CN111526977B - 用于加成制造的组合物和制品及其使用方法 - Google Patents

用于加成制造的组合物和制品及其使用方法 Download PDF

Info

Publication number
CN111526977B
CN111526977B CN201880084297.0A CN201880084297A CN111526977B CN 111526977 B CN111526977 B CN 111526977B CN 201880084297 A CN201880084297 A CN 201880084297A CN 111526977 B CN111526977 B CN 111526977B
Authority
CN
China
Prior art keywords
composition
radiation curable
curable composition
additive manufacturing
acrylate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201880084297.0A
Other languages
English (en)
Chinese (zh)
Other versions
CN111526977A (zh
Inventor
任康太
罗宾·帕帕克里斯托普洛斯
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Stratasys Inc
Original Assignee
DSM IP Assets BV
Covestro Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by DSM IP Assets BV, Covestro Netherlands BV filed Critical DSM IP Assets BV
Priority to CN202210662915.3A priority Critical patent/CN115179545B/zh
Priority to CN202210662066.1A priority patent/CN115179544B/zh
Publication of CN111526977A publication Critical patent/CN111526977A/zh
Application granted granted Critical
Publication of CN111526977B publication Critical patent/CN111526977B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
    • B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
    • B29C64/135—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask the energy source being concentrated, e.g. scanning lasers or focused light sources
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • B33Y70/10—Composites of different types of material, e.g. mixtures of ceramics and polymers or mixtures of metals and biomaterials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
    • C08F222/1025—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate of aromatic dialcohols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0041—Optical brightening agents, organic pigments
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00—Diaryl- or thriarylmethane dyes
    • C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/10—Amino derivatives of triarylmethanes
    • C09B11/24—Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M9/00—Aerodynamic testing; Arrangements in or on wind tunnels
    • G01M9/08—Aerodynamic models
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P5/00—Measuring speed of fluids, e.g. of air stream; Measuring speed of bodies relative to fluids, e.g. of ship, of aircraft
    • G01P5/18—Measuring speed of fluids, e.g. of air stream; Measuring speed of bodies relative to fluids, e.g. of ship, of aircraft by measuring the time taken to traverse a fixed distance
    • G01P5/20—Measuring speed of fluids, e.g. of air stream; Measuring speed of bodies relative to fluids, e.g. of ship, of aircraft by measuring the time taken to traverse a fixed distance using particles entrained by a fluid stream
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Manufacturing & Machinery (AREA)
  • Structural Engineering (AREA)
  • Optics & Photonics (AREA)
  • Aviation & Aerospace Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Ceramic Engineering (AREA)
  • Civil Engineering (AREA)
  • Composite Materials (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Architecture (AREA)
  • Fluid Mechanics (AREA)
  • Epoxy Resins (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
CN201880084297.0A 2017-12-29 2018-12-19 用于加成制造的组合物和制品及其使用方法 Active CN111526977B (zh)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN202210662915.3A CN115179545B (zh) 2017-12-29 2018-12-19 用于加成制造的组合物和制品及其使用方法
CN202210662066.1A CN115179544B (zh) 2017-12-29 2018-12-19 用于加成制造的组合物和制品及其使用方法

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201762612157P 2017-12-29 2017-12-29
US62/612,157 2017-12-29
US201862619439P 2018-01-19 2018-01-19
US62/619,439 2018-01-19
PCT/US2018/066346 WO2019133349A1 (en) 2017-12-29 2018-12-19 Compositions and articles for additive fabrication and methods of using the same

Related Child Applications (2)

Application Number Title Priority Date Filing Date
CN202210662066.1A Division CN115179544B (zh) 2017-12-29 2018-12-19 用于加成制造的组合物和制品及其使用方法
CN202210662915.3A Division CN115179545B (zh) 2017-12-29 2018-12-19 用于加成制造的组合物和制品及其使用方法

Publications (2)

Publication Number Publication Date
CN111526977A CN111526977A (zh) 2020-08-11
CN111526977B true CN111526977B (zh) 2022-07-01

Family

ID=65244588

Family Applications (3)

Application Number Title Priority Date Filing Date
CN201880084297.0A Active CN111526977B (zh) 2017-12-29 2018-12-19 用于加成制造的组合物和制品及其使用方法
CN202210662066.1A Active CN115179544B (zh) 2017-12-29 2018-12-19 用于加成制造的组合物和制品及其使用方法
CN202210662915.3A Active CN115179545B (zh) 2017-12-29 2018-12-19 用于加成制造的组合物和制品及其使用方法

Family Applications After (2)

Application Number Title Priority Date Filing Date
CN202210662066.1A Active CN115179544B (zh) 2017-12-29 2018-12-19 用于加成制造的组合物和制品及其使用方法
CN202210662915.3A Active CN115179545B (zh) 2017-12-29 2018-12-19 用于加成制造的组合物和制品及其使用方法

Country Status (6)

Country Link
US (3) US11180594B2 (https=)
EP (1) EP3732021A1 (https=)
JP (1) JP7251715B2 (https=)
KR (1) KR102864443B1 (https=)
CN (3) CN111526977B (https=)
WO (1) WO2019133349A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111526977B (zh) * 2017-12-29 2022-07-01 科思创(荷兰)有限公司 用于加成制造的组合物和制品及其使用方法
US12042985B2 (en) * 2018-12-27 2024-07-23 Stratasys Ltd. Additive manufacturing using reinforced materials
CN112730880A (zh) * 2020-12-08 2021-04-30 北京星航机电装备有限公司 一种增材制造设备风场校验系统及方法
CN113984328B (zh) * 2021-12-30 2022-03-22 清华大学 一种用于控制piv系统测量流场的三自由度调节平台

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5849459A (en) * 1994-11-29 1998-12-15 Teijin Seiki Co., Ltd. Resin composition for stereolithography
CN105924571A (zh) * 2016-05-19 2016-09-07 深圳长朗三维科技有限公司 连续光固化三维打印材料

Family Cites Families (46)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3708499A (en) 1970-11-20 1973-01-02 Basf Ag Rhodamine dyes which are sparingly soluble or insoluble in water
GB1391295A (en) 1971-07-30 1975-04-23 Basf Ag Rhodamine dye solutions
US3767358A (en) 1971-09-01 1973-10-23 Du Pont Rhodamine dye composition
US4575330A (en) 1984-08-08 1986-03-11 Uvp, Inc. Apparatus for production of three-dimensional objects by stereolithography
US5047568A (en) 1988-11-18 1991-09-10 International Business Machines Corporation Sulfonium salts and use and preparation thereof
US5380923A (en) 1993-04-29 1995-01-10 Minnesota Mining And Manufacturing Company Polymeric sulfonium salts and method of preparation thereof
JP3453741B2 (ja) 1993-07-08 2003-10-06 日本製紙株式会社 感熱記録体
US5665792A (en) 1995-06-07 1997-09-09 E. I. Du Pont De Nemours And Company Stabilizers for use with photoacid precursor formulations
US5866628A (en) * 1996-08-30 1999-02-02 Day-Glo Color Corp. Ultraviolet and electron beam radiation curable fluorescent printing ink concentrates and printing inks
JPH1087963A (ja) 1996-09-20 1998-04-07 Japan Synthetic Rubber Co Ltd 樹脂組成物および繊維質材料成形型
US6031021A (en) 1997-04-11 2000-02-29 Ncr Corporation Thermal transfer ribbon with thermal dye color palette
JP4204113B2 (ja) 1997-12-04 2009-01-07 株式会社Ａｄｅｋａ 新規な芳香族スルホニウム化合物、これからなる光酸発生剤およびこれを含む光重合性組成物、光造形用樹脂組成物ならびに光学的立体造形法
US20030149124A1 (en) 2001-11-27 2003-08-07 Thommes Glen A. Radiation curable resin composition for making colored three dimensional objects
WO2005027857A1 (fr) * 2003-09-05 2005-03-31 Rhodia Chimie Composition dentaire polymerisable et a haute teneur en charge
AU2003268671A1 (en) 2002-09-25 2004-04-19 Asahi Denka Co.Ltd. Novel aromatic sulfonium salt compound, photo-acid generator comprising the same and photopolymerizable composition containing the same, resin composition for optical three-dimensional shaping, and method of optically forming three-dimensional shape
ATE469126T1 (de) 2002-12-23 2010-06-15 Stx Aprilis Inc Fluorarylsulfonium fotosäure erzeugende verbindungen
US20050040562A1 (en) * 2003-08-19 2005-02-24 3D Systems Inc. Nanoparticle-filled stereolithographic resins
US7230122B2 (en) 2003-11-04 2007-06-12 National Starch And Chemical Investment Holding Corporation Sulfonium salt photinitiators and use thereof
US20050101684A1 (en) * 2003-11-06 2005-05-12 Xiaorong You Curable compositions and rapid prototyping process using the same
JP2007514805A (ja) * 2003-11-06 2007-06-07 ディーエスエム アイピー アセッツ ビー．ブイ． 硬化性組成物およびそれを用いるラピッドプロトタイピング法
ES2374823T3 (es) * 2004-03-22 2012-02-22 Huntsman Advanced Materials (Switzerland) Gmbh Composiciones fotocurables.
WO2006110517A1 (en) * 2005-04-08 2006-10-19 Saint-Gobain Abrasives, Inc. Abrasive article having reaction activated chromophore
JP2006348214A (ja) * 2005-06-17 2006-12-28 Jsr Corp 光造形用光硬化性液状組成物、立体造形物及びその製造方法
US7678528B2 (en) 2005-11-16 2010-03-16 Az Electronic Materials Usa Corp. Photoactive compounds
CN103760752A (zh) * 2007-03-20 2014-04-30 帝斯曼知识产权资产管理有限公司 立体光刻树脂组合物以及由其制成的三维物品
JP5304977B2 (ja) 2007-10-04 2013-10-02 セイコーエプソン株式会社 光硬化組成物を用いた硬化物の形成方法およびその硬化物
WO2009069428A1 (ja) 2007-11-28 2009-06-04 Sumitomo Seika Chemicals Co., Ltd. 光酸発生剤および光反応性組成物
JP5208573B2 (ja) 2008-05-06 2013-06-12 サンアプロ株式会社 スルホニウム塩、光酸発生剤、光硬化性組成物及びこの硬化体
JP5721630B2 (ja) 2008-10-20 2015-05-20 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ スルホニウム誘導体および潜在酸としてのその使用
KR101700980B1 (ko) 2009-02-20 2017-01-31 산아프로 가부시키가이샤 술포늄염, 광산 발생제 및 감광성 수지 조성물
US8953035B2 (en) * 2009-07-08 2015-02-10 Honda Motor Co., Ltd. Particle image velocimetry method, particle image velocimetry method for 3-dimensional space, particle image velocimetry system, and tracer particle generating device in particle image velocimetry system
US9025849B2 (en) * 2009-09-16 2015-05-05 Monash University Partical image velocimetry suitable for X-ray projection imaging
EP2478379B1 (en) * 2009-09-16 2021-05-26 4DMedical Limited Particle image velocimetry suitable for x-ray projection imaging
CN106125509B (zh) 2009-12-17 2019-12-17 帝斯曼知识产权资产管理有限公司 用于加成法制造的可led固化的液体树脂组合物
KR101666263B1 (ko) * 2011-03-07 2016-10-13 산요가세이고교 가부시키가이샤 감광성 조성물, 경화물, 및, 활성 광선 경화물의 제조 방법
EP3266815B1 (en) 2013-11-05 2021-11-03 Covestro (Netherlands) B.V. Stabilized matrix-filled liquid radiation curable resin compositions for additive fabrication
KR20160102225A (ko) * 2013-12-20 2016-08-29 코베스트로 도이칠란트 아게 개선된 감광성을 갖는 홀로그래픽 매체
US9962142B2 (en) * 2014-11-14 2018-05-08 The Regents Of The University Of California Ultrasound-based volumetric particle tracking method
JP6780225B2 (ja) * 2015-08-06 2020-11-04 株式会社リコー 活性エネルギー線硬化型立体造形用組成物、活性エネルギー線硬化型インク、組成物収容容器、像の形成方法及び形成装置、並びに成形加工品
WO2017044381A1 (en) * 2015-09-09 2017-03-16 Carbon3D, Inc. Epoxy dual cure resins for additive manufacturing
EP3567428B1 (en) 2015-10-01 2021-06-23 DSM IP Assets B.V. Liquid, hybrid uv/vis radiation curable resin compositions for additive fabrication
JP2018536731A (ja) * 2015-11-17 2018-12-13 ディーエスエム アイピー アセッツ ビー．ブイ．Ｄｓｍ Ｉｐ Ａｓｓｅｔｓ Ｂ．Ｖ． 改善された付加造形用アンチモンフリー放射線硬化性組成物およびインベストメント鋳造プロセスにおけるその用途
WO2017112653A1 (en) * 2015-12-22 2017-06-29 Carbon, Inc. Dual precursor resin systems for additive manufacturing with dual cure resins
WO2018119049A1 (en) * 2016-12-20 2018-06-28 Basf Se Photopolymer ceramic dispersion for additive fabrication
US10239255B2 (en) * 2017-04-11 2019-03-26 Molecule Corp Fabrication of solid materials or films from a polymerizable liquid
CN111526977B (zh) * 2017-12-29 2022-07-01 科思创(荷兰)有限公司 用于加成制造的组合物和制品及其使用方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5849459A (en) * 1994-11-29 1998-12-15 Teijin Seiki Co., Ltd. Resin composition for stereolithography
CN105924571A (zh) * 2016-05-19 2016-09-07 深圳长朗三维科技有限公司 连续光固化三维打印材料

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
《Application of 3D printing technology in aerodynamic study》;K Olasek，P Wiklak;《Journal of Physics》;20141231;第1-7页 *

Also Published As

Publication number Publication date
JP2021509172A (ja) 2021-03-18
US20200339718A1 (en) 2020-10-29
US11878459B2 (en) 2024-01-23
US11180594B2 (en) 2021-11-23
WO2019133349A1 (en) 2019-07-04
US20220033553A1 (en) 2022-02-03
US20240157627A1 (en) 2024-05-16
EP3732021A1 (en) 2020-11-04
JP7251715B2 (ja) 2023-04-04
CN115179544A (zh) 2022-10-14
CN115179545A (zh) 2022-10-14
KR20200104368A (ko) 2020-09-03
CN115179545B (zh) 2024-12-24
CN111526977A (zh) 2020-08-11
US12296528B2 (en) 2025-05-13
KR102864443B1 (ko) 2025-09-24
CN115179544B (zh) 2025-08-05

Similar Documents

Publication Publication Date Title
US12269933B2 (en) Stabilized matrix-filled liquid radiation curable resin compositions for additive fabrication
CN102858738B (zh) 用于加成法制造的包含三芳基锍硼酸盐阳离子光引发剂的液体可辐射固化树脂
US11878459B2 (en) Compositions and articles for additive fabrication and methods of using the same
CN104345562A (zh) 用于增材制造的低粘度液体辐射可固化的牙对准器模具树脂组合物

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
CB02 Change of applicant information

Address after: Newhagen, the Netherlands

Applicant after: Kostron (Netherlands) Co.,Ltd.

Address before: Newhagen, the Netherlands

Applicant before: MS Holdings Ltd.

CB02 Change of applicant information
TA01 Transfer of patent application right

Effective date of registration: 20211209

Address after: Newhagen, the Netherlands

Applicant after: MS Holdings Ltd.

Address before: Holland Heerlen

Applicant before: DSM IP ASSETS B.V.

TA01 Transfer of patent application right
CB02 Change of applicant information
CB02 Change of applicant information

Address after: Geleen

Applicant after: Kostron (Netherlands) Co.,Ltd.

Address before: Newhagen, the Netherlands

Applicant before: Kostron (Netherlands) Co.,Ltd.

GR01 Patent grant
GR01 Patent grant
TR01 Transfer of patent right

Effective date of registration: 20240404

Address after: American Minnesota

Patentee after: STRATASYS, Inc.

Country or region after: U.S.A.

Address before: Geleen

Patentee before: Kostron (Netherlands) Co.,Ltd.

Country or region before: Netherlands

TR01 Transfer of patent right