CN203818661U - Multilayered film anti-reflective glass - Google Patents
Multilayered film anti-reflective glass Download PDFInfo
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- CN203818661U CN203818661U CN201420108981.7U CN201420108981U CN203818661U CN 203818661 U CN203818661 U CN 203818661U CN 201420108981 U CN201420108981 U CN 201420108981U CN 203818661 U CN203818661 U CN 203818661U
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- magnetron sputtering
- sputtering deposition
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- 239000011521 glass Substances 0.000 title claims abstract description 35
- 230000003667 anti-reflective effect Effects 0.000 title abstract description 12
- 238000000151 deposition Methods 0.000 claims abstract description 129
- 230000008021 deposition Effects 0.000 claims abstract description 121
- 238000001755 magnetron sputter deposition Methods 0.000 claims abstract description 121
- MEYZYGMYMLNUHJ-UHFFFAOYSA-N tunicamycin Natural products CC(C)CCCCCCCCCC=CC(=O)NC1C(O)C(O)C(CC(O)C2OC(C(O)C2O)N3C=CC(=O)NC3=O)OC1OC4OC(CO)C(O)C(O)C4NC(=O)C MEYZYGMYMLNUHJ-UHFFFAOYSA-N 0.000 claims description 83
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 13
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 12
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 12
- -1 iron ion Chemical class 0.000 claims description 10
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 6
- 229910052742 iron Inorganic materials 0.000 claims description 6
- 239000000377 silicon dioxide Substances 0.000 claims description 6
- 239000005329 float glass Substances 0.000 claims description 3
- 230000005540 biological transmission Effects 0.000 abstract description 5
- 239000010408 film Substances 0.000 description 51
- 239000010410 layer Substances 0.000 description 28
- 229910052786 argon Inorganic materials 0.000 description 14
- 239000007789 gas Substances 0.000 description 12
- 238000000034 method Methods 0.000 description 12
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 10
- 239000013077 target material Substances 0.000 description 10
- 239000000463 material Substances 0.000 description 8
- 239000003595 mist Substances 0.000 description 8
- 238000004544 sputter deposition Methods 0.000 description 8
- 238000005477 sputtering target Methods 0.000 description 8
- 239000000758 substrate Substances 0.000 description 8
- 230000003287 optical effect Effects 0.000 description 7
- 230000008569 process Effects 0.000 description 7
- 230000010354 integration Effects 0.000 description 5
- 238000000137 annealing Methods 0.000 description 4
- 239000006117 anti-reflective coating Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 230000004044 response Effects 0.000 description 4
- 229910052814 silicon oxide Inorganic materials 0.000 description 4
- 230000035882 stress Effects 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- 229910052719 titanium Inorganic materials 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- 229910017121 AlSiO Inorganic materials 0.000 description 2
- 229910000789 Aluminium-silicon alloy Inorganic materials 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000007688 edging Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 239000004519 grease Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000001953 recrystallisation Methods 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 230000008646 thermal stress Effects 0.000 description 2
- 230000008901 benefit Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000004313 glare Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Abstract
The utility model is applicable to the technical field of a display industry and solar glass. The utility model discloses multilayered film anti-reflective glass. The multilayered film anti-reflective glass comprises a transparent base layer, wherein the transparent base layer is provided with a first magnetron sputtering deposition layer film with the refractive index of 2.1-2.5 and the thickness of 5-100nm, a second magnetron sputtering deposition layer film with the refractive index of 1.3-1.6 and the thickness of 10-150nm, a third magnetron sputtering deposition layer film with the refractive index of 2.1-2.5 and the thickness of 5-100nm, and a fourth magnetron sputtering deposition layer film with the refractive index of 1.3-1.6 and the thickness of 10-300nm. According to the multilayered film anti-reflective glass provided by the embodiment of the utility model, a glass film layer is firm and the environment-resisting performance is good; the transmission average value at 400-800nm can be up to 94.39%; the transmission peak value at 380-1100nm can be up to 96-97%; the integral transmission at 380-780nm can be up to 96-97%; the transmission rate is high, the cost is low and the reliability is high.
Description
Technical field
The utility model belongs to and shows industry and solar energy glass technical field, relates in particular to a kind of multilayer film anti reflection glass.
Background technology
At present, most of show that glass and solar energy glass adopt monofilm, be difficult to the antireflective effect that reaches desirable, in order to realize zero reflection at single wavelength, or the antireflective effect having reached at wider spectral regions, can adopt the antireflective coating of bilayer, three layers of even more multi-layered number.
Utility model content
The purpose of this utility model is to overcome above-mentioned the deficiencies in the prior art, and a kind of multilayer film anti reflection glass is provided, and its antireflective film suitably selective membrane layer thickness is adjusted through crest, and transmitance is high and cost is low, reliability is high.
The technical solution of the utility model is: a kind of multilayer film anti reflection glass, comprise transparent base layer, on described transparent base layer by magnetron sputtering deposition have refractive index be 2.1 to 2.5 and thickness be the first magnetron sputtering deposition tunic of 5 to 100nm, on described the first magnetron sputtering deposition tunic by magnetron sputtering deposition have refractive index be 1.3 to 1.6 and thickness be the second magnetron sputtering deposition tunic of 10 to 150nm; On described the second magnetron sputtering deposition tunic by magnetron sputtering deposition have refractive index be 2.1 to 2.5 and thickness be 5 to 100nm the 3rd magnetron sputtering deposition tunic; On described the 3rd magnetron sputtering deposition tunic by magnetron sputtering deposition have refractive index be 1.3 to 1.6 and thickness be 10 to 300nm the 4th magnetron sputtering deposition tunic.
Alternatively, described transparent base layer is that iron ion content is spent basic unit lower than ultra-white float glass or the iron ion content of 200PPM lower than the ultrawhite of 100PPM.
Alternatively, the thickness of described transparent base layer is 1 to 5mm.
Alternatively, described the first magnetron sputtering deposition tunic adopts titanium oxide to make.
Alternatively, described the second magnetron sputtering deposition tunic adopts silica to make.
Alternatively, described the 3rd magnetron sputtering deposition tunic adopts titanium oxide to make.
Alternatively, described the 4th magnetron sputtering deposition tunic adopts silica to make.
The multilayer film anti reflection glass that the utility model embodiment provides, glass rete is more firm, environmental resistance is good, 400～800nm sees through mean value can reach 94.39%, 380～1100nm sees through peak value can reach 96%～97%, 380～780nm integration sees through can reach 96%～97%, for showing that industry and response curve are having huge contribution aspect the Application of Solar Energy of 400～800nm.
Accompanying drawing explanation
In order to be illustrated more clearly in the technical scheme in the utility model embodiment, to the accompanying drawing of required use in embodiment be briefly described below, apparently, accompanying drawing in the following describes is only embodiment more of the present utility model, for those of ordinary skills, do not paying under the prerequisite of creative work, can also obtain according to these accompanying drawings other accompanying drawing.
Fig. 1 is the floor map that the multilayer film anti reflection glass that provides of the utility model embodiment is removed transparent base layer;
Fig. 2 is that the multilayer film anti reflection glass that provides of the utility model embodiment and chemical method antireflective film are at the transmittance curve comparison diagram of 400～800nm.
The specific embodiment
In order to make the purpose of this utility model, technical scheme and advantage clearer, below in conjunction with drawings and Examples, the utility model is further elaborated.Should be appreciated that specific embodiment described herein is only in order to explain the utility model, and be not used in restriction the utility model.
It should be noted that, when element is called as " being fixed on " or " being arranged at " another element, it can be directly on another element or may have centering elements simultaneously.When an element " being connected in " another element of being known as, it can be directly connected to another element or may have centering elements simultaneously.
Also it should be noted that, the orientation term such as left and right, upper and lower in the present embodiment, is only that relative concept or the normal operating condition of product of take are reference each other, and should not be regarded as have restrictive.
As depicted in figs. 1 and 2, a kind of multilayer film anti reflection glass that the utility model embodiment provides, comprise transparent base layer (not shown), transparent base layer can adopt iron ion content to make lower than the ultrawhite flower basic unit of 100PPM etc. lower than the ultra-white float glass of 200PPM or iron ion content, and its thickness can be between 1 to 5mm.On described transparent base layer by magnetron sputtering deposition have refractive index be 2.1 to 2.5 and thickness be the first magnetron sputtering deposition tunic 11 of 5 to 100nm, on described the first magnetron sputtering deposition tunic 11 by magnetron sputtering deposition have refractive index be 1.3 to 1.6 and thickness be the second magnetron sputtering deposition tunic 12 of 10 to 150nm; On described the second magnetron sputtering deposition tunic 12 by magnetron sputtering deposition have refractive index be 2.1 to 2.5 and thickness be 5 to 100nm the 3rd magnetron sputtering deposition tunic 13; On described the 3rd magnetron sputtering deposition tunic 13 by magnetron sputtering deposition have refractive index be 1.3 to 1.6 and thickness be 10 to 300nm the 4th magnetron sputtering deposition tunic 14.Respectively at being coated with after the first magnetron sputtering deposition tunic 11, the second magnetron sputtering deposition tunic 12, the 3rd magnetron sputtering deposition tunic 13 and the 4th magnetron sputtering deposition tunic 14, can carry out annealing in process.By above-mentioned the first magnetron sputtering deposition tunic 11, the second magnetron sputtering deposition tunic 12, the 3rd magnetron sputtering deposition tunic 13 and the 4th magnetron sputtering deposition tunic 14 are set, multilayer film anti reflection glass provided by the utility model is seen through high at 400～800nm integration, be applicable to showing that industry and response curve, at the aspects such as Application of Solar Energy of 400～800nm, can also be applied to show industry.Antireflective coating claims again anti-reflection film, and its major function is the reverberation that reduces or eliminates the optical surfaces such as lens, prism, level crossing, thereby increases the light transmission capacity of these elements, reduces or eliminates the veiling glare of system.The simplest anti-reflection film is monofilm, and it is the lower film of one deck refractive index being plated on optical element optical surface.If the optical thickness of rete is 1/4th of a certain wavelength, the optical path difference of adjacent two-beam is π just, and direction of vibration is contrary, and the result of stack makes optical surface reduce the reverberation of this wavelength.Suitably select thin-film refractive index, at this moment the reverberation of optical surface can be eliminated completely.Generally, adopt single layer anti reflective coating to be difficult to the antireflective effect that reaches desirable, in order to realize zero reflection at single wavelength, or the antireflective effect having reached at wider spectral regions, often adopt antireflective coatings double-deck, three layers of even more multi-layered number.And; magnetron sputtering method is to be filled with appropriate argon gas in high vacuum; between negative electrode (negative electrode can be Style Columu Talget or flat target) and anode (plated film locular wall), apply hundreds of K DC voltage, in coating chamber, produce magnet controlled abnormal glow discharge, argon gas is ionized.Argon ion is accelerated by negative electrode and bombarding cathode target surface, and target material surface atom sputtering is out deposited on and on substrate surface, forms film.By changing the target sputtering time different with control of unlike material, just can obtain the film of unlike material and different-thickness.In the utility model embodiment, adopt the more firm main cause of magnetron sputtering rete as follows: 1, dustproof, the damp proof and grease proofing adhesive strength having improved between film base in coating process; 2, under vacuum, prepare film, clean environment, film is vulnerable to pollution not, can obtain that compactness is good, purity is high, the rete of even film layer; 3, all product is heated owing to being coated with the first magnetron sputtering deposition tunic 11, the second magnetron sputtering deposition tunic 12, the 3rd magnetron sputtering deposition tunic 13 and the 4th magnetron sputtering deposition tunic 14, heating-up temperature is not higher than 400 ℃, make substrate temperature high, crystallite dimension is large, and Growing Process of Crystal Particles accelerates, and the film defect of condensing reduces, recrystallization strengthens, make the formation of film more perfect, thereby cause the internal stress of film to reduce, rete is in conjunction with more firm.But substrate temperature is too high, can make again the thermal stress of film increase.For the total stress of film is reduced, substrate heating temperature is wanted suitably, generally not higher than 400 ℃; 4, after film deposition, carry out necessary annealing in process, its mechanism is to make the aggravation of film base molecular thermalmotion, in interface phase counterdiffusion, forms the rete that intensity is very high.Fig. 2 is that the multilayer film anti reflection glass that provides of the utility model embodiment and chemical method antireflective film are at the transmittance curve comparison diagram of 400～800nm.Transmittance curve comparison diagram from Fig. 2 can be found out, it is substantially parallel through curve with former that chemical method antireflective film glass sees through curve, it is even rising, it is to have intersection point with former that multilayer film anti reflection glass sees through curve, ultraviolet and former of near-infrared two parts tranmittance are low, 400-800nm sees through higher, has peak value, therefore 400-800nm integration sees through height.
In concrete application, above-mentioned magnetron sputtering deposition can be magnetically controlled DC sputtering, medium frequency magnetron sputtering, radio-frequency sputtering or pulsed magnetron sputtering etc.Specifically can select according to actual conditions.
Alternatively, described the first magnetron sputtering deposition tunic 11 adopts titanium oxide (TiOX) to make, also can adopt other refractive index be 2.1 to 2.5 material by magnetron sputtering deposition in transparent base layer, its thickness can be 5 to 100nm, such as 10,20,30,40,50,60,70,80,90nm etc.
Alternatively, described the second magnetron sputtering deposition tunic 12 adopts silica (SiOX) to make, also can adopt other refractive index be 1.3 to 1.6 material by magnetron sputtering deposition in the first magnetron sputtering deposition layer, two its thickness of magnetron sputtering deposition tunic can be 10 to 150nm, such as 20,30,40,50,60,70,80,90,100,110,120,130,140nm etc.
Alternatively, described the 3rd magnetron sputtering deposition tunic 13 adopts titanium oxide (TiOX) to make, also can adopt other refractive index be 2.1 to 2.5 material by magnetron sputtering deposition in the second magnetron sputtering deposition tunic 12, its thickness can be 5 to 100nm, such as 10,20,30,40,50,60,70,80,90nm etc.
Alternatively, described the 4th magnetron sputtering deposition tunic 14 adopts silica (SiOX) to make, also can adopt other refractive index be 1.3 to 1.6 material by magnetron sputtering deposition in the first magnetron sputtering deposition layer, two its thickness of magnetron sputtering deposition tunic can be 10 to 300nm, such as 20,30,40,50,60,70,80,90,100,110,120,130,140,150,160,170,180,190,200,220,250,280nm etc.
The utility model embodiment also provides a kind of preparation method for the preparation of above-mentioned multilayer film anti reflection glass, comprise the following steps, prepare transparent base layer, on described transparent base layer by magnetron sputtering deposition refractive index be 2.1 to 2.5 and thickness be the first magnetron sputtering deposition tunic 11 of 5 to 100nm, on described the first magnetron sputtering deposition tunic 11 by magnetron sputtering deposition refractive index be 1.3 to 1.6 and thickness be the second magnetron sputtering deposition tunic 12 of 10 to 150nm; On described the second magnetron sputtering deposition tunic 12 by magnetron sputtering deposition refractive index be 2.1 to 2.5 and thickness be 5 to 100nm the 3rd magnetron sputtering deposition tunic 13; On described the 3rd magnetron sputtering deposition tunic 13 by magnetron sputtering deposition refractive index be 1.3 to 1.6 and thickness be 10 to 300nm the 4th magnetron sputtering deposition tunic 14.Respectively at being coated with after the first magnetron sputtering deposition tunic 11, the second magnetron sputtering deposition tunic 12, the 3rd magnetron sputtering deposition tunic 13 and the 4th magnetron sputtering deposition tunic 14, can carry out annealing in process.By above-mentioned the first magnetron sputtering deposition tunic 11, the second magnetron sputtering deposition tunic 12, the 3rd magnetron sputtering deposition tunic 13 and the 4th magnetron sputtering deposition tunic 14 are set, multilayer film anti reflection glass provided by the utility model is seen through high at 400～800nm integration, be applicable to demonstration industry and response curve at the aspects such as Application of Solar Energy of 400～800nm.And; magnetron sputtering method is to be filled with appropriate argon gas in high vacuum; between negative electrode (negative electrode can be Style Columu Talget or flat target) and anode (plated film locular wall), apply hundreds of K DC voltage, in coating chamber, produce magnet controlled abnormal glow discharge, argon gas is ionized.Argon ion is accelerated by negative electrode and bombarding cathode target surface, and target material surface atom sputtering is out deposited on and on substrate surface, forms film.By changing the target sputtering time different with control of unlike material, just can obtain the film of unlike material and different-thickness.In the utility model embodiment, adopt the more firm main cause of magnetron sputtering rete as follows: 1, dustproof, the damp proof and grease proofing adhesive strength having improved between film base in coating process; 2, under vacuum, prepare film, clean environment, film is vulnerable to pollution not, can obtain that compactness is good, purity is high, the rete of even film layer; 3, all product is heated owing to being coated with the first magnetron sputtering deposition tunic 11, the second magnetron sputtering deposition tunic 12, the 3rd magnetron sputtering deposition tunic 13 and the 4th magnetron sputtering deposition tunic 14, heating-up temperature is not higher than 400 ℃, make substrate temperature high, crystallite dimension is large, and Growing Process of Crystal Particles accelerates, and the film defect of condensing reduces, recrystallization strengthens, make the formation of film more perfect, thereby cause the internal stress of film to reduce, rete is in conjunction with more firm.But substrate temperature is too high, can make again the thermal stress of film increase.For the total stress of film is reduced, substrate heating temperature is wanted suitably, generally not higher than 400 ℃; 4, after film deposition, carry out necessary annealing in process, its mechanism is to make the aggravation of film base molecular thermalmotion, in interface phase counterdiffusion, forms the rete that intensity is very high, process stabilizing, and rete is firm.
In concrete application, above-mentioned magnetron sputtering deposition can be magnetically controlled DC sputtering, medium frequency magnetron sputtering, radio-frequency sputtering or pulsed magnetron sputtering etc.Specifically can select according to actual conditions.
Particularly, as a kind of possibility:
After former cutting edging of 3.2mm energy ultrawhite figured glass, as Benq's layer, after cleaning machine cleans and dries up, enter magnetron sputtering coater plated film;
While depositing described the first magnetron sputtering deposition tunic 11, adopting purity to be not less than 99.9% Ti target is that sputtering target material the mist that adopts purity to be all not less than 99.999% Ar, O2 are working gas, the first magnetron sputtering deposition tunic 11 that deposition consists of TiOX on described transparent base layer;
While depositing described the second magnetron sputtering deposition tunic 12, adopting purity to be not less than 99.9% Si target is that sputtering target material the mist that adopts purity to be all not less than 99.999% Ar, O2 are working gas, the second magnetron sputtering deposition tunic 12 that deposition consists of SiOX on described transparent base layer;
While depositing described the 3rd magnetron sputtering deposition tunic 13, adopting purity to be not less than 99.9% Ti target is that sputtering target material the mist that adopts purity to be all not less than 99.999% Ar, O2 are working gas, and on described transparent base layer, deposition is by TiOX(TiO
x) the 3rd magnetron sputtering deposition tunic 13 that forms;
While depositing described the 4th magnetron sputtering deposition tunic 14, adopting purity to be not less than 99.9% Si target is that sputtering target material the mist that adopts purity to be all not less than 99.999% Ar, O2 are working gas, and on described transparent base layer, deposition is by SiOX(SiO
x) the 4th magnetron sputtering deposition tunic 14 that forms;
Or, as alternative dispensing means: as Benq's layer, after cleaning machine cleans and dries up, enter magnetron sputtering coater plated film after former cutting edging of 3.2mm energy ultrawhite figured glass;
While depositing described the first magnetron sputtering deposition tunic 11, adopting purity to be not less than 99.9% Ti target is that sputtering target material the mist that adopts purity to be all not less than 99.999% Ar, O2 are working gas, the first magnetron sputtering deposition tunic 11 that deposition consists of TiOX on described transparent base layer;
While depositing described the second magnetron sputtering deposition tunic 12, adopting AlSi target is that sputtering target material the mist that adopts purity to be all not less than 99.999% Ar, O2 are working gas, and on described transparent base layer, deposition is by AlSiOX(AlSiO
x) the second magnetron sputtering deposition tunic 12 of forming;
While depositing described the 3rd magnetron sputtering deposition tunic 13, adopting purity to be not less than 99.9% Ti target is that sputtering target material the mist that adopts purity to be all not less than 99.999% Ar, O2 are working gas, the 3rd magnetron sputtering deposition tunic 13 that deposition consists of TiOX on described transparent base layer;
While depositing described the 4th magnetron sputtering deposition tunic 14, adopting AlSi target is that sputtering target material the mist that adopts purity to be all not less than 99.999% Ar, O2 are working gas, and on described transparent base layer, deposition is by AlSiOX(AlSiO
x) the 4th magnetron sputtering deposition tunic 14 that forms.
The multilayer film anti reflection glass that the utility model embodiment provides, glass rete is more firm, environmental resistance is good, 400～800nm sees through mean value can reach 94.39%, 380～1100nm sees through peak value can reach 96%～97%, 380～780nm integration sees through can reach 96%～97%, for showing that industry and response curve are having huge contribution aspect the Application of Solar Energy of 400～800nm.
The foregoing is only preferred embodiment of the present utility model; not in order to limit the utility model; all any modifications of doing within spirit of the present utility model and principle, be equal to and replace or improvement etc., within all should being included in protection domain of the present utility model.
Claims (7)
1. a multilayer film anti reflection glass, comprise transparent base layer, it is characterized in that, on described transparent base layer by magnetron sputtering deposition have refractive index be 2.1 to 2.5 and thickness be the first magnetron sputtering deposition tunic of 5 to 100nm, on described the first magnetron sputtering deposition tunic by magnetron sputtering deposition have refractive index be 1.3 to 1.6 and thickness be the second magnetron sputtering deposition tunic of 10 to 150nm; On described the second magnetron sputtering deposition tunic by magnetron sputtering deposition have refractive index be 2.1 to 2.5 and thickness be 5 to 100nm the 3rd magnetron sputtering deposition tunic; On described the 3rd magnetron sputtering deposition tunic by magnetron sputtering deposition have refractive index be 1.3 to 1.6 and thickness be 10 to 300nm the 4th magnetron sputtering deposition tunic.
2. multilayer film anti reflection glass as claimed in claim 1, is characterized in that, described transparent base layer is that iron ion content is spent basic unit lower than ultra-white float glass or the iron ion content of 200PPM lower than the ultrawhite of 100PPM.
3. multilayer film anti reflection glass as claimed in claim 1, is characterized in that, the thickness of described transparent base layer is 1 to 5mm.
4. multilayer film anti reflection glass as claimed any one in claims 1 to 3, is characterized in that, described the first magnetron sputtering deposition tunic adopts titanium oxide to make.
5. multilayer film anti reflection glass as claimed any one in claims 1 to 3, is characterized in that, described the second magnetron sputtering deposition tunic adopts silica to make.
6. multilayer film anti reflection glass as claimed any one in claims 1 to 3, is characterized in that, described the 3rd magnetron sputtering deposition tunic adopts titanium oxide to make.
7. multilayer film anti reflection glass as claimed any one in claims 1 to 3, is characterized in that, described the 4th magnetron sputtering deposition tunic adopts silica to make.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420108981.7U CN203818661U (en) | 2014-03-11 | 2014-03-11 | Multilayered film anti-reflective glass |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420108981.7U CN203818661U (en) | 2014-03-11 | 2014-03-11 | Multilayered film anti-reflective glass |
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| Publication Number | Publication Date |
|---|---|
| CN203818661U true CN203818661U (en) | 2014-09-10 |
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ID=51474201
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| CN201420108981.7U Expired - Lifetime CN203818661U (en) | 2014-03-11 | 2014-03-11 | Multilayered film anti-reflective glass |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104908377A (en) * | 2014-03-11 | 2015-09-16 | 信义光伏产业(安徽)控股有限公司 | Multilayer film antireflection glass and production method thereof |
| CN105291501A (en) * | 2015-05-13 | 2016-02-03 | 信义光伏产业(安徽)控股有限公司 | Blue-light high-reflective glass, production method of blue-light high-reflective glass, and automobile rearview mirror |
-
2014
- 2014-03-11 CN CN201420108981.7U patent/CN203818661U/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104908377A (en) * | 2014-03-11 | 2015-09-16 | 信义光伏产业(安徽)控股有限公司 | Multilayer film antireflection glass and production method thereof |
| CN105291501A (en) * | 2015-05-13 | 2016-02-03 | 信义光伏产业(安徽)控股有限公司 | Blue-light high-reflective glass, production method of blue-light high-reflective glass, and automobile rearview mirror |
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