CN1135190A - 用于在等离子电弧中制备粉末的方法及实施该方法的设备 - Google Patents

用于在等离子电弧中制备粉末的方法及实施该方法的设备 Download PDF

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Publication number
CN1135190A
CN1135190A CN95190857A CN95190857A CN1135190A CN 1135190 A CN1135190 A CN 1135190A CN 95190857 A CN95190857 A CN 95190857A CN 95190857 A CN95190857 A CN 95190857A CN 1135190 A CN1135190 A CN 1135190A
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China
Prior art keywords
plasma
arc
reactive component
plasma chamber
chamber
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Pending
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CN95190857A
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English (en)
Chinese (zh)
Inventor
B·塞罗尔
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WC Heraus GmbH and Co KG
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WC Heraus GmbH and Co KG
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Publication date
Application filed by WC Heraus GmbH and Co KG filed Critical WC Heraus GmbH and Co KG
Publication of CN1135190A publication Critical patent/CN1135190A/zh
Pending legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G15/00—Compounds of gallium, indium or thallium
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G19/00—Compounds of tin
    • C01G19/02—Oxides

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Plasma Technology (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
CN95190857A 1994-09-07 1995-09-07 用于在等离子电弧中制备粉末的方法及实施该方法的设备 Pending CN1135190A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR9410874A FR2724123A1 (fr) 1994-09-07 1994-09-07 Dispositif permettant la stabilisation d'une reaction chimique continue entre plusieurs corps dans un plasma
FR9410874 1994-09-07

Publications (1)

Publication Number Publication Date
CN1135190A true CN1135190A (zh) 1996-11-06

Family

ID=9466868

Family Applications (1)

Application Number Title Priority Date Filing Date
CN95190857A Pending CN1135190A (zh) 1994-09-07 1995-09-07 用于在等离子电弧中制备粉末的方法及实施该方法的设备

Country Status (8)

Country Link
US (1) US5723027A (https=)
EP (1) EP0726806B1 (https=)
JP (1) JP3462215B2 (https=)
KR (1) KR100300885B1 (https=)
CN (1) CN1135190A (https=)
DE (1) DE59506276D1 (https=)
FR (1) FR2724123A1 (https=)
WO (1) WO1996007475A1 (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100418674C (zh) * 2000-02-10 2008-09-17 特乔尼科斯有限公司 用于制造细粉末的等离子体电弧反应器
CN115072766A (zh) * 2022-08-08 2022-09-20 湖南工业大学 一种高温溅射法制备高纯氧化铟的设备

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WO2000005017A1 (en) * 1998-07-21 2000-02-03 Commonwealth Scientific And Industrial Research Organisation Method and apparatus for producing material vapour
TW561085B (en) * 2001-10-29 2003-11-11 Phild Co Ltd Method and device for producing metal powder
FR2839506B1 (fr) * 2002-05-10 2005-06-10 Michelle Paparone Serole Oxyde mixte d'indium etain dit ito a grande conductivite electrique a nanostructure
US6955745B1 (en) * 2002-08-01 2005-10-18 University Of Florida Research Foundation, Inc. Method of spark-processing silicon and resulting materials
US20050233380A1 (en) * 2004-04-19 2005-10-20 Sdc Materials, Llc. High throughput discovery of materials through vapor phase synthesis
US9173967B1 (en) 2007-05-11 2015-11-03 SDCmaterials, Inc. System for and method of processing soft tissue and skin with fluids using temperature and pressure changes
US7582265B2 (en) * 2007-06-28 2009-09-01 Plasma Waste Recycling, Inc. Gas conduit for plasma gasification reactors
US8507401B1 (en) 2007-10-15 2013-08-13 SDCmaterials, Inc. Method and system for forming plug and play metal catalysts
EP2396457A2 (en) * 2009-02-08 2011-12-21 AP Solutions, Inc. Plasma source with integral blade and method for removing materials from substrates
DE112010001371A5 (de) 2009-03-27 2012-08-30 Heraeus Materials Technology Gmbh & Co. Kg Herstellung von Fasern aus Platin oder Palladium oder Legierungen auf Platin- oder Palladiumbasis und von Vliesen oder Netzen daraus
US9149797B2 (en) * 2009-12-15 2015-10-06 SDCmaterials, Inc. Catalyst production method and system
US9039916B1 (en) 2009-12-15 2015-05-26 SDCmaterials, Inc. In situ oxide removal, dispersal and drying for copper copper-oxide
US8652992B2 (en) 2009-12-15 2014-02-18 SDCmaterials, Inc. Pinning and affixing nano-active material
US20110143930A1 (en) * 2009-12-15 2011-06-16 SDCmaterials, Inc. Tunable size of nano-active material on nano-support
US9126191B2 (en) 2009-12-15 2015-09-08 SDCmaterials, Inc. Advanced catalysts for automotive applications
US8669202B2 (en) 2011-02-23 2014-03-11 SDCmaterials, Inc. Wet chemical and plasma methods of forming stable PtPd catalysts
BR112014003781A2 (pt) 2011-08-19 2017-03-21 Sdcmaterials Inc substratos revestidos para uso em catalisadores e conversores catalíticos e métodos para revestir substratos com composições de revestimento por imersão
KR101307155B1 (ko) * 2011-11-17 2013-09-10 주식회사 포스코 몰드플럭스 주입장치
US9511352B2 (en) 2012-11-21 2016-12-06 SDCmaterials, Inc. Three-way catalytic converter using nanoparticles
US9156025B2 (en) 2012-11-21 2015-10-13 SDCmaterials, Inc. Three-way catalytic converter using nanoparticles
US9586179B2 (en) 2013-07-25 2017-03-07 SDCmaterials, Inc. Washcoats and coated substrates for catalytic converters and methods of making and using same
CN106061600A (zh) 2013-10-22 2016-10-26 Sdc材料公司 用于重型柴油机的催化剂设计
MX2016004759A (es) 2013-10-22 2016-07-26 Sdcmaterials Inc Composiciones para trampas de oxidos de nitrogeno (nox) pobres.
US9687811B2 (en) 2014-03-21 2017-06-27 SDCmaterials, Inc. Compositions for passive NOx adsorption (PNA) systems and methods of making and using same
JP2021045730A (ja) * 2019-09-20 2021-03-25 三菱ケミカルエンジニアリング株式会社 反応生成物製造装置及び反応生成物製造方法
CN113479929B (zh) * 2021-08-11 2022-06-21 芜湖映日科技股份有限公司 一种高纯纳米氧化铟的制备方法
CN116177593B (zh) * 2022-09-08 2024-03-29 昆明理工大学 一种微米级二氧化锡粉末的制备系统与制备方法

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FR378483A (fr) * 1906-06-18 1907-10-05 Sebastian Ziani De Ferranti Perfectionnements aux fours électriques
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CH281749A (de) * 1941-06-26 1952-03-31 Electronic Reduction Corp Verfahren zur Herstellung von Metallhalogeniden aus hitzebeständigen Mineralien dieser Metalle.
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US3101308A (en) * 1960-10-11 1963-08-20 Sheer Korman Associates Process for reduction of ores to metals, alloys, interstitial and intermetallic compounds
FR1560417A (https=) * 1968-01-08 1969-03-21
US3708409A (en) * 1969-05-22 1973-01-02 Ionarc Smelters Ltd Chemical process in high enthalpy thermal environment and apparatus therefor
JPS62111373A (ja) * 1985-11-11 1987-05-22 Ricoh Co Ltd バ−コ−ドシンボルマ−キング材料
FR2603209A1 (fr) * 1986-08-28 1988-03-04 Serole Bernard Tuyere de reaction chimique continue.
US4801435A (en) * 1986-09-08 1989-01-31 Plasma Holdings N.V. Hybrid plasma reactor
US5196102A (en) * 1991-08-08 1993-03-23 Microelectronics And Computer Technology Corporation Method and apparatus for applying a compound of a metal and a gas onto a surface
US5562809A (en) * 1993-01-22 1996-10-08 Plasma Plus Method for making hydrogen saturated metal compounds

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100418674C (zh) * 2000-02-10 2008-09-17 特乔尼科斯有限公司 用于制造细粉末的等离子体电弧反应器
CN115072766A (zh) * 2022-08-08 2022-09-20 湖南工业大学 一种高温溅射法制备高纯氧化铟的设备

Also Published As

Publication number Publication date
US5723027A (en) 1998-03-03
WO1996007475A1 (de) 1996-03-14
KR100300885B1 (ko) 2002-04-24
EP0726806B1 (de) 1999-06-23
EP0726806A1 (de) 1996-08-21
FR2724123B1 (https=) 1997-02-21
JPH09505268A (ja) 1997-05-27
JP3462215B2 (ja) 2003-11-05
DE59506276D1 (de) 1999-07-29
FR2724123A1 (fr) 1996-03-08
KR960705623A (ko) 1996-11-08

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