CN111628045A - Feeding and discharging method for PECVD surface coating based on coating detection - Google Patents
Feeding and discharging method for PECVD surface coating based on coating detection Download PDFInfo
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- CN111628045A CN111628045A CN202010467764.7A CN202010467764A CN111628045A CN 111628045 A CN111628045 A CN 111628045A CN 202010467764 A CN202010467764 A CN 202010467764A CN 111628045 A CN111628045 A CN 111628045A
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- 238000000576 coating method Methods 0.000 title claims abstract description 120
- 239000011248 coating agent Substances 0.000 title claims abstract description 117
- 238000001514 detection method Methods 0.000 title claims abstract description 92
- 238000000034 method Methods 0.000 title claims abstract description 59
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 title claims abstract description 33
- 238000007599 discharging Methods 0.000 title abstract description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 172
- 229910002804 graphite Inorganic materials 0.000 claims abstract description 172
- 239000010439 graphite Substances 0.000 claims abstract description 172
- 230000007246 mechanism Effects 0.000 claims abstract description 59
- 235000012431 wafers Nutrition 0.000 claims abstract description 49
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 33
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 33
- 239000010703 silicon Substances 0.000 claims abstract description 33
- 230000008569 process Effects 0.000 claims abstract description 28
- 238000003860 storage Methods 0.000 claims abstract description 7
- 239000000523 sample Substances 0.000 claims description 29
- 239000007888 film coating Substances 0.000 claims description 12
- 238000009501 film coating Methods 0.000 claims description 12
- 238000007747 plating Methods 0.000 claims description 11
- 238000000746 purification Methods 0.000 claims description 11
- 238000001816 cooling Methods 0.000 claims description 10
- 239000005002 finish coating Substances 0.000 abstract 1
- 230000003028 elevating effect Effects 0.000 description 5
- 238000005520 cutting process Methods 0.000 description 4
- 238000009434 installation Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 230000001965 increasing effect Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 1
- 230000002079 cooperative effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
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- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1804—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic Table
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
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Abstract
The invention discloses a loading and unloading method for PECVD surface coating based on coating detection, which comprises the steps of positioning a graphite boat, caching a frame on the graphite boat, detecting coating before boat entering, detecting coating before the graphite boat enters a reaction chamber, discharging the graphite boat from the reaction chamber, detecting coating before taking a wafer, returning the graphite boat to a wafer inserting and taking machine and the like. The invention arranges a device for detecting whether a graphite boat is coated or not on a buffer storage frame, adds two steps of coating detection steps, wherein the first step is that a mechanical arm directly grabs the graphite boat without coating on the buffer storage frame according to a detection result and puts the graphite boat into a boat pushing mechanism, and then the graphite boat is sent into a reaction chamber by the boat pushing mechanism for coating, so that secondary coating in the reaction chamber can be avoided, the second step is that the mechanical arm grabs the graphite boat with coating on the buffer storage frame according to the detection result and puts the graphite boat on a conveying mechanism, and the graphite boat is sent into a sheet inserting and taking machine by the conveying mechanism for taking a sheet, so that the silicon wafers without coating flow into the next process, each boat silicon wafer is ensured to finish coating, and no repeated.
Description
Technical Field
The invention relates to a PECVD surface coating process, in particular to a feeding and discharging method of PECVD surface coating based on coating detection.
Background
The PECVD (Plasma Enhanced Chemical Vapor Deposition, PECVD equipment comprises three parts, namely a gas source cabinet, a furnace body cabinet and a purifying table, a reaction chamber is positioned in the furnace body cabinet, a boat pushing mechanism, a buffer storage rack and a mechanical arm are positioned in the purifying table, and a conveying mechanism is communicated with the purifying table and a piece inserting and taking machine) is a Plasma Enhanced Chemical Vapor Deposition method. In the PECVD surface coating process, the graphite boat is a carrier of a solar cell, the silicon wafer is processed into the solar cell after a plurality of processes, and the surface coating is one of the core processes of the solar cell processing. The graphite boat is a carrier of the solar cell in the surface coating process, and the cell is inserted into the graphite boat after the flower basket in the previous process flows through the sheet inserting machine. The graphite boat is moved to the lower part of the purification table through the boat moving mechanism, then the graphite boat is grabbed by the mechanical arm and placed on the cache frame, when the reaction chamber has a vacancy, the mechanical arm grabs the graphite boat and places the graphite boat into the boat pushing mechanism, and then the graphite boat is sent into the reaction chamber by the boat pushing mechanism to be coated. After the film coating is finished, the boat pushing mechanism is taken out, then the boat is grabbed by the mechanical arm and placed to the cache for cooling, the graphite boat is grabbed by the mechanical arm after the cooling is finished and placed below the purifying table, the graphite boat is moved to the sheet inserting machine through the boat moving mechanism, and the inserted flower basket is conveyed to the next procedure. Because the cache frame not only stores the boat without coating film, but also has the boat which has finished coating film, the graphite boat silicon wafer without coating film is sent to the next procedure, and the graphite boat with coating film is sent to the reaction chamber again for coating film, which causes the confusion of the production process of the battery piece, and the efficiency of the battery piece without coating film and with repeated coating film is reduced.
At present, whether a battery piece in a graphite boat is coated or not is not detected, and a detection module is added on a sheet inserting machine in the prior art, and detection is carried out after the battery piece flows out from a flower basket, such as a camera and a light source, and fragments, hidden cracks and color differences of the battery piece are detected by photographing. In the prior art, X-rays are added on a conveying line for conveying the battery pieces in the piece inserting machine to detect the thickness and uniformity of the plated film. However, in both the two modes, the detection of the single wafer in the wafer inserting machine is carried out, so that the detection of whether the single wafer is broken or not and is hidden and cracked before entering the graphite boat and the detection of whether the thickness and the uniformity of the film coating before entering the flower basket in the next process after the film coating meet the requirements or not can be carried out, but the detection of whether the film coating of the silicon wafer in the graphite boat is carried out is not carried out. Therefore, the phenomenon that the whole boat is repeatedly coated or the whole boat is not coated is easy to occur, and the whole production efficiency and the quality of the battery piece are influenced.
Disclosure of Invention
The invention aims to overcome the defects of the prior art and provides a PECVD surface coating loading and unloading method based on coating detection, which can avoid secondary coating in a reaction chamber and avoid the situation that a silicon wafer without coating flows into the next process.
In order to solve the technical problems, the invention adopts the following technical scheme:
a loading and unloading method for PECVD surface coating based on coating detection comprises the following steps:
s1, positioning the graphite boat: the graphite boat inserted with the sheets by the sheet inserting and taking machine is moved to the position below a PECVD purification table through a conveying mechanism;
s2, caching rack on graphite boat: the manipulator grabs the graphite boat and puts the graphite boat on a cache frame of the purification table for waiting;
s3, coating detection before boat entering: detecting whether the silicon wafers in the graphite boats on the cache frame are coated with films or not, if no film is coated, feeding back to the manipulator, and when the reaction chamber has a vacant site, grabbing the graphite boat without the film on the cache frame by the manipulator and placing the graphite boat onto a boat pushing mechanism;
s4, carrying the graphite boat into a reaction chamber: the graphite boat is sent into a reaction chamber by a boat pushing mechanism to carry out a film coating process;
s5, taking the graphite boat out of the reaction chamber: after the process is finished, the boat pushing mechanism enters the reaction chamber to take out the graphite boat, and the mechanical arm picks the graphite boat after the process and puts the graphite boat on the cache frame for cooling;
s6, coating film detection before taking the film: after cooling, detecting whether the silicon wafers in the graphite boats on the cache frame are coated with films, if so, feeding back to the manipulator, and grabbing the graphite boats coated with films on the cache frame by the manipulator and placing the graphite boats on the lower part of the purification table;
s7, returning the graphite boat to insert the piece taking machine: the conveying mechanism conveys the graphite boat back to the inserting and taking machine for taking the graphite boat, and the graphite boat enters the next procedure.
As a further improvement of the above technical solution:
in the step S3, after the detection of the coating, timing each graphite boat without coating, and feeding back to the manipulator, when the reaction chamber has a vacancy, the manipulator picks the graphite boat without coating which is ended first in timing and places the graphite boat on the boat pushing mechanism; in step S6, after the detection of the plating, each graphite boat with the plating is timed and fed back to the manipulator, and the manipulator picks the graphite boat with the plating that is timed first and places the graphite boat on the conveying mechanism.
In the steps S3 and S6, the plating detection method includes: and the detection probe extends into the space between two adjacent boat sheets in the graphite boat on the cache frame to detect the color of the silicon wafer on the boat sheet, if the color is gray, no film is coated, and if not, the film is coated.
Every cache position correspondence of buffer memory frame is equipped with coating film detection device, coating film detection device including the lift drive with test probe, the lift drive is fixed in cache position department, test probe locates lift drive's drive end to in inserting the graphite boat under lift drive's drive.
The lifting drive is a lifting cylinder, and the detection probe is fixed on a piston rod of the lifting cylinder through a probe bracket.
The coating detection device also comprises a light source, and the light source is arranged at the end of the probe bracket where the detection probe is installed.
The coating detection device is arranged at one end of the buffer position and is positioned below the graphite boat on the buffer position, and during detection, the lifting drive drives the detection probe to ascend and insert into the graphite boat.
The boat pushing mechanism is characterized in that an auxiliary support is arranged on the boat pushing mechanism and comprises a supporting seat and a supporting rod, the supporting seat is fixed below a horizontal moving module of the boat pushing mechanism, the supporting rod is installed on the supporting seat, and one suspended end of a boat pushing paddle of the boat pushing mechanism can be put on the supporting rod.
The reactor is internally provided with a furnace lifting support for supporting the pushing paddle, the furnace lifting support comprises a support cylinder and a support piece arranged at the drive end of the support cylinder, and the pushing paddle can be put on the support piece.
The auxiliary support further comprises a lifting module used for driving the supporting rod to lift, the lifting module is installed on the supporting seat, and the supporting rod is connected with the lifting module.
Compared with the prior art, the invention has the advantages that:
(1) the invention relates to a loading and unloading method for PECVD surface coating based on coating detection, which is characterized in that a device for detecting whether a graphite boat on a cache frame is coated or not is arranged on the cache frame, two coating detection steps are added, wherein one step is before boat feeding, a mechanical arm directly grabs the graphite boat without the coating on the cache frame according to a detection result and puts the graphite boat into a boat pushing mechanism, then the boat pushing mechanism sends the graphite boat into a reaction chamber for coating, secondary coating in the reaction chamber is avoided, and the other step is before taking a wafer, the mechanical arm grabs the graphite boat with the coating on the cache frame according to the detection result and puts the graphite boat on a conveying mechanism, the graphite boat is sent into a sheet inserting and taking machine by the conveying mechanism for taking the wafer, so that the silicon wafers without coating are prevented from flowing into the next process, coating of each boat silicon wafer is ensured to be finished, no repeated coating is generated, the, the quality of the battery piece is improved.
(2) According to the loading and unloading method for PECVD surface coating based on coating detection, under the condition that the inner diameter of a reaction chamber is not increased, cantilever beam type stress of a high-capacity graphite boat is changed into a simply supported beam type stress by adding an auxiliary support, deflection of the graphite boat in the carrying process is greatly reduced, safety and no touch in the boat feeding and taking process are realized, the newly added auxiliary support solves the deflection problem, the height of equipment can be well controlled, and the height of the equipment needs to be controlled, so that if the problem is solved by increasing the diameter of the reaction chamber, the height direction is increased by several times.
(3) According to the loading and unloading method for PECVD surface coating based on coating detection, provided by the invention, through additionally arranging the auxiliary support outside the furnace and the lifting support in the furnace, the boat pushing paddle is of a simply supported beam structure instead of a cantilever structure no matter the boat pushing paddle is in the furnace or outside the furnace, so that the deflection is greatly reduced, the probability of touching the inner wall of the reaction chamber after the boat pushing paddle enters the reaction chamber is reduced, the deflection of the boat pushing paddle in the graphite boat carrying process is reduced, and the safety and no touch in the boat feeding and taking processes are realized.
Drawings
FIG. 1 is a process diagram of a PECVD surface coating loading and unloading method based on coating detection.
FIG. 2 is a flow chart of a PECVD surface coating loading and unloading method based on coating detection.
FIG. 3 is a schematic view showing a state before the boat pushing mechanism of the present invention enters the reaction chamber.
Fig. 4 is a schematic view of a cache shelf according to the present invention.
FIG. 5 is a schematic structural diagram (I) of the coating detection device of the present invention.
FIG. 6 is a schematic structural diagram of a coating detection apparatus according to the present invention (II).
Fig. 7 is a schematic perspective view of a buffer rack according to the present invention.
FIG. 8 is a schematic view of the boat pushing mechanism according to the present invention.
Fig. 9 is a schematic structural view (one) of the auxiliary support of the present invention.
Fig. 10 is a schematic structural view (ii) of the auxiliary support of the present invention.
FIG. 11 is a schematic view of the internal structure of a reaction chamber in the present invention.
FIG. 12 is a schematic view showing a graphite boat of the present invention in a state where the support rod is supported by the pusher paddle.
FIG. 13 is a schematic view showing the state in which the graphite boat is loaded into the reaction chamber, the elevating support is in a supporting state, and the support rod is not in a supporting state.
FIG. 14 is a schematic view showing a state where the graphite boat is completely introduced into the reaction chamber in the present invention.
FIG. 15 is a schematic view showing the graphite boat in the state of falling on the electrode rod and the boat pushing paddle starting to exit.
FIG. 16 is a schematic view showing a state where the pusher paddle is completely withdrawn from the quartz tube in the present invention.
FIG. 17 is a schematic view showing a state where the boat pushing paddle enters the reaction chamber to take a boat.
FIG. 18 is a schematic view showing a state where the boat is completely withdrawn from the reaction chamber after the boat is pushed and taken by the boat pusher in the present invention.
The reference numerals in the figures denote:
1. a graphite boat; 11. boat sheets; 2. a cache shelf; 21. a cache bit; 3. a reaction chamber; 31. an electrode rod; 4. a boat pushing mechanism; 41. a horizontal moving module; 42. pushing a boat oar; 43. a linear slider; 44. a boat pushing seat; 5. a coating film detection device; 51. lifting and driving; 52. detecting a probe; 53. a probe holder; 54. a light source; 7. auxiliary supporting; 71. a supporting seat; 72. a support bar; 73. a lifting module; 74. a guide mounting plate; 75. a guide slider; 76. mounting a rod; 77. a C-shaped cutting sleeve; 78. a clamping portion; 79. locking the bolt; 8. lifting and supporting in the furnace; 81. a support cylinder; 82. a top support.
Detailed Description
The invention is described in further detail below with reference to the figures and specific examples of the specification.
As shown in fig. 1 and fig. 2, the loading and unloading method for PECVD surface coating based on coating detection in this embodiment includes the following steps:
s1, positioning the graphite boat: the graphite boat 1 inserted with the wafers by the wafer inserting and taking machine moves to the position below a purification table of the PECVD through a conveying mechanism, wherein in the step, the silicon wafers are conveyed by a basket in the previous process, and the wafer inserting and taking machine inserts the silicon wafers into the graphite boat 1;
s2, caching rack on graphite boat: the mechanical arm grabs the graphite boat 1 and puts the graphite boat on the cache frame 2 of the purification platform for waiting;
s3, coating detection before boat entering: detecting whether the silicon wafers in the graphite boats 1 on the cache frame 2 are coated or not, if no coating exists, feeding back to the manipulator, and when the reaction chamber 3 has a vacancy, the manipulator grabs the graphite boat 1 without the coating on the cache frame 2 and puts the graphite boat on the boat pushing mechanism 4;
s4, carrying the graphite boat into a reaction chamber: the boat pushing mechanism 4 sends the graphite boat 1 into the reaction chamber 3 for coating;
s5, taking the graphite boat out of the reaction chamber: after the process is finished, the boat pushing mechanism 4 enters the reaction chamber 3 to take out the graphite boat 1, and the mechanical arm picks the graphite boat 1 after the process and puts the graphite boat 1 on the cache frame 2 for cooling;
s6, coating film detection before taking the film: after cooling, detecting whether the silicon wafers in the graphite boats 1 on the cache frame 2 are coated, if so, feeding back to the manipulator, and grabbing the graphite boats 1 coated with the films on the cache frame 2 by the manipulator and placing the graphite boats 1 on the lower part of the purification table;
s6, coating film detection before taking the film: after cooling, detecting whether the silicon wafers in the graphite boats 1 on the cache frame 2 are coated, if so, feeding back to the manipulator, and grabbing the graphite boats 1 coated with the films on the cache frame 2 by the manipulator and placing the graphite boats 1 on the lower part of the purification table;
s7, returning the graphite boat to insert the piece taking machine: the conveying mechanism sends the graphite boat 1 back to the inserting and taking machine for taking the graphite boat, and the graphite boat enters the next procedure, and the inserting and taking machine takes the silicon wafers on the graphite boat 1 out and places the silicon wafers in the flower basket of the next procedure.
The loading and unloading method for tubular PECVD surface coating based on coating detection is characterized in that a device for detecting whether a graphite boat 1 on a cache frame 2 is coated or not is arranged on the cache frame 2, two coating detection steps are added, one is before the boat is advanced, the mechanical arm directly grabs the graphite boat 1 without coating on the buffer storage frame 2 according to the detection result and puts the graphite boat on the boat pushing mechanism 4, then the graphite boat 1 is sent into the reaction chamber 3 by the boat pushing mechanism 4 for coating, so as to avoid the occurrence of secondary coating in the reaction chamber 3, before taking the wafer, the mechanical arm grabs the graphite boat 1 with the film coating on the cache frame 2 according to the detection result and places the graphite boat on the conveying mechanism, the graphite boat is conveyed to the film inserting and taking machine by the conveying mechanism to take the wafer, the silicon wafer without the film coating is prevented from flowing into the next working procedure, therefore, each boat of silicon wafers is ensured to finish film coating, no repeated film coating is carried out, the smoothness of the production flow is ensured, and the efficiency of the silicon wafers (battery pieces) is more stable, so that the quality of the battery pieces is improved.
In this embodiment, in step S3, after the detection of the coating, each graphite boat 1 without the coating is timed and fed back to the manipulator, and when the reaction chamber 3 has a vacancy, the manipulator picks the graphite boat 1 without the coating which is timed first and puts it on the boat pushing mechanism (4); similarly, in step S6, after the detection of the plating film, each coated graphite boat 1 is timed and fed back to the robot, and the robot picks the coated graphite boat 1 that has been timed first and places it on the conveying mechanism. That is, whether the graphite boat 1 carrying the uncoated silicon wafers from the previous process or the graphite boat 1 carrying the coated silicon wafers is placed on the buffer frame 2 or not is detected whether the coating is carried out or not, and the time is recorded (timed). When the reaction chamber 3 needs to enter the graphite boat 1 and has a vacancy, the mechanical arm takes the graphite boat 1 which is firstly put into the buffer frame 2 (firstly put after timing is finished and then put after timing is finished). When the conveying mechanism has a vacancy, the manipulator takes the graphite boat 1 which is firstly placed on the buffer storage frame 2 for cooling and then is placed into the conveying mechanism. Thus, the first-in first-out of the graphite boat 1 is met, and the influence on the efficiency of the battery piece caused by overlong waiting time of some graphite boats is avoided.
As shown in fig. 3 to 6, in this embodiment, in step S3, the plating detection method includes: the detection probe 52 extends into the space between two adjacent boat sheets 11 in the graphite boat 1 on the buffer frame 2, detects the color of the silicon wafer on the boat sheet 11, if the color is gray, the silicon wafer is not coated, and can be sent into the reaction chamber 3, otherwise, the silicon wafer is coated, and the manipulator does not grab the silicon wafer (grab before taking the wafer in step S6).
Similarly, in step S6, the plating detection method includes: the detection probe 52 extends into the space between two adjacent boat sheets 11 in the graphite boat 1 on the buffer frame 2, detects the color of the silicon wafer on the boat sheet 11, if the color is gray, the film is not coated, the manipulator does not grab the wafer (the wafer is grabbed before the boat is moved in step S3), otherwise, the wafer is coated, and the manipulator grabs the graphite boat 1 with the film coated and places the graphite boat on the conveying mechanism.
Wherein, every buffer position 21 of buffer frame 2 corresponds and is equipped with coating film detection device 5, and coating film detection device 5 includes lift drive 51 and test probe 52, and lift drive 51 is fixed in buffer position 21 department, and test probe 52 locates lift drive 51's drive end to insert in graphite boat 1 under lift drive 51's drive. The elevation drive 51 is preferably an elevation cylinder, and the detection probe 52 is fixed to a piston rod of the elevation cylinder through a probe holder 53. The coating detection device 5 further comprises two light sources 54, wherein the two light sources 54 are arranged, and the light sources 54 are arranged at the end of the probe bracket 53, which is provided with the detection probe 52. The detecting probe 52 is preferably a micro sensor, because the distance between two adjacent boat sheets 11 is only 10mm, a thin sensor is required; the light source 54 is preferably a diode light, and is required to be small, mainly for improving the effect of the sensor.
For convenience of installation, in the present embodiment, the plating film detection device 5 is provided at one end (outside) of the buffer position 21 and is located below the graphite boat 1 on the buffer position 21. During detection, the lifting drive 51 drives the detection probe 52 to lift and insert into the graphite boat 1. This arrangement does not affect the structure of the cache shelf 2 at all. It should be noted that, in other embodiments, the coating film detection device 5 may be disposed above the buffer location 21, close to the outer end of the graphite boat, and horizontally inserted into the graphite boat 1 from the outer end of the graphite boat 1, and this structure needs a transverse bracket to fix the coating film detection device 5 on the side frame of the buffer frame 2. Of course, the detection probe 52 may be provided above the graphite boat 1 and inserted from above the graphite boat 1.
As shown in fig. 7 to 10, in the present embodiment, the boat pushing mechanism 4 is provided with an auxiliary support 7, the auxiliary support 7 includes a support base 71 and a support rod 72, the support base 71 is fixed below the horizontal moving module 41 of the boat pushing mechanism 4, the support rod 72 is installed on the support base 71, and a suspended end of the boat pushing paddle 42 of the boat pushing mechanism 4 can be lapped on the support rod 72.
The graphite boat 1 is loaded on the boat pushing paddle 42, the front end of the boat pushing paddle 42 is abutted against the supporting rod 72, the boat pushing paddle 42 is not in a cantilever structure any more, but in a simply supported beam type with two ends supported, the linear sliding block 43 of the horizontal moving module 41 drives the boat pushing paddle 42 to advance, the graphite boat 1 is conveyed into the reaction chamber 3, the deflection is greatly reduced due to the fact that the auxiliary support 7 is arranged before the graphite boat enters the reaction chamber 3, the probability of touching the inner wall of the reaction chamber 3 (a quartz tube) is reduced after the boat pushing paddle 42 enters the reaction chamber 3, the deflection of the boat pushing paddle 42 in the conveying process of the graphite boat 1 is reduced, and safety and no touch in the boat feeding and taking processes are achieved. The boat pushing mechanism 4 further comprises a boat pushing seat 44, one end of the boat pushing paddle 42 is fixed on the boat pushing seat 44, the other end of the boat pushing paddle is abutted against the supporting rod 72, and the boat pushing seat 44 is connected with the linear sliding block 43.
The support rod 72 is a circular rod, which reduces the contact area with the boat pushing paddle 42 and the friction coefficient, thereby reducing the resistance of the boat pushing paddle 42 from the auxiliary support 7, and meanwhile, the circular rod is favorable for reducing the collision between the boat pushing paddle 42 and the support rod 72, so that the boat pushing paddle can be in contact with the support rod more gently.
As shown in fig. 11, in the present embodiment, a furnace lifting support 8 for supporting the boat pushing paddle 42 is disposed in the reaction chamber 3, the furnace lifting support 8 includes a support cylinder 81 and a supporting member 82 disposed at a driving end of the support cylinder 81, and the boat pushing paddle 42 can be lapped on the supporting member 82.
The furnace elevating support 8 is provided between two electrode rods 31 in the reaction chamber 3. The auxiliary support 7 is used outside the furnace for supporting the pushing paddle 42 before entering the reaction chamber 3, and the pushing paddle group 42 is supported by the top support 82 of the lifting support 8 in the furnace after entering the reaction chamber 3. The top support is preferably a top support round bar.
The working principle of the lifting support 8 in the furnace is as follows: when the pushing paddle 42 starts to enter the reaction chamber 3 and is supported on the top support round bar, the supporting cylinder 81 does not act at this time, after the pushing paddle 42 completely enters the reaction chamber 3, the pushing paddle 42 starts to descend, the supporting cylinder 81 also descends, in the descending process, the graphite boat 1 falls on the two electrode bars 31, and then the pushing paddle 42 withdraws from the reaction chamber 3. The arrangement of the lifting support 8 in the furnace ensures that the pushing paddle 42 enters the reaction chamber 3 and is also in a simple beam structure instead of a cantilever structure, thereby greatly reducing the deflection of the pushing paddle 42 and avoiding the contact between the pushing paddle 42 and the inner wall of the reaction chamber 3.
In this embodiment, two sets of in-furnace elevating supports 8 are provided, and arranged in the reaction chamber 3 in tandem. The auxiliary support 7 further comprises a lifting module 73 for driving the support rod 72 to lift, the lifting module 73 is installed on the support base 71, and the support rod 72 is connected with the lifting module 73.
Wherein, be equipped with direction mounting panel 74 and two sets of guide structure on the supporting seat 71, guide structure includes direction slider 75 and installation pole 76, and the installation pole 76 both ends are fixed on supporting seat 71, and the mobilizable dress that wears to locate of direction slider 75 is on installation pole 76, and direction mounting panel 74 is fixed on two direction sliders 75, and bracing piece 72 is fixed on direction mounting panel 74. The guide mounting plate 74 is provided with a C-shaped cutting sleeve 77, two ends of the C-shaped cutting sleeve 77 are provided with clamping portions 78, the support rod 72 is sleeved in the C-shaped cutting sleeve 77, and the clamping portions 78 at the two ends are provided with locking bolts 79 in a penetrating mode. The lifting module 73 is preferably a pneumatic cylinder, the piston rod of which is connected to the guide mounting plate 74. In other embodiments, the lifting module 73 may be a belt drive, a ball screw, an electric cylinder, or the like.
The cooperative action of the auxiliary support 7 and the furnace lifting support 8 is as follows:
the auxiliary support 7 functions to support the pusher paddle 42 before the pusher paddle 42 enters the reaction chamber 3. When the paddle 42 enters the reaction chamber 3 and starts to be lapped on the supporting member 82, the supporting rod 72 of the auxiliary support 7 outside the reaction chamber 3 needs to descend and leave the paddle 42, and at this time, the front end and the rear end of the paddle 42 form a simple beam structure instead of a cantilever structure, so that the supporting rod 72 is withdrawn (descended), firstly, the supporting rod 72 does not collide with the supporting rod 72 when the paddle 42 is conveyed into the boat chamber and retreats (the paddle seat 44 is lower than the paddle 42, so the paddle seat 44 needs to cross the supporting rod 72, and the supporting rod 72 needs to move downwards), secondly, the front end of the paddle 42 is ensured to be supported on the supporting member 82, and thirdly, the redundant friction generated in the moving process of the paddle 42 can be reduced.
The boat pushing mechanism 4 for PECVD surface coating based on coating detection has a boat in and out process (the process that the graphite boat 1 enters and exits the reaction chamber 3):
1) as shown in fig. 12, the graphite boat 1 loaded with the silicon wafer to be coated is placed on the boat pushing paddle 42 by the robot arm, and the support rod 72 outside the furnace is in a support state;
2) as shown in fig. 13, the graphite boat 1 is fed into the reaction chamber 3 by the boat pushing paddle 42, the furnace elevating support 8 is in a supporting state by force, and the support rod 72 outside the furnace descends and withdraws from the support;
3) as shown in fig. 14, the boat pushing paddle 42 and the boat pushing seat 44 go over the support rod 72, and the graphite boat 1 is completely placed in the reaction chamber 3;
4) as shown in fig. 15 and 16, the pusher paddle 42 descends, the support cylinder 81 descends, the in-furnace elevating support 8 is in a non-support state, the graphite boat 1 falls onto the electrode rod 31 in a soft landing state, and the pusher paddle 42 exits from the reaction chamber 3;
5) as shown in fig. 17, after the furnace door is opened, the boat pushing paddle 42 enters the reaction chamber 3, and rises to lift the graphite boat 1, the graphite boat 1 leaves the electrode rod 31 and is located on the boat pushing paddle 42, the supporting cylinder 81 also rises to continue to play a supporting role, and the boat pushing paddle 42 is lapped on the top supporting piece 82 to start to exit the reaction chamber 3;
6) as shown in fig. 18, the graphite boat 1 is moved out of the reaction chamber 3 by the paddle 42, the support rod 72 outside the furnace is lifted to restore the support before the paddle 42 is separated from the support member 82, and the graphite boat 1 is returned to the step 1 after the robot gripping process.
Although the present invention has been described with reference to the preferred embodiments, it is not intended to be limited thereto. Those skilled in the art can make numerous possible variations and modifications to the present invention, or modify equivalent embodiments to equivalent variations, without departing from the scope of the invention, using the teachings disclosed above. Therefore, any simple modification, equivalent change and modification made to the above embodiments according to the technical spirit of the present invention should fall within the protection scope of the technical scheme of the present invention, unless the technical spirit of the present invention departs from the content of the technical scheme of the present invention.
Claims (10)
1. A loading and unloading method for PECVD surface coating based on coating detection is characterized by comprising the following steps:
s1, positioning the graphite boat: the graphite boat (1) inserted with the sheets by the sheet inserting and taking machine moves to the lower part of a PECVD purification platform through a conveying mechanism;
s2, caching rack on graphite boat: the mechanical arm grabs the graphite boat (1) and puts the graphite boat on a cache frame (2) of the purification table for waiting;
s3, coating detection before boat entering: detecting whether the silicon wafers in the graphite boats (1) on the cache frame (2) are coated or not, if no coating exists, feeding back to the manipulator, and when the reaction chamber (3) has a vacancy, grabbing the graphite boats (1) without the coating on the cache frame (2) by the manipulator and putting the graphite boats on the boat pushing mechanism (4);
s4, carrying the graphite boat into a reaction chamber: the boat pushing mechanism (4) sends the graphite boat (1) into the reaction chamber (3) for coating;
s5, taking the graphite boat out of the reaction chamber: after the process is finished, the boat pushing mechanism (4) enters the reaction chamber (3) to take out the graphite boat (1), and the mechanical arm picks the graphite boat (1) after the process and puts the graphite boat on the buffer storage rack (2) for cooling;
s6, coating film detection before taking the film: after cooling, detecting whether the silicon wafers in the graphite boats (1) on the cache frame (2) are coated with films, if so, feeding back to the manipulator, and grabbing the graphite boats (1) coated with films on the cache frame (2) by the manipulator and placing the graphite boats on the conveyor mechanism below the purification table;
s7, returning the graphite boat to insert the piece taking machine: the conveying mechanism sends the graphite boat (1) back to the inserting and taking machine for taking the graphite boat, and the next procedure is carried out.
2. The loading and unloading method for PECVD surface coating based on coating detection as claimed in claim 1, characterized in that in step S3, after the coating detection, each graphite boat (1) without coating is timed and fed back to the manipulator, the reaction chamber (3) has a vacancy, and the graphite boat (1) without coating which is first finished in the manipulator grabbing timing is put on the boat pushing mechanism (4); in the step S6, after the detection of the plating film, each graphite boat (1) with the plating film is timed and fed back to the manipulator, and the manipulator picks the graphite boat (1) with the plating film that is finished first and puts the graphite boat on the conveying mechanism.
3. The loading and unloading method for PECVD surface coating based on coating detection as claimed in claim 1, wherein in the steps S3 and S6, the coating detection method comprises: the detection probe (52) extends into the space between two adjacent boat sheets (11) in the graphite boat (1) on the buffer frame (2) to detect the color of the silicon wafer on the boat sheet (11), if the color is gray, no coating film exists, otherwise, the silicon wafer is coated.
4. The loading and unloading method for PECVD surface coating based on coating detection as claimed in claim 3, wherein each buffer position (21) of the buffer rack (2) is correspondingly provided with a coating detection device (5), the coating detection device (5) comprises a lifting drive (51) and the detection probe (52), the lifting drive (51) is fixed at the buffer position (21), and the detection probe (52) is arranged at the drive end of the lifting drive (51) and is inserted into the graphite boat (1) under the drive of the lifting drive (51).
5. The loading and unloading method for PECVD surface coating based on coating detection as claimed in claim 4, wherein the lifting drive (51) is a lifting cylinder, and the detection probe (52) is fixed on a piston rod of the lifting cylinder through a probe bracket (53).
6. The method for loading and unloading PECVD surface coating films based on coating film detection as claimed in claim 4, wherein the coating film detection device (5) further comprises a light source (54), and the light source (54) is arranged at the end of the probe bracket (53) where the detection probe (52) is arranged.
7. The loading and unloading method for PECVD surface coating based on coating detection as claimed in claim 4, wherein the coating detection device (5) is arranged at one end of the buffer position (21) and is positioned below the graphite boat (1) on the buffer position (21), and during detection, the lifting drive (51) drives the detection probe (52) to ascend and insert into the graphite boat (1).
8. The loading and unloading method for PECVD surface coating film based on film coating detection as claimed in any one of claims 1-7, wherein the boat pushing mechanism (4) is provided with an auxiliary support (7), the auxiliary support (7) comprises a support base (71) and a support rod (72), the support base (71) is fixed below the horizontal moving module (41) of the boat pushing mechanism (4), the support rod (72) is installed on the support base (71), and the suspended end of the boat pushing paddle (42) of the boat pushing mechanism (4) can be lapped on the support rod (72).
9. The method for loading and unloading PECVD surface coating films based on film coating detection as claimed in claim 7, wherein a furnace lifting support (8) for supporting the boat pushing paddle (42) is arranged in the reaction chamber (3), the furnace lifting support (8) comprises a support cylinder (81) and a top support piece (82) arranged at the driving end of the support cylinder (81), and the boat pushing paddle (42) can be lapped on the top support piece (82).
10. The loading and unloading method for PECVD surface coating film based on film coating detection as claimed in claim 8, wherein the auxiliary support (7) further comprises a lifting module (73) for driving a support rod (72) to lift, the lifting module (73) is mounted on the support base (71), and the support rod (72) is connected with the lifting module (73).
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