CN113917800A - High-dynamic ultra-precise multi-rotor workpiece table for photoetching machine - Google Patents
High-dynamic ultra-precise multi-rotor workpiece table for photoetching machine Download PDFInfo
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- CN113917800A CN113917800A CN202111186443.0A CN202111186443A CN113917800A CN 113917800 A CN113917800 A CN 113917800A CN 202111186443 A CN202111186443 A CN 202111186443A CN 113917800 A CN113917800 A CN 113917800A
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- 238000001259 photo etching Methods 0.000 title claims abstract description 26
- 239000000919 ceramic Substances 0.000 claims description 40
- 230000033001 locomotion Effects 0.000 claims description 19
- 230000007246 mechanism Effects 0.000 claims description 19
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims description 18
- 229910052744 lithium Inorganic materials 0.000 claims description 18
- 238000001459 lithography Methods 0.000 claims description 16
- 238000001816 cooling Methods 0.000 claims description 13
- 230000005540 biological transmission Effects 0.000 claims description 8
- 238000001514 detection method Methods 0.000 claims description 7
- 239000000110 cooling liquid Substances 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 5
- 230000004044 response Effects 0.000 abstract description 3
- 239000000725 suspension Substances 0.000 description 2
- 238000003491 array Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
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- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K16/00—Machines with more than one rotor or stator
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- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
- H02K41/02—Linear motors; Sectional motors
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- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
- H02K41/02—Linear motors; Sectional motors
- H02K41/03—Synchronous motors; Motors moving step by step; Reluctance motors
- H02K41/031—Synchronous motors; Motors moving step by step; Reluctance motors of the permanent magnet type
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- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
- H02N15/00—Holding or levitation devices using magnetic attraction or repulsion, not otherwise provided for
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- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
- H02N2/00—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction
- H02N2/02—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction producing linear motion, e.g. actuators; Linear positioners ; Linear motors
- H02N2/028—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction producing linear motion, e.g. actuators; Linear positioners ; Linear motors along multiple or arbitrary translation directions, e.g. XYZ stages
Abstract
A high-dynamic ultra-precise multi-rotor workpiece table for a photoetching machine relates to the technical field of motor application. The problem of the dynamic response performance of work piece platform is poor that there is the disturbance that cable, water pipe brought in the moving coil formula planar motor in the work piece platform to lead to work piece platform positioning accuracy poor and work piece platform is solved. The invention comprises m stator units, n rotor units and n micromotion units; the m stator units are spliced together to form a stator module, the stator module is used for generating a moving three-dimensional magnetic field and acts on the n rotor units to provide power for the n rotor units and enable the n rotor units to move along a preset track; the n rotor units are magnetically suspended above the stator module formed by splicing the m stator units, and each rotor unit is fixed with a micro-motion unit; each micro-motion unit is used for carrying out micro-motion adjustment on the tray fixed on the micro-motion unit. The invention is mainly applied to the field of photoetching machines.
Description
Technical Field
The invention relates to the technical field of motor application.
Background
With the rapid development of microelectronic technology, the lithography machine plays a key role as a core device for producing large-scale integrated circuits. The high-end lithography machines are the most precise instruments in the world and are only mastered by a few manufacturers in the world. The workpiece table is one of the core units of the photoetching machine and is an ultra-precise motion platform. At present, a workpiece table of a mainstream lithography machine usually adopts a driving scheme combining macro motion of a long-stroke permanent magnet linear synchronous motor and high-precision micro motion of a direct current linear motor, so as to realize nano-scale precise positioning and tracking. Although the macro-micro combination scheme is relatively easy to realize, a series of problems such as backlash and deformation exist in the structure, and the positioning precision is difficult to reach a higher level.
The planar motor is an electromagnetic device capable of directly converting electromagnetic energy into two-dimensional planar motion, and has the advantages of high precision, low loss, large motion range and the like.
At present, a foreign famous photo-etching machine manufacturer successfully applies a moving coil type planar motor to a photo-etching machine workpiece table, the adoption of the moving coil type planar motor greatly improves the yield of the photo-etching machine, but the moving part of the moving coil type planar motor is a coil array, in order to meet the requirements of work and cooling, a large number of cables and cooling water pipes need to be dragged by a rotor part in the moving process, the weight of the cables and the water pipes can cause the mass center deviation of the rotor and also can bring great disturbance, and great difficulty is brought to the design and layout of the rotor. In addition, the coil array is a heat source, a large number of cooling and heat insulation devices are required to isolate the influence of the temperature rise on the light source circuit, and the weight of the devices greatly influences the dynamic response speed of the motor workpiece table, so that the above problems need to be solved.
Disclosure of Invention
The invention aims to solve the problems of poor positioning precision of a workpiece table and poor dynamic response performance of the workpiece table caused by the disturbance of a cable and a water pipe of a moving coil type planar motor in the workpiece table.
The high-dynamic ultra-precise multi-rotor workpiece table for the photoetching machine comprises m stator units, n rotor units and n micro-motion units; wherein m and n are integers;
the m stator units are spliced together to form a stator module, the stator module is used for generating a moving three-dimensional magnetic field and acts on the n rotor units to provide power for the n rotor units so as to enable the n rotor units to move along a preset track;
the n rotor units are magnetically suspended above the stator module formed by splicing the m stator units, and each rotor unit is fixed with a micro-motion unit;
the first stator of each micro-motion unit is fixed on the corresponding rotor unit, and the first rotor of each micro-motion unit is fixed with a tray for controlling the tray to perform micro-motion.
Preferably, each stator unit comprises a stator base, a stator bracket, a coil array and a water-cooling cover plate;
the stator base, the stator bracket, the coil array and the water-cooling cover plate are sequentially stacked and fixed together from bottom to top to form an integrated piece;
cooling liquid is introduced into the stator base and the water-cooling cover plate and is used for cooling the coil array;
the power supply end of the coil array is packaged on the stator base, the power supply end of the coil array is used for being connected with the stator power supply end of the drive control system of the photoetching machine, and the drive control system of the photoetching machine is used for controlling the current input to each coil in the coil array.
Preferably, the rotor unit comprises a Halbach permanent magnet array, a rotor bracket and an anti-collision buffer cushion;
the Halbach permanent magnet array is fixed on the lower surface of the rotor bracket;
the anti-collision buffer cushion is sleeved on the frame of the rotor support.
Preferably, the high-dynamic ultra-precise multi-stage for a lithography machine further includes a position detection unit fixed to a lower surface of the mover unit.
Preferably, the position detecting unit includes 4 position sensors;
the 4 position sensors are fixed on the lower surface of the rotor support, and the 4 position sensors are uniformly distributed around the Halbach permanent magnet array in the circumferential direction;
wherein, the lower surface of the rotor support is used as the lower surface of the rotor unit.
Preferably, each micro-motion unit comprises a first stator, a first rotor, a signal transmitting device, a signal receiving device and a lithium battery module; the signal transmitting device, the signal receiving device and the lithium battery module are all fixed on the upper surface of the first rotor;
the first rotor comprises 3 piezoelectric ceramics and 3 magnetostrictive mechanisms;
3 piezoelectric ceramics and 3 magnetostrictive mechanisms are fixed on the upper surface of the first stator, and the tray is fixed on the upper surfaces of the 3 piezoelectric ceramics and the 3 magnetostrictive mechanisms;
two piezoelectric ceramics in the 3 piezoelectric ceramics are used for controlling the tray to move along the X axis of the plane where the first stator is located, and the rest piezoelectric ceramics are used for controlling the tray to move along the Y axis of the plane where the first stator is located;
the 3 magnetostrictive mechanisms are used for controlling the tray to move along a Z axis which is vertical to the plane where the first stator is located;
the lithium battery module is used for supplying power to the 4 position sensors, the signal transmitting device, the signal receiving device, the 3 piezoelectric ceramics and the 3 magnetostrictive mechanisms;
the signal transmitting device is used for transmitting the position information detected by the position detecting unit to an external terminal in a wireless transmission mode;
and the signal receiving device receives a control instruction output by a drive control system of the photoetching machine in a wireless transmission mode to control the 3 piezoelectric ceramics and the 3 magnetostrictive mechanisms, so that the fine adjustment and positioning control of the tray is realized.
Preferably, the two piezoelectric ceramics for controlling the tray to move along the X-axis of the plane where the first stator is located are arranged oppositely, and the remaining one piezoelectric ceramic is perpendicular to the two piezoelectric ceramics.
Preferably, one ends of the 3 piezoelectric ceramics meet at a point, and the 3 piezoelectric ceramics are uniformly distributed in the circumferential direction.
Preferably, the first stator and the mover support are flat plate structures, and both have a square radial cross section.
Preferably, the number of the lithium battery modules on each inching unit is 4, and the 4 lithium battery modules are respectively located at the 4 corners of the first stator.
The high-dynamic ultra-precise multi-rotor workpiece table for the photoetching machine has the beneficial effects that the high-dynamic ultra-precise multi-rotor workpiece table for the photoetching machine comprises m stator units, n rotor units and n micro-motion units, the structure is simple, the modular design can be realized, the rotor units can be adjusted according to specific requirements, and the assembly is convenient; the rotor unit is supported by magnetic suspension, so that friction is eliminated, positioning accuracy is greatly improved, and the rotor unit can work in a vacuum environment. The rotor unit obtains energy through wireless energy transmission, and finally the rotor unit realizes wireless control and motion, so that the traditional cable framework structure design is replaced, the interference of cable disturbance on six-degree-of-freedom motion of the rotor is reduced, the motion and positioning precision of the whole machine are improved, the control difficulty is reduced, and the stability is improved; the moving part gets rid of the interference of cables and water pipes and air pipes, higher dynamic performance can be obtained, and the film yield of the photoetching machine can be greatly improved.
In addition, the tray on the micro-motion unit is controlled to be micro-moved through wireless signals, wireless control and movement are further achieved, and positioning accuracy can be improved.
Drawings
FIG. 1 is a schematic diagram of a high-dynamic ultra-precise multi-stage for a lithography machine according to the present invention;
fig. 2 is a schematic structural view of the stator unit 1;
fig. 3 is a schematic structural view of the mover unit 2;
fig. 4 is a schematic structural view of the inching unit 3.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
It should be noted that the embodiments and features of the embodiments may be combined with each other without conflict.
The first embodiment is as follows: the present embodiment will be described with reference to fig. 1, and the high-dynamic ultra-precise multi-stage for lithography according to the present embodiment includes m stator units 1, n mover units 2, and n micro-motion units 3; wherein m and n are integers;
the m stator units 1 are spliced together to form a stator module, the stator module is used for generating a moving three-dimensional magnetic field and acts on the n rotor units 2 to provide power for the n rotor units 2 so that the n rotor units 2 move along a preset track;
the n rotor units 2 are magnetically suspended above the stator modules formed by splicing the m stator units 1, and each rotor unit 2 is fixed with a micro-motion unit 3;
the first stator 3-1 of each micro-motion unit 3 is fixed on the corresponding rotor unit 2, and the first rotor 3-2 of the micro-motion unit 3 is fixed with a tray 4 for controlling the tray 4 to perform micro-motion.
In the embodiment, in specific application, the m stator units 1 can be combined into a stator module with a specific shape according to the actual requirement of the photoetching machine, the stator module can be fixed on the corresponding balance mass block, and a three-dimensional magnetic field generated by the stator module to move interacts with the rotor unit 2 so as to ensure that the rotor unit 2 realizes spatial six-degree-of-freedom precise movement;
the high-dynamic ultra-precise multi-rotor workpiece table for the photoetching machine is simple in structure, modular design can be realized, the number of the rotor units 2 can be adjusted according to specific requirements, and the assembly is convenient; the rotor unit 2 is supported by magnetic suspension, so that friction is eliminated, the positioning accuracy is greatly improved, and the rotor unit can work in a vacuum environment; the rotor unit 2 obtains energy through wireless energy transmission, and finally the rotor unit 2 realizes wireless control and motion, so that the traditional cable framework structural design is replaced, the interference of cable disturbance on six-degree-of-freedom motion of the rotor is reduced, the motion and positioning precision of the whole machine are improved, the control difficulty is reduced, and the stability is improved; the moving part gets rid of the interference of cables and water pipes and air pipes, higher dynamic performance can be obtained, and the film yield of the photoetching machine can be greatly improved.
Further, referring specifically to fig. 2, each stator unit 1 includes a stator base 1-1, a stator support 1-2, a coil array 1-3, and a water-cooling cover plate 1-4;
the stator base 1-1, the stator support 1-2, the coil array 1-3 and the water-cooling cover plate 1-4 are sequentially overlapped and fixed together from bottom to top to form an integrated piece;
cooling liquid is introduced into the stator base 1-1 and the water-cooling cover plate 1-4 and is used for cooling the coil array 1-3;
the power supply end of the coil array 1-3 is packaged on the stator base 1-1, the power supply end of the coil array 1-3 is used for being connected with the stator power supply end of a drive control system of the photoetching machine, and the drive control system of the photoetching machine is used for controlling current input to each coil in the coil array 1-3.
In the preferred embodiment, a specific structure of the stator unit 1 is provided, and the coil arrays 1-3 generate a moving three-dimensional magnetic field after being energized, and act on the n mover units 2 to provide power for the n mover units 2 and provide power for six-degree-of-freedom movement of the mover units 2.
Further, referring specifically to fig. 3, the mover unit 2 includes a Halbach permanent magnet array 2-1, a mover support 2-2 and a crash cushion 2-3;
the Halbach permanent magnet array 2-1 is fixed on the lower surface of the rotor support 2-2;
the anti-collision buffer cushion 2-3 is sleeved on the frame of the rotor support 2-2.
In the preferred embodiment, a specific structure of the rotor unit 2 is provided, and the Halbach permanent magnet array 2-1 interacts with the magnetic field generated by the coil array 1-3.
Furthermore, the high-dynamic ultra-precise multi-mover stage for the lithography machine further includes a position detection unit fixed to the lower surface of the mover unit 2.
In a specific application of the present preferred embodiment, a position detection unit is fixed to a lower surface of each of the mover units 2, and is configured to detect a position of the mover unit 2 where the position detection unit is located.
Further, with particular reference to fig. 3, the position detection unit comprises 4 position sensors 5; the 4 position sensors 5 are fixed on the lower surface of the rotor support 2-2, and the 4 position sensors 5 are uniformly distributed around the circumferential direction of the Halbach permanent magnet array 2-1;
wherein, the lower surface of the mover support 2-2 serves as the lower surface of the mover unit 2.
Further, referring specifically to fig. 4, each inching unit 3 comprises a first stator 3-1, a first mover 3-2, a signal transmitting device 3-3, a signal receiving device 3-4 and a lithium battery module 3-5; the signal transmitting device 3-3, the signal receiving device 3-4 and the lithium battery module 3-5 are all fixed on the upper surface of the first rotor 3-2;
the first rotor 3-2 comprises 3 piezoelectric ceramics 3-2-1 and 3 magnetostrictive mechanisms 3-2-2;
3 piezoelectric ceramics 3-2-1 and 3 magnetostrictive mechanisms 3-2-2 are fixed on the upper surface of the first stator 3-1, and the tray 4 is fixed on the upper surfaces of the 3 piezoelectric ceramics 3-2-1 and the 3 magnetostrictive mechanisms 3-2-2;
two piezoelectric ceramics 3-2-1 in the 3 piezoelectric ceramics 3-2-1 are used for controlling the tray 4 to move along the X axis of the plane where the first stator 3-1 is located, and the remaining piezoelectric ceramics 3-2-1 are used for controlling the tray 4 to move along the Y axis of the plane where the first stator 3-1 is located;
3 magnetostrictive mechanisms 3-2-2 for controlling the tray 4 to move along the Z axis perpendicular to the plane of the first stator 3-1;
the lithium battery module 3-5 is used for supplying power to 4 position sensors 5, the signal transmitting device 3-3, the signal receiving device 3-4, 3 piezoelectric ceramics 3-2-1 and 3 magnetostrictive mechanisms 3-2-2;
the signal transmitting device 3-3 is used for transmitting the position information detected by the position detecting unit to an external terminal in a wireless transmission mode;
and the signal receiving device 3-4 is used for receiving a control instruction output by a drive control system of the photoetching machine in a wireless transmission mode to control the 3 piezoelectric ceramics 3-2-1 and the 3 magnetostrictive mechanisms 3-2-2, so that fine adjustment and positioning control on the tray 4 is realized.
In the preferred embodiment, the stored energy of the lithium battery module 3-5 provides electric energy for the piezoelectric ceramic 3-2-1 and the magnetostrictive mechanism 3-2-2 on the micro-motion unit 3, so that wireless control and large-range motion are thoroughly realized, and compared with the traditional cable framework structure design, the interference of cable disturbance on six-degree-of-freedom motion of the rotor is reduced, the motion precision of the whole machine is improved, the control difficulty is reduced, and the stability is improved;
on the other hand, when the electric quantity of the lithium battery module 3-5 is low, the lithium battery module 3-5 can be charged through the charging pile on the photoetching machine.
Furthermore, two piezoelectric ceramics 3-2-1 for controlling the tray 4 to move along the X-axis of the plane of the first stator 3-1 are oppositely arranged, and the other piezoelectric ceramics 3-2-1 is perpendicular to the two piezoelectric ceramics 3-2-1.
Furthermore, one end of 3 piezoelectric ceramics 3-2-1 is intersected at one point, and the 3 piezoelectric ceramics 3-2-1 are uniformly distributed in the circumferential direction.
Furthermore, the first stator 3-1 and the mover support 2-2 are flat-plate structures, and both have a square radial cross section.
Furthermore, the number of the lithium battery modules 3-5 on each inching unit 3 is 4, and the 4 lithium battery modules 3-5 are respectively positioned at the 4 corners of the first stator 3-1 where the first stator is located.
Although the invention herein has been described with reference to particular embodiments, it is to be understood that these embodiments are merely illustrative of the principles and applications of the present invention. It is therefore to be understood that numerous modifications may be made to the illustrative embodiments and that other arrangements may be devised without departing from the spirit and scope of the present invention as defined by the appended claims. It should be understood that features described in different dependent claims and herein may be combined in ways different from those described in the original claims. It is also to be understood that features described in connection with individual embodiments may be used in other described embodiments.
Claims (10)
1. The high-dynamic ultra-precise multi-rotor workpiece table for the photoetching machine is characterized by comprising m stator units (1), n rotor units (2) and n micro-motion units (3); wherein m and n are integers;
the m stator units (1) are spliced together to form a stator module, the stator module is used for generating a moving three-dimensional magnetic field and acts on the n rotor units (2) to provide power for the n rotor units (2) so that the n rotor units (2) move along a preset track;
the n rotor units (2) are magnetically suspended above the stator modules formed by splicing the m stator units (1), and each rotor unit (2) is fixed with a micro-motion unit (3);
the first stator (3-1) of each micro-motion unit (3) is fixed on the corresponding rotor unit (2), and the first rotor (3-2) of the micro-motion unit (3) is fixed with a tray (4) for controlling the tray (4) to micro-motion.
2. The high-dynamic ultra-precise multi-mover stage for lithography machine of claim 1, wherein each stator unit (1) comprises a stator base (1-1), a stator frame (1-2), a coil array (1-3) and a water-cooled cover plate (1-4);
the stator base (1-1), the stator support (1-2), the coil array (1-3) and the water-cooling cover plate (1-4) are sequentially overlapped and fixed together from bottom to top to form an integrated piece;
cooling liquid is introduced into the stator base (1-1) and the water-cooling cover plate (1-4) and is used for cooling the coil array (1-3);
the power supply end of the coil array (1-3) is packaged on the stator base (1-1), the power supply end of the coil array (1-3) is used for being connected with the stator power supply end of a drive control system of the photoetching machine, and the drive control system of the photoetching machine is used for controlling current input to each coil in the coil array (1-3).
3. The high-dynamic ultra-precise multi-mover stage for lithography machine of claim 1, wherein the mover unit (2) comprises a Halbach permanent magnet array (2-1), a mover support (2-2) and a crash cushion (2-3);
the Halbach permanent magnet array (2-1) is fixed on the lower surface of the rotor support (2-2);
the anti-collision buffer cushion (2-3) is sleeved on the frame of the rotor support (2-2).
4. A high-dynamic ultra-precise multi-mover stage for a lithography machine according to claim 3, further comprising a position detection unit fixed to a lower surface of the mover unit (2).
5. The high-dynamic ultra-precise multi-stage workpiece table for lithography machine according to claim 4, wherein the position detection unit comprises 4 position sensors (5);
the 4 position sensors (5) are fixed on the lower surface of the rotor support (2-2), and the 4 position sensors (5) are uniformly distributed around the circumferential direction of the Halbach permanent magnet array (2-1);
wherein, the lower surface of the rotor support (2-2) is used as the lower surface of the rotor unit (2).
6. The high-dynamic ultra-precise multi-mover stage for lithography machine of claim 5, wherein each micro-motion unit (3) comprises a first stator (3-1), a first mover (3-2), a signal transmitting device (3-3), a signal receiving device (3-4) and a lithium battery module (3-5); the signal transmitting device (3-3), the signal receiving device (3-4) and the lithium battery module (3-5) are all fixed on the upper surface of the first rotor (3-2);
the first rotor (3-2) comprises 3 piezoelectric ceramics (3-2-1) and 3 magnetostrictive mechanisms (3-2-2);
3 piezoelectric ceramics (3-2-1) and 3 magnetostrictive mechanisms (3-2-2) are fixed on the upper surface of the first stator (3-1), and the tray (4) is fixed on the upper surfaces of the 3 piezoelectric ceramics (3-2-1) and the 3 magnetostrictive mechanisms (3-2-2);
two piezoelectric ceramics (3-2-1) in the 3 piezoelectric ceramics (3-2-1) are used for controlling the tray (4) to move along the X axis of the plane of the first stator (3-1), and the rest piezoelectric ceramics (3-2-1) are used for controlling the tray (4) to move along the Y axis of the plane of the first stator (3-1);
3 magnetostrictive mechanisms (3-2-2) for controlling the Z-axis motion of the tray (4) perpendicular to the plane of the first stator (3-1);
the lithium battery module (3-5) is used for supplying power to 4 position sensors (5), the signal transmitting device (3-3), the signal receiving device (3-4), 3 piezoelectric ceramics (3-2-1) and 3 magnetostrictive mechanisms (3-2-2);
a signal transmitting device (3-3) for transmitting the position information detected by the position detecting unit to an external terminal in a wireless transmission manner;
and the signal receiving device (3-4) receives a control instruction output by a drive control system of the photoetching machine in a wireless transmission mode to control the 3 piezoelectric ceramics (3-2-1) and the 3 magnetostrictive mechanisms (3-2-2), so that fine adjustment and positioning control of the tray (4) is realized.
7. The high-dynamic ultra-precise multi-stage workpiece stage for lithography machine according to claim 6, wherein two piezoelectric ceramics (3-2-1) controlling the movement of the tray (4) along the X-axis of the plane of the first stator (3-1) are oppositely arranged, and the remaining one piezoelectric ceramic (3-2-1) is perpendicular to the two piezoelectric ceramics (3-2-1).
8. The high-dynamic ultra-precise multi-mover stage for lithography machine according to claim 6, wherein one end of 3 piezoelectric ceramics (3-2-1) intersect at a point, and the 3 piezoelectric ceramics (3-2-1) are circumferentially uniformly distributed.
9. The high-dynamic ultra-precise multi-mover stage for lithography machine of claim 6, wherein the first stator (3-1) and the mover carriage (2-2) are of a flat plate type structure and have a square radial cross section.
10. The high-dynamic ultra-precise multi-active-cell workpiece stage for lithography machine of claim 9, wherein the number of lithium battery modules (3-5) on each micro-active cell (3) is 4, and 4 lithium battery modules (3-5) are respectively located at 4 corners of the first stator (3-1).
Priority Applications (1)
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CN202111186443.0A CN113917800B (en) | 2021-10-12 | 2021-10-12 | High-dynamic ultra-precise multi-rotor workpiece table for photoetching machine |
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CN202111186443.0A CN113917800B (en) | 2021-10-12 | 2021-10-12 | High-dynamic ultra-precise multi-rotor workpiece table for photoetching machine |
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CN113917800A true CN113917800A (en) | 2022-01-11 |
CN113917800B CN113917800B (en) | 2023-12-08 |
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Citations (4)
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CN101158815A (en) * | 2007-08-31 | 2008-04-09 | 上海微电子装备有限公司 | Air-float magnetic controlled precision movement platform |
CN105425548A (en) * | 2016-01-14 | 2016-03-23 | 哈尔滨工业大学 | Moving coil magnetic-levitation wireless micro-motion-stage vector circular-arc exchange method and device based on herringbone coil arrangement |
CN105607429A (en) * | 2009-06-19 | 2016-05-25 | 株式会社尼康 | Exposure apparatus and device manufacturing method |
CN106919002A (en) * | 2011-12-29 | 2017-07-04 | 株式会社尼康 | Exposure method, Bao Guang Installed put and manufacturing method |
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CN101158815A (en) * | 2007-08-31 | 2008-04-09 | 上海微电子装备有限公司 | Air-float magnetic controlled precision movement platform |
CN105607429A (en) * | 2009-06-19 | 2016-05-25 | 株式会社尼康 | Exposure apparatus and device manufacturing method |
CN106919002A (en) * | 2011-12-29 | 2017-07-04 | 株式会社尼康 | Exposure method, Bao Guang Installed put and manufacturing method |
CN105425548A (en) * | 2016-01-14 | 2016-03-23 | 哈尔滨工业大学 | Moving coil magnetic-levitation wireless micro-motion-stage vector circular-arc exchange method and device based on herringbone coil arrangement |
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