CN111628046B - Feeding and discharging method for PECVD surface coating - Google Patents
Feeding and discharging method for PECVD surface coating Download PDFInfo
- Publication number
- CN111628046B CN111628046B CN202010467836.8A CN202010467836A CN111628046B CN 111628046 B CN111628046 B CN 111628046B CN 202010467836 A CN202010467836 A CN 202010467836A CN 111628046 B CN111628046 B CN 111628046B
- Authority
- CN
- China
- Prior art keywords
- boat
- graphite boat
- coating
- graphite
- reaction chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 87
- 239000011248 coating agent Substances 0.000 title claims abstract description 84
- 238000000034 method Methods 0.000 title claims abstract description 53
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 title claims abstract description 29
- 238000007599 discharging Methods 0.000 title abstract description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 145
- 229910002804 graphite Inorganic materials 0.000 claims abstract description 145
- 239000010439 graphite Substances 0.000 claims abstract description 145
- 230000007246 mechanism Effects 0.000 claims abstract description 75
- 238000001514 detection method Methods 0.000 claims abstract description 74
- 235000012431 wafers Nutrition 0.000 claims abstract description 47
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 40
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 40
- 239000010703 silicon Substances 0.000 claims abstract description 40
- 230000008569 process Effects 0.000 claims abstract description 29
- 239000000523 sample Substances 0.000 claims description 27
- 238000000746 purification Methods 0.000 claims description 10
- 238000001816 cooling Methods 0.000 claims description 8
- 239000007888 film coating Substances 0.000 claims description 7
- 238000009501 film coating Methods 0.000 claims description 7
- 238000007747 plating Methods 0.000 claims description 4
- 238000003860 storage Methods 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 abstract description 5
- 230000003028 elevating effect Effects 0.000 description 6
- 238000005520 cutting process Methods 0.000 description 4
- 230000001965 increasing effect Effects 0.000 description 3
- 238000009434 installation Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 1
- 230000002079 cooperative effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 230000007723 transport mechanism Effects 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1804—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic Table
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1876—Particular processes or apparatus for batch treatment of the devices
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electromagnetism (AREA)
- Plasma & Fusion (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
The invention discloses a loading and unloading method for PECVD surface coating, which comprises the steps of placing a graphite boat in place, loading a cache frame on the graphite boat, pushing the graphite boat up, detecting coating before the boat is fed, feeding the graphite boat into a reaction chamber, discharging the graphite boat out of the reaction chamber, loading a conveying mechanism on the graphite boat, detecting coating before a sheet is taken, returning the graphite boat to be inserted into a sheet taking machine and the like. According to the invention, two coating detection steps are added on the necessary path of the graphite boat, one step is used for detecting whether the silicon wafers in the graphite boat which are about to enter the reaction chamber on the boat pushing mechanism are coated with the film or not, so that the secondary coating in the reaction chamber is avoided, the other step is used for detecting whether the silicon wafers which are about to enter the inserting and taking machine on the conveying mechanism are coated with the film or not, so that the silicon wafers which are not coated with the film are prevented from flowing into the next process, thereby ensuring that each boat of the silicon wafers are coated with the film, avoiding repeated coating, ensuring the smoothness of the production process, ensuring the efficiency of the silicon wafers to be more stable, and improving the quality of the battery wafers.
Description
Technical Field
The invention relates to a PECVD surface coating process, in particular to a feeding and discharging method for PECVD surface coating.
Background
The PECVD (Plasma Enhanced Chemical Vapor Deposition, PECVD equipment comprises three parts, namely a gas source cabinet, a furnace body cabinet and a purifying table, a reaction chamber is positioned in the furnace body cabinet, a boat pushing mechanism, a buffer storage rack and a mechanical arm are positioned in the purifying table, and a conveying mechanism is communicated with the purifying table and a piece inserting and taking machine) is a Plasma Enhanced Chemical Vapor Deposition method. In the PECVD surface coating process, the graphite boat is a carrier of a solar cell, the silicon wafer is processed into the solar cell after a plurality of processes, and the surface coating is one of the core processes of the solar cell processing. The graphite boat is a carrier of the solar cell in the surface coating process, and the cell is inserted into the graphite boat after the flower basket in the previous process flows through the sheet inserting machine. The graphite boat is moved to the lower part of the purification table through the boat moving mechanism, then the graphite boat is grabbed by the mechanical arm and placed on the cache frame, when the reaction chamber has a vacancy, the mechanical arm grabs the graphite boat and places the graphite boat into the boat pushing mechanism, and then the graphite boat is sent into the reaction chamber by the boat pushing mechanism to be coated. After the film coating is finished, the boat pushing mechanism is taken out, then the boat is grabbed by the mechanical arm and placed to the cache for cooling, the graphite boat is grabbed by the mechanical arm after the cooling is finished and placed below the purifying table, the graphite boat is moved to the sheet inserting machine through the boat moving mechanism, and the inserted flower basket is conveyed to the next procedure. Because the cache frame not only stores the boat without coating film, but also has the boat which has finished coating film, the graphite boat silicon wafer without coating film is sent to the next procedure, and the graphite boat with coating film is sent to the reaction chamber again for coating film, which causes the confusion of the production process of the battery piece, and the efficiency of the battery piece without coating film and with repeated coating film is reduced.
At present, whether a battery piece in a graphite boat is coated or not is not detected, and a detection module is added on a sheet inserting machine in the prior art, and detection is carried out after the battery piece flows out from a flower basket, such as a camera and a light source, and fragments, hidden cracks and color differences of the battery piece are detected by photographing. In the prior art, X-rays are added on a conveying line for conveying the battery pieces in the piece inserting machine to detect the thickness and uniformity of the plated film. However, in both the two modes, the detection of the single wafer in the wafer inserting machine is carried out, so that the detection of whether the single wafer is broken or not and is hidden and cracked before entering the graphite boat and the detection of whether the thickness and the uniformity of the film coating before entering the flower basket in the next process after the film coating meet the requirements or not can be carried out, but the detection of whether the film coating of the silicon wafer in the graphite boat is carried out is not carried out. Therefore, the phenomenon that the whole boat is repeatedly coated or the whole boat is not coated is easy to occur, and the whole production efficiency and the quality of the battery piece are influenced.
Disclosure of Invention
The invention aims to overcome the defects of the prior art and provides a loading and unloading method for PECVD surface coating, which can avoid secondary coating in a reaction chamber and prevent silicon wafers which are not coated from flowing into the next process.
In order to solve the technical problems, the invention adopts the following technical scheme:
a loading and unloading method for PECVD surface coating comprises the following steps:
s1, positioning the graphite boat: the graphite boat inserted with the sheets by the sheet inserting and taking machine is moved to the position below a PECVD purification table through a conveying mechanism;
s2, caching rack on graphite boat: the manipulator grabs the graphite boat and puts the graphite boat on a cache frame of the purification table for waiting;
s3, a graphite boat pushing-up mechanism: the reaction chamber is provided with a vacancy, and the mechanical arm grabs the graphite boat on the cache frame and puts the graphite boat on the boat pushing mechanism;
s4, coating detection before boat entering: detecting whether the silicon wafers in the graphite boat on the boat pushing mechanism are coated with films, if not, entering step S5, if so, grabbing the graphite boat by the manipulator and putting the graphite boat back to the cache frame again, and returning to step S3;
s5, carrying the graphite boat into a reaction chamber: the graphite boat is sent into a reaction chamber by a boat pushing mechanism to carry out a film coating process;
s6, taking the graphite boat out of the reaction chamber: after the process is finished, the boat pushing mechanism enters the reaction chamber to take out the graphite boat, and the mechanical arm picks the graphite boat after the process and puts the graphite boat on the cache frame for cooling;
s7, a graphite boat conveying mechanism: after cooling, the mechanical arm grabs the graphite boat on the cache frame and places the graphite boat on the conveying mechanism below the purification table;
s8, coating film detection before taking the film: detecting whether the silicon wafers in the graphite boat on the conveying mechanism are coated, if so, entering step S9, if not, the mechanical arm grabs the graphite boat and puts the graphite boat back to the cache frame again, and returning to step S7;
s9, returning the graphite boat to insert the piece taking machine: the conveying mechanism conveys the graphite boat back to the inserting and taking machine for taking the graphite boat, and the graphite boat enters the next procedure.
As a further improvement of the above technical solution:
in step S4, the coating detection method includes: the first detection probe extends into a space between two adjacent boat sheets in the graphite boat on the boat pushing mechanism to detect the color of the silicon wafers on the boat sheets, if the color is gray, no film is coated, and if not, the film is coated.
In step S4, adopt first coating film detection device to carry out the coating film and detect, first coating film detection device include stand, crossbeam, first lift drive and first test probe, crossbeam one end forms L shape support with the stand is fixed, install on the crossbeam other end first lift drive, first test probe locates first lift driven drive end, the stand is fixed on the horizontal migration module that pushes away the boat mechanism, first test probe is located the top that pushes away the boat oar of boat mechanism, and can insert in the graphite boat under first lift driven' S drive.
The first coating detection device further comprises a first light source, and the first light source is mounted at the driving end of the first lifting drive.
In step S8, the coating detection method includes: and the second detection probe extends into the space between two adjacent boat sheets in the graphite boat on the conveying mechanism to detect the color of the silicon wafers on the boat sheets, if the color is gray, no film is coated, and if not, the film is coated.
In step S8, a second coating detection device is used for coating detection, the second coating detection device includes a door-shaped frame, a second lifting drive and a second detection probe, two ends of the door-shaped frame are fixed on two sides of the conveying mechanism, the second lifting drive is arranged in the middle of the door-shaped frame, the second detection probe is arranged at a driving end of the second lifting drive and can be inserted into the graphite boat under the driving of the second lifting drive.
The second coating detection device further comprises a second light source, and the second light source is mounted at the driving end of the second lifting drive.
The boat pushing mechanism is characterized in that an auxiliary support is arranged on the boat pushing mechanism and comprises a supporting seat and a supporting rod, the supporting seat is fixed below a horizontal moving module of the boat pushing mechanism, the supporting rod is installed on the supporting seat, and one suspended end of a boat pushing paddle of the boat pushing mechanism can be put on the supporting rod.
The reactor is internally provided with a furnace lifting support for supporting the pushing paddle, the furnace lifting support comprises a support cylinder and a support piece arranged at the drive end of the support cylinder, and the pushing paddle can be put on the support piece.
The auxiliary support further comprises a lifting module used for driving the supporting rod to lift, the lifting module is installed on the supporting seat, and the supporting rod is connected with the lifting module.
Compared with the prior art, the invention has the advantages that:
(1) according to the loading and unloading method for PECVD surface coating, two coating detection steps are added on the necessary path of a graphite boat, one step is used for detecting whether the silicon wafers in the graphite boat which are about to enter a reaction chamber on a boat pushing mechanism are coated, so that secondary coating in the reaction chamber is avoided, the other step is used for detecting whether the silicon wafers which are about to enter a sheet inserting and taking machine on a conveying mechanism are coated, so that the silicon wafers which are not coated are prevented from flowing into the next process, each boat of silicon wafers is ensured to be coated, repeated coating is avoided, the smoothness of the production process is ensured, the efficiency of the silicon wafers is more stable, and the quality of the battery pieces is improved.
(2) According to the loading and unloading method for PECVD surface coating, under the condition that the inner diameter of a reaction chamber is not increased, cantilever beam type stress of a high-capacity graphite boat is changed into a simply supported beam type stress by adding an auxiliary support, deflection of the graphite boat in the carrying process is greatly reduced, safety and no touch in the boat feeding and taking processes are realized, the newly added auxiliary support solves the deflection problem, the height of equipment can be well controlled, and the height of the equipment needs to be controlled, and if the problem is solved by increasing the diameter of the reaction chamber, the height is increased by 5 times.
(3) According to the loading and unloading method for PECVD surface coating, the additional auxiliary support outside the furnace and the lifting support inside the furnace are adopted, so that the pushing paddle is of a simple beam structure instead of a cantilever structure no matter the pushing paddle is inside the furnace or outside the furnace, the deflection is greatly reduced, the probability of touching the inner wall of the reaction chamber after the pushing paddle enters the reaction chamber is reduced, the deflection of the pushing paddle in the carrying process of a graphite boat is reduced, and the safety and no touch in the boat feeding and taking processes are realized.
Drawings
FIG. 1 is a process diagram of a loading and unloading method for PECVD surface coating.
FIG. 2 is a flow chart of a loading and unloading method for PECVD surface coating of the present invention.
FIG. 3 is a schematic view showing a state before the boat pushing mechanism of the present invention enters the reaction chamber.
FIG. 4 is a schematic structural view of a first coating detection apparatus according to the present invention.
FIG. 5 is a schematic diagram showing the positional relationship between the first coating film detection device and the graphite boat in the present invention.
Fig. 6 is a schematic (three-dimensional) view showing the positional relationship between the transfer mechanism and the second coating film detection device according to the present invention.
FIG. 7 is a schematic view (lateral direction) of the positional relationship between the conveying mechanism and the second coating film detection device in the present invention.
FIG. 8 is a schematic structural view of a second coating film detection apparatus according to the present invention.
FIG. 9 is a schematic view of the boat pushing mechanism according to the present invention.
Fig. 10 is a schematic structural view (one) of the auxiliary support of the present invention.
Fig. 11 is a schematic structural view (ii) of the auxiliary support of the present invention.
FIG. 12 is a schematic view of the internal structure of a reaction chamber in the present invention.
FIG. 13 is a schematic view showing a graphite boat of the present invention in a state where the support rod is supported by the pusher paddle.
FIG. 14 is a schematic view showing the state in which the graphite boat is loaded into the reaction chamber, the elevating support is in a supporting state, and the support rod is not in a supporting state.
FIG. 15 is a schematic view showing a state where the graphite boat is completely introduced into the reaction chamber in the present invention.
FIG. 16 is a schematic view showing the state where the graphite boat is dropped on the electrode rod and the boat-pushing paddle starts to retreat.
FIG. 17 is a schematic view showing a state where the boat-pushing paddle is completely withdrawn from the quartz tube in the present invention.
FIG. 18 is a schematic view showing a state where the boat pushing paddle enters the reaction chamber and is taken out of the reaction chamber.
FIG. 19 is a schematic view showing a state where the boat is completely withdrawn from the reaction chamber after the boat is pushed and taken by the boat pusher in the present invention.
The reference numerals in the figures denote:
1. a graphite boat; 11. boat sheets; 2. a transport mechanism; 3. a reaction chamber; 31. an electrode rod; 4. a boat pushing mechanism; 41. a horizontal moving module; 42. pushing a boat oar; 43. a linear slider; 44. a boat pushing seat; 5. a first coating film detection device; 51. a column; 52. a cross beam; 53. a first lifting drive; 54. a first detection probe; 55. a first light source; 56. winding; 6. a second coating film detection device; 61. a door-shaped frame; 62. a second lifting drive; 63. a second detection probe; 64. a second light source; 7. auxiliary supporting; 71. a supporting seat; 72. a support bar; 73. a lifting module; 74. a guide mounting plate; 75. a guide slider; 76. mounting a rod; 77. a C-shaped cutting sleeve; 78. a clamping portion; 79. locking the bolt; 8. lifting and supporting in the furnace; 81. a support cylinder; 82. a top support.
Detailed Description
The invention is described in further detail below with reference to the figures and specific examples of the specification.
As shown in fig. 1 and fig. 2, the loading and unloading method for PECVD surface coating of the present embodiment includes the following steps:
s1, positioning the graphite boat: the graphite boat 1 inserted with the wafers by the wafer inserting and taking machine moves to the position below a purification table of the PECVD through a conveying mechanism 2, wherein in the step, the silicon wafers are conveyed by a basket in the previous process, and the wafer inserting and taking machine inserts the silicon wafers into the graphite boat 1;
s2, caching rack on graphite boat: the mechanical arm grabs the graphite boat 1 and puts the graphite boat on a cache frame of the purification table for waiting;
s3, a graphite boat pushing-up mechanism: the reaction chamber 3 is provided with a vacancy, and the mechanical arm grabs the graphite boat 1 on the cache frame and puts the graphite boat on the boat pushing mechanism 4;
s4, coating detection before boat entering: detecting whether the silicon wafers in the graphite boat 1 on the boat pushing mechanism 4 are coated with films, if not, entering step S5, if so, grabbing the graphite boat 1 by a manipulator and putting the graphite boat back to the cache frame again, and returning to step S3;
s5, carrying the graphite boat into a reaction chamber: the boat pushing mechanism 4 sends the graphite boat 1 into the reaction chamber 3 for coating;
s6, taking the graphite boat out of the reaction chamber: after the process is finished, the boat pushing mechanism 4 enters the reaction chamber 3 to take out the graphite boat 1, and the mechanical arm picks the graphite boat 1 after the process and puts the graphite boat 1 on a buffer storage rack for cooling;
s7, a graphite boat conveying mechanism: after cooling, the graphite boat 1 on the cache frame is grabbed by the mechanical arm and is placed on the conveying mechanism 2 below the purification table;
s8, coating film detection before taking the film: detecting whether the silicon wafers in the graphite boat 1 on the conveying mechanism 2 are coated, if so, entering step S9, if not, grabbing the graphite boat 1 by the manipulator and putting back the graphite boat 1 to the cache frame again, and returning to step S7;
s9, returning the graphite boat to insert the piece taking machine: and the conveying mechanism 2 conveys the graphite boat 1 back to a piece inserting and taking machine for taking the graphite boat, and the graphite boat enters the next process, and the piece inserting and taking machine takes the silicon wafers on the graphite boat 1 out and places the silicon wafers in a flower basket of the next process.
According to the loading and unloading method for PECVD surface coating, two coating detection steps are added on the necessary path of a graphite boat 1, one step is used for detecting whether the silicon wafers in the graphite boat 1 which are about to enter a reaction chamber 3 on a boat pushing mechanism 4 are coated, so that secondary coating in the reaction chamber 3 is avoided, the other step is used for detecting coating before entering a piece inserting and taking machine and taking the piece, and the silicon wafers which are not coated are prevented from flowing into the next process, so that each boat silicon wafer is ensured to be coated, repeated coating is avoided, the smoothness of the production process is ensured, and the efficiency of the silicon wafers (battery pieces) is more stable, and the quality of the battery pieces is improved.
As shown in fig. 3 to 5, in this embodiment, in step S4, the plating detection method includes: the first detecting probe 54 is inserted between two adjacent boat sheets 11 in the graphite boat 1 on the boat pushing mechanism 4, detects the color of the silicon wafer on the boat sheet 11, if the color is gray, the silicon wafer is not coated, and can be sent into the reaction chamber 3, otherwise, the silicon wafer is coated, and is put back on the buffer storage rack.
The first coating detection device 5 is used for coating detection, the first coating detection device 5 comprises a vertical column 51, a cross beam 52, a first lifting drive 53 and a first detection probe 54, one end of the cross beam 52 is fixed with the vertical column 51 to form an L-shaped support, the other end of the cross beam 52 is provided with the first lifting drive 53, the first detection probe 54 is arranged at the driving end of the first lifting drive 53, the vertical column 51 is fixed on the horizontal moving module 41 of the boat pushing mechanism 4, the first detection probe 54 is positioned above the boat pushing paddle 42 of the boat pushing mechanism 4 and can be inserted into the graphite boat 1 under the drive of the first lifting drive 53, and the graphite boat 1 is lifted after detection is finished without influencing the passing of the graphite boat 1. The first coating film detection device 5 further includes a first light source 55, and the first light source 55 is installed at the driving end of the first lifting driver 53. The first elevation drive 53 is preferably a rodless cylinder. The first detecting probe 54 is preferably a micro sensor, because the distance between two adjacent boat sheets 11 is only 10mm, a thin sensor is required; the first light source 55 is preferably a diode light emitter, which is required to be small, mainly for enhancing the effect of the sensor. The beam 52 is provided with routing coils 56 for routing the sensors and rodless cylinders.
As shown in fig. 6 to 8, in this embodiment, in step S8, the plating detection method includes: the second detection probe 63 extends into the space between two adjacent boat sheets 11 in the graphite boat 1 on the conveying mechanism 2, detects the color of the silicon wafers on the boat sheets 11, if the color is gray, the silicon wafers are not coated, and the silicon wafers are placed back to the cache frame, otherwise, the silicon wafers are coated and can be sent to a sheet inserting and taking machine.
The second coating detection device 6 is used for coating detection, the second coating detection device 6 comprises a door-shaped frame 61, a second lifting drive 62 and a second detection probe 63, two ends of the door-shaped frame 61 are fixed on two sides of the conveying mechanism 2, the second lifting drive 62 is arranged in the middle of the door-shaped frame 61, the second detection probe 63 is arranged at the driving end of the second lifting drive 62, and the second detection probe can be inserted into the graphite boat 1 under the driving of the second lifting drive 62. The second coating detection device 6 further includes a second light source 64, and the second light source 64 is installed at the driving end of the second elevating driver 62. Second lift drive 62 is also preferably a rodless cylinder. Similarly, the second detection probe 63 is preferably a micro-sensor and the second light source 64 is preferably a diode light emitter.
As shown in fig. 9 to fig. 11, in the present embodiment, the boat pushing mechanism 4 is provided with an auxiliary support 7, the auxiliary support 7 includes a support base 71 and a support rod 72, the support base 71 is fixed below the horizontal moving module 41 of the boat pushing mechanism 4, the support rod 72 is installed on the support base 71, and a suspended end of the boat pushing paddle 42 of the boat pushing mechanism 4 can be lapped on the support rod 72.
The graphite boat 1 is loaded on the boat pushing paddle 42, the front end of the boat pushing paddle 42 is abutted against the supporting rod 72, the boat pushing paddle 42 is not in a cantilever structure any more, but in a simply supported beam type with two ends supported, the linear sliding block 43 of the horizontal moving module 41 drives the boat pushing paddle 42 to advance, the graphite boat 1 is conveyed into the reaction chamber 3, the deflection is greatly reduced due to the fact that the auxiliary support 7 is arranged before the graphite boat enters the reaction chamber 3, the probability of touching the inner wall of the reaction chamber 3 (a quartz tube) is reduced after the boat pushing paddle 42 enters the reaction chamber 3, the deflection of the boat pushing paddle 42 in the conveying process of the graphite boat 1 is reduced, and safety and no touch in the boat feeding and taking processes are achieved. The boat pushing mechanism 4 further comprises a boat pushing seat 44, one end of the boat pushing paddle 42 is fixed on the boat pushing seat 44, the other end of the boat pushing paddle is abutted against the supporting rod 72, and the boat pushing seat 44 is connected with the linear sliding block 43.
The support rod 72 is a circular rod, which reduces the contact area with the boat pushing paddle 42 and the friction coefficient, thereby reducing the resistance of the boat pushing paddle 42 from the auxiliary support 7, and meanwhile, the circular rod is favorable for reducing the collision between the boat pushing paddle 42 and the support rod 72, so that the boat pushing paddle can be in contact with the support rod more gently.
As shown in fig. 12, in the present embodiment, a furnace lifting support 8 for supporting the boat pushing paddle 42 is disposed in the reaction chamber 3, the furnace lifting support 8 includes a support cylinder 81 and a supporting member 82 disposed at a driving end of the support cylinder 81, and the boat pushing paddle 42 can be lapped on the supporting member 82.
The furnace elevating support 8 is provided between two electrode rods 31 in the reaction chamber 3. The auxiliary support 7 is used outside the furnace for supporting the pushing paddle 42 before entering the reaction chamber 3, and the pushing paddle group 42 is supported by the top support 82 of the lifting support 8 in the furnace after entering the reaction chamber 3. The top support is preferably a top support round bar.
The working principle of the lifting support 8 in the furnace is as follows: when the pushing paddle 42 starts to enter the reaction chamber 3 and is supported on the top support round bar, the supporting cylinder 81 does not act at this time, after the pushing paddle 42 completely enters the reaction chamber 3, the pushing paddle 42 starts to descend, the supporting cylinder 81 also descends, in the descending process, the graphite boat 1 falls on the two electrode bars 31, and then the pushing paddle 42 withdraws from the reaction chamber 3. The arrangement of the lifting support 8 in the furnace ensures that the pushing paddle 42 enters the reaction chamber 3 and is also in a simple beam structure instead of a cantilever structure, thereby greatly reducing the deflection of the pushing paddle 42 and avoiding the contact between the pushing paddle 42 and the inner wall of the reaction chamber 3.
In this embodiment, two sets of in-furnace elevating supports 8 are provided, and arranged in the reaction chamber 3 in tandem. The auxiliary support 7 further comprises a lifting module 73 for driving the support rod 72 to lift, the lifting module 73 is installed on the support base 71, and the support rod 72 is connected with the lifting module 73.
Wherein, be equipped with direction mounting panel 74 and two sets of guide structure on the supporting seat 71, guide structure includes direction slider 75 and installation pole 76, and the installation pole 76 both ends are fixed on supporting seat 71, and the mobilizable dress that wears to locate of direction slider 75 is on installation pole 76, and direction mounting panel 74 is fixed on two direction sliders 75, and bracing piece 72 is fixed on direction mounting panel 74. The guide mounting plate 74 is provided with a C-shaped cutting sleeve 77, two ends of the C-shaped cutting sleeve 77 are provided with clamping portions 78, the support rod 72 is sleeved in the C-shaped cutting sleeve 77, and the clamping portions 78 at the two ends are provided with locking bolts 79 in a penetrating mode. The lifting module 73 is preferably a pneumatic cylinder, the piston rod of which is connected to the guide mounting plate 74. In other embodiments, the lifting module 73 may be a belt drive, a ball screw, an electric cylinder, or the like.
The cooperative action of the auxiliary support 7 and the furnace lifting support 8 is as follows:
the auxiliary support 7 functions to support the pusher paddle 42 before the pusher paddle 42 enters the reaction chamber 3. When the paddle 42 enters the reaction chamber 3 and starts to be lapped on the supporting member 82, the supporting rod 72 of the auxiliary support 7 outside the reaction chamber 3 needs to descend and leave the paddle 42, and at this time, the front end and the rear end of the paddle 42 form a simple beam structure instead of a cantilever structure, so that the supporting rod 72 is withdrawn (descended), firstly, the supporting rod 72 does not collide with the supporting rod 72 when the paddle 42 is conveyed into the boat chamber and retreats (the paddle seat 44 is lower than the paddle 42, so the paddle seat 44 needs to cross the supporting rod 72, and the supporting rod 72 needs to move downwards), secondly, the front end of the paddle 42 is ensured to be supported on the supporting member 82, and thirdly, the redundant friction generated in the moving process of the paddle 42 can be reduced.
The boat-in and boat-out process of the boat-pushing mechanism 4 for PECVD surface coating (the process of the graphite boat 1 entering and exiting the reaction chamber 3):
1) as shown in fig. 13, the graphite boat 1 loaded with the silicon wafer to be coated is placed on the boat pushing paddle 42 by the robot arm, and the support rod 72 outside the furnace is in a support state;
2) as shown in fig. 14, the graphite boat 1 is fed into the reaction chamber 3 by the boat pushing paddle 42, the furnace elevating support 8 is in a supporting state by a force, and the support rod 72 outside the furnace descends and withdraws from the support;
3) as shown in fig. 15, the boat pushing paddle 42 and the boat pushing seat 44 go across the support rod 72, and the graphite boat 1 is completely placed in the reaction chamber 3;
4) as shown in fig. 16 and 17, the pusher paddle 42 descends, the support cylinder 81 descends, the in-furnace elevating support 8 is in a non-support state, the graphite boat 1 falls onto the electrode rod 31 in a soft landing state, and the pusher paddle 42 exits from the reaction chamber 3;
5) as shown in fig. 18, after the furnace door is opened, the boat pushing paddle 42 enters the reaction chamber 3, and rises to lift the graphite boat 1, the graphite boat 1 leaves the electrode rod 31 and is located on the boat pushing paddle 42, the supporting cylinder 81 also rises to continue to play a supporting role, and the boat pushing paddle 42 is lapped on the top supporting piece 82 to start to exit the reaction chamber 3;
6) as shown in fig. 19, the graphite boat 1 is moved out of the reaction chamber 3 by the paddle 42, the support rod 72 outside the furnace is lifted to restore the support before the paddle 42 is separated from the support member 82, and the graphite boat 1 is returned to the cycle of step 1 after waiting for the robot to pick up the graphite boat 1.
Although the present invention has been described with reference to the preferred embodiments, it is not intended to be limited thereto. Those skilled in the art can make numerous possible variations and modifications to the present invention, or modify equivalent embodiments to equivalent variations, without departing from the scope of the invention, using the teachings disclosed above. Therefore, any simple modification, equivalent change and modification made to the above embodiments according to the technical spirit of the present invention should fall within the protection scope of the technical scheme of the present invention, unless the technical spirit of the present invention departs from the content of the technical scheme of the present invention.
Claims (6)
1. A loading and unloading method for PECVD surface coating is characterized by comprising the following steps:
s1, positioning the graphite boat: the graphite boat (1) inserted with the sheets by the sheet inserting and taking machine moves to the lower part of a PECVD purification table through a conveying mechanism (2);
s2, caching rack on graphite boat: the mechanical arm grabs the graphite boat (1) and puts the graphite boat on a cache frame of the purification table for waiting;
s3, a graphite boat pushing-up mechanism: the reaction chamber (3) is provided with a vacancy, and the graphite boat (1) on the cache frame is grabbed by the manipulator and placed on the boat pushing mechanism (4);
s4, coating detection before boat entering: detecting whether the silicon wafers in the graphite boat (1) on the boat pushing mechanism (4) are coated, if not, entering step S5, if so, grabbing the graphite boat (1) by the manipulator and putting back the graphite boat to the cache frame again, and returning to step S3;
s5, carrying the graphite boat into a reaction chamber: the boat pushing mechanism (4) sends the graphite boat (1) into the reaction chamber (3) for coating;
s6, taking the graphite boat out of the reaction chamber: after the process is finished, the boat pushing mechanism (4) enters the reaction chamber (3) to take out the graphite boat (1), and the mechanical arm picks the graphite boat (1) after the process and puts the graphite boat on the buffer storage rack for cooling;
s7, a graphite boat conveying mechanism: after cooling, the graphite boat (1) on the cache frame is grabbed by the mechanical arm and is placed on the conveying mechanism (2) below the purification table;
s8, coating film detection before taking the film: detecting whether the silicon wafers in the graphite boat (1) on the conveying mechanism (2) are coated, if so, entering step S9, if not, grabbing the graphite boat (1) by the manipulator and putting back the graphite boat to the cache frame again, and returning to step S7;
s9, returning the graphite boat to insert the piece taking machine: the conveying mechanism (2) returns the graphite boat (1) to the inserting and taking machine for taking the graphite boat, and the next procedure is carried out;
in step S4, the plating detection method includes: the first detection probe (54) extends into the space between two adjacent boat sheets (11) in the graphite boat (1) on the boat pushing mechanism (4) to detect the color of the silicon wafer on the boat sheet (11), if the color is gray, no film coating exists, otherwise, the film coating exists;
in step S8, the plating detection method includes: a second detection probe (63) extends into the space between two adjacent boat sheets (11) in the graphite boat (1) on the conveying mechanism (2) to detect the color of the silicon wafer on the boat sheet (11), if the color is gray, no coating film exists, otherwise, a coating film exists;
in the step S4, a first coating detection device (5) is used for coating detection, the first coating detection device (5) includes an upright (51), a cross beam (52), a first lifting drive (53) and a first detection probe (54), one end of the cross beam (52) is fixed to the upright (51) to form an L-shaped bracket, the first lifting drive (53) is installed at the other end of the cross beam (52), the first detection probe (54) is arranged at the driving end of the first lifting drive (53), the upright (51) is fixed to a horizontal movement module (41) of a boat pushing mechanism (4), and the first detection probe (54) is located above a boat pushing paddle (42) of the boat pushing mechanism (4) and can be inserted into the graphite boat (1) under the driving of the first lifting drive (53);
in the step S8, a second coating detection device (6) is used for coating detection, the second coating detection device (6) comprises a door-shaped frame (61), a second lifting drive (62) and a second detection probe (63), two ends of the door-shaped frame (61) are fixed on two sides of the conveying mechanism (2), the second lifting drive (62) is arranged in the middle of the door-shaped frame (61), the second detection probe (63) is arranged at the drive end of the second lifting drive (62), and the second detection probe can be inserted into the graphite boat (1) under the drive of the second lifting drive (62).
2. The loading and unloading method for PECVD surface coating of claim 1, wherein the first coating detection device (5) further comprises a first light source (55), and the first light source (55) is installed at the driving end of the first lifting drive (53).
3. The loading and unloading method for PECVD surface coating of claim 1, wherein the second coating detection device (6) further comprises a second light source (64), and the second light source (64) is installed at the driving end of the second lifting drive (62).
4. The loading and unloading method for PECVD surface coating according to claim 1 or 2, wherein the boat pushing mechanism (4) is provided with an auxiliary support (7), the auxiliary support (7) comprises a support base (71) and a support rod (72), the support base (71) is fixed below the horizontal moving module (41) of the boat pushing mechanism (4), the support rod (72) is installed on the support base (71), and the suspended end of the boat pushing paddle (42) of the boat pushing mechanism (4) can be lapped on the support rod (72).
5. The loading and unloading method for PECVD surface coating according to claim 4, wherein the reaction chamber (3) is internally provided with a furnace lifting support (8) for supporting the pusher paddle (42), the furnace lifting support (8) comprises a support cylinder (81) and a support member (82) arranged at the driving end of the support cylinder (81), and the pusher paddle (42) can be lapped on the support member (82).
6. The loading and unloading method for PECVD surface coating of claim 5, wherein the auxiliary support (7) further comprises a lifting module (73) for driving a support rod (72) to lift, the lifting module (73) is mounted on the support base (71), and the support rod (72) is connected with the lifting module (73).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010467836.8A CN111628046B (en) | 2020-05-28 | 2020-05-28 | Feeding and discharging method for PECVD surface coating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010467836.8A CN111628046B (en) | 2020-05-28 | 2020-05-28 | Feeding and discharging method for PECVD surface coating |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN111628046A CN111628046A (en) | 2020-09-04 |
| CN111628046B true CN111628046B (en) | 2022-05-03 |
Family
ID=72260109
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202010467836.8A Active CN111628046B (en) | 2020-05-28 | 2020-05-28 | Feeding and discharging method for PECVD surface coating |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN111628046B (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117096074A (en) * | 2023-10-17 | 2023-11-21 | 江苏微导纳米科技股份有限公司 | Slide boat, diffusion device and diffusion process method |
| CN117660915B (en) * | 2024-02-02 | 2024-06-14 | 星弧涂层新材料科技（苏州）股份有限公司 | Coating equipment and coating method thereof |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4366771A (en) * | 1980-07-18 | 1983-01-04 | Honeywell Inc. | Mercury containment for liquid phase growth of mercury cadmium telluride from tellurium-rich solution |
| CN102427098B (en) * | 2011-12-08 | 2013-04-17 | 浚鑫科技股份有限公司 | Discharging platform for solar cell |
| CN203055881U (en) * | 2012-12-27 | 2013-07-10 | 无锡先导自动化设备股份有限公司 | Silicon wafer automatic feeding and discharging device for plasma enhanced chemical vapor deposition (PECVD) device |
| CN204303847U (en) * | 2014-07-07 | 2015-04-29 | 镇江大全太阳能有限公司 | A kind of automatic picking device for abnormal solar battery sheet |
| CN204391073U (en) * | 2015-03-05 | 2015-06-10 | 苏州阿特斯阳光电力科技有限公司 | A kind of automatic loading and unloading device for PECVD filming equipment |
| CN106282971B (en) * | 2016-08-19 | 2018-09-18 | 湖南红太阳光电科技有限公司 | Automatic loading and unloading system and its method for multitube PECVD device |
| CN207367931U (en) * | 2017-10-19 | 2018-05-15 | 上海神舟新能源发展有限公司 | A kind of detection device for solar cell PECVD plated films |
| CN209071287U (en) * | 2018-09-27 | 2019-07-05 | 苏州迈为科技股份有限公司 | A kind of multistation cell piece efficiency detection device |
| CN110453201A (en) * | 2019-09-12 | 2019-11-15 | 深圳市捷佳伟创新能源装备股份有限公司 | To the process and coating apparatus of multiple graphite boats while plated film in one cavity |
-
2020
- 2020-05-28 CN CN202010467836.8A patent/CN111628046B/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN111628046A (en) | 2020-09-04 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN111628046B (en) | Feeding and discharging method for PECVD surface coating | |
| CN101723103B (en) | Method for conveying materials of taping machine, and compact type full automatic tube taping machine | |
| CN106282971A (en) | Automatic loading and unloading system and method thereof for multitube PECVD device | |
| CN111628045B (en) | Feeding and discharging method for PECVD surface coating based on coating detection | |
| CN114871157B (en) | Multilayer staggered type magazine storage device, discharging and sorting equipment and sorting system | |
| CN212610893U (en) | Boat pushing mechanism with auxiliary support and tubular PECVD (plasma enhanced chemical vapor deposition) equipment | |
| CN113649928B (en) | Alloy bar material quantitative cutting automatic line | |
| KR100594045B1 (en) | Device conveying drive and method of transfer press | |
| CN115815839B (en) | Automatic chamfering device for silicon wafer | |
| CN110282378B (en) | Automatic feeding and discharging machine for AVI (automatic video inspection) machine | |
| CN211401514U (en) | Tension detection device of two-for-one twister capsule tensioner | |
| CN216765042U (en) | Workpiece frame transfer system for vacuum coating machine | |
| CN111515988A (en) | Manipulator capable of grabbing multiple graphite boats and grabbing method of manipulator | |
| CN218443357U (en) | Feeding and discharging system for bar induction heating | |
| CN220419201U (en) | Pipe fitting detection device | |
| CN211401513U (en) | Tension detection system of two-for-one twister capsule tensioner | |
| CN217807058U (en) | Box buffer memory device that cylinder transfer chain was used | |
| CN220761828U (en) | Full-automatic miniature axle processingequipment | |
| CN210125911U (en) | Automatic loading and unloading system for impeller of multi-stage self-priming pump | |
| CN214298240U (en) | Substrate conveying device | |
| CN114164411A (en) | Workpiece frame transfer system for vacuum coating machine | |
| CN214472534U (en) | Nuclear fuel plate density measuring device | |
| CN219173647U (en) | Glass processing production line | |
| CN220200662U (en) | Automatic unloading equipment of going up of high-efficient Tray | |
| CN220744530U (en) | Charging tray clamping frame and charging tray device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |