CN112750712A - Measuring device - Google Patents
Measuring device Download PDFInfo
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- CN112750712A CN112750712A CN201911063317.9A CN201911063317A CN112750712A CN 112750712 A CN112750712 A CN 112750712A CN 201911063317 A CN201911063317 A CN 201911063317A CN 112750712 A CN112750712 A CN 112750712A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/70—Testing, e.g. accelerated lifetime tests
Abstract
The present invention provides a measuring apparatus, including: a substrate carrying unit for carrying a substrate; the measuring bearing unit comprises a measuring frame and a measuring slide block, the measuring frame comprises side walls arranged on two opposite sides of the substrate and a cross beam arranged on the side walls and moving along the side walls, and the measuring slide block is sleeved on the cross beam and moves along the cross beam; an optical measuring unit disposed on the measuring slider for measuring the mark on the substrate; and the anti-falling unit is arranged on the substrate bearing unit and is used for performing anti-falling protection on the substrate during substrate handover. Compared with the traditional bridge type measuring device, the measuring device provided by the invention is suitable for measuring large-size and large-mass substrates, saves the cost and the occupied area of the device, and improves the measuring precision. Furthermore, through setting up the anti-falling unit, avoid the base plate at handing-over in-process, high-speed falling damages the plummer when handing-over high position or acceleration descend.
Description
Technical Field
The invention relates to the field of semiconductor manufacturing, in particular to a measuring device.
Background
With the continuous development of flat panel display technology, a Flat Panel Display (FPD) represented by an Active Matrix Organic Light Emitting Display (AMOLED) is gradually becoming the mainstream of small and medium-sized intelligent display terminals by virtue of its display advantages, such as low power consumption, thin thickness, and high brilliance. The organic luminescent material in the AMOLED display device is evaporated on a Thin Film Transistor (TFT) array substrate through vacuum evaporation equipment, and exposure key process indexes such as Critical Dimension, Overlay and Total Pitch are measured through substrate measuring equipment after evaporation. However, with the development of times, in order to improve the yield and save the cost, the size and the specification of the substrate become larger and larger, the detection table becomes heavier and heavier, and the mobile detection table lags behind the framework of the mobile measurement table in the aspect of the precision design difficulty and the benefit. In view of the current test situation, it is urgently needed to develop a measuring device which has high measuring efficiency and high measuring precision and is suitable for large-size and large-quality substrates.
Disclosure of Invention
The invention aims to provide a measuring device suitable for measuring a large-size and large-mass substrate, and the measuring efficiency and the measuring precision of the measuring device are improved.
The present invention provides a measuring apparatus, including:
a substrate carrying unit for carrying a substrate;
the measurement bearing unit comprises a measurement frame and a measurement slide block, wherein the measurement frame comprises: the measuring slide block is sleeved on the cross beam and moves along the cross beam;
an optical measuring unit disposed on the measuring slider for measuring a mark on a substrate;
and the anti-falling unit is arranged on the substrate bearing unit and is used for performing anti-falling protection on the substrate during substrate handover.
Optionally, the measurement bearing unit further includes a tow chain assembly, the tow chain assembly includes an X-axis tow chain, a Y-axis tow chain and a tow chain support disposed above the beam, the X-axis tow chain is disposed right above the beam through the tow chain support, and the Y-axis tow chain is disposed on the side wall.
Optionally, the measurement bearing unit further comprises a cross beam adapter plate, the cross beam is arranged on the side wall through the cross beam adapter plate, a first air-floating slide block is arranged between the cross beam adapter plate and the side wall, and a second air-floating slide block is arranged between the cross beam and the measurement slide block.
Optionally, the measuring device further includes a measuring driving unit including an X-direction measuring driving assembly, a Y-direction measuring driving assembly, and a Z-direction measuring driving assembly, and configured to adjust movement of the optical measuring unit in the X-direction, the Y-direction, and the Z-direction.
Optionally, the X-direction measurement driving assembly includes an X-axis motor disposed between the measurement slider and the beam, a rotor of the X-axis motor is fixed to the measurement slider, and a stator of the X-axis motor is fixed to the beam.
Optionally, the X-axis motor adopts a single motor structure, and the X-axis motor is disposed near one side of the measuring slider, where the optical measuring unit is fixed.
Optionally, the X-axis motor adopts a dual-motor structure, and the X-axis motor is symmetrically arranged with respect to the cross beam.
Optionally, the Y-direction measurement driving assembly comprises a Y-axis motor and a counter force outward-guiding assembly,
a rotor of the Y-axis motor is fixed on the cross beam adapter plate, and a stator of the Y-axis motor is fixed on the side wall;
the reaction force outer leading assembly comprises a reaction force outer leading support and a reaction force outer leading spring, the reaction force outer leading support is arranged at a set distance from one end of the side wall, and the Y-axis motor stator is connected with the reaction force outer leading support through the reaction force outer leading spring.
Optionally, the Z-direction measurement driving assembly is arranged on one side of the measurement slider and comprises a Z-axis motor, a Z-axis guide rail and a Z-axis mounting plate, the Z-axis motor is located between the Z-axis guide rail and the Z-axis mounting plate, and the optical measurement unit is fixed on the Z-axis mounting plate.
Optionally, the measuring device further includes a displacement measuring unit, and the displacement measuring unit includes: the X-direction displacement measuring component and the Y-direction displacement measuring component adopt an interferometer measuring system, and the Z-direction displacement measuring component adopts a grating ruler measuring system.
Optionally, the substrate bearing unit includes a bearing table, a base and a plurality of supporting columns, and the bearing table is fixed on the base through the supporting columns.
Optionally, the dropproof unit includes mount pad, cushion cylinder and blotter, the mount pad is fixed on the support column, cushion cylinder sets up the blotter with between the mount pad, the blotter is in the effect of cushion cylinder is realized stretching into and is taken out to the base plate center down.
Optionally, the measuring apparatus further comprises a substrate interface unit, the substrate interface unit comprises a substrate interface assembly and a substrate interface driving assembly,
the substrate handing-over assembly comprises handing-over pillars, handing-over supports and vertical lifting mechanisms, the handing-over pillars are arranged on two opposite sides of the bearing table and penetrate through the bearing table, the handing-over supports are connected with the handing-over pillars which are oppositely arranged, and the vertical lifting mechanisms support the handing-over supports;
the base plate handover driving assembly comprises a roller screw motor connected with the vertical lifting mechanism, and the vertical lifting mechanism converts the horizontal linear motion of the roller screw motor into the vertical motion of the handover support and the handover support column to enable the vertical motion of the base plate to realize handover.
Optionally, a counterweight is disposed on a side of the measuring slider different from the optical measuring unit.
Optionally, the optical measurement unit includes a CCD image sensor or a CMOS image sensor.
Compared with the traditional bridge type measuring device, the measuring device provided by the invention has the following beneficial effects: (1) the cost is saved, the floor area of the equipment is reduced, and the measurement precision is improved; (2) the method is suitable for measurement of the large-mass substrate; (3) the central layout structure of the X-axis motor and the X-axis drag chain top reduces the influence of eccentric torque disturbance on the measurement precision in the motion process of the X-axis motor and the X-axis drag chain; (4) through setting up the dropproof unit, avoid the base plate at handing-over in-process, high-speed falling damages the plummer when handing-over high-order or acceleration decline.
Drawings
Fig. 1A is a schematic structural diagram of a measurement apparatus according to an embodiment of the present invention;
FIG. 1B is a top view of FIG. 1A (with the tow chain and tow chain brackets removed);
fig. 2A is a schematic structural diagram of a measurement apparatus according to an embodiment of the present invention when a substrate moves vertically;
FIG. 2B is a top view of FIG. 2A (with the tow chain and tow chain brackets removed);
fig. 3A to fig. 3C are schematic structural diagrams of a measuring slider in a measuring apparatus according to an embodiment of the present invention;
the attached drawings indicate the following:
01-a vibration damper; 02-base; 03-support column; 04-a mounting seat; 05-a buffer cylinder; 06-a buffer pad; 07-a cross-linking strut; 08-a substrate; 09-a cross beam; a 10-X axis tow chain; 11-a measuring slide; a 12-X axis tow chain support; 13-a beam adapter plate; 14 a-a first air-bearing slider; 14 b-a second air-bearing slider; 15-Y axis motors; a mover of the 15a-Y axis motor; 15 b-a stator of a Y-axis motor; a 16-Y axis tow chain; 17-side walls; 18-roller screw motor; 19-a cross-connecting bracket; 20-a vertical lifting mechanism; 21-a bearing platform; 22-X axis motor; 23-an optical measuring unit; a 24-Z axis motor; 25-Z axis mounting plate 26-Z axis guide rail; 27-counter force outward-leading spring; 28-counter force external leading support; 29-a counterweight block;
XG1, XG2, XG3-X directional interferometers; XF1, XF2, XF3-X directional reflector;
YG1, YG2, YG3, YG4-Y direction interferometer; YF1, YF2, YF3 and YF4-Y directional reflector.
Detailed Description
The measuring device of the present invention will be described in further detail with reference to the accompanying drawings and specific embodiments. The advantages and features of the present invention will become more apparent from the following description and drawings, it being understood, however, that the concepts of the present invention may be embodied in many different forms and should not be construed as limited to the specific embodiments set forth herein. The drawings are in simplified form and are not to scale, but are provided for convenience and clarity in describing embodiments of the invention.
The terms "first," "second," and the like in the description and in the claims, are used for distinguishing between similar elements and not necessarily for describing a particular sequential or chronological order. It is to be understood that the terms so used are interchangeable under appropriate circumstances such that the embodiments of the invention described herein are, for example, capable of operation in other sequences than described or illustrated herein. Similarly, if the method described herein comprises a series of steps, the order in which these steps are presented herein is not necessarily the only order in which these steps may be performed, and some of the described steps may be omitted and/or some other steps not described herein may be added to the method. Although elements in one drawing may be readily identified as such in other drawings, the present disclosure does not identify each element as being identical to each other in every drawing for clarity of description.
Fig. 1A is a schematic structural diagram of a measurement apparatus provided in this embodiment, and fig. 1B is a top view of fig. 1A. Referring to fig. 1A and 1B, the present embodiment provides a measurement apparatus including: a substrate carrying unit for carrying a substrate 08; a measurement bearing unit: comprising a measuring frame and a measuring slide 11, the measuring frame comprising: the measuring device comprises side walls 17 arranged on two opposite sides of the substrate and a cross beam 09 arranged on the side walls 17 and moving along the side walls 17, wherein the measuring slide block 11 is sleeved on the cross beam 09 and moves along the cross beam 09; an optical measuring unit 23, provided on the measuring slide 11, for measuring marks on the substrate 08; and the anti-falling unit is arranged on the substrate bearing unit and is used for performing anti-falling protection on the substrate 08 during substrate 08 handover.
Specifically, the measurement bearing unit further comprises a cross beam adapter plate 13 and a drag chain assembly, the cross beam 09 is arranged on the side wall 17 through the cross beam adapter plate 13, a first air-floating slide block 14a is arranged between the cross beam adapter plate 13 and the side wall 17, and a second air-floating slide block 14b is arranged between the cross beam 09 and the measurement slide block 11.
The drag chain assembly comprises an X-axis drag chain 10 and a Y-axis drag chain 16, wherein the X-axis drag chain 10 is arranged right above the cross beam 09 through a drag chain bracket 12 arranged above the cross beam 09. Three support legs of the drag chain support 12 are respectively connected with two Y motor rotors 15a on the cross beam 17 and the measuring slide block 11. One end of the X-axis drag chain 10 is connected to a support leg of the drag chain support 12 connected with the measuring slider 11, and the other end is connected to a mover 15a of the Y-axis motor. One end of the Y-axis drag chain 16 is connected with the rotor 15a of the Y motor, and the other end is connected with the side wall 17.
The measuring device further comprises a measuring driving unit, wherein the measuring driving unit comprises an X-direction measuring driving component, a Y-direction measuring driving component and a Z-direction measuring driving component, and is used for adjusting the movement of the optical measuring unit 23 in the X direction, the Y direction and the Z direction.
The X-direction measurement driving assembly comprises an X-axis motor 22 arranged between the measurement slider 11 and the cross beam 09, a rotor of the X-axis motor 22 is fixed on the measurement slider 11, and a stator of the X-axis motor is fixed on the cross beam 09. In this embodiment, the X-axis motor 22 is a single motor structure, and the X-axis motor 23 is disposed near a side of the measuring slider 11 where the optical measuring unit 23 is fixed, as shown in fig. 3A. In addition, in order to balance the stress on the measuring slider 11, a weight 29 is disposed on a side of the measuring slider 11 different from the optical measuring unit 23.
In other embodiments of the present invention, the X-axis motor 22 may have a dual-motor structure, and the X-axis motor 22 is symmetrically disposed about the cross beam 09. Illustratively, the X-axis motor 22 is bilaterally symmetric with respect to the cross beam 09, i.e., the dual-motor structure is respectively located at the left and right sides of the cross beam 09, as shown in fig. 3B. Alternatively, the X-axis motor 22 is vertically symmetrical with respect to the cross beam 09, that is, the dual-motor structure is respectively located at the upper and lower sides of the cross beam 09, as shown in fig. 3C.
The Y-direction measurement driving assembly comprises a Y-axis motor 15 and a counter force external guiding assembly, a rotor 15a of the Y-axis motor 15 is fixed on the beam adapter plate 13, and a stator of the Y-axis motor is fixed 15b on the side wall 17. The counter force draws subassembly outward includes: the Y-axis motor stator 15b is connected to the reaction force outer lead support 28 through the reaction force outer lead spring 27.
The Z-direction measurement driving assembly is arranged on one side of the measurement sliding block 11 and comprises a Z-axis motor 24, a Z-axis guide rail 26 and a Z-axis mounting plate 25, the Z-axis motor 24 is located between the Z-axis guide rail 26 and the Z-axis mounting plate 25, and the optical measurement unit 23 is fixed on the Z-axis mounting plate 25.
The measuring device further comprises a displacement measuring unit, and the displacement measuring unit comprises an X-direction displacement measuring component, a Y-direction displacement measuring component and a Z-direction displacement measuring component. Wherein, X to move to measure the subassembly and Y to move to measure the subassembly and adopt interferometer measurement system with the subassembly, specifically, X to move to measure the subassembly and include: x-directional interferometers (XG1, XG2 and XG3) and X-directional reflectors (XF1, XF2 and XF3) which are arranged on the beam adapter plate 13 and correspond to the X-directional interferometers (XG1, XG2 and XG3) and are arranged on the measuring slide 11. The Y-direction measuring assembly comprises: y-directional interferometers (YG1, YG2, YG3, and YG4) disposed on the carrier assembly, and X-directional mirrors ((YF1, YF2, YF3, and YF4)) disposed on the measurement slider 11 and corresponding to the Y-directional interferometers (YG1, YG2, YG3, and YG 4). The Z-direction displacement measuring component is a grating ruler measuring system which is arranged on the measuring slide block 11 and moves along with the measuring slide block 11.
The substrate bearing unit comprises a bearing table (chuck)21, a base 02 and a plurality of supporting columns 03, wherein the bearing table 21 is fixed on the base 02 through the supporting columns 03. In this embodiment, exemplarily, the plummer 21 is fixed on the base 02 through six support columns 03 that the symmetry set up, the base 02 is the marble base, arranges a horizontal plane in through the shock absorber 01 on, the plummer 21 comprises the ceramic plate concatenation, it has the air flue to open on the plummer 21, so that adsorb the base plate 08.
The anti-falling unit comprises a mounting seat 04, a buffer cylinder 05 and a buffer pad 06, the mounting seat 04 is fixed on the supporting column 03, the buffer cylinder 05 is arranged between the buffer pad 06 and the mounting seat 04, and the buffer pad 06 is stretched into and pulled out from the center of the substrate 08 under the action of the buffer cylinder 05.
In this embodiment, the carrier plate 21 is immovable, and the optical measurement unit 23 performs X-direction, Y-direction, and Z-direction movements through the measurement carrier unit and the displacement measurement unit to measure the mark on the substrate 08. The optical measurement unit 23 includes a CCD image sensor or a CMOS image sensor.
Specifically, the cross beam 09, the measuring slider 11, and the second air-floating slider 14b form an air-floating guide rail in the X direction, and the X-axis motor 22 drives the measuring slider 11 to move along the cross beam 09, so as to realize the movement of the optical measuring unit 23 in the X direction. By means of the measurement feedback of the interferometer in the X displacement measuring assembly, the X-coordinate position of the measuring slide 11 can be determined, and the optical measuring unit 23 can be positioned in the X direction. In addition, the X-axis drag chain 10 is disposed right above the cross beam 09, that is, the X-axis drag chain 10 adopts an overhead central layout structure, and when the measuring slide block 11 is driven by the X-axis motor 22 to move, the X-axis drag chain 10 is beneficial to eliminating the disturbance to the control precision of the X-axis motion caused by the eccentricity of the X-axis motor 22 and the X-axis drag chain, so as to realize high-precision positioning and measurement.
The cross beam 09, the cross beam adapter plate 13, the side wall 17 and the first air-floating slide block 14a form an air-floating guide rail in the Y direction, and the Y-axis motor 15 drives the cross beam 09 to move along the side beam 17, so that the movement of the optical measurement unit 23 in the Y direction is realized. Through the measurement feedback of the interferometer in the Y displacement measurement assembly, the Y-coordinate position of the measurement slide 11 can be determined, and the optical measurement unit 23 can be positioned in the Y direction. When the Y-axis motor 15 drives the beam 09 to move along the Y direction, the Y-axis motor 15 moving in the Y direction is driven to the ground through the counter force outer guide support 28 and the counter force outer guide spring 27 in the counter force outer guide assembly, so as to reduce disturbance impact on the measuring device. In addition, in the conventional bridge-type measuring device, a large-mass movable detection table structure (a bearing table drives a substrate to move along the Y direction) is generally adopted, the occupied area of the device is large, and the measurement precision is low. The Y-axis motor in the embodiment comprises two groups of motor structures located on two sides of the bearing assembly, the crossbeam 09 is driven to move along the Y direction, the traditional large-mass movable detection platform structure is changed into a small-mass movable crossbeam structure, and the measurement precision is effectively improved. In addition, in the implementation, the structural design of the fixed substrate bearing unit and the movable beam is more suitable for measurement of large size and large mass.
The Z-direction movement is mainly that the Z-axis motor 24 drives the optical measurement unit 23 to move vertically through the Z-axis mounting plate 25 along the Z-axis guide rail 26, and the Z-direction focusing of the substrate 08 is realized through the feedback of the Z-direction displacement measurement component.
The measuring device further comprises a substrate cross-connecting unit, and the substrate cross-connecting unit comprises a substrate cross-connecting assembly and a substrate cross-connecting driving assembly. Wherein, the base plate handing-over subassembly includes handing-over pillar (PIN pillar) 07, handing-over support (PIN support) 19 and vertical hoist mechanism 20, handing-over pillar 07 sets up the relative both sides of plummer 21 and run through plummer 21, handing-over support 19 connects relative the setting handing-over pillar 07, vertical hoist mechanism 20 supports handing-over support 19.
The base plate handover driving assembly comprises a roller screw motor 18 connected with the vertical lifting mechanism 20, the roller screw motor 18 is arranged on the base 02 below the bearing table 21, and the horizontal linear motion of the roller screw motor 18 is converted into the vertical motion of the handover support 19 and the handover support column 07 through the vertical lifting mechanism 20. The vertical movement of the cross-connecting support column 07 drives the vertical movement of the substrate 08 to realize the upper substrate and the lower substrate, so as to facilitate the cross-connecting of the substrate 08.
The anti-falling unit comprises a mounting seat 04, a buffer cylinder 05 and a buffer pad 06, wherein the mounting seat 04 is fixed on the supporting column 03, the buffer cylinder 05 is arranged between the buffer pad 06 and the mounting seat 04, and the buffer pad 06 can extend into and withdraw from the center of the substrate 08 under the action of the buffer cylinder 05.
Fig. 2A is a schematic structural diagram of the measurement apparatus according to the present embodiment when the substrate moves vertically; FIG. 2B is a top view of FIG. 2A (with the tow chain and tow chain brackets removed). Referring to fig. 2A and 2B, the base plate 08 performs vertical movement (PIN movement) through the base plate interface unit, so as to realize base plate interface and anti-falling protection. Specifically, the substrate handover driving assembly moves the handover column 07 vertically from a low position in the measurement mode to a high position in the handover mode, so as to realize the loading and unloading of the substrate 08.
When the substrate 08 is driven by the cross-connecting support column 07 to move vertically upwards, and the substrate 08 is separated from the top surface of the bearing table 21 by a first set distance D1, the buffer cylinder 05 is started, the buffer pad 06 extends to the position below the substrate 08 under the action of the buffer cylinder 05, and then the substrate 08 is continuously moved upwards to a second set distance D2 separated from the bearing table 21, so that the substrate 08 is cross-connected, the substrate 08 which is subjected to optical measurement is placed next, and then the next substrate 08 to be measured is received. When the handover support column 07 bears the substrate 08 to be tested and moves downwards at a high speed to a third set distance D3 away from the top surface of the bearing table 21, the buffer cylinder 05 is started to draw the buffer pad 06 away to the outer side of the substrate 08, and then the handover support column 07 drives the substrate 08 to be tested to move downwards at a low speed to place the substrate 08 to be tested on the bearing table 21. The second set distance D2 is a transfer height of the substrate 08, for example, D2 is 200mm, and the first set distance D1 and the third set distance D3 may be equal to or different from each other, and may specifically be set according to a working condition of the measuring apparatus. In this embodiment, the first set distance D1 and the third set distance D3 are equal, and in the example, D1 is equal to D3 is equal to 130 mm.
In the embodiment, the anti-falling unit is arranged, so that the bearing table 21 is prevented from being damaged by high-speed falling when the substrate 08 is in a high position for handover or is accelerated to descend in the handover process. In particular, a high mass metal substrate (weighing about 80kg) can be handled for protection against falling.
In summary, the present embodiment provides a measuring apparatus, including: a substrate carrying unit for carrying a substrate; the measurement bearing unit comprises a measurement frame and a measurement slide block, wherein the measurement frame comprises: the measuring slide block is sleeved on the cross beam and moves along the cross beam; an optical measuring unit disposed on the measuring slider for measuring a mark on a substrate; and the anti-falling unit is arranged on the substrate bearing unit and is used for performing anti-falling protection on the substrate during substrate handover. Compared with the traditional bridge type measuring device, the measuring device provided by the embodiment has the following beneficial effects: (1) the cost is saved, the floor area of the equipment is reduced, and the measurement precision is improved; (2) the method is suitable for measuring the large-size and large-mass substrate; (3) the central layout structure of the X-axis motor and the X-axis drag chain top reduces the influence of eccentric torque disturbance on the measurement precision in the motion process of the X-axis motor and the X-axis drag chain; (4) through setting up the dropproof unit, avoid the base plate at handing-over in-process, high-speed falling damages the plummer when handing-over high-order or acceleration decline.
The above description is only for the purpose of describing the preferred embodiments of the present invention, and is not intended to limit the scope of the present invention, and any variations and modifications made by those skilled in the art based on the above disclosure are within the scope of the appended claims.
Claims (15)
1. A measuring device, comprising:
a substrate carrying unit for carrying a substrate;
the measuring bearing unit comprises a measuring frame and a measuring slide block, the measuring frame comprises side walls arranged on two opposite sides of the substrate and a cross beam arranged on the side walls and moving along the side walls, and the measuring slide block is sleeved on the cross beam and moves along the cross beam;
an optical measuring unit disposed on the measuring slider for measuring a mark on a substrate;
and the anti-falling unit is arranged on the substrate bearing unit and is used for performing anti-falling protection on the substrate during substrate handover.
2. The measuring device according to claim 1, wherein the measuring and carrying unit further comprises a drag chain assembly, the drag chain assembly comprises an X-axis drag chain, a Y-axis drag chain and a drag chain bracket arranged above the cross beam, the X-axis drag chain is arranged right above the cross beam through the drag chain bracket, and the Y-axis drag chain is arranged on the side wall.
3. The measuring device according to claim 1, wherein the measurement carrying unit further comprises a beam adapter plate, the beam is disposed on the side wall through the beam adapter plate, a first air-floating slider is disposed between the beam adapter plate and the side wall, and a second air-floating slider is disposed between the beam and the measurement slider.
4. The measurement device of claim 3, further comprising a measurement drive unit including an X-direction measurement drive assembly, a Y-direction measurement drive assembly, and a Z-direction measurement drive assembly for adjusting movement of the optical measurement unit in the X-direction, the Y-direction, and the Z-direction.
5. The measuring device according to claim 4, wherein the X-direction measuring drive assembly comprises an X-axis motor disposed between the measuring slide and the cross beam, a rotor of the X-axis motor being fixed to the measuring slide, and a stator of the X-axis motor being fixed to the cross beam.
6. The measuring apparatus according to claim 5, wherein the X-axis motor has a single motor structure, and the X-axis motor is disposed near a side of the measuring slide on which the optical measuring unit is fixed.
7. The measuring device as claimed in claim 5, wherein the X-axis motor has a dual-motor structure, and the X-axis motor is symmetrically disposed about the beam.
8. The measuring device of claim 4, wherein the Y-direction measuring drive assembly comprises a Y-axis motor and a counter force leading-out assembly,
a rotor of the Y-axis motor is fixed on the cross beam adapter plate, and a stator of the Y-axis motor is fixed on the side wall;
the counter force draws subassembly outward includes: the Y-axis motor stator is connected with the counter-force outer leading support through the counter-force outer leading spring.
9. The measurement device according to claim 4, wherein the Z-direction measurement driving assembly is disposed on one side of the measurement slider and comprises a Z-axis motor, a Z-axis guide rail and a Z-axis mounting plate, the Z-axis motor is located between the Z-axis guide rail and the Z-axis mounting plate, and the optical measurement unit is fixed on the Z-axis mounting plate.
10. The measurement device of claim 1, further comprising a displacement measurement unit, the displacement measurement unit comprising: the X-direction displacement measuring component and the Y-direction displacement measuring component adopt an interferometer measuring system, and the Z-direction displacement measuring component adopts a grating ruler measuring system.
11. The measuring apparatus according to claim 1, wherein the substrate supporting unit comprises a supporting stage, a base and a plurality of supporting columns, and the supporting stage is fixed on the base through the supporting columns.
12. The measuring device according to claim 11, wherein the anti-falling unit comprises a mounting seat, a buffer cylinder and a buffer cushion, the mounting seat is fixed on the supporting column, the buffer cylinder is arranged between the buffer cushion and the mounting seat, and the buffer cushion is extended into and withdrawn from the center of the substrate under the action of the buffer cylinder.
13. The measurement device of claim 11, further comprising a substrate interface unit comprising a substrate interface assembly and a substrate interface drive assembly,
the substrate handing-over assembly comprises handing-over pillars, handing-over supports and vertical lifting mechanisms, the handing-over pillars are arranged on two opposite sides of the bearing table and penetrate through the bearing table, the handing-over supports are connected with the handing-over pillars which are oppositely arranged, and the vertical lifting mechanisms support the handing-over supports;
the base plate handover driving assembly comprises a roller screw motor connected with the vertical lifting mechanism, and the vertical lifting mechanism converts the horizontal linear motion of the roller screw motor into the vertical motion of the handover support and the handover support column to enable the vertical motion of the base plate to realize handover.
14. The measuring device according to claim 1, wherein a weight is disposed on a side of the measuring slider opposite to the optical measuring unit.
15. The measurement device according to claim 1, wherein the optical measurement unit comprises a CCD image sensor or a CMOS image sensor.
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| CN201911063317.9A CN112750712B (en) | 2019-10-31 | 2019-10-31 | Measuring device |
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| CN201911063317.9A CN112750712B (en) | 2019-10-31 | 2019-10-31 | Measuring device |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113441465A (en) * | 2021-05-27 | 2021-09-28 | 成都飞机工业（集团）有限责任公司 | Cleaning device for linear grating ruler and using method thereof |
| CN114234798A (en) * | 2021-11-04 | 2022-03-25 | 苏州天准科技股份有限公司 | Combined type coordinate measuring instrument |
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| JP2001129962A (en) * | 1999-11-05 | 2001-05-15 | Matsushita Electric Ind Co Ltd | Method and apparatus for screen printing |
| CN102705660A (en) * | 2012-05-17 | 2012-10-03 | 深圳市华星光电技术有限公司 | Supporting device of glass substrate cassette |
| CN109817539A (en) * | 2019-01-25 | 2019-05-28 | 北京半导体专用设备研究所（中国电子科技集团公司第四十五研究所） | Wafer measuring thickness device and wafer thickness measuring system |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN113441465A (en) * | 2021-05-27 | 2021-09-28 | 成都飞机工业（集团）有限责任公司 | Cleaning device for linear grating ruler and using method thereof |
| CN113441465B (en) * | 2021-05-27 | 2023-04-07 | 成都飞机工业（集团）有限责任公司 | Cleaning device for linear grating ruler and using method thereof |
| CN114234798A (en) * | 2021-11-04 | 2022-03-25 | 苏州天准科技股份有限公司 | Combined type coordinate measuring instrument |
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