CN112285815A - 衍射器件、分光装置和衍射器件的制造方法 - Google Patents
衍射器件、分光装置和衍射器件的制造方法 Download PDFInfo
- Publication number
- CN112285815A CN112285815A CN202010718667.0A CN202010718667A CN112285815A CN 112285815 A CN112285815 A CN 112285815A CN 202010718667 A CN202010718667 A CN 202010718667A CN 112285815 A CN112285815 A CN 112285815A
- Authority
- CN
- China
- Prior art keywords
- znse
- diffraction grating
- zns
- diffraction
- grating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 11
- SBIBMFFZSBJNJF-UHFFFAOYSA-N selenium;zinc Chemical compound [Se]=[Zn] SBIBMFFZSBJNJF-UHFFFAOYSA-N 0.000 claims abstract description 55
- 238000007654 immersion Methods 0.000 claims description 25
- 229910003460 diamond Inorganic materials 0.000 claims description 21
- 239000010432 diamond Substances 0.000 claims description 21
- 238000003754 machining Methods 0.000 claims description 18
- 230000003287 optical effect Effects 0.000 claims description 18
- 238000012545 processing Methods 0.000 claims description 18
- 239000000463 material Substances 0.000 claims description 15
- 238000000034 method Methods 0.000 claims description 14
- 238000000151 deposition Methods 0.000 claims description 7
- 230000000737 periodic effect Effects 0.000 claims description 4
- 239000006185 dispersion Substances 0.000 claims description 3
- 230000008569 process Effects 0.000 claims description 3
- 230000008878 coupling Effects 0.000 claims description 2
- 238000010168 coupling process Methods 0.000 claims description 2
- 238000005859 coupling reaction Methods 0.000 claims description 2
- 238000005137 deposition process Methods 0.000 claims 1
- 230000003595 spectral effect Effects 0.000 claims 1
- 239000005083 Zinc sulfide Substances 0.000 description 35
- 229910052984 zinc sulfide Inorganic materials 0.000 description 35
- 238000005520 cutting process Methods 0.000 description 25
- 239000013078 crystal Substances 0.000 description 10
- 238000010586 diagram Methods 0.000 description 6
- 238000002834 transmittance Methods 0.000 description 4
- 238000012546 transfer Methods 0.000 description 3
- 230000007547 defect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 238000007493 shaping process Methods 0.000 description 2
- PFNQVRZLDWYSCW-UHFFFAOYSA-N (fluoren-9-ylideneamino) n-naphthalen-1-ylcarbamate Chemical compound C12=CC=CC=C2C2=CC=CC=C2C1=NOC(=O)NC1=CC=CC2=CC=CC=C12 PFNQVRZLDWYSCW-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000002178 crystalline material Substances 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000005549 size reduction Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1876—Diffractive Fresnel lenses; Zone plates; Kinoforms
- G02B5/188—Plurality of such optical elements formed in or on a supporting substrate
- G02B5/1885—Arranged as a periodic array
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
- G01J3/0208—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using focussing or collimating elements, e.g. lenses or mirrors; performing aberration correction
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/12—Generating the spectrum; Monochromators
- G01J3/18—Generating the spectrum; Monochromators using diffraction elements, e.g. grating
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
- G02B27/1086—Beam splitting or combining systems operating by diffraction only
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1814—Diffraction gratings structurally combined with one or more further optical elements, e.g. lenses, mirrors, prisms or other diffraction gratings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1852—Manufacturing methods using mechanical means, e.g. ruling with diamond tool, moulding
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B2005/1804—Transmission gratings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Spectrometry And Color Measurement (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019135679A JP2021018392A (ja) | 2019-07-23 | 2019-07-23 | 回折素子および分光装置、ならびに回折素子の製造方法 |
| JP2019-135679 | 2019-07-23 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN112285815A true CN112285815A (zh) | 2021-01-29 |
Family
ID=71527657
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202010718667.0A Pending CN112285815A (zh) | 2019-07-23 | 2020-07-23 | 衍射器件、分光装置和衍射器件的制造方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US11520090B2 (enExample) |
| EP (1) | EP3770655A1 (enExample) |
| JP (1) | JP2021018392A (enExample) |
| CN (1) | CN112285815A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN119395799A (zh) * | 2025-01-06 | 2025-02-07 | 中国科学院长春光学精密机械与物理研究所 | 一种内反射式浸没光栅及其制作方法 |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2023055029A (ja) * | 2021-10-05 | 2023-04-17 | 日本電気硝子株式会社 | イマージョン回折素子及びその製造方法 |
| DE112022004753T5 (de) * | 2021-10-05 | 2024-08-14 | Nippon Electric Glass Co., Ltd. | Immersions-beugungselement und verfahren zu seiner herstellung |
| JP7647481B2 (ja) * | 2021-10-05 | 2025-03-18 | 日本電気硝子株式会社 | イマージョン回折素子 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1393862A (zh) * | 2001-06-21 | 2003-01-29 | 株式会社三协精机制作所 | 光拾取装置 |
| CN101222009A (zh) * | 2007-01-12 | 2008-07-16 | 清华大学 | 发光二极管 |
| CN101551519A (zh) * | 2008-04-03 | 2009-10-07 | 三星电子株式会社 | 光学扫描设备和包括该光学扫描设备的成像设备 |
| US20130342909A1 (en) * | 2012-06-20 | 2013-12-26 | Canon Kabushiki Kaisha | Method of manufacturing a diffraction grating |
| US20150309220A1 (en) * | 2014-04-28 | 2015-10-29 | Finisar Corporation | Reflective diffraction gratings employing efficiency enhancement or etch barrier layers |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5243583A (en) * | 1989-04-06 | 1993-09-07 | Ricoh Company, Ltd. | Optical pickup device with dual grating element |
| JPH0611616A (ja) * | 1992-04-28 | 1994-01-21 | Hitachi Ltd | 光偏光素子 |
| JP2003075622A (ja) * | 2001-09-05 | 2003-03-12 | Toshiba Corp | 回折格子、回折格子の加工方法及び光学要素 |
| US6965475B2 (en) * | 2003-03-28 | 2005-11-15 | Sumitomo Electric Industries, Ltd. | Optical component, optical device and optical communications system |
| JP2006220705A (ja) * | 2005-02-08 | 2006-08-24 | Sumitomo Electric Ind Ltd | 赤外線ハイブリッドレンズ及び赤外線ハイブリッドレンズの製造方法 |
| JP5599175B2 (ja) * | 2009-10-06 | 2014-10-01 | ジェイディーエス ユニフェイズ コーポレーション | 分散素子、分光装置、及び波長選択スイッチ |
| JP6254804B2 (ja) * | 2013-09-20 | 2017-12-27 | 株式会社タムロン | 赤外線光学系 |
| JP6253724B2 (ja) * | 2016-07-08 | 2017-12-27 | キヤノン株式会社 | 反射型回折素子 |
-
2019
- 2019-07-23 JP JP2019135679A patent/JP2021018392A/ja active Pending
-
2020
- 2020-07-08 EP EP20184701.9A patent/EP3770655A1/en not_active Withdrawn
- 2020-07-15 US US16/929,543 patent/US11520090B2/en active Active
- 2020-07-23 CN CN202010718667.0A patent/CN112285815A/zh active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1393862A (zh) * | 2001-06-21 | 2003-01-29 | 株式会社三协精机制作所 | 光拾取装置 |
| CN101222009A (zh) * | 2007-01-12 | 2008-07-16 | 清华大学 | 发光二极管 |
| CN101551519A (zh) * | 2008-04-03 | 2009-10-07 | 三星电子株式会社 | 光学扫描设备和包括该光学扫描设备的成像设备 |
| US20130342909A1 (en) * | 2012-06-20 | 2013-12-26 | Canon Kabushiki Kaisha | Method of manufacturing a diffraction grating |
| US20150309220A1 (en) * | 2014-04-28 | 2015-10-29 | Finisar Corporation | Reflective diffraction gratings employing efficiency enhancement or etch barrier layers |
Non-Patent Citations (2)
| Title |
|---|
| DALI LIU: "Optical bistability in ZnS/ZnSe", 《PROCEEDINGS OF SPIE》 * |
| ROMAN KRUZELECKY: "Hadamard spectrometer for passive LWIR standoff surveillance", 《PROCEEDINGS OF SPIE》 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN119395799A (zh) * | 2025-01-06 | 2025-02-07 | 中国科学院长春光学精密机械与物理研究所 | 一种内反射式浸没光栅及其制作方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20210026052A1 (en) | 2021-01-28 |
| US11520090B2 (en) | 2022-12-06 |
| EP3770655A1 (en) | 2021-01-27 |
| JP2021018392A (ja) | 2021-02-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US11520090B2 (en) | Diffraction device, spectroscopic apparatus, and manufacturing method of diffraction device | |
| JP5864920B2 (ja) | 回折格子の製造方法 | |
| US9715049B2 (en) | Method of manufacturing a diffraction grating | |
| US6965476B2 (en) | Diffractive optical element | |
| US7561333B2 (en) | Method for manufacturing mold | |
| JPH10293205A (ja) | 回折光学素子及び金型の製造方法 | |
| JP2003075622A (ja) | 回折格子、回折格子の加工方法及び光学要素 | |
| JP2015121605A (ja) | 回折格子および回折格子の製造方法 | |
| JP5972100B2 (ja) | 反射型回折素子 | |
| US9372289B2 (en) | Method of manufacturing a diffraction grating | |
| JP6253724B2 (ja) | 反射型回折素子 | |
| US12030143B2 (en) | Method for manufacturing a cutting tool, and the cutting tool | |
| JP2017156589A (ja) | ブレーズ型回折格子、製造方法、分光装置及び伝送装置 | |
| CN111741839B (zh) | 模具的制造方法 | |
| JP2020112601A (ja) | 回折素子、分光分析装置、回折素子の製造方法 | |
| Yamagata et al. | Fabrication of blazed holographic optical element by ultrahigh-precision cutting | |
| Morita et al. | Fabrication of blazed holographic optical elements on oxygen free copper by ultrahigh precision cutting |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20210129 |
|
| WD01 | Invention patent application deemed withdrawn after publication |