CN113307271A - Tail gas emission structure and reduction furnace - Google Patents
Tail gas emission structure and reduction furnace Download PDFInfo
- Publication number
- CN113307271A CN113307271A CN202110661115.5A CN202110661115A CN113307271A CN 113307271 A CN113307271 A CN 113307271A CN 202110661115 A CN202110661115 A CN 202110661115A CN 113307271 A CN113307271 A CN 113307271A
- Authority
- CN
- China
- Prior art keywords
- pipe
- exhaust
- tail gas
- branch
- annular
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/021—Preparation
- C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
- C01B33/035—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition or reduction of gaseous or vaporised silicon compounds in the presence of heated filaments of silicon, carbon or a refractory metal, e.g. tantalum or tungsten, or in the presence of heated silicon rods on which the formed silicon is deposited, a silicon rod being obtained, e.g. Siemens process
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Waste-Gas Treatment And Other Accessory Devices For Furnaces (AREA)
Abstract
The application discloses exhaust emission structure and reducing furnace, exhaust emission structure includes: a plurality of tailpipe branches; the first end of each exhaust branch pipe is communicated with the annular pipe, and the first ends of the exhaust branch pipes are arranged at intervals along the circumferential direction of the annular pipe; the annular pipe is communicated with the balance box; the first end of the tail gas main pipe is communicated with the balance box. Exhaust branch pipe and the exhaust hole intercommunication of the bottom of reduction furnace, gas in the reduction furnace passes through the exhaust hole and gets into exhaust branch pipe, and exhaust gas in the exhaust branch pipe gets into the toroidal tube, and tail gas in the different exhaust branch pipes can be balanced at the toroidal tube, and the tail gas in the toroidal tube gets into in the balance box balance and makes gaseous pressure more even, then the gas in the balance box gets rid of through the female pipe of tail gas. The gas flow in each tail gas branch pipe is balanced through the annular pipe and the balance box, the silicon bonding condition and the silicon slag cleaning frequency in the tail gas branch pipes are reduced, the tail gas emission is kept uniform and stable, and the pressure, the flow field and the temperature field in the reduction furnace are more stable.
Description
Technical Field
The application belongs to the technical field of polycrystalline silicon, and particularly relates to a tail gas discharge structure and a reduction furnace.
Background
Polycrystalline silicon is a main raw material for manufacturing integrated circuits and solar cells. The production of the polysilicon mainly uses an improved Siemens method, raw materials such as chlorosilane and hydrogen are sent into a reduction furnace to generate Chemical Vapor Deposition (CVD) reaction on a silicon rod to generate the polysilicon, in order to ensure higher production efficiency in the reduction furnace in the production process, the deposition speed of the polysilicon on the surface of the silicon rod is improved, raw material gas is continuously sprayed in through a nozzle, and the low-concentration chlorosilane after reaction and byproducts in the reaction process are continuously discharged through a tail gas port. When the tail gas flows through the tail gas pipe, the pressure and the flow of the gas in the tail gas pipe are not uniform, so that the pressure, the flow field and the temperature field in the reduction furnace are unstable, and the generation quality of polycrystalline silicon is influenced.
Disclosure of Invention
The embodiment of the application aims to provide a tail gas discharge structure and a reduction furnace, and aims to solve the problems that the pressure and the flow of gas in a tail gas pipe of the reduction furnace are not uniform, so that the pressure, the flow field and the temperature field in the reduction furnace are unstable, and the generation quality of polycrystalline silicon is influenced.
In a first aspect, an embodiment of the present application provides an exhaust emission structure, including:
a plurality of tailpipe branches;
the first end of each tail gas branch pipe is communicated with the annular pipe, and the first ends of the plurality of tail gas branch pipes are arranged at intervals along the circumferential direction of the annular pipe;
the annular pipe is communicated with the balance box;
the first end of the tail gas main pipe is communicated with the balance box.
The exhaust branch pipes are straight pipes, and the axes of the exhaust branch pipes are parallel to the axis of the annular pipe.
Wherein, still include:
a header through which the annular tubes communicate with the balancing tank, the header having a first end in communication with the annular tubes and a second end in communication with the balancing tank.
Wherein the collecting pipes are provided in plurality, first ends of the collecting pipes are arranged at regular intervals in the circumferential direction of the annular pipe, and second ends of the collecting pipes are arranged at regular intervals in the circumferential direction of the balancing tank.
The balance box is columnar, the axis of the balance box is collinear with the axis of the annular pipe, and the collecting pipe extends along the radial direction of the annular pipe.
Wherein, an expansion joint is arranged on the collecting pipe.
The annular pipe is provided with a tail gas branch pipe, the tail gas branch pipe is arranged at the first end of the tail gas branch pipe, the annular pipe is provided with a slag discharge pipe at the position close to the first end of the tail gas branch pipe, the axis of the slag discharge pipe is collinear with the axis of the tail gas branch pipe, the second end of the slag discharge pipe is provided with a baffle, and the baffle can be opened or closed at the pipe orifice of the second end of the slag discharge pipe.
And at least one of the tail gas branch pipe and the tail gas main pipe is provided with a temperature sensor.
The tail gas purification device comprises a balance box, a tail gas main pipe and a tail gas exhaust pipe, wherein an opening is formed in the balance box, the opening is communicated with the first end of the tail gas main pipe, and a dust removal device is arranged in the balance box or on the tail gas main pipe.
The bottom of the balance box is provided with a discharge port, a cover plate is arranged on the balance box and close to the discharge port, and the cover plate can open or close the discharge port.
Wherein, still include:
and at least one of the tail gas branch pipe, the annular pipe and the tail gas main pipe is provided with the temperature adjusting device.
In a second aspect, an embodiment of the present application provides a reduction furnace, including:
the exhaust gas discharge structure described in the above embodiment;
the furnace body, the bottom of furnace body is equipped with a plurality of exhaust holes, the exhaust hole respectively with correspond the second end intercommunication of tail gas branch pipe.
The exhaust holes are uniformly arranged at intervals along the circumferential direction of the bottom of the furnace body, and the tail gas branch pipe is perpendicular to the bottom of the furnace body.
The tail gas branch pipe is provided with a temperature sensor, and at least one of the bottom of the furnace body, the tail gas branch pipe, the annular pipe and the tail gas main pipe is provided with a temperature adjusting device;
the reduction furnace also comprises a control system, and the control system controls the temperature adjusting device according to the temperature detected by the temperature sensor.
According to the exhaust emission structure of the embodiment of this application, include: a plurality of tailpipe branches; the first end of each tail gas branch pipe is communicated with the annular pipe, and the first ends of the plurality of tail gas branch pipes are arranged at intervals along the circumferential direction of the annular pipe; the annular pipe is communicated with the balance box; the first end of the tail gas main pipe is communicated with the balance box. The utility model provides a tail gas discharging structure can be applied to the reducing furnace, and exhaust branch can with the exhaust hole intercommunication of the bottom of reducing furnace, every exhaust branch's first end with the ring pipe intercommunication, gas in the reducing furnace get into exhaust branch through the exhaust hole, and exhaust gas in the exhaust branch gets into the ring pipe, tail gas in the ring pipe gets into in the balance box, the gas in the balance box passes through the female pipe of tail gas and discharges. The distance from each tail gas branch pipe to the balance box and the tail gas main pipe is consistent, the on-way resistance of tail gas flowing through each tail gas branch pipe, the balance box and the tail gas main pipe is consistent, the balance of the annular pipe and the balance box to gas can enable the flow in each tail gas branch pipe in the tail gas emission process to be more balanced, the tail gas emission is kept uniform and stable, silicon is not bonded or is less bonded in the tail gas pipe, and the cleaning time interval is prolonged. The pressure, the flow field and the temperature field in the reduction furnace are more stable, the production quality of the polycrystalline silicon is ensured, the furnace turnover rate is reduced, the stability of production operation is improved, and energy conservation and consumption reduction are realized.
Drawings
FIG. 1 is a schematic structural diagram of an exhaust emission structure according to an embodiment of the present application;
FIG. 2 is another schematic structural diagram of an exhaust emission structure according to an embodiment of the present application;
FIG. 3 is a schematic view showing the connection of the furnace body to the offgas branch pipe.
Reference numerals
An exhaust branch pipe 10;
an annular tube 20; a slag discharge pipe 21; a baffle 22;
a balancing tank 30; a filter plate 31; a cover plate 32;
a tail gas header 40;
a header 50; an expansion joint 51;
a temperature sensor 60;
a furnace body 70.
Detailed Description
The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are some, but not all, embodiments of the present application. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.
The terms first, second and the like in the description and in the claims of the present application are used for distinguishing between similar elements and not necessarily for describing a particular sequential or chronological order. It is to be understood that the data so used is interchangeable under appropriate circumstances such that the embodiments of the application are capable of operation in sequences other than those illustrated or described herein. In addition, "and/or" in the specification and claims means at least one of connected objects, a character "/" generally means that a preceding and succeeding related objects are in an "or" relationship.
As shown in fig. 1 to 3, the exhaust emission structure according to the embodiment of the present application includes: a plurality of branch exhaust gas pipes 10, ring pipe 20, balance box 30 and the female pipe of tail gas 40, wherein, the specific quantity of branch exhaust gas pipe 10 can be selected according to actual need, for example four or six, the first end of every branch exhaust gas pipe 10 can communicate with ring pipe 20, the second end of every branch exhaust gas pipe 10 can communicate with the exhaust hole of the bottom of reducing furnace, make the tail gas in the reducing furnace can get into branch exhaust gas pipe 10 through the exhaust hole of bottom, the first end of a plurality of branch exhaust gas pipes 10 can be followed the circumference interval setting of ring pipe 20, can set up at even interval, make the tail gas in branch exhaust gas pipe 10 can be balanced easily in ring pipe 20, be favorable to keeping pressure and the flow stability of the tail gas in branch exhaust gas pipe 10. The annular pipe 20 and the balance box 30 can be communicated, so that the gas in the annular pipe 20 enters the balance box 30 to further balance the flow of the gas in the tail gas branch pipe 10, and the gas in the balance box 30 enters the tail gas main pipe 40 and is discharged from the second end of the tail gas main pipe 40.
The utility model provides a tail gas discharging structure can be applied to the reducing furnace, tail gas branch pipe 10 can communicate with the exhaust hole of the bottom of reducing furnace, the first end and the ring pipe 20 intercommunication of every tail gas branch pipe 10, gas in the reducing furnace passes through the exhaust hole and gets into tail gas branch pipe 10, tail gas among the tail gas branch pipe 10 gets into ring pipe 20, tail gas among the different tail gas branch pipes 10 can balance at ring pipe 20, tail gas among the ring pipe 20 gets into balance box 30 and balances once more, make gaseous flow more even stable, then gas among the balance box 30 passes through the female pipe 40 of tail gas and discharges, through ring pipe 20 and balance box 30 to gaseous balance, can make the flow of tail gas emission in-process more balanced, keep the even stability of tail gas discharge, realize that the tail gas pipe does not tie silicon or ties silicon less, extension clearance time interval. The pressure, the flow field and the temperature field in the reduction furnace are more stable, the production quality of the polycrystalline silicon is ensured, the furnace turnover rate is reduced, and the stability of production operation is improved.
In some embodiments, the exhaust branch pipe 10 may be a straight pipe, and the axes of the exhaust branch pipes 10 and the axis of the annular pipe 20 may be parallel. The axis of the annular tube 20 is a straight line perpendicular to the plane of the annular tube 20 and passing through the center of the annular tube 20. The second end of each exhaust branch pipe 10 may be perpendicular to the bottom of the reduction furnace, so that the exhaust in the reduction furnace can enter the exhaust branch pipe 10.
In an embodiment of the present application, the exhaust gas discharge structure may further include: the header 50, for example, the header 50 may have two, the ring tubes 20 and the balance tank 30 may communicate through the header 50, a first end of the header 50 may communicate with the ring tubes 20, and a second end of the header 50 may communicate with the balance tank 30. The number, shape, location and size of headers 50 may be selected as desired.
Wherein, the balance box 30 may be a column, the collecting pipe 50 may have a plurality of, for example, six, the first ends of the plurality of collecting pipes 50 may be uniformly spaced along the circumferential direction of the ring pipe 20, and the second ends of the plurality of collecting pipes 50 may be uniformly spaced along the circumferential direction of the balance box 30, so that the gas in the ring pipe 20 may uniformly and stably enter the balance box 30 through the collecting pipes 50. The number of headers 50 may be equal to the number of exhaust manifolds 10, and each header 50 may be disposed with respect to one exhaust manifold 10, e.g., a first end of the header 50 may be disposed adjacent to an exhaust manifold 10. The first end of the header 50 and the ring pipe 20 may be connected by a flange with a gasket or welding, and the second end of the header 50 and the balancing tank 30 may be connected by a flange with a gasket or welding.
According to some embodiments, the balance box 30 may be located at the center of the ring pipe 20, the axis of the balance box 30 may be collinear with the axis of the ring pipe 20, the headers 50 may extend in the radial direction of the ring pipe 20, the length and the diameter of each header 50 may be the same, and the distances from the exhaust gas branch pipes 10 to the balance box 30 may be equal, so that the gas in the ring pipe 20 may uniformly and stably enter the balance box 30 through the headers 50. The distances from the tail gas branch pipes 10 to the balance box 30 and the tail gas main pipe 40 are consistent, the on-way resistance of tail gas flowing through the tail gas branch pipes 10, the balance box 30 and the tail gas main pipe 40 is consistent, the gas pressure balance in the tail gas branch pipes 10 is ensured to the greatest extent, and the flow balance in the tail gas branch pipes 10 is further promoted. The tail gas branch pipes 10, the collecting pipes 50 and the balance box 30 are symmetrically distributed, and tail gas in the reduction furnace can enter the balance box 30 through the tail gas branch pipes 10 and the collecting pipes 50 and then enter the tail gas main pipe 40. The distance from each tail gas branch pipe 10 to the balance box 30 at the central axis position of the annular pipe 20 is the same, and the on-way resistance is the same, so that the flow in each tail gas branch pipe in the tail gas emission process is more balanced, the tail gas emission is kept uniform and stable, the tail gas pipes are free from silicon deposition or less silicon deposition, and the cleaning time interval is prolonged. And further, the pressure, the flow field and the temperature field in the reduction furnace are more stable, the production quality of polycrystalline silicon is ensured, the furnace turnover rate is reduced, the yield and the stability of production operation are improved, and energy conservation and consumption reduction are realized.
Alternatively, the header 50 may be provided with an expansion joint 51, and the header 50 may be provided with an expansion joint 51 on a side thereof adjacent to the surge tank 30. In the production process, the fluctuation range of tail gas pipe temperature is great, and the thermal stress of production probably leads to balance box 30 to take place to warp, and the risk of gas leakage risees, and the setting of expansion joint 51 can effectively protect equipment, avoids the emergence of dangerous condition, improves factor of safety.
In some embodiments, a slag discharge pipe 21 may be disposed on the annular pipe 20 at a position adjacent to the first end of the tail gas branch pipe 10, an axis of the slag discharge pipe 21 may be collinear with an axis of the corresponding tail gas branch pipe 10, a baffle 22 may be disposed at the second end of the slag discharge pipe 21, the baffle 22 may be a flange blind plate, the baffle 22 may open or close a pipe orifice of the second end of the slag discharge pipe 21, and when silicon slag needs to be cleaned, the flange blind plate is opened and then a slag removal tool is used to extend into the flange blind plate to discharge the silicon slag. The baffle 22 can be pivotally connected with the second end of the slag discharging pipe 21 so that the baffle 22 can open or close the nozzle of the second end of the slag discharging pipe 21; or, the baffle 22 can be detached when slag discharge is needed so as to facilitate slag discharge, and the baffle 22 can be installed when slag discharge is not needed, so that the baffle 22 seals the pipe orifice of the second end of the slag discharge pipe 21, and tail gas can be discharged normally. The tail gas branch pipes 10 and the collecting pipes 50 can be straight pipes, the cleaning difficulty of silicon slag is greatly reduced, the balance box or the cover plate at the bottom of the balance box can be detached during cleaning, and the cleaning effect and efficiency are improved.
In some embodiments, the balancing tank 30 may have an opening, the opening is communicated with the first end of the tail gas main pipe 40, and a dust removing device may be disposed in the balancing tank 30 or on the tail gas main pipe 40, so that the dust removing device can remove the dust particles in the gas in the balancing tank 30 or in the tail gas main pipe 40, thereby reducing deposition or pollution of the dust particles.
In other embodiments, the balance box 30 may be provided with an opening, the opening may be communicated with the first end of the tail gas main pipe 40, the opening may be located at the top of the balance box 30, the opening of the balance box 30 or the tail gas main pipe 40 may be provided with a dust removing device, the dust removing device may include a filter plate 31, the aperture of the filter hole of the filter plate 31 may be selected and replaced according to specific requirements, the filter plate 31 may be fixed by a plurality of spaced clamping grooves, the rotation may be detachable, and the reverse rotation may be fixed. In the application process, the tail gas flowing out of the opening or entering the tail gas main pipe 40 can be filtered through the filter plate 31, and pollution is reduced.
In the embodiment of the present application, the bottom of the balancing tank 30 may be provided with a discharge port, and a cover plate 32 may be provided on the balancing tank 30 adjacent to the discharge port, and the cover plate 32 may open or close the discharge port. The bottom of surge tank 30 can be equipped with detachable apron 32, and apron 32 can be connected with surge tank 30 through the flange, when the dross is cleared up to needs, can open apron 32, and it can to use the scarfing cinder instrument to stretch into the dross discharge.
In the exhaust emission in-process, the great silicon granule of diameter leans on gravity to fall into in row sediment pipe 21 or surge tank 30, and the less silicon granule of diameter can follow during tail gas gets into female pipe 40 of tail gas and the tail gas heat exchanger, can cause the influence production operation of blockking up after long-time, installs the jam that filter 31 can improve pipeline, tail gas heat exchanger additional, prolongs clearance time interval, reduces the influence to production operation.
In the normal exhaust emission process, the pressure in each exhaust branch pipe 10 is relatively balanced, the silicon bonding condition of each exhaust branch pipe 10 is relatively consistent, the probability of the abnormal and serious silicon bonding condition in a certain exhaust branch pipe 10 is low, and the frequency of cleaning silicon slag is obviously reduced. Meanwhile, the influence on a temperature field and a flow field in the reduction furnace in the tail gas discharge process is weakened, the stability of the growth environment of the polycrystalline silicon is improved, the probability of polycrystalline silicon rod falling is reduced, and the quality of polycrystalline silicon products is improved.
In some embodiments of the present application, the exhaust gas discharge structure may further include:
at least one of the temperature sensor 60, the branch exhaust pipe 10 and the main exhaust pipe 40 may be provided with a temperature sensor 60, for example, a temperature sensor 60 may be provided on each branch exhaust pipe 10, and the temperature of the exhaust gas in the branch exhaust pipe 10 may be detected by the temperature sensor 60. The exhaust gas header 40 may be provided with a temperature sensor 60 to detect the temperature of the exhaust gas in the exhaust gas header 40. The exhaust gas discharge structure may further include: and at least one of the temperature adjusting device, the tail gas branch pipe 10, the annular pipe 20 and the tail gas main pipe 40 is provided with the temperature adjusting device. Wherein, temperature regulation apparatus can include the jacket that has recirculated cooling water, and the jacket can set up in the outside of branch exhaust pipe 10, ring pipe 20 and the female pipe 40 of tail gas, can adjust the temperature of the gas in the body through temperature regulation apparatus to make the temperature in the body keep at reasonable temperature.
An embodiment of the present application provides a reduction furnace, as shown in fig. 3, the reduction furnace includes: the exhaust emission structure and furnace body 70 in the above-mentioned embodiment, the bottom of furnace body 70 can be equipped with a plurality of exhaust holes, the quantity in exhaust hole can equal with the quantity of tail gas branch pipe 10, the exhaust hole communicates with the second end of corresponding tail gas branch pipe 10 respectively, tail gas in furnace body 70 can get into corresponding tail gas branch pipe 10 through the exhaust hole, tail gas in tail gas branch pipe 10 can be balanced in ring pipe 20, be favorable to keeping the flow stability of tail gas in tail gas branch pipe 10, gas in ring pipe 20 gets into balance box 30 and balances once more, make gaseous flow more stable even, gas in the balance box 30 gets into the female pipe 40 of tail gas, discharge from the second end of the female pipe 40 of tail gas. Through the balance of the annular pipe 20 and the balance box 30 to gas, the flow in each tail gas branch pipe in the tail gas emission process is more balanced, the uniformity and stability of tail gas emission are kept, silicon is not bonded or is less bonded in the tail gas pipe, and the cleaning time interval is prolonged. And further, the pressure, the flow field and the temperature field in the reduction furnace are more stable, the production quality of polycrystalline silicon is ensured, the furnace turnover rate is reduced, the yield and the stability of production operation are improved, and energy conservation and consumption reduction are realized.
In some embodiments, the number of the exhaust holes may be multiple, the exhaust holes may be uniformly spaced along the circumference of the bottom of the furnace body 70, the exhaust holes may be located in the edge region of the bottom of the furnace body 70, and the exhaust branch pipe 10 may be perpendicular to the bottom of the furnace body 70, so that the exhaust in the reduction furnace may stably enter the exhaust branch pipe 10.
In the embodiment of the present application, the exhaust branch pipe 10 may be provided with a temperature sensor 60, and at least one of the bottom of the furnace body 70, the exhaust branch pipe 10, the ring pipe 20 and the exhaust main pipe 40 may be provided with a temperature adjusting device, through which the temperature of the bottom of the furnace body 70 or the temperature of the gas in the pipe body can be adjusted, so that the gas temperature is stabilized at a reasonable temperature. The reduction furnace may further include a control system that may control the temperature adjusting means according to the temperature detected by the temperature sensor 60. The control system can control the temperature adjusting device to adjust the temperature of the bottom of the furnace body 70 or the temperature of the gas in the tube body, so that the temperature is stabilized at a reasonable temperature. The temperature adjusting device can include the jacket that has recirculated cooling water, and the jacket can set up in the outside of exhaust branch pipe 10, ring pipe 20 and the female pipe 40 of tail gas, can adjust the temperature of the gas in the body through temperature adjusting device to make the temperature in the body keep at reasonable temperature, for example, can reduce the temperature fast when the temperature is too high and below the temperature of silicon formation, reduce the formation of silicon sediment. When the temperature of the gas in the exhaust branch pipe 10 is greater than or equal to the preset temperature, the control system may control the temperature adjusting device on the bottom of the furnace body 70 or the exhaust branch pipe 10 to adjust the temperature of the gas in the exhaust branch pipe 10, and reduce the temperature of the gas in the exhaust branch pipe 10, so that the temperature of the gas in the exhaust branch pipe 10 is stabilized within the preset temperature range; when the temperature of the gas in the tail gas branch pipe 10 is less than the preset temperature, the control system can control the temperature of the gas in the tail gas branch pipe 10 to be adjusted by the bottom of the furnace body 70 or the temperature adjusting device on the tail gas branch pipe 10, so that the temperature of the gas in the tail gas branch pipe 10 is stabilized within the preset temperature range, the stable flowing of the gas is ensured, and the generation of the silicon slag is reduced.
In the actual process, the temperature of the tail gas can be adjusted by adjusting the temperature and/or the flow of the cooling water and adjusting the current and the temperature of the silicon rod, so that silicon is not bonded or is less bonded in the tail gas exhaust pipe, the service life is prolonged, the cleaning is reduced, and the damage to the exhaust pipe is reduced. In practical application, the tail gas can further recycle heat energy so as to be used for generating steam and balancing heat of the whole plant.
The exhaust branch pipe 10 may be provided with a temperature sensor 60, and the temperature of the exhaust in the exhaust branch pipe 10 may be detected by the temperature sensor 60. The temperature sensor 60 can collect a temperature signal of the tail gas and transmit the signal to a control system (such as a DCS control system), if the temperature of the tail gas is higher than a set range, the control system can control an electronic regulating valve used for controlling cooling water on a jacket through a setting and analyzing module, the flow and pressure of the cooling water in the jacket on a pipe body and the flow and pressure of the cooling water in the jacket on a chassis of the reduction furnace are improved, electrode current can be finely adjusted, the temperature of the silicon rod is controlled and reduced, and the temperature of the tail gas is rapidly reduced to be below a vapor deposition temperature point. If the temperature of the tail gas is lower than the set range, the control system can control an electronic regulating valve used for controlling cooling water on a jacket through a setting and analyzing module, so that the flow and pressure of the cooling water in the jacket on the pipe body and the flow and pressure of the cooling water on a chassis of the reduction furnace are reduced, the electrode current can be finely adjusted, the temperature of the silicon rod is controlled and increased, the temperature of the tail gas is increased to the set range, and the energy consumption is reduced. The tail gas temperature can be kept below the vapor deposition temperature through dynamic adjustment, so that the tail gas hole does not knot silicon or the silicon-binding time of the tail gas pipe is prolonged. In addition, the control system can analyze the received temperature signals on the tail gas branch pipes, compare the gas flow in different tail gas branch pipes, judge whether the gas flow in each tail gas branch pipe is balanced, and predict the influence on the flow field in the furnace. And the silicon bonding condition in the pipe can be predicted according to the difference of the temperature signals of the tail gas, and if the temperature difference is large, the silicon bonding condition in the tail gas branch pipe with high temperature can be considered to be serious, and the silicon slag needs to be cleaned.
While the present embodiments have been described with reference to the accompanying drawings, it is to be understood that the invention is not limited to the precise embodiments described above, which are meant to be illustrative and not restrictive, and that various changes may be made therein by those skilled in the art without departing from the spirit and scope of the invention as defined by the appended claims.
Claims (14)
1. An exhaust emission structure, comprising:
a plurality of tailpipe branches;
the first end of each tail gas branch pipe is communicated with the annular pipe, and the first ends of the plurality of tail gas branch pipes are arranged at intervals along the circumferential direction of the annular pipe;
the annular pipe is communicated with the balance box;
the first end of the tail gas main pipe is communicated with the balance box.
2. The exhaust gas discharge structure according to claim 1, wherein the exhaust branch pipes are straight pipes, and axes of the plurality of exhaust branch pipes are parallel to an axis of the annular pipe.
3. The exhaust gas discharge structure according to claim 1, further comprising:
a header through which the annular tubes communicate with the balancing tank, the header having a first end in communication with the annular tubes and a second end in communication with the balancing tank.
4. The exhaust gas discharge structure according to claim 3, wherein the headers have a plurality, first ends of the headers are arranged at regular intervals in the circumferential direction of the annular pipe, and second ends of the headers are arranged at regular intervals in the circumferential direction of the surge tank.
5. The exhaust gas discharge structure according to claim 4, wherein the surge tank is cylindrical, an axis of the surge tank is collinear with an axis of the annular pipe, and the header pipe extends in a radial direction of the annular pipe.
6. The exhaust emission structure of claim 3, wherein an expansion joint is provided on the header.
7. The exhaust emission structure of claim 1, wherein a slag discharge pipe is disposed on the annular pipe at a position adjacent to the first end of the branch exhaust pipe, an axis of the slag discharge pipe is collinear with an axis of the corresponding branch exhaust pipe, and a baffle is disposed at the second end of the slag discharge pipe and can open or close a pipe orifice of the second end of the slag discharge pipe.
8. The exhaust gas discharge structure according to claim 1, wherein a temperature sensor is provided on at least one of the branch exhaust pipe and the mother exhaust pipe.
9. The exhaust emission structure of claim 1, wherein the balancing tank is provided with an opening, the opening is communicated with the first end of the exhaust main pipe, and a dust removing device is arranged in the balancing tank or on the exhaust main pipe.
10. The exhaust gas discharge structure according to claim 1, wherein the bottom of the surge tank is provided with a discharge port, and a cover plate is provided on the surge tank at a position adjacent to the discharge port, the cover plate being capable of opening or closing the discharge port.
11. The exhaust gas discharge structure according to claim 1, further comprising:
and at least one of the tail gas branch pipe, the annular pipe and the tail gas main pipe is provided with the temperature adjusting device.
12. A reduction furnace, comprising:
the exhaust gas emission structure according to any one of claims 1 to 11;
the furnace body, the bottom of furnace body is equipped with a plurality of exhaust holes, the exhaust hole respectively with correspond the second end intercommunication of tail gas branch pipe.
13. The reduction furnace according to claim 12, wherein a plurality of the exhaust holes are provided at regular intervals in a circumferential direction of a bottom of the furnace body, and the offgas branch pipes are perpendicular to the bottom of the furnace body.
14. The reduction furnace according to claim 12, wherein a temperature sensor is provided on the offgas branch pipe, and a temperature adjusting device is provided on at least one of a bottom of the furnace body, the offgas branch pipe, the ring pipe, and the offgas header pipe;
the reduction furnace also comprises a control system, and the control system controls the temperature adjusting device according to the temperature detected by the temperature sensor.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110661115.5A CN113307271A (en) | 2021-06-15 | 2021-06-15 | Tail gas emission structure and reduction furnace |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110661115.5A CN113307271A (en) | 2021-06-15 | 2021-06-15 | Tail gas emission structure and reduction furnace |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN113307271A true CN113307271A (en) | 2021-08-27 |
Family
ID=77378933
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202110661115.5A Pending CN113307271A (en) | 2021-06-15 | 2021-06-15 | Tail gas emission structure and reduction furnace |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN113307271A (en) |
Citations (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5473628A (en) * | 1991-11-06 | 1995-12-05 | Norsk Hydro A.S. | Device for ring section furnace |
| JPH0914563A (en) * | 1995-06-30 | 1997-01-17 | Tokyo Gas Co Ltd | Pressure change absorbing device |
| CN101036865A (en) * | 2007-01-31 | 2007-09-19 | 华东理工大学 | Slurry bubble columun reactor having internal circulation and external heat-exchanging and the application |
| JP2008133493A (en) * | 2006-11-27 | 2008-06-12 | Nippon Steel Corp | Device for blowing pulverized coal |
| CN102134074A (en) * | 2011-04-18 | 2011-07-27 | 天津大学 | Polycrystalline silicon reducing furnace and operating method thereof |
| CN103353123A (en) * | 2013-07-01 | 2013-10-16 | 东莞市百大新能源股份有限公司 | Synchronous double-bed air feeding method and structure for updraught type fixed bed gasifiers |
| CN204051242U (en) * | 2014-08-11 | 2014-12-31 | 贵州省万山银河化工有限责任公司 | A kind of catalyst dried tail gas delivery pipe structure |
| CN104862667A (en) * | 2014-02-26 | 2015-08-26 | 甘志银 | Symmetrical vapor deposition equipment reaction cavity |
| CN105043095A (en) * | 2015-06-25 | 2015-11-11 | 石家庄新华能源环保科技股份有限公司 | Double-heating rotary hearth ring furnace |
| CN109654892A (en) * | 2017-10-10 | 2019-04-19 | 中冶长天国际工程有限责任公司 | A kind of device and method monitored and control heat sinter cooling procedure carbon residue burns |
| CN210303060U (en) * | 2019-06-12 | 2020-04-14 | 陕西榆林协创资源再生有限公司 | Purification treatment device for waste gas generated by calcining polyethylene attachments |
| TWI723775B (en) * | 2020-02-14 | 2021-04-01 | 格泰綠能科技有限公司 | Box type drying and venting device |
| CN112665209A (en) * | 2020-12-17 | 2021-04-16 | 西安交通大学 | Thermodynamic exhaust system with accurate temperature response and control method thereof |
-
2021
- 2021-06-15 CN CN202110661115.5A patent/CN113307271A/en active Pending
Patent Citations (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5473628A (en) * | 1991-11-06 | 1995-12-05 | Norsk Hydro A.S. | Device for ring section furnace |
| JPH0914563A (en) * | 1995-06-30 | 1997-01-17 | Tokyo Gas Co Ltd | Pressure change absorbing device |
| JP2008133493A (en) * | 2006-11-27 | 2008-06-12 | Nippon Steel Corp | Device for blowing pulverized coal |
| CN101036865A (en) * | 2007-01-31 | 2007-09-19 | 华东理工大学 | Slurry bubble columun reactor having internal circulation and external heat-exchanging and the application |
| CN102134074A (en) * | 2011-04-18 | 2011-07-27 | 天津大学 | Polycrystalline silicon reducing furnace and operating method thereof |
| CN103353123A (en) * | 2013-07-01 | 2013-10-16 | 东莞市百大新能源股份有限公司 | Synchronous double-bed air feeding method and structure for updraught type fixed bed gasifiers |
| CN104862667A (en) * | 2014-02-26 | 2015-08-26 | 甘志银 | Symmetrical vapor deposition equipment reaction cavity |
| CN204051242U (en) * | 2014-08-11 | 2014-12-31 | 贵州省万山银河化工有限责任公司 | A kind of catalyst dried tail gas delivery pipe structure |
| CN105043095A (en) * | 2015-06-25 | 2015-11-11 | 石家庄新华能源环保科技股份有限公司 | Double-heating rotary hearth ring furnace |
| CN109654892A (en) * | 2017-10-10 | 2019-04-19 | 中冶长天国际工程有限责任公司 | A kind of device and method monitored and control heat sinter cooling procedure carbon residue burns |
| CN210303060U (en) * | 2019-06-12 | 2020-04-14 | 陕西榆林协创资源再生有限公司 | Purification treatment device for waste gas generated by calcining polyethylene attachments |
| TWI723775B (en) * | 2020-02-14 | 2021-04-01 | 格泰綠能科技有限公司 | Box type drying and venting device |
| CN112665209A (en) * | 2020-12-17 | 2021-04-16 | 西安交通大学 | Thermodynamic exhaust system with accurate temperature response and control method thereof |
Non-Patent Citations (1)
| Title |
|---|
| 胡荣华: ""零排放全降解"船舶生活污水处理设备及应用展望", 《中国船检》 * |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR101616527B1 (en) | Process for cooling and washing biomass syngas and system thereof | |
| CN109775728B (en) | Air inlet device of reducing carbonization tower | |
| CA1168993A (en) | Method of, and apparatus for cleaning hot, dust-laden gases, in particular coal gas produced in iron and steel bath reactors | |
| CN113307271A (en) | Tail gas emission structure and reduction furnace | |
| CN103007711A (en) | Equipment and tail gas treatment method for synchronously treating tail gas of multiple graphitization furnaces | |
| CN113375058B (en) | Tail gas emission structure and reducing furnace | |
| CN113213484B (en) | Tail gas emission structure and reducing furnace | |
| CN105253889A (en) | Polycrystalline silicon production system and polycrystalline silicon production method | |
| CN116899325A (en) | Short-flow metal filter bag dust remover and flue gas dust removal method | |
| CN109778145B (en) | CVD equipment gas supply device for producing solar cell and gas supply method thereof | |
| CN214635422U (en) | Air preheater anti-blocking treatment device based on denitration ammonia escape control | |
| CN214218775U (en) | U-shaped separation section, converter gas dust removal and waste heat recovery system | |
| CN103172067A (en) | Cold wall fluidized bed and application thereof | |
| CN202671215U (en) | Polysilicon reduction furnace | |
| CN215276262U (en) | Hot gas filter regenerating unit | |
| JP2016521238A (en) | Gas distributor for Siemens furnace | |
| CN212548690U (en) | Constant temperature filtration purification device of high temperature flue gas | |
| CN113245381B (en) | On-line cooling system and cooling method for sized seamless steel tube | |
| CN217431282U (en) | Complicated flue gas dirt arsenic piece-rate system | |
| CN217663230U (en) | Trichlorosilane synthesizer for fine silicon powder | |
| CN105255522B (en) | High-temperature gasification product Quench converts purifier and its process | |
| CN218296671U (en) | Drying equipment for reduction furnace bell jar | |
| CN215027129U (en) | Yellow phosphorus burner gas dust collector | |
| CN103588207B (en) | Furnace gas medium forced circulation type polycrystalline silicon reduction furnace | |
| CN214039595U (en) | Air equalizing device of grate cooler |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |