CN113416932A - Evaporation source device - Google Patents
Evaporation source device Download PDFInfo
- Publication number
- CN113416932A CN113416932A CN202110645989.1A CN202110645989A CN113416932A CN 113416932 A CN113416932 A CN 113416932A CN 202110645989 A CN202110645989 A CN 202110645989A CN 113416932 A CN113416932 A CN 113416932A
- Authority
- CN
- China
- Prior art keywords
- container
- evaporation source
- channel
- source apparatus
- top cover
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001704 evaporation Methods 0.000 title claims abstract description 29
- 230000008020 evaporation Effects 0.000 title claims abstract description 29
- 238000010438 heat treatment Methods 0.000 claims abstract description 20
- 238000007789 sealing Methods 0.000 claims abstract description 8
- 230000002093 peripheral effect Effects 0.000 claims description 8
- 239000011148 porous material Substances 0.000 claims description 4
- 239000010410 layer Substances 0.000 description 10
- 239000000463 material Substances 0.000 description 9
- 238000005516 engineering process Methods 0.000 description 7
- 239000000758 substrate Substances 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 239000000498 cooling water Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000009825 accumulation Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 2
- 150000003384 small molecules Chemical class 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- 230000004075 alteration Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000009529 body temperature measurement Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000004134 energy conservation Methods 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
Abstract
The invention discloses an evaporation source device, which comprises a heatable container and a heating source for heating the container, wherein the container is provided with an opening, the opening of the container is provided with a top cover for sealing the opening, the middle part of the top cover is provided with a channel communicated with the interior of the container, the channel forms a nozzle, and the top cover is internally provided with a plurality of layers of reflecting plates which are arranged along the axial direction of the top cover and surround the periphery of the channel. The upper part of the channel is in an open shape with a big top and a small bottom. The reflecting plate is provided with a through hole surrounding the channel, and the caliber of the through hole of the reflecting plate is sequentially reduced from top to bottom. The nozzle of the device is not easy to block and is safe to use.
Description
Technical Field
The invention relates to the field of coating equipment, in particular to an evaporation source device.
Background
Compared with the current mainstream liquid crystal display technology, the OLED display technology has the outstanding advantages of high contrast, wide color gamut, flexibility, lightness, thinness, energy conservation and the like. In recent years, the OLED display technology is gradually popularized in the fields of mobile devices such as smart phones and tablet computers, flexible wearable devices such as smart watches, large-size curved televisions, white light illumination and the like, and the development momentum is strong.
The currently commercialized OLED display devices mainly include RGB three-color OLED display devices and white OLED display devices in combination with CF display devices. The OLED technology mainly includes a small molecule OLED technology based on a vacuum evaporation technology and a high molecule OLED technology based on a solution process. The evaporation machine is a main device for producing the small molecule OLED devices which are produced in mass production at present, and the core part of the device is an evaporation source device which is divided into a point evaporation source, a line evaporation source, a surface evaporation source and the like. The common evaporation source is generally heated by introducing direct current through metal heating wires such as tantalum and the like. According to different application requirements, the point evaporation source crucible can be designed into an open type, a top cover, a middle plate type and the like.
The existing evaporation source device generates heat by electrifying a heating source (made of materials such as tantalum) so as to heat a crucible (Al)2O3PBN, etc.) and the material placed in the crucible are heated and vaporized, and deposited as a thin film after reaching the substrate. The thermocouple is arranged beside the heating source or at the bottom of the evaporation source to monitor the temperature of the crucible in real time, the reflecting plate is arranged outside the heating source to keep the temperature, and the cooling water interlayer can be arranged in the outer wall outside the reflecting plate to cool the evaporation source. The crucible can be internally provided with a middle plate, and the opening at the top of the crucible can be provided with a top cover and a nozzle, thereby controlling the airflow and the internal pressure in the crucible. The prior art has the following defects:
1. the nozzle is easy to gather and block holes due to local temperature reduction;
2. when the material to be evaporated is splashed out of the crucible, the material is blocked and foreign matters on the substrate are not good.
Disclosure of Invention
In view of the above, it is desirable to provide an evaporation source apparatus having a nozzle that is not easily clogged and is safe to use.
In order to solve the technical problems, the technical scheme of the invention is as follows: an evaporation source device comprises a heatable container and a heating source for heating the container, wherein the container is provided with an opening, the opening of the container is provided with a top cover for sealing the opening, the middle part of the top cover is provided with a channel communicated with the inside of the container, the channel forms a nozzle, and the top cover is internally provided with a plurality of layers of reflecting plates which are axially arranged along the top cover and surround the periphery of the channel.
Further, the upper part of the channel is in an open shape with a big top and a small bottom.
Furthermore, the reflecting plate is provided with a through hole surrounding the channel, and the caliber of the through hole of the reflecting plate is sequentially reduced from top to bottom.
Further, the lower part of the channel is in an open shape with a small upper part and a big lower part.
Further, the container is internally provided with a plurality of layers of middle plates for sealing the openings of the container, and the middle plates are provided with pores for gas to pass through.
Further, the pores between adjacent middle plates are arranged in a staggered manner, so that the path of the gas passing through the adjacent middle plates is a curve.
Furthermore, the holes in the same middle plate are distributed on the edges of a plurality of concentric circles, and the holes in adjacent concentric circles are arranged in a staggered manner.
Further, the diameters of circles on the adjacent middle plates are different, and the holes on the adjacent circles between the adjacent middle plates are arranged in a staggered mode.
Furthermore, the device also comprises a thermocouple for measuring the temperature of the container.
Furthermore, the peripheral side wall of the thermocouple is covered with an insulating layer, and the insulating layer on the peripheral side of the end part of the thermocouple facing the container is provided with a groove surrounding the end part of the thermocouple.
Compared with the prior art, the invention has the following beneficial effects:
1. avoiding the material accumulation and blockage caused by the uneven local temperature of the nozzle.
2. Prevent the material in the container from splashing due to local overheating to cause the crucible to block the hole and prevent the foreign matters on the substrate from being bad.
3. The head of the thermocouple is prevented from touching the heating source to cause wire breakage and thermocouple pollution.
In order to make the aforementioned and other objects, features and advantages of the invention comprehensible, preferred embodiments accompanied with figures are described in detail below.
Drawings
Fig. 1 is a schematic structural diagram of a first embodiment of the present invention.
Fig. 2 is a schematic structural diagram of a middle plate according to a first embodiment of the present invention.
Fig. 3 is a schematic structural diagram of a thermocouple according to an embodiment of the present invention.
Fig. 4 is a schematic structural diagram of a second embodiment of the present invention.
In the figure: 1-vessel, 2-heat source, 21-heat source reflector, 3-cooling water sandwich, 4-thermocouple, 41-insulation layer, 42-groove, 5-middle plate, 51-pore, 6-top cover, 7-reflector in top cover, 8-nozzle, 9-top cover of example two, 91-nozzle of example two.
Detailed Description
To further illustrate the technical means and effects of the present invention adopted to achieve the predetermined objects, the following detailed description of the embodiments, structures, features and effects according to the present invention will be made with reference to the accompanying drawings and preferred embodiments.
Example one
As shown in fig. 1-3, an evaporation source apparatus includes a container 1 capable of being heated and a heating source 2 for heating the container, in this embodiment, the container 1 is a crucible, the heating source 2 is a heating device formed by a metal heating coil, a reflector 21 is fixedly connected to a peripheral side wall of the heating source 2 for heat preservation, and a cooling water interlayer 3 is disposed on a peripheral side wall of the heating source 2 for cooling the evaporation source.
The opening at the top of the container 1 has a top cover 6 for sealing the opening, and the top cover 6 may be arranged to cover the peripheral side wall of the opening at the top of the crucible to improve the sealing property. The top cover 6 has a passage in the middle to the interior of the vessel, which constitutes a nozzle 8. Nozzle 8 and top cap 6 integrated design, both highly flush, the clearance that exists between the two when can eliminating original nozzle and top cap and separately use takes precautions against stifled hole.
The top cover 6 is internally provided with a plurality of layers of reflecting plates 7 which are arranged along the axial direction of the top cover and surround the periphery of the channel.
In this embodiment, the upper portion of the passage is open with a large upper portion and a small lower portion, and the lower portion of the passage is open with a small upper portion and a large lower portion. Meanwhile, the reflecting plate 7 is provided with a through hole surrounding the channel, and the caliber of the through hole of the reflecting plate 7 is sequentially reduced from top to bottom. Ensure that the open top of the channel scatters more heat and prevent the hole from being blocked.
The container 1 has several layers of middle plates 5 sealing its opening, the middle plates 5 having apertures 51 for gas to pass through. The holes on the same middle plate are distributed on the edges of a plurality of concentric circles, and the holes on adjacent concentric circles are arranged in a staggered manner. The diameters of circles on the adjacent middle plates are different, and the holes on the adjacent circles between the adjacent middle plates are arranged in a staggered mode. The holes are arranged in concentric circles, so that the airflow in the container can flow more uniformly, and turbulence are avoided. And meanwhile, the holes of the adjacent middle plates are staggered, so that the path of gas passing through the adjacent middle plates is a curve, the gas flow speed is effectively reduced, the flow stabilizing effect is achieved, and the phenomenon that the materials in the container are splashed to cause the bad foreign matters on the substrate is prevented.
In this embodiment, a thermocouple 4 for measuring the temperature of the container is further included. In order to prevent thermocouple 4 from touching heating source 2 and causing wire breakage of metal heating coil and contamination of thermocouple 4, the peripheral side wall of thermocouple 4 is covered with insulating layer 41, and the insulating layer of thermocouple 4 facing the peripheral side of the end of the container is provided with a groove 42 surrounding the end of the thermocouple; the groove 42 can expose the end part of the thermocouple 4 to facilitate temperature measurement, and the groove-shaped insulating layer can effectively protect the thermocouple when the thermocouple is touched due to careless operation.
By integrally designing the nozzle 8 and the top cover 6 and arranging the reflecting plate 7 in the top cover 6, material accumulation and blockage caused by uneven local temperature of the nozzle 8 can be avoided; through the design of the multilayer middle plates and the arrangement of the holes of the concentric circle structure, the phenomenon that the materials in the container are locally overheated and splashed out of the crucible to cause hole blockage and bad foreign matters on the substrate is avoided.
Example two
As shown in fig. 4, an evaporation source apparatus has a structure substantially the same as that of the first embodiment except that a nozzle structure is different, and similarly, a top cover 9 has a channel constituting a nozzle 91, and the channel constituting the nozzle structure is open in a large-top and small-bottom manner.
Although the present invention has been described with reference to the preferred embodiments, it should be understood that various changes, substitutions and alterations can be made herein without departing from the spirit and scope of the invention as defined by the appended claims.
Claims (10)
1. An evaporation source apparatus comprising a heatable container and a heating source for heating the container, characterized in that: the container is provided with an opening, the opening of the container is provided with a top cover for sealing the opening, the middle part of the top cover is provided with a channel communicated with the inside of the container, the channel forms a nozzle, and the top cover is internally provided with a plurality of layers of reflecting plates which are arranged along the axial direction of the top cover and surround the periphery of the channel.
2. The evaporation source apparatus according to claim 1, wherein: the upper part of the channel is in an open shape with a big top and a small bottom.
3. The evaporation source apparatus according to claim 2, wherein: the reflecting plate is provided with a through hole surrounding the channel, and the caliber of the through hole of the reflecting plate is sequentially reduced from top to bottom.
4. The evaporation source apparatus according to claim 2, wherein: the lower part of the channel is in an open shape with a small upper part and a big lower part.
5. The evaporation source apparatus according to claim 1, wherein: the container is provided with a plurality of middle plates for sealing the openings of the container, and the middle plates are provided with pores for gas to pass through.
6. The evaporation source apparatus according to claim 5, wherein: the apertures between adjacent middle plates are staggered so that the path of the gas as it passes through adjacent middle plates is curved.
7. The evaporation source apparatus according to claim 5, wherein: the holes on the same middle plate are distributed on the edges of a plurality of concentric circles, and the holes on adjacent concentric circles are arranged in a staggered manner.
8. The evaporation source apparatus according to claim 7, wherein: the diameters of circles on the adjacent middle plates are different, and the holes on the adjacent circles between the adjacent middle plates are arranged in a staggered mode.
9. The evaporation source apparatus according to any one of claims 1 to 8, wherein: the device also comprises a thermocouple for measuring the temperature of the container.
10. The evaporation source apparatus according to claim 9, wherein: the thermocouple is characterized in that an insulating layer covers the peripheral side wall of the thermocouple, and a groove surrounding the end of the thermocouple is formed in the insulating layer on the periphery of the end of the thermocouple facing the container.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110645989.1A CN113416932A (en) | 2021-06-10 | 2021-06-10 | Evaporation source device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110645989.1A CN113416932A (en) | 2021-06-10 | 2021-06-10 | Evaporation source device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN113416932A true CN113416932A (en) | 2021-09-21 |
Family
ID=77788305
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202110645989.1A Pending CN113416932A (en) | 2021-06-10 | 2021-06-10 | Evaporation source device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN113416932A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114182208A (en) * | 2021-12-10 | 2022-03-15 | 深圳市华星光电半导体显示技术有限公司 | Evaporation source and evaporation equipment |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014109050A (en) * | 2012-11-30 | 2014-06-12 | Panasonic Corp | Evaporation source for vapor deposition apparatus |
| CN104762601A (en) * | 2015-04-30 | 2015-07-08 | 京东方科技集团股份有限公司 | Evaporator source, evaporation device and evaporation method |
| CN109666897A (en) * | 2017-10-17 | 2019-04-23 | 合肥欣奕华智能机器有限公司 | A kind of crucible and point-type evaporation source |
| CN112680698A (en) * | 2021-03-15 | 2021-04-20 | 苏州盟萤电子科技有限公司 | Heating crucible for vacuum evaporation and vacuum evaporation device |
-
2021
- 2021-06-10 CN CN202110645989.1A patent/CN113416932A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014109050A (en) * | 2012-11-30 | 2014-06-12 | Panasonic Corp | Evaporation source for vapor deposition apparatus |
| CN104762601A (en) * | 2015-04-30 | 2015-07-08 | 京东方科技集团股份有限公司 | Evaporator source, evaporation device and evaporation method |
| CN109666897A (en) * | 2017-10-17 | 2019-04-23 | 合肥欣奕华智能机器有限公司 | A kind of crucible and point-type evaporation source |
| CN112680698A (en) * | 2021-03-15 | 2021-04-20 | 苏州盟萤电子科技有限公司 | Heating crucible for vacuum evaporation and vacuum evaporation device |
Non-Patent Citations (1)
| Title |
|---|
| (加)R.E.贝德福德 等合著, 哈尔滨：哈尔滨工程大学出版社 * |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114182208A (en) * | 2021-12-10 | 2022-03-15 | 深圳市华星光电半导体显示技术有限公司 | Evaporation source and evaporation equipment |
| CN114182208B (en) * | 2021-12-10 | 2024-01-23 | 深圳市华星光电半导体显示技术有限公司 | Evaporation source and evaporation equipment |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2015530477A (en) | Substrate heating apparatus and process chamber | |
| CN113416932A (en) | Evaporation source device | |
| US10697064B2 (en) | Chemical vapor deposition apparatus | |
| WO2017128471A1 (en) | Heating device for vacuum deposition | |
| US20190218656A1 (en) | Evaporation source device and evaporator | |
| US8551307B2 (en) | Sputtering target apparatus | |
| US20210207259A1 (en) | Evaporation source device and evaporation coating equipment | |
| WO2021248550A1 (en) | Display panel and manufacturing method therefor | |
| US20220051914A1 (en) | Wafer Susceptor | |
| KR102002316B1 (en) | evaporation source and thin flim deposition apparatus having the same | |
| KR101302788B1 (en) | Processing apparatus | |
| KR20100053365A (en) | Evapration apparatus which can evaporate downward direction | |
| CN101372736A (en) | Crucible heating apparatus and deposition apparatus including the same | |
| KR102149657B1 (en) | A Apparatus for Depositing Large Area Thin Film | |
| US20150044424A1 (en) | Bottom electrode and manufacturing method thereof | |
| CN105039913B (en) | Deposition material remove device and evaporation coating device | |
| KR20110033587A (en) | Deposition source and method of manufacturing organic light emitting device | |
| KR101554466B1 (en) | Linear Depositing System for Substrate Cooling | |
| KR102080764B1 (en) | Linear source, and substrate processing apparatus | |
| JP2013185252A (en) | Evaporation source apparatus, vacuum deposition apparatus, and method for producing organic el display device | |
| CN111455322A (en) | Crucible device and vapor deposition device | |
| WO2015100780A1 (en) | Vacuum vapour deposition device and vapour deposition method | |
| KR20140136650A (en) | Method for depositing a thin film | |
| KR20060117610A (en) | Apparatus for depositing thin film | |
| KR101456250B1 (en) | Depositing source apparatus with cooling shield |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20210921 |