CN111584408A - 一种基于相位掩膜干涉的Micro-LED巨量转移装置和方法 - Google Patents
一种基于相位掩膜干涉的Micro-LED巨量转移装置和方法 Download PDFInfo
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- CN111584408A CN111584408A CN202010485734.9A CN202010485734A CN111584408A CN 111584408 A CN111584408 A CN 111584408A CN 202010485734 A CN202010485734 A CN 202010485734A CN 111584408 A CN111584408 A CN 111584408A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67144—Apparatus for mounting on conductive members, e.g. leadframes or conductors on insulating substrates
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/15—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission
- H01L27/153—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission in a repetitive configuration, e.g. LED bars
- H01L27/156—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission in a repetitive configuration, e.g. LED bars two-dimensional arrays
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- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
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Abstract
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN202010485734.9A CN111584408B (zh) | 2020-06-01 | 2020-06-01 | 一种基于相位掩膜干涉的Micro-LED巨量转移装置和方法 |
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CN202010485734.9A CN111584408B (zh) | 2020-06-01 | 2020-06-01 | 一种基于相位掩膜干涉的Micro-LED巨量转移装置和方法 |
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CN111584408A true CN111584408A (zh) | 2020-08-25 |
CN111584408B CN111584408B (zh) | 2021-01-12 |
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Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1725042A (zh) * | 2005-06-30 | 2006-01-25 | 昆明理工大学 | 基于Talbot干涉仪的扫描式光栅写入法及扫描式Talbot干涉仪 |
KR20100039004A (ko) * | 2008-10-07 | 2010-04-15 | 한국과학기술원 | 패턴 전사 방법 및 패턴 전사 시스템 |
CN108962789A (zh) * | 2018-06-25 | 2018-12-07 | 开发晶照明(厦门)有限公司 | 微器件转移方法和微器件转移设备 |
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2020
- 2020-06-01 CN CN202010485734.9A patent/CN111584408B/zh active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1725042A (zh) * | 2005-06-30 | 2006-01-25 | 昆明理工大学 | 基于Talbot干涉仪的扫描式光栅写入法及扫描式Talbot干涉仪 |
KR20100039004A (ko) * | 2008-10-07 | 2010-04-15 | 한국과학기술원 | 패턴 전사 방법 및 패턴 전사 시스템 |
CN108962789A (zh) * | 2018-06-25 | 2018-12-07 | 开发晶照明(厦门)有限公司 | 微器件转移方法和微器件转移设备 |
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Effective date of registration: 20230526 Address after: 237400 Huoqiu modern industrial park, Hefei high tech Zone, Huoqiu County, Lu'an City, Anhui Province Patentee after: Anhui Chuangyuan Photoelectric Technology Co.,Ltd. Address before: 510006 Dongfeng East Road, Yuexiu District, Guangzhou, Guangdong 729 Patentee before: GUANGDONG University OF TECHNOLOGY Effective date of registration: 20230526 Address after: 710000 Room 31401, Unit 3, Unit 14, Jiatian International Building No. 1, 216 Taibai South Road, Yanta District, Xi'an City, Shaanxi Province Patentee after: Xi'an Crossing Photoelectric Technology Co.,Ltd. Address before: 237400 Huoqiu modern industrial park, Hefei high tech Zone, Huoqiu County, Lu'an City, Anhui Province Patentee before: Anhui Chuangyuan Photoelectric Technology Co.,Ltd. |