CN113270347B - 一种切边晶圆的清洗装置 - Google Patents

一种切边晶圆的清洗装置 Download PDF

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CN113270347B
CN113270347B CN202110634925.1A CN202110634925A CN113270347B CN 113270347 B CN113270347 B CN 113270347B CN 202110634925 A CN202110634925 A CN 202110634925A CN 113270347 B CN113270347 B CN 113270347B
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brush mechanism
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supporting wheels
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CN113270347A (zh
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史霄
吴尚东
黄坤
郑惠曦
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Beijing Jingyi Precision Technology Co ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
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    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67046Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68764Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68785Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Abstract

本发明提供了一种切边晶圆的清洗装置,属于化学机械抛光设备技术领域,包括:晶圆旋转及支承机构,包括至少四个主支撑轮和至少两个辅支撑轮;任意两个相邻所述主支撑轮的中心与圆心连线的夹角小于180度,任意一个所述辅支撑轮与相邻的所述主支撑轮之间的夹角大于晶圆上切边的夹角;滚刷机构,设于晶圆的相对两侧且绕自身轴线转动。本发明提供的切边晶圆的清洗装置,能够保证四个主支撑轮均匀的分布在晶圆的周边,对晶圆进行支撑;辅支撑轮与相邻的主支撑轮之间的夹角大于晶圆上切边的夹角,能够保证晶圆在转动过程中的支撑效果,进而保证滚刷机构的清洗效果。

Description

一种切边晶圆的清洗装置
技术领域
本发明涉及化学机械抛光设备技术领域,具体涉及一种切边晶圆的清洗装置。
背景技术
集成电路制造工艺过程通常是指将导体、半导体、绝缘层以一定的工艺顺序沉积在特定的基板(如硅晶圆)上。在制造工艺过程中,化学机械平坦化(Chemical MechanicalPlanarization,简称CMP)设备主要用于对晶圆在膜沉积工艺后的微观粗糙表面进行全局平坦化处理。
晶圆在经过全局平坦化处理后需要进行清洗,晶圆清洗方式具有多种,如辊刷清洗、兆声清洗等。其中,采用辊刷清洗时,通常会支撑轮支撑晶圆的边缘并驱动晶圆进行转动,完整的晶圆只要在晶圆的边缘位置处设置至少三个支撑轮即可完成晶圆的支撑和转动,而对于具有切边的晶圆,在晶圆旋转过程中晶圆切边位置会失去支撑,晶圆会上下窜动,严重时晶圆会飞出或者崩碎,无法实现清洗功能。
发明内容
因此,本发明要解决的技术问题在于克服现有晶圆辊刷清洗装置无法满足具有切边的晶圆实现可靠清洗的缺陷,从而提供一种切边晶圆的清洗装置。
为解决上述技术问题,本发明提供了一种切边晶圆的清洗装置,包括:
晶圆旋转及支承机构,包括围绕一圆心周向布置的至少四个主支撑轮和至少两个辅支撑轮;至少四个所述主支撑轮和至少两个所述辅支撑轮适于支撑晶圆并驱动晶圆绕中心轴线转动;任意两个相邻所述主支撑轮的中心与圆心连线的夹角小于180度,任意一个所述辅支撑轮与相邻的所述主支撑轮之间的夹角大于晶圆上切边的夹角;
滚刷机构,设于晶圆的相对两侧且绕自身轴线转动。
可选的,所述主支撑轮具有四个且均匀间隔布置,所述辅支撑轮两个且相对设置。
可选的,四个所述主支撑轮分为两组,同组的两个所述主支撑轮安装在同一支撑板上,且由同一驱动电机通过皮带轮机构驱动转动。
可选的,所述主支撑轮上连接有调节板,所述辅支撑轮通过连接板安装在调节板上,所述连接板与所述调节板活动连接。
可选的,每组所述主支撑轮均安装在驱动机构上,所述驱动机构适于驱动两组主支撑轮向相互靠近或相互远离的方向进行移动。
可选的,还包括有防水胶垫,设置在所述主支撑轮与所述电机之间。
可选的,所述滚刷机构包括有上刷机构和下刷机构,所述上刷机构和下刷机构分别位于切边晶圆的两侧;
所述上刷机构和下刷机构均连接有驱动气缸,所述驱动气缸适于驱动上刷机构和下刷机构朝向相互靠近或相互远离的方向进行移动。
可选的,所述上刷机构和下刷机构均包括有安装架;
滚刷本体,转动安装在所述安装架上,且所述滚刷本体与所述安装架为卡接连接。
可选的,还包括:
安装座,设置在安装架的一端,所述安装架的另一端设有转动座,所述滚刷本体转动安装在所述安装座与转动座之间。
可选的,还包括:
浮动块,滑动安装在所述安装座内,所述浮动块适于与所述滚刷本体抵接;
弹簧,设置在所述浮动块与所述安装座之间,所述弹簧具有使浮动块向所述滚刷本体移动的偏压力。
本发明技术方案,具有如下优点:
1.本发明提供的切边晶圆的清洗装置,晶圆旋转及支承机构包括有四个主支撑轮和至少两个辅支撑轮,四个主支撑轮和至少两个辅支撑轮支撑晶圆绕中心轴转动,并且任意两个相邻主支撑轮的中心与圆心连线的夹角小于180度,能够保证四个主支撑轮均匀的分布在晶圆的周边,对晶圆进行支撑;辅支撑轮与相邻的主支撑轮之间的夹角大于晶圆上切边的夹角,能够保证晶圆在转动过程中的支撑效果,进而保证滚刷机构的清洗效果。
2.本发明提供的切边晶圆的清洗装置,主支撑轮分为两组,同组的主支撑轮安装在同一支撑板上,并且由同一驱动电机通过皮带轮机构驱动转动,同时,每组主支撑轮均安装在驱动机构上,驱动机构可以调节两组主支撑轮之间的距离,以适应不同直径的晶圆。
3.本发明提供的切边晶圆的清洗装置,每组主支撑轮连接有调节板,辅支撑轮通过连接板安装在调节板上,连接板在调节板上的位置可调,可根据晶圆的半径调整合适的位置。
4.本发明提供的切边晶圆的清洗装置,滚刷机构包括上刷机构和下刷机构,上刷机构和下刷机构均包括有安装架,在安装架的一端滑动安装有浮动块,浮动块与滚刷本体抵接连接,在浮动块与安装座之间设有弹簧,在弹簧的弹性作用力下,浮动块保持滚刷本体的位置不变,当需要对滚刷本体进行更换时,只需将浮动块向安装座内按压,使浮动块挤压弹簧,便可将滚刷本体取出,便于更换。
附图说明
为了更清楚地说明本发明具体实施方式或现有技术中的技术方案,下面将对具体实施方式或现有技术描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图是本发明的一些实施方式,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。
图1为本发明提供的切边晶圆的清洗装置的结构示意图;
图2为本发明提供的晶圆旋转及支承机构的俯视图;
图3为切边晶圆的俯视图;
图4为本发明提供的晶圆旋转及支承机构支承晶圆时的结构示意图;
图5为本发明实施例中主支撑轮的连接示意图;
图6为本发明实施例中滚刷机构的结构示意图;
图7为本发明实施例中下刷机构的结构示意图;
图8为本发明实施例中安装座的半剖示意图;
图9为本发明实施例中定位组件的结构示意图;
图10为本发明实施例中定位组件的断面图。
附图标记说明:
1、主支撑轮;2、导轨组件;3、第一气缸;4、防水胶垫;5、电机;6、辅支撑轮;7、调节板;8、定位组件;9、安装端;10、转轴;11、防水盖;12、同步带轮;13、安装管;14、连接板;15、驱动气缸;16、防水罩;17、滚刷本体;18、安装座;19、弹簧;21、浮动块;22、传感器;23、壳体;24、销轴;25、配重块;26、滑动轴;27、滚轮;28、滑杆;29、密封盖;30、上刷机构;31、下刷机构;32、水箱。
具体实施方式
下面将结合附图对本发明的技术方案进行清楚、完整地描述,显然,所描述的实施例是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。
在本发明的描述中,需要说明的是,术语“中心”、“上”、“下”、“左”、“右”、“竖直”、“水平”、“内”、“外”等指示的方位或位置关系为基于附图所示的方位或位置关系,仅是为了便于描述本发明和简化描述,而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作,因此不能理解为对本发明的限制。
在本发明的描述中,需要说明的是,除非另有明确的规定和限定,术语“安装”、“相连”、“连接”应做广义理解,例如,可以是固定连接,也可以是可拆卸连接,或一体地连接;可以是机械连接,也可以是电连接;可以是直接相连,也可以通过中间媒介间接相连,可以是两个元件内部的连通。对于本领域的普通技术人员而言,可以具体情况理解上述术语在本发明中的具体含义。
此外,下面所描述的本发明不同实施方式中所涉及的技术特征只要彼此之间未构成冲突就可以相互结合。
本实施例提供了切边晶圆的清洗装置的一种具体的实施方式,如图1所示,晶圆旋转及支承机构包括有四个主支撑轮1和两个辅支撑轮6,四个主支撑轮1和两个辅支撑轮6支撑晶圆绕中心轴转动,并且任意两个主支撑轮1的中心与圆心连线的夹角小于180度,能够保证四个主支撑轮1均匀的分布在晶圆的周边,对晶圆进行支撑;如图2和图3所示,辅支撑轮6与相邻的主支撑轮1之间的夹角β大于晶圆上切边的夹角α,能够保证晶圆在转动过程中的支撑效果,进而保证滚刷机构的清洗效果。
主支撑轮1分为两组,同组的主支撑轮1安装在同一支撑板上,并且由安装在支撑板上的同一驱动电机5通过皮带轮机构驱动转动,支撑板连接在导轨组件2上,同时,每组主支撑轮1均安装在驱动机构上,驱动机构可以调节两组主支撑轮1之间的距离,以适应不同直径的晶圆。驱动机构为第一气缸3,支撑板与第一气缸3的驱动端进行连接,通过第一气缸3的驱动,支撑板可以在导轨组件2上进行滑动,进而带着主支撑轮1进行移动。
同组的两根主支撑轮1之间连接有调节板7,调节板7上安装有定位组件8,在晶圆停止转动时,实现切边晶圆的精准定位,切边在晶圆停止转动时始终保持在固定的位置处。
在导轨组件2与调节板7之间设有防水胶垫4,避免对晶圆进行清洗时,清洗液洒落至下方的驱动机构上。
如图4所示,辅支撑轮6通过连接板14安装在调节板7上,连接板14在调节板7上的位置可调,可根据晶圆的半径调整合适的位置。
如图5所示,驱动电机5的驱动端通过皮带与同步带轮12连接,同步带轮12连接有转轴10,转轴10安装在安装管13内,在安装管13上安装有防水盖11,转轴10的另一端设有安装端9,主支撑轮1固定安装在安装端9上。通过驱动电机5的驱动实现转动,进而带动晶圆转动。
如图6所示,本实施例中还包括有水箱32,滚刷机构设置在水箱32的一侧。其中,滚刷机构包括上刷机构30和下刷机构31,上刷机构30和下刷机构31均包括有安装架,安装架的两端分别安装有安装座18和转动座,滚刷本体17转动安装在安装座18和转动座之间。如图7所示,在安装架的下方设有驱动气缸15,驱动气缸15可以驱动安装架上下移动,以便滚刷机构靠近或远离晶圆。在驱动气缸15与安装架之间设有防水罩16。如图8,安装座18内滑动安装有浮动块21,同时,浮动块21可以通过螺钉与安装座18进行固定。浮动块21与滚刷本体17抵接连接,在浮动块21与安装座18之间设有弹簧19,在弹簧19的弹性作用力下,浮动块21保持滚刷本体17的位置不变,当需要对滚刷本体17进行更换时,只需将浮动块21向安装座18内按压,使浮动块21挤压弹簧19,便可将滚刷本体17取出,便于更换。
如图9和图10所示,定位组件8包括有壳体23及设置在壳体23上的密封盖29,壳体23内滑动安装滑杆28,滑杆28两侧设有滑动轴26,滑动轴26滑动在壳体23两侧的滑动槽内;在滑杆28的端部设有滚轮27,滚轮27与晶圆边缘接触设置,随着晶圆的转动而转动。在壳体23下方绕销轴24转动安装有配重块25,配重块25与滑杆28之间通过活动铰链连接;配重块25倾斜设置,使其始终具有将滑杆28推出壳体23的偏压力,传感器22设置在壳体23一侧,用于监测滑杆28的状态。当切边晶圆进行转动时,完整的圆弧部分会带动滚轮27同步转动,此时滑杆28受到晶圆边缘的挤压,保持在壳体23内部,此时传感器22可以检测到滑杆28;当切边晶圆具有切边的部分转过时,滑杆28在配重块25的作用下,会伸出壳体23,此时传感器22无法检测到滑杆28,判断到此为晶圆的切边部分,进而实现对切边晶圆的定位,在通过伺服电机5控制,可以实现切边晶圆停止旋转时的角度及位置。
显然,上述实施例仅仅是为清楚地说明所作的举例,而并非对实施方式的限定。对于所属领域的普通技术人员来说,在上述说明的基础上还可以做出其它不同形式的变化或变动。这里无需也无法对所有的实施方式予以穷举。而由此所引伸出的显而易见的变化或变动仍处于本发明创造的保护范围之中。

Claims (10)

1.一种切边晶圆的清洗装置,其特征在于,包括:
晶圆旋转及支承机构,包括围绕一圆心周向布置的至少四个主支撑轮(1)和至少两个辅支撑轮(6);至少四个所述主支撑轮(1)和至少两个所述辅支撑轮(6)适于支撑晶圆并驱动晶圆绕中心轴线转动;任意两个相邻所述主支撑轮(1)的中心与圆心连线的夹角小于180度,任意一个所述辅支撑轮(6)与相邻的所述主支撑轮(1)之间的夹角大于晶圆上切边的夹角;
滚刷机构,设于晶圆的相对两侧且绕自身轴线转动。
2.根据权利要求1所述的切边晶圆的清洗装置,其特征在于,所述主支撑轮(1)具有四个且均匀间隔布置,所述辅支撑轮(6)两个且相对设置。
3.根据权利要求2所述的切边晶圆的清洗装置,其特征在于,四个所述主支撑轮(1)分为两组,同组的两个所述主支撑轮(1)安装在同一支撑板上,且由同一驱动电机(5)通过皮带轮机构驱动转动。
4.根据权利要求3所述的切边晶圆的清洗装置,其特征在于,所述主支撑轮(1)上连接有调节板(7),所述辅支撑轮(6)通过连接板(14)安装在调节板(7)上,所述连接板(14)与所述调节板(7)活动连接。
5.根据权利要求4所述的切边晶圆的清洗装置,其特征在于,每组所述主支撑轮(1)均安装在驱动机构上,所述驱动机构适于驱动两组主支撑轮(1)向相互靠近或相互远离的方向进行移动。
6.根据权利要求3所述的切边晶圆的清洗装置,其特征在于,还包括有防水胶垫(4),设置在所述主支撑轮(1)与所述电机(5)之间。
7.根据权利要求1所述的切边晶圆的清洗装置,其特征在于,所述滚刷机构包括有上刷机构(30)和下刷机构(31),所述上刷机构(30)和下刷机构(31)分别位于切边晶圆的两侧;
所述上刷机构(30)和下刷机构(31)均连接有驱动气缸(15),所述驱动气缸(15)适于驱动上刷机构(30)和下刷机构(31)朝向相互靠近或相互远离的方向进行移动。
8.根据权利要求7所述的切边晶圆的清洗装置,其特征在于,所述上刷机构(30)和下刷机构(31)均包括有安装架;
滚刷本体(17),转动安装在所述安装架上,且所述滚刷本体(17)与所述安装架为卡接连接。
9.根据权利要求8所述的切边晶圆的清洗装置,其特征在于,还包括:
安装座(18),设置在安装架的一端,所述安装架的另一端设有转动座,所述滚刷本体(17)转动安装在所述安装座(18)与转动座之间。
10.根据权利要求9所述的切边晶圆的清洗装置,其特征在于,还包括:
浮动块(21),滑动安装在所述安装座(18)内,所述浮动块(21)适于与所述滚刷本体(17)抵接;
弹簧(19),设置在所述浮动块(21)与所述安装座(18)之间,所述弹簧(19)具有使浮动块(21)向所述滚刷本体(17)移动的偏压力。
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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10180198A (ja) * 1996-10-21 1998-07-07 Ebara Corp 洗浄装置
JPH11176790A (ja) * 1997-12-12 1999-07-02 Tokyo Electron Ltd 洗浄装置
JP2000077379A (ja) * 1998-09-03 2000-03-14 Toshiba Mach Co Ltd ブラシ洗浄装置
CN109482538A (zh) * 2018-12-10 2019-03-19 北京半导体专用设备研究所(中国电子科技集团公司第四十五研究所) 晶圆洗刷装置
CN109848827A (zh) * 2019-03-04 2019-06-07 天通日进精密技术有限公司 晶圆边缘抛光机构及晶圆边缘抛光装置
CN211507602U (zh) * 2020-07-30 2020-09-15 华海清科(北京)科技有限公司 晶圆支撑装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030051364A1 (en) * 2001-08-14 2003-03-20 Bernardo Donoso Method and apparatus for positioning a wafer chuck

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10180198A (ja) * 1996-10-21 1998-07-07 Ebara Corp 洗浄装置
JPH11176790A (ja) * 1997-12-12 1999-07-02 Tokyo Electron Ltd 洗浄装置
JP2000077379A (ja) * 1998-09-03 2000-03-14 Toshiba Mach Co Ltd ブラシ洗浄装置
CN109482538A (zh) * 2018-12-10 2019-03-19 北京半导体专用设备研究所(中国电子科技集团公司第四十五研究所) 晶圆洗刷装置
CN109848827A (zh) * 2019-03-04 2019-06-07 天通日进精密技术有限公司 晶圆边缘抛光机构及晶圆边缘抛光装置
CN211507602U (zh) * 2020-07-30 2020-09-15 华海清科(北京)科技有限公司 晶圆支撑装置

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