CN1139158A - Arc source with rotary magneitcally-controlled columnar cathode - Google Patents
Arc source with rotary magneitcally-controlled columnar cathode Download PDFInfo
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- CN1139158A CN1139158A CN 94102867 CN94102867A CN1139158A CN 1139158 A CN1139158 A CN 1139158A CN 94102867 CN94102867 CN 94102867 CN 94102867 A CN94102867 A CN 94102867A CN 1139158 A CN1139158 A CN 1139158A
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- arc
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Abstract
The said arc source for multi-arc ion plating and diffusing apparatus includes tubular cathode target and magnet steel strips inside the tube, which are parallel to axis and rotate integrally. It features that during arc discharge, the cathode arc is slim spot, which is parallel to arc source axis and scans along the surface of tubular target, and this results in even erosion and high utilization of target. The said arc source makes the ion plating and diffusing apparatus have high deposit rate, high metal ionizing rate for easy reaction deposit to obtain coating of titanium-helium compound and other compounds.
Description
The present invention is a kind of rotary magnetron cylindrical cathode arc source, is applied to multi-arc ion coating, multi sphere ion implantation field.
At present, in the cathode arc source that in multi-arc ion coating, multi sphere ion implantation field, is adopted, garden shape, rectangle plane source are arranged.(CN1069776A, CN1069777A, CN1074247A, CN2099135U) proposed column (tubulose) cathode arc source in the patent of having declared.Its feature all is to adopt ring-type or zigzag shape magnet, the parallel column arc of the field direction of generation source axis.Shown in accompanying drawing 2a.The arc spot is track in the form of a ring.Target easily produces groove, and target utilization is low, and membrane uniformity is poor.
The present invention has designed new cylindrical cathode arc source in order to improve target utilization, and its structure comprises the sleeve cathode target, is installed in the several strip magnet steel parallel with column arc source axis in the pipe.Doing integral body under driven by motor rotatablely moves.It is characterized in that igniting after awkward silence at a meeting causes arc discharge when arc electrode, cathode arc arc spot is the elongated spot tracks that parallels to the axis, along tubulose target surface scan.The field direction and the column arc source axis normal that produce.This novel column arc source is even along the axis direction thicknesses of layers, the target utilization height, does not go out groove; Coating chamber space availability ratio height, batch is big: than the sedimentation rate height of rotation magnetron sputtering Style Columu Talget, metal ionization level height is easier to reactive deposition, obtains compound coats such as titanium nitride: be suitable for plating big area sheet material and slender piece.
The present invention has following accompanying drawing
Fig. 1 is multi-arc ion coating, the multi sphere ion metallizing device synoptic diagram that rotary magnetron cylindrical cathode arc source has been installed.Among the figure 1, pumped vacuum systems; 2, workpiece bias power supply; 3, coating chamber; 4, workpiece; 5, rotary magnetron cylindrical cathode arc source; 6, inlet system; 7, motor; 8, arc source current; 9, striking pin; 10, electro-magnet.
After chamber to be coated vacuum tightness reaches processing requirement, open motor, magnet rotates, and starts the striking pin field of igniting then and causes arc discharge.Cathode arc arc spot is the elongated spot tracks parallel with column arc source axis along tubulose target surface scan.
Fig. 2 is column (tubulose) the cathode arc source Distribution of Magnetic Field comparison diagram of the present invention and other patents.11 is the tubulose target among the figure, and 12 for installing the auxiliary of magnet steel, and 13 is magnet steel, and 14 is water-cooled tube.
Fig. 2 a is the longitudinal profile structural representation of the cylindrical cathode arc source of other patents propositions.The magnet steel of laying in the tubulose target in the form of a ring or zigzag shape.Field direction distributes along column arc source axis direction as shown by arrows.Fig. 2 b is the horizontal section structural representation of cylindrical cathode arc source of the present invention.The magnet steel of laying in the tubulose target is strip, and field direction distributes with column arc source axis normal as shown by arrows.
Claims (2)
1, a kind of cylindrical cathode arc source that is applied in multi-arc ion coating, the multi sphere ion implantation field.By the sleeve cathode target, be installed in the pipe in the several strip magnet steel parallel with column arc source axis form.Magnet steel integral body rotates.It is characterized in that igniting after awkward silence at a meeting sends a telegraph arc discharge when arc electrode, cathode arc arc spot is the elongated spot tracks that parallels to the axis along tubulose target surface scan.
2, rotary magnetron cylindrical cathode arc source as claimed in claim 1 is characterized in that the field direction that records is not a parallel column arc source axis direction, but with the direction of column arc source axis normal.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN94102867A CN1040234C (en) | 1994-03-26 | 1994-03-26 | Arc source with rotary magneitcally-controlled columnar cathode |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN94102867A CN1040234C (en) | 1994-03-26 | 1994-03-26 | Arc source with rotary magneitcally-controlled columnar cathode |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1139158A true CN1139158A (en) | 1997-01-01 |
CN1040234C CN1040234C (en) | 1998-10-14 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN94102867A Expired - Lifetime CN1040234C (en) | 1994-03-26 | 1994-03-26 | Arc source with rotary magneitcally-controlled columnar cathode |
Country Status (1)
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CN (1) | CN1040234C (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1053712C (en) * | 1997-04-30 | 2000-06-21 | 浙江大学 | Rotary target column type magnetic controlled sputtering device |
CN102321870A (en) * | 2011-09-19 | 2012-01-18 | 王敬达 | Vacuum ion plating method of wear-resisting layer on inner wall of metal cylinder |
CN113564540A (en) * | 2021-07-30 | 2021-10-29 | 江苏徐工工程机械研究院有限公司 | Arc ion coating device and coating method |
CN115074678A (en) * | 2022-06-20 | 2022-09-20 | 肇庆市科润真空设备有限公司 | Multi-arc target mechanism for continuous coating of stainless steel sheet and PVD coating device |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN2075655U (en) * | 1989-09-05 | 1991-04-24 | 核工业西南物理研究院 | Double cavity rotary magnetic control splashing film plating machine |
CN1069776A (en) * | 1991-08-21 | 1993-03-10 | 南开大学 | The method and apparatus of arc vapor-phase deposition with magnetic confinement |
CN2099135U (en) * | 1991-10-26 | 1992-03-18 | 陆国民 | Plasma film coating machine for columnar target |
CN1074247A (en) * | 1992-01-08 | 1993-07-14 | 北京长城钛金技术联合开发公司 | Cathode and long arc Plasma evaporating source with tubular |
-
1994
- 1994-03-26 CN CN94102867A patent/CN1040234C/en not_active Expired - Lifetime
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1053712C (en) * | 1997-04-30 | 2000-06-21 | 浙江大学 | Rotary target column type magnetic controlled sputtering device |
CN102321870A (en) * | 2011-09-19 | 2012-01-18 | 王敬达 | Vacuum ion plating method of wear-resisting layer on inner wall of metal cylinder |
CN102321870B (en) * | 2011-09-19 | 2013-07-31 | 王敬达 | Vacuum ion plating method of wear-resisting layer on inner wall of metal cylinder |
CN113564540A (en) * | 2021-07-30 | 2021-10-29 | 江苏徐工工程机械研究院有限公司 | Arc ion coating device and coating method |
CN113564540B (en) * | 2021-07-30 | 2023-10-03 | 江苏徐工工程机械研究院有限公司 | Arc ion coating device and coating method |
CN115074678A (en) * | 2022-06-20 | 2022-09-20 | 肇庆市科润真空设备有限公司 | Multi-arc target mechanism for continuous coating of stainless steel sheet and PVD coating device |
Also Published As
Publication number | Publication date |
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CN1040234C (en) | 1998-10-14 |
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