CN112071958A - 一种新型p型晶硅电池发射极接触钝化制备工艺 - Google Patents

一种新型p型晶硅电池发射极接触钝化制备工艺 Download PDF

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CN112071958A
CN112071958A CN202011013644.6A CN202011013644A CN112071958A CN 112071958 A CN112071958 A CN 112071958A CN 202011013644 A CN202011013644 A CN 202011013644A CN 112071958 A CN112071958 A CN 112071958A
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crystalline silicon
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杨飞飞
张波
申开愉
张云鹏
李雪方
郭丽
吕爱武
杜泽霖
李陈阳
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Shanxi Luan Solar Energy Technology Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
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    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
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    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
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    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
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Abstract

本发明涉及太阳能电池生产领域,一种新型p型晶硅电池发射极接触钝化制备工艺,按照清洗制绒、扩散制结、去PSG及背刻蚀、高温氧化、正面减反膜、背面钝化及减反膜、正面激光开槽、发射极重掺杂、去PSG、背面激光开槽、丝网印刷的工艺进行,其中,发射极重掺杂过程中,采用热扩散的方式,通入300sccm的N2、500‑1000sccm的N2‑POCl3、400‑900sccm的O2,安均匀的速率从780℃提升到820℃,时间为100‑200s,维持820℃,通入1‑3slm的N2,时间1‑2min。通过钝化发射极,减少金属化区域复合电流,提升电池转换效率0.3‑0.5%。

Description

一种新型p型晶硅电池发射极接触钝化制备工艺
技术领域
本发明涉及太阳能电池生产领域,特别是涉及p型晶硅电池发射极制备领域。
背景技术
当前,单晶PERC电池转换效率的提升,主要基于非金属区域钝化膜层的优化、激光掺杂技术的应用等,当这些技术应用成熟后,PERC电池转换效率的提升出现瓶颈。
发明内容
本发明所要解决的技术问题是:如何克服PERC电池转换效率的提升出现瓶颈,进一步提升电池转换效率。
本发明所要解决的技术问题是:一种新型p型晶硅电池发射极接触钝化制备工艺,按照清洗制绒、扩散制结、去PSG及背刻蚀、高温氧化、正面减反膜、背面钝化及减反膜、正面激光开槽、发射极重掺杂、去PSG、背面激光开槽、丝网印刷的工艺进行,其中,发射极重掺杂过程中,采用热扩散的方式,通入300sccm的N2、500-1000sccm的N2-POCl3、400-900sccm的O2,安均匀的速率从780℃提升到820℃,时间为100-200s,维持820℃,通入1-3slm的N2,时间1-2min。
正面激光开槽时,开槽使用激光波长为532nm的绿光,激光光斑大小为120um,最大功率40W,打标能量为最大功率的90-100%,调制频率为200-240Khz,雕刻速度为27000mm/min。
去PSG步骤中,使用原液浓度为体积百分比为49%HF,与H2O配置成1%体积浓度的混合液,反应时间为0.5-2min。
本发明的有益效果是:本发明将氮化硅膜作为掩膜层,采用热扩散方式,在发射极制备磷重掺层,不仅降低金属区接触电阻,同时钝化了发射极。通过钝化发射极,减少金属化区域复合电流,提升电池转换效率0.3-0.5%。
附图说明
图1是本发明的完成后电池片结构示意图。
具体实施方式
本发明提出一种新型晶硅电池发射极接触钝化制备工艺,如图1,通过在发射极制备磷重掺层,不仅降低金属区接触电阻,同时钝化发射极。具体的制备工艺如下:
1. 清洗制绒。制绒使用碱制绒,刻蚀量控制在0.4-0.6g,反射率7%-12%。
2. 扩散制结。
3. 去PSG及背刻蚀。清洗边缘与背面部分BSG,使用碱刻蚀,刻蚀量控制在0.14-0.17g,反射率35%-45%。
4. 高温氧化。
5. 正面减反膜。在管式PECVD中制备氮化硅,折射率为2.03-2.10,膜厚为75-80nm的氮化硅膜。
6. 背面钝化及减反膜。
7. 正面激光开槽。开槽使用激光波长为532nm的绿光,激光光斑大小为120um,最大功率40W,打标能量为最大功率的90-100%。调制频率为200-240Khz,雕刻速度为27000mm/min。
8. 发射极重掺杂。采用热扩散的方式。通入300sccm的N2、500-1000sccm的N2-POCl3、400-900sccm的O2,按照均匀的速率从780℃提升到820℃,时间为100-200s;维持820℃,通入1-3slm的N2,时间1-2min。
9. 去PSG。使用原液浓度为49%HF,与H2O配置成1%体积浓度的混合液,反应时间为0.5-2min。
10. 背面激光开槽。
11. 丝网印刷。

Claims (3)

1.一种新型p型晶硅电池发射极接触钝化制备工艺,其特征在于:按照清洗制绒、扩散制结、去PSG及背刻蚀、高温氧化、正面减反膜、背面钝化及减反膜、正面激光开槽、发射极重掺杂、去PSG、背面激光开槽、丝网印刷的工艺进行,其中,发射极重掺杂过程中,采用热扩散的方式,通入300sccm的N2、500-1000sccm的N2-POCl3、400-900sccm的O2,安均匀的速率从780℃提升到820℃,时间为100-200s,维持820℃,通入1-3slm的N2,时间1-2min。
2.根据权利要求1所述的一种新型p型晶硅电池发射极接触钝化制备工艺,其特征在于:正面激光开槽时,开槽使用激光波长为532nm的绿光,激光光斑大小为120um,最大功率40W,打标能量为最大功率的90-100%,调制频率为200-240Khz,雕刻速度为27000mm/min。
3.根据权利要求1所述的一种新型p型晶硅电池发射极接触钝化制备工艺,其特征在于:去PSG步骤中,使用原液浓度为体积百分比为49%HF,与H2O配置成1%体积浓度的混合液,反应时间为0.5-2min。
CN202011013644.6A 2020-09-24 2020-09-24 一种新型p型晶硅电池发射极接触钝化制备工艺 Pending CN112071958A (zh)

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101533871A (zh) * 2009-04-01 2009-09-16 常州天合光能有限公司 晶体硅太阳电池选择性扩散工艺
KR20150107070A (ko) * 2014-03-13 2015-09-23 현대중공업 주식회사 태양전지의 선택 에미터 구조 형성방법 및 이에 의한 태양전지
CN106784053A (zh) * 2017-02-20 2017-05-31 泰州乐叶光伏科技有限公司 一种n型选择性发射极双面电池及其加工方法
CN107221568A (zh) * 2017-07-10 2017-09-29 苏州腾晖光伏技术有限公司 一种选择发射极双面perc电池的制备方法
CN107507872A (zh) * 2017-08-14 2017-12-22 江苏科来材料科技有限公司 一种双面掺杂的高效太阳能电池及其制作方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101533871A (zh) * 2009-04-01 2009-09-16 常州天合光能有限公司 晶体硅太阳电池选择性扩散工艺
KR20150107070A (ko) * 2014-03-13 2015-09-23 현대중공업 주식회사 태양전지의 선택 에미터 구조 형성방법 및 이에 의한 태양전지
CN106784053A (zh) * 2017-02-20 2017-05-31 泰州乐叶光伏科技有限公司 一种n型选择性发射极双面电池及其加工方法
CN107221568A (zh) * 2017-07-10 2017-09-29 苏州腾晖光伏技术有限公司 一种选择发射极双面perc电池的制备方法
CN107507872A (zh) * 2017-08-14 2017-12-22 江苏科来材料科技有限公司 一种双面掺杂的高效太阳能电池及其制作方法

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