CN112509963B - 一种多孔真空吸盘的自洁性检测装置及其检测方法 - Google Patents
一种多孔真空吸盘的自洁性检测装置及其检测方法 Download PDFInfo
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Classifications
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- G—PHYSICS
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- G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
- G01N15/08—Investigating permeability, pore-volume, or surface area of porous materials
- G01N15/082—Investigating permeability by forcing a fluid through a sample
- G01N15/0826—Investigating permeability by forcing a fluid through a sample and measuring fluid flow rate, i.e. permeation rate or pressure change
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N7/00—Analysing materials by measuring the pressure or volume of a gas or vapour
- G01N7/10—Analysing materials by measuring the pressure or volume of a gas or vapour by allowing diffusion of components through a porous wall and measuring a pressure or volume difference
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
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CN202011192815.6A CN112509963B (zh) | 2020-10-30 | 2020-10-30 | 一种多孔真空吸盘的自洁性检测装置及其检测方法 |
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Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA2039844A1 (en) * | 1990-04-09 | 1991-10-10 | Toshiyuki Nakagawa | Temperature control system for semiconductor wafer or substrate |
CN103323173A (zh) * | 2013-06-27 | 2013-09-25 | 开平市盈光机电科技有限公司 | 一种用于检测光盘模具镜面的真空度的检测器 |
TW201508814A (zh) * | 2013-08-27 | 2015-03-01 | Toshiba Kk | 檢查裝置及檢查方法 |
CN111220524A (zh) * | 2020-01-19 | 2020-06-02 | 福建龙净环保股份有限公司 | 一种多孔过滤材料透气性测试装置及方法 |
CN210938452U (zh) * | 2019-11-06 | 2020-07-07 | 平凉市老兵科技研发有限公司 | 一种用于减薄机的真空吸盘 |
CN211626838U (zh) * | 2020-01-21 | 2020-10-02 | 天津市通达广源科技发展有限公司 | 一种陶瓷真空气密性测试装置 |
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2020
- 2020-10-30 CN CN202011192815.6A patent/CN112509963B/zh active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA2039844A1 (en) * | 1990-04-09 | 1991-10-10 | Toshiyuki Nakagawa | Temperature control system for semiconductor wafer or substrate |
CN103323173A (zh) * | 2013-06-27 | 2013-09-25 | 开平市盈光机电科技有限公司 | 一种用于检测光盘模具镜面的真空度的检测器 |
TW201508814A (zh) * | 2013-08-27 | 2015-03-01 | Toshiba Kk | 檢查裝置及檢查方法 |
CN210938452U (zh) * | 2019-11-06 | 2020-07-07 | 平凉市老兵科技研发有限公司 | 一种用于减薄机的真空吸盘 |
CN111220524A (zh) * | 2020-01-19 | 2020-06-02 | 福建龙净环保股份有限公司 | 一种多孔过滤材料透气性测试装置及方法 |
CN211626838U (zh) * | 2020-01-21 | 2020-10-02 | 天津市通达广源科技发展有限公司 | 一种陶瓷真空气密性测试装置 |
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