CN113375058B - Tail gas emission structure and reducing furnace - Google Patents
Tail gas emission structure and reducing furnace Download PDFInfo
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- CN113375058B CN113375058B CN202110661123.XA CN202110661123A CN113375058B CN 113375058 B CN113375058 B CN 113375058B CN 202110661123 A CN202110661123 A CN 202110661123A CN 113375058 B CN113375058 B CN 113375058B
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- pipe
- tail gas
- converging
- exhaust
- pipes
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- 239000002893 slag Substances 0.000 claims description 70
- 238000007599 discharging Methods 0.000 claims description 33
- 230000001105 regulatory effect Effects 0.000 claims description 11
- 238000004891 communication Methods 0.000 claims description 6
- 229910021420 polycrystalline silicon Inorganic materials 0.000 abstract description 11
- 238000004519 manufacturing process Methods 0.000 abstract description 10
- 229920005591 polysilicon Polymers 0.000 abstract description 9
- 239000007789 gas Substances 0.000 description 187
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 27
- 229910052710 silicon Inorganic materials 0.000 description 27
- 239000010703 silicon Substances 0.000 description 27
- 239000000498 cooling water Substances 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000005046 Chlorosilane Substances 0.000 description 2
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000005265 energy consumption Methods 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 230000002035 prolonged effect Effects 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17D—PIPE-LINE SYSTEMS; PIPE-LINES
- F17D1/00—Pipe-line systems
- F17D1/02—Pipe-line systems for gases or vapours
- F17D1/04—Pipe-line systems for gases or vapours for distribution of gas
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/021—Preparation
- C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
- C01B33/035—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition or reduction of gaseous or vaporised silicon compounds in the presence of heated filaments of silicon, carbon or a refractory metal, e.g. tantalum or tungsten, or in the presence of heated silicon rods on which the formed silicon is deposited, a silicon rod being obtained, e.g. Siemens process
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17D—PIPE-LINE SYSTEMS; PIPE-LINES
- F17D3/00—Arrangements for supervising or controlling working operations
- F17D3/01—Arrangements for supervising or controlling working operations for controlling, signalling, or supervising the conveyance of a product
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17D—PIPE-LINE SYSTEMS; PIPE-LINES
- F17D5/00—Protection or supervision of installations
- F17D5/005—Protection or supervision of installations of gas pipelines, e.g. alarm
Abstract
The application discloses a tail gas emission structure and a reduction furnace, wherein the tail gas emission structure comprises: a plurality of tail gas branch pipes; the first ends of the tail gas branch pipes are communicated with the converging pipe, and the first ends of the tail gas branch pipes are arranged at intervals along the circumferential direction of the converging pipe; the first end of the collecting pipe is communicated with the converging pipe; the second end of the collecting pipe is communicated with one end of the tail gas main pipe. The exhaust emission structure can be applied in the reducing furnace, the second end of tail gas branch pipe can communicate with the exhaust hole of the bottom of the reducing furnace, tail gas in the reducing furnace enters the tail gas branch pipe through the exhaust hole, gas in the tail gas branch pipe can be balanced in the converging pipe after entering the converging pipe, so that the pressure flow of the gas in the converging pipe is more uniform and stable, the uniform and stable gas in the converging pipe stably flows into the converging pipe, and is discharged from the tail gas main pipe after passing through the converging pipe, so that the discharge of tail gas is more uniform and stable, the pressure, flow field and temperature field in the reducing furnace are stable, and the production quality of polysilicon is improved.
Description
Technical Field
The application belongs to the technical field of polysilicon, and particularly relates to a tail gas emission structure and a reducing furnace.
Background
Polysilicon is a main raw material for manufacturing integrated circuits and solar cells. In the production process of polysilicon, raw materials such as chlorosilane, hydrogen and the like are sent into a reducing furnace to generate chemical vapor deposition reaction on a silicon rod to generate polysilicon, in order to ensure higher production efficiency in the reducing furnace in the production process, the deposition speed of the raw materials on the surface of the silicon rod is to be improved, raw material gas is continuously sprayed through a nozzle, and meanwhile, the chlorosilane with low concentration after reaction and byproducts in the reaction process are continuously discharged through a tail gas port. When the tail gas flows through the tail gas pipe, the pressure and flow of the gas in the tail gas pipe are uneven and stable, so that the pressure, flow field and temperature field in the reduction furnace are unstable, and the production quality of the polycrystalline silicon is affected.
Disclosure of Invention
The embodiment of the application aims to provide a tail gas discharge structure and a reducing furnace, which are used for solving the problems that the pressure, flow field and temperature field in the reducing furnace are unstable and the production quality of polysilicon is affected due to the fact that the pressure and flow of gas in a tail gas pipe of the reducing furnace are not uniform and stable.
In a first aspect, an embodiment of the present application provides an exhaust emission structure, including:
a plurality of tail gas branch pipes;
a converging pipe, wherein the first end of each tail gas branch pipe is communicated with the converging pipe, and the first ends of a plurality of tail gas branch pipes are arranged at intervals along the circumferential direction of the converging pipe;
a plurality of headers, a first end of the headers being in communication with the junction;
and the second end of the collecting pipe is communicated with one end of the tail gas main pipe.
The converging pipes are arc-shaped or circular-ring-shaped, the tail gas branch pipes are straight pipes, and the axes of the tail gas branch pipes are parallel to the axes of the converging pipes.
The first ends of the tail gas branch pipes are uniformly arranged at intervals along the circumferential direction of the converging pipe.
Wherein a plurality of first ends of the header pipes are disposed at intervals along the circumferential direction of the header pipe.
The collecting pipe is a straight pipe, and the axis of the collecting pipe is parallel to the axis of the converging pipe.
The pipe that merges is the arc, it has a plurality ofly to merge the pipe, a plurality of the central line that merges the pipe is located same circle, every it is equipped with a plurality of to merge the pipe tail gas branch pipe on the pipe, the both ends that merge the pipe are equipped with the apron, the apron can seal or open the mouth of pipe at the both ends that merge the pipe.
Wherein, still include:
and the collecting header is communicated with the tail gas main pipe through the collecting header, the second end of the collecting header is communicated with the collecting main pipe, and the collecting main pipe is communicated with one end of the tail gas main pipe.
The collecting main pipe is arc-shaped, two ends of the collecting main pipe are respectively communicated with the second ends of the corresponding collecting pipes, and the middle part of the collecting main pipe is communicated with the tail gas main pipe.
The collecting pipe is a straight pipe, a slag discharging pipe is arranged on the collecting main pipe and adjacent to the collecting pipe, the axis of the slag discharging pipe is collinear with the axis of the corresponding collecting pipe, the first end of the slag discharging pipe is communicated with the collecting main pipe, a baffle is arranged at the second end of the slag discharging pipe, and the baffle can open or close a pipe orifice at the second end of the slag discharging pipe; and/or
The collecting main pipe is arc-shaped, cover plates are arranged at two ends of the collecting main pipe, and the cover plates can seal or open pipe orifices at two ends of the collecting main pipe.
Wherein the axis of at least one of the plurality of exhaust branch pipes is collinear with the axis of the header pipe.
The tail gas branch pipes are straight pipes, the number of the tail gas branch pipes is six, the number of the tail gas branch pipes is two, the axis of each of the two tail gas branch pipes is collinear with the axis of the corresponding tail gas branch pipe, the axes of the two tail gas branch pipes and the axis of the converging pipe are both in a first plane, and two tail gas branch pipes are respectively distributed on two sides of the first plane.
The position on the converging pipe, which is adjacent to the first end of the tail gas branch pipe, is provided with a slag discharging pipe, the tail gas branch pipe and the slag discharging pipe are straight pipes, the axis of the slag discharging pipe is collinear with the axis of the corresponding tail gas branch pipe, the first end of the slag discharging pipe is communicated with the converging pipe, the second end of the slag discharging pipe is provided with a baffle, and the baffle can open or close a pipe orifice of the second end of the slag discharging pipe.
And at least one of the tail gas branch pipe, the converging pipe and the tail gas main pipe is provided with a temperature sensor.
Wherein, still include:
and the tail gas branch pipe, the converging pipe and at least one of the tail gas main pipe are provided with the temperature regulating device.
In a second aspect, an embodiment of the present application provides a reduction furnace including:
the exhaust emission structure described in the above embodiment;
the bottom of furnace body is equipped with a plurality of exhaust holes, the exhaust hole respectively with the second end intercommunication of corresponding tail gas branch pipe.
The exhaust holes are uniformly arranged at intervals along the circumference of the bottom of the furnace body, and the tail gas branch pipes are perpendicular to the bottom of the furnace body.
The tail gas branch pipe, the converging pipe and the tail gas main pipe are provided with temperature sensors, and the bottom of the furnace body, the tail gas branch pipe, the converging pipe and the tail gas main pipe are provided with temperature regulating devices;
the reduction furnace further comprises a control system, and the control system controls the temperature adjusting device according to the temperature detected by the temperature sensor.
The exhaust emission structure of the embodiment of the application comprises: a plurality of tail gas branch pipes; a converging pipe, wherein the first end of each tail gas branch pipe is communicated with the converging pipe, and the first ends of a plurality of tail gas branch pipes are arranged at intervals along the circumferential direction of the converging pipe; a plurality of headers, a first end of the headers being in communication with the junction; and the second end of the collecting pipe is communicated with one end of the tail gas main pipe. The tail gas discharge structure can be applied to a reduction furnace, the second end of the tail gas branch pipe can be communicated with the exhaust hole at the bottom of the reduction furnace, tail gas in the reduction furnace enters the tail gas branch pipe through the exhaust hole, gas in the tail gas branch pipe enters the converging pipe, and the pressure in the converging pipe is balanced after the gas in the tail gas branch pipe enters the converging pipe, so that the pressure flow of the gas in the converging pipe is more uniform and stable, the balanced gas flows into the converging pipe from the converging pipe, the uniform and stable gas in the converging pipe stably flows into the converging pipe, and is discharged from the tail gas main pipe after passing through the converging pipe, so that the discharge of the tail gas is more uniform and stable, the pressure, the flow field and the temperature field in the reduction furnace are stable, and the production quality of polysilicon is improved.
Drawings
Fig. 1 is a schematic structural diagram of an exhaust emission structure according to a first embodiment of the present application;
fig. 2 is a schematic diagram of another exhaust emission structure according to the first embodiment of the present application;
fig. 3 is a top view of an exhaust emission structure according to a first embodiment of the present application;
fig. 4 is a schematic structural diagram of an exhaust emission structure according to a second embodiment of the present application;
fig. 5 is another schematic structural diagram of an exhaust emission structure according to a second embodiment of the present application;
fig. 6 is a top view of an exhaust emission structure according to a second embodiment of the present application;
fig. 7 is a schematic structural diagram of an exhaust emission structure according to a third embodiment of the present application;
fig. 8 is another schematic structural diagram of an exhaust emission structure according to a third embodiment of the present application;
fig. 9 is a top view of an exhaust emission structure according to a third embodiment of the present application;
FIG. 10 is a schematic view of the furnace body and tail gas manifold connection according to an embodiment of the present application.
Reference numerals
An exhaust branch pipe 10;
a converging pipe 20;
a header 30;
a header 40;
a tail gas main pipe 50;
a slag discharge pipe 60; a baffle 61;
a furnace body 70.
Detailed Description
The following description of the embodiments of the present application will be made clearly and fully with reference to the accompanying drawings, in which it is evident that the embodiments described are some, but not all embodiments of the application. All other embodiments, which can be made by those skilled in the art based on the embodiments of the application without making any inventive effort, are intended to be within the scope of the application.
The terms first, second and the like in the description and in the claims, are used for distinguishing between similar elements and not necessarily for describing a particular sequential or chronological order. It is to be understood that the data so used may be interchanged where appropriate such that embodiments of the application may be practiced otherwise than as specifically illustrated or described herein. Furthermore, in the description and claims, "and/or" means at least one of the connected objects, and the character "/", generally means that the associated object is an "or" relationship.
As shown in fig. 1 to 9, the exhaust emission structure according to the embodiment of the present application includes: the exhaust branch pipes 10, the converging pipes 20, the converging pipes 30 and the exhaust main pipe 50 are arranged, wherein the number of the exhaust branch pipes 10 can be selected according to actual needs, and can be even, such as four, six, eight and the like, the first end of each exhaust branch pipe 10 can be communicated with the converging pipe 20, the converging pipe 20 can be circular or arc-shaped, the first ends of the exhaust branch pipes 10 can be arranged at intervals along the circumference of the converging pipe 20 and can be uniformly arranged at intervals, the exhaust flowing out of the exhaust branch pipes 10 can be balanced in the converging pipe 20 through the converging pipe 20, so that the gas in the converging pipe 20 is more uniform and stable, the exhaust in the exhaust branch pipes 10 is facilitated to be uniformly and stably discharged along each exhaust branch pipe 10, the first end of the converging pipe 30 can be communicated with the converging pipe 20, the second end of the converging pipe 30 can be communicated with one end of the exhaust main pipe 50, and the uniform and stable gas in the converging pipe 20 can flow out of the main pipe 50 after passing through the converging pipe 30.
In the application process, the tail gas emission structure can be applied to a reduction furnace, the second end of the tail gas branch pipe 10 can be communicated with the exhaust hole at the bottom of the reduction furnace, tail gas in the reduction furnace enters the tail gas branch pipe 10 through the exhaust hole, gas in the tail gas branch pipe 10 enters the converging pipe 20, the gas in the tail gas branch pipe 10 enters the converging pipe 20 and then balances the pressure flow of the gas in the converging pipe 20, so that the pressure flow of the gas in the converging pipe 20 is more uniform and stable, the balanced gas flows into the converging pipe 30 from the converging pipe 20, the uniform and stable gas in the converging pipe 20 stably flows into the converging pipe 30 and is discharged from the tail gas main pipe 50 after passing through the converging pipe 30, the tail gas is more uniformly and stably discharged, the pressure, the flow field and the temperature field in the reduction furnace are further stable, the production quality of polysilicon is improved, the situation that the energy consumption is increased due to uneven flow field or poor flow field is avoided, and the situation that the tail gas pipe is further deteriorated in the silicon junction situation is avoided.
In some embodiments, the converging pipe 20 may be arc-shaped or circular-ring-shaped, the tail gas branch pipes 10 may be straight pipes, the pipe diameters of the tail gas branch pipes 10 may be selected according to practical situations, the axes of the tail gas branch pipes 10 and the converging pipe 20 may be parallel, and the axis of the converging pipe 20 is a straight line perpendicular to the plane of the converging pipe 20 and passing through the center of the ring or arc of the converging pipe 20. Wherein, the first ends of the plurality of exhaust branch pipes 10 may be uniformly spaced along the circumference of the converging pipe 20, so that the pressure of the gas in the plurality of exhaust branch pipes 10 in the converging pipe 20 is balanced, and the on-way resistance of each exhaust branch pipe 10 to the exhaust main pipe can be balanced.
In other embodiments, the first ends of the plurality of headers 30 may be spaced apart along the circumference of the junction tube 20, e.g., the first ends of the plurality of headers 30 may be evenly spaced apart along the circumference of the junction tube 20. For example, the exhaust branch pipes 10 may have four, the first ends of the four exhaust branch pipes 10 may be disposed at uniform intervals in the circumferential direction of the junction pipe 20, the junction pipe 30 may have two, and the axes of the two junction pipes 30 may be coplanar with the axis of the junction pipe 20. Alternatively, the header 30 may be a straight tube, and the axis of the header 30 may be parallel to the axis of the junction tube 20. For example, the two tail gas branch pipes 10 are located in the first symmetry plane, and the two other tail gas branch pipes 10 may be symmetrically disposed about the first symmetry plane, so that the gas in the tail gas branch pipes 10 is in favor of balancing in the converging pipe 20, the gas in the tail gas branch pipes 10 is promoted to flow uniformly and stably, and the tail gas in each tail gas branch pipe in the reduction furnace is promoted to be discharged uniformly and stably. The pressure and the flow rate of the tail gas in each tail gas branch pipe 10 are basically the same, the flow rate of each tail gas branch pipe 10 is relatively balanced, the silicon forming conditions are relatively consistent, the condition that the silicon forming degree in each tail gas branch pipe 10 is different is improved, the influence on the temperature field and the flow field in the reduction furnace in the tail gas emission process is further reduced, and the stability of the polycrystalline silicon growth environment is improved.
According to some embodiments, the converging pipes 20 may be arc-shaped, the converging pipes 20 may have a plurality of, for example, two, the central lines of the plurality of converging pipes 20 may be located on the same circle, the central line of the converging pipes 20 is an arc line where the circle centers of the circular sections of the converging pipes 20 are located, each converging pipe 20 may be provided with a plurality of tail gas branch pipes 10, for example, two ends of the converging pipes 20 may be provided with cover plates, the cover plates may be flange blind plates, and when the silicon slag needs to be cleaned, the flange blind plates are opened, and then the slag cleaning tools are used to extend into the silicon slag to discharge. The cover plate can close or open the pipe orifices at the two ends of the converging pipe 20, when slag discharge or overhaul and maintenance are needed, the pipe orifices at the two ends of the converging pipe 20 can be opened through the cover plate, so that the discharge or overhaul and maintenance of the silicon slag are facilitated, and the slag discharge efficiency and effect are improved; the nozzles at both ends of the confluence pipe 20 may be closed by a cover plate when slag discharge is not required, so that the gas normally flows into the header pipe 30.
According to other embodiments, the exhaust emission structure may further include: header 40, header 30 and tail gas header 50 may be in communication through header 40, a second end of header 30 may be in communication with header 40, and header 40 may be in communication with one end of tail gas header 50. Wherein, the collecting main pipe 40 may be arc-shaped, two ends of the collecting main pipe 40 may be respectively communicated with the second ends of the corresponding collecting pipes 30, and the middle part of the collecting main pipe 40 is communicated with the tail gas main pipe 50. For example, the collecting pipes 30 may have two, both ends of the collecting pipe 40 may be respectively connected to the second end of one collecting pipe 30, the middle portion of the collecting pipe 40 may be connected to the exhaust pipe 50, the exhaust pipe 50 may be a straight pipe, and the two collecting pipes 30 may be symmetrically disposed with respect to the exhaust pipe 50, so that the gas can be uniformly and stably discharged in the collecting pipes 30 and the exhaust pipe 50, and the exhaust gas in the reduction furnace is promoted to be uniformly and stably discharged. In the application process, the distances from the tail gas branch pipes 10 to the collecting pipes 30 are equal, so that the same flow rate is ensured, the tail gas branch pipes 10 are symmetrically distributed integrally, the distances from the collecting pipes 30 at two sides to the tail gas main pipe 50 are ensured to be equal, the distances from each tail gas branch pipe 10 to the tail gas main pipe 50 are ensured to be equal, and the same flow rate is ensured.
In the embodiment of the application, the collecting pipe 30 may be a straight pipe, the position on the collecting main pipe 40 adjacent to the collecting pipe 30 may be provided with a slag discharging pipe 60, the axis of the slag discharging pipe 60 may be collinear with the axis of the corresponding collecting pipe 30, the first end of the slag discharging pipe 60 may be communicated with the collecting main pipe 40, the second end of the slag discharging pipe 60 is provided with a baffle 61, the baffle 61 may be a flange blind plate, the baffle 61 may open or close a pipe orifice of the second end of the slag discharging pipe 60, and when silicon slag needs to be cleaned, the flange blind plate is opened, and then a slag removing tool is used to extend the silicon slag to discharge the silicon slag. When slag is required to be discharged, the pipe orifice at the second end of the slag discharge pipe 60 can be opened through the baffle plate 61, so that the silicon slag is conveniently discharged, and the slag discharge efficiency and effect are improved; after the silica slag is cleaned, when slag is not required to be discharged, the pipe orifice at the second end of the slag discharge pipe 60 can be closed by the baffle 61 so as to facilitate the normal flow of gas.
In some embodiments, the collecting main pipe 40 may be arc-shaped, two ends of the collecting main pipe 40 may be provided with cover plates, the cover plates may close or open the pipe orifices at two ends of the collecting main pipe 40, when the silicon slag needs to be cleaned, the cover plates may open the pipe orifices at two ends of the collecting main pipe 40, and the slag cleaning tool is used to extend into the pipe orifices to discharge the silicon slag, so that the silicon slag is conveniently discharged, and the slag discharging efficiency and effect are improved; after the slag discharge is completed, the cover plates can seal the nozzles at the two ends of the collecting main 40 so as to facilitate the normal flow and discharge of the gas.
In an embodiment of the present application, the axis of at least one exhaust manifold 10 of the plurality of exhaust manifolds 10 is collinear with the axis of the header 30. Slag discharging pipes 60 can be arranged on the collecting main pipe 40 at positions adjacent to the collecting pipe 30, and the axes of the slag discharging pipes 60 can be collinear with the axes of the collecting pipe 30 and the tail gas branch pipes 10, the axes of which are collinear with the axes of the collecting pipe 30, so that the silicon slag can be cleaned conveniently. For example, the exhaust branch pipe 10 has six exhaust branch pipes, the axes of two exhaust branch pipes 10 are respectively collinear with the axes of a corresponding one of the collecting pipes 30, the slag discharging pipe 60 is arranged at the lower side of the two collecting pipes 30, and the axes of the slag discharging pipes 60 can be collinear with the axes of the corresponding exhaust branch pipes 10 and the collecting pipes 30. The tail gas branch pipes 10 which are collinear with the axis of the collecting pipe 30 are closer to the collecting pipe 30, so that the diameters, the heat exchange inner surface areas under the diameters and the corresponding flow rates can be adjusted, the same on-way resistance of all the pipe bodies is ensured, the flow rates are similar, the six tail gas branch pipes 10 can better balance the tail gas flow and the pressure, and the influence of the tail gas discharge process on the temperature field and the flow field in the reduction furnace is reduced.
In the embodiment of the present application, the converging pipe 20 may be a circular ring, the exhaust branch pipe 10 may be a straight pipe, the converging pipe 30 may be a straight pipe, the exhaust branch pipe 10 has six converging pipes 30, the axes of each converging pipe 30 may be respectively collinear with the axes of a corresponding exhaust branch pipe 10, the pipe diameters of the two exhaust branch pipes 10 whose axes are collinear with the axes of the converging pipes 30 may be different from the pipe diameters of other exhaust branch pipes 10, for example, may be smaller than the pipe diameters of other exhaust branch pipes 10, and may be specifically selected according to practical situations. The axes of the two collecting pipes 30 and the axis of the converging pipe 20 are both in a first plane, two tail gas branch pipes 10 are respectively distributed on two sides of the first plane, and the tail gas branch pipes 10 on two sides of the first plane can be symmetrically arranged about the first plane so as to facilitate the balance of gas and be beneficial to the stable and balanced flow of gas. In the application process, the two tail gas branch pipes 10 with the axes collinear with the axes of the collecting pipe 30 can adjust the diameter, the heat exchange inner surface area under the diameter and the corresponding flow rate due to the closer distance from the collecting pipe 30, so that the same along-path resistance as other pipe bodies and similar flow rate are ensured.
In some embodiments, a slag pipe 60 may be disposed on the converging pipe 20 adjacent to the first end of the tail gas branch pipe 10, the tail gas branch pipe 10 and the slag pipe 60 may be straight pipes, the axes of the slag pipe 60 and the corresponding tail gas branch pipe 10 may be collinear, the first end of the slag pipe 60 is communicated with the converging pipe 20, the second end of the slag pipe 60 may be provided with a baffle 61, the baffle 61 may be a flange blind plate, and the baffle 61 may open or close the pipe orifice of the second end of the slag pipe 60. When slag is required to be discharged, the pipe orifice at the second end of the slag discharging pipe 60 can be opened through the baffle plate 61, so that the silicon slag can be cleaned conveniently; the mouth of the second end of the slag discharge pipe 60 may be closed by a baffle 61 when slag discharge is not required, so that the normal flow of gas is facilitated.
In some embodiments, at least one of the exhaust branch pipe 10, the junction pipe 20, the junction pipe 30 and the exhaust main pipe 50 may be provided with a temperature sensor to detect the temperature of the gas in the pipeline, and transmit a temperature signal to the control system, so that the temperature of the gas in the pipeline may be controlled within a reasonable temperature range, for example, temperature sensors may be provided on the exhaust branch pipe 10 and the exhaust main pipe 50, respectively, to detect the temperature of the gas in the exhaust branch pipe 10 and the exhaust main pipe 50.
According to some embodiments, the exhaust emission structure may further include: and at least one of the tail gas branch pipe 10, the converging pipe 20, the converging pipe 30 and the tail gas main pipe 50 can be provided with a temperature adjusting device, and the temperature of the gas in the pipe body can be adjusted through the temperature adjusting device, so that the temperature of the gas in the pipeline can be controlled in a reasonable temperature range.
An embodiment of the present application provides a reduction furnace, as shown in fig. 10, including: the exhaust emission structure described in the above embodiment; the furnace body 70, the bottom of the furnace body 70 may be provided with a plurality of exhaust holes, which are respectively communicated with the second ends of the corresponding tail gas branch pipes 10. The tail gas in the furnace body enters the tail gas branch pipe 10 through the exhaust hole, the gas in the tail gas branch pipe 10 enters the converging pipe 20, and the gas in the tail gas branch pipe 10 can be balanced in the converging pipe 20 after entering the converging pipe 20, so that the pressure flow of the gas in the converging pipe 20 is more uniform and stable, the balanced gas flows into the converging pipe 30 from the converging pipe 20, the uniform and stable gas in the converging pipe 20 stably flows into the converging pipe 30, and is discharged from the tail gas main pipe 50 after passing through the converging pipe 30, so that the discharge of the tail gas is more uniform and stable, the pressure, the flow field and the temperature field in the reducing furnace are stable, and the production quality of polysilicon is improved.
In some embodiments, the plurality of exhaust holes may be uniformly spaced along the circumference of the bottom of the furnace body 70, and the exhaust branch pipe 10 may be perpendicular to the bottom of the furnace body 70, so that the exhaust gas in the furnace body is stably exhausted.
In an embodiment of the present application, at least one of the exhaust branch pipe 10, the junction pipe 20, the junction pipe 30, and the exhaust main pipe 50 may be provided with a temperature sensor to detect the temperature of the gas in the pipe so that the temperature of the gas in the pipe can be controlled in a reasonable temperature range. At least one of the bottom of the furnace body 70, the tail gas branch pipe 10, the converging pipe 20, the converging pipe 30 and the tail gas main pipe 50 is provided with a temperature adjusting device, and the temperature of the gas in the pipe body can be adjusted by the temperature adjusting device, so that the temperature of the gas in the pipeline can be controlled in a reasonable temperature range. The reducing furnace can also comprise a control system, the control system can control the temperature regulating device according to the temperature detected by the temperature sensor, and the temperature regulating device can regulate the temperature of the gas in the pipe body to be in a reasonable temperature range. For example, when the temperature of the gas in the tail gas branch pipe 10 is greater than or equal to the preset temperature, the control system may control the bottom of the furnace body or the temperature adjusting device on the tail gas branch pipe 10 to adjust the temperature of the gas in the tail gas branch pipe 10, and reduce the temperature of the gas in the tail gas branch pipe 10, so that the temperature of the gas in the tail gas branch pipe 10 is stabilized in the preset temperature range; when the temperature of the gas in the tail gas branch pipe 10 is smaller than the preset temperature, the control system can control the bottom of the furnace body or the temperature adjusting device on the tail gas branch pipe 10 to adjust the temperature of the gas in the tail gas branch pipe 10, and raise the temperature of the gas in the tail gas branch pipe 10, so that the temperature of the gas in the tail gas branch pipe 10 is stabilized in the preset temperature range, the stable flow of the gas is ensured, and the generation of silica slag is reduced.
The temperature adjusting device may include a jacket having circulating cooling water, and the jacket may be provided at an outer side of the pipe body, and the temperature of the gas in the pipe body may be adjusted by the temperature adjusting device so that the temperature in the pipe body is maintained at a reasonable temperature. The temperature of the tail gas can be regulated by regulating the temperature and/or flow of cooling water and regulating the current and the temperature of the silicon rod, so that no silicon or less silicon is formed in the tail gas exhaust pipe, the service time is prolonged, cleaning is reduced, and damage to the exhaust pipe is reduced.
The temperature sensor can collect temperature signals of tail gas in the pipe body, and transmit the signals to the control system (such as a DCS control system), if the temperature of the tail gas is higher than a set range, the control system can control an electronic regulating valve on a jacket through a setting analysis module, the electronic regulating valve is used for controlling cooling water, the flow and pressure of the cooling water in the jacket on the pipe body and the flow and pressure of the cooling water in the jacket on the bottom of the furnace body are improved, electrode current can be finely adjusted, the temperature of a silicon rod is controlled to be reduced, and the temperature of the tail gas is quickly reduced to be below a vapor deposition temperature point. If the temperature of the tail gas is lower than the set range, the control system can control an electronic regulating valve on the jacket through the setting analysis module, so that the flow and pressure of the cooling water in the jacket on the pipe body and the flow and pressure of the cooling water on the bottom of the furnace body are reduced, the electrode current can be finely adjusted, the temperature of the silicon rod is controlled and improved, the temperature of the tail gas is increased to the set range, the deposition rate is accelerated, and the energy consumption is reduced. The tail gas temperature can be kept below the vapor deposition temperature through dynamic adjustment, so that the tail gas hole does not form silicon or the silicon forming time of the tail gas pipe is prolonged. In addition, the control system can also analyze according to the temperature signals received on each tail gas branch pipe, compare the gas flow in different tail gas branch pipes, judge whether the gas flow in each tail gas branch pipe is balanced, and predict the influence on the flow field in the furnace. And the silicon junction condition in the pipe can be predicted according to the difference of the temperature signals of the tail gas, and if the temperature difference is large, the silicon junction condition in the tail gas branch pipe with high temperature can be considered serious, and the silicon slag needs to be cleaned.
The embodiments of the present application have been described above with reference to the accompanying drawings, but the present application is not limited to the above-described embodiments, which are merely illustrative and not restrictive, and many forms may be made by those having ordinary skill in the art without departing from the spirit of the present application and the scope of the claims, which are to be protected by the present application.
Claims (12)
1. An exhaust emission structure, characterized by comprising:
a plurality of tail gas branch pipes;
a converging pipe, wherein the first end of each tail gas branch pipe is communicated with the converging pipe, and the first ends of a plurality of tail gas branch pipes are arranged at intervals along the circumferential direction of the converging pipe;
a plurality of headers, a first end of the headers being in communication with the junction;
the second end of the collecting pipe is communicated with one end of the tail gas main pipe;
the converging pipe is arc-shaped or circular-ring-shaped, the tail gas branch pipes are straight pipes, and the axes of the tail gas branch pipes are parallel to the axes of the converging pipe;
the first ends of the tail gas branch pipes are uniformly arranged at intervals along the circumferential direction of the converging pipe;
a plurality of first ends of the header pipes are arranged at intervals along the circumferential direction of the converging pipes;
the collecting pipe is a straight pipe, and the axis of the collecting pipe is parallel to the axis of the converging pipe;
the position on the converging pipe, which is adjacent to the first end of the tail gas branch pipe, is provided with a slag discharging pipe, the tail gas branch pipe and the slag discharging pipe are straight pipes, the axis of the slag discharging pipe is collinear with the axis of the corresponding tail gas branch pipe, the first end of the slag discharging pipe is communicated with the converging pipe, the second end of the slag discharging pipe is provided with a baffle, and the baffle can open or close a pipe orifice of the second end of the slag discharging pipe.
2. The exhaust emission structure according to claim 1, wherein the converging pipes are arc-shaped, the converging pipes are plural, the central lines of the converging pipes are located on the same circle, each converging pipe is provided with plural exhaust branch pipes, two ends of the converging pipe are provided with cover plates, and the cover plates can close or open the pipe orifices at the two ends of the converging pipe.
3. The exhaust gas discharge structure according to claim 1, further comprising:
and the collecting header is communicated with the tail gas main pipe through the collecting header, the second end of the collecting header is communicated with the collecting main pipe, and the collecting main pipe is communicated with one end of the tail gas main pipe.
4. The exhaust gas discharge structure according to claim 3, wherein the collecting main pipe is arc-shaped, two ends of the collecting main pipe are respectively communicated with the second ends of the corresponding collecting pipes, and the middle part of the collecting main pipe is communicated with the exhaust main pipe.
5. The exhaust emission structure according to claim 3, wherein the header pipe is a straight pipe, a slag discharging pipe is arranged on the header pipe adjacent to the header pipe, the axis of the slag discharging pipe is collinear with the axis of the header pipe, the first end of the slag discharging pipe is communicated with the header pipe, the second end of the slag discharging pipe is provided with a baffle, and the baffle can open or close a pipe orifice of the second end of the slag discharging pipe; and/or
The collecting main pipe is arc-shaped, cover plates are arranged at two ends of the collecting main pipe, and the cover plates can seal or open pipe orifices at two ends of the collecting main pipe.
6. The exhaust gas emission structure of claim 5, wherein an axis of at least one of the plurality of exhaust branch pipes is collinear with an axis of the header pipe.
7. The exhaust emission structure according to claim 1 or 6, wherein the converging pipe is circular, the exhaust branch pipes are straight pipes, the converging pipes are straight pipes, the exhaust branch pipes are six, the converging pipes are two, the axis of each converging pipe is respectively collinear with the axis of a corresponding exhaust branch pipe, the axes of the two converging pipes and the axis of the converging pipe are both in a first plane, and two exhaust branch pipes are respectively distributed on two sides of the first plane.
8. The exhaust gas discharge structure according to claim 1, wherein at least one of the exhaust branch pipe, the junction pipe, and the exhaust main pipe is provided with a temperature sensor.
9. The exhaust gas discharge structure according to claim 1, further comprising:
and the tail gas branch pipe, the converging pipe and at least one of the tail gas main pipe are provided with the temperature regulating device.
10. A reduction furnace, characterized by comprising:
the exhaust gas emission structure of any one of claims 1-9;
the bottom of furnace body is equipped with a plurality of exhaust holes, the exhaust hole respectively with the second end intercommunication of corresponding tail gas branch pipe.
11. The reduction furnace according to claim 10, wherein a plurality of the exhaust holes are provided at uniform intervals along a circumference of the bottom of the furnace body, and the exhaust branch pipe is perpendicular to the bottom of the furnace body.
12. The reduction furnace according to claim 10, wherein at least one of the tail gas branch pipe, the junction pipe, and the tail gas main pipe is provided with a temperature sensor, and at least one of the bottom of the furnace body, the tail gas branch pipe, the junction pipe, and the tail gas main pipe is provided with a temperature adjusting device;
the reduction furnace further comprises a control system, and the control system controls the temperature adjusting device according to the temperature detected by the temperature sensor.
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Citations (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20040104040A (en) * | 2003-06-02 | 2004-12-10 | 주성엔지니어링(주) | Exhaust system of chemical vapor deposition apparatus |
| CN102134074A (en) * | 2011-04-18 | 2011-07-27 | 天津大学 | Polycrystalline silicon reducing furnace and operating method thereof |
| JP2011231005A (en) * | 2011-07-11 | 2011-11-17 | Mitsubishi Materials Corp | Polysilicon reducing furnace |
| CN102674361A (en) * | 2012-05-09 | 2012-09-19 | 天津大学 | Top structure of inner container of energy-saving type polysilicon reduction furnace and implementation method for top structure |
| WO2012171149A1 (en) * | 2011-06-14 | 2012-12-20 | 上海森松新能源设备有限公司 | Polysilicon reducing furnace |
| CN203904000U (en) * | 2014-05-04 | 2014-10-29 | 上海森松化工成套装备有限公司 | Novel polycrystalline silicon reduction furnace adopting air feeding and discharging structure |
| CN203922736U (en) * | 2014-06-18 | 2014-11-05 | 四川永祥多晶硅有限公司 | A kind of polycrystalline silicon reduction furnace base plate and tail gas cooling structure |
| CN204224266U (en) * | 2014-08-28 | 2015-03-25 | 上海森松化工成套装备有限公司 | The polycrystalline silicon reducing furnace of large scale structure |
| CN106276914A (en) * | 2016-09-23 | 2017-01-04 | 中国恩菲工程技术有限公司 | Polycrystalline silicon reducing furnace |
| CN107321182A (en) * | 2017-06-14 | 2017-11-07 | 北京福田戴姆勒汽车有限公司 | Exhaust treatment system |
| CN209065431U (en) * | 2018-08-16 | 2019-07-05 | 青海黄河上游水电开发有限责任公司新能源分公司 | Polysilicon reducing furnace tail gas shield, polycrystalline silicon reducing furnace and polycrystalline silicon production system |
| CN211366978U (en) * | 2019-12-31 | 2020-08-28 | 四川永祥多晶硅有限公司 | Polycrystalline silicon reduction furnace and tail gas pipe group thereof |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102013209076A1 (en) * | 2013-05-16 | 2014-11-20 | Wacker Chemie Ag | A reactor for producing polycrystalline silicon and a method for removing a silicon-containing deposit on a component of such a reactor |
-
2021
- 2021-06-15 CN CN202110661123.XA patent/CN113375058B/en active Active
Patent Citations (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20040104040A (en) * | 2003-06-02 | 2004-12-10 | 주성엔지니어링(주) | Exhaust system of chemical vapor deposition apparatus |
| CN102134074A (en) * | 2011-04-18 | 2011-07-27 | 天津大学 | Polycrystalline silicon reducing furnace and operating method thereof |
| WO2012171149A1 (en) * | 2011-06-14 | 2012-12-20 | 上海森松新能源设备有限公司 | Polysilicon reducing furnace |
| JP2011231005A (en) * | 2011-07-11 | 2011-11-17 | Mitsubishi Materials Corp | Polysilicon reducing furnace |
| CN102674361A (en) * | 2012-05-09 | 2012-09-19 | 天津大学 | Top structure of inner container of energy-saving type polysilicon reduction furnace and implementation method for top structure |
| CN203904000U (en) * | 2014-05-04 | 2014-10-29 | 上海森松化工成套装备有限公司 | Novel polycrystalline silicon reduction furnace adopting air feeding and discharging structure |
| CN203922736U (en) * | 2014-06-18 | 2014-11-05 | 四川永祥多晶硅有限公司 | A kind of polycrystalline silicon reduction furnace base plate and tail gas cooling structure |
| CN204224266U (en) * | 2014-08-28 | 2015-03-25 | 上海森松化工成套装备有限公司 | The polycrystalline silicon reducing furnace of large scale structure |
| CN106276914A (en) * | 2016-09-23 | 2017-01-04 | 中国恩菲工程技术有限公司 | Polycrystalline silicon reducing furnace |
| CN107321182A (en) * | 2017-06-14 | 2017-11-07 | 北京福田戴姆勒汽车有限公司 | Exhaust treatment system |
| CN209065431U (en) * | 2018-08-16 | 2019-07-05 | 青海黄河上游水电开发有限责任公司新能源分公司 | Polysilicon reducing furnace tail gas shield, polycrystalline silicon reducing furnace and polycrystalline silicon production system |
| CN211366978U (en) * | 2019-12-31 | 2020-08-28 | 四川永祥多晶硅有限公司 | Polycrystalline silicon reduction furnace and tail gas pipe group thereof |
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|---|---|
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