CN102643035A - Self-cleaning reflector and preparation method and application thereof - Google Patents
Self-cleaning reflector and preparation method and application thereof Download PDFInfo
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- CN102643035A CN102643035A CN2012101226665A CN201210122666A CN102643035A CN 102643035 A CN102643035 A CN 102643035A CN 2012101226665 A CN2012101226665 A CN 2012101226665A CN 201210122666 A CN201210122666 A CN 201210122666A CN 102643035 A CN102643035 A CN 102643035A
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- rete
- automatically cleaning
- tio
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Abstract
The invention discloses a self-cleaning reflector comprising a substrate and a composite membrane layer which is plated on the substrate and has the self-cleaning function, wherein the composite membrane layer comprises an Ag membrane layer, a SiO2 membrane layer coated on the Ag membrane layer and a TiO2 membrane layer coated on the SiO2 membrane layer. The invention further discloses a self-cleaning reflector preparation method and an application of the self-cleaning reflector.
Description
Technical field
The present invention relates to a kind of mirror, particularly a kind of mirror and preparation method thereof with self-cleaning function.
Background technology
The commonly used mirror of prior art is in uses such as automobile, sharp curve way, solar concentrator, and the time that is exposed in the air is long slightly, and a large amount of dust spots will be adhered in the surface of mirror, and the light reflective properties of mirror is seriously descended.Water droplet and liquid oil contact scar thing adhere to that the time can make also that after for a long time the mirror performance seriously reduces on the speculum in addition, and are difficult to clean, and therefore, common mirror commonly used must often clean, and could keep its reflective function.
Summary of the invention
Technical problem to be solved by this invention is to provide a kind of automatically cleaning mirror and preparation method thereof, to overcome the defective of prior art mirror, can keep the cleaning of mirror long period, effectively keeps the reflectivity of mirror.
For achieving the above object, automatically cleaning mirror of the present invention comprises: a substrate; And one have a self-cleaning function composite film, this composite film is sputtered on this substrate.
Above-mentioned automatically cleaning mirror, said composite film comprises: an Ag rete; One is covered in the SiO on the said Ag rete
2Rete; Reach one and be covered in said SiO
2TiO on the rete
2Rete.
Above-mentioned automatically cleaning mirror, said composite film comprises: an Ag rete; And the TiO that is covered on the said Ag rete
2Rete.
Above-mentioned automatically cleaning mirror, the thickness of said composite film are 300-700nm.
Above-mentioned automatically cleaning mirror, in the said composite film, the thickness of said Ag rete is 100-300nm, said SiO
2Thicknesses of layers is 100-200nm; Said TiO
2Thicknesses of layers is 100-200nm.
Above-mentioned automatically cleaning mirror, in the said composite film, said Ag rete is a reflective coating, said SiO
2Rete is a protective film; Said TiO
2Rete is the automatically cleaning rete.
Above-mentioned automatically cleaning mirror, said substrate are glass or metal material.
Further, the invention provides a kind of preparation method of automatically cleaning mirror, may further comprise the steps: a substrate is provided; On said substrate, adopt magnetron sputtering method be coated with one have a self-cleaning function composite film.
The preparation method of above-mentioned automatically cleaning mirror, the step that is coated with composite film further comprises: be coated with an Ag rete on said substrate; Be coated with a SiO
2Rete is on said silver film; And be coated with a TiO
2Rete is at said SiO
2On the rete.
The preparation method of above-mentioned automatically cleaning mirror, the step that is coated with composite film further comprises: be coated with an Ag rete on said substrate; And be coated with a TiO
2Rete is on said silver film.
The preparation method of above-mentioned automatically cleaning mirror, the magnetron sputtering target that said magnetron sputtering method adopts and the distance of said substrate are 200-300mm, Ag target height is the thick 10-20mm of being of the wide 110-150mm of being of 1-1.5m; SiO2 target height is the thick 10-20mm of being of the wide 110-150mm of being of 1-1.5m; TiO
2The target height is the thick 10-20mm of being of the wide 110-150mm of being of 1-1.5m.
The preparation method of above-mentioned automatically cleaning mirror is characterized in that, the vacuum tightness of the Vakuumkammer that said magnetron sputtering method adopts reaches below the 10-3 order of magnitude pascal, and makes the running balance pressure that keeps the 10-2 pascal order of magnitude in this Vakuumkammer.
The preparation method of above-mentioned automatically cleaning mirror, when being coated with said Ag rete, the magneticstrength on silver-colored target surface is 80-90 Gauss; Regulating sputtering voltage is-370V--380V, and sputtering current is 4-5A, and substrate temperature is 80 deg.c, and Ag film sedimentation rate is controlled at 20-25nm/min.
The preparation method of above-mentioned automatically cleaning mirror is being coated with said SiO
2During rete, SiO2 target Surface field intensity is about 110 Gausses; Radio-frequency power supply power is controlled at 5-7 kilowatt of scope; SiO2 film sedimentation rate is controlled at the 3nm/min-5nm/min scope.
The preparation method of above-mentioned automatically cleaning mirror is being coated with said TiO
2During rete, close DP, open molecular pump, below the vacuum tightness 10-3 pascal order of magnitude, TiO
2Target Surface field intensity is 80-90 Gauss; About sputtering voltage-420V; Sputtering current 4-5A; Charge into argon gas and oxygen, the throughput ratio of control argon, oxygen is 1: 4, and TiO2 film rate of film build is controlled at 10nm/min-14nm/min.
The preparation method of above-mentioned automatically cleaning mirror, the thickness of said Ag rete is 100-300nm, said SiO
2Thicknesses of layers is 100-200nm; Said TiO
2Thicknesses of layers is 100-200nm.
The preparation method of above-mentioned automatically cleaning mirror, in the said composite film, said Ag rete is a reflective coating, said SiO
2Rete is a protective film, said TiO
2Rete is the automatically cleaning rete.
The preparation method of above-mentioned automatically cleaning mirror is characterized in that, said substrate is glass or metal material.
The present invention further provides a kind of automobile, adopts above-mentioned automatically cleaning mirror.
The present invention further provides a kind of solar concentrator, adopts above-mentioned automatically cleaning mirror.
Compared with prior art; The nano-titanium dioxide film that adopts in the composite film of the present invention; Possess hydrophilic property and the dual function of decomposing spot make mirror of the present invention have the high-reflectivity that self-cleaning function can effectively keep mirror under uviolizing.
The combination of the present invention and following accompanying drawing is merely illustrative embodiment, is not restriction of the present invention.
Description of drawings
Figure 1A is the first embodiment cross-sectional view of automatically cleaning mirror of the present invention;
Figure 1B is the second embodiment cross-sectional view of automatically cleaning mirror of the present invention;
Fig. 2 prepares the method flow diagram of automatically cleaning mirror for the present invention.
Embodiment
By the detailed description of following preferred embodiment, can further understand the characteristic and the benefit of method of the present invention and structure.
With reference to Figure 1A and 1B; Cross-sectional view for automatically cleaning mirror of the present invention; As shown in the figure; Automatically cleaning mirror of the present invention comprises: substrate 1 and adopt magnetron sputtering method to be sputtered to have a self-cleaning function composite film 2 on the said substrate 1, wherein this substrate is glass or metal material.
Figure 1A is the first example structure synoptic diagram of invention automatically cleaning mirror, and this composite film 2 is Ag-SiO
2-TiO
2Rete, that is: this composite film 2 comprises: an Ag rete 21; One is covered in the SiO on this Ag rete
2Rete 22; One is covered in SiO
2TiO on the rete
2Rete 23, wherein, the Ag rete is a reflective coating, the SiO2 rete is a protective film.The thickness of this composite film is 300-700nm.Wherein, the thickness of Ag rete 21 is 100-300nm, and said SiO2 rete 22 thickness are 100-200nm; Said TiO
2Rete 23 thickness are 100-200nm.
Figure 1B is the second example structure synoptic diagram of automatically cleaning mirror of the present invention, and this composite film 2 is Ag-TiO
2Rete, that is: this composite film 2 comprises: the TiO that an Ag rete 21 and is covered on the Ag rete
2Rete 23.Other structures are with above-mentioned first embodiment.
With reference to figure 2, the present invention further provides a kind of method for preparing above-mentioned automatically cleaning mirror, and is of Fig. 2, and this method may further comprise the steps:
S1: glass or metal substrate are provided;
S2: on this substrate, adopt magnetron sputtering method be coated with one have a self-cleaning function composite film.This composite film is Ag-SiO
2-TiO
2Rete or Ag-TiO
2Rete.
This is coated with Ag-SiO
2-TiO
2The step S2 of rete further comprises:
S21: be coated with an Ag rete on said substrate, the thickness of this Ag rete is 100-300nm;
S22: be coated with a SiO
2Rete on said silver film, this SiO
2The thickness of rete is 100-200nm;
S23: be coated with a TiO
2Rete is at said SiO
2On the rete, this SiO
2The thickness of rete is 100-200nm.
Be coated with Ag-TiO
2The step S2 of rete further comprises S21: be coated with an Ag rete on said substrate; S23: be coated with a TiO
2Rete is at said SiO
2On the rete.
In above-mentioned steps S1, put into Vakuumkammer after substrate cleaned up, the distance of substrate and magnetron sputtering target is 200-300mm, the thick 10-20mm of the wide 110-150mm of the high 1-1.5m of Ag target; The thick 10-20mm of the wide 110-150mm of the high 1-1.5m of SiO2 target; TiO
2The thick 10mm-20mm of the wide 110mm-150mm of the high 1m-1.5m of target.Wherein, the vacuum tightness of Vakuumkammer reaches below the 10-3 order of magnitude pascal, and makes the running balance pressure that keeps the 10-2 pascal order of magnitude in this Vakuumkammer.
In above-mentioned steps S21, when being coated with the Ag rete, the magneticstrength on Ag target surface is 80-90 Gauss; Regulating sputtering voltage is-370V--380V, and sputtering current is 4-5A, and substrate temperature is 80 deg.c, and Ag film sedimentation rate is controlled at 20-25nm/min, and the silverskin that makes 200nm needs 8-9 minute approximately.
In above-mentioned steps S22, when being coated with the SiO2 rete, SiO2 target Surface field intensity is about 110 Gausses; Radio-frequency power supply power is controlled at 5-7 kilowatt of scope; SiO2 film sedimentation rate is controlled at the 3nm/min-5nm/min scope, and the SiO2 rete that makes 100nm needs 20-30 minute approximately.
In above-mentioned steps S23, be coated with said TiO
2During rete, close DP, open molecular pump, below the vacuum tightness 10-3 pascal order of magnitude, TiO
2Target Surface field intensity is 80-90 Gauss; About sputtering voltage-420V; Sputtering current 4-5A; Charge into argon gas and oxygen, the throughput ratio of control argon, oxygen is 1: 4, TiO
2The film rate of film build is controlled at 10nm/min-14nm/min, and the TiO2 rete that makes 200nm needs 14-16 minute approximately.
The thickness of composite film is about among the 300-700nm, and wherein, the Ag rete is as reflective coating, and its thickness is about 100-300nm; SiO
2Rete is as protective film, and its thickness is 100-200nm; TiO
2Rete is as the automatically cleaning rete, and thickness is 100-200nm.
The present invention further provides a kind of automobile, adopts method for preparing automatically cleaning mirror.
The present invention further provides a kind of solar concentrator, adopts the automatically cleaning mirror of method for preparing.
Compared with prior art; The nano-titanium dioxide film that adopts in the composite film of the present invention; Possess hydrophilic property and the dual function of decomposing spot make mirror of the present invention have the high-reflectivity that self-cleaning function can effectively keep mirror under uviolizing.
Though this specification sheets mode by way of example has been described in the drawings embodiment of the present invention, and in this article it has been done detailed explanation, the present invention also allows various modifications and replacement form.Accompanying drawing content of the present invention can be inequality proportion; Accompanying drawing and detailed description thereof are merely the exposure of specific pattern; Be not restriction of the present invention, opposite, according to make amendment in the spirit of claim protection domain and the scope, impartial member and displacement thereof be all the scope that the present invention is contained.
Claims (20)
1. an automatically cleaning mirror is characterized in that, comprising:
One substrate;
One has the composite film of self-cleaning function, and this composite film is sputtered on this substrate.
2. automatically cleaning mirror according to claim 1 is characterized in that, said composite film comprises:
One Ag rete;
One is covered in the SiO on the said Ag rete
2Rete;
One is covered in said SiO
2TiO on the rete
2Rete.
3. automatically cleaning mirror according to claim 1 is characterized in that, said composite film comprises:
One Ag rete;
One is covered in the TiO on the said Ag rete
2Rete.
4. according to each described automatically cleaning mirror among the claim 1-3, it is characterized in that the thickness of said composite film is 300-700nm.
5. automatically cleaning mirror according to claim 2 is characterized in that, in the said composite film, the thickness of said Ag rete is 100-300nm, said SiO
2Thicknesses of layers is 100-200nm; Said TiO
2Thicknesses of layers is 100-200nm.
6. automatically cleaning mirror according to claim 2 is characterized in that, in the said composite film, said Ag rete is a reflective coating, said SiO
2Rete is a protective film, said TiO
2Rete is the automatically cleaning rete.
7. automatically cleaning mirror according to claim 1 is characterized in that, said substrate is glass or metal material.
8. the preparation method of an automatically cleaning mirror is characterized in that, may further comprise the steps:
One substrate is provided,
On said substrate, adopt magnetron sputtering method be coated with one have a self-cleaning function composite film.
9. the preparation method of automatically cleaning mirror according to claim 8 is characterized in that, the step that is coated with composite film further comprises:
Be coated with an Ag rete on said substrate;
Be coated with a SiO
2Rete is on said silver film;
Be coated with a TiO
2Rete is at said SiO
2On the rete.
10. the preparation method of automatically cleaning mirror according to claim 8 is characterized in that, the step that is coated with composite film further comprises:
Be coated with an Ag rete on said substrate;
Be coated with a TiO
2Rete is on said silver film.
11. the preparation method of automatically cleaning mirror according to claim 8 is characterized in that, the magnetron sputtering target that said magnetron sputtering method adopts and the distance of said substrate are 200-300mm, and Ag target height is the thick 10-20mm of being of the wide 110-150mm of being of 1-1.5m; SiO2 target height is the thick 10-20mm of being of the wide 110-150mm of being of 1-1.5m; TiO
2The target height is the thick 10-20mm of being of the wide 110-150mm of being of 1-1.5m.
12. the preparation method of automatically cleaning mirror according to claim 8; It is characterized in that; The vacuum tightness of the Vakuumkammer that said magnetron sputtering method adopts reaches below the 10-3 order of magnitude pascal, and makes the running balance pressure that keeps the 10-2 pascal order of magnitude in this Vakuumkammer.
13. the preparation method of automatically cleaning mirror according to claim 9 is characterized in that, when being coated with said Ag rete, the magneticstrength on silver-colored target surface is 80-90 Gauss; Regulating sputtering voltage is-370V--380V, and sputtering current is 4-5A, and substrate temperature is 80 deg.c, and Ag film sedimentation rate is controlled at 20-25nm/min.
14. the preparation method of automatically cleaning mirror according to claim 9 is characterized in that, is being coated with said SiO
2During rete, SiO2 target Surface field intensity is about 110 Gausses; Radio-frequency power supply power is controlled at 5-7 kilowatt of scope; SiO2 film sedimentation rate is controlled at the 3nm/min-5nm/min scope.
15. the preparation method of automatically cleaning mirror according to claim 9 is characterized in that, is being coated with said TiO
2During rete, close DP, open molecular pump, below the vacuum tightness 10-3 pascal order of magnitude, TiO
2Target Surface field intensity is 80-90 Gauss; About sputtering voltage-420V; Sputtering current 4-5A; Charge into argon gas and oxygen, the throughput ratio of control argon, oxygen is 1: 4, and TiO2 film rate of film build is controlled at 10nm/min-14nm/min.
16. the preparation method of automatically cleaning mirror according to claim 9 is characterized in that, the thickness of said Ag rete is 100-300nm, said SiO
2Thicknesses of layers is 100-200nm; Said TiO
2Thicknesses of layers is 100-200nm.
17. the preparation method of automatically cleaning mirror according to claim 9 is characterized in that, in the said composite film, said Ag rete is a reflective coating, said SiO
2Rete is a protective film, said TiO
2Rete is the automatically cleaning rete.
18. the preparation method of automatically cleaning mirror according to claim 8 is characterized in that, said substrate is glass or metal material.
19. an automobile is characterized in that, comprises each described automatically cleaning mirror among the aforesaid right requirement 1-7.
20. a solar concentrator is characterized in that, comprises each described automatically cleaning mirror among the aforesaid right requirement 1-7.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012101226665A CN102643035A (en) | 2012-04-23 | 2012-04-23 | Self-cleaning reflector and preparation method and application thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012101226665A CN102643035A (en) | 2012-04-23 | 2012-04-23 | Self-cleaning reflector and preparation method and application thereof |
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| Publication Number | Publication Date |
|---|---|
| CN102643035A true CN102643035A (en) | 2012-08-22 |
Family
ID=46656156
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2012101226665A Pending CN102643035A (en) | 2012-04-23 | 2012-04-23 | Self-cleaning reflector and preparation method and application thereof |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103543483A (en) * | 2013-11-08 | 2014-01-29 | 中盈长江国际新能源投资有限公司 | Flexible reflector film of sunlight reflector |
| CN106222612A (en) * | 2016-07-29 | 2016-12-14 | 郑州航空工业管理学院 | A kind of for energy-conservation hydrophobic transparent film of civil aircraft air port glass and preparation method thereof |
| CN106838807A (en) * | 2017-03-09 | 2017-06-13 | 广东工业大学 | A kind of floating lamp |
| CN109163240A (en) * | 2018-09-10 | 2019-01-08 | 天津大学 | Nano-energy-saving desk lamp holder |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1602285A (en) * | 2001-12-08 | 2005-03-30 | 皮尔金顿公共有限公司 | Self-cleaning glazing sheet |
| CN101985390A (en) * | 2009-07-29 | 2011-03-16 | 比亚迪股份有限公司 | Self-cleaning glass and preparation method thereof |
| CN202583497U (en) * | 2012-04-23 | 2012-12-05 | 大连宏海新能源发展有限公司 | Self-cleaning reflective mirror |
-
2012
- 2012-04-23 CN CN2012101226665A patent/CN102643035A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1602285A (en) * | 2001-12-08 | 2005-03-30 | 皮尔金顿公共有限公司 | Self-cleaning glazing sheet |
| CN101985390A (en) * | 2009-07-29 | 2011-03-16 | 比亚迪股份有限公司 | Self-cleaning glass and preparation method thereof |
| CN202583497U (en) * | 2012-04-23 | 2012-12-05 | 大连宏海新能源发展有限公司 | Self-cleaning reflective mirror |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103543483A (en) * | 2013-11-08 | 2014-01-29 | 中盈长江国际新能源投资有限公司 | Flexible reflector film of sunlight reflector |
| CN103543483B (en) * | 2013-11-08 | 2016-01-20 | 中盈长江国际新能源投资有限公司 | The flexible mirror film of solar light reflecting mirror |
| CN106222612A (en) * | 2016-07-29 | 2016-12-14 | 郑州航空工业管理学院 | A kind of for energy-conservation hydrophobic transparent film of civil aircraft air port glass and preparation method thereof |
| CN106838807A (en) * | 2017-03-09 | 2017-06-13 | 广东工业大学 | A kind of floating lamp |
| CN109163240A (en) * | 2018-09-10 | 2019-01-08 | 天津大学 | Nano-energy-saving desk lamp holder |
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Application publication date: 20120822 |