CN111909353A - 低粘度聚氨酯制备抛光垫的方法 - Google Patents

低粘度聚氨酯制备抛光垫的方法 Download PDF

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CN111909353A
CN111909353A CN202010613591.5A CN202010613591A CN111909353A CN 111909353 A CN111909353 A CN 111909353A CN 202010613591 A CN202010613591 A CN 202010613591A CN 111909353 A CN111909353 A CN 111909353A
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徐军
刘兆阳
房玉俊
李涛
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Shandong Dongda Inov Polyurethane Co Ltd
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    • C08G18/00Polymeric products of isocyanates or isothiocyanates
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Abstract

本发明属于聚氨酯应用技术领域,具体的涉及一种低粘度聚氨酯制备抛光垫的方法,先由聚醚多元醇、催化剂、扩链剂以及中空填充物或水制成25℃粘度为700‑1600mPa·s的固化剂组分;再由多元醇与二异氰酸酯在抗氧化剂保护下制得NCO含量为19‑26wt%的预聚体组分,25℃粘度为100‑600mPa·s。在25‑35℃下,将固化剂组分与预聚体组分混合均匀,浇注于模具中开模、硫化后,制得抛光垫制品。本发明固化剂组分与预聚体组分均具有起始粘度低,常温下不结晶等特点,易于粘度控制和工艺控制,可在常温下混合操作制得邵氏硬度为45D‑75D的聚氨酯抛光垫产品。

Description

低粘度聚氨酯制备抛光垫的方法
技术领域
本发明属于聚氨酯应用技术领域,具体的涉及一种低粘度聚氨酯制备抛光垫的方法。
背景技术
化学机械抛光(CMP)技术是目前最好的实现集成电路、平板显示器等精密表面全局平面化的工艺技术,通过机械摩擦和化学作用完成对微型元件表面形成的沉积多层的导电材料、半导体材料和介电材料的去除,为超精密表面(如半导体晶片、存储磁盘等)提供机械完整性和耐化学腐蚀性。
聚氨酯抛光垫是抛光垫主流类型,目前依然存在部分难题,一方面,常规的聚氨酯抛光垫在制作的过程中通常预聚体含量较低,常温下为固体,使用前需要长时间高温烘化,操作初始粘度较大,加入填料后粘度增加更加明显,且预聚体高温操作的方式不仅消耗大量能量增加成本,而且异氰酸根含量易降低与固化剂反应引起比例失调,导致质量风险;另一方面,考虑到抛光垫输送抛光液的需求,需要在抛光垫中造孔增加孔隙率,传统的方法仅限于加入气体填充的颗粒或微球、加入表面活性剂、降低压力以引起溶解的气体形成气泡等,更低成本、更易控制的方法亟待发现。
发明内容
本发明要解决的技术问题是:克服现有技术的不足,提供一种低粘度聚氨酯制备抛光垫的方法,采用该方法制备聚氨酯抛光垫时原料粘度低且无需加热,工艺操作性更好,使聚氨酯抛光垫制作的质量风险更低,为解决市场上制备聚氨酯抛光垫遇到的难题提供了一种有效方法。
本发明所述的低粘度聚氨酯制备抛光垫的方法,包括以下步骤:
(1)固化剂组分的制备
将扩链剂与聚醚多元醇混合均匀后,在90-110℃,0.095Mpa真空度下脱水至含水率≤0.03%,然后加入催化剂与中空聚合物微球填料或水混合后,即得固化剂组分;
(2)预聚体组分的制备
将多元醇与二异氰酸酯在抗氧化剂保护下进行反应,反应温度为70-85℃,得到异氰酸根含量为19-26wt%的预聚体组分;
(3)聚氨酯抛光垫的制备
在25-35℃下,将固化剂组分与预聚体组分以70:30-20:80的质量比充分混合均匀,浇注于模具中开模、硫化后,制得抛光垫制品。
所制备的聚氨酯抛光垫体积孔隙率为20-50%,密度为0.60-1.05g/cm3,邵氏硬度为45-75D。
步骤(1)中所述的扩链剂为醇类扩链剂或胺类扩链剂。所述的醇类扩链剂选自小分子醇类扩链剂以及芳香族二醇扩链剂中的一种或一种以上,小分子醇类扩链剂为1,4-丁二醇、乙二醇或二乙二醇,芳香族二醇扩链剂为氢醌-双(β-羟乙基)醚或4-羟乙基氧乙基-1-羟乙基苯二醚;所述的胺类扩链剂为3,3'-二氯-4,4'-二氨基二苯基甲烷或二甲硫基甲苯二胺中的一种或两种。
步骤(1)中所述的催化剂可选自有机铋类催化剂、有机锡类催化剂、胺类催化剂。
步骤(1)中所述的催化剂的加入量为扩链剂与聚醚多元醇总质量的0.3-0.6%,中空聚合物微球填料的加入量为扩链剂与聚醚多元醇总质量的的0.5-1%,水的加入量为扩链剂与聚醚多元醇总质量的0.3-0.5%。
步骤(1)中所述的聚醚多元醇为数均分子量为650-2000,官能度为2的聚醚多元醇中的一种或一种以上。优选地,所述的聚醚多元醇中包括聚四氢呋喃醚多元醇。
步骤(1)中所述的扩链剂与聚醚多元醇的质量比为5:95-60:40。
步骤(1)中所述的中空聚合物微球填料优选闭孔阿克苏诺贝尔expancel的40微米微球。
步骤(2)中所述的多元醇为数均分子量为500-2000的己二酸系聚酯多元醇、聚己内酯多元醇或聚四氢呋喃醚多元醇中的一种。
步骤(2)中所述的二异氰酸酯为4,4'二苯基甲烷二异氰酸酯与碳化二亚胺改性的4,4'二苯基甲烷二异氰酸酯中的混合物,4,4'二苯基甲烷二异氰酸酯与碳化二亚胺改性的4,4'二苯基甲烷二异氰酸酯的质量比为40:60-70:30。
步骤(2)中所述的抗氧化剂优选为抗氧剂1076、抗氧剂1010、抗氧剂CA或抗氧剂164。
步骤(2)中多元醇和二异氰酸酯的质量比为10:90-36:64,抗氧化剂的加入量为多元醇和二异氰酸酯总质量的0.3-0.8%。
步骤(1)中制备的固化剂组分25℃粘度在700-1600mPa·s之间,步骤(2)中制备的预聚体组分25℃粘度在100-600mPa·s之间。
本发明制备的固化剂组分与预聚体组分室温下不结晶为液体状态,混合时无需加热,并且可以在固化剂组分中加入水作为发泡剂,与异氰酸根反应生成原位气体造孔,以更低成本、更可控的方式增加抛光垫的孔隙率。
与现有技术相比,本发明的有益效果如下:
1、本发明合成的预聚体室温下为低黏度液体,使用前无需加热,并可以控制多元醇的种类以实现抛光垫性能上的差异。
2、本发明固化剂组分室温下不结晶,初始粘度低,与预聚体混合时比例更大,更易混合均匀,降低了质量风险。
3、本发明固化剂组分中可以加入水,通过控制水的添加量,以成本更低、更可控的方式在聚氨酯抛光垫中造孔。
具体实施方式
下面结合实施例对本发明做进一步的说明。
实施例中用到的所有原料若无特殊说明,均为市购。
Figure BDA0002562978110000031
实施例1
(1)固化剂组分的制备
将12.2g的BDO与60.6g的PTMG2000、26.0g的PPG2000混合,在温度100℃、真空度0.095MPa条件下脱水至含水率≤0.03%,而后加入0.5g胺类催化剂与0.7g中空聚合物微球填料;
(2)预聚体组分的制备
22.4g的PTMG1000与54.3g的MDI-100、23.3g的液化MDI配以0.7g的抗氧化助剂1076在温度75℃下反应,得到异氰酸根质量含量为23wt%的预聚物;
(3)聚氨酯抛光垫的制备
将固化剂组分与预聚体组分在30℃下按照100:66的比例充分混合均匀,浇注于模具中开模、硫化制得邵氏硬度为45D的聚氨酯弹性体。
实施例2
(1)固化剂组分的制备
将30.0g融化的MOCA与70.0g的PTMG1000混合,在温度100℃、真空度0.095MPa条件下脱水至含水率≤0.03%,而后加入0.3g胺类催化剂与0.5g中空聚合物微球填料;
(2)预聚体组分的制备
12.5g的PE-4005与61.3g的MDI-100、26.3g的液化MDI配以0.5g的抗氧化助剂1076在温度80℃下反应,得到异氰酸根质量含量为26wt%的预聚物;
(3)聚氨酯抛光垫的制备
将固化剂组分与预聚体组分在25℃下按照100:59的比例充分混合均匀,浇注于模具中开模、硫化制得邵氏硬度为60D的聚氨酯弹性体。
实施例3
(1)固化剂组分的制备
将57.3g融化的HQEE-L与41.4g的PTMG1000混合,在温度100℃、真空度0.095MPa条件下脱水至含水率≤0.03%,而后加入0.5g胺类催化剂与0.8g中空聚合物微球填料;
(2)预聚体组分的制备
31.5g的PCL-1000与41.4g的MDI-100、27.4g的液化MDI配以0.8g的抗氧化助剂1076在温度75℃下反应,得到异氰酸根质量含量为19wt%的预聚物;
(3)聚氨酯抛光垫的制备
将固化剂组分与预聚体组分在35℃下按照100:124的比例充分混合均匀,浇注于模具中开模、硫化制得邵氏硬度为75D的聚氨酯弹性体。
实施例4
(1)固化剂组分的制备
将7.3g的BDO与92.1g的PTMG1000混合,在温度100℃、真空度0.095MPa条件下脱水至含水率≤0.03%,而后加入0.3g胺类催化剂与0.3g的水;
(2)预聚体组分的制备
24.5g的PE-4005与49.1g的MDI-100、26.4g的液化MDI配以0.5g的抗氧化助剂1076在温度78℃下反应,得到异氰酸根质量含量为22wt%的预聚物;
(3)聚氨酯抛光垫的制备
将固化剂组分与预聚体组分在25℃下按照100:75的比例充分混合均匀,浇注于模具中开模、硫化制得邵氏硬度为50D的聚氨酯弹性体。
性能测试
将实施例1-4制备的聚氨酯弹性体进行性能测试,测试结果见表1。
表1实施例1-4制备的聚氨酯弹性体测试结果
Figure BDA0002562978110000051
当然,上述内容仅为本发明的较佳实施例,不能被认为用于限定对本发明的实施例范围。本发明也并不仅限于上述举例,本技术领域的普通技术人员在本发明的实质范围内所做出的均等变化与改进等,均应归属于本发明的专利涵盖范围内。

Claims (10)

1.一种低粘度聚氨酯制备抛光垫的方法,其特征在于:包括以下步骤:
(1)固化剂组分的制备
将扩链剂与聚醚多元醇混合均匀后,脱水至含水率≤0.03%,然后加入催化剂与中空聚合物微球填料或水混合后,即得固化剂组分;
(2)预聚体组分的制备
将多元醇与二异氰酸酯在抗氧化剂保护下进行反应,得到异氰酸根含量为19-26wt%的预聚体组分;
(3)聚氨酯抛光垫的制备
在25-35℃下,将固化剂组分与预聚体组分以70:30-20:80的质量比充分混合均匀,浇注于模具中开模、硫化后,制得抛光垫制品。
2.根据权利要求1所述的低粘度聚氨酯制备抛光垫的方法,其特征在于:步骤(1)中所述的扩链剂为醇类扩链剂或胺类扩链剂。
3.根据权利要求1所述的低粘度聚氨酯制备抛光垫的方法,其特征在于:步骤(1)中所述的催化剂的加入量为扩链剂与聚醚多元醇总质量的0.3-0.6%,中空聚合物微球填料的加入量为扩链剂与聚醚多元醇总质量的的0.5-1%,水的加入量为扩链剂与聚醚多元醇总质量的0.3-0.5%。
4.根据权利要求1所述的低粘度聚氨酯制备抛光垫的方法,其特征在于:步骤(1)中所述的聚醚多元醇为数均分子量为650-2000,官能度为2的聚醚多元醇。
5.根据权利要求1所述的低粘度聚氨酯制备抛光垫的方法,其特征在于:步骤(1)中所述的扩链剂与聚醚多元醇的质量比为5:95-60:40。
6.根据权利要求1所述的低粘度聚氨酯制备抛光垫的方法,其特征在于:步骤(1)中制备的固化剂组分25℃粘度为700-1600mPa·s。
7.根据权利要求1所述的低粘度聚氨酯制备抛光垫的方法,其特征在于:步骤(2)中所述的多元醇为数均分子量为500-2000的己二酸系聚酯多元醇、聚己内酯多元醇或聚四氢呋喃醚多元醇中的一种。
8.根据权利要求1所述的低粘度聚氨酯制备抛光垫的方法,其特征在于:步骤(2)中所述的二异氰酸酯为4,4'二苯基甲烷二异氰酸酯与碳化二亚胺改性的4,4'二苯基甲烷二异氰酸酯中的混合物,4,4'二苯基甲烷二异氰酸酯与碳化二亚胺改性的4,4'二苯基甲烷二异氰酸酯的质量比为40:60-70:30。
9.根据权利要求1所述的低粘度聚氨酯制备抛光垫的方法,其特征在于:步骤(2)中多元醇和二异氰酸酯的质量比为10:90-36:64,抗氧化剂的加入量为多元醇和二异氰酸酯总质量的0.3-0.8%。
10.根据权利要求1所述的低粘度聚氨酯制备抛光垫的方法,其特征在于:步骤(2)中制备的预聚体组分25℃粘度为100-600mPa·s。
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