CN103078246A - Signal acquisition method in synchronous control of MOPA (Master Oscillator Power-Amplifier) system excimer laser - Google Patents
Signal acquisition method in synchronous control of MOPA (Master Oscillator Power-Amplifier) system excimer laser Download PDFInfo
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- CN103078246A CN103078246A CN2012105785095A CN201210578509A CN103078246A CN 103078246 A CN103078246 A CN 103078246A CN 2012105785095 A CN2012105785095 A CN 2012105785095A CN 201210578509 A CN201210578509 A CN 201210578509A CN 103078246 A CN103078246 A CN 103078246A
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Abstract
The invention discloses a signal acquisition method in synchronous control of MOPA (Master Oscillator Power-Amplifier) system excimer laser. The method adopts a first discharge cavity MO and a second discharge cavity PA, wherein an excimer laser discharge head is installed in each discharge cavity. Two high-voltage probes are respectively adopted to detect the two excimer laser discharge heads to acquire discharge high-voltage signals of the two discharge cavities, or a photosensitive probe is adopted to detect the photosignal of the first discharge cavity MO, one high-voltage probe is adopted to detect the discharge signal of the second discharge cavity PA, the two signals are transmitted to a synchronous controller, the synchronous controller extracts rising edges from the two signals for synchronous adjustment, and finally the MOPA double-cavity synchronous light-emitting is realized. The method can effectively acquire the discharge time-sequence signal of the excimer laser in real time, and can combine the special synchronous controller of the excimer laser to effectively synchronously control the double-cavity excimer laser with the MOPA structure, thereby achieving the needed control precision.
Description
Technical field
The present invention relates to a kind of signal acquiring method, relate in particular to the signal acquiring method in a kind of MOPA system excimer laser Synchronization Control.
Background technology
Excimer laser can provide at ultraviolet band the Laser output of high-energy, high-peak power, high light beam quality, because wavelength is short, pulsewidth is short, peak power is high, its output beam makes various metals, nonmetallic materials gasification in cold working, produce neat side cut, without the heat affected area, have a wide range of applications at the little manufacture field excimer laser of industry, irreplaceable status is particularly also arranged especially at present in the ultraviolet photolithographic field.
In recent years, the excimer laser power output that is used for photoetching is increasing, and it is also more and more stricter about the standard of the light beam parameters such as pulse energy stability, wavelength stability and bandwidth stability, in such situation, adopt the excimer laser design of single discharge cavity substantially infeasible, because the accurate control of pulsed energy may cause adverse effect to wavelength or bandwidth.
Present external main flow way is to adopt the excimer laser of two discharge cavities.In this class formation, first discharge cavity produces preferably seed light of the lower but light beam parameters of laser energy, when seed light is transferred to second discharge cavity, this discharge cavity discharge, and seed light is carried out energy amplify, can obtain like this excimer laser output that energy is large and light beam parameters is good under the high repetition frequency condition, process as shown in Figure 1.
Because discharge time of excimer laser is very short, general 20 ~ 50ns, and the upper level lifetime of active medium is also in the 10ns magnitude, so the population inversion of excimer laser only can exist at interdischarge interval.So in this pair of discharge cavity laser, when the laser beam of first laser arrived second laser, this laser must population inversion could be realized the effective amplification to seed light.Therefore, the discharge of two-laser must be synchronous within the specific limits on the time, for example ± and 5ns.But owing to there being many laser factors of discharge time that affects, can be along with the operating time and number of pulses etc. changes initial relative timing gradually, affect the synchronism in two chambeies, so that the excimer laser of MOPA structure needs synchro system to carry out the discharge in two chambeies is synchronous.
Summary of the invention
The object of the invention is exactly in order to remedy the defective of prior art, and the signal acquiring method in a kind of MOPA system excimer laser Synchronization Control is provided.
The present invention is achieved by the following technical solutions:
Signal acquiring method in a kind of MOPA system excimer laser Synchronization Control, include the first discharge cavity MO chamber and the second discharge cavity PA chamber, the excimer laser discharge head all is installed in each discharge cavity, adopt respectively two high-voltage probes that two excimer laser discharge heads are detected, obtain the discharge high-voltage signal of two discharge cavities, and two discharge high-voltage signals are transferred to isochronous controller, isochronous controller extracts rising edge wherein, adjust synchronously, realize the bright dipping of MOPA cavity synchronous.
Signal acquiring method in a kind of MOPA system excimer laser Synchronization Control, include the first discharge cavity MO chamber and the second discharge cavity PA chamber, the excimer laser discharge head all is installed in each discharge cavity, adopt photosensitive probe to detect the light signal in the first discharge cavity MO chamber, adopt high-voltage probe to detect the discharge signal in the second discharge cavity PA chamber, the discharge signal in the light signal in the first discharge cavity MO chamber and the second discharge cavity PA chamber is a positive pulse and a negative pulse, the light signal in the first discharge cavity MO chamber and the discharge signal in the second discharge cavity PA chamber are transferred in the isochronous controller, isochronous controller extracts the rising edge of two signals, adjust synchronously, realize the bright dipping of MOPA cavity synchronous.
Described high-voltage probe adopts P6015A high-voltage probe or PPE20KV high-voltage probe.
Described photosensitive probe adopts Det10A or Det25k, perhaps S1722-02 or R1328U-54, perhaps similar photosensitive probe.
Advantage of the present invention is: the present invention can effectively obtain the discharge clock signal of excimer laser in real time, isochronous controller in conjunction with the excimer laser special use, can be effectively the two-chamber excimer laser of MOPA structure be carried out Synchronization Control, reach required control precision.
Description of drawings
Fig. 1 is the excimer laser electric discharge device of existing two discharge cavities.
Fig. 2 is the structure drawing of device of first method of the present invention.
Fig. 3 is the structure drawing of device of second method of the present invention.
Embodiment
As shown in Figure 2, signal acquiring method in a kind of MOPA system excimer laser Synchronization Control, include the first discharge cavity MO chamber 1 and the second discharge cavity PA chamber 2, excimer laser discharge head 3 all is installed in each discharge cavity, adopt respectively 4 pairs of two excimer laser discharge heads 3 of two high-voltage probes to detect, obtain the discharge high-voltage signal of two discharge cavities, and with two the discharge high-voltage signals transfer to isochronous controller 5, the rising edge that isochronous controller 5 extracts wherein, adjust synchronously, realize the bright dipping of MOPA cavity synchronous.
As shown in Figure 3, signal acquiring method in a kind of MOPA system excimer laser Synchronization Control, include the first discharge cavity MO chamber 1 and the second discharge cavity PA chamber 2, excimer laser discharge head 3 all is installed in each discharge cavity, adopt photosensitive probe 6 to detect the light signal in the first discharge cavity MO chamber 1, adopt high-voltage probe 4 to detect the discharge signal in the second discharge cavity PA chamber 2, the discharge signal in the light signal in the first discharge cavity MO chamber 1 and the second discharge cavity PA chamber 2 is a positive pulse and a negative pulse, the light signal in the first discharge cavity MO chamber 1 and the discharge signal in the second discharge cavity PA chamber 2 are transferred in the isochronous controller 5, isochronous controller 5 extracts the rising edge of two signals, adjust synchronously, realize the bright dipping of MOPA cavity synchronous.
Described high-voltage probe 4 adopts P6015A high-voltage probe or PPE20KV high-voltage probe.
Described photosensitive probe 6 adopts Det10A or Det25k, perhaps S1722-02 or R1328U-54, perhaps similar photosensitive probe.
Claims (4)
1. the signal acquiring method in the MOPA system excimer laser Synchronization Control, it is characterized in that: include the first discharge cavity MO chamber and the second discharge cavity PA chamber, the excimer laser discharge head all is installed in each discharge cavity, adopt respectively two high-voltage probes that two excimer laser discharge heads are detected, obtain the discharge high-voltage signal of two discharge cavities, and with two the discharge high-voltage signals transfer to isochronous controller, isochronous controller extracts rising edge wherein, adjust synchronously, realize the bright dipping of MOPA cavity synchronous.
2. the signal acquiring method in the MOPA system excimer laser Synchronization Control, it is characterized in that: include the first discharge cavity MO chamber and the second discharge cavity PA chamber, the excimer laser discharge head all is installed in each discharge cavity, adopt photosensitive probe to detect the light signal in the first discharge cavity MO chamber, adopt high-voltage probe to detect the discharge signal in the second discharge cavity PA chamber, the discharge signal in the light signal in the first discharge cavity MO chamber and the second discharge cavity PA chamber is a positive pulse and a negative pulse, the light signal in the first discharge cavity MO chamber and the discharge signal in the second discharge cavity PA chamber are transferred in the isochronous controller, isochronous controller extracts the rising edge of two signals, adjust synchronously, realize the bright dipping of MOPA cavity synchronous.
3. the signal acquiring method in the MOPA according to claim 1 and 2 system excimer laser Synchronization Control, it is characterized in that: described high-voltage probe adopts P6015A high-voltage probe or PPE20KV high-voltage probe.
4. want signal acquiring method in the 2 described MOPA system excimer laser Synchronization Control according to right, it is characterized in that: described photosensitive probe adopts Det10A or Det25k, perhaps S1722-02 or R1328U-54.
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Cited By (4)
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CN107735914A (en) * | 2015-07-14 | 2018-02-23 | 极光先进雷射株式会社 | Excimer laser apparatus |
CN111952822A (en) * | 2020-07-29 | 2020-11-17 | 中国科学院合肥物质科学研究院 | Light source synchronous control system of double-cavity excimer laser based on MOPA structure |
CN112864786A (en) * | 2020-12-30 | 2021-05-28 | 中国科学院合肥物质科学研究院 | Device for triggering excimer laser |
CN113783101A (en) * | 2021-07-28 | 2021-12-10 | 北京科益虹源光电技术有限公司 | Energy control method and device for dual-cavity excimer laser |
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US20020141470A1 (en) * | 2001-03-21 | 2002-10-03 | Kiyoharu Nakao | Injection locking type or MOPA type of laser device |
US20030031216A1 (en) * | 2001-04-09 | 2003-02-13 | Fallon John P. | Control system for a two chamber gas discharge laser |
US20050031004A1 (en) * | 2002-11-05 | 2005-02-10 | Dirk Basting | Excimer or molecular fluorine laser system with precision timing |
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US20020141470A1 (en) * | 2001-03-21 | 2002-10-03 | Kiyoharu Nakao | Injection locking type or MOPA type of laser device |
US20030031216A1 (en) * | 2001-04-09 | 2003-02-13 | Fallon John P. | Control system for a two chamber gas discharge laser |
US20050031004A1 (en) * | 2002-11-05 | 2005-02-10 | Dirk Basting | Excimer or molecular fluorine laser system with precision timing |
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Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107735914A (en) * | 2015-07-14 | 2018-02-23 | 极光先进雷射株式会社 | Excimer laser apparatus |
CN111952822A (en) * | 2020-07-29 | 2020-11-17 | 中国科学院合肥物质科学研究院 | Light source synchronous control system of double-cavity excimer laser based on MOPA structure |
CN111952822B (en) * | 2020-07-29 | 2021-08-27 | 中国科学院合肥物质科学研究院 | Light source synchronous control system of double-cavity excimer laser based on MOPA structure |
CN112864786A (en) * | 2020-12-30 | 2021-05-28 | 中国科学院合肥物质科学研究院 | Device for triggering excimer laser |
CN112864786B (en) * | 2020-12-30 | 2022-07-01 | 中国科学院合肥物质科学研究院 | Device for triggering excimer laser |
CN113783101A (en) * | 2021-07-28 | 2021-12-10 | 北京科益虹源光电技术有限公司 | Energy control method and device for dual-cavity excimer laser |
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