TW497149B - An illumination optical apparatus - Google Patents

Abstract

The present invention effectively suppresses light quantity loss and securing a prescribed focus depth and is capable to improve the resolution of a projecting optical system to a prescribed pattern shape. The apparatus is provided with angle luminous flux forming means (4, 5) for converting luminous fluxes projected from a light source means (1) into luminous fluxes of various angle components to a reference optic axis (AX) and making them be incident on a first prescribed surface; irradiation field formation means (6, 7) for forming two irradiation fields which are eccentric almost symmetrical with respect to the reference optical axis on a second prescribed surface, based on the incident luminous fluxes of the various angle components; an optical integrator (8) for forming a bipolar secondary light source provided with the almost same light intensity distribution, based on the luminous fluxes from the formed two irradiation fields; and a light guide optical system (10) for guiding the luminous fluxes form the optical integrator to a surface (M) to be irradiated.

Description

4 ^ 7149 A7 _ B7 V. Description of the Invention (1) Field of the Invention The present invention relates to an illumination optical device and an exposure device provided with the same, and particularly to a semiconductor device, a photographic device, and a liquid crystal display suitable for manufacturing a lithographic step. Illumination optics for exposure devices such as devices or thin-film magnetic heads. Relevant prior art This type of typical exposure device is a light beam emitted from a light source into a fly-eye lens, and a secondary light source containing many light source images is formed on the focal plane at the rear end. The light beam emitted by the secondary light source is restricted by the aperture stop near the focal surface at the rear end of the fly-eye lens, and then enters the condenser. The aperture diaphragm limits the shape or size of the secondary light source to the required shape or size according to the required lighting conditions (exposure conditions). The light beam condensed by the condenser lens is superimposed and illuminated with a mask having a specified pattern. The light that penetrates the mask pattern is imaged on the wafer via a projection optical system. As such, the mask pattern is projected and exposed (replicated) on the wafer. In addition, the pattern formed on the mask is overprinted. When the fine pattern is correctly copied on the wafer, it is indispensable to obtain a uniform illumination distribution on the wafer. m In recent years, by changing the size of the aperture portion (light transmitting portion) of the aperture stop disposed at the exit end of the fly-eye lens, the size of the secondary light source formed by the fly-eye lens has been changed, and the correlation of illumination β ( J 値 = aperture aperture / pupil aperture of the projection optical system, or 0 * 値 = number of apertures at the exit end of the illumination optical system / throw, apertures at the entrance end of the shadow optical system) has attracted attention. In addition, by setting the shape of the aperture portion of the aperture stop at the exit end of the fly-eye lens into a belt shape and a four-hole shape (that is, a quadrupole shape), the compound eye -4- This paper size applies the Chinese National Standard (CNS) A4 size (210 X 297 mm) 4β7149 Α7 ______— Β7 V. Description of the invention (2) The shape of the lens formed by the secondary light source is limited to the belt shape and quadrupole shape, which improves the focal depth and resolution of the projection optical system Technology has attracted attention. As described above, in the prior art, because the shape of the secondary light source is limited to the shape of the belt and the quadrupole, and the deformation lighting (belt lighting and quadrupole lighting) is performed, the light beam emitted by the larger secondary light source formed by the fly-eye lens It is limited by the aperture stop with a ring-shaped and quadrupole-shaped aperture. In other words, in the ribbon illumination and quadrupole illumination of the prior art, a considerable portion of the light beam emitted from the secondary light source is blocked by the aperture diaphragm, which affects the illumination (exposure). Therefore, due to the loss of the light amount of the aperture diaphragm, the brightness on the mask and the wafer is reduced, and the throughput of the exposure device is also reduced. In addition, since the patterns to be reproduced also include various pattern shapes, there is a need for an illumination technology that enables the projection optical system to improve the resolution of a specific pattern shape without reducing the depth of focus. SUMMARY OF THE INVENTION The object of the present invention is to perform anamorphic lighting, which is used to effectively suppress the loss of light quantity and ensure a specified depth of focus, while making the projection optical system improve the resolution of a specific pattern shape. In order to achieve the above object, an aspect of the present invention is an illumination optical device for illuminating a mask, which is used on a projection exposure device, and the pattern image on the mask is copied to a substrate through a projection optical system, and The light source mechanism is used to supply a light beam with an exposure wavelength; the secondary light source forming mechanism is used to form a light beam emitted from the light source mechanism in the illumination pupil shared with the pupil of the projection optical% system. Two surface light sources that are roughly symmetrically offset from a quasi-optical axis; and a zoom optical system, which is used to continuously change the distance between the two surface light sources from the reference optical axis, and the above -5- paper size applies China National Standard (CNS) A4 specification (210X297 mm) " ----- ^ 4p7149 A7 B7 V. Description of the invention (3) Each size of the two surface light sources and the above two surface light sources are estimated from the above reference optical axis The azimuth of the angle. Brief Description of the Drawings Fig. 1 is a schematic view showing a structure of an exposure apparatus provided with an illumination optical apparatus according to a first embodiment of the present invention. FIG. 2 is a structural view schematically showing the micro compound eye 4 of FIG. 1. FIG. 3 is an explanatory diagram of the action of the diffractive optical element 6 for bipolar illumination. FIG. 4 is an explanatory view of the action of the diffractive optical element 6 for bipolar illumination, and also shows a bipolar irradiation area formed on the incident surface of the fly-eye lens 8. FIG. Fig. 5 is a schematic view showing a structure of a turntable in which a plurality of aperture diaphragms are arranged in a circle. FIG. 6 is a diagram schematically showing the structure of the entrance surfaces from the micro fly's eye 4 to the fly's eye lens 8. FIG. It is a diagram illustrating the relationship between the magnification of the continuous zoom lens (Afocal Zoom Lens) 5 and the focal distance of the zoom lens (Zoom Lens) 7 and the size and shape of the polarized irradiation area formed on the entrance surface of the fly-eye lens 8. Fig. 7 is a structural diagram schematically showing an exposure apparatus provided with an illumination optical apparatus according to a second embodiment of the present invention. m Fig. 8 is a structural diagram of an important part schematically showing a similar example of the first embodiment and the second embodiment. FIG. 9 is a flowchart of a method of obtaining a semiconductor device of a micro device. The preferred embodiment is described in detail. A typical embodiment of the present invention is an angular beam forming mechanism and an irradiation area forming mechanism arranged in the optical path between the light source mechanism and the optical integrator. Specifically, the angular beam forming mechanism includes: a scattered beam forming element-6- This paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) A7 —____ B7 V. Description of the invention (4) pieces Converting the roughly parallel light beams emitted by the light source mechanism into light beams that scatter the reference optical axis at various angles; and optical systems such as continuous zoom lenses that converge the scattered light beams formed by the micro compound eyes and introduce them into later-described light beams The diffractive surface of the diffractive optical element of the conversion element. Therefore, the roughly parallel light beams emitted from the light source mechanism pass through the micro compound eye and the continuous zoom lens, and become light beams having various angular components with respect to the reference optical axis, and enter the diffractive optical element. In addition, the 'irradiation region forming mechanism includes a beam conversion element including a diffractive optical element', which is used to convert an incident beam into a plurality of (two) beams which are offset from a reference optical axis; According to several (two) light beams formed by the diffractive optical element, a plurality of irradiation areas offset from the reference optical axis are formed on the incident surface of the optical integrator of the fly-eye lens. The several (two) irradiated areas offset from the reference optical axis here refer to two irradiated areas that are roughly symmetrically offset from the reference optical axis, that is, polarized irradiated areas. In this way, the role of an angular beam forming mechanism composed of a micro fly eye and a continuous zoom lens, and an irradiation area forming mechanism composed of a diffractive optical element and a zoom lens, forms a bipolar irradiation area on the incident surface of the fly eye lens . Therefore, a secondary light source having the same bipolar shape is formed on the rear focal surface of the fly-eye lens. After the light beam emitted from such a secondary light source formed by the fly-eye lens is restricted by the aperture stop having an aperture portion corresponding to the size and shape of the secondary light source, a mask that illuminates the illuminated surface is superimposed. In this way, the present invention can form a bipolar secondary light source based on the light beam emitted from the light source mechanism with almost no loss of light quantity. Therefore, it can effectively restrain the limitation of the secondary -7. This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 497149 A7 B7 V. Description of the invention (5) The amount of light in the aperture of the light beam emitted by the light source is lost. And ensure the specified depth of focus, while enabling the projection optical system to improve the resolution of the specific pattern shape for deformation lighting. That is, the bipolar illumination based on the bipolar secondary light source mainly improves the resolution of the projection optical system for the pattern shape along one direction. In addition, of course, it is also possible to perform general circular lighting by keeping the micro compound eyes away from the illumination optical path and effectively suppressing the loss of light amount. In addition, according to the embodiment of the present invention, by changing the magnification of the continuous zoom lens, the outer diameter and the belt ratio of the secondary light source can be changed at the same time. Furthermore, by changing the focal length of the zoom lens, the outer diameter of the secondary light source can be changed without changing the wheel ratio of the secondary light source. Therefore, by appropriately changing the magnification of the continuous zoom lens and the focal distance of the zoom lens, the outer diameter of the secondary light source can be changed without changing its wheel ratio. As described above, the illumination optical device according to the embodiment of the present invention can effectively suppress the loss of the amount of light in the aperture stop of the secondary light source, and perform deformation illumination such as bipolar illumination and general circular illumination. In addition, with the simple operation of changing the magnification of the continuous zoom lens and changing the focal distance of the zoom lens, it is possible to effectively suppress the loss of light amount on the aperture stop, and at the same time, the parameters of the deformed illumination (the size and shape of the restricted secondary light source) )change. Therefore, the exposure device installed with the illumination optical device according to the embodiment of the present invention can appropriately change the type and parameters of the deformed illumination to obtain the resolution and focus depth of the projection optical system suitable for the fine pattern requiring exposure projection. Therefore, a good projection exposure with a high flux can be performed by using a high exposure brightness and good exposure conditions. In addition, using the illumination optical device according to the embodiment of the present invention, the pattern of the mask disposed on the illuminated surface is exposed on a photosensitive base. 8- This paper is in accordance with the Chinese National Standard (CNS) A4 specification (210 X 297 mm). )

Binding

The exposure method on the board can produce a good device because it can project light under good exposure conditions. Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings: Fig. 1 is a schematic view showing a structure of an exposure device equipped with the illumination optical device of the first embodiment of the present invention in 7F. In the figure, the normal direction along the wafer W of the photosensitive substrate I is set as the z axis, and the direction in the wafer plane parallel to the paper plane in FIG. I is set as the γ axis. The wafer plane is perpendicular to The direction of the paper surface in figure i is set to the X axis. The illumination optical device in Fig. I is set to perform bipolar illumination. The exposure apparatus of FIG. 1 is provided with a light source 1 ′ for supplying exposure light (illumination light), such as an excimer laser light source for supplying light with a wavelength of 248 nm or 193 nm. A substantially parallel light beam emitted from the light source 1 in the Z direction has a rectangular cross section elongated along the X direction, and enters a beam diffuser 2 composed of a pair of cylindrical lenses 2 a and 2 b. Each of the cylindrical lenses 2a and 2b has a negative refractive power and a positive refractive power in the paper plane (in the γζ plane) in FIG. 1, and functions as parallel plane plates in planes (in the XZ plane) perpendicular to the paper plane including the optical axis Ax. Therefore, the light beam entering the light beam diffuser 2 is enlarged within the paper surface of Fig. 1 and is shaped into a light beam having a prescribed rectangular cross section. The roughly parallel light beams passing through the beam diffuser 2 of the shaping optical system are deflected in the Y direction by the refracting mirror 3 and then enter the micro compound eyes *. As shown in Figs. 1 and 2, the micro compound eye 4 is an optical element composed of a plurality of regular hexagonal micro lenses 4a having positive refractive power and arranged in a vertical and horizontal direction. Generally, a micro compound eye is formed by performing an etching process on a parallel plane glass plate to form a micro lens group. -9-The paper ruler and Chinese National Standard (CNS) A4 specification (2iGχ tear public love) 497149 A7 B7 V. Description of the invention (7) Here, 'the micro lenses constituting the micro compound eye are more than the lens units constituting the compound eye lens Even smaller. In addition, unlike the fly-eye lens, which is composed of lens units that are isolated from each other, many micro-lenses are integrally formed and are not isolated from each other. However, the 'micro-eye' is similar to the fly-eye lens in that the lens elements having a positive refractive power are arranged vertically and horizontally. In addition, in FIG. 1 and FIG. 2, for the sake of simplicity, the number of the micro lenses 4 a constituting the micro compound eye 4 is set to be much smaller than the number of actual repairs. Therefore, the light beam entering the micro compound eye 4 is two-dimensionally divided by a plurality of microlenses, and a light source (condensing point) is formed on the rear focal surface of each microlens. The light beams emitted from a plurality of light sources formed on the focal surface at the rear end of the micro compound eye 4 respectively form scattered light beams having a regular hexagonal cross-section, and enter the continuous zoom lens 5. In this way, the micro compound eye 4 is an optical element array having a plurality of unit optical elements (microlenses) arranged in a planar shape (two-dimensional shape), and constitutes a scattered beam forming element, and converts a roughly parallel light beam emitted from the light source 1 into Light beams scattered at various angles with respect to the optical axis AX. In addition, the micro-complex eye 4 can be arbitrarily disassembled and assembled. In addition, the continuous zoom lens 5 has a structure that maintains a focus-free optical system (Afocal system) and allows the magnification to be continuously changed within a specified range. Here, the light path length of the illumination from the micro-eye 4 is executed by the first driving system 22 which operates according to the instruction of the control system 21. In addition, the magnification change of the continuous zoom lens 5 is performed by the second driving system 23, which operates in accordance with a command of the control system 21. The light beam that has passed through the continuous zoom lens 5 is incident on two diffractive optical elements (DOE) 6 for Mo Ming. At this time, each of the -10-^ scales formed on the focal plane at the rear end of the micro compound eye 4 applies the Chinese National Standard (CNS) A " ^ (21GX297 涵 497149

The scattered light beam emitted by the light source maintains a regular hexagonal cross section, 4 prosthetics, and a diffraction surface. That is, the focal plane of the continuous zoom lens 52 and the diffraction plane of the diffractive optical element 6 are optically conjugated. Therefore, the magnification of the continuous zoom lens 5 is changed by condensing the light beam aperture I at a point on the diffraction surface of the diffractive optical element 6. Generally, the structure of a diffractive optical element is formed on a glass substrate with a step having a wavelength interval of approximately exposure light (illumination light), and has a function of diffracting an incident light beam into a desired angle. Specifically, as shown in FIG. 3 (a), a diffraction optical element 6 for bipolar illumination converts a thin light beam that is perpendicularly incident to a human axis parallel to the optical axis into two light beams that travel at a specified exit angle. In other words, the thin light beams that are perpendicularly incident along the optical axis AX are diffracted in two specific directions at equal angles with the optical axis AX as the center to form two thin beams. Further details, 'the thin beam perpendicularly incident on the diffractive optical element 6 is converted into two beams' will pass through the center of the line connecting the two points of the two beams parallel to the rear surface of the diffractive optical element 6, which is located in the diffractive optical The injection axis of the element 6. In this way, the diffractive optical element 6 constitutes a light beam conversion element for converting the incident light beam into two light beams. Therefore, as shown in FIG. 3 (b), when a thick parallel light beam is incident perpendicularly to the diffractive optical element 6, two point images are also formed at the focal position of the lens 31 disposed behind the diffractive optical element 6. Point-like light source image) 3 2. That is, the diffractive optical element 6 forms a two-point light intensity distribution in the far field (or the Fraunhofer diffraction region). In addition, the lens 31 forms a two-point light intensity distribution formed on the far field (or the Fraunhofer diffraction region) on the rear focal plane. At this time, as shown in FIG. 3 (c), the coarse parallel light that is incident on the diffractive optical element 6 -11-This paper size applies to the Chinese National Standard (CNS) A4 specification (210X 297 male I)

Installation m 497149 A7 B7 V. Description of the invention (9) When the beam is tilted to the light extraction A X, the two images formed at the focal position of the transparence ^ 1 move. That is, when a thick parallel light beam incident on the diffractive optical element 6 is inclined along a specified surface, the two point images 3 3 formed at the focal position of the lens 31 are not changed in size, and the center thereof is inclined along the specified plane. Move the other end. As described above, 'the scattered light beam emitted from each light source formed on the focal plane after the micro compound eye 4 converges on the diffraction surface of the diffractive optical element 6 while maintaining a regular hexagonal cross section. In other words, although a light beam having various angular components is incident on the diffractive optical element 6, the angle of incidence is limited by the range of the light beam having a regular hexagonal cone shape. Therefore, as shown in FIG. 4 (a), the two-point image 40 formed by the light beams that are perpendicularly incident on the diffractive optical element 6 is used as the center, and the maximum angle of each edge line corresponding to the regular hexagonal cone-shaped beam range is projected The incoming light beam forms two dot-like images 4 1 to 4 6 at the focal position of the lens 31. Actually, since an infinite number of light beams having many angular components limited by the beam range of a regular hexagonal cone is incident into the diffractive optical element 6, an infinite number of two-point images overlap at the focal position of the lens 31, and A bipolar irradiation area 0 as shown in Fig. 4 (b) is formed. In addition, the diffractive optical element 6 adopts a structure in which the illumination light path can be detached arbitrarily, and adopts a diffractive optical element 6 which can be converted into eight-pole illumination. Structures of the diffractive optical element 61 for anamorphic quadrupole illumination and the diffractive optical element 62 for general circular illumination. The structures and functions of the diffractive optical element 60 for octapole illumination, the diffractive optical element 61 for quaternary illumination, and the diffractive optical element 62 for general circular illumination are described later. Here 'diffractive light extraction element for bipolar illumination 6, diffractive optical element 60 for octapolar illumination, deformed quadrupole illumination: -12 This paper size applies to China National Standard (CNS) A4 (210X 297 mm) 497149 A7 -------- B7 V. Description of the invention (1〇) I 'Diffraction optics το 6 1 and the diffractive optical element 6 2 for general circular lighting conversion is based on the control system 2 丨The third driving system 24 executes the command operation. Once again ... Fig. 1 'The light beam of the diffracting optical element 6 enters the zoom lens 7. At this time, the t-zoom lens 7 has the same function as the lens shown in FIG. 3. In addition, the entrance surface of the fly-eye lens 8 as an optical integrator is fixed near the focal surface of the rear end of the second transparent lens 7. Therefore, wear The light beam passing through the diffractive optical π member 6 forms two irradiations on the focal plane at the rear end of the zoom lens 7 and the entrance plane of the fly-eye lens 8 to the optical axis A χ as shown in FIG. 4 (b). The 'area' is a polarized irradiation area. The size of the polarized irradiation area (the diameter of the circle outside the polarized irradiation area) changes with the focal distance of the zoom lens 7. Thus, the diffractive optical element of the zoom lens 7 and the compound eye The incident surfaces of the lens 8 are connected in a substantially Fourier transform relationship. In addition, the change in the focal distance of the zoom lens 7 is performed by a fourth driving system 25 that operates according to a command of the control system]. Fly-eye lens 8 A plurality of lens units having a positive refractive power are arranged closely and arranged vertically and horizontally. In addition, each lens unit constituting the fly-eye lens 8 has a shape corresponding to an irradiation area to be formed on a mask (or needs to be formed on a wafer). The shape of the exposed area formed) is similar to a rectangular cross section. In addition, the entrance surface of each lens unit constituting the complex lens 8 is formed into a spherical shape convex toward the entrance end, and the exit surface is formed into a spherical shape convex toward the exit end. Therefore, the light beam incident on the fly-eye lens 8 is two-dimensionally divided by many lens units, and a light source is formed on the rear focal plane of each lens unit where the light beam is incident. In this way, light is formed on the rear focal plane of the fly-eye lens 8. Intensity points

497149 A7 _ B7 V. Description of the invention (11) The polar surface light source (hereinafter referred to as "secondary light source") having the same polarized area as the irradiation area formed by the light beam incident on the fly-eye lens 8 is used. A light beam emitted from a bipolar secondary light source formed on the focal end surface behind the fly-eye lens 8 enters an aperture stop 9 disposed in the vicinity thereof. The aperture diaphragm 9 is supported on a turntable (rotating plate: not shown in Fig. 1) that can rotate around a specified axis parallel to the optical axis AX. FIG. 5 is a schematic view showing a structure of a turntable in which a plurality of aperture diaphragms are arranged in a circle. As shown in FIG. 5, on the turntable substrate 400, eight aperture apertures having a light transmission range shown by diagonal lines in the figure are provided along the circumferential direction. The structure of the turntable substrate 400 can rotate around its axis parallel to the optical axis Ax through its center point 0. Therefore, by rotating the turntable substrate 400, one aperture stop selected from the eight aperture stops can be fixed in the illumination path. In addition, the rotation of the turntable substrate 400 is performed by a fifth drive system 26 which operates in accordance with a command of the control system 21. On the turntable substrate 400, three bipolar aperture diaphragms 401, 403, and 405 having different wheel ratios are formed. The bipolar aperture stop 401 here has two circular penetration regions symmetrically arranged at its center in a belt-shaped region having a belt-ratio of r11 / r21. The bipolar aperture diaphragm 403 has two circular penetration regions arranged symmetrically to its center in a wheel-belt region having a wheel-belt ratio of γ12 / γ22. The bipolar aperture diaphragm 405 has two circular penetration regions arranged symmetrically to its center in a belt-like region having a belt-ratio of rl3 / r21. In addition, three octopole apertures 402, 404, and 406 having different wheel ratios are formed on the turntable substrate 400. Furthermore, two circles having different sizes (apertures) are formed on the turntable substrate 400. -14-

A7 ______ B7 V. Description of the invention (U ^ --- shaped aperture diaphragms 407 and 408. Here the circular aperture diaphragm 407 has 2 ^, a small circular penetration area, and the circular aperture diaphragm 408 has A circular penetrating area of the size of 丄. In addition, three portable quadrupole apertures 409 to 411 with different wheel ratios are formed on the turntable substrate 400. Due to paper restrictions, the composition is shown separately. Therefore, borrow Choose a rain pole hole from the three wheel aperture apertures 40.1, 4.03, and 4.05; f two apertures, fixed in the light path, can be properly restricted (specified). Have a different wheel ratio The two pole-shaped beams are illuminated by three types of poles with different wheel-to-belt ratios. Furthermore, 'a circular aperture stop is selected from two circular aperture stops 407 and 408 and fixed in the illumination path. Two kinds of general circular illumination with different σ 値 can be performed. In Fig. 1, 'because a bipolar primary light source is formed on the focal surface behind the fly-eye lens 8', therefore, three bipolar apertures 1,403 and 405 are used. One of the two-pole aperture diaphragms 9 is selected. However, the structure of the turntable shown in FIG. 5 It is only an example, and the type and number of the aperture diaphragms are not limited. In addition, it is not limited to the aperture diaphragm of the turntable method. It can also be fixed in the illumination path to change the size and shape of the light transmission area.徨 Aperture. In addition, a rainbow aperture can be set to continuously change the circular aperture 'to replace the two circular aperture apertures 407 and 408. It penetrates the aperture aperture 9 having a bipolar aperture portion (light transmitting portion) twice After the light and line emitted from the light source receive the light-concentrating effect of the light-concentrating optical system 10 of the light-guiding optical system, the overlapping uniform illumination forms a mask M of a specified pattern. The light beam penetrating the pattern of the mask M passes through the projection optical system. PL, -15 on the photosensitive substrate. This paper size applies Chinese national standards ... ^^) Α4 size (210X297 mm) 497149

Figure I of a mask pattern is formed on the wafer w. In this way, in a plane (χγ plane) perpendicular to the projection optical system PL <optical pumping AX, by plane driving control of 3 circles W and performing unified exposure or scanning exposure, the pattern of the mask M is sequentially exposed on the wafer W On each exposed area. In addition, in the case of uniform exposure, the mask pattern is uniformly exposed on each exposure area of the wafer according to the so-called step and repeat method. At this time, the shape of the irradiation area _ on the mask M is a rectangle close to a square, and the cross-sectional shape of each lens unit of the fly-eye lens 8 is also a rectangle close to a square. In addition, during the scanning exposure, the mask and the wafer are moved relative to the projection optical system according to the so-called step and scan method, and the exposed mask patterns are scanned and exposed for each exposed area of the wafer. At this time, the shape of the irradiated area on the 'mask M is a rectangle with a short side to long side ratio of 1: 3, and the cross-sectional shape of each lens unit of the fly-eye lens 8 is similarly short. FIG. 6 is a structural diagram schematically showing the entrance surface of the fly-eye lens 4 to the fly-eye lens 8, illustrating the magnification of the continuous zoom lens 5 and the focal distance of the zoom lens 7, and the polar shape formed on the entrance surface of the fly-eye lens 8. The relationship between the size and shape of the irradiation area. In FIG. 6, at the center of the microlens disposed on the optical axis AX of the micro compound eye 4, the light rays 70 incident along the optical axis AX are emitted along the optical axis AX. The size of the micro compound eye 4 (the size corresponding to the diameter of the circle outside the regular hexagonal line) a is composed of a minute lens having a focal distance f 1. The light 70 passes through the continuous zoom lens 5 and enters the diffractive optical element 6 along the optical axis A X. The diffractive optical element 6 forms a light beam 7 0 a which is emitted at an angle of # with respect to the optical axis A X based on the light rays 70 incident perpendicularly along the optical axis AX. The light 7 emitted by the self-diffractive optical element 6 at an angle Θ 7 a a zoom lens 7 penetrating the focal distance f 2, -16- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 497149 A7 B7 V. Description of the invention (14) It reaches the entrance surface of the fly-eye lens 8. At this time, the position of the light ray 70a on the incident surface of the 'Flying Eye Lens 8 has a south degree from the optical sleeve AX to y. In addition, light rays 71, which enter the uppermost end of the microlenses arranged on the optical axis AX of the micro compound eye 4 in parallel to the optical axis AX, are emitted at an angle t to the optical axis AX. The light beam 71 passes through the continuous zoom lens 5 with a magnification of m and enters the diffractive optical element 6 at an angle t with respect to the optical axis AX. The light ray 71, which is incident on the diffractive optical element 6 at an angle t 'to the light #AX, is converted into various types of light including the light 71a which is emitted at an angle (Θ + t') to the optical axis AX. At an angle (Θ + t ') to the optical axis AX, the light 7 1 a emitted from the self-diffractive optical element 6 penetrates the zoom lens 7 and reaches the entrance plane of the fly-eye lens 8 from the optical axis AX as (y + b) South. In addition, the light rays 72 entering the lowermost end of the microlenses arranged on the optical axis A X of the micro compound eye 4 parallel to the optical axis AX are emitted at an angle to the optical axis AX. The light 72 passes through the continuous zoom lens 5 and enters the diffractive optical element 6 at an angle t with respect to the optical axis AX. The light rays 72 entering the diffractive optical element 6 at an angle t 'with respect to the optical axis AX are converted into various light rays including light rays 72a (not shown in the figure) emitted at an angle (β -t') with respect to the optical axis AX. At an angle (θ -1 ′) to the optical axis AX, the light 7 2 a emitted from the self-diffractive optical element 6 penetrates the zoom lens 7, and reaches the entrance surface of the fly-eye lens 8 from the optical axis AX as (yb) the height of. In this way, the range of the scattered light beams emitted from the light sources near the focal plane behind the micro-fly eye 4 to the entrance surface of the fly-eye lens 8 is in the two, polar irradiation areas shown in FIG. 4 (b). The distance from the optical axis AX is centered at a height of y and has a range of a width 2b. That is, as shown in FIG. 6 (b), the polarized irradiation area formed on the entrance surface of the fly-eye lens 8 and the rear area of the fly-eye lens 8 are formed. -17- This paper applies the Chinese National Standard (CNS) A4 specification ( 210X 297 mm) 497149 A7

5. Description of the invention (15) The bipolar secondary light source on the focal end surface has a height y from the center of the optical axis A X and has a width 2b. Here, the exiting angle t of the self-micro compound eye 4 and the angle t ′ entering the diffractive optical element 6 are expressed by the following formulas (1) and (2): t = a / (2-fl) (1) t '= t / m = a / (2-fl .m) (2) In addition, the sincere height y, the highest height (y + b), and the lowest south degree (yb) of the polar secondary light source are given by the following formula (3 ) ~ (5) represent: y = f2 · sin θ (3) y + b = f2 (sin β + sint,) (4) y — b = f2 (sin &lt; 9-sint,) (5) Therefore, The wheel ratio A, which is limited by the inner diameter 0 i and the outer diameter 0 of the bipolar secondary light source, is expressed by the following formula (6). Here, as shown in FIG. 6 (b), the inscribed 0i is the diameter of the circle inscribed on a pair of circles (equivalent to the aperture portion of the aperture 9 behind the hole) in a regular hexagonal surface light source. In addition, the outer diameter 0 is the diameter of a circle that lies outside the pair of circles. A = 0i / 0〇 = 2 (y — b) / (2 (y + b)) two (sin &lt; 9-sint 丨) / (sin θ + sint ’)

Msin θ-sin (a / (2 · fl · m))) / (sin $ + sin ((a / (2 · fl · m))) (6) In addition, the outer diameter of the bipolar secondary light source is 0 〇 is represented by the following formula (7):-0〇 = 2 (y + b) = 2 · f2 (sin θ + sint1) = 2 · f2 (sin θ + sin (2 / (a · f 1 · m) )) (7,

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497149 A7

V. Description of the invention (16) So, referring to formulas (2) to (6), when the magnification m of the continuous zoom lens 5 is changed, it can be seen that the center height y of the secondary secondary light source does not change, but only its width 2b changes. That is, by changing the magnification m of the continuous zoom lens 5, the size (outer diameter 0) of the bipolar secondary light source and its shape (belt ratio A) can be changed at the same time. In addition, with reference to the formulas (3) to (7), when the focal distance f 2 of the zoom lens 7 is changed, it can be seen that the belt ratio A of the bipolar secondary light source does not change, and the central direction y and its width 2b Change at the same time. That is, by changing the focal point distance f2 of the zoom lens 7, it is possible to change the outer diameter 0 of the secondary polarized light source without changing its belt ratio A. According to the above, by appropriately changing the magnification m of the continuous zoom lens 5 and the focal distance f2 of the zoom lens 7, it is possible to change only the wheel belt ratio A without changing the outer diameter 0 of the bipolar secondary light source. In addition, as shown in FIG. 6 (b), the two regular hexagonal surface light sources formed symmetrically offset from the optical axis AX are used as secondary light sources, the distance y from the optical axis AX of each surface light source, and each surface light source The size (width) 2b and the angle of each surface light source estimated from the optical axis AX, that is, the azimuth angle Φ, change continuously with the change in the magnification m of the continuous zoom lens 5 and the focal distance f 2 of the zoom lens 7. Therefore, when the diffractive optical element 6 for bipolar illumination is used, a bipolar secondary light source can be formed based on the light beam emitted from the light source 1 with almost no light loss. Therefore, it is possible to effectively suppress the aperture stop 9 that restricts the beam of the secondary light source. The amount of light is lost, for bipolar illumination. Secondly, let ’s say that the micro compound eye 4 is separated from the illumination optical path, and a diffractive optical element 62 for circular illumination is set in the illumination optical path to replace the diffractive optical element 6, 60 or 61, and the obtained general Circular lighting. At this time, along the optical axis -19- this paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 497149 A7 ___B7 V. Description of the invention (17) AX 'A beam with a rectangular cross section enters a continuous zoom Lens 5. The light beam incident on the continuous zoom lens 5 is enlarged or reduced according to its magnification. The light beam having a rectangular cross section along the optical axis AX exits from the continuous zoom lens 5 and enters the diffractive optical element 6 2. Here the circle The diffractive optical element 62 for shape illumination has a function of converting an incident rectangular light beam into a circular light beam. Therefore, a round chirped light beam formed by the diffractive optical element 62 penetrates the zoom lens 7 and forms a circular irradiation area centered on the optical axis A X on the incident surface of the continuous zoom lens 8. Therefore, a circular secondary light source centered on the optical axis a X is also formed on the rear focal surface of the fly-eye lens 8. At this time, by changing the focal distance of the zoom lens 7, the outer diameter of the circular secondary light source can be appropriately changed. In addition, corresponding to the micro compound eye 4 leaving the optical path of the illumination and using the diffractive optical element 6 2 s for circular illumination, it is sufficient to illuminate the optical path. 9b is converted into a circular aperture stop 9c. The circular aperture stop 9c is a circular aperture stop selected from two circular aperture stops 407 and 408, and has an aperture portion corresponding to the size of a circular secondary light source. In this way, by leaving the micro compound eye 4 away from the illumination optical path and using the diffractive optical element 62 for circular illumination, a circular secondary light source can be formed based on the light beam 'emitted from the light source 1 with almost no loss of light amount, It can effectively suppress the loss of light amount in the aperture stop that restricts the light beam of the secondary light source for general circular lighting. In the following, the prefecture will explain the lighting conversion operation and the like of the first embodiment. First of all, according to the step and repeat method or step and scan method, through the keyboard and other input mechanisms 20, the relevant information of the various masks that need to be sequentially exposed will be disclosed. -20- ^ 张 标定 财 目 ^^ ⑽) A4 Secret (21G X 297 mm) 497149 A7 B7 V. Description of the invention (18) Enter the control system 21. The control system 21 stores information such as the optimal line width (resolution) and depth of focus of various masks in some internal memories, and supplies appropriate control signals to the first drive system 2 according to the input of the input mechanism 20. ~ Fifth drive system 2 6. That is, when performing bipolar illumination based on the most appropriate resolution and focal depth, the second drive system 24 fixes the diffraction_optical element 6 for bipolar illumination in the light path of the illumination according to the instruction of the control system 21. Continuing, the second driving system 23 sets the magnification of the continuous zoom lens 5 according to the instruction of the control system 21, and the fourth driving system 25 sets the focus distance of the zoom lens 7 according to the instruction of the control system 21, and sets the focus distance of the zoom lens 7 On the rear focal plane, a bipolar secondary light source with the required size (outer diameter) and shape (belt ratio) is obtained. In addition, because the bipolar secondary light source is restricted in a state where the loss of light quantity is effectively suppressed, the fifth drive system 2 6 rotates the turntable according to the instructions of the control system 21 and fixes the required bipolar aperture diaphragm to the lighting. Light path. In this way, the bipolar primary light source 'can be formed with almost no light loss depending on the light beam of the light source 1, and thus the bipolar illumination can be performed with almost no light loss in the aperture stop which restricts the light beam emitted from the secondary light source. The bipolar illumination based on the bipolar secondary light source can make the projection optical system PL to improve the resolution of the pattern mainly along a certain direction while ensuring the specified focal depth. Furthermore, when necessary, the magnification of the continuous zoom lens 5 is changed by the second driving system 23, and the focal distance of the zoom lens 7 is changed by the fourth driving system 25. The change can be made appropriately after the fly-eye lens 8. The magnitude and wheel ratio of the two-pole primary light source on the end focus surface. At this time, the turntable was rotated in response to changes in the size of the bipolar light source and the ratio of the wheel and belt, and was selected to have the required -21-this paper size is suitable for financial countries @ 家 标准 (CNS) A4 size (21GX297)

The diameter and aperture ratio of the two-pole aperture diaphragm This' allows the two-pole-shaped secondary light source to perform a variety of two-pole illumination at the loss of the amount of the two-pole-shaped secondary light source. , And fixed in the light path. For example, in the formation and its limitation, the size of almost no light and the ratio of the wheel belt change appropriately. In addition, when performing general circular lighting based on the most appropriate solution power and depth of focus, the first drive system 2 2 is based on the 柝 佩 k The command of the control system 21 causes the micro compound eye 4 to leave from the illumination path. Besides one-r r drive system 24 according to the control system

The command of the device 21 'fixes the diffractive optical element 62 for general circular lighting in the bright light. Continue, follow, continue 'The second drive system 23 sets the magnification of the continuous zoom lens 5 in accordance with the instructions of the control system 2 ^, and the fourth drive system 25 sets the focus distance of the zoom lens 7 in accordance with the instructions of the control system 2i, and transmits through the compound eye A circular secondary source with the required size (outer diameter) is obtained on the focal surface of the 4¾ 8 i rear end. In addition, in order to limit the circular secondary light source while effectively suppressing the loss of light, the fifth drive system 26 rotates the turntable according to the instructions of the control system 2 i, and fixes the required circular aperture diaphragm to the illumination light. Process. In addition, when using a rainbow aperture that can change the continuity of the circular aperture, the fifth drive system 26 sets the aperture of the rainbow aperture according to the instruction of the prism system 21. In this way, a circular secondary light source can be formed based on the light beam emitted from the light source 1 with almost no loss of light amount. Therefore, it is possible to effectively limit the loss of light amount in the aperture of the light beam of the secondary light source for general circular lighting. Moreover, when the function is important, the size of the circular secondary light source formed on the focal point surface of the rear end of the fly-eye lens 8 can be appropriately changed by changing the focal distance of the zoom lens 7 by the fourth driving system 25. At this time, the turntable should respond to the circular quadratic 22- This paper size applies the Chinese National Standard (CNS) A4 specification (210X 297 mm) 497149 A7 B7 V. Description of the invention (20) The size of the light source is rotated and selected to have the required The circular aperture stop of the small and large aperture section is fixed in the illumination path. In this way, in the formation and limitation of the circular secondary light source, it is possible to effectively suppress the loss of light quantity, and appropriately change the chirp to perform a variety of general circular lighting. As described above, the first embodiment described above can effectively suppress the loss of light due to the limitation of the aperture stop of the secondary light source, and perform deformation lighting such as bipolar lighting and general circular f lighting. Furthermore, the simple operation of changing the magnification of the continuous zoom lens and changing the focal distance of the zoom lens can effectively suppress the loss of the light amount of the aperture diaphragm, and change the parameters of anamorphic lighting and general circular lighting. Therefore, the types and parameters of the anamorphic illumination can be appropriately changed, and the resolution and focal depth of the projection optical system suitable for exposure and projection of a fine pattern can be obtained. Therefore, a good projection exposure with high flux can be performed according to the high exposure brightness and good exposure conditions. Fig. 7 is a structural diagram schematically showing an exposure apparatus provided with an illumination optical apparatus according to a second embodiment of the present invention. The second embodiment has a structure similar to that of the first embodiment. However, in the first embodiment, a micro fly eye 4 is arranged between the refraction lens 3 and the continuous zoom lens 5, and a diffractive optical element 6 (60 to 6 is arranged between the continuous zoom lens 5 and the zoom lens 7). 2), and the second embodiment is that a diffractive optical element 6 (60, 61) is arranged between the refraction lens 3 and the continuous zoom lens 5, and a micro lens is arranged between the continuous zoom lens 5 and the zoom lens 7. Compound eyes 4. That is, the basic difference between the first embodiment and the second embodiment is only that the positions of the micro compound eyes and the diffractive optical elements are opposite. The second embodiment differs from the first embodiment in that there is no diffractive optical element for circular illumination. -23- This paper size applies to China National Standard (CNS) A4 (210X 297mm)

497149 A7 B7 V. Description of the invention (21) As mentioned above, the micro compound eye 4 and the continuous zoom lens 5 of the first embodiment form an angle beam forming mechanism, which converts the light beam emitted from the light source 1 into the optical axis AX having Light beams of various angle components are made to enter the diffraction surfaces of the diffractive optical element 6 (60, 61). At this time, the micro compound eye 4 constitutes a scattered light beam forming element, which converts a substantially parallel light beam emitted from the light source 1 into a light beam scattered at various angles with respect to the optical axis A X. In addition, the diffractive optical element 6 (6 0, 6 1_) and the zoom lens 7 constitute an irradiation area forming mechanism, which are based on a plurality of angle components (2) which are symmetrically shifted from the optical axis AX based on the incident light beam having various angular components. (A) The irradiation area is formed on the incident surface of the fly-eye lens 8. At this time, the diffractive optical element 6 (60, 61) constitutes a light beam conversion element which converts the incident light beam into several (two) light beams. Conversely, the diffractive optical element 6 (60, 61) and the continuous zoom lens 5 of the second embodiment form a beam shape conversion mechanism, which converts the light beam emitted from the light source 1 into a number of shifts to the optical axis AX ( (2) Light beams, and the light rays emitted from these light beams are incident on the entrance surface of the micro compound eye 4 from a direction inclined to the optical axis AX. At this time, the diffractive optical element 6 (60, 61) constitutes a light beam conversion element which converts a substantially parallel light beam emitted from the light source 1 into several (two) light beams. In addition, the micro fly's eye 4 and the zoom lens 7 form an irradiation area forming mechanism. Based on the light beam incident obliquely, a plurality of (two are symmetrically offset from the optical axis AX are formed on the incident surface of the fly eye lens 8). ) Irradiated area. At this time, the micro compound eye 4 system constitutes a wavefront division element, and the wavefront divides the incident light beam to form many chirped sources. As described above, the arrangement positions of the micro compound eyes 4 and the slit optical elements 6 (60, 61) of the first embodiment and the second embodiment are opposite. However, Article No. -24- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm)

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497149 A7 _ B7 ____ 5. Description of the invention (22) Part of the optical system from the micro compound eye 4 to the zoom lens 7 of the application mode, and the self-diffractive optical element 6 (60, 6 1) to the zoom of the second embodiment Part of the optical system of the lens 7 is optically equivalent. Therefore, part of the optical system from the micro fly eye 4 to the fly eye lens 8 in the first embodiment and part of the optical system from the self-diffractive optical element 6 (60, 6 1) to the fly eye lens 8 in the second embodiment are in The secondary light source forming mechanism is the same as several surface light sources that are symmetrically offset from the optical axis AX in the illumination pupil conjugated to the pupil of the projection optical system PL based on the light beam emitted from the light source 1. The differences from the first embodiment will be briefly described below. The continuous zoom lens 5 of the second embodiment connects the diffractive optical element 6 and the entrance surface of the micro-complex eye 4 to form an optical outline. In addition, the zoom lens 7 connects the focal surface at the rear end of the micro fly eye 4 and the incident surface of the fly eye lens 8 into a substantially Fourier transform relationship. Therefore, the light passing through the diffractive optical element 6 for polarized illumination forms two spot images on the pupil surface of the continuous zoom lens 5 as shown in FIG. 3 (b). The light emitted from these two point images penetrates the continuous zoom lens 5 to form parallel light, and enters the incident surface of the micro compound eye 4 from a direction inclined to the optical axis A X. Therefore, in the second embodiment, similar to the first embodiment, a symmetry with respect to the optical axis AX as shown in FIG. 4 (b) is formed on the focal surface at the rear end of the zoom lens 7 and on the incident surface of the fly-eye lens 8. The two irradiated regions that are offset, that is, polarized irradiated regions. Continuing, on the rear focal plane of the fly-eye lens 8, a bipolar secondary light source is formed with almost no light loss depending on the light beam 'emitted from the light source 1. In addition, the aperture diaphragm 9 disposed near the focal plane of the rear end of the fly-eye lens 8 hardly causes a loss of light amount. With regard to the continuous zoom-25- this paper size applies the Chinese National Standard (CNS) A4 specification (210X 297 mm) 497149 A7 B7 V. Description of the invention (23) The magnification of lens 5 and the focal distance of zoom lens 7 are appropriate The change can change the size and shape (wheel ratio) of the bipolar secondary light source, which is the same as the first embodiment. Fig. 8 is a structural diagram showing the essential parts of a similar example of the first embodiment and the second embodiment. The similar example of Fig. 8 has a structure similar to that of the first embodiment and the second embodiment. However, the basic difference is only that the first embodiment and the second embodiment use a wavefront split type fly-eye lens' as an optical integrator. A similar example in Fig. 8 uses a rod-shaped optical integrator of the internal reflection type. In addition, in FIG. 8, the elements of the light source side and the elements of the drive control relationship are omitted from the zoom lens 7 of the first embodiment and the second embodiment. Hereinafter, similar examples will be described with respect to differences from the first embodiment and the second embodiment. In the similar example, 'corresponding to the use of a rod-shaped integrator 8 a instead of the fly-eye lens 8, a condenser 7 a is attached to the optical path between the zoom lens 7 and the rod-shaped integrator 8 a, so the imaging optical system i 〇a is provided. Instead of condensing optical system 丄 〇, at the same time, the aperture stop for limiting the secondary light source is omitted. Here, in a similar example corresponding to the first embodiment, the composite optical system composed of the zoom lens 7 and the glare lens 7 a is formed by diffractive surfaces of the diffractive optical element 6 (60-62) and The incident surface of the two-shaped integrator 8a is connected to form an optically conjugate. In a similar example corresponding to the second embodiment, the rear focal surface of the micro compound eye 4 and the incident surface of the rod-shaped integrator 8a are connected to each other. Optical properties are generally consumed. In addition, the imaging optical system 10a connects the exit surface of the rod integrator 8a and the mask 掩 to form an optically approximate conjugate. The rod-shaped integrator 8a is made of glass materials such as quartz glass and fluorite. -26- 297 ^ 57 Kojima scale suitable country 497149 A7 B7 5. Description of the invention (24-sided reflective glass rod, using the inside and outside The interface, that is, the total reflection of the inner surface, passes through the condensing point and forms a light source image corresponding to the number of internal surface reflections along the parallel plane on the incident surface. Most of the light source images formed at this time are virtual images. The light source image at only the center (condensing point) is a real image. That is, the light beam incident on the rod integrator 8 a is reflected by the inner surface and divided along the angular direction. The secondary light source composed of many light source images is formed on the parallel plane. The light beam emitted by the secondary light source formed by the rod integrator 8 a at its entrance end is superimposed on its exit surface and penetrates the imaging optical system. 10a, uniformly illuminate the mask M with a specified pattern. As described above, the imaging optical system 10a connects the exit surface of the rod integrator 8a and the mask M (or the wafer W) to form an optical outline. Therefore, a rod-shaped product is formed on the mask M. The rectangular irradiation area of the cross section of the device 8a is similar. Therefore, similar examples are also the same as the first embodiment and the second embodiment, which can effectively suppress the loss of light amount, and perform deformation lighting such as bipolar lighting and general Circular illumination. The exposure apparatus of the various embodiments described above uses the illumination optical device to illuminate the mask (illumination step), and uses a projection optical system to scan and expose the copy pattern formed on the mask on the photosensitive substrate (exposure step ), Micro devices (semiconductor elements, photographic elements, liquid crystal display elements, thin-film magnetic heads, etc.) can be manufactured. Hereinafter, the exposure apparatus of the first embodiment shown in FIG. 1 or FIG. 7 will be described with reference to the flowchart of FIG. 9. The exposure apparatus of the second embodiment shown is a method for forming a predetermined circuit pattern on a wafer or the like of a photosensitive substrate to obtain a micro device such as a semiconductor device. -27- This paper is in accordance with China National Standard (CNS) A4 Specifications (210X297 mm)

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497149 A7 _B7 V. Description of the invention (25 ~~ ^ 'First' In step 301 of FIG. 9, a metal film is vapor-deposited on a batch of wafers. Second, in step 302, the metal film on the batch of wafers A photoresist is applied on the surface. Then, in step 303, the exposure device shown in FIG. I or FIG. 7 is used, and the pattern image on the mask is sequentially exposed and copied through its projection optical system (projection optical module). Each illuminated area on the batch of wafers. After that, the photoresist development on the batch of wafers is performed in step 304, and then in step 305, the photoresist is applied on the batch of wafers. The pattern is etched as a mask, and a circuit pattern corresponding to the pattern on the mask is formed in each irradiated area on each wafer. Then, a device such as a semiconductor element is manufactured by forming an upper circuit pattern and the like. Using the above The method for manufacturing a semiconductor device can obtain a semiconductor device having an extremely fine circuit pattern with a good flux. In addition, in each of the above embodiments, the diffractive optical element 6 (6 1 to 6 2), which is a light beam conversion element, can be used in a turntable manner. Fixed in the light path In addition, the above-mentioned diffractive optical element 6 (6 1 to 62) can be disassembled and converted by using a general sliding mechanism. In addition, in each of the above embodiments, the shape of the micro lens constituting the micro compound eye 4 is set Regular Hexagon. Because circular micro lenses cannot be arranged closely, light loss will occur. Therefore, a regular hexagon that is close to a circular polygon is selected. However, the shape of each micro lens constituting the micro compound eye 4 is not limited to this, for example Other suitable shapes including rectangles can also be used. In addition, in the above embodiments, the refractive power of the microlenses constituting the micro compound eye 4 is positive, but the refractive power of the microlenses may also be negative. The first embodiment uses a continuous zoom lens 5. However, a focal zoom lens (Focal Zoom Lens) can also be used instead of the continuous variable -28- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) ) 497149 A7 B7 Description) ~ A focal lens with a diffractive optical element in front of the micro compound eye 4 to convert a rectangular beam into a circular beam. In addition, each of the above embodiments uses one fly-eye lens 8, but the double-eye method using two fly-eye lenses is also applicable to the present invention. Moreover, in the first embodiment described above, when performing general circular illumination, the diffractive optical element 62 is fixed in the optical path of the illumination, but the diffractive optical element 62 may be omitted. In addition, although the various embodiments described above use the micro fly eye 4 as a scattered light beam forming element, a fly eye lens, a diffractive optical element, etc. may be used if necessary. The various embodiments described above use diffractive optical elements as the light beam conversion elements 6 (6 1 to 6 2). However, the present invention is not limited to this. For example, refractive optical elements such as a micro compound eye and a micro prism lens may be used. A detailed description of the diffractive optical element that can be used in the present invention is disclosed in U.S. Patent No. 5,850,300 and the like. In addition, the various embodiments described above take the projection exposure device provided with the illumination optical device as an example to explain the present invention. Of course, the present invention can also be applied to a general illumination optical device for uniformly illuminating an illuminated surface other than a mask. In addition, the structures of the light-guiding optical systems of the various embodiments described above are based on a condensing optical system 10 for condensing light emitted from a secondary light source formed at a position of the aperture stop 9 at an overlapping lighting mask. An optical region diaphragm (Mask Blind) and a relay optical system for forming an image of the illuminated region diaphragm on the mask M may be disposed between the condenser optical system 10 and the mask M. At first, the light guide optical system is composed of a condensing optical system 10 and an image transfer optical system. The condensing optical system 10 focuses the light emitted by the secondary light source formed at the position of the aperture stop 9 and overlaps the illumination. Irradiation area-29- The standard of this paper standard (CNS) A viewing frame (21GX 297 mm y 497149 A7 B7) V. Description of the invention (27) Aperture, the image of the aperture part of the aperture of the irradiated area by the transfer optical system It is formed on the mask M. As described above, the similar examples of the various embodiments are the same. In addition, the above-mentioned various embodiments are formed by combining a plurality of element lenses to form a fly-eye lens 8. Refers to those who set a few micro lens surfaces in a matrix on a light-transmitting substrate by means such as intaglio. Regarding the formation of several light source images, there is virtually no difference in function between the compound eye lens and the micro compound eye, but The size of the aperture of an element lens (micro lens) can be made extremely small, manufacturing costs can be greatly reduced, and the thickness and thinness in the optical axis direction can be made. Micro compound eyes are excellent. Furthermore, in the above-mentioned various embodiments, an aperture stop 9 for restricting the light beam of the secondary light source is arranged near the focal surface at the rear end of the fly-eye lens 8. However, a configuration in which the aperture stop is omitted may be adopted so that the light beam of the secondary light source is not affected at all For example, when the compound eye lens 8 described above is used as a micro compound eye, and the cross-sectional area of each lens unit constituting the compound eye is set to be extremely small, the configuration of the aperture stop can be omitted to make the beam of the secondary light source completely. The structure is not limited. In addition, the various embodiments described above use KrF excimer laser (wavelength: 248 nm) and ArF excimer laser (wavelength: 193 nm) as exposure light with a wavelength of 180 nm or more. Therefore, the diffractive optical element can be formed of quartz glass. In addition, when using a wavelength below 200 nm as the exposure light, such as when using an h laser (wavelength: 157 nm) that supplies exposure light with a wavelength in the hollow ultraviolet region, Can also be fluorite, quartz glass doped with fluorine, quartz glass doped with fluorine and hydrogen, the specified temperature of the structure is below 12,000 k, and the OH group concentration Quartz glass above 1000ppm, structure index -30-This paper size applies Chinese National Standard (CNS) A4 specification (210X297 public love) 497149 A7 B7 V. Description of the invention (28) The fixed temperature is below 1200 K, Quartz glass with a hydrogen molecule concentration of 1 X 1017 molecules / cm3 or more, a quartz glass with a structure designation temperature of 1200 K or less and a chlorine concentration of 50 ppm or less, and a structure designation temperature of 1200 K or less, and a hydrogen molecule concentration of 1 Materials selected from quartz glass group with xlO17 molecules / cm3 or more and chlorine concentration below 50 ppm to form diffractive optical elements. In addition, as for the quartz glass with a specified structure temperature of 1200 K or less and an OH group concentration of 1,000 ppm or more, as disclosed by the applicant of this patent in Japanese Patent No. 2770224, the specified temperature of the structure is 1200 K or less, and hydrogen Quartz glass with a molecular concentration of 1 X 1017 molecules / cm3 or more, quartz glass with a structural designation temperature of 1200 K or less and a gas concentration of 50 ppm or less, and a structural designation temperature of 1200 K or less with a hydrogen molecular concentration of 1 X 1 Quartz glass above 0 17 molecules / cm3 and chlorine concentration below 50 ppm is disclosed in Japanese Patent No. 293613 8 by the applicant of this patent. As described above, the illumination optical device according to various embodiments of the present invention can effectively suppress the loss of the light amount of the aperture stop caused by the limitation of the secondary light source, and perform deformed illumination such as bipolar illumination and general circular illumination. Therefore, the specified focal depth can be ensured, and the projection optical system can improve the resolution of a specific pattern shape. In addition, by changing the magnification of the continuous zoom lens and the simple operation of changing the focal distance of the zoom lens, it is possible to effectively suppress the light amount loss of the aperture diaphragm and change the parameters of the distortion illumination. Therefore, by installing the exposure device of the illumination optical device of various embodiments of the present invention, the types and parameters of the anamorphic illumination are appropriately changed to obtain the suitable requirements. -31-This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297) (Mm)

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497149 A7 B7 V. Explanation of the invention (29 Resolution and focal depth of the projection optical system for exposing the fine pattern of the projection. Therefore, a good projection exposure with high flux can be performed according to the high exposure brightness and good exposure conditions. In addition, the invention is used For the illumination optical device, an exposure method in which a mask pattern arranged on an illuminated surface is exposed on a photosensitive substrate can perform projection exposure according to good exposure conditions, so that a good micro device can be manufactured. -32- This paper size Applicable to China National Standard (CNS) A4 (210 X 297 mm)

Claims (1)

497149 1. An illumination optical device, which is used to illuminate a mask and is used on a projection exposure device to copy a pattern image on the mask onto a substrate via a projection optical system, which is characterized by having a light source mechanism, It is used to supply a light beam with an exposure wavelength; a secondary light source forming mechanism is used to form a roughly symmetrical reference optical axis based on the light beam emitted by the light source mechanism 'in an illumination pupil conjugated with the pupil of the above-mentioned projection optical system' Two surface light sources that are shifted in a linear manner; and a zoom optical system for continuously changing the distance between the two surface light sources from the reference optical axis, the respective sizes of the two surface light sources, and estimating the above from the reference optical axis The azimuth of the angle of the two area light sources. 2 · The illumination optical device according to item 1 of the patent application range, wherein the above-mentioned zoom optical system is provided with two zoom optical systems. 3. The illumination optical device according to item 2 of the patent application, wherein the above-mentioned secondary light source forming mechanism is provided with a light beam conversion element for converting an incident light beam into two light beams. 4 · The illumination optical device according to item 3 of the patent application, wherein the above-mentioned beam conversion element can be exchanged with other beam conversion elements. 5. The illumination optical device according to item i of the patent application scope, wherein the secondary light source forming mechanism includes: an angle beam forming mechanism for converting a light beam emitted from the light source mechanism into various angles with respect to the reference optical axis The component beam is incident on the first designated surface; and the irradiation area forming mechanism is used to comply with the above-mentioned first--33- This paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297) ) 497149 The light beams of the above-mentioned various angle components on the designated surface form two irradiation areas that are roughly symmetrically offset from the reference optical axis on the second designated surface; and a photon accumulator is used to form the second designated The light beams emitted from the two irradiated areas on the surface form a bipolar secondary light source having approximately the same light distribution as the two irradiated areas; and a light guide optical system for emitting the light from the optical integrator. Guide to the illuminated surface. 6 · The illumination optical device according to item 5 of the application, wherein the angle beam forming mechanism has a scattered beam forming element for converting a substantially parallel light beam emitted by the light source mechanism into a reference beam axis. Light beams scattered at various angles; and a first optical system for condensing a teaching light beam formed by the scattered light beam forming element and incident on the first designated surface. 7. The illumination optical device according to item 6 of the patent application, wherein the first optical system has a first zoom optical system, which does not change the center heights of the surface light sources formed as the secondary light sources, so that The width is changed, and the first zoom optical system constitutes at least a part of the above-mentioned zoom optical system. 8. The illumination optical device according to item 7 of the scope of the patent application, wherein the scattered light beam forming element has an optical element array having a plurality of unit optical elements arranged in a flat shape,-the first zoom optical system has a continuous zoom lens 'It is the number of light beams emitted by the above-mentioned light source mechanism formed by the above-mentioned optical element array -34- This paper size applies to China National Standard (CNS) A4 specification (210 X 297 mm) 497149 The light-condensing point is connected to the first predetermined surface to form a general optical conjugate. 9 · The illumination optical device according to item 5 of the application, wherein the above-mentioned irradiation area forming mechanism has a light beam conversion element which is arranged near the first designated surface for converting the incident light beam into several light beams; and the second The optical system is configured to guide a light beam emitted from the light beam conversion element to the second designated surface. 10. The illumination optical device according to item 9 of the scope of patent application, wherein the light beam conversion element forms a plurality of irradiated areas offset from the reference optical axis in the far field, and the second optical system makes the light field formed in the far field The plurality of irradiation areas are formed on the second designated surface. 11. The illumination optical device according to item 9 of the application, wherein the second optical system has a second zoom optical system, which is used to maintain a similar shape and change the outer diameter of the surface light sources forming the secondary light source. The second zoom optical system constitutes at least a part of the zoom optical system. 12. For the illumination optical device according to item 11 of the scope of patent application, wherein the above-mentioned beam conversion element has a diffractive optical element, which is configured to be detachable to the illumination optical path 'and the diffractive surface is fixed on the first specified surface The second zoom optical system connects the diffraction surface of the diffractive optical element and the second designated surface into a substantially Fourier transform relationship. 13. For example, the illumination optical device according to item i of the patent scope, wherein the secondary light source forming mechanism includes: a beam shape conversion mechanism for emitting the light source mechanism described above -35- The light beam is converted into two light beams which are offset from the reference optical axis, and the light rays emitted by the two light beams are incident on the first designated surface from a direction inclined to the reference optical axis; The light beam in the oblique direction on the first designated surface forms two irradiation areas that are roughly symmetrically offset from the reference optical axis on the second designated surface; and an optical integrator for forming on the second designated surface according to The light beams emitted from the two irradiated areas on the designated surface form a bipolar secondary light source having a light distribution similar to that of the two irradiated areas, and further include a light guide optical system for emitting the optical integrator. The light beam is guided into the above mask. 14. The illumination optical device according to item 13 of the scope of patent application, wherein the beam shape conversion mechanism has: a beam conversion element for converting roughly parallel light beams emitted by the light source mechanism into a plurality of light beams; and third optical A system for guiding a light beam emitted from the light beam conversion element to the first designated surface. 15. The illumination optical device according to item 14 of the scope of patent application, wherein the light beam conversion element forms a plurality of light beams shifted from the reference optical axis in a far field, and the third optical system causes the light beam formed in the far field to be formed. Several light beams are formed on the pupil surface. 16. According to the application, the illumination optical device according to item 4 of the patent, wherein the third optical system has a third zoom optical system, which is used to not change the center heights of the surface light sources forming the one human light source. The width of this paper is -36- This paper size is in accordance with Chinese National Standard (CNS) A4 (210 X 297 public directors) AB c D 497149 々 The scope of patent application is changed. The third zoom optical system constitutes the above-mentioned zoom optical system At least part of it. 17. For the illumination optical device according to item 16 of the patent application, wherein the above-mentioned beam conversion element has a diffractive optical element, and its structure can be arbitrarily detached and attached to the illumination optical path, and the third zoom optical system has a continuous zoom lens, The diffractive surface of the diffractive magnetic element is connected to the first predetermined surface to form an optically rough conjugate. 18. The illuminating optical device according to item 13 of the scope of patent application, wherein the above-mentioned irradiation area forming mechanism has: a wavefront division element for wavefront division of the light beam incident on the first specified surface to form a plurality of light sources; and a fourth An optical system is used for condensing the scattered light beams emitted from a plurality of light sources formed by the wave surface division element and introducing the scattered light beams into the second specified surface. 19. The illumination optical device according to item 18 of the scope of patent application, wherein the fourth optical system has a fourth zoom optical system, which is used to maintain a similar shape so that the outer diameters of the surface light sources forming the secondary light source described above Alternatively, the fourth zoom optical system constitutes at least a part of the above-mentioned zoom optical system. 20. The illumination optical device according to item 19 of the scope of patent application, in which the incident surface of the wave-surface dividing element is arranged near the first specified surface and has an optical element array having a plurality of units arranged in a flat shape. Optical components, -37- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 497149 8 8 8 8 A B c D 6. Scope of patent application The fourth zoom optical system connects the above-mentioned incident surface of the above-mentioned optical element array and the above-mentioned second specified surface into an optically roughly conjugated relationship. 21. An exposure device comprising: an illumination optical device according to any one of claims 1 to 20 of a patent application scope; and a projection optical system for projecting and exposing a mask pattern set on the surface to be irradiated On a photosensitive substrate. 22. A method for manufacturing a micro device, comprising: an exposure step for exposing the mask pattern on the photosensitive substrate by using the exposure device of the Nanning Patent Application No. 21; and an imaging step; It develops the photosensitive substrate exposed by the exposure step. -38- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm)