CN111880379A - Processing method and device for exposure graph of exposure machine and exposure machine - Google Patents
Processing method and device for exposure graph of exposure machine and exposure machine Download PDFInfo
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- CN111880379A CN111880379A CN202010631694.4A CN202010631694A CN111880379A CN 111880379 A CN111880379 A CN 111880379A CN 202010631694 A CN202010631694 A CN 202010631694A CN 111880379 A CN111880379 A CN 111880379A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/213—Exposing with the same light pattern different positions of the same surface at the same time
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
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Abstract
The invention discloses a processing method and a processing device for an exposure graph of an exposure machine and the exposure machine, wherein the method comprises the following steps: segmenting the graph to be exposed to obtain a plurality of segmented graphs with preset lengths, wherein each segmented graph is provided with an alignment mark, and the preset length is the one-time exposure length of the exposure machine; if the previous exposure stage does not exist before the current exposure stage, directly exposing the segmented graph of the current exposure stage; if the previous exposure stage exists before the current exposure stage, the position of the segmented graph of the current exposure stage is corrected according to the segmented image of the previous exposure stage and the alignment mark of the segmented graph of the current exposure stage, the corrected segmented graph is exposed, and the step is executed iteratively until the position correction and the exposure of all the segmented graphs are completed. When the image is processed in a segmented mode, the rear-segment image and the front-segment image can be accurately aligned through the alignment marks, so that the exposure precision is improved, and the product quality is guaranteed.
Description
Technical Field
The invention relates to the technical field of pattern exposure, in particular to a method and a device for processing an exposed pattern of an exposure machine and the exposure machine.
Background
An exposure machine, such as a roll-to-roll direct writing exposure machine, is a core equipment of an exposure process. The roll-to-roll direct writing exposure machine does not need a film, the pattern is directly converted, the process flow is reduced, the processing period is shortened, and the roll-to-roll direct writing exposure machine is popular with PCB (Printed circuit board) processors. The roll-to-roll direct writing exposure machine is mainly suitable for the pattern transfer process of the whole roll of soft boards.
However, the length of the material belt for one-time exposure of the roll-to-roll direct writing exposure machine is limited, if the pattern to be exposed exceeds the one-time exposure length of the exposure machine, the processing of one pattern needs to be completed through multiple exposures, and in the two adjacent exposure processing processes, whether the splicing of the front and the back two patterns is accurate or not plays a key role in the final product quality.
Disclosure of Invention
The present invention is directed to solving at least one of the problems of the prior art.
Therefore, an object of the present invention is to provide a method for processing an exposure pattern of an exposure machine, which can precisely align a rear-stage pattern with a front-stage pattern through an alignment mark when processing the images in a segmented manner, thereby improving exposure precision and ensuring product quality.
Therefore, a second object of the present invention is to provide an exposure pattern processing apparatus for an exposure machine.
To this end, a third object of the invention is to propose an exposure machine.
In order to achieve the above object, an embodiment of a first aspect of the present invention discloses a processing method for an exposure pattern of an exposure machine, including the steps of: segmenting a pattern to be exposed to obtain a plurality of segmented patterns with preset lengths, wherein each segmented pattern is provided with an alignment mark, and the preset length is the one-time exposure length of the exposure machine on the material belt; during exposure, if the previous exposure stage does not exist before the current exposure stage, directly exposing the segmented graph of the current exposure stage; if the previous exposure stage exists before the current exposure stage, the position of the segmented graph of the current exposure stage is corrected according to the segmented image of the previous exposure stage and the alignment mark of the segmented graph of the current exposure stage, the corrected segmented graph is exposed, and the step is executed iteratively until the position correction and the exposure of all the segmented graphs are completed.
According to the processing method of the exposure graph of the exposure machine, the graph to be exposed is segmented to obtain a plurality of segmented graphs, wherein each segmented graph is provided with an alignment mark, and the length of each segmented graph is the one-time exposure length of the exposure machine on the material belt; when the image is processed in a segmented mode, the rear-section image and the front-section image can be accurately aligned through the alignment marks, so that exposure precision is improved, and product quality is guaranteed.
In addition, the processing method of the exposure pattern of the exposure machine according to the above embodiment of the present invention may further include the following additional technical features;
in some examples, the position correcting the current segment pattern according to the alignment mark of the segment image of the previous exposure stage and the current segment pattern includes: and aligning the alignment mark of the segmented graph in the current exposure stage with the alignment mark of the segmented graph in the previous exposure stage to realize the position correction of the segmented graph in the current exposure stage.
In some examples, the alignment marks of a plurality of the segment patterns are located at positions corresponding to each other.
In some examples, the alignment marks of a plurality of the segmented patterns are uniform in shape.
In some examples, the alignment mark is configured as a circular hole.
In some examples, each of the alignment marks of the segment patterns is plural.
In order to achieve the above object, an embodiment of a second aspect of the present invention discloses an exposure pattern processing apparatus of an exposure machine, comprising: the device comprises a segmentation module, a storage module and a control module, wherein the segmentation module is used for segmenting a graph to be exposed to obtain a plurality of segmented graphs with preset lengths, each segmented graph is provided with an alignment mark, and the preset length is the one-time exposure length of the exposure machine on a material belt; and the exposure module is used for directly exposing the segmented graph of the current exposure stage when the previous exposure stage does not exist before the current exposure stage during exposure, and correcting the position of the segmented graph of the current exposure stage according to the alignment marks of the segmented image of the previous exposure stage and the segmented graph of the current exposure stage when the previous exposure stage exists before the current exposure stage, exposing the corrected segmented graph and iteratively executing the process until the position correction and exposure of all the segmented graphs are finished.
According to the processing device of the exposure graph of the exposure machine, the graph to be exposed is segmented to obtain a plurality of segmented graphs, wherein each segmented graph is provided with an alignment mark, and the length of each segmented graph is the one-time exposure length of the exposure machine on the material belt; when the image is processed in a segmented mode, the rear-section image and the front-section image can be accurately aligned through the alignment marks, so that exposure precision is improved, and product quality is guaranteed.
In addition, the processing device for the exposure pattern of the exposure machine according to the above embodiment of the present invention may further include the following additional technical features;
in some examples, the exposure module is specifically configured to: and aligning the alignment mark of the segmented graph in the current exposure stage with the alignment mark of the segmented graph in the previous exposure stage to realize the position correction of the segmented graph in the current exposure stage.
In some examples, the alignment marks of a plurality of the segment patterns are located at positions corresponding to each other.
In order to achieve the above object, an embodiment of a third aspect of the present invention discloses an exposure machine provided with a processing device for an exposure pattern of the exposure machine according to the above embodiment of the present invention.
According to the exposure machine provided by the embodiment of the invention, a graph to be exposed is segmented to obtain a plurality of segmented graphs, wherein each segmented graph is provided with an alignment mark, and the length of each segmented graph is the one-time exposure length of the exposure machine on a material belt; when the image is processed in a segmented mode, the rear-section image and the front-section image can be accurately aligned through the alignment marks, so that exposure precision is improved, and product quality is guaranteed.
Additional aspects and advantages of the invention will be set forth in part in the description which follows and, in part, will be obvious from the description, or may be learned by practice of the invention.
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The above and/or additional aspects and advantages of the present invention will become apparent and readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings of which:
FIG. 1 is a flowchart of a processing method of an exposure pattern of an exposure machine according to one embodiment of the present invention;
FIG. 2 is a schematic diagram of an arrangement of alignment marks according to one embodiment of the present invention;
fig. 3 is a schematic configuration diagram of a processing device of an exposure pattern of an exposure machine according to an embodiment of the present invention.
Detailed Description
Embodiments of the present invention will be described in detail below, the embodiments described with reference to the drawings being illustrative, and the embodiments of the present invention will be described in detail below.
The following describes a method and apparatus for processing an exposure pattern of an exposure machine, and an exposure machine according to an embodiment of the present invention with reference to fig. 1 to 3. The exposure graph processing method and device of the exposure machine and the exposure machine can be applied to processing and splicing scenes of large-size flexible circuit boards.
Fig. 1 is a flowchart of a processing method of an exposure pattern of an exposure machine according to one embodiment of the present invention. The exposure machine is, for example, a roll-to-roll direct write exposure machine. As shown in fig. 1, the method for processing an exposure pattern of an exposure machine includes the steps of:
step S1: and segmenting the pattern to be exposed to obtain a plurality of segmented patterns with preset lengths, wherein each segmented pattern is provided with an alignment mark, and the preset length is the one-time exposure length of the exposure machine on the material belt.
Specifically, the length of the material belt for one-time exposure of the roll-to-roll exposure machine is limited, and if the pattern to be exposed exceeds the one-time exposure length of the exposure machine on the material belt, the processing of one pattern needs to be completed through multiple exposures. In the embodiment of the invention, the pattern to be exposed is divided into a plurality of segmented patterns with preset lengths, wherein the preset lengths are the one-time exposure lengths of the exposure machine on the material belt, and the lengths of all the segmented patterns are the same. For example, as shown in fig. 2, the length of each segment pattern is the length L of one exposure of the exposure machine on the material tape.
In an embodiment of the invention, the alignment marks of the plurality of segment patterns are located at positions corresponding to each other, that is, the distance between corresponding standard marks in two adjacent segment patterns is a preset length, that is, the preset length is consistent with the one-time exposure length of the exposure machine on the material belt. Specifically, the positions of the alignment marks in each segmented pattern are consistent, for example, all the alignment marks are located at the upper right corner of the pattern, or all the alignment marks are located at the lower right corner of the pattern, so that the alignment is facilitated. For example, as shown in fig. 2, the positions of the alignment marks in each segmented graph correspond to each other, and may all be located at the lower right corner or the lower left corner or the upper left corner of the graph, or may also be located at other positions in the graph, which does not reduce redundancy, and is not illustrated one by one in the figure.
In one embodiment of the present invention, the alignment marks of the plurality of segment patterns are uniform in shape. That is, the shape of the alignment mark of each segment pattern is uniform, thereby facilitating matching alignment. In a specific example, the alignment marks of each segmented pattern may be configured to be the same geometric pattern, facilitating the alignment operation.
In one embodiment of the invention, the alignment marks are configured as circular holes. It is understood that the alignment marks may be configured in other shapes, such as triangular, quadrilateral, etc. The circular holes are more easily matched aligned relative to other geometries.
In one embodiment of the present invention, the alignment mark of each segment pattern is plural, and the arrangement of plural segment marks with respect to one segment mark can improve the alignment reliability. Taking the alignment mark as one circular hole as an example, when the circular holes of adjacent segmented patterns are aligned, the patterns are not necessarily completely spliced, if the rear segment pattern may be inclined, the exposure precision may be reduced, and when a plurality of circular holes are provided as the alignment mark, when the plurality of circular holes are all aligned correspondingly, the positions of the front and rear segments of patterns are considered to be consistent, and the splicing can be completed.
It is understood that the arrangement positions of the plurality of alignment marks can be freely selected according to actual requirements. For example, the outer area of the segmented pattern is provided with a plurality of alignment marks for alignment of next exposure, and the alignment marks can be arrayed along the exposure direction of the material belt, and the pitch of the array is completely consistent with the pattern length of each exposure.
In a specific embodiment, for example, as shown in fig. 2, two alignment marks are provided for each segment pattern, and the two alignment marks are respectively provided on the left and right sides below or above the pattern.
In the embodiment of the invention, the alignment mark is exposed by the exposure machine, so that the alignment precision is high. For other equipment punch before the material area is lifted, the alignment mark that the exposure machine exposed out, position accuracy is high, can not bring the precision influence problem of other equipment into to improve the exposure accuracy.
Step S2: during exposure, if the previous exposure stage does not exist before the current exposure stage, the segmented graph of the current exposure stage is directly exposed. That is, there is no previous segmented pattern before the segmented pattern in the current exposure stage, and if the current segmented pattern is considered to be the first segmented pattern of the pattern to be exposed, the segmented pattern is directly exposed without alignment.
Step S3: if the previous exposure stage exists before the current exposure stage, the position of the segmented graph of the current exposure stage is corrected according to the segmented image of the previous exposure stage and the alignment mark of the segmented graph of the current exposure stage, the corrected segmented graph is exposed, and the step is executed iteratively until the position correction and the exposure of all the segmented graphs are completed.
It can be understood that the alignment mark of the segment pattern of the previous exposure stage can be clearly displayed when being aligned with the alignment mark of the segment pattern of the next exposure stage, thereby improving the alignment accuracy.
The alignment mark of the segment pattern of the previous exposure stage can be accurately captured within a predetermined alignment range when being aligned with the alignment mark of the segment pattern of the next exposure stage.
In one embodiment of the present invention, the position correction of the current segment pattern according to the alignment mark of the segment image of the previous exposure stage and the current segment pattern includes: and aligning the alignment mark of the segmented graph in the current exposure stage with the alignment mark of the segmented graph in the previous exposure stage to realize the position correction of the segmented graph in the current exposure stage. For example, the alignment mark of the segment pattern in the current exposure stage is aligned with the alignment mark of the segment pattern in the previous exposure stage, and if the alignment marks of the two segment patterns are matched, the position correction of the segment pattern in the current exposure stage is completed, so that the precise splicing of the two segment patterns can be completed.
In other words, if the current segment pattern has a previous segment pattern adjacent to the current segment pattern, and the current segment pattern is not considered to be the first segment pattern, alignment is required, the alignment mark of the previous segment pattern is aligned with the alignment mark of the current segment pattern in a matching manner, so that the position of the current segment pattern is corrected according to the position of the previous segment pattern, and when the alignment mark of the previous segment pattern is completely matched with the alignment mark of the current segment pattern, the position where the current segment pattern is located is the corrected target position, and the segment pattern is exposed at the position. After finishing the position correction and exposure of the current segmented graph, carrying out position correction and exposure on the next segmented graph according to the same process, and iteratively executing the process until finishing the position correction and exposure of all segmented graphs, thereby accurately splicing all segmented graphs and finishing the exposure of the whole graph to be exposed.
In one embodiment of the invention, the positioning precision of the mechanism for the roll-to-roll collecting and releasing plate is higher, and after the material belt is collected, the difference between the actual position relation and the theoretical position relation (the error between the front and the back and the left and the right) is less than 0.5 mm. And the length of the whole pattern to be exposed is larger than the maximum processed plate length of the exposure machine.
The principle of the processing method of the exposure graph of the exposure machine of the embodiment of the invention can be summarized as follows: the method comprises the steps of dividing a graph to be exposed to be processed into a plurality of segmented graphs meeting the processing length of an exposure machine, and adding a plurality of alignment marks on each segmented graph for graph alignment in the next segment of exposure. The whole graph to be exposed is processed by a segmented processing method, and the graph of the rear segment is aligned through the alignment marks (such as alignment holes) of the graph processed by the front segment, so that the position of the graph is accurate, the exposure precision is very high, the splicing precision of the front segment graph and the rear segment graph is improved, and the whole product quality is ensured. When the alignment mark is added in the segmented pattern, the alignment mark of the next segment of pattern is exposed and processed in the previous segment of pattern, and the space of the alignment mark is completely consistent with the exposure length. When the next section is exposed, the alignment mark of the previous section is aligned, and the position of the next section of graph is corrected through the alignment mark of the previous section, so that the graphs processed by the front section and the rear section can be completely spliced, and the splicing precision is improved.
As a specific embodiment, with reference to fig. 2, an execution flow of the method for processing an exposure pattern of an exposure machine according to an embodiment of the present invention can be summarized as follows: preprocessing a graph to be exposed, dividing the graph into a plurality of segmented graphs with each segment length being L, and adding two round holes (namely alignment marks) at the gap of each segmented graph; installing a roll-to-roll mechanism on the material belt; exposing the first segment of segmented graph without an alignment hole through an exposure machine; after the first section of segmented graph exposure is finished, the plate collecting and releasing mechanism starts to act, the material discharging mechanism discharges materials, the plate collecting mechanism receives materials, and the material belt advances for about L; the alignment system of the exposure machine starts working, captures the alignment hole exposed on the first segment of the segmented graph, corrects the position of the next segment of the segmented graph, and processes the graph after the alignment is finished; exposing the second segment of the segmented graph; and the above process is executed iteratively until the exposure of the whole pattern to be exposed is completed.
According to the processing method of the exposure graph of the exposure machine, the graph to be exposed is segmented to obtain a plurality of segmented graphs, wherein each segmented graph is provided with an alignment mark, and the length of each segmented graph is the one-time exposure length of the exposure machine on the material belt; when the image is processed in a segmented mode, the rear-section image and the front-section image can be accurately aligned through the alignment marks, so that exposure precision is improved, and product quality is guaranteed.
The embodiment of the invention also provides a processing device of the exposure graph of the exposure machine.
Fig. 3 is a schematic configuration diagram of a processing device of an exposure pattern of an exposure machine according to an embodiment of the present invention. As shown in fig. 3, the apparatus 100 for processing an exposure pattern of an exposure machine includes: a segmentation module 110 and an exposure module 120.
The segmenting module 110 is configured to segment a pattern to be exposed to obtain a plurality of segmented patterns with preset lengths, where each segmented pattern has an alignment mark, and the preset length is a length of one-time exposure of the exposure machine on the material tape.
Specifically, the length of the material belt for one-time exposure of the roll-to-roll exposure machine is limited, and if the pattern to be exposed exceeds the one-time exposure length of the exposure machine on the material belt, the processing of one pattern needs to be completed through multiple exposures. In the embodiment of the invention, the pattern to be exposed is divided into a plurality of segmented patterns with preset lengths, wherein the preset lengths are the one-time exposure lengths of the exposure machine on the material belt, and the lengths of all the segmented patterns are the same. For example, as shown in fig. 2, the length of each segment pattern is the length L of one exposure of the exposure machine on the material tape.
In an embodiment of the invention, the alignment marks of the plurality of segment patterns are located at positions corresponding to each other, that is, the distance between corresponding standard marks in two adjacent segment patterns is a preset length, that is, the preset length is consistent with the one-time exposure length of the exposure machine on the material belt. Specifically, the positions of the alignment marks in each segmented pattern are consistent, for example, all the alignment marks are located at the upper right corner of the pattern, or all the alignment marks are located at the lower right corner of the pattern, so that the alignment is facilitated.
In one embodiment of the present invention, the alignment marks of the plurality of segment patterns are uniform in shape. That is, the shape of the alignment mark of each segment pattern is uniform, thereby facilitating matching alignment. In a specific example, the alignment marks of each segmented pattern may be configured to be the same geometric pattern, facilitating the alignment operation.
In one embodiment of the invention, the alignment marks are configured as circular holes. It is understood that the alignment marks may be configured in other shapes, such as triangular, quadrilateral, etc. The circular holes are more easily matched aligned relative to other geometries.
In one embodiment of the present invention, the alignment mark of each segment pattern is plural, and the arrangement of plural segment marks with respect to one segment mark can improve the alignment reliability. Taking the alignment mark as one circular hole as an example, when the circular holes of adjacent segmented patterns are aligned, the patterns are not necessarily completely spliced, if the rear segment pattern may be inclined, the exposure precision may be reduced, and when a plurality of circular holes are provided as the alignment mark, when the plurality of circular holes are all aligned correspondingly, the positions of the front and rear segments of patterns are considered to be consistent, and the splicing can be completed.
It is understood that the arrangement positions of the plurality of alignment marks can be freely selected according to actual requirements. For example, the outer area of the segmented pattern is provided with a plurality of alignment marks for alignment of next exposure, and the alignment marks can be arrayed along the exposure direction of the material belt, and the pitch of the array is completely consistent with the pattern length of each exposure.
In the embodiment of the invention, the alignment mark is exposed by the exposure machine, so that the alignment precision is high. For other equipment punch before the material area is lifted, the alignment mark that the exposure machine exposed out, position accuracy is high, can not bring the precision influence problem of other equipment into to improve the exposure accuracy.
The exposure module 120 is configured to, during exposure, directly expose the segmented pattern in the current exposure stage when a previous exposure stage does not exist before the current exposure stage, and, when the previous exposure stage exists before the current exposure stage, perform position correction on the segmented pattern in the current exposure stage according to the alignment marks of the segmented image in the previous exposure stage and the segmented pattern in the current exposure stage, expose the corrected segmented pattern, and iteratively execute the process until the position correction and exposure of all the segmented patterns are completed.
In an embodiment of the present invention, the exposure module 120 is specifically configured to: and aligning the alignment mark of the segmented graph in the current exposure stage with the alignment mark of the segmented graph in the previous exposure stage to realize the position correction of the segmented graph in the current exposure stage. For example, the alignment mark of the segment pattern in the current exposure stage is aligned with the alignment mark of the segment pattern in the previous exposure stage, and if the alignment marks of the two segment patterns are matched, the position correction of the segment pattern in the current exposure stage is completed, so that the precise splicing of the two segment patterns can be completed.
It can be understood that the alignment mark of the segment pattern of the previous exposure stage can be clearly displayed when being aligned with the alignment mark of the segment pattern of the next exposure stage, thereby improving the alignment accuracy.
The alignment mark of the segment pattern of the previous exposure stage can be accurately captured within a predetermined alignment range when being aligned with the alignment mark of the segment pattern of the next exposure stage.
The last segmented graph does not exist before the segmented graph in the current exposure stage, and the current segmented graph is considered to be the first segmented graph of the graph to be exposed, so that the segmented graph is directly exposed without alignment.
If the current segmented graph has a last segmented graph adjacent to the current segmented graph, the current segmented graph is not considered to be the first segmented graph, alignment is needed, an alignment mark of the last segmented graph is matched and aligned with an alignment mark of the current segmented graph, so that the position of the current segmented graph is corrected according to the position of the last segmented graph, when the alignment mark of the last segmented graph is completely matched and matched with the alignment mark of the current segmented graph, the position of the current segmented graph is the corrected target position, and the segmented graph is exposed at the position. After finishing the position correction and exposure of the current segmented graph, carrying out position correction and exposure on the next segmented graph according to the same process, and iteratively executing the process until finishing the position correction and exposure of all segmented graphs, thereby accurately splicing all segmented graphs and finishing the exposure of the whole graph to be exposed.
In one embodiment of the invention, the positioning precision of the mechanism for the roll-to-roll collecting and releasing plate is higher, and after the material belt is collected, the difference between the actual position relation and the theoretical position relation (the error between the front and the back and the left and the right) is less than 0.5 mm. And the length of the whole pattern to be exposed is larger than the maximum processed plate length of the exposure machine.
It should be noted that a specific implementation manner of the processing apparatus for an exposure pattern of an exposure machine according to an embodiment of the present invention is similar to a specific implementation manner of the processing method for an exposure pattern of an exposure machine according to an embodiment of the present invention, and please refer to the description of the method part specifically, and details are not repeated here in order to reduce redundancy.
According to the processing device of the exposure graph of the exposure machine, the graph to be exposed is segmented to obtain a plurality of segmented graphs, wherein each segmented graph is provided with an alignment mark, and the length of each segmented graph is the one-time exposure length of the exposure machine on the material belt; when the image is processed in a segmented mode, the rear-section image and the front-section image can be accurately aligned through the alignment marks, so that exposure precision is improved, and product quality is guaranteed.
A further embodiment of the present invention further provides an exposure machine, including the processing device for the exposure pattern of the exposure machine described in any one of the above embodiments of the present invention. The exposure machine is, for example, a roll-to-roll direct write exposure machine.
According to the exposure machine provided by the embodiment of the invention, a graph to be exposed is segmented to obtain a plurality of segmented graphs, wherein each segmented graph is provided with an alignment mark, and the length of each segmented graph is the one-time exposure length of the exposure machine on a material belt; when the image is processed in a segmented mode, the rear-section image and the front-section image can be accurately aligned through the alignment marks, so that exposure precision is improved, and product quality is guaranteed.
In addition, other configurations and functions of the exposure machine according to the above-described embodiment of the present invention are known to those skilled in the art, and are not described in detail in order to reduce redundancy.
In the description of the present invention, it is to be understood that the terms "central," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," "axial," "radial," "circumferential," and the like are used in the orientations and positional relationships indicated in the drawings for convenience in describing the invention and to simplify the description, and are not intended to indicate or imply that the referenced device or element must have a particular orientation, be constructed and operated in a particular orientation, and are not to be considered limiting of the invention.
In the description of the present invention, "a plurality" means two or more.
In the description herein, references to the description of the term "one embodiment," "some embodiments," "an illustrative embodiment," "an example," "a specific example," or "some examples" or the like mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, the schematic representations of the terms used above do not necessarily refer to the same embodiment or example.
While embodiments of the invention have been shown and described, it will be understood by those of ordinary skill in the art that: various changes, modifications, substitutions and alterations can be made to the embodiments without departing from the principles and spirit of the invention, the scope of which is defined by the claims and their equivalents.
Claims (10)
1. A processing method of an exposure pattern of an exposure machine is characterized by comprising the following steps:
segmenting a pattern to be exposed to obtain a plurality of segmented patterns with preset lengths, wherein each segmented pattern is provided with an alignment mark, and the preset length is the one-time exposure length of the exposure machine on the material belt;
during exposure, if the previous exposure stage does not exist before the current exposure stage, directly exposing the segmented graph of the current exposure stage;
if the previous exposure stage exists before the current exposure stage, the position of the segmented graph of the current exposure stage is corrected according to the segmented image of the previous exposure stage and the alignment mark of the segmented graph of the current exposure stage, the corrected segmented graph is exposed, and the step is executed iteratively until the position correction and the exposure of all the segmented graphs are completed.
2. The method for processing an exposure pattern of an exposure machine according to claim 1, wherein the position correction of the current segment pattern based on the alignment marks of the segment image of the previous exposure stage and the current segment pattern comprises:
and aligning the alignment mark of the segmented graph in the current exposure stage with the alignment mark of the segmented graph in the previous exposure stage to realize the position correction of the segmented graph in the current exposure stage.
3. The method for processing an exposure pattern of an exposure machine according to claim 1, wherein the alignment marks of the plurality of segment patterns are located at positions corresponding to each other.
4. The method for processing an exposure pattern of an exposure machine according to claim 1, wherein the alignment marks of the plurality of segment patterns are uniform in shape.
5. The method for processing an exposure pattern of an exposure machine according to claim 4, wherein the alignment mark is configured as a circular hole.
6. The method for processing an exposure pattern of an exposure machine according to any one of claims 1 to 5, wherein the alignment mark of each of the segment patterns is plural.
7. An apparatus for processing an exposure pattern of an exposure machine, comprising:
the device comprises a segmentation module, a storage module and a control module, wherein the segmentation module is used for segmenting a graph to be exposed to obtain a plurality of segmented graphs with preset lengths, each segmented graph is provided with an alignment mark, and the preset length is the one-time exposure length of the exposure machine on a material belt;
and the exposure module is used for directly exposing the segmented graph of the current exposure stage when the previous exposure stage does not exist before the current exposure stage during exposure, and correcting the position of the segmented graph of the current exposure stage according to the alignment marks of the segmented image of the previous exposure stage and the segmented graph of the current exposure stage when the previous exposure stage exists before the current exposure stage, exposing the corrected segmented graph and iteratively executing the process until the position correction and exposure of all the segmented graphs are finished.
8. The apparatus for processing an exposure pattern of an exposure machine according to claim 7, wherein the exposure module is specifically configured to:
and aligning the alignment mark of the segmented graph in the current exposure stage with the alignment mark of the segmented graph in the previous exposure stage to realize the position correction of the segmented graph in the current exposure stage.
9. The apparatus for processing an exposure pattern of an exposure machine according to claim 8, wherein the alignment marks of the plurality of segment patterns are located at positions corresponding to each other.
10. An exposure machine, characterized in that processing means for the exposure pattern of the exposure machine according to any one of claims 7 to 9 are provided.
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112748644A (en) * | 2020-12-31 | 2021-05-04 | 合肥芯碁微电子装备股份有限公司 | Lens distortion compensation method, storage medium and direct-writing photoetching machine |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20160238951A1 (en) * | 2013-10-22 | 2016-08-18 | Applied Materials, Inc. | Roll to roll mask-less lithography with active alignment |
| CN110196535A (en) * | 2019-06-20 | 2019-09-03 | 合肥芯碁微电子装备有限公司 | A kind of segmentation exposure method of roll-to-roll no exposure mask laser direct-write photoetching equipment |
| CN111208713A (en) * | 2020-03-17 | 2020-05-29 | 合肥芯碁微电子装备股份有限公司 | Method for processing exposure pattern data, exposure control unit and direct-write exposure machine |
-
2020
- 2020-07-03 CN CN202010631694.4A patent/CN111880379A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20160238951A1 (en) * | 2013-10-22 | 2016-08-18 | Applied Materials, Inc. | Roll to roll mask-less lithography with active alignment |
| CN110196535A (en) * | 2019-06-20 | 2019-09-03 | 合肥芯碁微电子装备有限公司 | A kind of segmentation exposure method of roll-to-roll no exposure mask laser direct-write photoetching equipment |
| CN111208713A (en) * | 2020-03-17 | 2020-05-29 | 合肥芯碁微电子装备股份有限公司 | Method for processing exposure pattern data, exposure control unit and direct-write exposure machine |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112748644A (en) * | 2020-12-31 | 2021-05-04 | 合肥芯碁微电子装备股份有限公司 | Lens distortion compensation method, storage medium and direct-writing photoetching machine |
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