CN112596349A - Two-photon parallel direct writing device and method based on multi-point array generation and independent control - Google Patents
Two-photon parallel direct writing device and method based on multi-point array generation and independent control Download PDFInfo
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Abstract
The invention discloses a two-photon parallel direct writing device and a method based on multi-point array generation and independent control, which mainly comprise three core elements: the digital micromirror array DMD, the spatial light modulator SLM and the micro lens array MLA, the DMD equally divides an effective pixel area into N × N units, one unit corresponds to one light spot, and m × m micromirrors contained in each unit of the DMD are independently switched to realize independent regulation and control of the intensity and uniformity of the light spots of each unit; the SLM equally divides the effective pixel area into N × N units, and the effective pixel area corresponds to each incident unit light spot one by one and independently performs phase control; the device and the method have the function of gray scale lithography, can rapidly process curved surface structures and true three-dimensional microstructures with any shapes and high uniformity, and can be applied to the fields of super-resolution lithography and the like.
Description
Technical Field
The invention belongs to the technical field of micro-nano optics and the field of optical element processing and manufacturing, and particularly relates to a two-photon parallel direct writing device and method based on multi-lattice generation and independent control.
Background
The spatial light modulator SLM and the digital micromirror array DMD can be respectively used for modulating the wave front and the light field amplitude, and the spatial light modulator SLM and the digital micromirror array DMD are respectively combined with a super-resolution two-photon direct writing technology, so that the advantages of the SLM (or the DMD) and the two-photon are simultaneously exerted, and the flexible and efficient processing of a micro-nano structure is realized. At present, although the two-photon direct writing technical scheme based on the DMD or the SLM obtains significant scores in the aspects of super-resolution implementation, three-dimensional complex structure processing and the like, a particularly significant effect is not obtained in the aspect of improving the processing flux, the large increase of the flux is often realized by increasing the number of parallel lines, and the increase of the number of parallel lines can lead to the reduction of the processing flexibility, if the processing paths of each parallel beam cannot be controlled respectively, the parallel beam can only be processed according to a unified planning path, and the obtained processing structure is relatively single.
Gray scale photoetching is an important technology for manufacturing a three-dimensional microstructure, batch manufacturing is generally realized by adopting a gray scale mask, different gray scales of the gray scale mask correspond to different transmittances, so that the exposure dose generated on the surface of a photosensitive material is adjusted, a three-dimensional structure in proportion to the exposure dose can be obtained after development, and then a pattern on the photosensitive layer is copied onto a substrate by an etching technology, so that a surface structure is finally formed. At present, the main problem of manufacturing a gray mask is that the manufacturing difficulty and cost are greatly increased along with the increase of gray level; when the gray scale photoetching technology is applied to manufacture the three-dimensional micro-device, the design of a gray scale mask graph of a free-form surface is limited, and generally, only a three-dimensional micro-structure with an elementary analytical curved surface (such as an arc surface and a spherical surface) on the surface can be processed, but a gray scale mask with a pattern in any shape cannot be manufactured, and the manufacture of the three-dimensional micro-structure containing the free-form surface is difficult to realize; in addition, the gray scale lithography based on the gray scale mask can only process the surface of the material generally, and the manufacturing of the true three-dimensional microstructure cannot be realized. And the gray scale photoetching by scanning point by point and synchronously controlling the light spot dosage has the defects of low processing flux, poor uniformity and the like.
In the literature [ Optics & Laser Technology, 2019, 113: 407-.
Disclosure of Invention
The invention aims to overcome the defects of the prior art and provide a two-photon parallel direct writing device and a two-photon parallel direct writing method with multi-point array generation and independent control.
The technical solution of the invention is as follows:
the utility model provides a two-photon parallel direct writing device that multi-spot array produced and independent control, include the femto second laser pulse that sets gradually according to light direction of advance, the beam expander, first speculum, digital micromirror array DMD, first convex lens, second convex lens, the second mirror, spatial light modulator SLM, the third speculum, third convex lens, the fourth speculum, square adjustable diaphragm, microlens array MLA, the fifth convex lens, the dichroscope, objective, accurate displacement platform and set up at the sixth convex lens of dichroscope reflection end, CCD.
Preferably, the digital micromirror array DMD is configured to modulate the amplitude of an incident light spot, specifically, the DMD equally divides an effective pixel area into N × N units, one unit corresponds to one light spot, and switches the state of m × m micromirrors included in each unit of the digital micromirror array DMD between "on" and "off" independently, so as to independently control the intensity and uniformity of the light spots of each unit.
Preferably, the spatial light modulator SLM performs phase modulation on the incident light spot, specifically: the spatial light modulator SLM equally divides an effective pixel area into N multiplied by N units, each unit comprises m multiplied by m liquid crystal surface elements, each liquid crystal surface element of each unit of the spatial light modulator SLM corresponds to m multiplied by m pixels of each unit of the digital micromirror array DMD one by one, and wave fronts of light spots of each unit are independently regulated and controlled by controlling the m multiplied by m liquid crystal surface elements in each unit of the spatial light modulator SLM.
Preferably, the first convex lens and the second convex lens form a 4F system for imaging the light field on the DMD to the spatial light modulator SLM, and the focal lengths F1 and F2 of the first convex lens and the second convex lens satisfy F1/F2= dD/dSWherein d isD、dSPixel pitches of the digital micromirror array DMD and the spatial light modulator SLM are respectively; and adjusting the positions and postures of the digital micromirror array DMD and the spatial light modulator SLM to enable the light beams to pass through the 4F system, so that the light spots of each unit coincide with the unit areas on the spatial light modulator SLM one by one.
Preferably, the third convex lens and the fourth convex lens form a 4F system two for imaging the light field on the SLM onto the focal plane of the microlens array MLA, and the focal lengths F3 and F4 of the third convex lens and the fourth convex lens satisfy F3/F4= m × dS/dMWherein d isMA microlens pitch that is MLA; and adjusting the transverse position of the micro lens array MLA to enable each unit light spot to correspond to each micro lens of the micro lens array MLA one by one.
Preferably, the first mirror and the second mirror are respectively used for adjusting the incident angle of the digital micromirror array DMD and the spatial light modulator SLM, wherein the incident angle of the spatial light modulator SLM is controlled within 10 °.
Preferably, the microlens array MLA comprises NxN microlenses, and is used for focusing incident NxN unit light spots, wherein one unit light spot corresponds to one microlens, and at most, an NxN focal point array can be generated in the focal plane of the MLA (14); and modulating the wave front of each unit light spot through a Spatial Light Modulator (SLM), and independently controlling the position of each focus point near the focus point of the optical axis of the corresponding micro lens.
The square adjustable diaphragm is used for limiting the size of a light spot incident to the micro lens array MLA, and the aperture of the square adjustable diaphragm is equal to the size of the effective area of the micro lens array MLA.
Preferably, the fifth convex lens and the micro lens array MLA form a 4F system three, a focal array generated by the micro lens array MLA is changed into parallel light transmitted at different angles through the fifth convex lens, and the light spot overlapping is realized at the entrance pupil surface of the objective lens, and finally, the light spot overlapping is focused on the focal plane of the objective lens to form a parallel direct writing light spot lattice.
A method based on the device comprises the following steps: femtosecond laser pulses are incident to a digital micromirror array DMD after passing through a beam expander and a first reflector, the digital micromirror array DMD performs amplitude modulation on incident light spots, the incident light spots are imaged on a spatial light modulator SLM through a 4F system and a second reflector, pure phase modulation is performed on the light spots through the spatial light modulator SLM, the light spots emitted from the spatial light modulator SLM sequentially pass through a third reflector, a 4F system II, a fourth reflector and a square adjustable iris and are incident to a micro lens array MLA, a focus dot matrix is generated on a focal plane of the micro lens array MLA, the dot matrix finally images in an objective focal plane on a precise displacement table through a fifth convex lens, a dichroic mirror and an objective lens, high-flux super-resolution two-photon direct writing processing is performed, and generated fluorescence is focused on a CCD through the objective lens, the dichroic mirror and a sixth convex lens for imaging.
The invention has the following technical effects:
the invention utilizes MLA to generate multi-beam focusing dot matrix, and simultaneously carries out independent control on the dose and position of each light beam through DMD and SLM, the number of the realized dot matrix is large, the processing flux is high, the intensity of each light spot is controllable, the invention has the function of gray scale photoetching, and the invention does not need to adopt the traditional gray scale mask, realizes high gray scale level, simultaneously, the position of each light spot is independently controllable, the processing is more flexible, and the super-resolution parallel processing of high-uniformity arbitrary curved surface structure and true three-dimensional microstructure can be realized.
Drawings
FIG. 1 is a schematic structural diagram of a two-photon parallel direct writing device based on multi-point array generation and independent control according to the present invention;
FIG. 2 is a schematic diagram illustrating the principle of the present invention for realizing N × N dot matrix generation and independent control of intensity position by DMD, SLM and MLA;
FIG. 3 is a schematic diagram of the present invention utilizing DMD to realize NxN spot matrix intensity distribution;
FIG. 4 is a schematic diagram illustrating the principle of the present invention for realizing the change of the position of the light spot behind the MLA microlens by wavefront control;
FIG. 5 is a schematic diagram of the present invention for simultaneously implementing N × N light spot lattice intensity and position distribution by using DMD and SLM;
FIG. 6 is a schematic diagram of an arbitrary curved surface structure with high uniformity based on parallel gray scale lithography according to the present invention;
in the figure, 1-femtosecond laser light source, 2-beam expander, 3-first reflector, 4-digital micromirror array DMD, 5-first convex lens, 6-second convex lens, 7-second reflector, 8-spatial light modulator SLM, 9-third reflector, 10-third convex lens, 11-fourth convex lens, 12-fourth reflector, 13-square adjustable diaphragm, 14-microlens array MLA, 15-fifth convex lens, 16-dichroic mirror, 17-objective lens, 18-precision displacement table, 19-sixth convex lens and 20-CCD.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not limiting of the invention.
As shown in fig. 1, the present invention provides a two-photon parallel direct writing device with multi-dot array generation and independent control, which comprises a femtosecond laser pulse 1, a beam expander 2, a first reflector 3, a digital micromirror array DMD4, a first convex lens 5, a second convex lens 6, a second reflector 7, a spatial light modulator SLM8, a third reflector 9, a third convex lens 10, a fourth convex lens 11, a fourth reflector 12, a square adjustable diaphragm 13, a microlens array MLA14, a fifth convex lens 15, a dichroic mirror 16, an objective lens 17, a precision displacement table 18, a sixth convex lens 19 and a CCD20, which are sequentially arranged along the light advancing direction.
The digital micromirror array DMD4 is used for amplitude modulation of incident light spots, specifically, the DMD4 equally divides an effective pixel area into N × N units, one unit corresponds to one light spot, and independent on and off state switching is performed on m × m micromirrors included in each unit of the digital micromirror array DMD4, so as to independently regulate and control the intensity and uniformity of the light spots of each unit.
The spatial light modulator SLM8 performs phase modulation on the incident light spot, specifically: the spatial light modulator SLM8 equally divides the effective pixel area into N × N cells, each cell includes m × m liquid crystal bins, each liquid crystal bin of each cell of the spatial light modulator SLM8 corresponds to m × m pixels of each cell of the digital micromirror array DMD4 one by one, and the wavefront of each cell light spot is independently regulated and controlled by controlling the m × m liquid crystal bins in each cell of the spatial light modulator SLM 8.
The first convex lens 5 and the second convex lens 6 form a 4F system for imaging the light field on the DMD4 to the spatial light modulator SLM8, and the focal lengths F1 and F2 of the first convex lens 5 and the second convex lens 6 satisfy F1/F2= dD/dSWherein d isD、dSThe pixel pitch of the digital micromirror array DMD4 and the spatial light modulator SLM8, respectively; the positions and postures of the digital micromirror array DMD4 and the spatial light modulator SLM8 are adjusted so that after the light beam passes through the 4F system, the unit light spots coincide with the unit areas on the spatial light modulator SLM8 one by one.
The third convex lens 10 and the fourth convex lens 11 form a 4F system two, which is used for imaging the light field on the spatial light modulator SLM8 onto the focal plane of the microlens array MLA14, and the focal lengths F3 and F4 of the third convex lens 10 and the fourth convex lens 11 satisfy that F3/F4= m×dS/dMWherein d isMA microlens pitch of MLA 14; the transverse position of the micro lens array MLA14 is adjusted, so that each unit light spot is respectively corresponding to each micro lens of the micro lens array MLA 14.
The first mirror 3 and the second mirror 7 are respectively used for adjusting the incident angle of the digital micromirror array DMD4 and the spatial light modulator SLM8, wherein the incident angle of the spatial light modulator SLM8 is controlled within 10 °.
The micro lens array MLA14 comprises NxN micro lenses for focusing incident NxN unit light spots, wherein one unit light spot corresponds to one micro lens and can generate an NxN focal point array at most in an MLA (14) focal plane; the wavefront of each unit light spot is modulated through a spatial light modulator SLM (8), and the falling point position of each focus near the focus of the corresponding optical axis of the micro lens is independently controlled.
The square adjustable diaphragm 13 is used for limiting the size of a light spot incident to the micro lens array MLA14, and the aperture of the square adjustable diaphragm 13 is equal to the size of the effective area of the micro lens array MLA 14.
The fifth convex lens 15 and the micro lens array MLA14 form a 4F system III, a focus array generated by the micro lens array MLA14 is changed into parallel light transmitted at different angles through the fifth convex lens 15, light spot overlapping is realized at the entrance pupil surface of the objective lens 17, and finally a parallel direct writing light spot lattice is formed by focusing on the focal plane of the objective lens 17.
According to the invention, through the imaging system combining the DMD, the SLM, the MLA, the square adjustable diaphragm and the convex lens, light spots generate light spot lattices on a focal plane of the MLA after passing through the MLA through the characteristics of the MLA, the light spot lattices are finally transmitted to the focal plane of the objective lens through the imaging system to carry out two-photon parallel photoetching, and meanwhile, the DMD and the SLM are respectively used for independently controlling the intensity and the position of each light spot, so that the high-flux super-resolution flexible processing of any curved surface structure with high uniformity and a true three-dimensional microstructure can be realized.
The working process of the device of the invention is as follows: the femtosecond laser pulse 1 expands the light spot through the beam expander 2, then adjusts the incident angle of the light beam to the DMD4 through the first reflector 3, and performs amplitude modulation on the incident light field through the DMD4, as shown in fig. 2, the DMD4 equally divides the effective pixel area into N × N units, one unit corresponds to one light spot, independent on and off state switching is performed on m × m micromirrors contained in each unit of the DMD4, so as to realize independent regulation and control on the intensity and uniformity of the light spots of each unit, the light beam emitted from the DMD4 is imaged on the SLM8 through a 4F system (a first convex lens 5 and a second convex lens 6) and a second reflector 7, the second reflector 7 is used for adjusting the incident angle of the light beam to the SLM8, and performs phase modulation on the incident light field through the SLM8, as shown in fig. 2, the SLM8 equally divides the effective pixel area into N × N units, each unit contains m × m liquid crystal bins, each liquid crystal surface element of each unit of the SLM8 corresponds to m × m pixels of each unit of the DMD4 one by one, independent wavefront modulation of each unit light spot is realized by controlling the m × m liquid crystal surface elements in each unit of the SLM8, a proper 4F system parameter is selected, the positions and postures of the DMD4 and the SLM8 are finely adjusted, after light beams pass through the 4F system, each unit light spot is overlapped with each unit area on the SLM8 one by one, the light beams emitted from the SLM8 pass through the third reflecting mirror 9, the second 4F system (the third convex lens 10 and the fourth convex lens 11), the fourth reflecting mirror 12 and the square adjustable diaphragm 13 to be incident on the MLA14, the square adjustable diaphragm 13 is used for limiting the size of the light spot incident on the MLA14, the size of the light spot incident on the MLA14 is just consistent with the effective micro-mirror range of the MLA14, a proper 4F system parameter is selected, and the transverse position of the MLA14 is finely adjusted, so that each MLA14 corresponds to one incident light spot, and a focused spot lattice is obtained on an MLA14 focal plane, the lattice number is equal to the number NXN of MLA14 micro-lenses, because the wave fronts of all unit spots are different, all unit spots are focused on the MLA14 focal plane at different offset angles after passing through MLA14, a 4F system is formed by the fifth convex lens 15 and the MLA14, all unit parallel light beams emitted from the fifth convex lens 15 sequentially pass through the dichroic mirror 16 and the objective lens 17 at different angles, and are respectively refocused at the focal plane of the objective lens 17 to obtain a high parallel two-photon direct writing lattice, the high-flux super-resolution flexible processing of a high-uniformity curved surface structure and a true three-dimensional microstructure can be realized by combining the independent control of the intensity and position distribution of all the spots by the DMD4 and the SLM8, and generated fluorescence is reflected by the objective lens 17 and the dichroic mirror 16 and focused on the CCD20 for imaging.
The device of the invention has partial parameter setting examples: assuming that the number of MLA14 microlenses is 100 × 100, the pitch of the microlenses is 150 μm, the effective area on the MLA14 is 15mm × 15mm, the aperture of the square adjustable diaphragm 13 is adjusted to 15mm × 15mm, the resolution of the SLM8 is 1272 × 1024, the liquid crystal cell size is 12.5 μm × 12.5 μm, 10 × 10 pixels on the SLM8 is one cell, each cell corresponds to one microlens on the MLA14, i.e., a cell of 125 μm × 125 μm on the SLM8 corresponds to one microlens of 150 μm × 150 μm on the MLA14, the effective utilization area of the SLM8 is 12.5mm × 125mm, and simultaneously, F3/F4= m × d is calculated according to the focal length calculation formula of the second third convex lens 10 and the fourth convex lens 11 of the 4F systemS/dMF3/F4= 0.83; assuming that the resolution of the DMD4 is 1920 × 1080, the pixel pitch is 10.8 μm, and 10 × 10 pixels of the DMD4 correspond to 10 × 10 pixels on the SLM8, the effective utilization area of the DMD4 is 10.8mm × 10.8mm, and the focal length calculation formula F1/F2= d of the first convex lens 5 and the second convex lens 6 according to the 4F system is F1/F2= dD/dSIt is understood that F1/F2=0.864, the diameter of the circular spot of the femtosecond laser used in the DMD4 is 10.8mm × =15.27mm, and the diameter of the expanded femtosecond laser must be larger than this size.
The adjustment of the intensity and the uniformity of each light spot in the dot matrix is realized and explained: the m × m pixels on the DMD4 correspond to one light spot, and for single light spot intensity control, the control can be realized by uniformly turning off or turning on some micromirrors for the m × m micromirrors, and fig. 3 is a schematic diagram of controlling the intensity distribution of the processing dot matrix by modulating the dose of each unit light spot by using a DMD 4; for the uniformity control of a single light spot, it can be achieved by turning off some micromirrors at high intensity or turning on some micromirrors at low intensity, for example, if the intensity distribution of a certain light spot in a lattice is gaussian, it can be achieved by turning off more micromirrors in m × m micromirrors closer to the central area.
Quantitative description of the relationship between the incident wavefront variation and the position deviation of the landing point on the MLA focal plane: fig. 4 is a schematic diagram of the imaging principle of the MLA14 microlens array. For a single microlens, the unit spot having a planar wavefront (a real parallel line) is normally incident on the microlens and is focused to a focal position on the optical axis of the lens(reference spot position) and the distorted wavefront (dashed parallel lines) is not normal incidence, it will be focused to a position offset from the reference spot, and the offset angle can be calculated geometrically. Assuming that the wavefront slope incident on the MLA14 is α, and that each spot in the MLA14 focal plane moves within its respective active region without overlapping the active regions of the other spots, the maximum displacement angle (also the maximum wavefront slope) α of the incident element beam with respect to the optical axis of each microlens ismax=h/fM=D/2/fMH is the maximum displacement distance of the light spot in the focal plane of MLA14, D is the diameter of the microlens, fMIs the focal length of the microlens. While the DMD4 controls the intensity distribution of the light spot lattice, the SLM8 controls the wavefront of each unit light spot incident on the MLA14, and also controls the position distribution of each light spot of the lattice at the focal plane, as shown in FIG. 5.
The high-flux super-resolution two-photon direct writing of the high-uniformity arbitrary curved surface structure and the true three-dimensional microstructure based on gray level photoetching is realized by the following steps: as shown in fig. 6, it is assumed that a heart-shaped curved surface structure is processed, a high-brightness region corresponds to a curved surface vertex, and a low-brightness region corresponds to a curved surface lower point; when the structure is processed by the light spot lattice, the processing area is partitioned according to the active area of each light spot, two-photon polymerization is realized by adopting different light spot intensities for each unit area, the light spot intensity at the vertex of the curved surface is highest, the light spot intensity is lower towards the edge of the heart-shaped structure, the wavefront of each light spot is changed in each unit area through the SLM8, the light spots can be controlled to scan along any track in each active area, and the light spot intensity is synchronously modulated through the DMD4, so that high-uniformity gray scale photoetching of any curved surface structure and three-dimensional microstructure is realized, and the advantages of high flux and super resolution are achieved.
It will be understood by those skilled in the art that the foregoing is only a preferred embodiment of the present invention, and is not intended to limit the invention, and that any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the scope of the present invention.
Claims (10)
1. A two-photon parallel direct writing device based on multi-point array generation and independent control is characterized in that: the device comprises a femtosecond laser pulse (1), a beam expander (2), a first reflector (3), a digital micromirror array (DMD) (4), a first convex lens (5), a second convex lens (6), a second reflector (7), a Spatial Light Modulator (SLM) (8), a third reflector (9), a third convex lens (10), a fourth convex lens (11), a fourth reflector (12), a square adjustable diaphragm (13), a microlens array MLA (14), a fifth convex lens (15), a dichroic mirror (16), an objective lens (17), a precise displacement table (18), a sixth convex lens (19) and a CCD (20) which are arranged at the reflection end of the dichroic mirror (16) in sequence according to the light advancing direction.
2. The two-photon parallel direct writing apparatus based on multi-dot matrix generation and independent control according to claim 1, wherein: the digital micromirror array DMD (4) is used for modulating the amplitude of incident light spots, specifically, the effective pixel area is equally divided into N multiplied by N units by the DMD (4), one unit corresponds to one light spot, and m multiplied by m micromirrors contained in each unit of the digital micromirror array DMD (4) are switched between an independent on state and an independent off state to independently regulate and control the intensity and the uniformity of the light spots of each unit.
3. The two-photon parallel direct writing apparatus based on multi-dot matrix generation and independent control according to claim 2, wherein: the spatial light modulator SLM (8) performs phase modulation on incident light spots, and specifically comprises the following steps: the spatial light modulator SLM (8) equally divides an effective pixel area into N multiplied by N units, each unit comprises m multiplied by m liquid crystal surface elements, each liquid crystal surface element of each unit of the spatial light modulator SLM (8) is in one-to-one correspondence with m multiplied by m pixels of each unit of the digital micro mirror array DMD (4), and the wavefront of each unit light spot is independently regulated and controlled by controlling the m multiplied by m liquid crystal surface elements in each unit of the spatial light modulator SLM (8).
4. The device of claim 3, wherein the device is characterized in that the device is based on multi-dot matrix generation and independent controlIn the following steps: the first convex lens (5) and the second convex lens (6) form a 4F system and are used for imaging a light field on the DMD (4) to the SLM (8), and focal lengths F1 and F2 of the first convex lens (5) and the second convex lens (6) meet the requirements of F1/F2= dD/dSWherein d isD、dSPixel pitch of the digital micromirror array DMD (4) and the spatial light modulator SLM (8), respectively; and adjusting the positions and postures of the digital micromirror array DMD (4) and the spatial light modulator SLM (8) to ensure that after the light beams pass through the 4F system, the light spots of each unit are superposed with the unit areas on the spatial light modulator SLM (8) one by one.
5. The two-photon parallel direct writing apparatus based on multi-dot matrix generation and independent control according to claim 4, wherein: the third convex lens (10) and the fourth convex lens (11) form a 4F system II for imaging the light field on the SLM (8) to the focal plane of the micro lens array MLA (14), and the focal lengths F3 and F4 of the third convex lens (10) and the fourth convex lens (11) meet the requirements of F3/F4= m × dS/dMWherein d isMA microlens pitch of MLA (14); and adjusting the transverse position of the micro lens array MLA (14) to enable each unit light spot to correspond to each micro lens of the micro lens array MLA (14) one by one.
6. The two-photon parallel direct writing apparatus based on multi-dot matrix generation and independent control according to claim 5, wherein: the first reflecting mirror (3) and the second reflecting mirror (7) are respectively used for adjusting incident angles of the digital micro-mirror array DMD (4) and the spatial light modulator SLM (8), wherein the incident angle of the spatial light modulator SLM (8) is controlled within 10 degrees.
7. The two-photon parallel direct writing apparatus based on multi-dot matrix generation and independent control according to claim 6, wherein: the micro lens array MLA (14) comprises NxN micro lenses and is used for focusing incident NxN unit light spots, one unit light spot corresponds to one micro lens, and at most, an NxN focal point array can be generated in the focal plane of the MLA (14); the wavefront of each unit light spot is modulated through a spatial light modulator SLM (8), and the falling point position of each focus near the focus of the corresponding optical axis of the micro lens is independently controlled.
8. The two-photon parallel direct writing apparatus based on multi-dot matrix generation and independent control according to claim 7, wherein: the square adjustable diaphragm (13) is used for limiting the size of a light spot incident to the micro lens array MLA (14), and the aperture of the square adjustable diaphragm (13) is equal to the size of the effective area of the micro lens array MLA (14).
9. The two-photon parallel direct writing apparatus based on multi-dot matrix generation and independent control according to claim 8, wherein: the fifth convex lens (15) and the micro lens array MLA (14) form a 4F system III, a focus array generated by the micro lens array MLA (14) is changed into parallel light transmitted at different angles after passing through the fifth convex lens (15), light spot overlapping is realized at the entrance pupil surface of the objective lens (17), and finally, the parallel direct writing light spot lattice is formed by focusing on the focal plane of the objective lens (17).
10. The two-photon parallel direct writing device and method based on multi-lattice generation and independent control according to any one of claims 1-9, comprising the following steps: femtosecond laser pulse (1) is incident on a digital micromirror array (DMD) (4) after passing through a beam expander (2) and a first reflector (3), the digital micromirror array (DMD) (4) performs amplitude modulation on incident light spots, the incident light spots are imaged on a spatial light modulator (8) through a 4F system and a second reflector (7), the light spots are subjected to pure phase modulation through the spatial light modulator (8), the light spots emitted from the spatial light modulator (8) sequentially pass through a third reflector (9), a 4F system second, a fourth reflector (12) and a square adjustable diaphragm (13) to be incident on a micro lens array MLA (14), a focal point lattice is generated on a focal plane of the micro lens array MLA (14), and the lattice finally forms an image in a focal plane of an objective lens (17) on a precise displacement platform (18) after passing through a fifth convex lens (15), a dichroic mirror (16) and the objective lens (17), high-flux super-resolution two-photon direct writing processing is carried out, and generated fluorescence is reflected by an objective lens (17) and a dichroic mirror (16) and focused on a CCD (20) through a sixth convex lens (19) for imaging.
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