CN111952822B - Light source synchronous control system of double-cavity excimer laser based on MOPA structure - Google Patents

Light source synchronous control system of double-cavity excimer laser based on MOPA structure Download PDF

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CN111952822B
CN111952822B CN202010741966.6A CN202010741966A CN111952822B CN 111952822 B CN111952822 B CN 111952822B CN 202010741966 A CN202010741966 A CN 202010741966A CN 111952822 B CN111952822 B CN 111952822B
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cavity
delay
circuit
trigger
trigger signal
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CN111952822A (en
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梁勖
王晨
刘冬生
林颖
邵景珍
方晓东
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Hefei Institutes of Physical Science of CAS
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Hefei Institutes of Physical Science of CAS
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70025—Production of exposure light, i.e. light sources by lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/10084—Frequency control by seeding
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/102—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
    • H01S3/1022—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation by controlling the optical pumping
    • H01S3/1024—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation by controlling the optical pumping for pulse generation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/102—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
    • H01S3/104—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers

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  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Lasers (AREA)

Abstract

The invention discloses a light source synchronous control system of a double-cavity excimer laser based on an MOPA structure, wherein a trigger control module respectively generates trigger signals for triggering an MO cavity and a PA cavity to carry out discharge excitation, and the trigger signals of the MO cavity and the PA cavity are both fed back to a delay measurement module; the delay measurement module calculates delay data between the discharge signal of the MO cavity and the corresponding trigger signal thereof and delay data between the discharge signal of the PA cavity and the corresponding trigger signal thereof according to the discharge signals of the MO cavity and the PA cavity obtained by sampling and the trigger signals of the MO cavity and the PA cavity obtained by receiving, and sends the delay data of the MO cavity and the PA cavity to the trigger control module; and the trigger control module respectively generates the next trigger signals of the MO cavity and the PA cavity according to the delay data of the MO cavity and the PA cavity. The invention realizes that stable double-cavity synchronization can be obtained after a small number of trigger pulses, and meets the requirement of normal use in integrated circuit photoetching.

Description

Light source synchronous control system of double-cavity excimer laser based on MOPA structure
Technical Field
The invention relates to the field of light source control of a dual-cavity excimer laser, in particular to a light source synchronous control system of the dual-cavity excimer laser based on an MOPA structure.
Background
The excimer laser can provide high-energy, high-peak power and high-beam-quality laser output in ultraviolet and deep ultraviolet bands, gasifies various metal and non-metal materials in the interaction with substances to generate regular edge cutting, and has a small heat affected zone, so that the excimer laser has wide application in the field of industrial micromachining, particularly in the field of deep ultraviolet lithography, the excimer laser is a mainstream light source of current large-scale semiconductor integrated circuit lithography, and the largest application field of the excimer laser is a light source of a lithography machine.
In recent years, excimer lasers used for lithography require that the output power of the light source thereof is increased more and more, and the specifications of beam parameters such as pulse energy stability, wavelength stability and bandwidth stability are also increased more and more, so that the design of an excimer laser adopting a single discharge chamber is basically infeasible, and the accurate control of the pulse energy by the excimer laser of the single discharge chamber may adversely affect the wavelength or the bandwidth.
At present, the mainstream method at home and abroad is to adopt an excimer laser with two discharge cavities, namely a dual-cavity excimer laser with an MOPA structure. As shown in fig. 1, in the dual-cavity excimer laser with the MOPA structure, a first discharge cavity MO generates seed light with low laser energy but good beam parameters, and when the seed light is transmitted to a second discharge cavity PA, the second discharge cavity PA discharges and amplifies the energy of the seed light, so that excimer laser output with high energy and good beam parameters under a high repetition frequency condition is obtained.
Since the discharge time of an excimer laser is very short, typically 20ns to 50ns, and the lifetime of the upper level of the active medium is also in the order of 10ns, the population inversion of the excimer laser can only occur during discharge. In a dual cavity excimer laser, the laser beam from a first laser reaches a second laser, which must be population-reversed to achieve efficient amplification of the seed light. Therefore, the discharge of the dual cavity excimer laser must be synchronized in time within a certain range, for example ± 5 ns. However, due to the existence of many factors affecting the discharge time of the dual-cavity excimer laser, and the initial relative timing sequence can be gradually changed along with the working time, the number of pulses and the like, the synchronism of the two cavities of the dual-cavity excimer laser is affected, and the dual-cavity excimer laser cannot normally work.
Through retrieval, chinese patent document CN102593704A discloses a synchronous control system for dual-cavity excimer laser, which firstly detects the discharge time sequence of the two cavities with high precision in real time, and secondly adopts a single chip to adjust the digital programmable delay generator in real time according to the discharge time sequence, so as to realize the synchronization of the dual-cavity excimer laser. The main defects of the patent are that: the discharge time sequence of the two cavities can be judged only based on each trigger pulse, and then the single chip microcomputer gradually adjusts the delay generator to achieve the purpose of controlling the discharge synchronization. Because there are several steps of the conditioning process, there are more unwanted laser trigger pulses, and the laser is usually of no output or the output characteristics are not normally used in the first few hundred to tens of trigger pulses dual cavity systems. The photoetching light source generally adopts a burst pulse string running mode, the number of pulses before each trigger pulse string is required to be as small as possible, and double-cavity synchronization with good performance can be realized after 1-2 trigger pulses, so that the synchronization technology of the prior patent cannot meet the high-speed synchronization requirement in the burst mode of photoetching application.
Disclosure of Invention
In order to overcome the defects in the prior art, the invention provides a light source synchronous control system of a double-cavity excimer laser based on an MOPA structure, which solves the problems of excessive adjusting pulse number and overlong response time caused by the adoption of a trigger pulse-based time sequence judgment and step-by-step adjusting mode of the double-cavity excimer laser in the prior art, can realize stable double-cavity synchronization after a small number of trigger pulses, and further meets the requirement of normal use in integrated circuit photoetching.
In order to achieve the purpose, the invention adopts the following technical scheme that:
a light source synchronous control system of a double-cavity excimer laser based on a MOPA structure comprises: the delay measuring module and the trigger control module;
the trigger control module respectively generates a trigger signal of an MO cavity and a trigger signal of a PA cavity of the dual-cavity excimer laser, and the trigger signals are respectively used for triggering the MO cavity and the PA cavity of the dual-cavity excimer laser to carry out discharge excitation; the trigger control module further feeds back the generated trigger signal of the MO cavity and the generated trigger signal of the PA cavity to the delay measurement module;
the delay measurement module respectively samples an optical pulse signal (discharge signal) output by an MO cavity of the dual-cavity excimer laser and an optical pulse signal (discharge signal) output by a PA cavity; the delay measurement module calculates delay data between the discharge signal of the MO cavity and the corresponding trigger signal thereof and calculates delay data between the discharge signal of the PA cavity and the corresponding trigger signal thereof according to the discharge signal of the MO cavity and the discharge signal of the PA cavity obtained by sampling and according to the trigger signal of the MO cavity and the trigger signal of the PA cavity obtained by receiving;
the delay measurement module sends delay data between the discharge signal of the MO cavity and the trigger signal corresponding to the discharge signal of the MO cavity and delay data between the discharge signal of the PA cavity and the trigger signal corresponding to the discharge signal of the PA cavity to the trigger control module;
and the trigger control module respectively generates the next trigger signal of the MO cavity and the next trigger signal of the PA cavity of the dual-cavity excimer laser according to the delay data between the discharge signal of the MO cavity and the trigger signal corresponding to the discharge signal of the MO cavity and the delay data between the discharge signal of the PA cavity and the trigger signal corresponding to the discharge signal of the PA cavity.
The delay measurement module includes: the device comprises a first sampling circuit, a second sampling circuit, a first optical coupler, a second optical coupler, a first measuring circuit and a second measuring circuit;
the input end of the first sampling circuit is connected with an MO cavity of the dual-cavity excimer laser, the output end of the first sampling circuit is connected with the input end of a first optical coupler, the output end of the first optical coupler is connected with the input end of a first measuring circuit, and the output end of the first measuring circuit is connected with the trigger control module;
the input end of the second sampling circuit is connected with a PA cavity of the dual-cavity excimer laser, the output end of the second sampling circuit is connected with the input end of a second optical coupler, the output end of the second optical coupler is connected with the input end of a second measuring circuit, and the output end of the second measuring circuit is connected with the trigger control module;
the first sampling circuit and the second sampling circuit respectively sample the discharge signal of the MO cavity and the discharge signal of the PA cavity; the first sampling circuit and the second sampling circuit respectively send the discharge signal of the MO cavity and the discharge signal of the PA cavity obtained by sampling into a first optical coupler and a second optical coupler, and the first optical coupler and the second optical coupler respectively isolate the discharge signal of the MO cavity and the discharge signal of the PA cavity obtained by sampling;
the first optical coupler and the second optical coupler respectively send the isolated discharge signals of the MO cavity and the PA cavity into a first measuring circuit and a second measuring circuit;
the trigger control module is also used for feeding back the generated trigger signal of the MO cavity and the generated trigger signal of the PA cavity to the first measuring circuit and the second measuring circuit respectively;
the first measuring circuit is used for calculating time delay data between a discharge signal of the MO cavity and a trigger signal corresponding to the discharge signal, and the second measuring circuit is used for calculating time delay data between a discharge signal of the PA cavity and a trigger signal corresponding to the discharge signal.
The first measuring circuit and the second measuring circuit are isolated from the outside through high-speed optical couplers and are shielded by adopting shielding boxes; the high-speed optical coupler means that the output speed is greater than or equal to 100 MHz.
The trigger control module includes: the FPGA chip, the first delay circuit and the second delay circuit;
the FPGA chip is in bidirectional communication connection with the delay measurement module; the output end of the FPGA chip is respectively connected with the input end of the first delay circuit and the input end of the second delay circuit;
the FPGA chip respectively calculates the accurate delay time of the next trigger signal of the MO cavity and the next trigger signal of the PA cavity according to the delay data between the discharge signal of the MO cavity and the trigger signal corresponding to the discharge signal of the PA cavity and the delay data between the discharge signal of the PA cavity and the trigger signal corresponding to the discharge signal of the MO cavity, and respectively sends the calculated accurate delay time of the next trigger signal of the MO cavity and the calculated accurate delay time of the next trigger signal of the PA cavity to the first delay circuit and the second delay circuit;
the FPGA chip respectively generates delay adjustment in a larger range, namely a next trigger signal of the MO cavity and a next trigger signal of the PA cavity under coarse-precision delay, and respectively sends the generated next trigger signal of the MO cavity and the generated next trigger signal of the PA cavity under coarse-precision delay to the first delay circuit and the second delay circuit;
and the first delay circuit and the second delay circuit respectively carry out high-precision delay on the next trigger signal of the MO cavity and the next trigger signal of the PA cavity delayed in coarse precision according to the precise delay time of the next trigger signal of the MO cavity and the precise delay time of the next trigger signal of the PA cavity, and respectively generate the next trigger signal of the MO cavity and the next trigger signal of the PA cavity delayed in high precision.
The FPGA chip, the first delay circuit and the second delay circuit are isolated from the outside through high-speed optical couplers and are shielded by adopting a shielding box; the high-speed optical coupler means that the output speed is greater than or equal to 100 MHz.
The trigger control module further comprises: the first optical coupler is connected with the first input end of the first amplifier circuit;
the input end of the third optical coupler is connected with the output end of the first delay circuit, and the output end of the third optical coupler is connected with the input end of the first amplifying circuit; the input end of the fourth optical coupler is connected with the output end of the second delay circuit, and the output end of the fourth optical coupler is connected with the input end of the second amplifying circuit;
the first delay circuit and the second delay circuit respectively send the generated high-precision delayed next trigger signal of the MO cavity and the generated high-precision delayed next trigger signal of the PA cavity to the third optical coupler and the fourth optical coupler for isolation;
the third optical coupler and the fourth optical coupler respectively transmit the next trigger signal of the isolated high-precision delayed MO cavity and the next trigger signal of the isolated high-precision delayed PA cavity to the first amplifying circuit and the second amplifying circuit for amplification;
and the amplified next trigger signal of the high-precision time-delay MO cavity and the amplified next trigger signal of the PA cavity respectively trigger the MO cavity and the PA cavity of the dual-cavity excimer laser to carry out discharge excitation.
The delay measurement module calculates the delay data between the discharge signal of the MO cavity and the corresponding trigger signal thereof and the delay data between the discharge signal of the PA cavity and the corresponding trigger signal thereof to reach ps level; the precision of the coarse precision delay of the FPGA chip reaches ns level, and the precision of the high precision delay of the first delay circuit and the second delay circuit reaches ps level.
The system further comprises: the charging device comprises a direct-current power supply, a charging module, a first boosting module, a second boosting module, a first magnetic switch module and a second magnetic switch module;
the direct current power supply is used for supplying power to the charging module, the charging module divides electric energy into two paths for output, wherein one path of electric energy is subjected to voltage boosting through the first voltage boosting module and pulse compression through the first magnetic switch module in sequence and then is sent into a first discharge cavity (MO cavity) of the dual-cavity excimer laser for discharge excitation; the other path of the laser power is subjected to boosting through a second boosting module and pulse compression through a second magnetic switch module in sequence, and then is sent into a second discharge cavity, namely a PA cavity, of the dual-cavity excimer laser for discharge excitation;
the trigger control module sends the generated trigger signal of the MO cavity and the trigger signal of the PA cavity of the dual-cavity excimer laser to the first boosting module and the second boosting module respectively, so that the first boosting module and the second boosting module are triggered to discharge and excite the MO cavity and the PA cavity of the dual-cavity excimer laser.
The light source synchronous control system is wholly shielded by a shielding box.
The first measurement circuit includes: the device comprises a receiver MO-BNC, a CMOS fast comparator U1, a high-speed digital isolator U2, a D flip-flop U3, a D flip-flop U4, a D flip-flop U5, a low-power-consumption double-Schmitt trigger inverter U6, an NPN triode T1, an NPN triode T2, a resistor R1, a resistor R1, a resistor R2, a resistor R3, a resistor R4, a resistor R5, a resistor R6, a capacitor C1, a capacitor C2 and a high-precision time measuring chip U13;
the circuit connection mode of the first measurement circuit is specifically as follows:
the receiver MO-BNC is used for receiving a discharge signal of the MO cavity, the output end of the receiver MO-BNC is connected with the inverting input end of a CMOS fast comparator U1, the non-inverting input end of the CMOS fast comparator U1 is connected with a reference voltage Vref, the output end of the CMOS fast comparator U1 is connected with the input end of a high-speed digital isolator U2, the output end of the high-speed digital isolator U2 is respectively connected with the clock end of a D trigger U3 and the input end of a low-power double Schmitt trigger inverter U6, the D end of the input end of the D trigger U3 is connected with the set end of a D trigger U3 and then connected with a high-level Vcc, the Q end of the output end of the D trigger U3 is connected with a resistor R1 and then connected with the B pole of an NPN triode T1, the C pole of the NPN triode T1 is respectively connected with one end of a resistor R2 and one end of a resistor R3, the E pole of the NPN triode T1 is respectively connected with one end and the ground end of a capacitor C1 and the ground, the other end of the high-level Vcc resistor R2 is connected with the high Vcc, the other end of the resistor R3 is connected to the other end of the capacitor C1 and the zero clearing end of the D flip-flop U3 respectively, the non-end of the output end Q of the D flip-flop U3 is connected to the clock end of the D flip-flop U4, the D end of the input end of the D flip-flop U4 is connected with the set end of the D flip-flop U4 and then connected to a high-level Vcc, the Q end of the output end of the D flip-flop U4 is connected to the input end of the D flip-flop U5, the clock end of the D flip-flop U5 is connected to the output end of the low-power double Schmitt trigger inverter U6, and the Q end of the output end of the D flip-flop U5 is connected to one end of the resistor R4 and the STOP1 end of the high-precision time measuring chip U13 respectively; the other end of the resistor R4 is connected to a B pole of an NPN triode T2, a C pole of the NPN triode T2 is connected to one end of the resistor R5 and one end of the resistor R6 respectively, an E pole of the NPN triode T2 is connected to one end of a capacitor C2 and a ground terminal respectively, the other end of the resistor R5 is connected to a high-level Vcc, and the other end of the resistor R6 is connected to the other end of the capacitor C1, a clear end of a D flip-flop U4 and a clear end of a D flip-flop U5 respectively.
The second measuring circuit and the first measuring circuit have the same circuit structure.
The invention has the advantages that:
(1) the invention samples two cavities of the double-cavity excimer laser in real time, accurately measures relative delay data, feeds back to a high-speed FPGA chip for calculation, obtains the next time trigger delay data after adjustment, realizes delay adjustment in a larger range, namely coarse precision delay, with the precision reaching 5ns through the FPGA chip, realizes delay adjustment in a small range, namely high precision delay, with the precision reaching 10ps through a digital programmable delay generator in a delay circuit, and meets the requirements of realizing stable synchronization of the two cavities of the double-cavity excimer laser in 1-2 trigger pulses, and the measurement and adjustment precision reaches 10ps magnitude, thereby effectively realizing the application requirements of the double-cavity excimer laser light source in large-scale semiconductor integrated circuit photoetching.
(2) Because the excimer laser has stronger electromagnetic interference in operation, the invention adopts an electromagnetic isolation mode of double shielding boxes and high-speed optical coupler isolation, firstly, a measuring circuit in a delay measuring module and an FPGA chip and a delay circuit in a trigger control module are isolated from the outside by adopting the optical coupler, secondly, the part is shielded by adopting the shielding box again, and finally, the whole light source synchronous control system is also shielded by adopting the shielding box. By the isolation and shielding mode, the system is effectively prevented from being subjected to electromagnetic interference in working, a double-cavity excimer laser can be ensured not to generate logic errors in high repetition frequency operation, and synchronous control of the precision that the discharge time interval of the two cavities is less than +/-5 ns is realized.
Drawings
Fig. 1 is a schematic diagram of a dual cavity excimer laser with MOPA structure.
Fig. 2 is a schematic diagram of a light source synchronization control system according to the present invention.
Fig. 3 is a schematic diagram of the delay measurement module and the trigger control module according to the present invention.
FIG. 4 is a schematic circuit diagram of a measurement circuit in the delay measurement module according to the present invention.
Fig. 5 is a circuit diagram of a delay circuit in the trigger control module according to the present invention.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
As shown in fig. 2, a system for synchronously controlling a light source of a dual cavity excimer laser based on a MOPA structure includes: the device comprises a double-cavity excimer laser 1, a direct-current power supply 2, a charging module 3, a first boosting module 4, a second boosting module 5, a first magnetic switch module 6, a second magnetic switch module 7, a time delay measuring module 8 and a trigger control module 9.
As shown in fig. 1, the dual-cavity excimer laser 1 has a MOPA structure, the first discharge cavity, i.e., the MO cavity, generates seed light with low laser energy but good beam parameters, and when the seed light is transmitted to the PA cavity of the second discharge cavity, i.e., the PA cavity, discharges and amplifies the energy of the seed light, so as to obtain excimer laser output with high energy and good beam parameters under the condition of high repetition frequency.
The direct current power supply 2 is used for supplying power to the charging module 3, the charging module 3 divides electric energy into two paths for output, wherein one path of electric energy is subjected to voltage boosting through the first voltage boosting module 4 and pulse compression through the first magnetic switch module 6 in sequence, and then is sent into a first discharge cavity (MO cavity) of the dual-cavity excimer laser 1 for discharge excitation; the other path of the laser beam is subjected to boosting through a second boosting module 5 and pulse compression through a second magnetic switch module 7 in sequence, and then is sent into a second discharge cavity, namely a PA cavity, of the dual-cavity excimer laser 1 for discharge excitation.
The trigger control module 9 is configured to generate trigger signals of the MO cavity and the PA cavity, and send the generated trigger signals of the MO cavity and the PA cavity to the first voltage boosting module 4 and the second voltage boosting module 5, respectively, so as to trigger the MO cavity and the PA cavity of the dual-cavity excimer laser 1 to perform discharge excitation.
The optical pulse signals, i.e. the discharge signals, output by the MO cavity and the PA cavity of the dual-cavity excimer laser 1 are both sent to the delay measurement module 8. The trigger control module 9 further sends the generated trigger signals of the MO cavity and the PA cavity to the delay measurement module 8.
As shown in fig. 3, the delay measurement module 8 includes: the device comprises a first sampling circuit 801a, a second sampling circuit 801b, a first optical coupler 802a, a second optical coupler 802b, a first measuring circuit 803a and a second measuring circuit 803 b.
The first sampling circuit 801a and the second sampling circuit 801b respectively sample the discharge signals of the MO cavity and the PA cavity; the discharge signals of the MO cavity and the PA cavity obtained by sampling are firstly sent into the first optical coupler 802a and the second optical coupler 802b respectively, and the first optical coupler 802a and the second optical coupler 802b are used for isolating the discharge signals of the MO cavity and the PA cavity obtained by sampling respectively.
The separated discharge signals of the MO cavity and PA cavity are respectively sent to a first measuring circuit 803a and a second measuring circuit 803 b; the trigger control module 9 further sends the generated trigger signals of the MO cavity and the PA cavity to the first measurement circuit 803a and the second measurement circuit 803b, respectively; the first measurement circuit 803a is used for calculating the delay data between the discharge signal of the MO cavity and the corresponding trigger signal, and the second measurement circuit 803b is used for calculating the delay data between the discharge signal of the PA cavity and the corresponding trigger signal, with the accuracy up to 10 ps.
The delay measurement module 8 sends the calculated delay data between the discharge signal of the MO cavity and the corresponding trigger signal and the calculated delay data between the discharge signal of the PA cavity and the corresponding trigger signal to the trigger control module 9.
As shown in fig. 3, the trigger control module 9 includes: the circuit comprises an FPGA chip 901, a first delay circuit 902a, a second delay circuit 902b, a third optocoupler 903a, a fourth optocoupler 903b, a first amplifying circuit 904a and a second amplifying circuit 904 b.
The FPGA chip 901 calculates the delay time of the next trigger signal of the MO cavity and the PA cavity according to the delay data between the discharge signal of the MO cavity and the corresponding trigger signal and the delay data between the discharge signal of the PA cavity and the corresponding trigger signal, and sends the calculated delay time of the next trigger signal of the MO cavity and the PA cavity to the first measurement circuit 803a and the second measurement circuit 803b, respectively; and the delay time of the next trigger signal of the MO cavity and the PA cavity by the FPGA chip 901 is adjusted to a larger range, i.e., coarse precision delay, and the precision can reach ns level, i.e., the FPGA chip 901 generates the next trigger signal of the MO cavity and the PA cavity with coarse precision delay.
The FPGA chip 901 sends the next trigger signal of the generated coarse-precision delayed MO cavity and PA cavity to the first delay circuit 902a and the second delay circuit 902b, respectively.
The first delay circuit 902a and the second delay circuit 902b respectively delay the next trigger signals of the MO cavity and the PA cavity after coarse precision delay with high precision, wherein the precision can reach ps level, and the first delay circuit 902a and the second delay circuit 902b respectively generate the next trigger signals of the MO cavity and the PA cavity after high precision delay.
In the embodiment, the crystal oscillator of the FPGA chip is 50MHz, and the frequency of the 50MHz crystal oscillator is doubled to 200MHz internally, so that the precision of coarse precision time delay reaches 5 ns; the first delay circuit 902a and the second delay circuit 902b respectively perform 500 equal divisions on 5ns, so that the precision of high-precision delay reaches 10 ps.
The first delay circuit 902a and the second delay circuit 902b respectively send the generated high-precision delayed next trigger signals of the MO cavity and the PA cavity to the third optical coupler 903a and the fourth optical coupler 903b for isolation; the next trigger signals of the isolated high-precision delayed MO cavity and PA cavity are respectively sent to a first amplifying circuit 904a and a second amplifying circuit 904b for amplification; the amplified next trigger signals of the high-precision delayed MO cavity and PA cavity are respectively sent to the first boosting module 4 and the second boosting module 5, so that the MO cavity and PA cavity of the dual-cavity excimer laser 1 are triggered to be discharged and excited at high precision.
The first boosting module 4 and the second boosting module 5 are identical in structure, and energy storage capacitors are arranged between the first boosting module 4 and the charging module 3 and between the second boosting module 5 and the charging module 3. The direct current power supply 2 charges the two energy storage capacitors simultaneously in an LC resonance mode to ensure that the charging voltages of the two energy storage capacitors are the same, a switching tube adopted by the charging module 3 is Y30KKE silicon controlled rectifier of TECHNSEM company, and a cut-off diode adopted by the charging module 3 is formed by connecting a plurality of HFA80FA120 of International rectifier company in series and parallel.
The first magnetic switch module 6 and the second magnetic switch module 7 each include a multi-stage magnetic switch.
The first measurement circuit 803a and the second measurement circuit 803b both use high precision time measurement chips. In this embodiment, the high-precision time measurement chip is a TDC-GP2 chip of ACAM corporation.
The first delay circuit 902a and the second delay circuit 902b both use digital programmable delay generators. In this example, a digitally programmable delay generator of type MC100EP196 by the company of armeniam is used.
In this embodiment, the FPGA chip is an EP4CE10E22C8N chip from Altera corporation.
The measurement circuit in the delay measurement module 8, the FPGA chip in the trigger control module 9 and the delay circuit are isolated from the outside by high-speed optical couplers and shielded by shielding boxes; the high-speed optical coupler means that the output speed is greater than or equal to 100MHz, that is, the first optical coupler 802a, the second optical coupler 802b, the third optical coupler 903a and the fourth optical coupler 903b in the embodiment are used for being isolated from the outside.
The whole light source synchronous control system of the invention is also shielded by adopting a shielding box.
Because the excimer laser has stronger electromagnetic interference in operation, the circuit design above adopts the electromagnetic isolation mode of high-speed optical coupling isolation by double shielding boxes, firstly, the digital logic control part in the middle of the circuit, namely the delay circuit, the measuring circuit and the FPGA are isolated from the outside by the high-speed optical coupling, secondly, the part is shielded by the shielding box again, and finally, the whole sampling and output circuit above is shielded by the shielding box. By the isolation and shielding mode, the system is effectively prevented from being subjected to electromagnetic interference in working, a double-cavity excimer laser can be ensured not to generate logic errors in high repetition frequency operation, and synchronous control of the precision that the discharge time interval of the two cavities is less than +/-5 ns is realized.
In this embodiment, a specific circuit of the delay data measuring part in the delay measuring module 8 is shown in fig. 4, where the first measuring circuit 803a is an up path and the second measuring circuit 803b is a down path.
The first measurement circuit 803a includes: the device comprises a receiver PA-BNC, a CMOS fast comparator U1, a high-speed digital isolator U2, a D flip-flop U3, a D flip-flop U4, a D flip-flop U5, a low-power-consumption double-Schmitt trigger inverter U6, an NPN triode T1, an NPN triode T2, a resistor R1, a resistor R1, a resistor R2, a resistor R3, a resistor R4, a resistor R5, a resistor R6, a capacitor C1, a capacitor C2 and a high-precision time measuring chip U13.
The second measurement circuit 803b includes: the device comprises a receiver PA-BNC, a CMOS fast comparator U7, a high-speed digital isolator U8, a D flip-flop U9, a D flip-flop U10, a D flip-flop U11, a low-power-consumption double-Schmitt trigger inverter U12, an NPN triode T3, an NPN triode T4, a resistor R7, a resistor R8, a resistor R9, a resistor R10, a resistor R11, a resistor R12, a capacitor C3, a capacitor C4 and a high-precision time measuring chip U13.
The receiver MO-BNC is used for receiving a discharge signal of the MO cavity, the receiver PA-BNC is used for receiving a discharge signal of the PA cavity, and the specific models of the CMOS fast comparators U1 and U7 are ADCMP 601; the specific models of the high-speed digital isolators U2 and U8 are IL 710; the specific models of the D triggers U3, U4, U5, U9, U10 and U11 are NC7SZ 74; the specific models of the low-power-consumption double Schmitt trigger inverters U6 and U12 are SN74AUP2G 14; the specific model of the high-precision time measurement chip U13 is TDC-GP 2.
Taking the first measurement circuit 803a as an example:
the circuit connection structure of the first measurement circuit 803a is specifically as follows:
the receiver MO-BNC is used for receiving a discharge signal of the MO cavity, the output end of the receiver MO-BNC is connected with the inverting input end of a CMOS fast comparator U1, the non-inverting input end of the fast comparator U1 is connected with a reference voltage Vref, the output end of the CMOS fast comparator U1 is connected with the input end of a high-speed digital isolator U2, the output end of the high-speed digital isolator U2 is respectively connected with the clock end of a D trigger U3 and the input end of a low-power double Schmitt trigger inverter U6, the D end of the input end of the D trigger U3 is connected with the set end of the D trigger U3 and then connected with a high-level Vcc, the Q end of the output end of the D trigger U3 is connected with a resistor R1 and then connected with the B pole of an NPN triode T1, the C pole of the NPN triode T1 is respectively connected with one end of a resistor R2 and one end of a resistor R3, the E pole of the NPN triode T1 is respectively connected with one end and the ground end of a capacitor C1 and the other end of the high-level Vcc 2, the other end of the resistor R3 is connected to the other end of the capacitor C1 and the zero clearing end of the D flip-flop U3 respectively, the non-end of the output end Q of the D flip-flop U3 is connected to the clock end of the D flip-flop U4, the D end of the input end of the D flip-flop U4 is connected with the set end of the D flip-flop U4 and then connected to a high-level Vcc, the Q end of the output end of the D flip-flop U4 is connected to the input end of the D flip-flop U5, the clock end of the D flip-flop U5 is connected to the output end of the low-power double Schmitt trigger inverter U6, and the Q end of the output end of the D flip-flop U5 is connected to one end of the resistor R4 and the STOP1 end of the high-precision time measuring chip U13 respectively; the other end of the resistor R4 is connected to a B pole of an NPN triode T2, a C pole of the NPN triode T2 is connected to one end of the resistor R5 and one end of the resistor R6 respectively, an E pole of the NPN triode T2 is connected to one end of a capacitor C2 and a ground terminal respectively, the other end of the resistor R5 is connected to a high-level Vcc, and the other end of the resistor R6 is connected to the other end of the capacitor C1, a clear end of a D flip-flop U4 and a clear end of a D flip-flop U5 respectively.
The circuit principle of the first measurement circuit 803a is as follows:
the measured discharge signal of the MO cavity is input to the inverting input end of a CMOS fast comparator U1 through a receiver MO-BNC, when a signal comes temporarily, the CMOS fast comparator U1 outputs a pulse signal to the input end of a high-speed digital isolator U2, the pulse signal is output to the clock end of a D flip-flop U3 and the input end of a double-Schmitt trigger inverter U6 after being isolated, an external RC circuit is utilized, the D flip-flop U3 forms a monostable flip-flop, namely, the signal enters a temporarily stable state temporarily, the monostable flip-flop automatically returns to the stable state after a delay time, the specific delay time is related to the external RC circuit, the delay time of the monostable flip-flop formed by the D flip-flop U3 is about 10ns, namely, the Q end of the output end of the D flip-flop U3 outputs a pulse signal, the Q non-end of the output end of the D flip-flop U3 is a negative pulse signal, the Q non-end of the output end of the D flip-flop U3 outputs a negative pulse signal to the D flip-flop U4, the D trigger U4 outputs based on the rising edge of the negative pulse signal, an external RC circuit is also used for enabling the D trigger U4 to form a monostable trigger, after a period of delay time, the monostable trigger automatically returns to a stable state, the specific delay time is related to the external RC circuit, and the delay time of the monostable trigger formed by the D trigger U4 is far longer than the time of the pulse width of the detected signal; the isolated output is inverted and input to the D flip-flop U5, and the inverted rising edge of the isolated output signal is bound to be within the acquisition range.
The second measurement circuit 803b and the first measurement circuit 803a have the same circuit structure, the second measurement circuit 803b and the first measurement circuit 803a share the same high-precision time measurement chip U13, and the output terminal of the second measurement circuit 803b, i.e., the output terminal Q of the D flip-flop U11, is connected to the STOP2 terminal of the high-precision time measurement chip U13.
In this embodiment, a specific circuit of the trigger signal delay part in the trigger control module 9 is shown in fig. 5, wherein the first delay circuit 902a and the second delay circuit 902b are implemented by using a MC100EP196 programmable delay unit U14, the third optical coupler 903a and the fourth optical coupler 904b are implemented by using a chip U15 with an ADUM3221A, and the first amplifier circuit 904a and the second amplifier circuit 904b are implemented by using a linear regulator LDO, i.e., a chip U16.
The FPGA chip generates a trigger signal of the MO cavity and a trigger signal of the PA cavity after coarse precision time delay, and the trigger signals are respectively input into a first time delay circuit 902a and a second time delay circuit 902b, namely the trigger signals are input into a programmable delay unit U14 with the model of MC100EP196 for high precision time delay; 5ns is equally divided by 500 by controlling ports D1-D9 of a programmable delay unit U14 to reach the precision of 10ps, and a trigger signal of an MO cavity and a trigger signal of a PA cavity after high-precision delay are respectively input into a third optical coupler 903a and a fourth optical coupler 904b, namely, are input into a chip U15 with the model of ADUM3221A for isolation; the output voltage value of the chip U15 is controlled by a port VDD2, the port VDD2 is connected to a linear voltage regulator LDO, namely V-ADJ in the chip U16, and the output voltage value of the chip U15 can be controlled by controlling the resistance value of a resistor R14, so that the output voltage value is regulated.
The working process of the invention is as follows:
the direct current power supply charges energy storage capacitors between the first boosting module 4 and the charging module 3 and between the second boosting module 5 and the charging module 3 through the charging module respectively, if the energy storage capacitors reach required voltage after being charged and the first boosting module 4 and the second boosting module 5 are triggered by trigger signals sent by the trigger control module 9, pulse transformers in the first boosting module 4 and the second boosting module 5 respectively boost the charging voltage, and then pulse compression is respectively carried out through two to three magnetic switches in the first magnetic switch module 6 and the second magnetic switch module 7, so that the discharge excitation of two discharge cavities of the dual-cavity excimer laser 1 is realized; the delay measurement module 8 measures delay data between the discharge signals of the two discharge chambers and the corresponding trigger signals; the trigger control module 9 calculates the relative delay time of the two discharge chambers required by the next trigger according to the delay data between the discharge signals of the two discharge chambers and the corresponding trigger signals, and respectively generates the next trigger signal of the first boost module 4 and the second boost module 5 in a coarse precision delay and high precision delay mode to realize the next pulse trigger.
The main workflow of the components of the invention is as follows:
the FPGA chip 901 sets the accurate delay time of the trigger signal of the MO cavity and the trigger signal of the PA cavity, and respectively feeds back the accurate delay time of the trigger signal of the MO cavity and the trigger signal of the PA cavity to the first measurement circuit 803a and the second measurement circuit 803 b;
the FPGA chip 901 generates a coarse-precision delayed trigger signal of the MO cavity and a coarse-precision delayed trigger signal of the PA cavity according to a set repetition frequency;
after passing through the first delay circuit 902a and the second delay circuit 902b, the trigger signal generates two paths of trigger signals with default relative delay, which are respectively a trigger signal of the high-precision delay MO cavity and a trigger signal of the PA cavity;
a trigger signal of the MO cavity and a trigger signal of the PA cavity are isolated by a third optical coupler 903a and a fourth optical coupler 903b respectively, amplified by a first amplifying circuit 904a and a second amplifying circuit 904b respectively, and then triggered by the MO cavity and the PA cavity respectively;
after a period of time delay, the MO cavity and the PA cavity are respectively discharged, and a discharge signal of the MO cavity and a discharge signal of the PA cavity are respectively sampled by the first sampling circuit 801a and the second sampling circuit 801 b;
the discharge signal of the MO cavity and the discharge signal of the PA cavity are isolated by the first optical coupler 802a and the second optical coupler 802b respectively, and then are respectively subjected to delay measurement by the first measuring circuit 803a and the second measuring circuit 803b to respectively obtain accurate delay data between the discharge signal of the MO cavity and the trigger signal of the MO cavity and accurate delay data between the discharge signal of the PA cavity and the trigger signal of the PA cavity,
the FPGA chip 901 respectively calculates the accurate delay time of the two-cavity trigger signals required for realizing synchronization of next trigger according to the current delay data of the MO cavity and the PA cavity;
according to the calculated accurate delay time of the two cavity trigger signals, coarse accuracy delay and high accuracy delay of the two trigger signals are respectively set, and the two trigger signals are respectively isolated by a third optical coupler 903a and a fourth optical coupler 903b and amplified by a first amplifying circuit 904a and a second amplifying circuit 904b, so that triggering of the two high accuracy delay trigger signals on the MO cavity and the PA cavity is realized.
The next pulse is continued.
According to the invention, accurate relative delay data of two cavities under the current trigger pulse is firstly obtained, then the accurate delay of two cavity trigger signals required by the next trigger is calculated according to the required synchronous state, and the accurate delay of the two cavity trigger signals is realized in a mode of combining an FPGA internal delay circuit and a high-precision digital programming delay circuit, under the working mode, the system can realize the stable synchronization of the dual-cavity excimer laser system after 1-2 trigger pulses, the synchronization control precision and the jitter of the system depend on two parts of feedback signal delay measurement and trigger signal delay control, and the system can reach the magnitude of 10-100ps by combining a model selection digital device.
The invention is not to be considered as limited to the specific embodiments shown and described, but is to be understood to cover all modifications, equivalents, and alternatives falling within the spirit and scope of the invention as defined by the appended claims.

Claims (8)

1. A light source synchronous control system of a double-cavity excimer laser based on a MOPA structure is characterized by comprising: a delay measurement module (8) and a trigger control module (9);
the trigger control module (9) respectively generates a trigger signal of an MO cavity and a trigger signal of a PA cavity of the dual-cavity excimer laser (1), and the trigger signals are respectively used for triggering the MO cavity and the PA cavity of the dual-cavity excimer laser (1) to carry out discharge excitation; the trigger control module (9) feeds back the generated trigger signal of the MO cavity and the generated trigger signal of the PA cavity to the delay measurement module (8);
the delay measurement module (8) respectively samples an optical pulse signal (discharge signal) output by an MO cavity of the dual-cavity excimer laser (1) and an optical pulse signal (discharge signal) output by a PA cavity; the delay measurement module (8) calculates delay data between the discharge signal of the MO cavity and the corresponding trigger signal thereof and calculates delay data between the discharge signal of the PA cavity and the corresponding trigger signal thereof according to the discharge signal of the MO cavity and the discharge signal of the PA cavity obtained by sampling and according to the trigger signal of the MO cavity and the trigger signal of the PA cavity obtained by receiving;
the delay measurement module (8) sends delay data between the discharge signal of the MO cavity and the corresponding trigger signal thereof and delay data between the discharge signal of the PA cavity and the corresponding trigger signal thereof to the trigger control module (9);
the trigger control module (9) respectively generates the next trigger signal of the MO cavity and the next trigger signal of the PA cavity of the dual-cavity excimer laser (1) according to the delay data between the discharge signal of the MO cavity and the trigger signal corresponding to the discharge signal of the MO cavity and the delay data between the discharge signal of the PA cavity and the trigger signal corresponding to the discharge signal of the PA cavity;
the delay measurement module (8) comprises: the device comprises a first sampling circuit (801 a), a second sampling circuit (801 b), a first optical coupler (802 a), a second optical coupler (802 b), a first measuring circuit (803 a) and a second measuring circuit (803 b);
the input end of a first sampling circuit (801 a) is connected with an MO cavity of the dual-cavity excimer laser (1), the output end of the first sampling circuit (801 a) is connected with the input end of a first optical coupler (802 a), the output end of the first optical coupler (802 a) is connected with the input end of a first measuring circuit (803 a), and the output end of the first measuring circuit (803 a) is connected with a trigger control module (9);
the input end of a second sampling circuit (801 b) is connected with a PA cavity of the dual-cavity excimer laser (1), the output end of the second sampling circuit (801 b) is connected with the input end of a second optical coupler (802 b), the output end of the second optical coupler (802 b) is connected with the input end of a second measuring circuit (803 b), and the output end of the second measuring circuit (803 b) is connected with a trigger control module (9);
a first sampling circuit (801 a) and a second sampling circuit (801 b) respectively sample a discharge signal of the MO cavity and a discharge signal of the PA cavity; a first sampling circuit (801 a) and a second sampling circuit (801 b) respectively send a discharge signal of an MO cavity and a discharge signal of a PA cavity obtained by sampling into a first optical coupler (802 a) and a second optical coupler (802 b), and the first optical coupler (802 a) and the second optical coupler (802 b) respectively isolate the discharge signal of the MO cavity and the discharge signal of the PA cavity obtained by sampling;
the first optical coupler (802 a) and the second optical coupler (802 b) respectively send the isolated discharge signals of the MO cavity and the PA cavity into a first measuring circuit (803 a) and a second measuring circuit (803 b);
the trigger control module (9) further feeds the generated trigger signal of the MO cavity and the trigger signal of the PA cavity back to the first measuring circuit (803 a) and the second measuring circuit (803 b) respectively;
the first measuring circuit (803 a) is used for calculating time delay data between a discharge signal of the MO cavity and a corresponding trigger signal thereof, and the second measuring circuit (803 b) is used for calculating time delay data between a discharge signal of the PA cavity and a corresponding trigger signal thereof;
the first measurement circuit (803 a) includes: the device comprises a receiver MO-BNC, a CMOS fast comparator U1, a high-speed digital isolator U2, a D flip-flop U3, a D flip-flop U4, a D flip-flop U5, a low-power-consumption double-Schmitt trigger inverter U6, an NPN triode T1, an NPN triode T2, a resistor R1, a resistor R1, a resistor R2, a resistor R3, a resistor R4, a resistor R5, a resistor R6, a capacitor C1, a capacitor C2 and a high-precision time measuring chip U13;
the circuit connection mode of the first measurement circuit (803 a) is specifically as follows:
the receiver MO-BNC is used for receiving a discharge signal of the MO cavity, the output end of the receiver MO-BNC is connected with the inverting input end of a CMOS fast comparator U1, the non-inverting input end of the CMOS fast comparator U1 is connected with a reference voltage Vref, the output end of the CMOS fast comparator U1 is connected with the input end of a high-speed digital isolator U2, the output end of the high-speed digital isolator U2 is respectively connected with the clock end of a D trigger U3 and the input end of a low-power double Schmitt trigger inverter U6, the D end of the input end of the D trigger U3 is connected with the set end of a D trigger U3 and then connected with a high-level Vcc, the Q end of the output end of the D trigger U3 is connected with a resistor R1 and then connected with the B pole of an NPN triode T1, the C pole of the NPN triode T1 is respectively connected with one end of a resistor R2 and one end of a resistor R3, the E pole of the NPN triode T1 is respectively connected with one end and the ground end of a capacitor C1 and the ground, the other end of the high-level Vcc resistor R2 is connected with the high Vcc, the other end of the resistor R3 is connected to the other end of the capacitor C1 and the zero clearing end of the D flip-flop U3 respectively, the non-end of the output end Q of the D flip-flop U3 is connected to the clock end of the D flip-flop U4, the D end of the input end of the D flip-flop U4 is connected with the set end of the D flip-flop U4 and then connected to a high-level Vcc, the Q end of the output end of the D flip-flop U4 is connected to the input end of the D flip-flop U5, the clock end of the D flip-flop U5 is connected to the output end of the low-power double Schmitt trigger inverter U6, and the Q end of the output end of the D flip-flop U5 is connected to one end of the resistor R4 and the STOP1 end of the high-precision time measuring chip U13 respectively; the other end of the resistor R4 is connected to a B pole of an NPN triode T2, a C pole of the NPN triode T2 is connected with one end of the resistor R5 and one end of the resistor R6 respectively, an E pole of the NPN triode T2 is connected with one end of a capacitor C2 and a ground terminal respectively, the other end of the resistor R5 is connected to a high-level Vcc, and the other end of the resistor R6 is connected to the other end of the capacitor C2, a zero clearing end of a D trigger U4 and a zero clearing end of a D trigger U5 respectively;
the second measurement circuit (803 b) and the first measurement circuit (803 a) have the same circuit configuration.
2. The system for synchronously controlling the light source of the dual-cavity excimer laser based on the MOPA structure as claimed in claim 1, wherein the first measuring circuit (803 a) and the second measuring circuit (803 b) are isolated from the outside by high-speed optical couplers and are shielded by a shielding box; the high-speed optical coupler means that the output speed is greater than or equal to 100 MHz.
3. The system for synchronously controlling the light source of the dual-cavity excimer laser based on the MOPA structure as claimed in claim 1, wherein the trigger control module (9) comprises: the circuit comprises an FPGA chip (901), a first delay circuit (902 a) and a second delay circuit (902 b);
the FPGA chip (901) is in bidirectional communication connection with the delay measurement module (8); the output end of the FPGA chip (901) is respectively connected with the input end of the first delay circuit (902 a) and the input end of the second delay circuit (902 b);
the FPGA chip (901) respectively calculates the accurate delay time of the next trigger signal of the MO cavity and the next trigger signal of the PA cavity according to the delay data between the discharge signal of the MO cavity and the trigger signal corresponding to the discharge signal of the PA cavity and the delay data between the discharge signal of the PA cavity and the trigger signal corresponding to the discharge signal of the MO cavity, and respectively sends the calculated accurate delay time of the next trigger signal of the MO cavity and the calculated accurate delay time of the next trigger signal of the PA cavity to a first delay circuit (902 a) and a second delay circuit (902 b);
the FPGA chip (901) respectively generates a delay adjustment with a larger range, namely a next trigger signal of the MO cavity and a next trigger signal of the PA cavity under coarse-precision delay, and respectively sends the generated next trigger signal of the MO cavity and the generated next trigger signal of the PA cavity under coarse-precision delay to a first delay circuit (902 a) and a second delay circuit (902 b);
and the first delay circuit (902 a) and the second delay circuit (902 b) respectively carry out high-precision delay on the next trigger signal of the MO cavity and the next trigger signal of the PA cavity which are subjected to coarse-precision delay according to the precise delay time of the next trigger signal of the MO cavity and the precise delay time of the next trigger signal of the PA cavity, and respectively generate the next trigger signal of the MO cavity and the next trigger signal of the PA cavity which are subjected to high-precision delay.
4. The system for synchronously controlling the light source of the dual-cavity excimer laser based on the MOPA structure of claim 3, wherein the FPGA chip (901), the first delay circuit (902 a) and the second delay circuit (902 b) are isolated from the outside by high-speed optical couplers and are shielded by a shielding box; the high-speed optical coupler means that the output speed is greater than or equal to 100 MHz.
5. The system for synchronously controlling the light source of the dual-cavity excimer laser based on the MOPA structure as claimed in claim 3, wherein the trigger control module (9) further comprises: a third optical coupler (903 a), a fourth optical coupler (903 b), a first amplifying circuit (904 a) and a second amplifying circuit (904 b);
the input end of a third optocoupler (903 a) is connected with the output end of the first delay circuit (902 a), and the output end of the third optocoupler (903 a) is connected with the input end of the first amplifying circuit (904 a); the input end of a fourth optocoupler (903 b) is connected with the output end of the second delay circuit (902 b), and the output end of the fourth optocoupler (903 b) is connected with the input end of the second amplifying circuit (904 b);
the first delay circuit (902 a) and the second delay circuit (902 b) respectively send the generated high-precision delayed next trigger signal of the MO cavity and the generated high-precision delayed next trigger signal of the PA cavity to a third optical coupler (903 a) and a fourth optical coupler (903 b) for isolation;
the third optical coupler (903 a) and the fourth optical coupler (903 b) respectively transmit the next trigger signal of the isolated high-precision time-delay MO cavity and the next trigger signal of the isolated high-precision time-delay PA cavity to the first amplifying circuit (904 a) and the second amplifying circuit (904 b) for amplification;
the amplified next trigger signal of the high-precision time-delay MO cavity and the amplified next trigger signal of the PA cavity respectively trigger the MO cavity and the PA cavity of the dual-cavity excimer laser (1) to carry out discharge excitation.
6. The system for synchronously controlling the light source of the dual-cavity excimer laser based on the MOPA structure of claim 3, wherein the calculation accuracy of the delay measurement module (8) for the delay data between the discharge signal of the MO cavity and the trigger signal corresponding thereto and the delay data between the discharge signal of the PA cavity and the trigger signal corresponding thereto reaches ps level; the precision of coarse precision delay of the FPGA chip (901) reaches ns level, and the precision of high precision delay of the first delay circuit (902 a) and the second delay circuit (902 b) reaches ps level.
7. The system of claim 1, further comprising: the charging device comprises a direct current power supply (2), a charging module (3), a first boosting module (4), a second boosting module (5), a first magnetic switch module (6) and a second magnetic switch module (7);
the direct current power supply (2) is used for supplying power to the charging module (3), the charging module (3) divides electric energy into two paths for output, wherein one path of electric energy is subjected to voltage boosting through the first voltage boosting module (4) and pulse compression through the first magnetic switch module (6) in sequence, and then is sent into a first discharge cavity (MO cavity) of the dual-cavity excimer laser (1) for discharge excitation; the other path of the laser power is subjected to boosting through a second boosting module (5) and pulse compression through a second magnetic switch module (7) in sequence, and then is sent into a second discharge cavity, namely a PA cavity, of the dual-cavity excimer laser (1) for discharge excitation;
the trigger control module (9) sends the trigger signal of the MO cavity and the trigger signal of the PA cavity of the generated dual-cavity excimer laser (1) to the first boosting module (4) and the second boosting module (5) respectively, so that the first boosting module (4) and the second boosting module (5) are triggered to discharge and excite the MO cavity and the PA cavity of the dual-cavity excimer laser (1).
8. The system according to claim 7, wherein the whole system is shielded by a shielding box.
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CN112864786B (en) * 2020-12-30 2022-07-01 中国科学院合肥物质科学研究院 Device for triggering excimer laser
CN113783101B (en) * 2021-07-28 2024-02-02 北京科益虹源光电技术有限公司 Energy control method and device for dual-cavity excimer laser
CN117543324A (en) * 2022-12-27 2024-02-09 北京科益虹源光电技术有限公司 Synchronous control method and control equipment for dual-cavity excimer laser and laser
CN116435858B (en) * 2023-06-12 2023-09-01 北京精亦光电科技有限公司 Accurate delay control system and method for excimer laser

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6987790B2 (en) * 2003-02-14 2006-01-17 Lambda Physik Ag Excimer or molecular fluorine laser with several discharge chambers
US7366213B2 (en) * 2003-05-19 2008-04-29 Lambda Physik Ag MOPA excimer or molecular fluorine laser system with improved synchronization
CN102447214A (en) * 2011-12-21 2012-05-09 中国科学院安徽光学精密机械研究所 Synchronous system for all-solid-state power supply of excimer laser based on FPGA (Field Programmable Gate Array)
CN102593704A (en) * 2012-01-18 2012-07-18 中国科学院安徽光学精密机械研究所 Synchronous control system of double-cavity excimer laser
CN103078246A (en) * 2012-12-27 2013-05-01 中国科学院安徽光学精密机械研究所 Signal acquisition method in synchronous control of MOPA (Master Oscillator Power-Amplifier) system excimer laser

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4877692B2 (en) * 2001-03-21 2012-02-15 株式会社小松製作所 Injection-locked or MOPA laser device

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6987790B2 (en) * 2003-02-14 2006-01-17 Lambda Physik Ag Excimer or molecular fluorine laser with several discharge chambers
US7366213B2 (en) * 2003-05-19 2008-04-29 Lambda Physik Ag MOPA excimer or molecular fluorine laser system with improved synchronization
CN102447214A (en) * 2011-12-21 2012-05-09 中国科学院安徽光学精密机械研究所 Synchronous system for all-solid-state power supply of excimer laser based on FPGA (Field Programmable Gate Array)
CN102593704A (en) * 2012-01-18 2012-07-18 中国科学院安徽光学精密机械研究所 Synchronous control system of double-cavity excimer laser
CN103078246A (en) * 2012-12-27 2013-05-01 中国科学院安徽光学精密机械研究所 Signal acquisition method in synchronous control of MOPA (Master Oscillator Power-Amplifier) system excimer laser

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
MOPA 结构准分子激光系统的同步控制;钱小东等;《激光技术》;20150331;第39卷(第2期);全文 *

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