TWI460078B - A multilayer film with hydrophilic, anti-reflection and anti-fog and the method of manufacturing the multilayer film - Google Patents

A multilayer film with hydrophilic, anti-reflection and anti-fog and the method of manufacturing the multilayer film Download PDF

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TWI460078B
TWI460078B TW102122470A TW102122470A TWI460078B TW I460078 B TWI460078 B TW I460078B TW 102122470 A TW102122470 A TW 102122470A TW 102122470 A TW102122470 A TW 102122470A TW I460078 B TWI460078 B TW I460078B
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film layer
iron
layer
film
tungsten
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TW201500217A (en
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Shao Chih He
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H P B Optoelectronic Co Ltd
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具親水性、抗反射及抗霧之多層複合薄膜及其製作方法 Multilayer composite film with hydrophilicity, anti-reflection and anti-fog and preparation method thereof

本發明係關於一種多層複合薄膜,尤指一種具有親水性、抗反射性與抗霧性之多層複合薄膜及該多層複合薄膜之製作方法。 The present invention relates to a multilayer composite film, and more particularly to a multilayer composite film having hydrophilicity, antireflection and antifogging properties and a method for producing the multilayer composite film.

一般所謂親水性膜是指在基板上附著有一光觸媒膜層,當水滴接觸到該親水膜層之表面時,因光觸媒層具有自潔之特性,因此水滴無法附著於該膜層表面;其原理在於該光觸媒膜層經由光線照射後產生電子電洞對,電子電洞對對附著於層膜表面之雜質產生氧化還原作用,使的雜質無法附著於膜層表面上,並促使水滴產生氫氧基,使水滴於表面呈現超親水效果。 Generally speaking, a hydrophilic film refers to a photocatalyst film layer attached to a substrate. When a water droplet contacts the surface of the hydrophilic film layer, the photocatalyst layer has a self-cleaning property, so that water droplets cannot adhere to the surface of the film layer; The photocatalyst film layer generates an electron hole pair after being irradiated with light, and the electron hole has a redox effect on impurities attached to the surface of the film film, so that the impurities cannot adhere to the surface of the film layer, and the water droplets are caused to generate hydroxyl groups. The water droplets are rendered super-hydrophilic on the surface.

目前已知之光觸媒材料有二氧化鈦、二氧化錫、氧化鋅、硫化鎘、硫化鋅等材料,但是基於對環境影響、成本考量、永續性及親水效果,以二氧化鈦為目前主要之光觸媒材料;但是因為二氧化鈦的能階為3.2eV,其要產生激發電子電洞對之光譜範圍落於紫外光波長範圍內,因此對於其他區域之光譜即無法使用,進而造成二氧化鈦的光觸媒效果低落;有人提出為增加其他區域之光譜的利用率,於是在製備二氧化鈦膜層時,同時對該膜層滲入氧化鎢材料,其能階為2.7eV,藉以增加吸收之光譜範圍,將由原先之二氧化鈦吸收光譜387nm提升至460nm,以提高光譜的利用範圍,但參雜三氧化鎢之薄膜會有三氧化鎢原子團發生團聚之現象,導致薄膜光吸收不均勻而影響親水效果。 Currently known photocatalyst materials are titanium dioxide, tin dioxide, zinc oxide, cadmium sulfide, zinc sulfide and other materials, but based on environmental impact, cost considerations, sustainability and hydrophilic effects, titanium dioxide is currently the main photocatalyst material; The energy level of titanium dioxide is 3.2eV, and the spectral range of the excited electron hole pair falls within the ultraviolet wavelength range. Therefore, the spectrum of other regions cannot be used, which causes the photocatalytic effect of titanium dioxide to be low. It is proposed to add other The utilization ratio of the spectrum of the region is such that when the titanium dioxide film layer is prepared, the tungsten oxide material is infiltrated into the film layer at a level of 2.7 eV, thereby increasing the absorption spectrum range, and the absorption spectrum of the original titanium dioxide is increased from 387 nm to 460 nm. In order to improve the utilization range of the spectrum, the film of the doped tungsten trioxide has a phenomenon of agglomeration of the tungsten trioxide atomic group, resulting in uneven light absorption of the film and affecting the hydrophilic effect.

另外目前最常使用於光觸媒的製備方法為利用塗佈方式,其方式為將溶有二氧化鈦之溶液噴塗於基板表面上,再經由加熱烘乾後形成一具有二氧化鈦之光觸媒膜層,但是該膜層與基板之附著力不足,因此常容易造成膜層脫落而失去光觸媒效果,同時使用塗佈方式製備親水膜層時因為膜厚過厚,因此導致光線之穿透率過低,無法應用於玻璃鏡片上,進而限制了親水膜的使用範圍。 In addition, the most commonly used photocatalyst preparation method is a coating method in which a solution in which titanium dioxide is dissolved is sprayed on the surface of a substrate, and then dried by heating to form a photocatalyst film layer having titanium dioxide, but the film layer The adhesion to the substrate is insufficient, so that the film layer is often detached and the photocatalytic effect is lost. At the same time, when the hydrophilic film layer is prepared by the coating method, the film thickness is too thick, so that the light transmittance is too low to be applied to the glass lens. This further limits the range of use of the hydrophilic membrane.

本發明的目的之一為提供一可增加吸收光譜的波長範圍之親水性、抗反射性與抗霧性之多層複合薄膜。 One of the objects of the present invention is to provide a multilayer composite film which can increase the hydrophilicity, antireflection and antifogging properties in the wavelength range of the absorption spectrum.

本發明之另一目的在於提供一種具有高比表面積之親水性、抗反射性與抗霧性之多層複合薄膜。 Another object of the present invention is to provide a multilayer composite film having hydrophilicity, antireflection and antifogging properties with high specific surface area.

本發明之另一目的在於提供一種高比例二氧化鈦銳鈦礦比例之親水性、抗反射性與抗霧性之多層複合薄膜。 Another object of the present invention is to provide a multilayer composite film which is hydrophilic, antireflective and antifogging in a high proportion of titanium dioxide anatase.

本發明之多層複合薄膜包含有:一基板、一多層抗反射膜層,該多層抗反射膜層設置於基板上,用以減少光線之反射率,其中該多層抗反射膜層係由高折射係數與低折射係數材料依序堆疊而成;一鐵/鎢複合膜層,該鐵/鎢複合膜層設置於該多層反射膜上,其中該鐵/鎢複合膜層係由鎢鐵合金鈀或是由分別鎢、鐵靶製備形成;一親水膜層,該親水膜層設置於該三氧化二鐵/氧化鎢複合膜層上方用以提供光觸媒功用;一保護膜層,該保護膜層設置於親水膜層上方,用以保護親水膜層不受外界損傷,該保護膜層係由低折射率高硬度之材質所形成。 The multilayer composite film of the present invention comprises: a substrate and a multi-layer anti-reflection film layer disposed on the substrate for reducing the reflectivity of the light, wherein the multi-layer anti-reflection film layer is made of high refraction The coefficient and the low refractive index material are sequentially stacked; an iron/tungsten composite film layer is disposed on the multilayer reflective film, wherein the iron/tungsten composite film layer is made of tungsten-iron alloy palladium or Formed by tungsten and iron targets respectively; a hydrophilic film layer disposed above the ferric oxide/tungsten oxide composite film layer for providing photocatalytic function; a protective film layer disposed on the hydrophilic layer Above the film layer, the hydrophilic film layer is protected from external damage, and the protective film layer is formed of a material having a low refractive index and a high hardness.

本發明之多層複合薄膜之製備方式為首先將基板置放於真空腔體中,以濺鍍方式將不同折射率之材料依序沉積於基板上形成一多層抗反射膜層;跟著於該多層抗反射膜層上以濺鍍方式形成一鐵/鎢複合膜層,其中該鐵/鎢複合膜層可以由一鎢鐵合金靶沉積形成,也可以分別以鎢靶與鐵靶同時沉積形成,當該鐵/鎢 複合膜層沉積形成於多層抗反射膜層,因鐵原子與鎢原子的大小不一樣而使的鐵/鎢複合膜層表面的粗糙度變大,接著將光觸媒材料以濺鍍方沉積於該鐵/鎢複合膜層形成親水膜層,其中該光觸媒材料可以為二氧化鈦、硫化鎘、氧化鋅、硫化鋅、二氧化錫等,當親水膜層沉積時,因鐵/鎢複合膜層表面的粗糙度變大進而使得親水膜層之表面積之粗糙度亦隨之增加,因此提升了該親水膜層之比表面積;接著於親水膜層上方濺鍍沉積一層保護膜層,該保護膜層為由高硬度、高透光性材料所形成。 The multilayer composite film of the present invention is prepared by first placing a substrate in a vacuum chamber, and depositing materials of different refractive indexes on the substrate in a sputtering manner to form a multilayer anti-reflection film layer; Forming an iron/tungsten composite film layer on the anti-reflective film layer by sputtering, wherein the iron/tungsten composite film layer may be formed by depositing a tungsten-iron alloy target, or may be formed by simultaneously depositing a tungsten target and an iron target, respectively. Iron/tungsten The composite film layer is formed on the multilayer anti-reflection film layer, and the roughness of the surface of the iron/tungsten composite film layer is increased due to the difference in size of the iron atoms and the tungsten atoms, and then the photocatalyst material is deposited on the iron by sputtering. /Tungsten composite film layer forms a hydrophilic film layer, wherein the photocatalyst material may be titanium dioxide, cadmium sulfide, zinc oxide, zinc sulfide, tin dioxide, etc., when the hydrophilic film layer is deposited, due to the roughness of the surface of the iron/tungsten composite film layer When the size is increased, the surface area of the hydrophilic film layer is also increased, thereby increasing the specific surface area of the hydrophilic film layer; then depositing a protective film layer on the hydrophilic film layer, the protective film layer is made of high hardness It is formed of a highly transparent material.

當完成該親水性、抗反射性與抗霧性之多層薄膜製備後,對該親水性、抗反射性與抗霧性之多層薄膜進行退火,以提高二氧化鈦之銳鈦礦結構之比例,藉以提高親水膜層之親水、除霧功效。 After the preparation of the hydrophilic, anti-reflective and anti-fogging multilayer film, the hydrophilic, anti-reflective and anti-fogging multilayer film is annealed to increase the proportion of the anatase structure of the titanium dioxide, thereby improving The hydrophilic membrane has a hydrophilic and defogging effect.

依據本發明所製備之親水性、抗反射性與抗霧性之多層薄膜,藉由鐵/鎢複合膜層可以吸收不同波長之光譜,產生更多電子電洞對以延長光觸媒效果,具有擴大使用波長範圍,增加太陽光使用率;藉由鐵/鎢複合膜層原子粒徑大小的不同,於親水膜層成膜後,可以提高親水膜層之比表面積,增加電子電洞對之作用面積,延長親水性使用壽命。 The multilayer film of hydrophilicity, anti-reflection and anti-fog prepared according to the invention can absorb different wavelengths of the spectrum by the iron/tungsten composite film layer, and generate more electron hole pairs to prolong the photocatalytic effect, and has an expanded use. The wavelength range increases the solar light utilization rate; after the film formation of the hydrophilic film layer by the atomic particle size of the iron/tungsten composite film layer, the specific surface area of the hydrophilic film layer can be increased, and the effective area of the electron hole is increased. Extend the hydrophilic life.

然而,在本創作領域中具有通常知識者應能瞭解該等詳細說明以及實施本創作所列舉的特定實施例僅係用於說明本創作,並非用以限制本創作之專利申請範圍。 However, those of ordinary skill in the art should be able to understand the detailed description and the specific embodiments set forth in the present disclosure are merely illustrative of the present invention and are not intended to limit the scope of the patent application.

1‧‧‧多層薄膜 1‧‧‧Multilayer film

10‧‧‧基板 10‧‧‧Substrate

20‧‧‧多層抗反射膜層 20‧‧‧Multilayer anti-reflective coating

201‧‧‧高折射率膜 201‧‧‧High refractive index film

202‧‧‧低折射率膜 202‧‧‧Low-refractive-index film

30‧‧‧鐵/鎢複合膜層 30‧‧‧ iron/tungsten composite film

40‧‧‧親水膜層 40‧‧‧Hydrophilic film

50‧‧‧保護膜層 50‧‧‧Protective film

S1‧‧‧基板預清潔流程 S1‧‧‧Substrate pre-cleaning process

S2‧‧‧多層抗反射膜層成膜流程 S2‧‧‧Multilayer anti-reflection film formation process

S3‧‧‧鐵/鎢複合膜層成膜流程 S3‧‧‧Iron/Tungsten Composite Film Formation Process

S4‧‧‧親水膜層成膜流程 S4‧‧‧Hydrophilic film formation process

S5‧‧‧保護膜層成膜流程 S5‧‧‧Protective film formation process

S6‧‧‧多層薄膜退火流程 S6‧‧‧Multilayer film annealing process

圖1為該多層複合薄膜堆疊示意圖。 FIG. 1 is a schematic view showing the stacking of the multilayer composite film.

圖2為多層抗反射膜層之結構。 Figure 2 is a structure of a multilayer antireflection film layer.

圖3為該多層複合薄膜製備流程示意圖 3 is a schematic view showing the preparation process of the multilayer composite film

請參閱圖一,有關本發明之具親水性、抗反射性與抗霧性之多層複合薄膜1包含有:一基板10,該基板10可為玻璃基板或 光學塑膠基板;一多層抗反射膜層20,該多層抗反射膜層20沉積於該基板10之一側,該多層抗反射膜層20由複數層高折射率膜201與複數層低折射率膜202相互交錯堆疊形成,其中該高折射率膜201可為二氧化鈦膜,該低折射率膜202可為二氧化矽膜,該多層抗反射膜層20用以降低光線反射率提高透光率;一鐵/鎢複合膜層30,該鐵/鎢複合膜層30沉積於多層抗反射膜層20相對於基板的10一側,該鐵/鎢複合膜層30可以吸收460nm~563nm波長之能量用以激發電子電動對之產生;一親水膜層40,該親水膜層40沉積於相對鐵/鎢複合膜層30一側,該親水膜層40由具光觸媒功能之材料沉積而成,該材料可為二氧化鈦、硫化鎘、氧化鋅、硫化鋅、二氧化錫等;一保護膜層50,該保護膜層50沉積於親水膜層40相對於鐵/鎢複合膜層30之一側,該保護膜層50由具有高硬度、高透光性之材料沉積而成,其中該保護層之材料可為二氧化矽。 Referring to FIG. 1, a multilayer composite film 1 having hydrophilicity, anti-reflection and anti-fogging properties according to the present invention comprises: a substrate 10, which may be a glass substrate or An optical plastic substrate; a multilayer anti-reflective film layer 20 deposited on one side of the substrate 10, the multilayer anti-reflective film layer 20 comprising a plurality of layers of high refractive index film 201 and a plurality of layers of low refractive index The high-refractive-index film 201 may be a titanium dioxide film, and the low-refractive-index film 202 may be a ceria film, and the multi-layer anti-reflective film layer 20 is used to reduce light reflectance and improve light transmittance; An iron/tungsten composite film layer 30 is deposited on the side of the multilayer anti-reflective film layer 20 with respect to the substrate 10, and the iron/tungsten composite film layer 30 can absorb energy at a wavelength of 460 nm to 563 nm. The electro-optical pair is generated; a hydrophilic film layer 40 is deposited on the side of the opposite iron/tungsten composite film layer 30, and the hydrophilic film layer 40 is deposited from a photocatalytic material. It is titanium dioxide, cadmium sulfide, zinc oxide, zinc sulfide, tin dioxide, etc.; a protective film layer 50 deposited on one side of the hydrophilic film layer 40 with respect to the iron/tungsten composite film layer 30, the protective film The layer 50 is deposited from a material having high hardness and high light transmittance. Wherein the material of the protective layer may be silicon dioxide.

有關本發明之具親水性、抗反射性與抗霧性之多層薄膜1製備流程如下所述;基板10預清潔流程S1:先將濺鍍機台腔體壓力抽到8×10-6Torr,通入氬氣,施加偏壓產生氬氣電漿,利用電漿將基板10預轟擊,清潔基板10表面髒污,接著停止輸入氬氣,改通入氧氣,產生氧氣電漿來活化基板10表面;多層抗反射膜層成膜流程S2:於腔體中通入氧氣與氬氣,其比通入流量比例為為氧氣/氬氣為1/4、將基座溫度控制在150℃,腔體真空度控制在4×10-2Torr,依序濺鍍高折射率膜201與低折射率膜201,形成高折射率膜201與低折射率膜202相互交錯重疊之多層抗反射膜層20,該多層抗反射膜層20沉積於基板10一側,其中該高折射率膜201可為二氧化鈦膜,其靶材可以是鈦金屬靶材或二氧化鈦靶材,該低折射率膜202為二氧化矽膜,其靶材可為矽靶材或二氧化矽靶材,另外該多層抗反射膜層20 之層數無特定限制,視所需之光線穿透率決定;鐵/鎢複合膜層成膜流程S3:於腔體中通入氧氣與氬氣,其通入流量比例為為氧氣/氬氣為1/2,進行濺鍍形成鐵/鎢複合膜層30,該鐵/鎢複合膜層30沉積於多層抗反射膜層相對於基板10的一側,其中該鐵/鎢複合膜層30利用鐵鎢靶材來沉積鐵/鎢薄膜30,其中該鐵/鎢薄膜30為三氧化二鐵/三氧化鎢薄膜,該三氧化二鐵/三氧化鎢薄膜膜厚為30nm,而鐵鎢靶材不侷限於鐵鎢混合靶,也可以分別為鐵靶與鎢靶兩種靶材或分別為三氧化二鐵靶與氧化鎢靶;親水膜層成膜流程S4:於腔體中通入氧氣與氬氣,其通入流量比例為氧氣/氬氣為1/4,以鈦金屬為靶材進行二氧化鈦膜層沉積,該親水膜層40膜厚介於70nm~120nm,但以100nm為較佳膜厚;保護膜層成膜流程S5:於腔體中通入氧氣與氬氣,其通入流量比例為為氧氣/氬氣為1/4,以矽材料或二氧化矽為靶材進行二氧化矽膜層沉積,該保護膜層50膜厚小於15nm;多層薄膜退火流程S6:將鍍膜完成之基板10置於退火爐中於350℃~450℃進行退火,於退火製程中三氧化二鐵/氧化鎢複合膜層30之薄膜原子擴散至親水膜層40中,抑制親水膜層40之二氧化鈦薄膜原子晶粒成長,同時提高二氧化鈦中銳鈦礦的比例,同時因三氧化二鐵/氧化鎢複合膜層30之薄膜原子擴散至親水膜層40內,因薄膜原子之粒徑大小不一,增加親水膜層40表面的粗糙度因而增加親水膜層40的比表面積。 The preparation process of the multilayer film 1 having hydrophilicity, anti-reflection and anti-fog property according to the present invention is as follows; the substrate 10 pre-cleaning process S1: first pumping the pressure of the sputtering machine chamber to 8×10 -6 Torr, An argon gas is introduced, a bias voltage is applied to generate an argon plasma, and the substrate 10 is pre-bombard by the plasma to clean the surface of the substrate 10, and then the argon gas is stopped, the oxygen is turned on, and the oxygen plasma is generated to activate the surface of the substrate 10. Multi-layer anti-reflection film layer forming process S2: oxygen and argon gas are introduced into the cavity, and the ratio of the flow rate to the flow rate is 1/4 of oxygen/argon gas, and the temperature of the susceptor is controlled at 150 ° C, the cavity The vacuum degree is controlled at 4 × 10 -2 Torr, and the high refractive index film 201 and the low refractive index film 201 are sequentially sputtered to form a multilayer antireflection film layer 20 in which the high refractive index film 201 and the low refractive index film 202 are alternately overlapped. The multi-layer anti-reflection film layer 20 is deposited on one side of the substrate 10, wherein the high-refractive-index film 201 may be a titanium dioxide film, and the target may be a titanium metal target or a titanium dioxide target, and the low-refractive-index film 202 is cerium oxide. a film whose target can be a ruthenium target or a ruthenium dioxide target, and the multilayer anti-reflection The number of layers of the film layer 20 is not particularly limited, depending on the required light transmittance; the iron/tungsten composite film layer is formed into a film flow S3: oxygen and argon are introduced into the cavity, and the flow rate of the flow is oxygen. / argon gas is 1/2, and sputtering is performed to form an iron/tungsten composite film layer 30 deposited on one side of the multilayer anti-reflection film layer with respect to the substrate 10, wherein the iron/tungsten composite film The layer 30 utilizes an iron-tungsten target 30 for depositing an iron/tungsten film 30, wherein the iron/tungsten film 30 is a ferric oxide/tungsten trioxide film having a film thickness of 30 nm and iron The tungsten target is not limited to the iron-tungsten mixed target, and may be an iron target and a tungsten target, respectively, or a ferric oxide target and a tungsten oxide target respectively; a hydrophilic film forming process S4: passing through the cavity Oxygen and argon are introduced, and the ratio of the flow rate is 1/4 of that of oxygen/argon. Titanium dioxide is used as a target to deposit titanium dioxide film. The thickness of the hydrophilic film 40 is between 70 nm and 120 nm, but 100 nm. Good film thickness; protective film layer forming process S5: oxygen and argon gas are introduced into the cavity, and the flow rate of the flow is 1/4 of oxygen/argon gas. The ruthenium dioxide film is deposited on the ruthenium material or the ruthenium dioxide as a target, and the thickness of the protective film layer 50 is less than 15 nm; the multilayer film annealing process S6: placing the coated substrate 10 in an annealing furnace at 350 ° C to 450 ° C Annealing, the film atoms of the ferric oxide/tungsten oxide composite film layer 30 are diffused into the hydrophilic film layer 40 in the annealing process, and the atomic grain growth of the titanium dioxide film of the hydrophilic film layer 40 is suppressed, and the anatase in the titanium dioxide is increased. The ratio is also due to the diffusion of the film atoms of the ferric oxide/tungsten oxide composite film layer 30 into the hydrophilic film layer 40. Since the particle size of the film atoms is different, the roughness of the surface of the hydrophilic film layer 40 is increased, thereby increasing the hydrophilic film layer. 40 specific surface area.

在本發明領域中具有通常知識者應能瞭解該等詳細說明以及實施本發明所列舉的特定實施例僅係用於說明本發明,並非用以限制本發明之專利申請範圍。 The specific embodiments of the present invention are intended to be illustrative, and are not intended to limit the scope of the invention.

1‧‧‧多層複合薄膜 1‧‧‧Multilayer composite film

10‧‧‧基板 10‧‧‧Substrate

20‧‧‧多層抗反射層膜 20‧‧‧Multilayer anti-reflective film

30‧‧‧複合層膜 30‧‧‧Composite film

40‧‧‧親水層膜 40‧‧‧Hydrophilic film

50‧‧‧保護層膜 50‧‧‧Protective film

Claims (11)

一種具親水性、抗反射及抗霧之多層複合薄膜,該薄膜至少包含有:一基板;一多層抗反射膜層,該多層抗反射膜層沉積於該基板一側,該多層抗反射膜層係由複數層高折射率材質與低折射率材質依序沉積而成;一鐵/鎢複合膜層,該鐵/鎢複合膜層沉積於該多層抗反射膜層相對於基板一側;一親水膜層,該親水膜層沉積於該鐵/鎢複合膜層相對於該多層抗反射膜層一側;一保護膜層,該保護膜層沉積於該親水膜層相對於該鐵/鎢複合膜層一側。 A multilayer composite film having hydrophilicity, anti-reflection and anti-fog, the film comprising at least: a substrate; a multilayer anti-reflection film layer deposited on one side of the substrate, the multilayer anti-reflection film The layer is formed by sequentially depositing a plurality of layers of a high refractive index material and a low refractive index material; an iron/tungsten composite film layer deposited on the side of the multilayer antireflection film layer opposite to the substrate; a hydrophilic film layer deposited on a side of the iron/tungsten composite film layer opposite to the multilayer anti-reflective film layer; a protective film layer deposited on the hydrophilic film layer with respect to the iron/tungsten composite One side of the membrane layer. 如請求項1所述之具親水性、抗反射及抗霧之多層複合薄膜,該多層抗反射膜層,該高折射率材質為二氧化鈦,低折射率材質為二氧化矽。 The multi-layer composite film having hydrophilicity, anti-reflection and anti-fog as described in claim 1, the multi-layer anti-reflection film layer, the high refractive index material is titanium dioxide, and the low refractive index material is ceria. 如請求項1所述之具親水性、抗反射及抗霧之多層複合薄膜,該鐵/鎢複合膜層之材料為鐵/鎢混合靶,該鐵/鎢複合膜層之膜厚介於15nm~50nm。 The multi-layer composite film having hydrophilicity, anti-reflection and anti-fog as described in claim 1, wherein the material of the iron/tungsten composite film layer is an iron/tungsten mixed target, and the film thickness of the iron/tungsten composite film layer is between 15 nm~ 50nm. 如請求項1所述之具親水性、抗反射及抗霧之多層複合薄膜,該鐵/鎢複合膜層之材料分別為鐵靶與鎢靶,該鐵/鎢複合膜層之膜厚介於15nm~50nm。 The multilayer composite film having hydrophilicity, anti-reflection and anti-fog as described in claim 1, wherein the material of the iron/tungsten composite film layer is an iron target and a tungsten target, respectively, and the thickness of the iron/tungsten composite film layer is between 15 nm. ~50nm. 如請求項1所述之具親水性、抗反射及抗霧之多層複合薄膜,該親水膜層為二氧化鈦,該親水膜層膜厚為70nm~120nm。 The multilayer composite film having hydrophilicity, anti-reflection and anti-fogging according to claim 1, wherein the hydrophilic film layer is titanium dioxide, and the film thickness of the hydrophilic film layer is 70 nm to 120 nm. 如請求項1所述之具親水性、抗反射及抗霧之多層複合薄膜, 該保護膜層為二氧化矽,該保護膜層膜厚介於10nm~15nm。 a multilayer composite film having hydrophilicity, anti-reflection and anti-fog as described in claim 1 The protective film layer is cerium oxide, and the protective film layer has a film thickness of 10 nm to 15 nm. 一種製作如請求項1之具親水性、抗反射及抗霧之多層複合薄膜方法,該方法至少包含下列流程:清潔流程:將濺鍍機台之腔體內壓力抽至真空,通入氬氣,施加偏壓產生氬氣電漿,利用電漿將基板預轟擊,以清潔基板表面髒污,接著通入氧氣,產生氧氣電漿來活化基板表面;多層抗反射膜層成膜流程:於該基板一側表面濺鍍形成一多層抗反射膜層,該多層抗反射膜層係由複數層具高折射率材質與低折射率之材質形成;鐵/鎢複合膜層成膜流程:於該多層抗反射膜層相對於該基板一側形成一鐵/鎢複合膜層;親水膜層成膜流程:於該鐵/鎢複合膜層相對於該多層抗反射膜層一側形成一親水膜層;保護膜層成膜流程:於該親水膜層相對於該鐵/鎢複合膜層一側形成一保護膜層,使用之材料為鐵鎢靶;多層薄膜退火流程:將該基板置於退火爐中於進行退火。 A method for producing a multilayer, composite film having hydrophilicity, anti-reflection and anti-fog as claimed in claim 1, the method comprising at least the following process: a cleaning process: pumping a pressure in a chamber of the sputtering machine to a vacuum, and introducing argon gas, Applying a bias voltage to generate an argon plasma, pre-bombard the substrate with a plasma to clean the surface of the substrate, and then introducing oxygen to generate an oxygen plasma to activate the surface of the substrate; a multilayer anti-reflective film layer forming process: on the substrate One side surface is sputtered to form a multi-layer anti-reflection film layer formed of a plurality of layers of a material having a high refractive index material and a low refractive index; a film forming process of the iron/tungsten composite film layer: The anti-reflective film layer forms an iron/tungsten composite film layer on the side of the substrate; the hydrophilic film layer is formed into a film: a hydrophilic film layer is formed on the side of the iron/tungsten composite film layer relative to the multilayer anti-reflective film layer; Protective film formation process: a protective film layer is formed on the side of the hydrophilic film layer relative to the iron/tungsten composite film layer, and the material used is an iron-tungsten target; the multilayer film annealing process: the substrate is placed in an annealing furnace Annealing is performed. 如請求項7所述之具親水性、抗反射及抗霧之多層複合薄膜方法,該多層抗反射膜層成膜流程之高折射率材質為二氧化鈦,該低折射率材質為二氧化矽。 The multi-layer composite film method according to claim 7, wherein the high refractive index material of the multi-layer anti-reflection film layer forming process is titanium dioxide, and the low refractive index material is ceria. 如請求項7所述之具親水性、抗反射及抗霧之多層複合薄膜方法,該鐵/鎢複合膜層成膜流程之鐵鎢靶為鐵金屬與鎢金屬之混合靶。 The multi-layer composite film method of hydrophilicity, anti-reflection and anti-fog according to claim 7, wherein the iron-tungsten target of the iron/tungsten composite film formation process is a mixed target of iron metal and tungsten metal. 如請求項7所述之具親水性、抗反射及抗霧之多層複合薄膜方法,該鐵/鎢複合膜層成膜流程之鐵鎢靶為單獨之鐵金屬靶與鎢金屬靶。 The multi-layer composite film method according to claim 7, wherein the iron-tungsten target of the iron/tungsten composite film formation process is a separate iron metal target and a tungsten metal target. 如請求項7所述之具親水性、抗反射及抗霧之多層複合薄膜方法,該多層薄膜退火流程之退火溫度為350℃~450℃。 The multi-layer composite film method of the hydrophilic, anti-reflective and anti-fog method according to claim 7, wherein the annealing temperature of the multilayer film annealing process is 350 ° C to 450 ° C.
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
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Citations (1)

* Cited by examiner, † Cited by third party
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* Cited by examiner, † Cited by third party
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