3-5 is low, the lithium battery module 3-5 can be charged through a charging pile on the photoetching machine.
Further, two piezoelectric ceramics 3-2-1 of the control tray 4 moving along the X-axis of the plane of the first stator 3-1 are oppositely disposed, and the remaining one piezoelectric ceramics 3-2-1 is perpendicular to the two piezoelectric ceramics 3-2-1.
Further, one ends of the 3 piezoelectric ceramics 3-2-1 intersect at a point, and the 3 piezoelectric ceramics 3-2-1 are uniformly distributed in the circumferential direction.
Further, the first stator 3-1 and the mover support 2-2 are of a flat plate structure, and both radial sections are square.
Further, the number of the lithium battery modules 3-5 on each micro-motion unit 3 is 4, and the 4 lithium battery modules 3-5 are respectively located at the 4 corners of the first stator 3-1.
Although the invention herein has been described with reference to particular embodiments, it is to be understood that these embodiments are merely illustrative of the principles and applications of the present invention. It is therefore to be understood that numerous modifications may be made to the illustrative embodiments and that other arrangements may be devised without departing from the spirit and scope of the present invention as defined by the appended claims. It should be understood that the different dependent claims and the features described herein may be combined in ways other than as described in the original claims. It is also to be understood that features described in connection with separate embodiments may be used in other described embodiments.
Claims (6)
1. The high-dynamic ultra-precise multi-rotor workpiece table for the photoetching machine comprises m stator units (1), n rotor units (2) and n micro-motion units (3); wherein m and n are integers;
the m stator units (1) are spliced together to form a stator module, and the stator module is used for generating a moving three-dimensional magnetic field and acting on the n rotor units (2) to provide power for the n rotor units (2) so that the n rotor units (2) move along a preset track;
the n rotor units (2) are magnetically suspended above stator modules formed by splicing the m stator units (1), and each rotor unit (2) is fixedly provided with a micro-motion unit (3);
the first stator (3-1) of each micro-motion unit (3) is fixed on the corresponding rotor unit (2), and a tray (4) is fixed on the first rotor (3-2) of the micro-motion unit (3) and used for controlling the tray (4) to micro-motion;
the ultra-precise multi-rotor workpiece table is characterized by further comprising a position detection unit, wherein the position detection unit is fixed on the lower surface of the rotor unit (2);
the position detection unit comprises 4 position sensors (5);
the 4 position sensors (5) are fixed on the lower surface of the rotor bracket (2-2), and the 4 position sensors (5) are uniformly distributed around the Halbach permanent magnet array (2-1) in the circumferential direction;
wherein the lower surface of the rotor bracket (2-2) is used as the lower surface of the rotor unit (2);
the rotor unit (2) comprises a Halbach permanent magnet array (2-1), a rotor bracket (2-2) and a crash cushion (2-3);
the Halbach permanent magnet array (2-1) is fixed on the lower surface of the rotor bracket (2-2);
the anti-collision buffer cushion (2-3) is sleeved on the frame of the rotor bracket (2-2);
each micro-motion unit (3) comprises a first stator (3-1), a first rotor (3-2), a signal transmitting device (3-3), a signal receiving device (3-4) and a lithium battery module (3-5); wherein, the signal transmitting device (3-3), the signal receiving device (3-4) and the lithium battery module (3-5) are all fixed on the upper surface of the first rotor (3-2);
the first rotor (3-2) comprises 3 piezoelectric ceramics (3-2-1) and 3 magnetostriction mechanisms (3-2-2);
the 3 piezoelectric ceramics (3-2-1) and the 3 magnetostriction mechanisms (3-2-2) are fixed on the upper surface of the first stator (3-1), and the tray (4) is fixed on the upper surfaces of the 3 piezoelectric ceramics (3-2-1) and the 3 magnetostriction mechanisms (3-2-2);
two piezoelectric ceramics (3-2-1) in the 3 piezoelectric ceramics (3-2-1) are used for controlling the tray (4) to move along the X axis of the plane of the first stator (3-1), and the rest piezoelectric ceramics (3-2-1) are used for controlling the tray (4) to move along the Y axis of the plane of the first stator (3-1);
3 magnetostriction mechanisms (3-2-2) for controlling the tray (4) to move along the Z axis perpendicular to the plane where the first stator (3-1) is located;
the lithium battery module (3-5) is used for supplying power to the 4 position sensors (5), the signal transmitting device (3-3), the signal receiving device (3-4), the 3 piezoelectric ceramics (3-2-1) and the 3 magnetostriction mechanisms (3-2-2);
signal transmitting means (3-3) for transmitting the position information detected by the position detecting unit to an external terminal in a wireless transmission manner;
the signal receiving device (3-4) receives control instructions output by a drive control system of the photoetching machine in a wireless transmission mode to control the 3 piezoelectric ceramics (3-2-1) and the 3 magnetostriction mechanisms (3-2-2), so that fine adjustment positioning control of the tray (4) is realized.
2. The high-dynamic ultra-precise multi-mover work table for a lithography machine according to claim 1, wherein each stator unit (1) includes a stator base (1-1), a stator bracket (1-2), a coil array (1-3), and a water-cooled cover plate (1-4);
the stator base (1-1), the stator bracket (1-2), the coil array (1-3) and the water cooling cover plate (1-4) are sequentially stacked and fixed together from bottom to top to form an integral piece;
cooling liquid is introduced into the stator base (1-1) and the water-cooling cover plate (1-4) for cooling the coil array (1-3);
the power supply end of the coil array (1-3) is packaged on the stator base (1-1), the power supply end of the coil array (1-3) is used for being connected with the stator power supply end of a drive control system of the photoetching machine, and the drive control system of the photoetching machine is used for controlling currents input to all coils in the coil array (1-3).
3. The high-dynamic ultra-precise multi-mover stage for a lithography machine according to claim 1, wherein the control tray (4) is disposed opposite to two piezoelectric ceramics (3-2-1) moving along the X-axis of the plane in which the first stator (3-1) is disposed, and the remaining one piezoelectric ceramic (3-2-1) is perpendicular to the two piezoelectric ceramics (3-2-1).
4. The high-dynamic ultra-precise multi-mover table for a lithography machine according to claim 1, wherein one ends of the 3 piezoelectric ceramics (3-2-1) intersect at a point, and the 3 piezoelectric ceramics (3-2-1) are uniformly distributed in the circumferential direction.
5. The high-dynamic ultra-precise multi-mover workpiece table for a lithography machine according to claim 1, wherein the first stator (3-1) and the mover support (2-2) are of a flat plate structure, and the radial cross sections of the first stator and the mover support are square.
6. The high-dynamic ultra-precise multi-mover workpiece table for the lithography machine according to claim 5, wherein the number of the lithium battery modules (3-5) on each micro-motion unit (3) is 4, and the 4 lithium battery modules (3-5) are respectively positioned at 4 corners of the first stator (3-1).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111186443.0A CN113917800B (en) | 2021-10-12 | 2021-10-12 | High-dynamic ultra-precise multi-rotor workpiece table for photoetching machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111186443.0A CN113917800B (en) | 2021-10-12 | 2021-10-12 | High-dynamic ultra-precise multi-rotor workpiece table for photoetching machine |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN113917800A CN113917800A (en) | 2022-01-11 |
| CN113917800B true CN113917800B (en) | 2023-12-08 |
Family
ID=79239420
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202111186443.0A Active CN113917800B (en) | 2021-10-12 | 2021-10-12 | High-dynamic ultra-precise multi-rotor workpiece table for photoetching machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN113917800B (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101158815A (en) * | 2007-08-31 | 2008-04-09 | 上海微电子装备有限公司 | Air-float magnetic controlled precision movement platform |
| CN105425548A (en) * | 2016-01-14 | 2016-03-23 | 哈尔滨工业大学 | Moving coil magnetic-levitation wireless micro-motion-stage vector circular-arc exchange method and device based on herringbone coil arrangement |
| CN105607429A (en) * | 2009-06-19 | 2016-05-25 | 株式会社尼康 | Exposure apparatus and device manufacturing method |
| CN106919002A (en) * | 2011-12-29 | 2017-07-04 | 株式会社尼康 | Exposure method, Bao Guang Installed put and manufacturing method |
-
2021
- 2021-10-12 CN CN202111186443.0A patent/CN113917800B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101158815A (en) * | 2007-08-31 | 2008-04-09 | 上海微电子装备有限公司 | Air-float magnetic controlled precision movement platform |
| CN105607429A (en) * | 2009-06-19 | 2016-05-25 | 株式会社尼康 | Exposure apparatus and device manufacturing method |
| CN106919002A (en) * | 2011-12-29 | 2017-07-04 | 株式会社尼康 | Exposure method, Bao Guang Installed put and manufacturing method |
| CN105425548A (en) * | 2016-01-14 | 2016-03-23 | 哈尔滨工业大学 | Moving coil magnetic-levitation wireless micro-motion-stage vector circular-arc exchange method and device based on herringbone coil arrangement |
Also Published As
| Publication number | Publication date |
|---|---|
| CN113917800A (en) | 2022-01-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101807010B (en) | Nano-precision six-freedom-degree magnetic suspension jiggle station and application | |
| CN102880009B (en) | Six-degree-of-freedom micro-motion worktable | |
| CN102594220B (en) | Magnetic suspension planar motor with superconductor excitation structure | |
| CN105634241B (en) | Micro-nano positioning device and its voice coil motor | |
| CN103226296B (en) | Rough-fine-movement laminated workbench with laser interferometer measurement | |
| CN110939683A (en) | Large-load low-power-consumption magnetic suspension vibration isolation platform | |
| CN103019046B (en) | Six-freedom-degree magnetic levitation micropositioner based on multi-group individual drive decoupling control | |
| CN110429868B (en) | Low-rigidity magnetic suspension gravity compensator, driving device and six-degree-of-freedom micro-motion platform | |
| CN101741290B (en) | Magnetic suspension inching platform with six degrees of freedom | |
| CN102681364A (en) | Six-degree-of-freedom magnetic suspension micro-positioner | |
| CN103226295A (en) | Lithography machine silicon wafer bench micro-motion workbench | |
| CN109861493A (en) | Moving-magnetic type magnetic suspension permanent magnet synchronous plane motor | |
| CN103383526B (en) | The dynamic stacking workbench of a kind of thick essence | |
| Hu et al. | Extended range six-DOF high-precision positioner for wafer processing | |
| CN113471112A (en) | Magnetic suspension gravity compensation device and micro-motion platform | |
| US10331044B2 (en) | Dynamic-magnetic steel magnet levitation double-workpiece-stage vector arc switching method and apparatus based on wireless energy transmission | |
| CN109870881B (en) | Macro-micro combined long-stroke precision motion platform | |
| CN111490642B (en) | Displacement device based on Hall effect sensor and planar motor | |
| CN113917800B (en) | High-dynamic ultra-precise multi-rotor workpiece table for photoetching machine | |
| CN114977721B (en) | Bidirectional integrated lorentz force motor | |
| CN113029235B (en) | Small-stroke nanoscale motion platform and heat-related hysteresis data measuring method | |
| CN115242129A (en) | Three-degree-of-freedom magnetic suspension mobile platform and control method thereof | |
| CN114825854A (en) | Magnetic levitation planar motor workbench with double-layer winding coarse and fine driving function | |
| CN112928891B (en) | Six-degree-of-freedom magnetic levitation table device and control method thereof | |
| CN101800460A (en) | Short-stroke direct current planar motor integrating winding structure |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |