CN113296361B - Patterned photosensitive resin coating, manufacturing method thereof, circuit structure and capacitive touch screen - Google Patents
Patterned photosensitive resin coating, manufacturing method thereof, circuit structure and capacitive touch screen Download PDFInfo
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- CN113296361B CN113296361B CN202110602960.5A CN202110602960A CN113296361B CN 113296361 B CN113296361 B CN 113296361B CN 202110602960 A CN202110602960 A CN 202110602960A CN 113296361 B CN113296361 B CN 113296361B
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- 239000011347 resin Substances 0.000 title claims abstract description 92
- 229920005989 resin Polymers 0.000 title claims abstract description 92
- 239000011248 coating agent Substances 0.000 title claims abstract description 84
- 238000000576 coating method Methods 0.000 title claims abstract description 84
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 11
- 238000000149 argon plasma sintering Methods 0.000 claims abstract description 76
- 239000000758 substrate Substances 0.000 claims description 22
- 239000010408 film Substances 0.000 claims description 14
- 239000010409 thin film Substances 0.000 claims description 10
- 230000000149 penetrating effect Effects 0.000 claims description 3
- 238000000034 method Methods 0.000 claims description 2
- 238000010586 diagram Methods 0.000 description 5
- 230000000903 blocking effect Effects 0.000 description 2
- 238000007711 solidification Methods 0.000 description 2
- 230000008023 solidification Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 241001391944 Commicarpus scandens Species 0.000 description 1
- 229910001182 Mo alloy Inorganic materials 0.000 description 1
- 238000007792 addition Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 229940051841 polyoxyethylene ether Drugs 0.000 description 1
- 229920000056 polyoxyethylene ether Polymers 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
- G06F3/0445—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using two or more layers of sensing electrodes, e.g. using two layers of electrodes separated by a dielectric layer
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- General Engineering & Computer Science (AREA)
- Theoretical Computer Science (AREA)
- Human Computer Interaction (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Position Input By Displaying (AREA)
Abstract
The invention relates to a patterned photosensitive resin coating, a manufacturing method, a circuit structure and a capacitive touch screen thereof, wherein the photosensitive resin coating is provided with at least one first edge slope along a first axial direction, and the gradient angle of the first edge slope is smaller than that of other edge slopes; along the second axis, the photosensitive resin layer has at least one second edge slope, and the slope angle of the second edge slope is greater than the slope angle of the other edge slopes; the photosensitive resin coating is formed by coating negative photosensitive resin and exposing and curing by an anisotropic ultraviolet light source, wherein the light scattering angle of the anisotropic ultraviolet light source at a first edge slope is a first light scattering angle, the light scattering angle of the anisotropic ultraviolet light source at a second edge slope is a second light scattering angle, and the first light scattering angle is larger than the second light scattering angle; the first edge slope is used for setting a conducting line. The invention can greatly save the area of the photosensitive resin coating under the condition of ensuring the conduction of the circuit, and can effectively reduce the area of the bridging point when being used in bridging connection.
Description
Technical Field
The invention relates to the technical field of touch screens, in particular to a patterned photosensitive resin coating, a manufacturing method thereof, a circuit structure and a capacitive touch screen.
Background
The patterned photosensitive resin coating obtained by coating and patterning (such as exposure and development) with photosensitive resin can be generally applied to capacitive touch screens as insulating layers of bridge points. The bridge point is a jumper structure commonly used on a capacitive touch screen, and generally comprises a first direction electrode, an insulating layer and a second direction electrode, wherein the first direction electrode passes through the bottom of the insulating layer along the first direction, and the second direction electrode crosses over the insulating layer along the second direction, so that the first direction electrode and the second direction electrode can be kept independently conducted in the respective directions without contacting.
The thickness of the photosensitive resin coating is typically 1 μm-20 μm, and the edges thereof are typically provided with a slope along which the conductive film layer (e.g., the above-described second-direction electrode) may climb over the edges of the insulating layer. In a capacitive touch screen, a conductive film layer such as an ITO film and a metal film (such as a Mo-Al-Mo alloy film) is generally manufactured by adopting a vacuum coating process such as magnetron sputtering, and when the gradient of a slope is overlarge, the thickness, uniformity and even integrity of the film formed by the conductive film layer on the slope are influenced, so that a circuit formed by the conductive film layer is easy to break; for this reason, it is generally required to control the slope angle of the slope within 15 ° at present to avoid the above-mentioned problems of the conductive film layer on the slope.
However, when the slope angle of the slope is too small, the slope becomes very wide, a large amount of photosensitive resin coating area is required, and when it is applied to the bridge point of the touch screen, the area of the bridge point has to be designed very large; in general, in the circuit film layer of the touch screen, there is a very large refractive index difference between the photosensitive resin coating and other film layers, and when the area of the bridge point is too large, the reflected light can cause the bridge point to look very obvious, so that the appearance of the capacitive touch screen is affected.
In addition, some capacitive touch screens also adopt the opening of the photosensitive resin coating to realize connection of two conductive film layers, and the opening also has the edge, so that the area of the opening is very large, and the circuit layout of the capacitive touch screen can be influenced.
Disclosure of Invention
The invention aims to solve the technical problem of providing a patterned photosensitive resin coating, a manufacturing method thereof, a circuit structure and a capacitive touch screen, wherein the patterned photosensitive resin coating not only can greatly save the area of the photosensitive resin coating under the condition of ensuring the conduction of a circuit, but also can effectively reduce the area of a bridging point in bridging connection. The technical scheme adopted is as follows:
a patterned photosensitive resin coating, characterized by: the photosensitive resin coating is provided with at least one first edge slope along the first axial direction, and the gradient angle of the first edge slope is smaller than that of other edge slopes; along the second axis, the photosensitive resin layer has at least one second edge slope, and the slope angle of the second edge slope is greater than the slope angle of the other edge slopes; the photosensitive resin coating is formed by coating negative photosensitive resin and performing exposure and solidification through an anisotropic ultraviolet light source, wherein the light scattering angle of the anisotropic ultraviolet light source at a first edge slope is a first light scattering angle, the light scattering angle of the anisotropic ultraviolet light source at a second edge slope is a second light scattering angle, the light scattering angles of the anisotropic ultraviolet light source at other edge slopes are other light scattering angles, the first light scattering angle is larger than the other light scattering angles, and the second light scattering angle is smaller than the other light scattering angles; the first edge slope is used for setting a conducting line.
Typically, the patterned photosensitive resin coating is disposed on a surface of the substrate; the first axial direction and the second axial direction are defined based on the surface of the substrate. In a preferred embodiment, the second axis is mutually orthogonal to the first axis.
In the patterned photosensitive resin coating, the gradient angle of the first edge slope is smaller than that of other edge slopes, and the conducting circuit is only arranged on the first edge slope, and the circuit is not conducted or key circuit is not conducted on other edge slopes with high gradient angles, so that the quantity of the first edge slopes is only required to be arranged, the edges of the photosensitive resin coating can be reduced without influencing the conduction of the circuit, a large quantity of photosensitive resin coating area is saved in the direction of the high gradient angle, the area of a bridging point can be effectively reduced in bridging connection, and the occurrence of the situation that the reflecting light of the bridging point causes the bridging point to be quite obvious due to the overlarge area of the bridging point can be avoided.
In a preferred embodiment, the first edge slope has a slope angle of 8 ° to 15 °. The wettability of the developing solution is improved by adding polyoxyethylene ether substances into the chemical components of the developing solution, so that the gradient angle of the first edge slope is 8-15 degrees.
Preferably, the second edge slope has a slope angle of 20-65 °.
In a preferred embodiment, the photosensitive resin coating has a rectangular cross-sectional shape having two first edge slopes disposed opposite to each other in the first axial direction and two second edge slopes disposed opposite to each other in the second axial direction.
The invention also provides a circuit structure, which comprises a first thin film wire, an insulating layer and a second thin film wire which are sequentially arranged on a substrate from inside to outside, and is characterized in that: the insulating layer is the patterned photosensitive resin coating, the first thin film wire penetrates through the bottom of the insulating layer along the first axial direction, and the second thin film wire sequentially crosses over a first edge slope of the insulating layer, the top of the insulating layer and another first edge slope along the second axial direction. This circuit configuration may be used as a jumper configuration.
In another preferred scheme, the upper surface of the photosensitive resin coating is provided with a square hole penetrating up and down, the cross section area of the square hole is gradually reduced from top to bottom, and the inner wall of the square hole is provided with two first edge slopes which are arranged oppositely along the first axial direction and two second edge slopes which are arranged oppositely along the second axial direction.
The invention also provides a circuit structure, which comprises a first conductive layer, an insulating layer and a second conductive layer which are sequentially arranged from inside to outside, and is characterized in that: the insulating layer is the patterned photosensitive resin coating, the first conductive layer extends to the bottom of the square hole, and the second conductive layer sequentially spans over and is in contact fit with one first edge slope of the insulating layer, the bottom of the square hole and the other first edge slope along the first axial direction. The inner and outer parts are respectively as follows: the side close to the substrate is inner, and the side far away from the substrate is outer. By adopting the structure, the electric connection between the first conductive layer and the second conductive layer can be realized through the square holes, the area of the opening can be effectively reduced, and the influence on the circuit layout of the capacitive touch screen is prevented. This circuit configuration may be used as a jumper configuration.
The invention also provides a capacitive touch screen, which is characterized in that: comprising the circuit structure.
The invention also provides a manufacturing method of the patterned photosensitive resin coating, which is characterized by comprising the following steps:
(1) Coating a negative photosensitive resin on one surface of the substrate to form a photosensitive resin coating;
(2) Exposing the photosensitive resin coating by using a pattern mask plate through an anisotropic ultraviolet light source, and enabling a first light scattering angle of the anisotropic ultraviolet light source along a first axial direction to be larger than other light scattering angles and enabling a second light scattering angle of the anisotropic ultraviolet light source along a second axial direction to be smaller than other light scattering angles;
(3) And developing the photosensitive resin coating to obtain a patterned photosensitive resin coating, and forming a first edge slope along a first axial direction and a second edge slope along a second axial direction on the patterned photosensitive resin coating, wherein the gradient angle of the first edge slope is smaller than the gradient angle of other edge slopes, and the gradient angle of the second edge slope is larger than the gradient angle of other edge slopes.
In the invention, the negative photosensitive resin is irradiated to part of the finally reserved photosensitive resin by ultraviolet light, and the photosensitive resin coating is subjected to anisotropic ultraviolet light source exposure curing and development to form a patterned photosensitive resin coating; since the first light scattering angle is larger than the other light scattering angles, the second light scattering angle is smaller than the other light scattering angles, namely, the first light scattering angle is larger than the second light scattering angle, the photosensitive resin coating can form a first edge slope along the first axial direction through the exposure and solidification of the anisotropic ultraviolet light source, a second edge slope is formed along the second axial direction, the gradient angle of the first edge slope is smaller than the gradient angle of the other edge slopes, and the gradient angle of the second edge slope is larger than the gradient angle of the other edge slopes.
In a preferred embodiment, in the step (2), the first light scattering angle is greater than 45 ° and the second light scattering angle is less than 30 °.
In a preferred embodiment, the anisotropic ultraviolet light source includes an ultraviolet lamp tube and two strip-shaped baffles, the ultraviolet lamp tube is disposed along a second axis, and the two strip-shaped baffles are disposed along the second axis and side by side on both sides of the ultraviolet lamp tube. Typically, the graphic mask is directly attached to the substrate. When the ultraviolet light emitted by the ultraviolet lamp tube passes through a gap between the lower edges of the two strip-shaped baffles, the ultraviolet light irradiates towards the photosensitive resin coating on the substrate through the non-shading part of the pattern mask, and the first light scattering angle of the anisotropic ultraviolet light source along the first axial direction is larger than other light scattering angles due to the blocking of the two strip-shaped baffles 52, the second light scattering angle along the second axial direction is smaller than other light scattering angles, and a first edge slope along the first axial direction and a second edge slope along the second axial direction can be formed on the patterned photosensitive resin coating.
In another preferred scheme, the anisotropic ultraviolet light source comprises an ultraviolet lamp tube and a plurality of U-shaped baffle plates, wherein each U-shaped baffle plate is sequentially overlapped to form a baffle plate group with a strip-shaped cavity, and the ultraviolet lamp tube is positioned in the strip-shaped cavity. Typically, the graphic mask is directly attached to the substrate. When the ultraviolet light source works, ultraviolet light emitted by the ultraviolet lamp tube passes through gaps among the lower edges of the U-shaped baffle plates, and irradiates towards the photosensitive resin coating on the substrate through the non-shading part of the pattern mask plate, and as the ultraviolet light source is blocked by the U-shaped baffle plates, the first light scattering angle of the anisotropic ultraviolet light source along the first axial direction is larger than other light scattering angles, the second light scattering angle along the second axial direction is smaller than other light scattering angles, and the angles at the two ends of the ultraviolet lamp tube are better consistent with the middle.
The invention adopts an ultraviolet lamp with anisotropic scattering angle to expose negative photosensitive resin coated on a substrate so as to manufacture a patterned photosensitive resin coating with anisotropic gradient angle; in the imaging photosensitive resin coating, the gradient angle of the first edge slope is smaller than that of other edge slopes, and a conducting circuit is arranged on the first edge slope, and the other edge slopes at the high gradient angle are not arranged to conduct a circuit or are not arranged to conduct a key circuit, so that only a small number of first edge slopes are needed, the edges of the photosensitive resin coating can be reduced without influencing the conduction of the circuit, a large amount of photosensitive resin coating area is saved in the direction of the high gradient angle, the area of a bridging point can be effectively reduced in bridging connection, and the situation that the bridging point looks very obvious due to reflected light caused by the overlarge area of the bridging point can be avoided, so that the influence on the appearance of a circuit structure and a capacitive touch screen is prevented.
Drawings
Fig. 1 is a schematic structural view of a patterned photosensitive resin coating according to an embodiment of the present invention.
Fig. 2 is a right side view of fig. 1.
Fig. 3 is a schematic structural diagram of a circuit structure according to a first embodiment of the present invention.
Fig. 4 is a schematic structural diagram of a capacitive touch screen according to an embodiment of the present invention.
Fig. 5 is a schematic diagram of the cooperation between the anisotropic uv light source, the pattern mask and the substrate according to the first embodiment of the present invention.
Fig. 6 is a right side view of fig. 5.
Fig. 7 is a schematic structural diagram of an anisotropic uv light source according to a second embodiment of the present invention.
Fig. 8 is a schematic structural diagram of a circuit structure according to a third embodiment of the present invention.
Detailed Description
Example 1
As shown in fig. 1 to 6, such a patterned photosensitive resin coating 1 is provided on a surface of a substrate 0, defining first and second axial directions orthogonal to each other based on the surface of the substrate 0; in the first axial direction, the photosensitive resin coating 1 has at least one first edge slope 11, and the slope angle of the first edge slope 11 is smaller than the slope angles of the other edge slopes; along the second axis, the photosensitive resin layer 1 has at least one second edge slope 12, and the slope angle of the second edge slope 12 is larger than that of the other edge slopes; the photosensitive resin coating 1 is formed by coating negative photosensitive resin and exposing and curing by an anisotropic ultraviolet light source 5, wherein the light scattering angle of the anisotropic ultraviolet light source 5 at a first edge slope 11 is a first light scattering angle 501, the light scattering angle of the anisotropic ultraviolet light source 5 at a second edge slope 12 is a second light scattering angle 502, the light scattering angles of the anisotropic ultraviolet light source 5 at other edge slopes are other light scattering angles, the first light scattering angle 501 is larger than the other light scattering angles, and the second light scattering angle 502 is smaller than the other light scattering angles; the first edge ramp 11 is used to set the conductive line.
In the present embodiment, the gradient angle of the first edge slope 11 is 8-15 °; the slope angle of the second edge slope 12 is 20-65 °.
In the present embodiment, the photosensitive resin coating 1 has a rectangular cross-sectional shape having two first edge slopes 11 disposed opposite to each other in the first axial direction and two second edge slopes 12 disposed opposite to each other in the second axial direction.
The circuit structure 2 provided in this embodiment includes a first thin film wire 21, an insulating layer 22 and a second thin film wire 23 sequentially disposed on the substrate 0 from inside to outside, the insulating layer 22 is the patterned photosensitive resin coating 1, the first thin film wire 21 passes through the bottom of the insulating layer 22 along a first axial direction, and the second thin film wire 23 sequentially crosses over a first edge slope 11, the top of the insulating layer 22 and another first edge slope 11 of the insulating layer 22 along a second axial direction. This circuit configuration 2 can be used as a jumper configuration.
The capacitive touch screen 3 provided in this embodiment includes the circuit structure 2.
The manufacturing method of the patterned photosensitive resin coating 1 comprises the following steps:
(1) A negative photosensitive resin is coated on one surface of the substrate 0 to form a photosensitive resin coating 1;
(2) Exposing the photosensitive resin coating 1 by using a pattern mask plate 4 through an anisotropic ultraviolet light source 5, wherein a first light scattering angle 501 of the anisotropic ultraviolet light source 5 along a first axial direction is larger than other light scattering angles, and a second light scattering angle 502 of the anisotropic ultraviolet light source 5 along a second axial direction is smaller than other light scattering angles;
(3) Developing the photosensitive resin coating 1 to obtain a patterned photosensitive resin coating 1, and forming a first edge slope 11 along a first axial direction and a second edge slope 12 along a second axial direction on the patterned photosensitive resin coating 1, wherein the gradient angle of the first edge slope 11 is smaller than the gradient angle of the other edge slopes, and the gradient angle of the second edge slope 12 is larger than the gradient angle of the other edge slopes.
In this embodiment, in the step (2), the first light scattering angle 501 is greater than 45 ° and the second light scattering angle 502 is less than 30 °.
In the present embodiment, the anisotropic ultraviolet light source 5 includes an ultraviolet lamp tube 51 and two strip-shaped shutters 52, the ultraviolet lamp tube 51 being disposed along a second axis, the two strip-shaped shutters 52 being disposed along the second axis and side by side on both sides of the ultraviolet lamp tube 51. Typically, the graphics mask 4 is directly attached to the substrate 0. In operation, after the ultraviolet light emitted by the ultraviolet lamp 51 passes through the gap between the lower edges of the two strip baffles 52, the ultraviolet light irradiates the photosensitive resin coating 1 on the substrate 0 through the non-shading part of the pattern mask plate 4, and due to the blocking of the two strip baffles 52, the first light scattering angle 501 of the anisotropic ultraviolet light source 5 along the first axial direction can be made larger than other light scattering angles, the second light scattering angle 502 along the second axial direction is made smaller than other light scattering angles, and the first edge slope 11 along the first axial direction and the second edge slope 12 along the second axial direction can be formed on the patterned photosensitive resin coating 1.
Example two
Referring to fig. 7, in the case where the other portions are the same as in the first embodiment, the difference is that: in this embodiment, the anisotropic uv light source 5' includes a uv lamp tube 51' and a plurality of U-shaped baffles 52', and each of the U-shaped baffles 52' is stacked in sequence to form a baffle group having a strip-shaped cavity, in which the uv lamp tube 51' is located. The pattern mask 4 is directly attached to the substrate 0. When the ultraviolet light source works, after ultraviolet light emitted by the ultraviolet lamp tube 51' passes through gaps between the lower edges of the U-shaped baffle plates 52', the ultraviolet light source irradiates towards the photosensitive resin coating 1 on the substrate 0 through the non-shading parts of the pattern mask plate 4, and as being blocked by the U-shaped baffle plates 52', the first light scattering angle 501 of the anisotropic ultraviolet light source 5' along the first axial direction is larger than other light scattering angles, the second light scattering angle 502 along the second axial direction is smaller than other light scattering angles, and the angles at the two ends of the ultraviolet lamp tube 51' are better consistent with the middle.
Example III
Referring to fig. 8, in the case where the other portions are the same as in embodiment one, the difference is that: in the present embodiment, a square hole 10 penetrating up and down is provided on the upper surface of the photosensitive resin coating 1, and the cross-sectional area of the square hole 10 becomes smaller from top to bottom, and the inner wall of the square hole 10 has two first edge slopes 11 provided opposite to each other in the first axial direction and two second edge slopes 12 provided opposite to each other in the second axial direction.
The circuit structure 2' provided in this embodiment includes a first conductive layer 21', an insulating layer 22', and a second conductive layer 23' sequentially disposed on the substrate 0 from inside to outside, wherein the insulating layer 22' is the patterned photosensitive resin coating 1, the first conductive layer 21' extends to the bottom of the square hole 10, and the second conductive layer 23' sequentially spans from a first edge slope 11 of the insulating layer 22', the bottom of the square hole 10, and another first edge slope 11 along the first axial direction and is in contact fit with the first conductive layer 21 '. With this structure, electrical connection between the first conductive layer 21 'and the second conductive layer 23' can be achieved through the square hole 10, and the area of the opening can be effectively reduced, preventing influence on the circuit layout. This circuit configuration 2' may be referred to as a jumper configuration.
In addition, it should be noted that, in the specific embodiments described in the present specification, names of various parts and the like may be different, and all equivalent or simple changes of the structures, features and principles described in the conception of the present invention are included in the protection scope of the present invention. Those skilled in the art may make various modifications or additions to the described embodiments or substitutions in a similar manner without departing from the scope of the invention as defined in the accompanying claims.
Claims (10)
1. A patterned photosensitive resin coating, characterized by: the photosensitive resin coating is provided with at least one first edge slope along the first axial direction, and the gradient angle of the first edge slope is smaller than that of other edge slopes; along the second axis, the photosensitive resin layer has at least one second edge slope, and the slope angle of the second edge slope is greater than the slope angle of the other edge slopes; the photosensitive resin coating is formed by coating negative photosensitive resin and exposing and curing by an anisotropic ultraviolet light source, wherein the anisotropic ultraviolet light source adopts an anisotropic ultraviolet light source with a scattering angle, the light scattering angle of the anisotropic ultraviolet light source at a first edge slope is a first light scattering angle, the light scattering angle of the anisotropic ultraviolet light source at a second edge slope is a second light scattering angle, the light scattering angles of the anisotropic ultraviolet light source at other edge slopes are other light scattering angles, the first light scattering angle is larger than the other light scattering angles, and the second light scattering angle is smaller than the other light scattering angles; the first edge slope is used for setting a conducting line.
2. A patterned photosensitive resin coating according to claim 1, wherein: the second axis is mutually orthogonal to the first axis; the gradient angle of the first edge slope is 8-15 degrees; the second edge slope has a slope angle of 20-65 °.
3. A patterned photosensitive resin coating according to claim 1, wherein: the photosensitive resin coating has a rectangular cross-sectional shape having two first edge slopes disposed opposite to each other in a first axial direction and two second edge slopes disposed opposite to each other in a second axial direction.
4. A patterned photosensitive resin coating according to claim 1, wherein: the upper surface of the photosensitive resin coating is provided with a square hole penetrating up and down, the cross section area of the square hole is gradually reduced from top to bottom, and the inner wall of the square hole is provided with two first edge slopes which are arranged oppositely along a first axial direction and two second edge slopes which are arranged oppositely along a second axial direction.
5. The utility model provides a circuit structure, includes from inside to outside setting gradually first film wire, insulating layer and the second film wire on the base plate, its characterized in that: the insulating layer is the patterned photosensitive resin coating of claim 3, the first thin film wire passes through the bottom of the insulating layer along a first axial direction, and the second thin film wire sequentially crosses over a first edge slope of the insulating layer, the top of the insulating layer, and another first edge slope along a second axial direction.
6. The utility model provides a circuit structure, includes from interior first conducting layer, insulating layer and the second conducting layer that sets gradually outward, its characterized in that: the insulating layer is the patterned photosensitive resin coating of claim 4, the first conductive layer extends to the bottom of the square hole, and the second conductive layer sequentially spans over and is in contact fit with one first edge slope of the insulating layer, the bottom of the square hole and the other first edge slope along the first axial direction.
7. A capacitive touch screen, characterized by: comprising the circuit arrangement of claim 5 or 6.
8. The method for manufacturing the patterned photosensitive resin coating is characterized by comprising the following steps of:
(1) Coating a negative photosensitive resin on one surface of the substrate to form a photosensitive resin coating;
(2) Exposing the photosensitive resin coating by using a pattern mask plate through an anisotropic ultraviolet light source, wherein the anisotropic ultraviolet light source adopts an anisotropic ultraviolet light source with a scattering angle, and the first light scattering angle of the anisotropic ultraviolet light source along a first axial direction is larger than other light scattering angles, and the second light scattering angle of the anisotropic ultraviolet light source along a second axial direction is smaller than other light scattering angles;
(3) And developing the photosensitive resin coating to obtain a patterned photosensitive resin coating, and forming a first edge slope along a first axial direction and a second edge slope along a second axial direction on the patterned photosensitive resin coating, wherein the gradient angle of the first edge slope is smaller than the gradient angle of other edge slopes, and the gradient angle of the second edge slope is larger than the gradient angle of other edge slopes.
9. The method of making a patterned photosensitive resin coating according to claim 8, wherein: in the step (2), the first light scattering angle is larger than 45 degrees, and the second light scattering angle is smaller than 30 degrees.
10. The method of making a patterned photosensitive resin coating according to claim 8, wherein: the anisotropic ultraviolet light source comprises an ultraviolet lamp tube and two strip-shaped baffles, the ultraviolet lamp tube is arranged along a second axis, and the two strip-shaped baffles are arranged along the second axis and are arranged on two sides of the ultraviolet lamp tube side by side; or the anisotropic ultraviolet light source comprises an ultraviolet lamp tube and a plurality of U-shaped baffle plates, wherein each U-shaped baffle plate is sequentially overlapped to form a baffle plate group with a strip-shaped cavity, and the ultraviolet lamp tube is positioned in the strip-shaped cavity.
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