JP4373163B2 - Method for manufacturing optical structure - Google Patents

Method for manufacturing optical structure Download PDF

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JP4373163B2
JP4373163B2 JP2003315714A JP2003315714A JP4373163B2 JP 4373163 B2 JP4373163 B2 JP 4373163B2 JP 2003315714 A JP2003315714 A JP 2003315714A JP 2003315714 A JP2003315714 A JP 2003315714A JP 4373163 B2 JP4373163 B2 JP 4373163B2
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靖彦 下間
一之 平尾
建栄 邱
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Kyocera Corp
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本発明は、光通信等の分野に使用される偏光子、回折格子、リフレクター、フィルター、光減衰器等に適用可能な構造を備えた光学用構造体の製造方法に関するものである。 The present invention relates to a method for manufacturing an optical structure having a structure applicable to a polarizer, a diffraction grating, a reflector, a filter, an optical attenuator and the like used in the field of optical communication and the like.

従来、光アイソレーター等に使用される偏光子、光学系のレンズとして使用される回折格子、分光器等に使用されるリフレクターやフィルター、光減衰器には、種々の構造のものが提案されてきた。
特開2000−193823号 特開2001−66428号 特開2001−4817号 特開平10−282337号 特開平11−352327号 特開平11−167024号 特開2001−83321号 特開2002−311242号 特開2003−57442号 特開2003−66232号 特開平9−311237号 近藤(T. Kondo),松尾( S. Matsuo),ジュオカジス(S. Juodkazis), 三沢 (H. Misawa)著「三次元光学結晶製造のための回折ビームスプリッターを使ったフェムト秒レーザ干渉技術(Femtosecond laser interference technique with diffractive beam splitter for fabrication of three-dimensional photonic crystals)」 アプライド・フィジックス・レター(Appl. Phys. Lett.)79巻6号, 725−727頁 (2001年8月)
Conventionally, various structures have been proposed for polarizers used in optical isolators, diffraction gratings used as lenses in optical systems, reflectors and filters used in spectrometers, and optical attenuators. .
JP 2000-193823 A JP 2001-66428 A JP 2001-4817 JP-A-10-282337 JP-A-11-352327 JP-A-11-167024 JP 2001-83321 A JP 2002-311242 A JP 2003-57442 A JP 2003-66232 A JP 9-311237 A "Femtosecond laser interference technology using a diffracted beam splitter for 3D optical crystal production (Femtosecond)" by T. Kondo, S. Matsuo, S. Juodkazis, and Misawa. Laser interference technique with diffractive beam splitter for fabrication of three-dimensional photonic crystals) ”Appl. Phys. Lett. 79, 6, 725-727 (August 2001)

しかしながら、従来の素子では、いずれも光回路の集積化の点で好適なサブミクロンオーダーの微細周期構造を形成するために、真空蒸着やスパッタリング、リソグラフィー等を用いている。この場合、製造工程が複雑になり、装置構成が大がかりになり、その結果、光学素子のコストアップをもたらしてしまうという問題があった。
そこで本発明は、製造が簡便かつ迅速に行え、しかもサブミクロンオーダーの微細周期構造が簡単に実現でき、さらにその微細周期構造の方向、幅又はピッチを任意に制御でき、三次元的な周期構造を得ることが可能な、優れた光学用構造体の製造方法を提供することを目的とする。
However, all the conventional elements use vacuum deposition, sputtering, lithography, or the like in order to form a fine periodic structure on the order of submicrons suitable for integration of optical circuits. In this case, there has been a problem that the manufacturing process becomes complicated and the apparatus configuration becomes large, resulting in an increase in the cost of the optical element.
Therefore, the present invention can be manufactured easily and quickly, and a fine periodic structure on the order of submicrons can be easily realized, and the direction, width or pitch of the fine periodic structure can be arbitrarily controlled, and a three-dimensional periodic structure can be obtained. capable of obtaining, and an object thereof is to provide an excellent manufacturing how the optical structure.

パルス幅がフェムト秒オーダー(10-12〜10-15秒)のパルスレーザ光を、特定の偏光モードで光透過基材内部に集光照射することにより、集光位置のみに屈折率が変化する領域を形成することができる。このフェムト秒のパルスレーザ光の照射によって屈折率が変化する現象は、「光誘起屈折率変化」と呼ばれており、光導波路の作製の例が知られている。 By condensing and irradiating a pulsed laser beam having a pulse width of femtosecond order (10 −12 to 10 −15 seconds) inside the light transmitting substrate in a specific polarization mode, the refractive index changes only at the condensing position. Regions can be formed. This phenomenon in which the refractive index changes by irradiation with femtosecond pulsed laser light is called “photoinduced refractive index change”, and an example of manufacturing an optical waveguide is known.

本発明者は、前記光誘起屈折率変化を起こす領域に、1μm以下のピッチで屈折率の高い領域と低い領域とが繰り返し生じる周期構造が形成されることを発見した。
この周期構造において、屈折率の高い領域又は屈折率の低い領域のつながった面を「主面」と定義する。なお、屈折率の高い領域と屈折率の低い領域とは、隣接して交互に形成されるのであるから、屈折率の高い領域のつながった面を「主面」と定義しても、屈折率の低い領域のつながった面を「主面」と定義しても実質同じことである。しかし、以下、定義を明確にするために、屈折率の高い領域のつながった面を「主面」ということにする。
The inventor has found that a periodic structure in which a region having a high refractive index and a region having a low refractive index are repeatedly formed at a pitch of 1 μm or less is formed in the region causing the change in the refractive index of light.
In this periodic structure, a surface where high refractive index regions or low refractive index regions are connected is defined as a “main surface”. Note that regions with a high refractive index and regions with a low refractive index are alternately formed adjacent to each other. Therefore, even if the surface where the regions with a high refractive index are connected is defined as the “main surface”, the refractive index Even if the surface where the low region is connected is defined as the “main surface”, it is substantially the same. However, in the following, in order to clarify the definition, the connected surface of the regions having a high refractive index is referred to as “main surface”.

前記主面は、照射されたパルスレーザ光の偏光磁場方向と平行に形成される。パルスレーザ光は電磁波であるから、電場と磁場とが直交関係を保ちながら、それぞれ所定の振動数で変化しながら伝搬するという性質がある。このパルスレーザ光の磁場の方向を本明細書では「偏光磁場方向」という。
前記周期構造は、照射されたパルスレーザ光と集光位置内部で発生するプラズマとの干渉によって形成される。したがって、照射するパルスレーザ光線は1本のみでよい。
The main surface is formed parallel to the direction of the polarized magnetic field of the irradiated pulsed laser light. Since the pulse laser beam is an electromagnetic wave, it has the property of propagating while changing at a predetermined frequency while maintaining an orthogonal relationship between the electric field and the magnetic field. In this specification, the direction of the magnetic field of the pulsed laser light is referred to as “polarized magnetic field direction”.
The periodic structure is formed by interference between the irradiated pulsed laser light and plasma generated inside the focusing position. Therefore, only one pulse laser beam is required to be irradiated.

これまで報告されているように、照射するパルスレーザ光を少なくとも2本以上使用し、それらのパルスレーザ光の干渉によって周期構造を形成する例がある。本発明では、使用するパルスレーザ光線は1本のみであるため、装置構成などが極めて簡便にすることができる。
なお、ビームスプリッターなどでパルスレーザ光を少なくとも2本以上に分割し、又は2本以上のパルスレーザ光を使って、それぞれ光透過基材の別々の部位に同時照射してもよいことはもちろんである。これにより各々のパルスレーザ光の集光位置内部に、所定以下、例えば1μm以下のピッチで屈折率の高い領域と低い領域とが繰り返し生じる周期構造を、それぞれ形成することができる。
As reported so far, there is an example in which at least two pulsed laser beams to be irradiated are used and a periodic structure is formed by interference of these pulsed laser beams. In the present invention, since only one pulse laser beam is used, the apparatus configuration and the like can be extremely simplified.
Of course, the pulse laser beam may be divided into at least two beams by a beam splitter or the like, or two or more pulse laser beams may be used to simultaneously irradiate different parts of the light transmitting substrate. is there. As a result, a periodic structure in which a region having a high refractive index and a region having a low refractive index are repeatedly formed at a predetermined pitch or less, for example, 1 μm or less, can be formed in each pulse laser beam condensing position.

前記周期構造のピッチは、照射されたパルスレーザ光の波長、照射パルス数又はパルスエネルギーに依存する。
前記周期構造は、照射されるパルスレーザ光と集光位置内部で発生するプラズマとの干渉によって形成されることから、照射されるパルスレーザ光の波数ベクトルをkw、発生するプラズマの波数ベクトルをkp、形成される周期構造の屈折率の高い領域と低い領域との繰り返しの変調ベクトルをkdと置くと、運動量保存則から、次式(1)の関係が成り立つ。
The pitch of the periodic structure depends on the wavelength of the irradiated pulse laser beam, the number of irradiation pulses, or the pulse energy.
Since the periodic structure is formed by the interference between the irradiated pulse laser beam and the plasma generated inside the focusing position, the wave number vector of the pulse laser beam to be irradiated is k w and the wave vector of the generated plasma is k p, when the repetition of the modulation vector of the refractive index of high and low regions of the periodic structure formed placing the k d, the law of conservation of momentum, the following expression is established (1).

d=kp −kw (1)
ここで、照射されるパルスレーザ光の波長をλとおくと、kw =2π/λ、また周期構造のピッチをΛとおくと、kd=2π/Λの関係が成り立つ。
したがって、(1)式から、照射されるパルスレーザ光の波長λを小さくすると、kwが大きく、kdが小さくなり、その結果、周期構造のピッチΛは大きくなる。
k d = k p −k w (1)
Here, if the wavelength of the pulse laser beam to be irradiated is λ, k w = 2π / λ, and if the pitch of the periodic structure is Λ, the relationship k d = 2π / Λ is established.
Therefore, from equation (1), when the wavelength λ of the irradiated pulse laser beam is reduced, k w is increased and k d is decreased, and as a result, the pitch Λ of the periodic structure is increased.

プラズマの縦光学モードにおける周波数ωpは、
e:発生プラズマの電子密度、
e:発生プラズマの電子の電荷、
ε0:真空誘電率、
e:発生プラズマの電子質量、
κB:ボルツマン定数、
e:発生プラズマの電子温度
とすると、次式(2)で表される。
The frequency ω p in the longitudinal optical mode of the plasma is
n e : electron density of generated plasma,
e: charge of electrons in generated plasma,
ε 0 : vacuum dielectric constant,
m e : electron mass of generated plasma,
κ B : Boltzmann constant,
When T e is the electron temperature of the generated plasma, it is expressed by the following equation (2).

Figure 0004373163
Figure 0004373163

照射されるパルスレーザ光の照射パルス数及びパルスエネルギーを大きくすると、発生プラズマの電子密度ne及び発生プラズマの電子温度Teがそれらに比例して大きくなり、kpは小さくなる。その結果、周期構造の変調ベクトルkdが小さくなり、周期構造のピッチΛは大きくなる。
前記パルスレーザ光のパワー密度は、光透過基材の種類によっても異なるが、集光位置内部に所定以下のピッチで屈折率の高い領域と低い領域とが繰り返し生じた本発明の周期構造を形成するためには、108W/cm2以上が好ましい。
Increasing the irradiation pulse number and pulse energy of the pulsed laser light irradiation, electron density n e and generating plasma electron temperature T e of the generated plasma is increased in proportion to their, k p decreases. As a result, the modulation vector k d of the periodic structure is reduced, and the pitch Λ of the periodic structure is increased.
The power density of the pulsed laser light varies depending on the type of the light transmissive substrate, but the periodic structure of the present invention is formed in which a region having a high refractive index and a region having a low refractive index are repeatedly generated at a predetermined pitch or less inside the condensing position. In order to achieve this, 10 8 W / cm 2 or more is preferable.

ここで、パワー密度は、パルスレーザ光の、「出力エネルギーのピーク値(J)/パルス幅(秒)」で表される出力パワー(W)を、照射単位面積あたりで割って表した値である。パワー密度が108W/cm2に満たないと、集光位置内部に有効な周期構造が形成されないことがある。パルスエネルギーが高いほど屈折率の高い領域と低い領域の繰り返しが鮮明(屈折率差が大)になる。 Here, the power density is a value expressed by dividing the output power (W) represented by “peak value of output energy (J) / pulse width (second)” per unit irradiation area of the pulse laser beam. is there. If the power density is less than 10 8 W / cm 2 , an effective periodic structure may not be formed inside the condensing position. The higher the pulse energy, the clearer the repetition of the high and low refractive index regions (the larger the difference in refractive index).

しかし、過大に大きなパルスエネルギー量のレーザ光を照射すると、熱的な効果により、集光位置には空洞欠陥が形成される。このため、光透過基材の組成によっても異なるが、パルスレーザ光のパワー密度が、集光位置内部に所定以下、例えば1μm以下の周期構造が形成される閾値と、空洞欠陥が形成される閾値との間になるように、繰り返し周波数によって調整するとよい。具体的には、生産性も考慮すると、一定時間(例えば1秒)でのパルスレーザ光の繰り返し周波数のとりうる下限は1Hz、好ましくは10kHz、さらに好ましくは100kHzに設定し、とりうる上限は100MHzに設定する。なお、前記パルスレーザ光は、単一ショットの光パルスでもよい。   However, when a laser beam having an excessively large pulse energy amount is irradiated, a cavity defect is formed at the condensing position due to a thermal effect. For this reason, although it depends on the composition of the light-transmitting substrate, the threshold at which the power density of the pulse laser beam is a predetermined value or less, for example, 1 μm or less, is formed inside the condensing position, and the threshold at which a cavity defect is formed It is good to adjust by repetition frequency so that it may be between. Specifically, considering productivity, the lower limit of the repetition frequency of the pulsed laser light in a certain time (for example, 1 second) is set to 1 Hz, preferably 10 kHz, more preferably 100 kHz, and the upper limit that can be taken is 100 MHz. Set to. The pulsed laser light may be a single shot light pulse.

なお、高い繰り返し周波数のパルスレーザ光あっても、光誘起屈折率変化を起こすパワー密度を得ることができれば、集光位置内部に所定以下の周期構造を形成できる。逆に、10kHz以下の低い繰り返し周波数のパルスレーザ光あっても、NDフィルターなどを使用して、空洞欠陥が形成されるパワー密度の閾値以下に、パワー密度を調整することによって、集光位置内部に所定以下の周期構造を形成できる。   In addition, even with pulsed laser light having a high repetition frequency, if a power density that causes a photoinduced refractive index change can be obtained, a periodic structure of a predetermined value or less can be formed inside the condensing position. Conversely, even in the case of pulsed laser light having a low repetition frequency of 10 kHz or less, by using a ND filter or the like, the power density is adjusted below the power density threshold at which cavity defects are formed, so A periodic structure having a predetermined value or less can be formed.

パルスレーザ光のエネルギーを、集光位置内部に所定以下の周期構造が形成される閾値と、空洞欠陥が形成される閾値との間に調整し、さらに周期のピッチが均等でかつ主面の幅が同一でかつ方向が同一方向に規則正しく並んだ、周期性が良好な周期構造を形成するためには、光透過基材の種類によっても異なるが、照射するパルスレーザ光の1パルスあたりのエネルギーを0.1μJ/pulse〜10μJ/pulseの間に調整することが望ましい。   The energy of the pulsed laser beam is adjusted between the threshold value at which a predetermined or less periodic structure is formed inside the focusing position and the threshold value at which a cavity defect is formed, and the periodic pitch is uniform and the width of the main surface In order to form a periodic structure with the same periodicity in the same direction and good periodicity, the energy per pulse of the pulsed laser light to be irradiated is different depending on the type of the light transmitting substrate. It is desirable to adjust between 0.1 μJ / pulse and 10 μJ / pulse.

パルスレーザ光は、レンズ等の集光素子により集光される。前記周期構造を有する領域の形状は、基本的には球状である。前記光誘起屈折率変化が起きるパルスエネルギーを有するパルスレーザ光は、光透過基材を伝播中に3次の非線形光学効果である空間カー効果(Kerr effect)を受けて、パルスレーザ光の集光位置の形状は、望ましくは球に集光され、その球の直径は0.1μmから1mmの範囲が好適である。   The pulse laser beam is condensed by a condensing element such as a lens. The shape of the region having the periodic structure is basically spherical. The pulse laser beam having the pulse energy causing the light-induced refractive index change is subjected to a spatial Kerr effect which is a third-order nonlinear optical effect while propagating through the light-transmitting substrate, thereby condensing the pulse laser beam. The shape of the position is preferably focused on a sphere, and the diameter of the sphere is preferably in the range of 0.1 μm to 1 mm.

このときの集光位置を光透過基材に対して一定方向に連続的に相対移動させることとすれば、前記周期構造を有する領域が断面円形のひも状、又は円柱状に延びた光学用構造体を作製することができる。
また、この集光位置を光透過基材に対して所定間隔でかつ一定方向に断続的に相対移動させることにより、前記周期構造を有する球状の領域が複数、繰り返し並設された、いわば二重周期構造を持つ光学素子を作製することができる。
If the condensing position at this time is continuously moved relative to the light-transmitting substrate in a fixed direction, the optical structure in which the region having the periodic structure extends in a string having a circular cross section or a columnar shape. The body can be made.
In addition, a plurality of spherical regions having the periodic structure are repeatedly arranged in parallel by intermittently moving the light collection position at a predetermined interval and in a fixed direction with respect to the light-transmitting base material. An optical element having a periodic structure can be manufactured.

また前記集光位置を、光透過基材に対して所定間隔でかつ一定方向に連続的に相対移動させることにより、断面円形のひも状、又は円柱状の周期構造が複数、繰り返し並設された、いわば二重周期構造を持つ光学素子を作製することができる。
これらの二重周期構造を、光透過基材内に3次元的に形成すれば、多波長の光信号に対して、回折効果、偏光効果、複屈折効果を同時に得ることができる。
Further, a plurality of periodic structures having a circular cross-section or a columnar shape are repeatedly arranged side by side by continuously moving the condensing position at a predetermined interval and in a fixed direction with respect to the light-transmitting substrate. In other words, an optical element having a double periodic structure can be produced.
If these double periodic structures are three-dimensionally formed in a light-transmitting substrate, a diffraction effect, a polarization effect, and a birefringence effect can be simultaneously obtained for a multiwavelength optical signal.

複屈折効果は、一般にガラス材料では、構造が等方的であるため、発現しない。ところが前記所定以下のピッチで屈折率の高い領域と低い領域とが繰り返し生じる周期構造が形成されることにより、複屈折効果が発現しない等方性材料に対して、この複屈折効果を付与することができる。
前記所定以下のピッチで屈折率の高い領域と低い領域とが繰り返し生じる周期構造が複数、繰り返し並設された二重周期構造を持つ光学素子に、波長多重された光を入射すると、二重周期構造に依存して、特定波長の反射率を増加させることができる。
The birefringence effect is generally not manifested in glass materials because the structure is isotropic. However, this birefringence effect is imparted to an isotropic material that does not exhibit a birefringence effect by forming a periodic structure in which a region having a high refractive index and a region having a low refractive index are repeatedly generated at a pitch equal to or less than the predetermined pitch. Can do.
When a wavelength-multiplexed light is incident on an optical element having a double periodic structure in which a plurality of periodic structures in which a region having a high refractive index and a region having a low refractive index are repeatedly generated at a predetermined pitch or less are repeatedly arranged in parallel, Depending on the structure, the reflectance of a specific wavelength can be increased.

以上説明したように、本発明の光学用構造体の製造方法によれば、集光位置内に所定以下のピッチで屈折率の高い領域と低い領域とが繰り返し生じる周期構造を形成することができる。この構造体を光透過基材内部の任意の位置に作製することができ、この光学用構造体に対して、所定の波長領域の光信号を入射すると、偏光効果や干渉・回折効果が得られる。
さらに、本発明の光学用構造体の製造方法によれば、本来複屈折現象を示さない光透過基材等の等方性材料に形成し、複屈折現象を生じさせることができ、光アイソレーター等の偏光子として機能させることができる。
As described above, according to the method for manufacturing an optical structure of the present invention, it is possible to form a periodic structure in which a region having a high refractive index and a region having a low refractive index are repeatedly generated at a predetermined pitch or less in a condensing position. . This structure can be produced at an arbitrary position inside the light-transmitting substrate. When an optical signal in a predetermined wavelength region is incident on this optical structure, a polarization effect and interference / diffraction effect can be obtained. .
Furthermore, according to the method for producing an optical structure of the present invention, it can be formed on an isotropic material such as a light-transmitting substrate that does not inherently exhibit a birefringence phenomenon, and a birefringence phenomenon can be caused, such as an optical isolator. It can function as a polarizer.

さらに、本発明の光学用構造体の製造方法によれば、この二重周期を有する光学用構造体に対して、波長多重された光を入射することにより、前記周期構造に依存した特定波長の反射率を増加させることができ、特定波長の光のみを反射するリフレクターやフィルター、光減衰器として機能する。
本発明の光学用構造体の製造方法によれば、光透過基材に集光されるパルスレーザ光と、その集光位置内部に発生するプラズマとの干渉を利用することにより、1本のパルスレーザ光を照射するだけで、複雑な工程を経ることなく、しかも簡単に、所定以下のピッチで屈折率の高い領域と低い領域とが繰り返し生じた周期構造を有する領域が形成された光学用構造体を製造することができる。
Furthermore, according to the method for manufacturing an optical structure of the present invention, the wavelength-multiplexed light is incident on the optical structure having the double period, thereby having a specific wavelength depending on the periodic structure. The reflectance can be increased, and it functions as a reflector, filter, or optical attenuator that reflects only light of a specific wavelength.
According to the method for manufacturing an optical structure of the present invention, a single pulse is obtained by utilizing interference between a pulsed laser beam focused on a light-transmitting substrate and plasma generated inside the focused position. An optical structure in which a region having a periodic structure in which a region having a high refractive index and a region having a low refractive index are repeatedly generated at a predetermined pitch or less simply by irradiating a laser beam without any complicated process. The body can be manufactured.

前記光学用構造体は、光通信に使用される光信号の偏光方向の制御素子、回折効果を奏する光学素子もしくは特定波長の光信号を反射するリフレクター・フィルター、光減衰器等の光学素子として応用することができる。   The optical structure is applied as a control element for the polarization direction of an optical signal used for optical communication, an optical element having a diffraction effect, a reflector filter for reflecting an optical signal of a specific wavelength, or an optical element such as an optical attenuator. can do.

図1に本発明に係る光学用構造体の製造装置の模式図を示す。
光学用構造体の製造装置は、励起光を発生する励起光発生部3、励起光に基づきパルスレーザ光を発生するパルス光発生部4、パルスレーザ光を増幅する光増幅部5を備えている。
励起光発生部3は、Ar等の気体レーザやGaAs等の半導体レーザで構成される。
FIG. 1 is a schematic view of an optical structure manufacturing apparatus according to the present invention.
The optical structure manufacturing apparatus includes an excitation light generator 3 that generates excitation light, a pulse light generator 4 that generates pulse laser light based on the excitation light, and an optical amplifier 5 that amplifies the pulse laser light. .
The excitation light generator 3 is composed of a gas laser such as Ar or a semiconductor laser such as GaAs.

パルス発生部4は、Ti:Al23(チタンをドープしたサファイア結晶)レーザで構成される。Ti:Al23レーザは、そのモードロック機構により、パルス幅がフェムト秒オーダー(10-12から10-15秒)のパルス光を発振する。パルス光の波長は可変(100nm〜2000nm)であるが、パルスレーザ光がガラス材料1を透過できるように、例えば800nmに設定している。 The pulse generator 4 is composed of a Ti: Al 2 O 3 (titanium-doped sapphire crystal) laser. The Ti: Al 2 O 3 laser oscillates pulsed light having a pulse width of the order of femtoseconds (10 −12 to 10 −15 seconds) by its mode lock mechanism. The wavelength of the pulsed light is variable (100 nm to 2000 nm), but is set to, for example, 800 nm so that the pulsed laser light can pass through the glass material 1.

光増幅部5は、QスイッチNd:YAGレーザ等の結晶固体レーザで構成される。
光増幅部5から出力されるパルスレーザ光は、ミラー9で反射され、直線偏光板8によって直線偏光が取り出され、レンズ等の集光部材6により、ガラス材料1の表面又は内部に集光される。前記ガラス材料1は、XYZ方向に走査可能な電動ステージ7上に設置されている。
The optical amplifying unit 5 is composed of a crystal solid laser such as a Q switch Nd: YAG laser.
The pulse laser beam output from the optical amplifying unit 5 is reflected by the mirror 9, linearly polarized light is extracted by the linearly polarizing plate 8, and is condensed on the surface or inside of the glass material 1 by the condensing member 6 such as a lens. The The glass material 1 is installed on an electric stage 7 capable of scanning in the XYZ directions.

直線偏光板8の役割を説明すると、光増幅部5から出力されるパルスレーザ光の偏光は、一般に直線偏光であるが、直線偏光板8を光路上に挿入することによって、偏光を揃えたり、その偏光角度を自由に変えたりすることが可能になる。
パルスレーザ光が照射されるガラス材料1には、酸化物ガラス、ハロゲン化物ガラス、カルコゲナイドガラス等のガラス材料、その他、サファイア、水晶等の結晶材料が使用される。酸化物ガラスには、例えばケイ酸塩系、硼酸塩系、燐酸塩系、弗燐酸塩系、ビスマス系等があり、ハロゲン化物ガラスにはBeF2系、ZrF4系、InF3系、Cd−Zn−Cl系等があり、硫化物ガラスにはGa−La−S系等があり、カルコゲナイドガラスにはS−As系等がある。
The role of the linearly polarizing plate 8 will be described. The polarization of the pulsed laser light output from the optical amplifying unit 5 is generally linearly polarized light. By inserting the linearly polarizing plate 8 in the optical path, The polarization angle can be freely changed.
As the glass material 1 to which the pulse laser beam is irradiated, glass materials such as oxide glass, halide glass and chalcogenide glass, and crystal materials such as sapphire and quartz are used. Examples of the oxide glass include silicate-based, borate-based, phosphate-based, fluorophosphate-based, and bismuth-based glasses, and halide glasses include BeF 2 -based, ZrF 4 -based, InF 3 -based, and Cd- There are Zn-Cl system, sulfide glass includes Ga-La-S system, and chalcogenide glass includes S-As system.

ガラス材料1の表面又は内部の集光位置に対して、108W/cm2以上のパワー密度を有するパルスレーザ光が集められることになるため、集光位置内部に光誘起屈折率変化の現象が起きる。その結果、ほぼ球状の屈折率変化領域が形成される。屈折率変化領域の大きさは、集光部材6の性能やパルスレーザ光の波長、パルスエネルギーによって決まるが、1μmから1mmの範囲内である。 Since the pulse laser beam having a power density of 10 8 W / cm 2 or more is collected with respect to the condensing position on the surface of glass material 1 or inside, the phenomenon of light-induced refractive index change inside the condensing position. Happens. As a result, a substantially spherical refractive index change region is formed. The size of the refractive index changing region is determined by the performance of the condensing member 6, the wavelength of the pulse laser beam, and the pulse energy, but is in the range of 1 μm to 1 mm.

さらに、屈折率変化領域の内部で、1μm以下(サブミクロン)のピッチで屈折率の高い領域と低い領域とが繰り返し存在する周期構造が形成される。
図2A〜図2Cは、屈折率変化領域内に形成される周期構造を示す断面図である。
屈折率変化領域S内には、屈折率が高い領域17と屈折率が低い領域18とが周期的に交互に形成される。その周期のピッチをP、屈折率が高い領域17の幅をLで表す。ピッチPや幅Lは、照射するパルスレーザ光の偏光方向、波長、照射パルス数、パルスエネルギー等に依存するため、これらを変数として設定することにより、任意の波長領域の光信号に適した周期構造を作製することができる。
Furthermore, a periodic structure is formed in which a region having a high refractive index and a region having a low refractive index are repeatedly present at a pitch of 1 μm or less (submicron) within the refractive index changing region.
2A to 2C are cross-sectional views showing a periodic structure formed in the refractive index changing region.
Within the refractive index changing region S, regions 17 having a high refractive index and regions 18 having a low refractive index are periodically and alternately formed. The pitch of the period is represented by P, and the width of the region 17 having a high refractive index is represented by L. Since the pitch P and the width L depend on the polarization direction, wavelength, number of irradiation pulses, pulse energy, etc. of the pulsed laser light to be irradiated, by setting these as variables, a period suitable for an optical signal in an arbitrary wavelength region A structure can be made.

図2Aは、磁場方向が水平偏光のパルスレーザ光を紙面に垂直に照射して形成した周期構造の状態を示す。球状の屈折率変化領域S(その直径をDで示す)内に形成される周期構造のうち、屈折率が高い領域17をつないだ面(主面という)は、磁場の偏光方向に平行に、輪切り状態で形成される。
図2Bは、パルスレーザ光を紙面右から水平に照射した場合の、周期構造の形成状態を示す。パルスレーザ光は、紙面に垂直である。
FIG. 2A shows a state of a periodic structure formed by irradiating a pulse laser beam whose magnetic field direction is horizontally polarized perpendicularly to the paper surface. Of the periodic structure formed in the spherical refractive index changing region S (whose diameter is indicated by D), the surface (referred to as the main surface) connecting the region 17 having a high refractive index is parallel to the polarization direction of the magnetic field, It is formed in a ring-cut state.
FIG. 2B shows a formation state of the periodic structure when the pulse laser beam is irradiated horizontally from the right side of the drawing. The pulse laser beam is perpendicular to the paper surface.

図2Cは、パルスレーザ光を紙面下方から上方に照射した場合の、周期構造の形成状態を示す。
主面の形成方向と、パルスレーザ光の偏光との関係を図3A及び図3Bに示す。図3Aには、磁場方向が水平偏光のパルスレーザ光を紙面に垂直に照射して形成した周期構造の状態が示され、図3Bには、磁場方向が垂直偏光のパルスレーザ光を紙面に垂直に照射して形成した周期構造の状態が示されている。このように、屈折率が高い領域17で構成される主面の方向は、偏光磁場の方向と同一方向となる。
FIG. 2C shows a formation state of the periodic structure when the pulse laser beam is irradiated from the lower side to the upper side of the drawing.
The relationship between the main surface formation direction and the polarization of the pulsed laser beam is shown in FIGS. 3A and 3B. FIG. 3A shows a state of a periodic structure formed by irradiating a pulse laser beam whose magnetic field direction is horizontally polarized perpendicularly to the paper surface, and FIG. 3B shows that a pulse laser beam whose magnetic field direction is vertically polarized is perpendicular to the paper surface. The state of the periodic structure formed by irradiation is shown. Thus, the direction of the main surface constituted by the region 17 having a high refractive index is the same as the direction of the polarization magnetic field.

かくして、本発明の実施形態によれば、屈折率変化領域内に、サブミクロンオーダーで屈折率が変化する周期構造を形成することができる。この周期構造の周期の方向は、照射するパルスレーザ光の偏光磁場方向を設定することによって、任意の方向に設定することが可能である。
図4A〜図4Cは、照射するパルスレーザ光の偏光方向、波長、照射パルス数、パルスエネルギー等を設定することによって、前記周期構造の主面の方向又はその周期のピッチPを変えて作製した屈折率変化領域Sの構造を示す断面図である。
Thus, according to the embodiment of the present invention, it is possible to form a periodic structure in which the refractive index changes in the submicron order in the refractive index change region. The direction of the period of this periodic structure can be set to an arbitrary direction by setting the direction of the polarization magnetic field of the pulse laser beam to be irradiated.
4A to 4C are produced by changing the direction of the principal surface of the periodic structure or the pitch P of the period by setting the polarization direction, wavelength, number of irradiation pulses, pulse energy, etc. of the pulsed laser light to be irradiated. 3 is a cross-sectional view showing a structure of a refractive index changing region S. FIG.

図4Aの屈折率変化領域Sは、主面の方向が水平に形成されている。これに対して、波長多重された信号光を垂直に入射している。図4Bの屈折率変化領域Sは、周期のピッチPは図4Aと同一であるが、主面の方向が垂直に形成されている。この主面に対して、波長多重された信号光を平行に入射している。図4Cは、主面に対して、波長多重された信号光を垂直に入射することは、図4Aと同一であるが、周期のピッチPが異なる場合を示す。   In the refractive index changing region S of FIG. 4A, the direction of the main surface is formed horizontally. On the other hand, wavelength-multiplexed signal light is incident vertically. In the refractive index changing region S in FIG. 4B, the pitch P of the period is the same as that in FIG. 4A, but the direction of the main surface is formed perpendicularly. Wavelength multiplexed signal light is incident in parallel to this main surface. FIG. 4C shows the case where the wavelength-multiplexed signal light is perpendicularly incident on the main surface as in FIG. 4A, but the period pitch P is different.

これらの、波長多重された信号光の入射角度の相違、又はピッチPの相違によって、主面に対する入射角度及びピッチPに依存して、特定の波長の反射率を増加させる効果が期待できる。具体的には、図4Aから反射される反射光A、図4Bから反射される反射光B、図4Cから反射される反射光Cは、それぞれ異なる波長の光である。
いままでは、単独の屈折率変化領域が形成される場合を示したが、屈折率変化領域は複数形成されてもよい。また、屈折率変化領域の形状も球状とは限らない。
Depending on the difference in the incident angle of the wavelength-multiplexed signal light or the difference in the pitch P, an effect of increasing the reflectance of a specific wavelength can be expected depending on the incident angle and the pitch P with respect to the main surface. Specifically, the reflected light A reflected from FIG. 4A, the reflected light B reflected from FIG. 4B, and the reflected light C reflected from FIG. 4C are light of different wavelengths.
Although the case where a single refractive index change region is formed is shown as it is, a plurality of refractive index change regions may be formed. Further, the shape of the refractive index change region is not necessarily spherical.

図1において、ガラス材料1にレーザ光を当てた後、レーザ光をオフして、ガラス材料を、X、Y、Z方向に所定距離移動させ、またレーザ光を当てることを繰り返せば、ガラス材料1の表面又はガラス材料1内に、前記周期構造を有する球状の屈折率変化領域を複数個、離散的に繰り返し設定することができる。
レーザ光を当てながらガラス材料を、X、Y、Z方向に所定距離連続的に移動させることによって、ガラス材料1の表面又はガラス材料1内に、前記周期構造を有する屈折率変化領域を、円柱状又は断面円形の曲線ひも状に形成することもできる。
In FIG. 1, after applying the laser beam to the glass material 1, the laser beam is turned off, the glass material is moved by a predetermined distance in the X, Y, and Z directions, and the laser beam is repeatedly applied. A plurality of spherical refractive index changing regions having the periodic structure can be set discretely and repeatedly in one surface or glass material 1.
By continuously moving the glass material by a predetermined distance in the X, Y, and Z directions while applying the laser beam, the refractive index changing region having the periodic structure is formed on the surface of the glass material 1 or in the glass material 1. It can also be formed in the shape of a curved string having a columnar shape or a circular cross section.

また、レーザ光を当てながらガラス材料1をX、Y又はZ方向から選ばれるいずれか一方向に連続的に移動させ、移動が終わると、レーザ光をオフして他の方向に所定距離ずつ断続的に移動させて、再度レーザ光をオンして前記一方向の連続的移動を繰り返せば、ガラス材料1上又はガラス材料1内に、円柱状の屈折率変化領域を複数個繰り返し設定することができる。   In addition, the glass material 1 is continuously moved in any one direction selected from the X, Y, and Z directions while irradiating the laser beam. When the movement is finished, the laser beam is turned off, and the laser beam is turned off and interrupted by a predetermined distance in the other direction. If the laser beam is turned on again and the laser beam is turned on again and the continuous movement in one direction is repeated, a plurality of columnar refractive index changing regions can be repeatedly set on or in the glass material 1. it can.

さらに、いずれか任意の方向に曲線状に連続的に移動させ、移動が終わると、レーザ光をオフして他の方向に所定距離ずつ断続的に移動させて、再度レーザ光をオンして前記曲線状の移動を繰り返せば、ガラス材料1の表面又はガラス材料1内に、断面円形の曲線ひも状の屈折率変化領域を複数個繰り返し設定することができる。
このように、屈折率変化領域を、所定間隔でかつ一定方向に複数個並設することによって、屈折率が二重周期的に変化する光学用構造体をガラス基板内の任意の場所に作製することができる。前記「所定間隔」は、例えば1μmから1mmの範囲内とすることができる。
In addition, it is continuously moved in a curved shape in any direction, and when the movement is finished, the laser beam is turned off and moved intermittently by a predetermined distance in the other direction. If the curved movement is repeated, a plurality of refractive index change regions having a circular cross-section having a circular cross section can be set on the surface of the glass material 1 or in the glass material 1.
In this way, by arranging a plurality of refractive index changing regions in parallel at a predetermined interval and in a fixed direction, an optical structure whose refractive index changes in a double cycle is produced at an arbitrary location in the glass substrate. be able to. The “predetermined interval” can be set within a range of 1 μm to 1 mm, for example.

この二重周期を有する光学用構造体に対して、図5に示すように、任意の波長、任意の偏光の光信号を入射すると、波長ごとに所定の方向に回折させると同時に、一定の偏光を取り出す回折格子・偏光子としての効果が期待できる。さらに、このようにして構成した偏光子を2個用いてファラデー回転子を挟んで光アイソレーターとして機能させることも可能である。   As shown in FIG. 5, when an optical signal having an arbitrary wavelength and an arbitrary polarization is incident on this optical structure having a double period, it is diffracted in a predetermined direction for each wavelength, and at the same time a constant polarization Expected to be effective as a diffraction grating / polarizer. Furthermore, it is possible to function as an optical isolator with two Faraday rotators sandwiched between two polarizers thus configured.

前記周期構造の主面の方向・ピッチPを一層ごとに変えて、図6に示すように3次元的に積層させた構造にすることによって、本発明の光学用構造体を、波長多重された光信号から、特定の波長のみを高効率に反射させるリフレクター・フィルターとして機能させることも可能である。
なお、上述した実施形態はごく一例にすぎず、本発明の要旨を逸脱しない範囲で適宜変更実施が可能である。
The optical structure of the present invention was wavelength-multiplexed by changing the direction / pitch P of the principal surface of the periodic structure for each layer to form a three-dimensionally laminated structure as shown in FIG. It is also possible to function as a reflector filter that reflects only a specific wavelength from an optical signal with high efficiency.
It should be noted that the above-described embodiment is merely an example, and modifications can be appropriately made without departing from the gist of the present invention.

<実施例1>
10mm×10mm×5mmの石英ガラス基板10に屈折率変化領域を複数個、繰り返し設定した。図7に示すように、パルスレーザ光11をレンズ12で集光し、石英ガラス基板10に対して、パルスレーザ光11の集光位置13が、石英ガラス基板10の内部に位置するように照射した。パルスレーザ光としては、アルゴンレーザー励起のTi:Al23レーザから発振されたパルス幅150フェムト秒、繰り返し周波数200kHz、波長800nm、平均出力600mW、水平偏光磁場のレーザを使用した。照射時間は、一集光位置あたり4秒である。
<Example 1>
A plurality of refractive index change regions were repeatedly set on a 10 mm × 10 mm × 5 mm quartz glass substrate 10. As shown in FIG. 7, the pulse laser beam 11 is condensed by the lens 12 and irradiated to the quartz glass substrate 10 so that the condensing position 13 of the pulse laser beam 11 is located inside the quartz glass substrate 10. did. As the pulse laser beam, a laser having a pulse width of 150 femtoseconds, a repetition frequency of 200 kHz, a wavelength of 800 nm, an average output of 600 mW, and a horizontally polarized magnetic field oscillated from an argon laser-excited Ti: Al 2 O 3 laser was used. The irradiation time is 4 seconds per focusing position.

集光位置13内には、1μm以下のピッチで屈折率が異なる第1領域と第2領域とが交互に繰り返し生じる縞状の周期構造が形成された。
このようにして形成された周期構造を構成する屈折率変化領域の直径は約2μm、周期構造のピッチPは200nm、第1領域の幅Lは約30nm、第2領域の幅は約170nmであった。
In the condensing position 13, a striped periodic structure in which first regions and second regions having different refractive indexes with a pitch of 1 μm or less are alternately generated was formed.
The refractive index changing region constituting the periodic structure thus formed has a diameter of about 2 μm, the pitch P of the periodic structure is 200 nm, the width L of the first region is about 30 nm, and the width of the second region is about 170 nm. It was.

第1領域は、酸素欠陥が生じており、SiO2-x(0<x<2)の組成に変化するため、周囲の屈折率(周期構造を除くガラス基板の屈折率)に対して、屈折率が高くなると考えられる。また第2領域は、第1領域から酸素が移動し、構造中に取り込まれ、SiO2+xの組成に変化するため、周囲の屈折率(周期構造を除くガラス基板の屈折率)に対して、屈折率が同程度もしくは低くなると考えられる。しかし、酸素が減ることによって屈折率が下がるということも考えられ、酸素が増えることによって屈折率が上がるということも考えられる。したがって、酸素と屈折率の関係は、現段階では確定したことが言えない。しかし第1領域、第2領域において、屈折率の変化が起こっていることは間違いない。 The first region has oxygen defects and changes to the composition of SiO 2−x (0 <x <2). Therefore, the first region is refracted relative to the surrounding refractive index (the refractive index of the glass substrate excluding the periodic structure). The rate is likely to be high. In the second region, oxygen moves from the first region, is taken into the structure, and changes to the composition of SiO 2 + x , so that the refractive index of the surroundings (the refractive index of the glass substrate excluding the periodic structure) The refractive index is considered to be the same or lower. However, it is conceivable that the refractive index decreases as oxygen decreases, and the refractive index increases as oxygen increases. Therefore, it cannot be said that the relationship between oxygen and refractive index has been established at this stage. However, there is no doubt that the refractive index changes in the first region and the second region.

前記屈折率変化領域の大きさDは、照射するパルスレーザ光のパルスエネルギー、集光する際のレンズの倍率によって、約1〜約100μmの範囲で可変であり、第1領域及び第2領域の幅は、照射するパルスレーザ光の波長、照射パルス数、パルスエネルギー及びガラス基板の屈折率によって、第1領域の幅Lは約10〜50nm、第2領域の幅は約50〜190nmの範囲で可変である。   The size D of the refractive index changing region is variable in the range of about 1 to about 100 μm depending on the pulse energy of the pulse laser beam to be irradiated and the magnification of the lens at the time of focusing. The width of the first region is about 10 to 50 nm, and the width of the second region is about 50 to 190 nm, depending on the wavelength of the pulse laser beam to be irradiated, the number of irradiation pulses, the pulse energy, and the refractive index of the glass substrate. It is variable.

前記集光位置13を石英ガラス基板10内に対して所定間隔でX、Y、Z方向に断続的に相対移動させると(照射時間は、1集光位置あたり4秒)、図8Aに示すように、球状の屈折率変化領域14が繰り返し、設定される。この屈折率変化領域14が繰り返し設定された石英ガラス基板10の平面図を図8Bに示す。
パルスレーザ光11を、X、Y方向に、断続的に相対移動させ、かつZ方向に連続的に相対移動(Z方向の相対移動速度は100μm/sec)させると、図9Aに示すように円柱状の屈折率変化領域15が繰り返し、設定される。この円柱状の屈折率変化領域15が繰り返し設定された石英ガラス基板10の平面図を図9Bに示す。
When the light condensing position 13 is intermittently moved relative to the quartz glass substrate 10 at predetermined intervals in the X, Y, and Z directions (irradiation time is 4 seconds per light condensing position), as shown in FIG. 8A. In addition, the spherical refractive index change region 14 is set repeatedly. FIG. 8B shows a plan view of the quartz glass substrate 10 in which the refractive index change region 14 is repeatedly set.
When the pulse laser beam 11 is intermittently relatively moved in the X and Y directions and continuously moved in the Z direction (the relative movement speed in the Z direction is 100 μm / sec), a circular shape is obtained as shown in FIG. 9A. The columnar refractive index change region 15 is repeatedly set. FIG. 9B shows a plan view of the quartz glass substrate 10 in which the columnar refractive index change region 15 is repeatedly set.

さらに、パルスレーザ光11をXから60°(Yから30°)方向に、断続的に相対移動させ、かつZ方向に連続的に前記速度で相対移動させると、図10に示すような、円柱状の屈折率変化領域15が三角格子状に設定された石英ガラス基材10を作製することができる。
パルスレーザ光11を、X方向に、断続的に相対移動させ、かつY方向に連続的に相対移動(Y方向の相対移動速度は100μm/sec)させると、図11Aに示すように円柱状の屈折率変化領域16が繰り返し、設定される。この円柱状の屈折率変化領域16が繰り返し設定された石英ガラス基板10の平面図を図11Bに示す。
Further, when the pulse laser beam 11 is intermittently relatively moved in the direction from X to 60 ° (Y to 30 °) and continuously in the Z direction at the above speed, a circle as shown in FIG. The quartz glass substrate 10 in which the columnar refractive index change regions 15 are set in a triangular lattice shape can be produced.
When the pulse laser beam 11 is intermittently relatively moved in the X direction and continuously moved in the Y direction (the relative movement speed in the Y direction is 100 μm / sec), as shown in FIG. The refractive index changing region 16 is set repeatedly. FIG. 11B shows a plan view of the quartz glass substrate 10 on which the cylindrical refractive index change region 16 is repeatedly set.

<実施例2>
前記実施例1と同じく、10mm×10mm×5mmの石英ガラス基板10の内部に、パルスレーザ光11の集光位置が位置するように照射した。パルスレーザ光の照射条件は前記実施例1と同じである。
ただし、図1に示した直線偏光板8によって、照射するパルスレーザ光の偏光方向(磁場)を水平偏光もしくは垂直偏光に変えて照射した。
<Example 2>
In the same manner as in Example 1, irradiation was performed so that the focused position of the pulsed laser light 11 was positioned inside the quartz glass substrate 10 of 10 mm × 10 mm × 5 mm. The irradiation conditions of the pulse laser beam are the same as those in the first embodiment.
However, irradiation was performed by changing the polarization direction (magnetic field) of the pulsed laser light to be irradiated to horizontal polarization or vertical polarization by the linearly polarizing plate 8 shown in FIG.

図3A,図3Bに示したように、屈折率の高い領域と低い領域とが繰り返し生じた縞状の周期構造がパルスレーザ光の偏光方向(磁場)に依存した方向に形成された。すなわち、水平偏光の場合は横方向(図3A)、垂直偏光の場合には縦方向(図3B)に縞状の周期構造が形成された。
実施例1と同じように、集光位置をガラス基材に対して所定間隔でかつ一定方向に断続的又は連続的に相対移動させ、球状、円柱状もしくは断面円形のひも状の屈折率変化領域を繰り返し形成した。
As shown in FIGS. 3A and 3B, a striped periodic structure in which a region having a high refractive index and a region having a low refractive index are repeatedly formed is formed in a direction depending on the polarization direction (magnetic field) of the pulse laser beam. That is, a striped periodic structure was formed in the horizontal direction (FIG. 3A) in the case of horizontal polarization, and in the vertical direction (FIG. 3B) in the case of vertical polarization.
Similar to the first embodiment, the light collection position is intermittently or continuously moved relative to the glass substrate at a predetermined interval and in a fixed direction, and the refractive index changing region is a string having a spherical shape, a cylindrical shape, or a circular cross section. Was repeatedly formed.

本発明の光学用構造体の製造装置を示す模式図である。It is a schematic diagram which shows the manufacturing apparatus of the optical structure of this invention. 屈折率変化領域内に形成される周期構造を示す、光照射方向の正面断面図である。It is front sectional drawing of the light irradiation direction which shows the periodic structure formed in a refractive index change area | region. 屈折率変化領域内に形成される周期構造を示す、光照射方向の側面断面図である。It is side surface sectional drawing of the light irradiation direction which shows the periodic structure formed in a refractive index change area | region. 屈折率変化領域内に形成される周期構造を示す、光照射方向の平面断面図である。It is a plane sectional view of a light irradiation direction showing a periodic structure formed in a refractive index change region. 偏光磁場方向が水平のパルスレーザ光を照射視した場合の、屈折率変化領域内に形成された周期構造を示す断面図である。It is sectional drawing which shows the periodic structure formed in the refractive index change area | region at the time of irradiating and irradiating the pulsed laser beam whose polarization magnetic field direction is horizontal. 偏光磁場方向が垂直のパルスレーザ光を照射視した場合の、屈折率変化領域内に形成された周期構造を示す断面図である。It is sectional drawing which shows the periodic structure formed in the refractive index change area | region at the time of irradiating and irradiating the pulsed laser beam with a perpendicular polarization magnetic field direction. 屈折率変化領域内に形成された周期構造を示す断面図であり、屈折率変化領域内に形成された周期構造の主面に対して垂直に、波長多重された光信号を照射した場合を示している。It is sectional drawing which shows the periodic structure formed in the refractive index change area | region, and shows the case where the wavelength multiplexed optical signal is irradiated perpendicularly with respect to the main surface of the periodic structure formed in the refractive index change area | region. ing. 屈折率変化領域内に形成された周期構造を示す断面図であり、屈折率変化領域内に形成された周期構造の主面に対して、平行に波長多重された光信号を照射した場合を示している。It is sectional drawing which shows the periodic structure formed in the refractive index change area | region, and shows the case where the optical signal wavelength-division-multiplexed in parallel is irradiated with respect to the main surface of the periodic structure formed in the refractive index change area | region. ing. 屈折率変化領域内に形成された周期構造を示す断面図であり、屈折率変化領域内に形成された周期構造の主面に対して、垂直に波長多重された光信号を照射するが、周期構造のピッチPを大きくした場合を示している。It is sectional drawing which shows the periodic structure formed in the refractive index change area | region, and irradiates the optical signal wavelength-multiplexed perpendicularly with respect to the main surface of the periodic structure formed in the refractive index change area | region. The case where the pitch P of a structure is enlarged is shown. 二重周期を有する光学用構造体を回折格子・偏光子として用いた例を示す斜視図である。It is a perspective view which shows the example which used the optical structure which has a double period as a diffraction grating and a polarizer. 二重周期を有する光学用構造体をリフレクター・フィルターとして用いた例を示す斜視図である。It is a perspective view which shows the example which used the optical structure which has a double period as a reflector filter. 石英ガラス基板にパルスレーザ光を照射した状態を示す斜視図である。It is a perspective view which shows the state which irradiated the pulsed laser beam to the quartz glass substrate. ガラス基材に対して所定間隔でかつ三方向に断続的に相対移動させることによって、球状の屈折率変化領域を三次元格子状に複数並設した光学用構造体を示す斜視図である。FIG. 5 is a perspective view showing an optical structure in which a plurality of spherical refractive index change regions are arranged side by side in a three-dimensional lattice pattern by intermittently moving relative to a glass substrate at predetermined intervals and in three directions. 同平面図である。It is the same top view. 円柱状の屈折率変化領域を二次元に複数並設した光学用構造体を示す斜視図である。It is a perspective view which shows the optical structure which arranged two or more column-shaped refractive index change area | regions in two dimensions. 同平面図である。It is the same top view. 屈折率変化領域を三角格子状に複数並設した光学用構造体を示す平面図である。FIG. 6 is a plan view showing an optical structure in which a plurality of refractive index changing regions are arranged in a triangular lattice pattern. 断面円形帯(円柱)状の屈折率変化領域を二次元に複数並設した光学用構造体を示す斜視図である。It is a perspective view which shows the structure for optics which arranged two or more two-dimensionally the refractive index change area | region of a cross-sectional circular belt (column) shape. 同平面図である。It is the same top view.

符号の説明Explanation of symbols

1 ガラス材料
2 パルスレーザ光
3 励起光発生部
4 パルス光発生部
5 光増幅部
6 レンズ等の集光装置
7 XYZ方向に走査可能な電動ステージ
8 直線偏光板
9 ミラー
10 石英ガラス基板
11 パルスレーザ光
12 集光レンズ
13 集光位置
14 周期構造を持つ球状の屈折率変化領域
15 周期構造を持つ円柱状の屈折率変化領域
16 周期構造を持つ断面円形の帯状の屈折率変化領域
S 周期構造を持つ球状の屈折率変化領域
P 屈折率変化領域S内の周期構造のピッチ
L 屈折率変化領域S内の屈折率が高い領域の幅
DESCRIPTION OF SYMBOLS 1 Glass material 2 Pulsed laser beam 3 Excitation light generation part 4 Pulsed light generation part 5 Optical amplification part 6 Condensing apparatus 7 such as a lens Electric stage 8 capable of scanning in XYZ directions Linearly polarizing plate 9 Mirror 10 Quartz glass substrate 11 Pulse laser Light 12 Condensing lens 13 Condensing position 14 Spherical refractive index changing region 15 having periodic structure Cylindrical refractive index changing region 16 having periodic structure Band-shaped refractive index changing region S having periodic structure Spherical refractive index changing region P having a pitch L of the periodic structure in the refractive index changing region S The width of the high refractive index region in the refractive index changing region S

Claims (14)

レーザ光を透過する基材に、光誘起屈折率変化を起こすエネルギー量を有する集光された1本の直線偏光のパルスレーザ光を照射し、
その集光位置に、屈折率の高い領域と低い領域とが繰り返し生じた周期構造であって、当該周期構造における、屈折率の高い領域のつながった面又は屈折率の低い領域のつながった面として定義される主面が、照射した前記パルスレーザ光の偏光磁場方向と平行に形成された領域を形成する、光学用構造体の製造方法。
A base material that transmits laser light is irradiated with a focused single linearly polarized pulsed laser light having an energy amount that causes a light-induced refractive index change,
A periodic structure in which a region having a high refractive index and a region having a low refractive index are repeatedly generated at the condensing position, and a surface connected to a region having a high refractive index or a surface connected to a region having a low refractive index in the periodic structure. A method for manufacturing an optical structure , wherein a defined main surface forms a region formed in parallel to a direction of a polarized magnetic field of the irradiated pulsed laser beam .
前記周期構造のピッチは、照射されたパルスレーザ光の波長、照射パルス数又はパルスエネルギーに依存して形成される請求項1記載の光学用構造体の製造方法The pitch of the periodic structure, the wavelength of an emitted pulse laser beam, the manufacturing method of the optical structure of claim 1 Symbol placement are formed depending on the irradiation pulse number or the pulse energy. 前記周期構造のピッチは、1μm以下である請求項1又は請求項に記載の光学用構造体の製造方法。 Pitch of the periodic structure, manufacturing method of the optical structure according to claim 1 or claim 2 is 1μm or less. 前記周期構造を有する領域が球である請求項1〜請求項のいずれかに記載の光学用構造体の製造方法 Method of manufacturing an optical structure according to any one of claims 1 to 3 region having the periodic structure is a sphere. 前記球の直径が0.1μmから1mmの範囲にある請求項4に記載の光学用構造体の製造方法The method for manufacturing an optical structure according to claim 4, wherein the diameter of the sphere is in a range of 0.1 μm to 1 mm. 前記周期構造を有する領域が断面円形のひも状、又は円柱状である請求項1〜請求項のいずれかに記載の光学用構造体の製造方法The method for manufacturing an optical structure according to any one of claims 1 to 3 , wherein the region having the periodic structure is a string having a circular cross section or a columnar shape. 前記周期構造を有する領域が一定間隔で複数、繰り返し並設されている請求項1〜請求項のいずれかに記載の光学用構造体の製造方法 Method of manufacturing an optical structure according to a plurality, any one of claims 1 to 6 that are repeatedly arranged in the region having the periodic structure is constant intervals. 前記一定間隔が1μmから1mmの範囲にある請求項に記載の光学用構造体の製造方法The method for manufacturing an optical structure according to claim 7 , wherein the predetermined interval is in a range of 1 μm to 1 mm. 前記周期構造を有する領域を、本来複屈折現象を示さない等方性材料に形成した請求項1〜請求項のいずれかに記載の光学用構造体の製造方法 Method of manufacturing an optical structure according to any one of claims 1 to 8, wherein a region having a periodic structure was formed in the isotropic material originally does not exhibit birefringence phenomenon. 前記パルスレーザ光のパルス幅が、10-12〜10-15secである請求項1〜請求項9のいずれかに記載の光学用構造体の製造方法。 The method for manufacturing an optical structure according to any one of claims 1 to 9, wherein a pulse width of the pulsed laser light is 10-12 to 10-15 sec. 前記パルスレーザ光のパルスの繰り返し周期が100MHz以下である請求項1〜請求項10のいずれかに記載の光学用構造体の製造方法。 The method for manufacturing an optical structure according to any one of claims 1 to 10, wherein a pulse repetition period of the pulse laser beam is 100 MHz or less. 前記パルスレーザ光のパルスは、単一のパルスである請求項〜請求項10のいずれかに記載の光学用構造体の製造方法。 Pulse of the pulsed laser light, a manufacturing method of an optical structure according to any one of claims 1 to 10 is a single pulse. 前記基材に集光されるパルスレーザ光のパワー密度が108W/cm2以上である請求項〜請求項12のいずれかに記載の光学用構造体の製造方法。 Method of manufacturing an optical structure according to any one of claims 1 to 12 power density of the pulsed laser light is condensed on the substrate is 10 8 W / cm 2 or more. 前記基材に集光されるパルスレーザ光のパルスエネルギーが0.1μJ/pulseから10μJ/pulseである請求項〜請求項13のいずれかに記載の光学用構造体の製造方法。 Method of manufacturing an optical structure according to any one of the substrate according to claim 1 pulse energy of the pulsed laser beam is focused is 10 .mu.J / pulse from 0.1μJ / pulse to ~ claim 13.
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