CN1074247A - Cathode and long arc Plasma evaporating source with tubular - Google Patents
Cathode and long arc Plasma evaporating source with tubular Download PDFInfo
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- CN1074247A CN1074247A CN 92100027 CN92100027A CN1074247A CN 1074247 A CN1074247 A CN 1074247A CN 92100027 CN92100027 CN 92100027 CN 92100027 A CN92100027 A CN 92100027A CN 1074247 A CN1074247 A CN 1074247A
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- negative electrode
- cathode
- tubular
- shielding
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Abstract
A kind of cathode and long arc Plasma evaporating source with tubular, comprise anode casing, negative electrode, semi-circular shielding and plate sheath type shielding, negative electrode is the long column tubular body arranged inside that can run through the logical end or the obstructed end of anode casing arbitrarily, the upper and lower end of negative electrode all is equipped with terminal stud, be marked with water coolant in the cavity of negative electrode, the outside of negative electrode all is with semi-circular shielding and plate sheath type shielding, steam output is big, a sleeve cathode is equivalent to a plurality of evaporation sources, the structure of existing film coating apparatus is simplified greatly, saved material, reduced cost, using easily, is a kind of novel evaporation source.
Description
The present invention is a kind of cathode and long arc Plasma evaporating source with tubular, is a kind of physical vapor deposition techniques.
In the current prior art, as plasma evaporation source related among the CN8710473o, its Coating Materials negative electrode is a short cylinder, does not run through whole anode casing, steam output is very little, the lining face is very narrow, be coated with large-scale workpiece, must adopt a plurality of evaporation sources, this has structurally caused very big complicacy for film coating apparatus, cost is very high, and the installation and removal technology of coating equipment has also been increased very big complexity, and manufacturing process is very complicated.
In order to overcome above-mentioned shortcoming, the invention provides a kind of cathode and long arc Plasma evaporating source with tubular, its negative electrode is the long column tubular body arranged inside that can run through the logical end or the obstructed end of anode casing arbitrarily, is a kind of novel plasma evaporation source.
The present invention is a kind of cathode and long arc Plasma evaporating source with tubular, comprise anode casing, negative electrode, semi-circular screen fraud and plate sheath type shielding, negative electrode is the long column tubular body arranged inside that can run through the logical end or the obstructed end of anode casing arbitrarily, on the negative electrode, terminal stud all is equipped with in the lower end, be marked with water coolant in the cavity of negative electrode, the plate sheath type shielding that the outside of negative electrode all has been with the semi-circular shielding of directive action and has prevented to puncture, the long column sleeve cathode of this provenance is being coated with the spiral tube replacement that also available open tube is made under the more situation of workpiece, can add magnet steel or solenoid in the pipe, to increase spots moving speed.
Advantage of the present invention is: steam output is big, and a sleeve cathode is equivalent to a plurality of evaporation sources, and the structure of existing film coating apparatus is simplified greatly, has saved material, has reduced cost, brings great convenience to manufacturing process, has improved the reliability of plated film.This negative electrode can be placed on the intravital optional position of anode case according to the needs of plating piece, uses easily.
Concrete structure of the present invention is provided by accompanying drawing 1.
Accompanying drawing 1 is the synoptic diagram of sleeve cathode long arc gas ions evaporation source.
Primary structure is among the figure: anode casing 1, negative electrode 2, semi-circular shielding 3, plate sheath type shielding 4, terminal stud 5, striking triggering device 6, isolator 7, flange 8, resistance 9, electro-magnet 10, voltage relay 11, cooling water intakeoutfall 12.
Below in conjunction with accompanying drawing in addition detailed explanation of the present invention.
During work with negative electrode 2 two ends identical arc power in parallel, or only connect single arc power, it is negative pole, anode casing connects positive source, short-circuit arc trigger 6 in the evaporation source, join by resistance 9 and anode casing 1, under the effect of electromagnet 10, finish the short-circuit arc action behind the plugged, between striking trigger 6 and negative electrode Coating Materials 2, form striking electric arc, and become rapidly main arc between negative electrode Coating Materials 2 and the anode casing 1, under the effect of this arc cathode spot, 2 evaporation and the ionization of negative electrode Coating Materials, the surface that speeds away forms needed plasma flow, in order to realize more preferably arc process, incorporate a voltage relay between negative electrode Coating Materials 2 and short-circuit arc trigger 6, under the voltage of the normal smooth combustion of electric arc, voltage relay 11 discharges, make the line bag outage of electromagnet 10, short-circuit arc trigger 6 is in the state that breaks away from negative electrode 1; Otherwise, occur extinguishing trend and be directed at arc power voltage at arc extinction or electric arc and rise to when being higher than normal voltage, voltage relay 11 adhesives, the line of electromagnet 10 is surrounded by electricity, short-circuit arc trigger 6 is carried out the short-circuit arc action, realize sealing and electric insulation by plate sheath type shielding 4 between each parts in the evaporation source, semi-circular shielding axle is removably, can regulate direction, in order to form directed plasma flow, under special circumstances, can around negative electrode, add the impressed current anode of a helix, to improve the stability of electric arc. Negative electrode itself adopts solenoid shape to bring convenience through setting and the adjusting of central magnetic field.
Example:
1, the workpiece that will process (plated film) earlier cleans after the purpose that reaches decontamination, deoils, dewaters through special pre-treatment program, is installed on (in modes such as suspension, clampings) on the workpiece pivoted frame.
2, with the oven door opening of vacuum chamber, the workpiece that finishes of at this moment will being installed is packed in the vacuum chamber in the lump together with pivoted frame, closes door opened vacuum system and carries out the exhaust operation.
3, treat that system reaches high vacuum after, in vacuum chamber, charge into assist gas, open the bombardment power supply workpiece carried out icon bombardment cleaning, electric current to be cleaned stops bombardment after steadily.
4, again vacuum is evacuated to high vacuum, sends into reactant gases such as N thereafter again
2, O
2Begin minor arc bombardment program Deng lighting evaporation source, so that reach the purpose that workpiece is heated up rapidly, subsequently bombarding current voltage is further reduced, operation plated film master routine, after program is finished, close all evapn ionization source and lay down Hong bias current voltage, treat that workpiece cools off a little after, can put into air, take out workpiece to be plated.
Claims (2)
1, a kind of cathode and long arc Plasma evaporating source with tubular, comprise anode casing 1, negative electrode 2, semi-circular shielding 3 and plate sheath type shielding 4, negative electrode 2 is the long column tubular body arranged inside that can run through the logical end or the obstructed end of anode casing 1 arbitrarily, the upper and lower end of negative electrode 2 all is equipped with terminal stud 5, is marked with water coolant in the cavity 13 of negative electrode 2, and the outside of negative electrode 2 all is with semi-circular shielding 3 and plate sheath type shielding 4.
2, cathode and long arc Plasma evaporating source with tubular as claimed in claim 1, its long column tubular body arranged inside negative electrode 2 can replace with spiral tube, can add magnet steel or solenoid in the pipe.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 92100027 CN1074247A (en) | 1992-01-08 | 1992-01-08 | Cathode and long arc Plasma evaporating source with tubular |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 92100027 CN1074247A (en) | 1992-01-08 | 1992-01-08 | Cathode and long arc Plasma evaporating source with tubular |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1074247A true CN1074247A (en) | 1993-07-14 |
Family
ID=4938308
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 92100027 Pending CN1074247A (en) | 1992-01-08 | 1992-01-08 | Cathode and long arc Plasma evaporating source with tubular |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1074247A (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1040234C (en) * | 1994-03-26 | 1998-10-14 | 王福贞 | Arc source with rotary magneitcally-controlled columnar cathode |
| CN1040235C (en) * | 1994-08-18 | 1998-10-14 | 王福贞 | Cylindrical helical magnetic control cathode arc evaporation source |
| CN100410416C (en) * | 2006-05-31 | 2008-08-13 | 中国科学院物理研究所 | Movable universal eva porating source apparatus for vacuum system |
| CN102102178A (en) * | 2009-12-22 | 2011-06-22 | 王殿儒 | Tubular cathode controlled arc plasma evaporation and ionization source |
| CN102355790A (en) * | 2011-09-28 | 2012-02-15 | 南京创能电力科技开发有限公司 | Plasma high-frequency arc generator |
| CN102839353A (en) * | 2011-06-23 | 2012-12-26 | 中国科学院金属研究所 | Electrical arc ion plating cooling apparatus for preparing amorphous film, and applications thereof |
| CN104313539A (en) * | 2014-09-12 | 2015-01-28 | 湖州鑫隆镀膜科技有限公司 | Arc ion plating production method |
-
1992
- 1992-01-08 CN CN 92100027 patent/CN1074247A/en active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1040234C (en) * | 1994-03-26 | 1998-10-14 | 王福贞 | Arc source with rotary magneitcally-controlled columnar cathode |
| CN1040235C (en) * | 1994-08-18 | 1998-10-14 | 王福贞 | Cylindrical helical magnetic control cathode arc evaporation source |
| CN100410416C (en) * | 2006-05-31 | 2008-08-13 | 中国科学院物理研究所 | Movable universal eva porating source apparatus for vacuum system |
| CN102102178A (en) * | 2009-12-22 | 2011-06-22 | 王殿儒 | Tubular cathode controlled arc plasma evaporation and ionization source |
| CN102839353A (en) * | 2011-06-23 | 2012-12-26 | 中国科学院金属研究所 | Electrical arc ion plating cooling apparatus for preparing amorphous film, and applications thereof |
| CN102355790A (en) * | 2011-09-28 | 2012-02-15 | 南京创能电力科技开发有限公司 | Plasma high-frequency arc generator |
| CN104313539A (en) * | 2014-09-12 | 2015-01-28 | 湖州鑫隆镀膜科技有限公司 | Arc ion plating production method |
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Legal Events
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| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C01 | Deemed withdrawal of patent application (patent law 1993) | ||
| WD01 | Invention patent application deemed withdrawn after publication |