CN112750712B - Measuring device - Google Patents
Measuring device Download PDFInfo
- Publication number
- CN112750712B CN112750712B CN201911063317.9A CN201911063317A CN112750712B CN 112750712 B CN112750712 B CN 112750712B CN 201911063317 A CN201911063317 A CN 201911063317A CN 112750712 B CN112750712 B CN 112750712B
- Authority
- CN
- China
- Prior art keywords
- measuring
- substrate
- unit
- assembly
- measurement
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/70—Testing, e.g. accelerated lifetime tests
Abstract
The present invention provides a measuring device comprising: a substrate carrying unit for carrying a substrate; the measuring bearing unit comprises a measuring frame and a measuring slide block, wherein the measuring frame comprises side walls arranged on two opposite sides of the substrate and a cross beam arranged on the side walls and moving along the side walls; an optical measurement unit, which is arranged on the measurement slide block and is used for measuring marks on the substrate; and the anti-falling unit is arranged on the substrate bearing unit and used for carrying out anti-falling protection on the substrate during substrate delivery. Compared with the traditional bridge type measuring device, the measuring device provided by the invention is suitable for measuring large-size and large-quality substrates, saves cost and occupied area of the device, and improves measuring precision. Further, through setting up the anti-falling unit, avoid the base plate to fall at a high speed when handing over high position or accelerating to descend in the handing-over process and damage the plummer.
Description
Technical Field
The invention relates to the field of semiconductor manufacturing, in particular to a measuring device.
Background
With the continuous development of flat panel display technology, flat Panel Displays (FPDs) represented by Active Matrix Organic Light Emitting Displays (AMOLED) are becoming the mainstream of small and medium-sized intelligent display terminals by virtue of their low power consumption, thin thickness, and gorgeous display advantages. The organic luminescent material in the AMOLED display device is evaporated onto a Thin Film Transistor (TFT) array substrate by a vacuum evaporation device, and after evaporation, key process indexes of exposure items, such as Critical Dimension, overlay, total Pitch, etc., are measured by a substrate measurement device. However, with the development of the times, in order to improve the productivity and save the cost, the size and the specification of the substrate are larger and larger, the detection platform is heavier and the dynamic detection platform is behind the dynamic measurement platform architecture in terms of the precision design difficulty and the benefit. In view of the current testing situation, development of a measuring device which is high in measuring efficiency, high in measuring precision and suitable for large-size and large-quality substrates is urgently needed.
Disclosure of Invention
The invention aims to provide a measuring device suitable for measuring a large-size and large-quality substrate, and the measuring efficiency and the measuring precision of the measuring device are improved.
The present invention provides a measuring device comprising:
a substrate carrying unit for carrying a substrate;
the measurement bearing unit comprises a measurement frame and a measurement slide block, wherein the measurement frame comprises: the measuring slide block is sleeved on the cross beam and moves along the cross beam;
an optical measurement unit, which is arranged on the measurement slide block and is used for measuring marks on the substrate;
and the anti-falling unit is arranged on the substrate bearing unit and used for carrying out anti-falling protection on the substrate during substrate delivery.
Optionally, the measuring bearing unit further comprises a drag chain assembly, the drag chain assembly comprises an X-axis drag chain, a Y-axis drag chain and a drag chain bracket arranged above the cross beam, the X-axis drag chain is arranged right above the cross beam through the drag chain bracket, and the Y-axis drag chain is arranged on the side wall.
Optionally, the measuring bearing unit further comprises a beam adapter plate, the beam is arranged on the side wall through the beam adapter plate, a first air floatation sliding block is arranged between the beam adapter plate and the side wall, and a second air floatation sliding block is arranged between the beam and the measuring sliding block.
Optionally, the measuring device further includes a measuring driving unit including an X-direction measuring driving assembly, a Y-direction measuring driving assembly, and a Z-direction measuring driving assembly, for adjusting the movement of the optical measuring unit in the X-direction, the Y-direction, and the Z-direction.
Optionally, the X-direction measurement driving assembly includes an X-axis motor disposed between the measurement slide block and the beam, a mover of the X-axis motor is fixed on the measurement slide block, and a stator of the X-axis motor is fixed on the beam.
Optionally, the X-axis motor adopts a single motor structure, and the X-axis motor is disposed near one side of the measuring slide block where the optical measuring unit is fixed.
Optionally, the X-axis motor adopts a dual-motor structure, and the X-axis motor is symmetrically arranged with respect to the beam.
Optionally, the Y-direction measuring driving component comprises a Y-axis motor and a counter-force external guiding component,
the rotor of the Y-axis motor is fixed on the beam adapter plate, and the stator of the Y-axis motor is fixed on the side wall;
the reaction force outward guiding assembly comprises a reaction force outward guiding support and a reaction force outward guiding spring, the reaction force outward guiding support is arranged at a set distance away from one end of the side wall, and the Y-axis motor stator is connected with the reaction force outward guiding support through the reaction force outward guiding spring.
Optionally, the Z is measured the drive assembly and is set up one side of slider is measured, including Z axle motor, Z axle guide rail and Z axle mounting panel, Z axle motor is located Z axle guide rail with between the Z axle mounting panel, the optical measurement unit is fixed on the Z axle mounting panel.
Optionally, the measuring device further includes a displacement measuring unit, the displacement measuring unit includes: the system comprises an X-displacement measuring assembly, a Y-displacement measuring assembly and a Z-displacement measuring assembly, wherein the X-displacement measuring assembly and the Y-displacement measuring assembly adopt an interferometer measuring system, and the Z-displacement measuring assembly adopts a grating ruler measuring system.
Optionally, the substrate bearing unit includes a bearing platform, a base and a plurality of support columns, and the bearing platform is fixed on the base through the support columns.
Optionally, the anti-falling unit includes mount pad, buffer cylinder and buffer pad, the mount pad is fixed on the support column, buffer cylinder sets up the blotter with between the mount pad, the blotter is in realize stretching into and taking out to the base plate center under buffer cylinder's effect.
Optionally, the measuring device further comprises a substrate transfer unit, the substrate transfer unit comprises a substrate transfer assembly and a substrate transfer driving assembly,
the substrate handing-over assembly comprises handing-over struts, handing-over brackets and a vertical lifting mechanism, wherein the handing-over struts are arranged on two opposite sides of the bearing table and penetrate through the bearing table, the handing-over brackets are connected with the handing-over struts which are arranged oppositely, and the vertical lifting mechanism supports the handing-over brackets;
the substrate handing-over driving assembly comprises a roller screw motor connected with the vertical lifting mechanism, and the vertical movement of the substrate is enabled to be realized by converting the horizontal linear movement of the roller screw motor into the vertical movement of the handing-over bracket and the handing-over support through the vertical lifting mechanism.
Optionally, a balancing weight is arranged on one side of the measuring slide block, which is different from the optical measuring unit.
Optionally, the optical measurement unit includes a CCD image sensor or a CMOS image sensor.
Compared with the traditional bridge type measuring device, the measuring device provided by the invention has the following beneficial effects: (1) Cost is saved, occupied area of equipment is reduced, and measurement accuracy is improved; (2) suitable for measurement of large quality substrates; (3) The central layout structure of the overhead X-axis motor and the X-axis drag chain reduces the influence of eccentric torque disturbance on measurement accuracy in the motion process of the X-axis motor and the X-axis drag chain; (4) Through setting up the anti-falling unit, avoid the base plate to fall at a high speed when handing over high position or accelerating to descend in the handing-over process and damage the plummer.
Drawings
FIG. 1A is a schematic diagram of a measuring apparatus according to an embodiment of the present invention;
FIG. 1B is a top view of FIG. 1A (with the tow chain and tow chain bracket removed);
FIG. 2A is a schematic diagram of a measuring device according to an embodiment of the present invention when a substrate moves vertically;
FIG. 2B is a top view of FIG. 2A (with the tow chain and tow chain bracket removed);
fig. 3A to 3C are schematic structural diagrams of a measuring slider in a measuring device according to an embodiment of the present invention;
the attached drawings are used for identifying and describing:
01-a damper; 02-a base; 03-supporting columns; 04-mounting seats; 05-buffer cylinder; 06-a cushion pad; 07-an interface post; 08-substrate; 09—a beam; 10-X axis drag chain; 11-measuring a slide; a 12-X axis drag chain bracket; 13-a beam adapter plate; 14 a-a first air bearing slider; 14 b-a second air-bearing slider; a 15-Y axis motor; a mover of a 15a-Y axis motor; a stator of a 15b-Y axis motor; 16-Y axis drag chain; 17-side walls; 18-roller screw motor; 19-handing over rack; 20-a vertical lifting mechanism; 21-a bearing table; a 22-X axis motor; 23-an optical measurement unit; a 24-Z axis motor; a 25-Z axis mounting plate 26-Z axis guide rail; 27-a counterforce external spring; 28-a counterforce external support; 29-balancing weight;
XG1, XG2, XG3-X interferometer; XF1, XF2, XF3-X mirrors;
YG1, YG2, YG3, YG4-Y interferometer; YF1, YF2, YF3, YF 4-Y-direction reflecting mirror.
Detailed Description
The measuring device according to the invention is described in further detail below with reference to the drawings and the specific examples. The advantages and features of the present invention will become more apparent from the following description and drawings, however, it should be understood that the inventive concept may be embodied in many different forms and is not limited to the specific embodiments set forth herein. The drawings are in a very simplified form and are to non-precise scale, merely for convenience and clarity in aiding in the description of embodiments of the invention.
The terms "first," "second," and the like in the description and in the claims, are used for distinguishing between similar elements and not necessarily for describing a particular sequential or chronological order. It is to be understood that the terms so used are interchangeable under appropriate circumstances such that the embodiments of the invention described herein are, for example, capable of operation in other sequences than described or illustrated herein. Similarly, if a method described herein comprises a series of steps, and the order of the steps presented herein is not necessarily the only order in which the steps may be performed, and some of the described steps may be omitted and/or some other steps not described herein may be added to the method. If a component in one drawing is identical to a component in another drawing, the component will be easily recognized in all drawings, but in order to make the description of the drawings clearer, the specification does not refer to all the identical components in each drawing.
Fig. 1A is a schematic structural diagram of a measurement device according to the present embodiment, and fig. 1B is a top view of fig. 1A. Referring to fig. 1A and 1B, the measurement device provided in this embodiment includes: a substrate carrying unit for carrying a substrate 08; measurement carrying unit: comprising a measuring frame and a measuring slide 11, said measuring frame comprising: the measuring slide block 11 is sleeved on the cross beam 09 and moves along the cross beam 09; an optical measuring unit 23 provided on the measuring slider 11 for measuring marks on the substrate 08; and the anti-falling unit is arranged on the substrate bearing unit and is used for carrying out anti-falling protection on the substrate 08 when the substrate 08 is connected.
Specifically, the measurement bearing unit further comprises a beam adapter plate 13 and a drag chain assembly, the beam 09 is arranged on the side wall 17 through the beam adapter plate 13, a first air floatation slider 14a is arranged between the beam adapter plate 13 and the side wall 17, and a second air floatation slider 14b is arranged between the beam 09 and the measurement slider 11.
The drag chain assembly comprises an X-axis drag chain 10 and a Y-axis drag chain 16, wherein the X-axis drag chain 10 is arranged right above the cross beam 09 through a drag chain bracket 12 arranged above the cross beam 09. Wherein, three stabilizer blades of the drag chain bracket 12 are respectively connected with two Y motor movers 15a positioned on the cross beam 17 and the measuring slide block 11. One end of the X-axis drag chain 10 is connected to the support leg of the drag chain bracket 12 connected with the measuring slide block 11, and the other end is connected to the rotor 15a of the Y motor. One end of the Y-axis drag chain 16 is connected with the rotor 15a of the Y motor, and the other end of the Y-axis drag chain is connected with the side wall 17.
The measuring device further comprises a measuring driving unit, wherein the measuring driving unit comprises an X-direction measuring driving assembly, a Y-direction measuring driving assembly and a Z-direction measuring driving assembly, and the measuring driving unit is used for adjusting the movement of the optical measuring unit 23 in the X direction, the Y direction and the Z direction.
The X-direction measurement driving assembly comprises an X-axis motor 22 arranged between the measurement slide block 11 and the cross beam 09, a rotor of the X-axis motor 22 is fixed on the measurement slide block 11, and a stator of the X-axis motor is fixed on the cross beam 09. In this embodiment, the X-axis motor 22 adopts a single motor structure, and the X-axis motor 23 is disposed near the side of the measuring slide 11 where the optical measuring unit 23 is fixed, as shown in fig. 3A. In addition, in order to balance the force applied to the measuring slide 11, a weight 29 is provided on a side of the measuring slide 11 different from the optical measuring unit 23.
In other embodiments of the present invention, the X-axis motor 22 may have a dual motor structure, and the X-axis motor 22 is symmetrically disposed with respect to the beam 09. Illustratively, the X-axis motor 22 is laterally symmetrical with respect to the beam 09, i.e., the dual motor structure is respectively located at left and right sides of the beam 09, as shown in fig. 3B. Alternatively, the X-axis motor 22 is vertically symmetrical with respect to the beam 09, that is, the dual-motor structure is respectively located at the upper and lower sides of the beam 09, as shown in fig. 3C.
The Y-direction measurement driving assembly comprises a Y-axis motor 15 and a counter-force external guiding assembly, a rotor 15a of the Y-axis motor 15 is fixed on the beam adapter plate 13, and a stator 15b of the Y-axis motor is fixed on the side wall 17. The reaction force outward guiding assembly comprises: the reaction force outward support 28 and the reaction force outward spring 27, the reaction force outward support 28 is arranged at a set distance from one end of the side wall 17, and the Y-axis motor stator 15b is connected with the reaction force outward support 28 through the reaction force outward spring 27.
The Z-direction measurement driving assembly is arranged on one side of the measurement slide block 11 and comprises a Z-axis motor 24, a Z-axis guide rail 26 and a Z-axis mounting plate 25, wherein the Z-axis motor 24 is positioned between the Z-axis guide rail 26 and the Z-axis mounting plate 25, and the optical measurement unit 23 is fixed on the Z-axis mounting plate 25.
The measuring device also comprises a displacement measuring unit, wherein the displacement measuring unit comprises an X-displacement measuring component, a Y-displacement measuring component and a Z-displacement measuring component. Wherein the X-displacement measurement assembly and the Y-displacement measurement assembly employ interferometer measurement systems, in particular, the X-displacement measurement assembly comprises: x-direction interferometers (XG 1, XG2 and XG 3) arranged on the beam adapter plate 13 and X-direction reflectors (XF 1, XF2 and XF 3) arranged on the measuring slide 11 and corresponding to the X-direction interferometers (XG 1, XG2 and XG 3). The Y-direction measurement assembly includes: the X-direction mirrors ((YF 1, YF2, YF3 and YF 4)) provided on the measuring slider 11 and corresponding to the Y-direction interferometers (YG 1, YG2, YG3 and YG 4). The Z-displacement measuring component is a grating ruler measuring system which is arranged on the measuring slide block 11 and moves along with the measuring slide block 11.
The substrate carrying unit comprises a carrying table (chuck) 21, a base 02 and a plurality of support columns 03, wherein the carrying table 21 is fixed on the base 02 through the support columns 03. In this embodiment, illustratively, the carrying platform 21 is fixed on the base 02 by six symmetrically arranged support columns 03, the base 02 is a marble base, the marble base is placed on a horizontal plane by the damper 01, the carrying platform 21 is formed by splicing ceramic plates, and an air passage is formed in the carrying platform 21 so as to facilitate the adsorption of the substrate 08.
The anti-falling unit comprises a mounting seat 04, a buffer air cylinder 05 and a buffer pad 06, wherein the mounting seat 04 is fixed on the supporting column 03, the buffer air cylinder 05 is arranged between the buffer pad 06 and the mounting seat 04, and the buffer pad 06 stretches into and withdraws from the center of the base plate 08 under the action of the buffer air cylinder 05.
In this embodiment, the carrying plate 21 is not movable, and the optical measuring unit 23 performs X-direction, Y-direction and Z-direction movements by the measuring carrying unit and the displacement measuring unit to measure the marks on the substrate 08. The optical measurement unit 23 includes a CCD image sensor or a CMOS image sensor.
Specifically, the beam 09, the measuring slide 11 and the second air-floating slide 14b form an air-floating guide rail in the X direction, and the X-axis motor 22 drives the measuring slide 11 to move along the beam 09, so as to further realize the movement of the optical measuring unit 23 in the X direction. The X-coordinate position of the measuring slide 11 can be determined by measurement feedback from an interferometer in the X-displacement measuring assembly, and the optical measuring unit 23 can be positioned in the X-direction. In addition, the X-axis drag chain 10 is disposed directly above the cross beam 09, that is, the X-axis drag chain 10 adopts a top-mounted center layout structure, and when the measuring slide 11 is driven by the X-axis motor 22 to move, the X-axis drag chain 10 is beneficial to eliminating disturbance of control precision of X-axis motion due to eccentricity of the X-axis motor 22 and the X-axis drag chain, so as to realize high-precision positioning and measurement.
The beam 09, the beam adapter plate 13, the side wall 17 and the first air-floating sliding block 14a form an air-floating guide rail in the Y direction, and the Y-axis motor 15 drives the beam 09 to move along the side beam 17, so as to further realize the movement of the optical measurement unit 23 in the Y direction. The Y-coordinate position of the measuring slide 11 can be determined by measurement feedback from the interferometer in the Y-displacement measuring assembly, and the optical measuring unit 23 can be positioned in the Y-direction. When the Y-axis motor 15 drives the beam 09 to move along the Y-direction, the Y-direction moving Y-axis motor 15 is guided to the ground by the reaction force outward support 28 and the reaction force outward spring 27 in the reaction force outward assembly, so that disturbance impact on the measuring device is reduced. In addition, in the traditional bridge type measuring device, a high-quality dynamic detection table structure (a bearing table drives a substrate to move along the Y direction) is generally adopted, the occupied area of the device is large, and the measuring precision is low. In this embodiment, the Y-axis motor includes two sets of motor structures located at two sides of the bearing assembly, and drives the beam 09 to move along the Y direction, so that the traditional large-mass movable detection table structure is changed into a small-mass movable beam structure, and the measurement accuracy is effectively improved. In addition, in this implementation, the structural design of fixed base plate bearing unit, movable cross beam is applicable to the measurement of jumbo size, big quality more.
The movement in the Z direction is mainly that the Z-axis motor 24 drives the optical measurement unit 23 to move vertically along the Z-axis guide rail 26 through the Z-axis mounting plate 25, and the Z-direction focusing on the substrate 08 is realized through feedback of the Z-direction displacement measurement assembly.
The measuring device further comprises a substrate handing-over unit, wherein the substrate handing-over unit comprises a substrate handing-over assembly and a substrate handing-over driving assembly. The substrate handover assembly includes a handover support (PIN support) 07, a handover support (PIN support) 19, and a vertical lifting mechanism 20, the handover support 07 is disposed on two opposite sides of the bearing table 21 and penetrates through the bearing table 21, the handover support 19 is connected with the handover support 07 which is disposed oppositely, and the vertical lifting mechanism 20 supports the handover support 19.
The substrate handover driving assembly comprises a roller screw motor 18 connected with the vertical lifting mechanism 20, the roller screw motor 18 is arranged on the base 02 below the bearing table 21, and the horizontal linear motion of the roller screw motor 18 is converted into the vertical motion of the handover support 19 and the handover support 07 through the vertical lifting mechanism 20. The vertical movement of the cross brace 07 drives the vertical movement of the base plate 08 to realize the upper and lower base plates, so as to facilitate the cross of the base plate 08.
The anti-falling unit comprises an installation seat 04, a buffer air cylinder 05 and a buffer pad 06, wherein the installation seat 04 is fixed on the supporting column 03, the buffer air cylinder 05 is arranged between the buffer pad 06 and the installation seat 04, and the buffer pad 06 stretches into and withdraws from the center of the base plate 08 under the action of the buffer air cylinder 05.
Fig. 2A is a schematic structural diagram of the measuring device according to the present embodiment when the substrate moves vertically; fig. 2B is a top view of fig. 2A (with the tow chain and tow chain bracket removed). Referring to fig. 2A and 2B, the substrate 08 performs vertical movement (PIN axis movement) through a substrate transfer unit, so as to implement substrate transfer and anti-drop protection. Specifically, the substrate 08 is vertically moved from a low position in the measurement mode to a high position in the connection mode by the substrate connection driving assembly, so as to realize the upper and lower sheets of the substrate 08.
When the delivering post 07 drives the substrate 08 to move vertically upwards, the substrate 08 is separated from the top surface of the carrying table 21 by a first set distance D1, the buffer cylinder 05 is started, the buffer cushion 06 stretches into the lower portion of the substrate 08 under the action of the buffer cylinder 05, then, the substrate 08 continues to move upwards until the substrate 08 is separated from the carrying table 21 by a second set distance D2, the substrate 08 is delivered, the substrate 08 with optical measurement is cut off, and then the next substrate 08 to be measured is received. When the handover support column 07 carries the substrate 08 to be tested to move downwards at a high speed to a third set distance D3 from the top surface of the carrying table 21, the buffer cylinder 05 is started to draw the buffer pad 06 away from the outer side of the substrate 08, and then the handover support column 07 drives the substrate 08 to be tested to move downwards at a low speed to place the substrate 08 to be tested on the carrying table 21. The second set distance D2 is a handover height of the substrate 08, for example d2=200mm, and the first set distance D1 and the third set distance D3 may be equal or unequal, and may be specifically set according to a working condition of the measuring device. In this embodiment, the first set distance D1 and the third set distance D3 are equal, and d1=d3=130 mm.
In this embodiment, by providing the anti-falling unit, the substrate 08 is prevented from falling at a high speed to damage the carrying table 21 when the substrate is in a high position or is in an accelerated descent during the handover process. In particular, the drop protection can be performed for the transfer of a large-mass metal substrate (weight of about 80 kg).
In summary, the present embodiment provides a measurement device, including: a substrate carrying unit for carrying a substrate; the measurement bearing unit comprises a measurement frame and a measurement slide block, wherein the measurement frame comprises: the measuring slide block is sleeved on the cross beam and moves along the cross beam; an optical measurement unit, which is arranged on the measurement slide block and is used for measuring marks on the substrate; and the anti-falling unit is arranged on the substrate bearing unit and used for carrying out anti-falling protection on the substrate during substrate delivery. Compared with the traditional bridge type measuring device, the measuring device provided by the embodiment has the following beneficial effects: (1) Cost is saved, occupied area of equipment is reduced, and measurement accuracy is improved; (2) suitable for measurement of large-size, high-quality substrates; (3) The central layout structure of the overhead X-axis motor and the X-axis drag chain reduces the influence of eccentric torque disturbance on measurement accuracy in the motion process of the X-axis motor and the X-axis drag chain; (4) Through setting up the anti-falling unit, avoid the base plate to fall at a high speed when handing over high position or accelerating to descend in the handing-over process and damage the plummer.
The above description is only illustrative of the preferred embodiments of the present invention and is not intended to limit the scope of the present invention, and any alterations and modifications made by those skilled in the art based on the above disclosure shall fall within the scope of the appended claims.
Claims (13)
1. A measurement device, comprising:
the substrate bearing unit is used for bearing a substrate and comprises a bearing table, a base and a plurality of supporting columns, wherein the bearing table is fixed on the base through the supporting columns;
the measuring bearing unit comprises a measuring frame and a measuring slide block, wherein the measuring frame comprises side walls arranged on two opposite sides of the substrate and a cross beam arranged on the side walls and moving along the side walls, and the measuring slide block is sleeved on the cross beam and moves along the cross beam;
an optical measurement unit, which is arranged on the measurement slide block and is used for measuring marks on the substrate;
the anti-falling unit is arranged on the substrate bearing unit and used for protecting the substrate from falling when the substrate is connected, and comprises a mounting seat, a buffer cylinder and a buffer pad, wherein the mounting seat is fixed on the support column, the buffer cylinder is arranged between the buffer pad and the mounting seat, and the buffer pad stretches into and withdraws from the center of the substrate under the action of the buffer cylinder.
2. The measurement device of claim 1, wherein the measurement carrier unit further comprises a tow chain assembly comprising an X-axis tow chain disposed directly above the cross beam via a Y-axis tow chain disposed on the side wall, and a tow chain support disposed above the cross beam.
3. The measurement device of claim 1, wherein the measurement carrier unit further comprises a beam adapter plate, the beam is disposed on the side wall through the beam adapter plate, a first air-floating slider is disposed between the beam adapter plate and the side wall, and a second air-floating slider is disposed between the beam and the measurement slider.
4. A measuring device according to claim 3, further comprising a measuring drive unit comprising an X-direction measuring drive assembly, a Y-direction measuring drive assembly and a Z-direction measuring drive assembly for adjusting the movement of the optical measuring unit in the X-direction, the Y-direction and the Z-direction.
5. The measuring device of claim 4, wherein the X-direction measuring drive assembly comprises an X-axis motor disposed between the measuring slide and the beam, a mover of the X-axis motor being fixed to the measuring slide, and a stator of the X-axis motor being fixed to the beam.
6. The measuring device of claim 5, wherein the X-axis motor is of a single motor structure, and the X-axis motor is disposed near a side of the measuring slide to which the optical measuring unit is fixed.
7. The measuring device of claim 5, wherein the X-axis motor is of a dual motor construction and the X-axis motor is symmetrically disposed about the beam.
8. The measuring apparatus of claim 4, wherein the Y-direction measuring drive assembly comprises a Y-axis motor and a counter-force take-out assembly,
the rotor of the Y-axis motor is fixed on the beam adapter plate, and the stator of the Y-axis motor is fixed on the side wall;
the reaction force outward guiding assembly comprises: the Y-axis motor stator is connected with the counterforce outward guiding support through the counterforce outward guiding spring.
9. The measuring device of claim 4, wherein the Z-direction measuring drive assembly is disposed on one side of the measuring slide and comprises a Z-axis motor, a Z-axis guide rail, and a Z-axis mounting plate, the Z-axis motor is disposed between the Z-axis guide rail and the Z-axis mounting plate, and the optical measuring unit is fixed to the Z-axis mounting plate.
10. The measurement device of claim 1, further comprising a displacement measurement unit comprising: the system comprises an X-displacement measuring assembly, a Y-displacement measuring assembly and a Z-displacement measuring assembly, wherein the X-displacement measuring assembly and the Y-displacement measuring assembly adopt an interferometer measuring system, and the Z-displacement measuring assembly adopts a grating ruler measuring system.
11. The measurement device of claim 1, further comprising a substrate interface unit comprising a substrate interface assembly and a substrate interface drive assembly,
the substrate handing-over assembly comprises handing-over struts, handing-over brackets and a vertical lifting mechanism, wherein the handing-over struts are arranged on two opposite sides of the bearing table and penetrate through the bearing table, the handing-over brackets are connected with the handing-over struts which are arranged oppositely, and the vertical lifting mechanism supports the handing-over brackets;
the substrate handing-over driving assembly comprises a roller screw motor connected with the vertical lifting mechanism, and the vertical movement of the substrate is enabled to be realized by converting the horizontal linear movement of the roller screw motor into the vertical movement of the handing-over bracket and the handing-over support through the vertical lifting mechanism.
12. The measuring device according to claim 1, characterized in that a side of the measuring slide opposite the optical measuring unit is provided with a counter weight.
13. The measurement device according to claim 1, wherein the optical measurement unit comprises a CCD image sensor or a CMOS image sensor.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911063317.9A CN112750712B (en) | 2019-10-31 | 2019-10-31 | Measuring device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911063317.9A CN112750712B (en) | 2019-10-31 | 2019-10-31 | Measuring device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN112750712A CN112750712A (en) | 2021-05-04 |
| CN112750712B true CN112750712B (en) | 2023-06-02 |
Family
ID=75645172
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201911063317.9A Active CN112750712B (en) | 2019-10-31 | 2019-10-31 | Measuring device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN112750712B (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113441465B (en) * | 2021-05-27 | 2023-04-07 | 成都飞机工业（集团）有限责任公司 | Cleaning device for linear grating ruler and using method thereof |
| CN114234798A (en) * | 2021-11-04 | 2022-03-25 | 苏州天准科技股份有限公司 | Combined type coordinate measuring instrument |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001129962A (en) * | 1999-11-05 | 2001-05-15 | Matsushita Electric Ind Co Ltd | Method and apparatus for screen printing |
| CN102705660A (en) * | 2012-05-17 | 2012-10-03 | 深圳市华星光电技术有限公司 | Supporting device of glass substrate cassette |
| CN109817539A (en) * | 2019-01-25 | 2019-05-28 | 北京半导体专用设备研究所（中国电子科技集团公司第四十五研究所） | Wafer measuring thickness device and wafer thickness measuring system |
| CN110346298A (en) * | 2019-07-30 | 2019-10-18 | 北京允升吉电子有限公司 | A kind of SMT steel plate automatic checkout equipment and its detection method |
-
2019
- 2019-10-31 CN CN201911063317.9A patent/CN112750712B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001129962A (en) * | 1999-11-05 | 2001-05-15 | Matsushita Electric Ind Co Ltd | Method and apparatus for screen printing |
| CN102705660A (en) * | 2012-05-17 | 2012-10-03 | 深圳市华星光电技术有限公司 | Supporting device of glass substrate cassette |
| CN109817539A (en) * | 2019-01-25 | 2019-05-28 | 北京半导体专用设备研究所（中国电子科技集团公司第四十五研究所） | Wafer measuring thickness device and wafer thickness measuring system |
| CN110346298A (en) * | 2019-07-30 | 2019-10-18 | 北京允升吉电子有限公司 | A kind of SMT steel plate automatic checkout equipment and its detection method |
Also Published As
| Publication number | Publication date |
|---|---|
| CN112750712A (en) | 2021-05-04 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP6835191B2 (en) | Mobile device, object processing device, exposure device, device manufacturing method, flat panel manufacturing method, object exchange method, and exposure method | |
| CN103252761B (en) | There is the Long Distances two-dimensional nano work system of angle compensation function | |
| CN112750712B (en) | Measuring device | |
| TWI286599B (en) | Apparatus and method for measuring shape of both sides of a plate | |
| JP3325077B2 (en) | Electromagnetic alignment device | |
| CN101571675B (en) | Balancing and positioning system for workpiece platform of photoetching machine | |
| US20210173313A1 (en) | Exposure apparatus, manufacturing method of flat-panel display, device manufacturing method, and exposure method | |
| CN100535765C (en) | 6-freedom micro-motion platform capable of isolating exterior vibration | |
| CN107479332B (en) | Exposure apparatus, method for manufacturing flat panel display, and method for manufacturing device | |
| JP2005062819A (en) | High-precision gas bearing axially divided stage for conveyance and restraint of large-sized flat-plate flexible medium in processing | |
| CN100526996C (en) | Exposure apparatus and exposure method | |
| CN102483579A (en) | Object moving apparatus, object processing apparatus, exposure apparatus, object inspecting apparatus and device manufacturing method | |
| CN106194943A (en) | The assembled machine table of main photographic head module active alignment | |
| CN203245845U (en) | Large stroke two-dimensional nanometer work table system with angle compensation function | |
| US20210173314A1 (en) | Carrier device, exposure apparatus, exposure method, manufacturing method of flat-panel display, device manufacturing method, and carrying method | |
| CN103119706A (en) | Exposure apparatus, exchange method of object, exposure method, and device manufacturing method | |
| TWI590365B (en) | Object exchange system, object exchange method, object carry-out method, object holding apparatus, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method | |
| CN102279532B (en) | Device for assembling and regulating lens of projection objective of lithography machine | |
| CN106292196B (en) | A kind of litho machine vibration damping frame | |
| CN103105742B (en) | Mask table system of six-degree-of-freedom coarse table with photoelectric position detector measurement function | |
| CN103116250B (en) | Masking platform system with laser interferometer measurement and six-freedom-degree coarse movement platform | |
| CN206072045U (en) | The assembled machine table of main camera module active alignment | |
| KR101000549B1 (en) | Coater | |
| CN106292190B (en) | Torque compensation device and method applied to sports platform | |
| CN114813692B (en) | Online fluorescence microscopy machine of OLED screen |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |