CN111208713A - Method for processing exposure pattern data, exposure control unit and direct-write exposure machine - Google Patents
Method for processing exposure pattern data, exposure control unit and direct-write exposure machine Download PDFInfo
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- CN111208713A CN111208713A CN202010188495.0A CN202010188495A CN111208713A CN 111208713 A CN111208713 A CN 111208713A CN 202010188495 A CN202010188495 A CN 202010188495A CN 111208713 A CN111208713 A CN 111208713A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
Abstract
The invention provides a method for processing exposure graph data, an exposure control unit and a direct-writing exposure machine, wherein the method comprises the following steps: a relocation step of positioning the address pointer of the read data to the address of the repeated data required by the next section of data in response to the completion of the reading of the section of data; reading the required repeated data and the next segment of data from the first storage unit according to the address of the repeated data required by the next segment of data and the address of the next segment of data; repeating the repositioning step and the reading step until each piece of data of the exposure pattern data is obtained. According to the method for processing the exposure graphic data, the first storage unit is additionally arranged to store the exposure data, the required data is directly read from the first storage unit during data processing, resending is not needed, the transmission bandwidth of the data is saved, the transmission time is also saved, and therefore the capacity of the exposure machine is improved.
Description
Technical Field
The invention relates to the technical field of exposure, in particular to a method for exposing graphic data, an exposure control unit and a direct-writing type exposure machine.
Background
The direct-writing exposure machine is a key Device in the production process of a PCB (Printed Circuit Board) and a mask plate, the productivity is a concern of each manufacturer in the production process of the PCB and the mask plate, links of manufacturing a film and the like of the exposure machine are omitted, and an exposure graph is directly transferred to an exposure substrate through a Digital Micromirror (DMD), so that the productivity of the PCB is improved.
However, due to the different complexity of the PCB circuit, the data file size of different PCB patterns is different, and the transmission time for the complex pattern data is increased accordingly, thereby the productivity is low.
Disclosure of Invention
The present invention is directed to solving at least one of the problems of the prior art. Therefore, an object of the present invention is to provide a method for processing exposure pattern data, which can save data transmission time and is beneficial to improve the productivity of a circuit board or a mask.
A second object of the present invention is to provide an exposure control unit.
A third object of the present invention is to provide a direct writing type exposure machine.
In order to achieve the above object, a first aspect of the present invention provides a method for processing exposure pattern data, which is used for a direct-write exposure machine, the direct-write exposure machine including an exposure control unit, the exposure control unit including a first storage unit for storing exposure pattern data sent by an upper computer, the method including: a relocation step of locating the address of the read data to the address of the repeated data required by the next segment of data in response to completion of reading the segment of data; reading the required repeated data and the next segment of data from the first storage unit according to the address of the repeated data required by the next segment of data and the address of the next segment of data; repeating the repositioning step and the reading step until the complete exposure pattern data is obtained.
According to the method for processing the exposure graphic data, the first storage unit is added to store the exposure graphic data sent by the upper computer, the issued data are guaranteed not to be lost, the read address of repeated data required by exposure is relocated to the first storage unit through the relocation step during data processing, the repeated data can be directly read from the first storage unit without being sent again by the upper computer, the data transmission time is saved, the transmission bandwidth of the data is also saved, and therefore the capacity of generating a PCB or a mask is improved.
In some embodiments, the exposure pattern data includes any one of filled binarized data, gray scale data, and vector data.
In some embodiments, the exposure control unit further includes a second storage unit, the method further comprising: and processing the exposure pattern data, and storing the processed exposure pattern data to the second storage unit.
In some embodiments, the method further comprises: receiving the exposure graph data sent by the upper computer; and controlling the write address of the first storage unit according to a preset storage sequence so as to store the exposure pattern data to the first storage unit.
In some embodiments, when the exposure pattern data is vector data, the controlling the write address of the first storage unit according to a preset storage sequence to store the exposure pattern data in the first storage unit includes: restoring the received vector coordinate file into binary image data; and storing the binary image data to the first storage unit, wherein the writing addresses of the first storage unit are increased progressively according to a preset storage sequence.
In order to achieve the above object, a second aspect of the present invention provides an exposure control unit including: a first storage unit for storing exposure pattern data; a second storage unit for storing the processed exposure pattern data; and the core control chip is respectively connected with the first storage unit and the second storage unit in a communication mode and is used for the method for processing the exposure pattern data in any one of the above embodiments.
According to the exposure control unit implemented by the invention, the exposure data is stored in the first storage unit to ensure that the graphic data cannot be lost, and when the data is processed, the data required by exposure can be directly read from the first storage unit by repositioning the read address without retransmitting by an upper computer, so that the transmission bandwidth and the transmission time of the data are saved, the exposure speed is improved, and the capacity of a circuit board is improved.
In some embodiments, the first memory unit includes one of memory banks of DDR2, DDR3, DDR 4.
In some embodiments, the core control chip comprises a field programmable gate array.
In order to achieve the above object, a third embodiment of the present invention provides a direct-write exposure machine, which includes an exposure system, a digital micromirror device, and any one of the exposure control units mentioned in the above embodiments, the exposure control unit being configured to control the exposure system and the digital micromirror device respectively according to exposure pattern data.
According to the direct-writing exposure machine disclosed by the embodiment of the invention, the exposure graphic data sent by the upper computer is stored by adopting the exposure control unit disclosed by the embodiment of the invention, so that the graphic data can be ensured not to be lost, the repeated data required by exposure does not need to be retransmitted again, the transmission bandwidth and the transmission time of the data are saved, the exposure speed is improved, and the productivity is improved.
Additional aspects and advantages of the invention will be set forth in part in the description which follows and, in part, will be obvious from the description, or may be learned by practice of the invention.
Drawings
The above and/or additional aspects and advantages of the present invention will become apparent and readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings of which:
FIG. 1 is a diagram illustrating reading of exposure pattern data in the prior art;
FIG. 2 is a flow diagram of a method of processing exposure pattern data according to one embodiment of the invention;
FIG. 3 is a schematic diagram of reading exposure pattern data according to one embodiment of the present invention;
FIG. 4 is a schematic diagram of a data store according to one embodiment of the present invention;
fig. 5 is a block diagram of an exposure control unit according to an embodiment of the present invention;
fig. 6 is a block diagram of a direct write exposure machine according to one embodiment of the present invention.
Detailed Description
Embodiments of the present invention will be described in detail below, the embodiments described with reference to the drawings being illustrative, and the embodiments of the present invention will be described in detail below.
The direct-write exposure machine needs to segment the graphic data to be exposed (referred to as exposure graphic data in the embodiment of the present invention) and then send the segmented graphic data to the exposure control unit to realize the transfer of the exposure graphic to the substrate, wherein the segmentation is to support data transmission and scanning simultaneously and realize real-time exposure.
As shown in fig. 1, since the exposure control unit performs processes such as rotation transformation on data during exposure display, in the conventional implementation, some data of the previous data needs to be repeatedly transmitted before each data segment to ensure lossless seaming of graphics processing, and at the end of each data segment, some parts r1, r2 and r3 shown in fig. 1 need to be added to assist the graphics processing operation. Further, all graphics processing is based on frame operations, so the repeated data and added black map height need to be an integer multiple of the frame height. Therefore, before each section of data is read, the upper computer is required to repeatedly send the required repeated data, the data transmission time is wasted, the transmission bandwidth of the graphic data is reduced, the exposure efficiency is reduced, and the production capacity of the circuit board is further influenced.
In order to solve the above problems, the method for processing exposure graphic data according to the embodiment of the present invention does not require an upper computer to repeatedly send data, thereby saving transmission time, increasing data transmission bandwidth, increasing efficiency, and increasing the capacity of a production line board.
In an embodiment of the present invention, the direct write exposure machine includes an exposure control unit added with a first storage unit for storing exposure pattern data sent by an upper computer.
A method of processing exposure pattern data according to an embodiment of the first aspect of the present invention is described below with reference to fig. 2 to 4.
As shown in fig. 2, the method of processing exposure pattern data of the embodiment of the present invention includes at least step S1, step S2, and step S3.
And step S1, in response to the completion of reading one piece of data, positioning the address pointer of the read data to the address of the repeated data needed by the next piece of data.
And step S2, reading the required repeated data and the next segment of data from the first storage unit according to the address of the required repeated data of the next segment of data and the address of the next segment of data.
Step S3, the repositioning step and the reading step are repeated until each piece of data of the exposure pattern data is obtained.
FIG. 3 is a schematic diagram of reading exposure pattern data according to an embodiment of the present invention. Specifically, the upper computer caches the optimized sending graph in a memory, and the exposure control unit receives exposure graph data sent by the upper computer; and controlling the write address of the first storage unit according to a preset storage sequence so as to store the exposure pattern data to the first storage unit. When the required data is read from the first storage unit, the data needing to be repeated is selected by controlling the read address, after one section of data is read and before the next section of data is read, the address pointer of the read data is positioned to the data needing to be repeated, such as r1 in the second section of data or r2 in the third section of data, the data without a seam is lossless, the upper computer does not need to retransmit again, the transmission bandwidth of the data is saved, the exposure speed is improved, the transmission time is saved, and therefore the capacity of the exposure machine is improved.
According to the method for processing the exposure graphic data, the first storage unit is added to store the exposure graphic data sent by the upper computer, the issued data are guaranteed not to be lost, and when the data are processed, the address pointer of the read data is positioned to the address of the repeated data for the repeated data needed by exposure, so that the repeated data can be directly read from the first storage unit without being sent again by the upper computer, the transmission time is saved, the transmission bandwidth of the data is also saved, and the capacity of a production line board is improved.
In the embodiment of the present invention, the exposure pattern data includes any one of filled binarized data, gradation data, vector data, or the exposure pattern data is other data type used.
Taking vector data as an example, after receiving exposure graphic data such as vector data, the exposure machine sends the data to the exposure control unit in the form of a vector coordinate file, the exposure control unit restores the received vector coordinate file into binary image data, and stores the binary image data to the first storage unit according to a preset storage sequence, wherein the writing address of the first storage unit is increased progressively according to the preset storage sequence, so that the operation efficiency of the storage unit can be improved to the maximum. FIG. 4 is a diagram illustrating a data store according to an embodiment of the invention. Because the exposure control unit has limited resources, the issued vector coordinate file exists in the form of a frame, if the frame size is 1024 × 256, the size of the filled binary image is 1024 (high) × 256 (wide), for example, the one-time exposure width is 2048 × 16 pixels, and meanwhile, the height of each segment is defined as 10240 pixels. Further, when exposure control is performed, exposure pattern data without damage to the joint can be realized by reading from the first storage unit by the repetitive operation of controlling the read/write address in the manner shown in fig. 3.
In some embodiments, the exposure control unit further comprises a second storage unit, the method further comprising: and processing the exposure pattern data, and storing the processed exposure pattern data in a second storage unit. The second storage unit is used for storing various exposure data after conversion and expansion.
For example, by controlling the read address of the first storage unit, any reading, combination or transformation of the stored data can be realized, for example, the data is subjected to rotation transformation processing, the processed exposure pattern data is stored in the second storage unit, and when exposure is needed, the relevant data can be read from the second storage unit.
In summary, according to the method for processing exposure pattern data in the embodiment of the present invention, the first storage unit and the second storage unit are set based on the exposure control unit, the exposure pattern data is stored by the first storage unit, it is ensured that the issued data is not lost, and when the data is processed, the repeated data required for exposure can be directly read from the first storage unit without being sent again, which not only saves the transmission time, but also saves the transmission bandwidth of the data, thereby improving the production capacity of the circuit board.
An exposure control unit according to an embodiment of the second aspect of the present invention is described below with reference to the drawings.
Fig. 5 is a block diagram of an exposure control unit according to an embodiment of the present invention, and as shown in fig. 5, the exposure control unit 10 of an embodiment of the present invention includes a first memory unit 110, a second memory unit 120, and a core control chip 130.
The first storage unit 110 is used for storing exposure pattern data; the second storage unit 120 is used for storing the processed exposure pattern data; the core control chip 130 is communicatively connected to the first storage unit 110 and the second storage unit 120, respectively, for executing the method for processing exposure pattern data mentioned in the above embodiments, wherein the description of the method for processing exposure pattern data executed by the core control chip 130 is referred to above.
According to the exposure control unit 10 of the embodiment of the invention, the first storage unit 110 is added to store the exposure data to ensure that the graphic data is not lost, and during data processing, the data required by exposure can be directly read from the first storage unit by repositioning the read address without sending again, so that the transmission time and the transmission bandwidth are saved, and the productivity of the circuit board is improved.
In some embodiments, the first memory unit 110 may include one of the memory banks of DDR2, DDR3, DDR 4. The selectivity is more, and is convenient for install in the exposure machine.
In some embodiments, core control chip 130 includes a field programmable gate array. Because the resources of the field programmable gate array are limited, the issued vector coordinate file exists in a frame form, and the normal communication between the field programmable gate array and the storage unit is ensured.
A direct write type exposure machine according to an embodiment of the third aspect of the present invention is described below with reference to the drawings.
Fig. 6 is a block diagram of a direct write exposure machine according to an embodiment of the present invention, and as shown in fig. 6, a direct write exposure machine 20 according to an embodiment of the present invention includes an exposure system 210, a digital micro-mirror device 220, and an exposure control unit 10 of any one of the above-mentioned embodiments, and the exposure control unit 10 is configured to control the exposure system 210 and the digital micro-mirror device 220, respectively, according to exposure pattern data.
According to the direct-writing exposure machine 20 of the embodiment of the invention, the exposure graphic data sent by the upper computer is stored by adopting the exposure control unit 10 of the embodiment, so that the graphic data can be ensured not to be lost, the repeated data required by exposure does not need to be retransmitted again, the transmission bandwidth and the transmission time of the data are saved, the exposure efficiency is improved, and the improvement of the productivity of the circuit board is facilitated.
In the description herein, references to the description of the term "one embodiment," "some embodiments," "an illustrative embodiment," "an example," "a specific example," or "some examples" or the like mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, the schematic representations of the terms used above do not necessarily refer to the same embodiment or example.
While embodiments of the invention have been shown and described, it will be understood by those of ordinary skill in the art that: various changes, modifications, substitutions and alterations can be made to the embodiments without departing from the principles and spirit of the invention, the scope of which is defined by the claims and their equivalents.
Claims (9)
1. A method of processing exposure pattern data for a direct write type exposure machine, the direct write type exposure machine comprising an exposure control unit including a first storage unit for storing exposure pattern data sent from an upper computer, the method comprising:
a relocation step of positioning the address pointer of the read data to the address of the repeated data required by the next section of data in response to the completion of the reading of the section of data;
reading the required repeated data and the next segment of data from the first storage unit according to the address of the repeated data required by the next segment of data and the address of the next segment of data;
repeating the repositioning step and the reading step until each piece of data of the exposure pattern data is obtained.
2. The method of processing exposure pattern data according to claim 1, wherein the exposure pattern data includes any one of filled binarized data, gradation data, and vector data.
3. The method of processing exposure pattern data according to claim 1, wherein the exposure control unit further includes a second storage unit, the method further comprising:
and processing the exposure pattern data, and storing the processed exposure pattern data to the second storage unit.
4. The method of processing exposure pattern data according to claim 1, further comprising:
receiving the exposure graph data sent by the upper computer;
and controlling the write address of the first storage unit according to a preset storage sequence so as to store the exposure pattern data to the first storage unit.
5. The method for processing exposure pattern data according to claim 1, wherein when the exposure pattern data is vector data, the controlling the write address of the first storage unit according to a preset storage sequence to store the exposure pattern data in the first storage unit comprises:
restoring the received vector coordinate file into binary image data;
and storing the binary image data to the first storage unit according to a preset storage sequence, wherein the writing addresses of the first storage unit are increased progressively according to the preset storage sequence.
6. An exposure control unit characterized by comprising:
a first storage unit for storing exposure pattern data;
a second storage unit for storing the processed exposure pattern data;
a core control chip, communicatively connected to the first storage unit and the second storage unit, respectively, for executing the method of processing exposure pattern data according to any one of claims 1 to 5.
7. The exposure control unit of claim 6, wherein the first memory unit comprises one of memory banks of DDR2, DDR3, DDR 4.
8. The exposure control unit of claim 6, wherein the core control chip comprises a field programmable gate array.
9. A direct write exposure machine comprising an exposure system, a digital micromirror device, and an exposure control unit according to any one of claims 6 to 8 for controlling the exposure system and the digital micromirror device, respectively, according to exposure pattern data.
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| CN111880379A (en) * | 2020-07-03 | 2020-11-03 | 合肥芯碁微电子装备股份有限公司 | Processing method and device for exposure graph of exposure machine and exposure machine |
| CN112328513A (en) * | 2020-10-14 | 2021-02-05 | 合肥芯碁微电子装备股份有限公司 | Scanning type exposure system and data caching and scheduling method and device thereof |
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