CN111390378A - Device and method for reducing pulse number required by femtosecond laser introduction structure - Google Patents
Device and method for reducing pulse number required by femtosecond laser introduction structure Download PDFInfo
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- CN111390378A CN111390378A CN202010354304.3A CN202010354304A CN111390378A CN 111390378 A CN111390378 A CN 111390378A CN 202010354304 A CN202010354304 A CN 202010354304A CN 111390378 A CN111390378 A CN 111390378A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
- B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/0643—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising mirrors
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/70—Auxiliary operations or equipment
- B23K26/702—Auxiliary equipment
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Abstract
The invention discloses a device and a method for reducing the pulse number required by a femtosecond laser introducing structure, belonging to the field of laser processing. The method comprises the following steps: generating a first beam of femtosecond laser pulses and a second beam of femtosecond laser pulses; modulating the delay time of the first beam of femtosecond laser pulse and the second beam of femtosecond laser pulse to ensure that the second beam of femtosecond laser pulse lags behind the first beam of femtosecond laser pulse within the range of 0-150 femtoseconds; focusing the first beam of femtosecond laser pulse and the second beam of femtosecond laser pulse to a processing area in the processing material to form an anisotropic structure; wherein the first femtosecond laser pulse is used to generate nanoplasmons in the material; the second femtosecond laser pulse is used for accelerating the asymmetric growth process of the nano-plasmons. The invention effectively reduces the pulse quantity required for generating the nano grating structure, improves the generation speed of the nano grating structure, and can meet the application of optical storage and the like with high requirements on speed.
Description
Technical Field
The invention belongs to the field of laser processing, and particularly relates to a device and a method for reducing the number of pulses required by a femtosecond laser introduced structure.
Background
In recent years, femtosecond laser and its application have been greatly developed and receive more and more attention. Due to the extremely high instantaneous power density, nonlinear effects such as multiphoton absorption or multiphoton polymerization and the like can be realized in the transparent material after focusing, and the preparation method is rapidly developed in the fields of micro-nano manufacturing and the like. Fused silica is a common material in femtosecond laser processing, and three different types of structural changes can be induced in the fused silica according to different laser pulse energies. When the pulse energy is low, the refractive index of the processing region increases, and the processing region can be used for manufacturing an optical waveguide. When the energy is high, the processing area can generate small holes or cracks, and the method can be used for three-dimensional optical storage technology. When the pulse energy is in a middle range, a periodic structure can be induced in the processing area, the period of the periodic structure is usually smaller than the wavelength of the laser, and the arrangement direction is related to the polarization state of the laser, and the periodic structure is called a nano-grating structure. The nano grating structure has double refraction characteristic and high damage threshold, and may be used in making polarizing optical device and five-dimensional optical memory technology.
Currently, the method used to generate the nano-grating structure is to continuously irradiate fused quartz with femtosecond pulses with appropriate parameters. However, because an incubation process exists in the formation of the nano-grating, dozens or even hundreds of laser pulses are needed for generating the nano-grating structure, and the nano-grating structure is difficult to meet the requirements when being applied to applications with high requirements on speed, such as optical storage, and the like, and is one of the difficulties which are urgently needed to be solved in the applications of five-dimensional optical storage technology, and the like. Accordingly, there is a need for improvements in the art that enable fewer pulses to form a nanograting structure or other similar birefringent structure.
Disclosure of Invention
Aiming at the defects or improvement requirements of the prior art, the invention provides a device and a method for reducing the pulse number required by a femtosecond laser introduction structure, and aims to solve the technical problems that the conventional method for producing the nano grating needs more pulse numbers, has longer generation time and is difficult to meet the application requirements of optical storage and the like.
To achieve the above object, according to one aspect of the present invention, there is provided an apparatus for reducing the number of pulses required for a femtosecond laser to introduce a structure, comprising: the device comprises a first femtosecond laser, a second femtosecond laser, a first reflector, a second reflector, a time delay unit and an objective lens;
the first femtosecond laser is used for generating a first beam of femtosecond laser pulses; the second femtosecond laser is used for generating a second beam of femtosecond laser pulses; wherein the second beam of femtosecond laser pulses lags behind the first beam of femtosecond laser pulses;
the delay unit is used for modulating the delay time of the first beam of femtosecond laser pulse and the second beam of femtosecond laser pulse;
the first reflector is used for reflecting the first beam of femtosecond laser pulses to the objective lens;
the second reflector is used for transmitting the first beam of femtosecond laser pulse and reflecting the second beam of femtosecond laser pulse to the objective lens;
the objective lens is used for focusing the first beam of femtosecond laser pulse and the second beam of femtosecond laser pulse to a processing area inside a processing material to form an anisotropic structure; wherein the first femtosecond laser pulse is used to generate nanoplasmons in the material; the second femtosecond laser pulse is used for accelerating the asymmetric growth process of the nano-plasmons.
Further, the second femtosecond laser pulse wavelength is determined according to the size of the nano-plasmon.
Further, the second femtosecond laser pulse is within 150 femtoseconds behind the first femtosecond laser pulse.
Further, the processing material is fused silica.
Further, the anisotropic structure is a nano-grating structure.
According to another aspect of the present invention, there is provided a method of reducing the number of pulses required to introduce a structure by a femtosecond laser, comprising:
s1, generating a first beam of femtosecond laser pulse and a second beam of femtosecond laser pulse;
s2, modulating the delay time of the first beam of femtosecond laser pulse and the second beam of femtosecond laser pulse to enable the second beam of femtosecond laser pulse to lag behind the first beam of femtosecond laser pulse;
s3, focusing the first beam of femtosecond laser pulse and the second beam of femtosecond laser pulse to a processing area in the processing material to form an anisotropic structure; wherein the first femtosecond laser pulse is used to generate nanoplasmons in the material; the second femtosecond laser pulse is used for accelerating the asymmetric growth process of the nano-plasmons.
Further, the second femtosecond laser pulse wavelength is determined according to the size of the nano-plasmon.
Further, the second femtosecond laser pulse is within 150 femtoseconds behind the first femtosecond laser pulse.
Further, the processing material is fused silica.
Further, the anisotropic structure is a nano-grating structure.
In general, the above technical solutions contemplated by the present invention can achieve the following advantageous effects compared to the prior art.
(1) The invention adopts femtosecond laser pulses with two wavelengths to carry out femtosecond laser processing, wherein the wavelength of one femtosecond laser pulse is the same as that of the laser pulse which is commonly used for generating a nano grating structure; the wavelength of the other femtosecond laser pulse is selected according to the size of the nano plasmon, so that the interaction between the femtosecond laser pulse and the nano plasmon is stronger, the effect of accelerating the conversion of the nano plasmon from a spherical shape to a nano plane is achieved, the pulse quantity required for generating the nano grating structure is effectively reduced, the generation speed of the nano grating structure is increased, and the application with high requirements on speed such as optical storage and the like can be met.
(2) During the process of converting the nano plasma from a spherical shape to an ellipsoid shape or a nano plane, the processing area can also present a certain anisotropy, and can also present a birefringence characteristic. The invention is also effective when the structure without the nano grating is required to be processed (such as anisotropic nano holes), so the invention has wide application range and strong practicability.
Drawings
Fig. 1 is a schematic structural diagram of an apparatus for reducing the number of pulses required for introducing a femtosecond laser into a structure according to an embodiment of the invention.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is described in further detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention. In addition, the technical features involved in the embodiments of the present invention described below may be combined with each other as long as they do not conflict with each other.
Studies have shown that nanograting requires a hatching process to be performed. Due to the existence of some inherent defects in fused silica, when the femtosecond laser is applied to the processing area, the defects have lower ionization threshold, and some randomly distributed nano plasmons are generated in the processing area. Under the irradiation of subsequent laser pulses, the nano plasmons can be expanded continuously, and the expansion process shows obvious anisotropy according to the polarization state of the laser, so that the ellipsoidal nano plasmons are formed. The ellipsoidal plasma has an enhancement effect on an optical field, a positive feedback process is formed, and the growth of the plasma is further accelerated until the shape of a nano plane is evolved. The planes are firstly randomly distributed in a focus area, the density of electron plasmas in the nano plane is increased along with the accumulation of incident pulses, so that the excitation material has a metal-like phase and is coherent with an incident light field, the plasmas are subjected to periodic modulation, and finally the randomly distributed nano plane forms a nano grating structure.
Since the production process of the nano plasmon plays an important role in the formation of the nano grating, the acceleration of the process is expected to accelerate the formation of the nano grating. In order to accelerate this process, as shown in fig. 1, the present invention proposes an apparatus for reducing the number of pulses required for the introduction of a structure by a femtosecond laser, comprising: the device comprises a first femtosecond laser, a second femtosecond laser, a first reflector, a second reflector, a time delay unit and an objective lens; a first femtosecond laser for generating a first beam of femtosecond laser pulses; a second femtosecond laser for generating a second beam of femtosecond laser pulses; wherein the second beam of femtosecond laser pulses lags behind the first beam of femtosecond laser pulses; the delay unit is used for modulating the delay time of the first beam of femtosecond laser pulse and the second beam of femtosecond laser pulse; the first reflector is used for reflecting the first beam of femtosecond laser pulses to the objective lens; the second reflector is used for transmitting the first beam of femtosecond laser pulse and reflecting the second beam of femtosecond laser pulse to the objective lens; the objective lens is used for focusing the first beam of femtosecond laser pulse and the second beam of femtosecond laser pulse to a processing area inside a processing material to form an anisotropic structure; wherein the first femtosecond laser pulse is used to generate nanoplasmons in the material, with the same wavelength as the laser pulse typically used to generate a nanopattern structure, typically 800nm or 1030 nm; (ii) a The second femtosecond laser pulse is used for accelerating the asymmetric growth process of the nano plasmon; the processing area is the focus of the objective lens.
Studies have shown that nanoplasmonic lifetimes are around 150 femtoseconds, and therefore the relative delay of two laser pulses must be precisely controlled so that the second laser pulse lags the first laser pulse by within 150 femtoseconds. The interaction strength of the nano plasma and the optical field is related to the geometric dimension of the nano plasmon and the wavelength of incident light, so that for the second laser pulse, the wavelength is selected according to the dimension of the nano plasmon, the wavelength is far shorter than the wavelength of the first laser, for example, 3-frequency doubling of the first laser can be adopted for generation, the interaction between the first laser pulse and the nano plasmon is strongest, the conversion process of the nano plasmon from a spherical shape to a nano plane is accelerated, and the aim of accelerating the asymmetric growth process of the nano plasmon is fulfilled.
The processing material in the embodiment of the invention is fused silica, but the invention is not limited to the fused silica, and other materials capable of forming a similar anisotropic structure, such as germanium oxide glass, sapphire and the like, can be replaced in practical application.
It should be noted that during the conversion of the nanoplasmon from spherical to ellipsoidal or nanoplanar, the processed region will also exhibit some anisotropy, and can also exhibit birefringence. The present invention is equally effective when it is desired to process such structures that have not yet been formed into a nanograting, such as anisotropic nanoholes, and is therefore within the scope of the present invention.
In another aspect of the present invention, there is provided a method for reducing the number of pulses required for introducing a structure by a femtosecond laser, including:
s1, generating a first beam of femtosecond laser pulse and a second beam of femtosecond laser pulse;
s2, modulating the delay time of the first beam of femtosecond laser pulse and the second beam of femtosecond laser pulse to enable the second beam of femtosecond laser pulse to lag behind the first beam of femtosecond laser pulse;
s3, focusing the first beam of femtosecond laser pulse and the second beam of femtosecond laser pulse to a processing area in the processing material to form an anisotropic structure; wherein the first femtosecond laser pulse is used to generate nanoplasmons in the material; the second femtosecond laser pulse is used for accelerating the asymmetric growth process of the nano-plasmons. Wherein, the wavelength of the second beam of femtosecond laser pulse is determined according to the size of the nanometer plasmon; the second femtosecond laser pulse is within 150 femtoseconds behind the first femtosecond laser pulse.
It will be understood by those skilled in the art that the foregoing is only a preferred embodiment of the present invention, and is not intended to limit the invention, and that any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the scope of the present invention.
Claims (10)
1. An apparatus for reducing the number of pulses required to introduce a structure by a femtosecond laser, comprising: the device comprises a first femtosecond laser, a second femtosecond laser, a first reflector, a second reflector, a time delay unit and an objective lens;
the first femtosecond laser is used for generating a first beam of femtosecond laser pulses; the second femtosecond laser is used for generating a second beam of femtosecond laser pulses; wherein the second beam of femtosecond laser pulses lags behind the first beam of femtosecond laser pulses;
the delay unit is used for modulating the delay time of the first beam of femtosecond laser pulse and the second beam of femtosecond laser pulse;
the first reflector is used for reflecting the first beam of femtosecond laser pulses to the objective lens;
the second reflector is used for transmitting the first beam of femtosecond laser pulse and reflecting the second beam of femtosecond laser pulse to the objective lens;
the objective lens is used for focusing the first beam of femtosecond laser pulse and the second beam of femtosecond laser pulse to a processing area inside a processing material to form an anisotropic structure; wherein the first femtosecond laser pulse is used to generate nanoplasmons in the material; the second femtosecond laser pulse is used for accelerating the asymmetric growth process of the nano-plasmons.
2. An apparatus as claimed in claim 1, wherein the second femtosecond laser pulse wavelength is determined according to the size of the nanoplasmonic excimer.
3. An apparatus as claimed in claim 2, wherein said second femtosecond laser pulse is within 150 femtoseconds behind said first femtosecond laser pulse.
4. An apparatus for reducing the number of pulses required for the introduction of a structure by a femtosecond laser according to any one of claims 1 to 3, wherein the processing material is fused silica.
5. An apparatus for reducing the number of pulses required for the introduction of a structure by a femtosecond laser according to claim 4, wherein the anisotropic structure is a nano-grating structure.
6. A method for reducing the number of pulses required to introduce a structure by a femtosecond laser, comprising:
s1, generating a first beam of femtosecond laser pulse and a second beam of femtosecond laser pulse;
s2, modulating the delay time of the first beam of femtosecond laser pulse and the second beam of femtosecond laser pulse to enable the second beam of femtosecond laser pulse to lag behind the first beam of femtosecond laser pulse;
s3, focusing the first beam of femtosecond laser pulse and the second beam of femtosecond laser pulse to a processing area in the processing material to form an anisotropic structure; wherein the first femtosecond laser pulse is used to generate nanoplasmons in the material; the second femtosecond laser pulse is used for accelerating the asymmetric growth process of the nano-plasmons.
7. A method as claimed in claim 6, wherein the second femtosecond laser pulse wavelength is determined according to the size of the nanoplasmon.
8. A method as claimed in claim 7, wherein said second femtosecond laser pulse is 150 femtoseconds behind said first femtosecond laser pulse.
9. A method for reducing the number of pulses required for the introduction of a structure by a femtosecond laser according to any one of claims 6 to 8, wherein the processing material is fused silica.
10. A method as claimed in claim 9, wherein the anisotropic structure is a nano-grating structure.
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Cited By (2)
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| CN111992878A (en) * | 2020-09-14 | 2020-11-27 | 华中科技大学 | Device and method for reducing time required by femtosecond laser introduction structure |
| CN114267380A (en) * | 2021-12-24 | 2022-04-01 | 华中科技大学 | Multi-dimensional optical storage method using polyacrylonitrile as optical storage medium |
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