CN109848547A - The modified transparent material of femtosecond laser efficient stable is uniformly at silk method - Google Patents
The modified transparent material of femtosecond laser efficient stable is uniformly at silk method Download PDFInfo
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Abstract
The present invention relates to a kind of modified transparent materials of femtosecond laser efficient stable uniformly at silk method, belongs to femtosecond laser applied technical field.The present invention is by carrying out spatio-temporal synergy shaping to femtosecond laser, regulate and control subpulse time interval and action time in time domain, the plasma enhancing material for allowing preamble subpulse excitation free electron to generate deposits subsequent child pulse energy effectively the absorptivity of femtosecond laser；Time domain shaping simultaneously can decompose pulse energy, reduce by high-energy bring self-focusing tail portion bifurcated effect, realize that transparent material is modified to the uniformity consistency in area；Single beam femtosecond laser is shaped as multiple laser simultaneous processing on airspace, greatly improves processing efficiency.Operation is simple for the method for the present invention, is not necessarily to exposure mask and mobile example, does not require sample translation stage precision, effectively increases inside the modified transparent material of femtosecond laser into silk stability and uniformity, avoids surface abrasion, enhance information confidentiality.
Description
Technical field
The present invention relates to a kind of modified transparent materials of femtosecond laser efficient stable uniformly at silk method, belongs to femtosecond laser and answers
Use technical field.
Background technique
In recent years, holographic technique is because of its important application and demand in fields such as information storage, military surveillance, imaging of medical
And become hot research direction.Encoded holographic figure is processed in current holographic technique and generallys use the super surface method of processing, mainly
Processing method has surface plasma body resonant vibration photoetching and electron/ion beams exposure etc..For example, Liu et al. people utilizes surface plasma
Resonance body photoetching technique combination air separation layer avoids the pollution and damage of mask pattern, is prepared for super surface hologram (Liu
L,Zhang X,Zhao Z,et al.Batch fabrication of metasurface holograms enabled by
plasmonic cavity lithography[J].Advanced Optical Materials,2017,5(21):
1700429).But prior art processing hologram is confined to surface processing, is seldom related to material internal processing, and different
The problems such as that there are processing methods in degree is complicated, expensive, inefficiency, constrains its extensive use.Information is stored
Especially for information encryption storage, the encoded holographic figure for being hidden in material internal has great advantage, and is located in material
The hologram in portion can avoid information caused by due to surface abrasion from losing completely.However, to material under the premise of not influencing surface
The stably and controllable structure processing of the internal progress of material is very difficult for traditional diamond-making technique.With going out for chirp amplifying technique
It is existing, femtosecond laser technology rapid development.Its ultrafast superpower characteristic enables it to be processed and be modified inside transparent material, this
It is that other traditional diamond-making techniques are incomparable.The encoded holographic figure processed on the surface of the material is substantially a series of to cause light phase
The lattice array or nanocell structures of position or amplitude variations, this function will be realized inside transparent material, then is needed in material
Inside processes the structural unit that refractive index is different from undressed region, such as modified filament, to realize to incident light phase delay
Modulation.Since the change rate and variable quantity of the phase delay refractive index of incident light are very sensitive, to processing structure
Uniformity proposes very high requirement.
Summary of the invention
The present invention in order to solve the above-mentioned technical problem, provide a kind of modified transparent material of femtosecond laser efficient stable uniformly at
Silk method, this method is by carrying out spatio-temporal synergy shaping to femtosecond laser, in time domain when regulation subpulse time interval and effect
Between, and beam of laser is integrated into multi beam pulse laser simultaneous processing on airspace using spatial light modulator, without mobile and
Sample is scanned, highly-efficient processing has gone out that structure is uniform, depth is programmable is modified to an array inside transparent material, i.e., coding is complete
Subelement is ceased, different subelements are further sliceable to obtain hologram inside transparent material, avoids surface abrasion, enhances letter
Cease confidentiality.
To achieve the above object, present invention employs following technical proposals:
For the modified transparent material of femtosecond laser efficient stable uniformly at silk method, specific procedure of processing is as follows:
Step 1: the optical path of fs-laser system is adjusted, it is ensured that laser level enters femtosecond double pulses and generates dress
It sets；
Preferably, femtosecond double pulses generation device is that the dipulse based on Michelson Interference Principle production generates
Device.
Step 2: the zero degree mirror angle of dipulse generation device two-arm is adjusted, after guaranteeing that the laser of two-arm is reflected
It is spatially overlapped along backtracking by beam splitter, and two beam laser of guarantee is got ready by single-point triggering to focus on sample same
Position；The one-dimensional delay translation stage for adjusting one arm of dipulse generation device determines the time weight of two pulses by interference fringe
Chalaza, continuing to move to delay platform can be obtained the double-pulse laser of different delayed time, be changed by changing femtosecond double pulses delay
Become material internal and is modified to yarn quality；
Step 3: introducing spatial light modulator for two pulses, is spatially shaped as pulse using more luminous point phases
Multi beam pulse；By femtosecond laser focal point in sample interior, the repetition rate of fixed femto-second laser pulse passes through timing on-off
Mechanical switch adjusts umber of pulse, to control the length of modification area in sample.
The device for realizing the above method includes: that fs-laser system, mechanical switch, femtosecond reflecting mirror, beam splitter, zero degree are anti-
It penetrates mirror, one-dimensional delay translation stage, reflective spatial light modulator, half-wave plate, polarizing film, LED coaxial-illuminating light source, focus thoroughly
Mirror, three-dimensional piezoelectric translation stage and imaging CCD.The fs-laser system generates femtosecond laser and opens by femtosecond reflecting mirror and machinery
It puts into dipulse generation device, generates the dipulse of different delayed time by adjusting zero degree reflecting mirror and one-dimensional delay translation stage
Afterwards, it into more array of light spots are spatially shaped as after reflective spatial light modulator, is adjusted and is swashed by half-wave plate combination polarizing film
Light energy is then focused object lens and focuses on sample interior to be processed and processed；Sample is mounted on three-dimensional piezoelectric translation stage,
LED coaxial-illuminating light source is incident in imaging CCD by focusing objective len amplification after sample transmission and observes process in real time
And result.
Preferably, processing effect when test dipulse delay is 150fs-200ps, according to the preferred 40ps of optimum efficiency
Dipulse delay is processed.
Laser energy is adjusted by rotatory polarization piece and half-wave plate, to obtain being modified to for different quality material
Silk；The laser energy density adjustable range is 3~20J/cm2。
Can use LED coaxial-illuminating light source and imaging CCD be imaged, observe processed sample inside modification area and
Its process.
Preferably, choosing femtosecond laser focal position is 400 μm in sample, the repetition rate of femto-second laser pulse is
1kHz, timing mechanical switch 5s, so that controlling umber of pulse is 5000 pulses or pulse train.
Beneficial effect
1, information is lost caused by the inside processing encoded holographic drawing method that the present invention uses is avoided because of material surface abrasion
It loses, while enhancing the confidentiality of hologram storage information, the fields such as encryption information storage can be efficiently applied to extensively.
2, the present invention is based on dynamic control theories, using spatio-temporal synergy shaping, by the way that femtosecond laser pulse exists
Dipulse is modulated on time, suction of the plasma enhancing material for allowing preamble pulse excitation free electron to generate to femtosecond laser
Yield deposits the energy of succeeding impulse effectively, substantially increases capacity usage ratio；It is simultaneously that single beam pulse space is whole
Shape is multi beam pulse simultaneous processing, greatly improves processing efficiency.
3, the spatio-temporal synergy shaping processing method that the present invention uses is scanned into a method compared to traditional femtosecond laser, single
One-step forming without scanning, does not require the precision of sample moving platform, substantially increases the stability of processing result.
4, the present invention utilizes femto-second laser pulse sequence, by the son that the pulse of high-energy is decomposed into two low energy
Pulse, to reduce by high-energy bring self-focusing tail portion bifurcated effect, hence it is evident that improve in femtosecond laser processing transparent material
The uniformity of the modified filament in portion, improves processing quality, ensure that the accuracy of the storage information of internal hologram.
Detailed description of the invention
Fig. 1 is the index path that femtosecond double pulses single step of the invention is uniformly modified transparent material method；
Fig. 2 is the modification filament shape appearance figure obtained inside vitreous silica into processing described in the embodiment of the present invention；Scheme (a)
It for 40ps, dipulse total energy density is 10.4J/cm to use time interval2, pulse number be 5000 dipulse process
The modification filament arrived；Figure (b) is to use single pulse energy metric density for 10.4J/cm2, pulse number be 5000 pulse process
Obtained modification filament；Figure (c) is that use time interval for 40ps, dipulse total energy density be respectively 2.6/5.2/7.8/
10.4J/cm2, the modification filament processed of dipulse that pulse number is 5000；Figure (d) be use time interval for 40ps,
Dipulse total energy density is 10.4J/cm2, the modification filament processed of dipulse that pulse number is 2000.
Appended drawing reference: 1- fs-laser system；2- femtosecond reflecting mirror；3- mechanical switch；4- beam splitter；The first zero degree of 5- is anti-
Penetrate mirror；The one-dimensional delay translation stage of 6-；7- the second zero degree reflecting mirror；8- femtosecond reflecting mirror；9- reflective spatial light modulator；10-
Femtosecond reflecting mirror；11- half-wave plate；12- polarizing film；13- processes focusing objective len；14-LED coaxial light source；15- three-dimensional piezoelectric is mobile
Translation stage；16- sample to be processed；17- imaging and focusing object lens；CCD is imaged in 18-.
Specific embodiment
The present invention will be further described below with reference to the accompanying drawings and embodiments.
Specific processing optical path in present embodiment as shown in Figure 1, femto-second laser pulse is generated by fs-laser system 1,
Dipulse generation device is reached by femtosecond reflecting mirror 2, mechanical switch 3, the device is by 4, two zero degree reflecting mirrors 5,7 of beam splitter
It is formed with one-dimensional delay translation stage 6, subsequent laser pulse is modulated to by femtosecond reflecting mirror 8 through reflective spatial light modulator 9
Multiple light beams, and then femtosecond reflecting mirror 10 is reached, using the energy attenuation of half-wave plate 11 and polarizing film 12, by focusing objective len 13
It focuses on inside sample 16, sample position is adjusted by three-dimensional piezoelectric mobile platform 15；Imaging optical path is by LED coaxial light source 14
The white light of generation passes through sample transmission, is incident in imaging CCD18 by the amplification of focusing objective len 17.
Femto-second laser employed in experimentation uses institute, U.S.'s spectrum physics (Spectrum-Physics) company
The laser of production, parameter are as follows: central wavelength 800nm, pulse width 50fs, repetition rate 1kHz is adjustable, linear polarization,
Light distribution is Gaussian；Mechanical switch 3 wins (Thorlabs) company SH05 produced using Soret, switchs the response time
For 1ms, the laser processing time can be arbitrarily controlled；One-dimensional delay translation stage 6 is using the production of SmarAct company, Germany
SLC2490s-47, mobile accuracy are 1 μm；Reflective spatial light modulator 9 is using the production of Holoeye company, Germany
The pure phase spatial light modulator of PLUTO-NIR-015；Experiment processed sample 16 is vitreous silica (SiO2), with a thickness of 1mm, side
Face and front polish.
Embodiment 1:
For focusing on inside vitreous silica and process uniformly modified filament at 400 μm, using femto-second laser pulse sequence
Processing method, the specific steps are as follows:
Step 1: adjustment femtosecond laser processes optical path, it is ensured that laser level enters to be made based on Michelson Interference Principle
Dipulse generation device.
Step 2: two the space coincidence and time delay of dipulse produced by adjusting: are adjusted in dipulse generation device
The pitching of zero degree reflecting mirror 5,7 ensures pulse by 4 beam splitting of beam splitter for after two pulses by the method for aperture backtracking
It is still propagated respectively along pulse original road, in order to more accurately two pulses be allowed spatially to be completely coincident, by blocking one
The mode that label is got in the triggering of arm single-point ready ensures that two pulses focus on sample same position；One-dimensional delay is manipulated by controller
Translation stage 6, so that the two-arm light path of dipulse generation device is identical, method of discrimination, that is, two pulses close Shu Houhui due to laser
The short pulse duration of coherence and femto-second laser pulse and generate interference fringe, due to it is one-dimensional delay translation stage 6 precision be 1 μm,
Corresponding femtosecond laser turnaround time 6.67fs chooses interference fringe so will appear interference fringe in a moving range
The midpoint of appearing and subsiding is to be overlapped zero point the dipulse time, this example is delayed using 40ps dipulse, therefore continues to move to prolong
When 6000 μm of translation stage.
Step 3: loading more luminous point phases in reflective spatial light modulator 9, and single beam pulse spatially is modulated to
Multi beam pulse simultaneous processing；The dipulse gross energy that rotatory polarization piece 11 and the combination of half-wave plate 12 adjust single filament is 10.4J/
cm2。
Step 4: femtosecond laser is focused using 5 × focusing objective len 13, using CCD18 image side faces by marking air to hit
It wears point of maximum intensity and determines focus, it is assumed that direction of laser propagation is z-axis, and sample 16 is placed and moves translation stage 15 to three-dimensional piezoelectric and incites somebody to action
At surface translation to focus mark, 400 μm are moved backward along z-axis, so that femtosecond laser focuses at 400 μm of sample interior.Gu
Determining femtosecond laser repetition rate is 1kHz, and 3 opening time of timing mechanical switch is 5s, so that exciting in same machining area
Umber of pulse is 5000, and what be can be obtained is loaded with the holographic subelement of specific coding information.Wherein modified filament pattern such as Fig. 2 of single
(a) shown in, uniformity is fabulous, 550 μm of the head of district uniform.
To focus at 400 μm of vitreous silica inside for processing modified filament, other steps and above-mentioned dipulse are processed
It is identical, the difference is that: by blocking a wherein arm when dipulse generation device in step 2, i.e., rushed in using only simple venation
Row processing, obtains the modification filament of 350 μm of the uniform head of district, as shown in Fig. 2 (b).
Since two sub- pulse energies are small compared with single pulse energy in femtosecond double pulses modifying process, high energy can reduce
Self-focusing tail portion bifurcated effect caused by amount is modified, while plasma caused by preamble pulse excitation material can reinforcing material
To the absorptivity of femtosecond laser, so that succeeding impulse energy is effectively deposited, so as to process ten in transparent material
Divide uniform modified filament, therefore the generated filament that is modified of dipulse effect is more uniform, is more in line with processing request.
Embodiment 2:
To focus at 400 μm of vitreous silica inside for processing modified filament, other steps are same as Example 1, no
It is with place: adjusts polarizing film 11 and half-wave plate 12 in step 3 and change the load phase in reflection type spatial light reshaper
Position, to regulate and control the energy proportioning of multiple beam, i.e. the dipulse total energy density ratio of generation single filament is 4:3:2:1, wherein
The minimum total energy density of single beam dipulse is 2.6J/cm2(each pulse energy density i.e. in dipulse is 1.3J/cm2),
Can single step process encoding phase delay, the i.e. uniform modified filament array of different length, the wherein modification of different-energy density
Shown in filament pattern such as Fig. 2 (c).
Particular phases figure can be calculated according to different storage information using method of the invention, thus process length it is different,
It is loaded with the modification filament array of out of phase delay information.
Embodiment 3:
To focus at 400 μm of vitreous silica inside for processing modified filament, other steps are same as Example 1, no
Be with place: 3 opening time of timing mechanical switch in step 4 is 2s, so that being in same machining area excitation pulse number
2000, i.e., the length of the controllable modified filament of holographic subelement, wherein shown in the modified filament pattern such as Fig. 2 (d) of single.
It can be adjusted for transparent material of different nature using method of the invention, to obtain specific modified filament
Array length.
Specific example described in this specification has carried out further in detail the purpose, implementation method and beneficial effect of invention
It describes in detail bright.But those skilled in the art are such as added it should be understood that the above is only a specific embodiment of the present invention
Work sample is not limited to vitreous silica, for other transparent materials, such as Al2O3, PMMA etc., corresponding femtosecond laser processing ginseng
Number needs to reaffirm desired value.All within the spirits and principles of the present invention, any modification, equivalent substitution and improvement done
Deng should all be included in the protection scope of the present invention.
Claims (9)
1. the modified transparent material of femtosecond laser efficient stable is uniformly at silk method, it is characterised in that: specific procedure of processing is as follows:
Step 1: the optical path of fs-laser system is adjusted, it is ensured that laser level enters femtosecond double pulses generation device；
Step 2: adjusting the zero degree mirror angle of dipulse generation device two-arm, guarantees after the laser of two-arm is reflected along original
Road returns through beam splitter and is spatially overlapped, and is got ready by single-point triggering and guarantee that two beam laser focus on the same position of sample
It sets；The one-dimensional delay translation stage for adjusting one arm of dipulse generation device determines that the time of two pulses is overlapped by interference fringe
Point, continuing to move to delay platform can be obtained the double-pulse laser of different delayed time, be changed by changing femtosecond double pulses delay
Material internal is modified to yarn quality；
Step 3: introducing spatial light modulator for two pulses, and pulse is spatially shaped as multi beam using more luminous point phases
Pulse；By femtosecond laser focal point in sample interior, the repetition rate of fixed femto-second laser pulse is mechanical by timing on-off
Switch is to adjust umber of pulse, to control the length of modification area in sample.
2. realizing the device of method as described in claim 1, it is characterised in that: include: fs-laser system, mechanical switch, fly
Second reflecting mirror, beam splitter, zero degree reflecting mirror, one-dimensional delay translation stage, reflective spatial light modulator, half-wave plate, polarizing film,
LED coaxial-illuminating light source, condenser lens, three-dimensional piezoelectric translation stage and imaging CCD；The fs-laser system generates femtosecond laser
Enter dipulse generation device by femtosecond reflecting mirror and mechanical switch, by adjusting zero degree reflecting mirror and one-dimensional delay translation stage
After the dipulse for generating different delayed time, into reflective spatial light modulator after be spatially shaped as more array of light spots, by half
Wave plate combination polarizing film adjusts laser energy, is then focused object lens and focuses on sample interior to be processed and is processed；Sample peace
On three-dimensional piezoelectric translation stage, LED coaxial-illuminating light source is incident on imaging after sample transmission, through focusing objective len amplification
Process and result are observed in CCD in real time.
3. method as described in claim 1, it is characterised in that: femtosecond double pulses generation device described in step 1 is based on advanced in years
The dipulse generation device of Ke Erxun principle of interference production.
4. method as claimed in claim 3, it is characterised in that: the delay between dipulse that the dipulse generation device generates
For 150fs-200ps.
5. method as claimed in claim 4, it is characterised in that: the delay between the dipulse is 40ps.
6. device as claimed in claim 2, it is characterised in that: carried out by the rotatory polarization piece and half-wave plate to laser energy
It adjusts, is modified to silk with obtain different quality material.
7. device as claimed in claim 6, it is characterised in that: the laser energy density adjustable range is 3~20J/cm2。
8. device as claimed in claim 2, it is characterised in that: be imaged, seen using LED coaxial-illuminating light source and imaging CCD
Survey the modification area and its process inside processed sample.
9. device as claimed in claim 2, it is characterised in that: the femtosecond laser focal position is 400 μm in sample, and femtosecond swashs
The repetition rate of light pulse is 1kHz, timing mechanical switch 5s, so that controlling umber of pulse is 5000 pulses or pulse train.
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Cited By (6)
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| CN110788500A (en) * | 2019-10-28 | 2020-02-14 | 北京航天控制仪器研究所 | Femtosecond laser precision forming processing system for complex hard and brittle material component |
| CN112289171A (en) * | 2020-09-30 | 2021-01-29 | 北京德弦科技有限公司 | Data identification processing, reading and detecting method and device for transparent medium |
| CN112828481A (en) * | 2020-12-31 | 2021-05-25 | 武汉华工激光工程有限责任公司 | Method and system for processing and reading two-dimensional code in transparent material |
| CN113085185A (en) * | 2021-04-08 | 2021-07-09 | 北京理工大学 | Method for inducing forward transfer of liquid film based on time domain shaping femtosecond laser |
| CN113385837A (en) * | 2021-04-16 | 2021-09-14 | 华东师范大学 | Laser pulse sequence silicon hole processing system with adjustable sub-pulse time interval |
| CN114453770A (en) * | 2022-03-10 | 2022-05-10 | 浙江大学杭州国际科创中心 | Method for double-pulse femtosecond laser slicing of SiC substrate |
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| CN112828481A (en) * | 2020-12-31 | 2021-05-25 | 武汉华工激光工程有限责任公司 | Method and system for processing and reading two-dimensional code in transparent material |
| CN112828481B (en) * | 2020-12-31 | 2022-05-03 | 武汉华工激光工程有限责任公司 | Method and system for processing and reading two-dimensional code in transparent material |
| CN113085185A (en) * | 2021-04-08 | 2021-07-09 | 北京理工大学 | Method for inducing forward transfer of liquid film based on time domain shaping femtosecond laser |
| CN113385837A (en) * | 2021-04-16 | 2021-09-14 | 华东师范大学 | Laser pulse sequence silicon hole processing system with adjustable sub-pulse time interval |
| CN114453770A (en) * | 2022-03-10 | 2022-05-10 | 浙江大学杭州国际科创中心 | Method for double-pulse femtosecond laser slicing of SiC substrate |
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