CN111962033A - Preparation method and preparation equipment of color dielectric film - Google Patents
Preparation method and preparation equipment of color dielectric film Download PDFInfo
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/28—Processes for applying liquids or other fluent materials performed by transfer from the surfaces of elements carrying the liquid or other fluent material, e.g. brushes, pads, rollers
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
- B05D5/06—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain multicolour or other optical effects
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/24—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
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- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/285—Interference filters comprising deposited thin solid films
Abstract
The invention discloses a preparation method of a color dielectric film, which comprises the following steps: step 1, plating a high-refractive-index film layer by a magnetron sputtering method, ionizing a high-refractive-index material into an ion state under the action of an electromagnetic field, and sputtering O in a cavity2Carrying out chemical reaction, and depositing the reaction product on the surface of the substrate to obtain a high-refractive-index film layer; step 2, plating a low-refractive-index film layer by a roll coating method, and heating and curing the low-refractive-index material to realize combination with the substrate to obtain the low-refractive-index filmA layer; and 3, performing laminated alternate plating according to the high-refractive-index film layer plating method in the step 1 and the low-refractive-index film layer plating method in the step 2 to finish the preparation of the color medium film. The color dielectric film preparation method adopts a magnetron sputtering/roll coating method/magnetron sputtering/roll coating method … … repeated stacking process to prepare the color dielectric film, and solves the problem of production beat mismatching of the color dielectric film caused by different thicknesses of high refractive index materials and low refractive index materials.
Description
Technical Field
The invention relates to the technical field of dielectric films, in particular to a preparation method and preparation equipment of a color dielectric film.
Background
Dielectric film: the film layer material is non-metal oxide, and functional optical films are formed by stacking materials with different refractive indexes of high/low/… …, and comprise high-transmittance films, high-reflection films, color films and the like.
The color dielectric film has colorful colors and high optical transmittance, and is very suitable for being applied to photovoltaic modules. The color dielectric film brings building aesthetic effects to a power generation curtain wall, a power generation tile and the like, simultaneously ensures that the photovoltaic front panel has good optical transmittance and extremely low optical loss, perfectly combines building beauty and green environmental protection together, and has wide application market.
However, the existing color dielectric film has a huge problem in mass production. At present, the commonly used color dielectric film coating technologies comprise evaporation coating and magnetron sputtering coating. The evaporation coating is manufactured in a single furnace, so that the coating time is long, the efficiency is low, the coating size is limited, and the evaporation coating is generally only applied to the development of a film system in a laboratory or small-area and small-batch trial production and is not suitable for large-area and large-scale production. The magnetron sputtering technology is usually used in large-area large-scale continuous production because of large plating area, high speed and high film layer quality and can realize continuous production. For example, the Low-E glass and the solar control film glass which are popular in the market are all realized by a magnetron sputtering method.
The color medium film adopts the stack of materials with different refractive indexes, such as high/low/high/low … …, and the like, thereby realizing the coherence or the cancellation of the light with the specific wave band, reflecting the light with the specific wave band to the eyeball of a person and realizing the color effect. The thickness of the high/low/high/low … … material must be adjusted to achieve the coherence or cancellation of light with different wavelengths, so that the thickness of two adjacent layers of the color dielectric film has a large difference in nature, which causes the mismatching of sputtering speed and low production efficiency in the mass production process of magnetron sputtering.
Disclosure of Invention
In order to solve the technical problems, the invention provides a color dielectric film preparation method, which adopts a magnetron sputtering/roll coating method/magnetron sputtering/roll coating method … … repeated stacking process to prepare the color dielectric film, and solves the problem of production beat mismatching of the color dielectric film caused by different thicknesses of a high refractive index material and a low refractive index material.
The invention specifically provides a preparation method of a color dielectric film, which comprises the following steps:
step 1, plating a high-refractive-index film layer by a magnetron sputtering method, ionizing a high-refractive-index material into an ion state under the action of an electromagnetic field, and sputtering O in a cavity2Carrying out chemical reaction, and depositing the reaction product on the surface of the substrate to obtain a high-refractive-index film layer;
step 2, plating a low-refractive-index film layer by a roll coating method, and heating and curing the low-refractive-index material to realize combination with the substrate to obtain the low-refractive-index film layer;
and 3, performing laminated alternate plating according to the high-refractive-index film layer plating method in the step 1 and the low-refractive-index film layer plating method in the step 2 to finish the preparation of the color medium film.
In order to solve the technical problems, the invention also provides color dielectric film preparation equipment, wherein high-refractive-index film layers and low-refractive-index film layers are alternately plated by a magnetron sputtering device and a roller coating device, so that the preparation of dielectric films with various colors is realized.
The invention particularly provides color dielectric film preparation equipment which comprises a magnetron sputtering device, a first transfer frame, a roller coating device and a second transfer frame, wherein the magnetron sputtering device is used for coating a high-refractive-index film layer by using a high-refractive-index material, the first transfer frame is used for placing a product coated with the high-refractive-index film layer, the roller coating device is used for coating a low-refractive-index film layer by using a low-refractive-index material based on the product coated with the high-refractive-index film layer, the second transfer frame is used for placing the product coated with the low-refractive-index film layer, and the magnetron sputtering device, the first transfer frame, the roller coating device and the second transfer frame sequentially and cyclically work to finish the coating of multiple layers of high-refractive-index film layers.
Additional features and advantages of the invention will be set forth in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention. The objectives and other advantages of the invention will be realized and attained by the structure particularly pointed out in the written description and claims hereof as well as the appended drawings.
Drawings
The accompanying drawings are included to provide a further understanding of the invention and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and together with the example serve to explain the principles of the invention and not to limit the invention.
FIG. 1 is a schematic flow chart of a method for preparing a color dielectric film according to the present invention;
FIG. 2 is a schematic structural view of a color dielectric film producing apparatus according to the present invention;
FIG. 3 is a schematic structural diagram of a magnetron sputtering apparatus according to the present invention;
FIG. 4 is a schematic structural view of a roll coating apparatus according to the present invention;
FIG. 5 is a schematic view of the structure of the coating section of the present invention.
Reference numerals: the device comprises a magnetron sputtering device 1, a first transfer frame 2, a roller coating device 3, a second transfer frame 4, a sheet feeding chamber 21, a sheet feeding buffer chamber 22, a sputtering chamber 23, a sheet discharging buffer chamber 24, a sheet discharging chamber 25, a preheating section 31, a coating section 32, a curing section 33, a coating rubber roller 41, a thickness control rubber roller 42, a photoelectric rubber roller 43, a viscosity detector 51, a controller 52, an automatic liquid adding device 53 and a stirrer 54.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the drawings of the embodiments of the present invention. It is to be understood that the embodiments described are only a few embodiments of the present invention, and not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the described embodiments of the invention without any inventive step, are within the scope of protection of the invention.
With reference to fig. 1 to 5, an embodiment of the present invention provides a method for preparing a color dielectric film, including the following steps:
step 1, plating a high-refractive-index film layer 101 by a magnetron sputtering method, ionizing a high-refractive-index material into an ionic state under the action of an electromagnetic field, and sputtering O in a cavity2Carrying out chemical reaction, and depositing the reaction product on the surface of the substrate to obtain a high-refractive-index film layer;
step 2, plating a low-refractive-index film layer 102 by a roll coating method, and heating and curing the low-refractive-index material to realize combination with the substrate to obtain the low-refractive-index film layer;
and 3, performing laminated alternate plating according to the high-refractive-index film layer plating method in the step 1 and the low-refractive-index film layer plating method in the step 2 to finish the preparation 103 of the color medium film.
In the prior art, magnetron sputtering is adopted to prepare a color dielectric film, and the most typical three-layer blue dielectric film Nb is adopted2O5/SiO2/Nb2O5For example, three layers are each Nb2O5(25nm)、SiO2(75nm)、Nb2O5(25 nm). This presents the problem that, if the Nb and Si sputtering rates are exactly the same, the ratio of the single Nb target to the Si target must be maintained at 1:3 to ensure that the film thickness is the desired thickness at the same rate, i.e., a 75nm SiO layer is deposited2The membrane, which requires the number of targets, is a layer of 25nm Nb2O53 times of the total weight of the product. And in practice, far beyond this ratio. Since Nb has very strong metallic properties, it is ionized in an electromagnetic field to form Nb5+Ions, readily with O2Oxidation reaction takes place to produce Nb2O5Deposited on the surface of the substrate, therefore, Nb2O5The deposition rate of (a) is very fast; meanwhile, since Si is a semiconductor, Si is generated after ionization under an electromagnetic field4+Ions due to Si4+Is not very reactive, and O2Reaction to produce SiO2Need forFor a certain time, therefore, SiO2Sputtering rate of film is much lower than Nb2O5The sputtering rate of the film, the ratio of the single layer Nb and Si targets to match the two, is conservatively estimated at 1: 6, the initial investment cost of the equipment and the industry admission threshold are greatly increased.
Another possibility is to apply SiO2When the film is formed, the required thickness is achieved by adopting a back-and-forth moving mode, and as a result, in the Si target plating process, the Nb target is in an idle state, the equipment utilization efficiency is extremely low, and the large-scale production cannot be realized.
In addition, the color dielectric film has a fundamental problem that different colors may be the same material, but the thickness of each layer is different, and the difference between the two colors may be very large. The coating equipment designed according to the blue film system not only has the sputtering speed matching and the production rhythm meeting the requirements, but also is not suitable for the production of the yellow film system. At present, no magnetron sputtering coating equipment exists, and the large-scale production of dielectric films with various large-area colors can be met.
In this embodiment, most of the high refractive index material is Nb, Ta, and other active elements, and is plated by magnetron sputtering method, and ionized into ion-like ions and O in the sputtering cavity under the action of electromagnetic field2Chemical reaction is carried out to produce Nb2O5Or Ta2O5The material is deposited on the surface of the substrate, and the sputtering speed is high; its advantages are as follows: 1) the metal target material is cheap; 2) nb, Ta and other materials are easy to ionize into corresponding ionic states under the condition of an electromagnetic field; 3) nb5+、Ta5+High plasma activity and O in the sputtering chamber2The reaction is fast to generate corresponding metal oxide which is deposited on the substrate.
The low refractive index material comprises SiO as the main component2And coated by a roll coating method. The main component of the material is SiO2The solution is heated and cured, so that the film layer and the substrate have strong binding force, the production beat is fast, and the running speed can reach 5 m/min; its advantages are as follows: 1) the solid content in the precursor solution can be adjusted to adjust the filmThickness; 2) the thickness of the film layer can be adjusted by adjusting the glue coating roller and the thickness control rubber roller 42 in the roller coating device 3; 3) the thickness of the film layer can be achieved by a roll coating method at one time, and the production efficiency of the color dielectric film is greatly improved.
Thus, the color dielectric film is prepared by adopting the repeated stacking process of magnetron sputtering/roller coating method/magnetron sputtering/roller coating method … …, and the problem of unmatched production takt time caused by different thicknesses of the high-refractive-index material and the low-refractive-index material of the color dielectric film is solved.
In addition, the embodiment is suitable for mass production of large-area color dielectric films, and the thickness of each layer of material can be flexibly adjusted according to different colors, so that optimal process matching is achieved, and the production efficiency is greatly improved. The number of layers of the film layer can also be adjusted, and can be realized by the present embodiment, whether 3, 4, 5, 6, 7 or more layers.
In addition, in the embodiment, the color dielectric films are prepared by adopting the repeated stacking process of magnetron sputtering/roll coating/magnetron sputtering/roll coating … …, and only a simple magnetron sputtering device 1 and a simple roll coating device 3 are needed to realize the plating of the dielectric films with various colors. The investment cost of the equipment is greatly reduced.
Another embodiment of the invention provides color dielectric film preparation equipment, which comprises a magnetron sputtering device 1, a first transfer frame 2, a roller coating device 3 and a second transfer frame 4, wherein the magnetron sputtering device 1 plates a high-refractive-index film layer by using a high-refractive-index material, the first transfer frame 2 is used for placing a product plated with the high-refractive-index film layer, the roller coating device 3 plates a low-refractive-index film layer by using a low-refractive-index material based on the product plated with the high-refractive-index film layer, the second transfer frame 4 is used for placing the product plated with the low-refractive-index film layer, and the magnetron sputtering device 1, the first transfer frame 2, the roller coating device 3 and the second transfer frame 4 sequentially and circularly work to complete the plating of multiple high-refractive-index film layers and low-refractive-index film layers.
The color dielectric film is formed by stacking two materials, wherein the two materials can be divided into a high-refractive-index material and a low-refractive-index material according to different refractive indexes, the refractive indexes of the two materials and the thickness of each layer of material are different, the number of layers is different along with the difference of colors, and the number of layers can be 2, 3, 4, 5, 6 and 7 or more. The high-refractive-index material plating of the high-refractive-index film layer is realized on the magnetron sputtering device 1, the low-refractive-index material plating of the low-refractive-index film layer is realized on the roller coating device 3, and the times of the utilized coating devices (namely the magnetron sputtering device 1 and the roller coating device 3) are different according to the difference of the number of the dielectric film layers, and the specific table is as follows:
in the embodiment, the magnetron sputtering device 1 and the roller coating device 3 are used for alternately plating the high-refractive-index film layer and the low-refractive-index film layer, so that the preparation of the dielectric films with various colors is realized.
Preferably, the magnetron sputtering device 1 comprises a wafer inlet chamber 21, a wafer inlet buffer chamber 22, a sputtering chamber 23, a wafer outlet buffer chamber 24 and a wafer outlet chamber 25, wherein the substrate enters the magnetron sputtering device 1 from the wafer inlet chamber 21, is transported to the wafer inlet buffer chamber 22 and then enters the sputtering chamber 23. The coating of the high-refractive-index film layer is finished in the sputtering process, and the high-refractive-index film layer is output through the film outlet buffer chamber 24 and the film outlet chamber 25, wherein the substrate can be glass, and the thickness of the film layer is controlled by controlling the data of the traveling speed of the substrate, the power of a target material, the flow of process gas and the like.
Preferably, the roller coating device 3 comprises a transmission roller way, a preheating section 31, a coating section 32 and a curing section 33, a product coated with a high-refractive-index film layer is placed on the transmission roller way of the roller coating device 3 and enters the preheating section 31 for preheating, the temperature of the preheating section 31 is 30-40 ℃, the effect of the preheating section is to keep the humidity of a substrate constant, control parameters of a coating process are stabilized, and the control is convenient, the substrate can be glass, then enters the coating section 32 for coating, and then is dried and cured through the curing section 33, the temperature of the curing section 33 is 250-300 ℃, and the effect of the curing section is to dry and cure a solution coated on the substrate to form the low-refractive-index film.
The coating section 32 is arranged in a hundred thousand grade clean room, ensures that the surrounding environment is in a constant temperature and humidity state, is used for coating a low-refractive-index film layer, and comprises a rubber roller unit and a viscosity control unit, wherein the rubber roller unit comprises a coating rubber roller 41, a thickness control rubber roller 42 and a photoelectric rubber roller 43, and the photoelectric rubber roller 43 and the coating rubber roller 41 form a groove capable of storing coating liquid (namely a low-refractive-index material); the distance between the thickness control rubber roller 42 and the coating rubber roller 41 is adjustable, and the distance is used for controlling the amount of coating liquid on the coating rubber roller 41 so as to control the thickness of the film layer;
the viscosity control unit comprises a viscosity detector 5151, a controller 5252, an automatic liquid filler 5353 and a stirrer 5454; the viscosity detector 51 is used for monitoring the viscosity of the coating liquid in real time, when the viscosity change exceeds a set interval, the viscosity detector 51 sends a signal to the controller 52 to control the automatic liquid adding device 53 to add a proper amount of solvent and dilute the solution, so as to ensure that the viscosity of the whole system reaches a set range, and after liquid is added, the stirrer 54 quickly stirs the solution, so as to ensure the stability of the system.
The thickness of the high refractive index film layer can be adjusted by a sputtering process, and the substrate running speed, the sputtering power or the reaction gas flow rate are correspondingly adjusted. The thickness of the low refractive index film layer can be adjusted by two methods, one is to control the solid content of the solution, and the other is to control the distance between the coating roller and the thickness control rubber roller 42.
Preferably, the low refractive index material comprises SiO2. The high refractive index material comprises Nb and Ta.
Another embodiment of the present invention specifically provides a blue Nb2O5/SiO2/Nb2O5The preparation method of the material comprises the following steps:
the first step is as follows: magnetron sputtering device 1 for realizing first layer of high-refractive-index material Nb2O5Plating. The magnetron sputtering apparatus 1 includes a sheet feeding chamber 21, a sheet feeding buffer chamber 22, a sputtering chamber 23, a sheet discharging buffer chamber 24, and a sheet discharging chamber 25. The substrate enters the magnetron sputtering apparatus 1 from the substrate feeding chamber 21, is transferred into the buffer chamber, and then enters the sputtering chamber 23. In sputtering, a first layer of high refractive index material Nb is completed2O5Plating. The film layer can be controlled by the substrate speed, the target material power, the reaction gas flow and the likeThickness and mass of. The glass is characterized in that the glass can move back and forth in the running direction, and the purpose of the arrangement is to ensure that the high-refractive-index material film layer is thicker, and the required thickness can be achieved by repeatedly moving back and forth and sputtering for multiple times.
The second step is that: the finished semi-finished product plated by the magnetron sputtering device 1 is temporarily stored in the first transfer frame 2 and is ready for the second layer of low-refraction material SiO2Plating.
The third step: roller coating device 3 for realizing second layer of low-refraction material SiO2Plating. The roller coating device 3 mainly comprises a preheating section 31, a coating section 32 and a curing section 33.
The semi-finished product from the first transfer frame 2 is placed on a conveying roller way of the roller coating device 3 and enters a preheating section 31, the temperature of the preheating section 31 in the preheating section 31 is 30-40 ℃, and the function of the semi-finished product is to keep the humidity of the glass substrate constant, stabilize the control parameters of the coating process and facilitate control.
The coated section 32 is placed in a clean room of one hundred thousand grades and mainly functions to complete a second layer of low refractive index material SiO2The coating system mainly comprises a rubber roller unit and a viscosity control unit, wherein the rubber roller unit mainly comprises a coating rubber roller 41, a thickness control rubber roller 42 and a photoelectric rubber roller 43. The photoelectric rubber roller 43 and the coating rubber roller 41 form a groove for storing the coating liquid; the thickness control roller 42 has the function that the distance between the thickness control roller 42 and the coating roller 41 is adjustable, so as to control the amount of the coating liquid on the coating roller 41, and further control the thickness of the film layer. The viscosity control unit comprises a viscosity detector 51, a controller 52, an automatic liquid filler 53 and a stirrer 54; viscosity detector 51 monitors the viscosity of system immediately, and when viscosity change exceeded the interval of setting for, viscosity detector 51 sends the signal to controller 52, and the automatic liquid feeder 53 of control adds appropriate amount of solvent, dilutes the solution, guarantees that the viscosity of whole system reaches the within range of setting for, and after the liquid feeding, agitator 54 stirs fast, guarantees the stability of system.
The temperature of the curing section 33 is 250-300 ℃, and the function of the curing section is to dry and cure the solution coated on the substrate to form SiO2And (5) film layer.
The process can control the thickness of the film layer in two ways, one is to control the solid content of the solution, and the second is to control the distance between the thickness control rubber roller 42 and the glue roller.
The fourth step: after the roller coating device 3 is coated, the coating device is temporarily stored in the second transfer frame 4 to prepare for carrying out a third layer of high-refraction material Nb2O5Plating.
The fifth step: repeating the first step, and carrying out a third layer of high-refraction material Nb2O5Plating.
And a sixth step: after the magnetron sputtering device 1 finishes plating, the performance is detected, and the product is packaged and put in storage.
Another embodiment of the present invention specifically provides an Nb2O5/SiO2/Nb2O5/SiO2The preparation method of the material comprises the following steps:
the first step is as follows: in the same manner as the step 1 of the previous embodiment, a first layer of high refractive index material is plated, and the process parameters are controlled to the required thickness.
The second step is that: in step 2 of the previous example, a second layer of low refractive index material is prepared for plating.
The third step: in step 3 of the previous embodiment, a second layer of low refractive index material is plated, and the process parameters are controlled to the required thickness.
The fourth step: as in step 4 of the previous example, high refractive index material plating was prepared.
The fifth step: in the same manner as the step 1 of the previous embodiment, a third layer of high refractive index material is plated, and the process parameters are controlled to the required thickness.
And a sixth step: in step 2 of the previous example, a fourth layer of low refractive index material is prepared for plating.
The seventh step: in step 3 of the previous embodiment, a fourth layer of low refractive index material is plated, and the process parameters are controlled to the required thickness.
Eighth step: and (5) after the roller coating device 3 finishes plating, carrying out performance detection, and packaging and warehousing.
Although the embodiments of the present invention have been described above, the above description is only for the convenience of understanding the present invention, and is not intended to limit the present invention. It will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined by the appended claims.
Claims (7)
1. The preparation method of the color dielectric film is characterized by comprising the following steps of:
step 1, plating a high-refractive-index film layer by a magnetron sputtering method, ionizing a high-refractive-index material into an ion state under the action of an electromagnetic field, and sputtering O in a cavity2Carrying out chemical reaction, and depositing the reaction product on the surface of the substrate to obtain a high-refractive-index film layer;
step 2, plating a low-refractive-index film layer by a roll coating method, and heating and curing the low-refractive-index material to realize combination with the substrate to obtain the low-refractive-index film layer;
and 3, performing laminated alternate plating according to the high-refractive-index film layer plating method in the step 1 and the low-refractive-index film layer plating method in the step 2 to finish the preparation of the color medium film.
2. The utility model provides a colour dielectric film preparation equipment, its characterized in that, includes magnetron sputtering device (1), first transfer frame (2), roller coat device (3) and second transfer frame (4), magnetron sputtering device (1) utilizes the high refractive index material to plate high refractive index rete, first transfer frame (2) are used for placing the product of plating the high refractive index rete, roller coat device (3) utilize low refractive index material to plate low refractive index rete based on the product of plating the high refractive index rete, second transfer frame (4) are used for placing the product of plating the low refractive index rete, magnetron sputtering device (1), first transfer frame (2), roller coat device (3) and second transfer frame (4) cycle work in proper order accomplish multilayer high refractive index rete and low refractive index rete plating.
3. The color medium film preparation equipment according to claim 2, wherein the magnetron sputtering device (1) comprises a film inlet chamber (21), a film inlet buffer chamber (22), a sputtering chamber (23), a film outlet buffer chamber (24) and a film outlet chamber (25), wherein the substrate enters the magnetron sputtering device (1) from the film inlet chamber (21), is conveyed to the film inlet buffer chamber (22) and then enters the sputtering chamber (23), the high-refractive-index film layer is plated in the sputtering process, and is output through the film outlet buffer chamber (24) and the film outlet chamber (25).
4. The color dielectric film preparation equipment according to claim 2, wherein the roller coating device (3) comprises a preheating section (31), a coating section (32) and a curing section (33), wherein a product coated with the high-refractive-index film layer enters the preheating section (31) for preheating, then enters the coating section (32) for coating, and then is dried and cured by the curing section (33) to form the low-refractive-index film layer.
5. The color medium film preparation equipment according to claim 4, wherein the coating section (32) is arranged in a hundred thousand grade clean room and is used for coating the low-refractive-index film, and comprises a rubber roller unit and a viscosity control unit, wherein the rubber roller unit comprises a coating rubber roller (41), a thickness control rubber roller (42) and a photoelectric rubber roller (43), and the photoelectric rubber roller (43) and the coating rubber roller (41) form a groove for storing coating liquid; the distance between the thickness control rubber roll (42) and the coating rubber roll (41) is adjustable, and the thickness control rubber roll is used for controlling the amount of coating liquid on the coating rubber roll (41) so as to control the thickness of a film layer;
the viscosity control unit comprises a viscosity detector (51), a controller (52), an automatic liquid filler (53) and a stirrer (54); the viscosity detector (51) is used for monitoring the viscosity of the coating liquid in real time, when the viscosity change exceeds a set interval, the viscosity detector (51) sends a signal to the controller (52) to control the automatic liquid adding device (53) to add a proper amount of solvent and dilute the solution, and after the liquid is added, the stirrer (54) rapidly stirs the solution.
6. The color media film production apparatus of claim 2, wherein the low index material comprises SiO2。
7. The apparatus of claim 2, wherein the high index material comprises Nb, Ta.
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| US4851095A (en) * | 1988-02-08 | 1989-07-25 | Optical Coating Laboratory, Inc. | Magnetron sputtering apparatus and process |
| US5814367A (en) * | 1993-08-13 | 1998-09-29 | General Atomics | Broadband infrared and signature control materials and methods of producing the same |
| CN102267802A (en) * | 2010-07-29 | 2011-12-07 | 和合科技集团有限公司 | Roller coating device for preparing anti-reflective coated photovoltaic glass |
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