CN113296361A - Graphical photosensitive resin coating, manufacturing method thereof, circuit structure and capacitive touch screen - Google Patents
Graphical photosensitive resin coating, manufacturing method thereof, circuit structure and capacitive touch screen Download PDFInfo
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- CN113296361A CN113296361A CN202110602960.5A CN202110602960A CN113296361A CN 113296361 A CN113296361 A CN 113296361A CN 202110602960 A CN202110602960 A CN 202110602960A CN 113296361 A CN113296361 A CN 113296361A
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- 239000011347 resin Substances 0.000 title claims abstract description 94
- 229920005989 resin Polymers 0.000 title claims abstract description 94
- 239000011248 coating agent Substances 0.000 title claims abstract description 77
- 238000000576 coating method Methods 0.000 title claims abstract description 77
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 9
- 238000000149 argon plasma sintering Methods 0.000 claims abstract description 70
- 239000010410 layer Substances 0.000 claims description 59
- 239000000758 substrate Substances 0.000 claims description 22
- 239000010408 film Substances 0.000 claims description 18
- 239000011247 coating layer Substances 0.000 claims description 6
- 239000010409 thin film Substances 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 4
- 238000010586 diagram Methods 0.000 description 6
- 230000000903 blocking effect Effects 0.000 description 4
- 239000000126 substance Substances 0.000 description 2
- 241001391944 Commicarpus scandens Species 0.000 description 1
- 229910001182 Mo alloy Inorganic materials 0.000 description 1
- 238000007792 addition Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 229940051841 polyoxyethylene ether Drugs 0.000 description 1
- 229920000056 polyoxyethylene ether Polymers 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
- G06F3/0445—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using two or more layers of sensing electrodes, e.g. using two layers of electrodes separated by a dielectric layer
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- General Engineering & Computer Science (AREA)
- Theoretical Computer Science (AREA)
- Human Computer Interaction (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Position Input By Displaying (AREA)
Abstract
The invention relates to a graphical photosensitive resin coating, a manufacturing method thereof, a circuit structure and a capacitive touch screen, wherein the photosensitive resin coating is provided with at least one first edge slope along a first axial direction, and the slope angle of the first edge slope is smaller than that of other edge slopes; the photosensitive resin layer is provided with at least one second edge slope along a second axial direction, and the slope angle of the second edge slope is larger than that of other edge slopes; the photosensitive resin coating is formed by coating negative photosensitive resin and exposing and curing the negative photosensitive resin by an anisotropic ultraviolet light source, wherein the light scattering angle of the anisotropic ultraviolet light source at a first edge slope is a first light scattering angle, the light scattering angle of the anisotropic ultraviolet light source at a second edge slope is a second light scattering angle, and the first light scattering angle is larger than the second light scattering angle; the first edge slope is used for setting a conducting line. The invention can greatly save the area of the photosensitive resin coating under the condition of ensuring the circuit conduction, and can effectively reduce the area of a bridge point when being used in bridging connection.
Description
Technical Field
The invention relates to the technical field of touch screens, in particular to a graphical photosensitive resin coating, a manufacturing method thereof, a circuit structure and a capacitive touch screen.
Background
The patterned photosensitive resin coating, which is formed by coating and patterning (e.g., exposing and developing) the photosensitive resin, is generally applied to the capacitive touch screen as an insulating layer of the bridge points. The bridge point is a jumper structure commonly used on a capacitive touch screen, and generally comprises a first direction electrode, an insulating layer and a second direction electrode, wherein the first direction electrode penetrates through the bottom of the insulating layer along a first direction, and the second direction electrode crosses over the insulating layer along a second direction, so that the first direction electrode and the second direction electrode are not in contact and can be kept independently conducted in respective directions.
The photosensitive resin coating is typically 1 μm-20 μm thick, and has a slope at its edge, along which the overlying conductive film layer (e.g., the second-direction electrode) may climb over the edge of the insulating layer. In a capacitive touch screen, a conductive film layer such as an ITO film and a metal film (such as a Mo-Al-Mo alloy film) is generally manufactured by adopting a vacuum coating process such as magnetron sputtering, when the gradient of a slope is overlarge, the thickness, uniformity and even integrity of the film formed on the slope of the conductive film layer are affected, and therefore a circuit formed by the conductive film layer is easy to break; therefore, the slope angle of the slope is generally controlled within 15 ° at present, so as to avoid the above problem of the conductive film layer on the slope.
However, when the slope angle of the slope is too small, the slope becomes very wide, a large amount of photosensitive resin coating area is occupied, and when the slope is applied to a bridge point of a touch screen, the area of the bridge point has to be designed to be very large; generally, in the circuit film layers of the touch screen, the photosensitive resin coating has a very large refractive index difference with other film layers, and when the area of the bridge point is too large, the reflected light of the photosensitive resin coating causes the bridge point to be very obvious, which affects the appearance of the capacitive touch screen.
In addition, some capacitive touch screens also adopt the opening of the photosensitive resin coating to realize the connection of two conductive film layers, and the opening also has the edge, so that the area of the opening is very large, and the circuit layout of the capacitive touch screen can be influenced.
Disclosure of Invention
The invention aims to solve the technical problem of providing a graphical photosensitive resin coating, a manufacturing method thereof, a circuit structure and a capacitive touch screen. The technical scheme is as follows:
a patterned photosensitive resin coating, comprising: the photosensitive resin coating layer has at least one first edge slope, the slope angle of which is smaller than those of the other edge slopes, in a first axial direction; the photosensitive resin layer is provided with at least one second edge slope along a second axial direction, and the slope angle of the second edge slope is larger than that of other edge slopes; the photosensitive resin coating is formed by coating negative photosensitive resin and exposing and curing the negative photosensitive resin by an anisotropic ultraviolet light source, wherein the light scattering angle of the anisotropic ultraviolet light source at a first edge slope is a first light scattering angle, the light scattering angle of the anisotropic ultraviolet light source at a second edge slope is a second light scattering angle, the light scattering angles of the anisotropic ultraviolet light source at other edge slopes are other light scattering angles, the first light scattering angle is larger than the other light scattering angles, and the second light scattering angle is smaller than the other light scattering angles; the first edge slope is used for setting a conducting line.
Generally, the patterned photosensitive resin coating is disposed on one surface of a substrate; the first and second axial directions are defined based on the substrate surface. Preferably, the second axis is orthogonal to the first axis.
Among the above-mentioned graphical photosensitive resin coating, because the slope angle of first edge slope is less than the slope angle of other edge slopes, and only set up at first edge slope and switch on the circuit, other edge slopes at high slope angle do not arrange the circuit and switch on or do not arrange critical circuit and switch on, so only need set up less first edge slope of quantity can, the edge of its photosensitive resin coating can reduce and can not influence the switching on of circuit, a large amount of photosensitive resin coating areas have been saved in the direction at high slope angle, and be used in the area that can effectively reduce the bridge point in the bridging connection, can avoid making the very obvious condition of bridge point look appear because of the too big and its reverberation of area that leads to the bridge point.
In a preferred scheme, the slope angle of the first edge slope is 8-15 degrees. The wetting property of the developing solution is improved by adding polyoxyethylene ether substances into the chemical components of the developing solution, so that the slope angle of the first edge slope is 8-15 degrees.
In a preferable scheme, the slope angle of the second edge slope is 20-65 degrees.
In a preferred embodiment, the photosensitive resin coating layer has a rectangular cross-sectional shape having two first edge slopes disposed in a first axial direction and opposite to each other and two second edge slopes disposed in a second axial direction and opposite to each other.
The invention also provides a circuit structure, which comprises a first film wire, an insulating layer and a second film wire which are arranged on the substrate from inside to outside in sequence, and is characterized in that: the insulating layer is the graphical photosensitive resin coating, the first film wire penetrates through the bottom of the insulating layer along a first axial direction, and the second film wire sequentially crosses over a first edge slope of the insulating layer, the top of the insulating layer and the other first edge slope along a second axial direction. Such a circuit structure may be used as a jumper structure.
In another preferred embodiment, a square hole penetrating through the upper surface of the photosensitive resin coating is formed, the cross-sectional area of the square hole gradually decreases from top to bottom, and the inner wall of the square hole has two first edge slopes arranged along a first axial direction and opposite to each other and two second edge slopes arranged along a second axial direction and opposite to each other.
The invention also provides a circuit structure, which comprises a first conducting layer, an insulating layer and a second conducting layer which are sequentially arranged from inside to outside, and is characterized in that: the insulating layer is the graphical photosensitive resin coating, the first conducting layer extends to the bottom of the square hole, and the second conducting layer sequentially crosses over a first edge slope, the bottom of the square hole and the other first edge slope of the insulating layer along a first axial direction and is in contact fit with the first conducting layer. The inner part and the outer part are respectively as follows: one side close to the substrate is inner, and the other side far away from the substrate is outer. By adopting the structure, the electric connection between the first conducting layer and the second conducting layer can be realized through the square hole, the area of the opening hole can be effectively reduced, and the influence on the circuit layout of the capacitive touch screen is prevented. Such a circuit structure may be used as a jumper structure.
The invention also provides a capacitive touch screen, which is characterized in that: the circuit structure is included.
The invention also provides a manufacturing method of the graphical photosensitive resin coating, which is characterized by comprising the following steps:
(1) coating negative photosensitive resin on one surface of the substrate to form a photosensitive resin coating;
(2) exposing the photosensitive resin coating by using an anisotropic ultraviolet light source through a graphic mask plate, and enabling a first light scattering angle of the anisotropic ultraviolet light source along a first axial direction to be larger than other light scattering angles and a second light scattering angle of the anisotropic ultraviolet light source along a second axial direction to be smaller than other light scattering angles;
(3) and developing the photosensitive resin coating to obtain a graphical photosensitive resin coating, and forming a first edge slope along a first axial direction and a second edge slope along a second axial direction on the graphical photosensitive resin coating, wherein the slope angle of the first edge slope is smaller than that of other edge slopes, and the slope angle of the second edge slope is larger than that of other edge slopes.
In the invention, the negative photosensitive resin is photosensitive resin which is finally remained by being irradiated by ultraviolet light, and the photosensitive resin coating is exposed, cured and developed by an anisotropic ultraviolet light source to form a graphical photosensitive resin coating; the photosensitive resin coating can form a first edge slope along the first axial direction and a second edge slope along the second axial direction after being exposed and cured by the anisotropic ultraviolet light source, wherein the slope angle of the first edge slope is smaller than that of the other edge slopes, and the slope angle of the second edge slope is larger than that of the other edge slopes.
Preferably, in the step (2), the first light scattering angle is greater than 45 °, and the second light scattering angle is less than 30 °.
In a preferred embodiment, the anisotropic ultraviolet light source includes an ultraviolet lamp tube and two strip-shaped baffles, the ultraviolet lamp tube is disposed along the second axial direction, and the two strip-shaped baffles are disposed along the second axial direction and are disposed side by side at two sides of the ultraviolet lamp tube. Typically, the patterned mask is attached directly to the substrate. When the ultraviolet lamp works, ultraviolet light emitted by the ultraviolet lamp tube penetrates through a gap between the lower edges of the two strip-shaped baffles and irradiates towards the photosensitive resin coating on the substrate through the non-shading part of the pattern mask plate, and due to the blocking of the two strip-shaped baffles 52, a first light scattering angle of the anisotropic ultraviolet light source along a first axial direction is larger than other light scattering angles, a second light scattering angle along a second axial direction is smaller than other light scattering angles, and a first edge slope along the first axial direction and a second edge slope along the second axial direction can be formed on the patterned photosensitive resin coating.
In another preferred scheme, the anisotropic ultraviolet light source comprises an ultraviolet lamp tube and a plurality of U-shaped baffle plates, wherein the U-shaped baffle plates are sequentially overlapped and arranged to form a baffle plate group with a strip-shaped cavity, and the ultraviolet lamp tube is positioned in the strip-shaped cavity. Typically, the patterned mask is attached directly to the substrate. When the ultraviolet lamp works, ultraviolet light emitted by the ultraviolet lamp tube penetrates through gaps between the lower edges of the U-shaped blocking pieces and irradiates towards the photosensitive resin coating on the substrate through the non-shading part of the graphic mask plate, and due to the blocking of the U-shaped blocking pieces, a first light scattering angle of the anisotropic ultraviolet light source along a first axial direction is larger than other light scattering angles, a second light scattering angle of the anisotropic ultraviolet light source along a second axial direction is smaller than other light scattering angles, and the consistency between the angles of two ends of the ultraviolet lamp tube and the middle is better.
The invention adopts an ultraviolet lamp with anisotropic scattering angle to expose the negative photosensitive resin coated on the substrate to manufacture a patterned photosensitive resin coating with anisotropic slope angle; in the graphical photosensitive resin coating, because the slope angle of first edge slope is less than the slope angle of other edge slopes, and only set up at first edge slope and switch on the circuit, it switches on or does not arrange the circuit at other edge slopes of high slope angle and switches on to arrange critical circuit, so only need set up less first edge slope of quantity can, the edge of its photosensitive resin coating can reduce and can not influence the switching on of circuit, a large amount of photosensitive resin coating areas have been saved in the direction of high slope angle, and be used in the area that can effectively reduce the bridge point in bridging connection, can avoid making the very obvious condition of bridge point look appear because of its reverberation of too big area messenger's bridge point of bridge point, in order to prevent that the outward appearance of circuit structure and capacitive touch screen from receiving the influence.
Drawings
Fig. 1 is a schematic structural diagram of a patterned photosensitive resin coating layer according to an embodiment of the present invention.
Fig. 2 is a right side view of fig. 1.
Fig. 3 is a schematic structural diagram of a circuit structure according to a first preferred embodiment of the present invention.
Fig. 4 is a schematic structural diagram of a capacitive touch screen according to a preferred embodiment of the present invention.
Fig. 5 is a schematic diagram of the cooperation between the anisotropic uv light source, the mask pattern and the substrate according to a first preferred embodiment of the present invention.
Fig. 6 is a right side view of fig. 5.
Fig. 7 is a schematic structural diagram of an anisotropic ultraviolet light source provided in example two of the preferred embodiments of the present invention.
Fig. 8 is a schematic structural diagram of a circuit structure provided in a third embodiment of the present invention.
Detailed Description
Example one
As shown in fig. 1 to 6, this patterned photosensitive resin coating layer 1, which is provided on one surface of the substrate 0, defines a first axial direction and a second axial direction orthogonal to each other based on the surface of the substrate 0; the photosensitive resin coating 1 has at least one first edge slope 11 along a first axis direction, and the slope angle of the first edge slope 11 is smaller than that of the other edge slopes; the photosensitive resin layer 1 has at least one second edge slope 12 along a second axial direction, and the slope angle of the second edge slope 12 is greater than that of the other edge slopes; the photosensitive resin coating 1 is formed by coating a negative photosensitive resin and exposing and curing the negative photosensitive resin by an anisotropic ultraviolet light source 5, wherein the light scattering angle of the anisotropic ultraviolet light source 5 at a first edge slope 11 is a first light scattering angle 501, the light scattering angle of the anisotropic ultraviolet light source 5 at a second edge slope 12 is a second light scattering angle 502, the light scattering angle of the anisotropic ultraviolet light source 5 at other edge slopes is other light scattering angles, the first light scattering angle 501 is larger than the other light scattering angles, and the second light scattering angle 502 is smaller than the other light scattering angles; the first edge ramp 11 is used to set a conducting line.
In the embodiment, the slope angle of the first edge slope 11 is 8-15 °; the slope angle of the second edge slope 12 is 20 to 65 °.
In the present embodiment, the photosensitive resin coating 1 has a rectangular cross-sectional shape having two first edge slopes 11 arranged in a first axial direction and opposed to each other and two second edge slopes 12 arranged in a second axial direction and opposed to each other.
The circuit structure 2 provided by this embodiment includes a first thin film wire 21, an insulating layer 22 and a second thin film wire 23 sequentially disposed on the substrate 0 from inside to outside, the insulating layer 22 is the patterned photosensitive resin coating 1, the first thin film wire 21 passes through the bottom of the insulating layer 22 along a first axial direction, and the second thin film wire 23 sequentially passes over a first edge slope 11 of the insulating layer 22, the top of the insulating layer 22 and another first edge slope 11 along a second axial direction. Such a circuit configuration 2 can be used as a jumper configuration.
The capacitive touch screen 3 provided by the embodiment comprises the circuit structure 2.
The manufacturing method of the graphical photosensitive resin coating 1 comprises the following steps:
(1) coating negative photosensitive resin on one surface of the substrate 0 to form a photosensitive resin coating layer 1;
(2) exposing the photosensitive resin coating 1 by using an anisotropic ultraviolet light source 5 by using a graphic mask 4, and enabling a first light scattering angle 501 of the anisotropic ultraviolet light source 5 along a first axial direction to be larger than other light scattering angles and a second light scattering angle 502 of the anisotropic ultraviolet light source 5 along a second axial direction to be smaller than other light scattering angles;
(3) developing the photosensitive resin coating 1 to obtain a patterned photosensitive resin coating 1, and forming a first edge slope 11 along a first axial direction and a second edge slope 12 along a second axial direction on the patterned photosensitive resin coating 1, wherein the slope angle of the first edge slope 11 is smaller than that of other edge slopes, and the slope angle of the second edge slope 12 is larger than that of other edge slopes.
In this embodiment, in step (2), the first light scattering angle 501 is greater than 45 °, and the second light scattering angle 502 is less than 30 °.
In the present embodiment, the anisotropic ultraviolet light source 5 includes an ultraviolet lamp tube 51 and two strip-shaped baffles 52, the ultraviolet lamp tube 51 is disposed along the second axial direction, and the two strip-shaped baffles 52 are disposed along the second axial direction and are disposed side by side on two sides of the ultraviolet lamp tube 51. Typically, the patterned mask 4 is attached directly to the substrate 0. In operation, after passing through the gap between the lower edges of the two bar-shaped baffles 52, the ultraviolet light emitted from the ultraviolet lamp 51 is irradiated toward the photosensitive resin coating 1 on the substrate 0 through the non-light-shielding portion of the pattern mask 4, and the light is blocked by the two bar-shaped baffles 52, so that the first light scattering angle 501 of the anisotropic ultraviolet light source 5 along the first axial direction is larger than other light scattering angles, and the second light scattering angle 502 along the second axial direction is smaller than other light scattering angles, so that the first edge slope 11 along the first axial direction and the second edge slope 12 along the second axial direction can be formed on the patterned photosensitive resin coating 1.
Example two
Referring to fig. 7, in the case where the other parts are the same as those of the first embodiment, the difference is: in the present embodiment, the anisotropic uv light source 5 ' includes a uv lamp tube 51 ' and a plurality of U-shaped baffles 52 ', each U-shaped baffle 52 ' is stacked in sequence to form a baffle group having a bar-shaped cavity, and the uv lamp tube 51 ' is located in the bar-shaped cavity. The pattern mask 4 is directly attached to the substrate 0. In operation, after passing through the gaps between the lower edges of the U-shaped baffles 52 ', the ultraviolet light emitted by the ultraviolet lamp tube 51 ' is irradiated toward the photosensitive resin coating 1 on the substrate 0 through the non-light-shielding portions of the pattern mask 4, and is blocked by the U-shaped baffles 52 ', so that the first light scattering angle 501 of the anisotropic ultraviolet light source 5 ' along the first axial direction is larger than other light scattering angles, the second light scattering angle 502 along the second axial direction is smaller than other light scattering angles, and the angles of the two ends of the ultraviolet lamp tube 51 ' are better consistent with the middle.
EXAMPLE III
Referring to fig. 8, in the case where the other parts are the same as those of the first embodiment, the difference is: in this embodiment, a square hole 10 is provided on the upper surface of the photosensitive resin coating 1, the square hole 10 having a cross-sectional area gradually decreasing from top to bottom, and the inner wall of the square hole 10 has two first edge slopes 11 arranged in a first axial direction and opposite to each other and two second edge slopes 12 arranged in a second axial direction and opposite to each other.
The circuit structure 2 ' provided by this embodiment includes a first conductive layer 21 ', an insulating layer 22 ', and a second conductive layer 23 ' sequentially disposed on the substrate 0 from inside to outside, where the insulating layer 22 ' is the patterned photosensitive resin coating 1, the first conductive layer 21 ' extends to the bottom of the square hole 10, and the second conductive layer 23 ' sequentially crosses over a first edge slope 11 of the insulating layer 22 ', the bottom of the square hole 10, and another first edge slope 11 along the first axial direction and is in contact with the first conductive layer 21 '. With this structure, the electrical connection between the first conductive layer 21 'and the second conductive layer 23' can be achieved through the square hole 10, and the area of the opening can be effectively reduced, preventing the circuit layout from being affected. Such a circuit configuration 2' can be used as a jumper configuration.
In addition, it should be noted that the names of the parts and the like of the embodiments described in the present specification may be different, and the equivalent or simple change of the structure, the characteristics and the principle described in the present patent idea is included in the protection scope of the present patent. Various modifications, additions and substitutions for the specific embodiments described may be made by those skilled in the art without departing from the scope of the invention as defined in the accompanying claims.
Claims (10)
1. A patterned photosensitive resin coating, comprising: the photosensitive resin coating layer has at least one first edge slope, the slope angle of which is smaller than those of the other edge slopes, in a first axial direction; the photosensitive resin layer is provided with at least one second edge slope along a second axial direction, and the slope angle of the second edge slope is larger than that of other edge slopes; the photosensitive resin coating is formed by coating negative photosensitive resin and exposing and curing the negative photosensitive resin by an anisotropic ultraviolet light source, wherein the light scattering angle of the anisotropic ultraviolet light source at a first edge slope is a first light scattering angle, the light scattering angle of the anisotropic ultraviolet light source at a second edge slope is a second light scattering angle, the light scattering angles of the anisotropic ultraviolet light source at other edge slopes are other light scattering angles, the first light scattering angle is larger than the other light scattering angles, and the second light scattering angle is smaller than the other light scattering angles; the first edge slope is used for setting a conducting line.
2. A patterned photosensitive resin coating according to claim 1, wherein: a second axis orthogonal to the first axis; the slope angle of the first edge slope is 8-15 degrees; the slope angle of the second edge slope is 20-65 degrees.
3. A patterned photosensitive resin coating according to claim 1, wherein: the photosensitive resin coating has a rectangular cross-sectional shape having two first edge slopes disposed in a first axial direction and opposite to each other and two second edge slopes disposed in a second axial direction and opposite to each other.
4. A patterned photosensitive resin coating according to claim 1, wherein: the upper surface of the photosensitive resin coating is provided with a square hole which penetrates through the photosensitive resin coating from top to bottom, the cross section area of the square hole is gradually reduced from top to bottom, and the inner wall of the square hole is provided with two first edge slopes which are arranged along a first axial direction and are opposite to each other and two second edge slopes which are arranged along a second axial direction and are opposite to each other.
5. The utility model provides a circuit structure, includes from inside to outside sets gradually first film wire, insulating layer and the second film wire on the base plate, its characterized in that: the insulating layer is the patterned photosensitive resin coating of claim 3, the first thin film wire passes through the bottom of the insulating layer in a first axial direction, and the second thin film wire sequentially crosses over a first edge slope of the insulating layer, the top of the insulating layer, and another first edge slope in a second axial direction.
6. The utility model provides a circuit structure, includes first conducting layer, insulating layer and the second conducting layer that sets gradually from inside to outside, its characterized in that: the insulating layer is the patterned photosensitive resin coating of claim 4, the first conductive layer extends to the bottom of the square hole, and the second conductive layer crosses over and is in contact fit with the first conductive layer from a first edge slope of the insulating layer, the bottom of the square hole, and another first edge slope in the first axial direction.
7. A capacitive touch screen, characterized by: comprising the circuit arrangement of claim 5 or 6.
8. A method for manufacturing a graphical photosensitive resin coating is characterized by comprising the following steps:
(1) coating negative photosensitive resin on one surface of the substrate to form a photosensitive resin coating;
(2) exposing the photosensitive resin coating by using an anisotropic ultraviolet light source through a graphic mask plate, and enabling a first light scattering angle of the anisotropic ultraviolet light source along a first axial direction to be larger than other light scattering angles and a second light scattering angle of the anisotropic ultraviolet light source along a second axial direction to be smaller than other light scattering angles;
(3) and developing the photosensitive resin coating to obtain a graphical photosensitive resin coating, and forming a first edge slope along a first axial direction and a second edge slope along a second axial direction on the graphical photosensitive resin coating, wherein the slope angle of the first edge slope is smaller than that of other edge slopes, and the slope angle of the second edge slope is larger than that of other edge slopes.
9. The method of claim 8, wherein: in the step (2), the first light scattering angle is greater than 45 °, and the second light scattering angle is less than 30 °.
10. The method of claim 8, wherein: the anisotropic ultraviolet light source comprises an ultraviolet lamp tube and two strip-shaped baffles, the ultraviolet lamp tube is arranged along the second axial direction, and the two strip-shaped baffles are arranged along the second axial direction and are arranged at two sides of the ultraviolet lamp tube side by side; or the anisotropic ultraviolet light source comprises an ultraviolet lamp tube and a plurality of U-shaped baffle plates, each U-shaped baffle plate is sequentially overlapped and arranged to form a baffle plate group with a strip-shaped cavity, and the ultraviolet lamp tube is positioned in the strip-shaped cavity.
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