CN111455343A - Film coating machine and film coating control method - Google Patents
Film coating machine and film coating control method Download PDFInfo
- Publication number
- CN111455343A CN111455343A CN201910048962.7A CN201910048962A CN111455343A CN 111455343 A CN111455343 A CN 111455343A CN 201910048962 A CN201910048962 A CN 201910048962A CN 111455343 A CN111455343 A CN 111455343A
- Authority
- CN
- China
- Prior art keywords
- baffle
- coating
- assembly
- target
- area
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 35
- 239000007888 film coating Substances 0.000 title abstract description 16
- 238000009501 film coating Methods 0.000 title abstract description 16
- 238000000576 coating method Methods 0.000 claims abstract description 80
- 239000011248 coating agent Substances 0.000 claims abstract description 66
- 239000000758 substrate Substances 0.000 claims abstract description 44
- 239000013077 target material Substances 0.000 claims abstract description 14
- 239000002245 particle Substances 0.000 claims abstract description 13
- 230000033001 locomotion Effects 0.000 claims abstract description 10
- 239000000463 material Substances 0.000 claims description 12
- 238000000429 assembly Methods 0.000 claims description 8
- 230000000712 assembly Effects 0.000 claims description 8
- 239000010410 layer Substances 0.000 claims 5
- 239000011247 coating layer Substances 0.000 claims 1
- 238000007747 plating Methods 0.000 abstract description 18
- 230000008569 process Effects 0.000 abstract description 18
- 238000004544 sputter deposition Methods 0.000 abstract description 16
- 239000007789 gas Substances 0.000 description 17
- 230000005540 biological transmission Effects 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201910048962.7A CN111455343A (en) | 2019-01-18 | 2019-01-18 | Film coating machine and film coating control method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201910048962.7A CN111455343A (en) | 2019-01-18 | 2019-01-18 | Film coating machine and film coating control method |
Publications (1)
Publication Number | Publication Date |
---|---|
CN111455343A true CN111455343A (en) | 2020-07-28 |
Family
ID=71678240
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201910048962.7A Pending CN111455343A (en) | 2019-01-18 | 2019-01-18 | Film coating machine and film coating control method |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN111455343A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113265630A (en) * | 2021-06-30 | 2021-08-17 | 纳峰真空镀膜(上海)有限公司 | Coating film baffle |
CN113684451A (en) * | 2021-08-16 | 2021-11-23 | 上海济物光电技术有限公司 | Additive surface shape correcting device of silicon carbide optical lens |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103132016A (en) * | 2013-02-22 | 2013-06-05 | 京东方科技集团股份有限公司 | Membrane edge adjusting device |
CN104944793A (en) * | 2015-06-30 | 2015-09-30 | 中山市格兰特实业有限公司 | Magnetron sputtering glass coating device with adjustable sputtering range |
CN105543792A (en) * | 2015-12-11 | 2016-05-04 | 中国电子科技集团公司第四十八研究所 | Magnetron sputtering device and magnetron sputtering method |
CN105908141A (en) * | 2016-04-27 | 2016-08-31 | 芜湖真空科技有限公司 | Sputter coating mechanism |
CN105948523A (en) * | 2016-04-27 | 2016-09-21 | 芜湖真空科技有限公司 | Glass sputtering mechanism |
CN107313020A (en) * | 2017-08-18 | 2017-11-03 | 深圳市华星光电半导体显示技术有限公司 | A kind of magnetic control sputtering film plating device |
CN109023273A (en) * | 2018-08-06 | 2018-12-18 | 信阳舜宇光学有限公司 | A kind of filming equipment and film plating process |
-
2019
- 2019-01-18 CN CN201910048962.7A patent/CN111455343A/en active Pending
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103132016A (en) * | 2013-02-22 | 2013-06-05 | 京东方科技集团股份有限公司 | Membrane edge adjusting device |
CN104944793A (en) * | 2015-06-30 | 2015-09-30 | 中山市格兰特实业有限公司 | Magnetron sputtering glass coating device with adjustable sputtering range |
CN105543792A (en) * | 2015-12-11 | 2016-05-04 | 中国电子科技集团公司第四十八研究所 | Magnetron sputtering device and magnetron sputtering method |
CN105908141A (en) * | 2016-04-27 | 2016-08-31 | 芜湖真空科技有限公司 | Sputter coating mechanism |
CN105948523A (en) * | 2016-04-27 | 2016-09-21 | 芜湖真空科技有限公司 | Glass sputtering mechanism |
CN107313020A (en) * | 2017-08-18 | 2017-11-03 | 深圳市华星光电半导体显示技术有限公司 | A kind of magnetic control sputtering film plating device |
CN109023273A (en) * | 2018-08-06 | 2018-12-18 | 信阳舜宇光学有限公司 | A kind of filming equipment and film plating process |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113265630A (en) * | 2021-06-30 | 2021-08-17 | 纳峰真空镀膜(上海)有限公司 | Coating film baffle |
CN113684451A (en) * | 2021-08-16 | 2021-11-23 | 上海济物光电技术有限公司 | Additive surface shape correcting device of silicon carbide optical lens |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
CB02 | Change of applicant information | ||
CB02 | Change of applicant information |
Address after: 100076 6015, 6th floor, building 8, 9 Yingshun Road, Yinghai Town, Daxing District, Beijing Applicant after: Beijing Dingrong Photovoltaic Technology Co.,Ltd. Address before: 100176 Beijing Daxing District Beijing economic and Technological Development Zone Rongchang East Street 7 hospital 6 Building 3001 room. Applicant before: BEIJING APOLLO DING RONG SOLAR TECHNOLOGY Co.,Ltd. |
|
TA01 | Transfer of patent application right | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20210413 Address after: 518066 Room 201, building A, No. 1, Qian Wan Road, Qianhai Shenzhen Hong Kong cooperation zone, Shenzhen, Guangdong (Shenzhen Qianhai business secretary Co., Ltd.) Applicant after: Shenzhen Zhengyue development and Construction Co.,Ltd. Address before: 100076 6015, 6th floor, building 8, 9 Yingshun Road, Yinghai Town, Daxing District, Beijing Applicant before: Beijing Dingrong Photovoltaic Technology Co.,Ltd. |
|
TA01 | Transfer of patent application right | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20210924 Address after: 201203 3rd floor, no.665 Zhangjiang Road, China (Shanghai) pilot Free Trade Zone, Pudong New Area, Shanghai Applicant after: Shanghai zuqiang Energy Co.,Ltd. Address before: 518066 Room 201, building A, No. 1, Qian Wan Road, Qianhai Shenzhen Hong Kong cooperation zone, Shenzhen, Guangdong (Shenzhen Qianhai business secretary Co., Ltd.) Applicant before: Shenzhen Zhengyue development and Construction Co.,Ltd. |
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SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination |