CN111318503A - Cleaning device - Google Patents

Cleaning device Download PDF

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Publication number
CN111318503A
CN111318503A CN202010201126.0A CN202010201126A CN111318503A CN 111318503 A CN111318503 A CN 111318503A CN 202010201126 A CN202010201126 A CN 202010201126A CN 111318503 A CN111318503 A CN 111318503A
Authority
CN
China
Prior art keywords
tray
cleaning
box body
liquid
collector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202010201126.0A
Other languages
Chinese (zh)
Inventor
李在桓
史进
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Xian Eswin Silicon Wafer Technology Co Ltd
Xian Eswin Material Technology Co Ltd
Original Assignee
Xian Eswin Silicon Wafer Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Xian Eswin Silicon Wafer Technology Co Ltd filed Critical Xian Eswin Silicon Wafer Technology Co Ltd
Priority to CN202010201126.0A priority Critical patent/CN111318503A/en
Publication of CN111318503A publication Critical patent/CN111318503A/en
Pending legal-status Critical Current

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02Cleaning by the force of jets or sprays
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B13/00Accessories or details of general applicability for machines or apparatus for cleaning
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26DRYING
    • F26BDRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B21/00Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
    • F26B21/004Nozzle assemblies; Air knives; Air distributors; Blow boxes
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26DRYING
    • F26BDRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B23/00Heating arrangements
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26DRYING
    • F26BDRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B23/00Heating arrangements
    • F26B23/04Heating arrangements using electric heating
    • F26B23/06Heating arrangements using electric heating resistance heating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B2203/00Details of cleaning machines or methods involving the use or presence of liquid or steam
    • B08B2203/02Details of machines or methods for cleaning by the force of jets or sprays
    • B08B2203/0258Multiple lance high pressure cleaning station

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

The present invention provides a cleaning device, including: a cleaning tank, wherein a cavity is limited in the cleaning tank; the supporting rod is arranged in the cavity; the tray is arranged on the supporting rod and used for bearing the box body to be cleaned; a supply pipe provided with a nozzle for cleaning the cartridge body; the collector is arranged below the tray to collect the cleaning liquid flowing out of the tray; and the inlet of the liquid particle counter is communicated with the liquid outlet of the collector to detect the particle content in the cleaning liquid flowing into the liquid particle counter. In the use, place the box body in the tray on, wash the box body through the nozzle, wash the back that the washing liquid after the box body flows down from the tray, detect the particle in the washing liquid after wasing the box body through liquid particle counter, and then judge whether the box body has washd thoroughly, can accurately judge whether have the pollutant particle in the box body, avoid not thorough to the washing of box body, influence the quality of silicon chip when avoiding transporting the silicon chip.

Description

Cleaning device
Technical Field
The invention relates to the field of silicon wafers, in particular to a cleaning device.
Background
Generally, after a series of processes such as cutting, grinding, polishing, and cleaning processes, the silicon wafer is loaded in a transport box, and is transported and delivered to a device manufacturer, and various foreign substances such as polymers and impurities generated from the transport box may contaminate the surface of the silicon wafer during the process, resulting in a decrease in productivity of semiconductor devices, so that the transport box needs to prevent the contamination of the silicon wafer by the transport box through an additional cleaning process. The existing cleaning device can not accurately judge whether pollutant particles exist in the box body or not, can not accurately determine whether the box body meets the cleaning requirement or not, easily causes incomplete cleaning of the box body, and influences the quality of the silicon wafer when the silicon wafer is transported.
Disclosure of Invention
In view of the above, the invention provides a cleaning device, which is used for solving the problems that the existing cleaning device cannot accurately judge whether contaminant particles exist in a box body, cannot accurately determine whether the box body meets the cleaning requirement, is easy to cause incomplete cleaning of the box body, and affects the quality of silicon wafers during transportation.
In order to solve the technical problems, the invention adopts the following technical scheme:
according to the embodiment of the invention, the cleaning device comprises:
a cleaning tank, wherein a cavity is limited in the cleaning tank;
a support rod disposed in the chamber;
the tray is arranged on the supporting rod and used for bearing the box body to be cleaned;
a supply pipe provided with a nozzle to clean the cartridge body;
the collector is arranged below the tray to collect the cleaning liquid flowing out of the tray;
a liquid particle counter having an inlet in communication with the outlet of the collector to detect the particle content in the cleaning liquid flowing into the liquid particle counter.
Wherein the supply tube is rotatable along an axis of the supply tube.
Wherein the support rod is rotatable along an axis of the support rod.
Wherein the axis of the support rod is parallel to the axis of the supply tube.
Wherein the tray includes:
the first tray is used for bearing the box body;
the second tray is used for bearing the box cover of the box body, the second tray and the first tray are arranged at intervals along the length direction of the supporting rod, and the second tray is positioned above the first tray.
Wherein, the upper side of the first tray is provided with an inclined surface.
The supply pipe is provided with a plurality of nozzles which are arranged at intervals along the length direction of the supply pipe, at least one nozzle is arranged above the second tray and used for cleaning the box cover, and at least one nozzle is arranged above the first tray and below the second tray and used for cleaning the box body.
Wherein, still include:
and the inlet of the conveying pump is communicated with the liquid outlet of the collector, and the outlet of the conveying pump is communicated with the inlet of the liquid particle counter.
Wherein, still include:
a drying structure provided in the chamber for drying the cartridge.
The liquid particle counter comprises a collector and a liquid storage tank, wherein the bottom of the collector is provided with a bottom opening, and the bottom opening and an outlet of the liquid particle counter are respectively communicated with the liquid storage tank.
The technical scheme of the invention has the following beneficial effects:
according to the cleaning device provided by the invention, a cavity is defined in the cleaning tank, the supporting rod is arranged in the cavity, the tray is arranged on the supporting rod and used for bearing a box body to be cleaned, the supply pipe is provided with the nozzle for cleaning the box body, the collector is arranged below the tray and used for collecting the cleaning liquid flowing out of the tray, and the inlet of the liquid particle counter is communicated with the liquid outlet of the collector to detect the particle content in the cleaning liquid flowing into the liquid particle counter. In the use, place the box body in the tray on, wash the box body through the nozzle, wash the back that the washing liquid after the box body flows down from the tray, detect the particle in the washing liquid after wasing the box body through liquid particle counter, and then judge whether the box body has washd thoroughly, can accurately judge whether there is the pollutant particle in the box body to satisfy the washing requirement, avoid not thorough to the washing of box body, influence the quality of silicon chip when avoiding transporting the silicon chip.
Drawings
FIG. 1 is a schematic structural view of a cleaning apparatus according to an embodiment of the present invention;
fig. 2 is another schematic structural diagram of the cleaning apparatus according to the embodiment of the present invention.
Reference numerals
A cleaning tank 10; a first motor 11; a second electric machine 12;
a support rod 20; a first tray 21; a second tray 22;
a case 30; a box cover 31;
a supply tube 40; a nozzle 41;
a collector 50;
a liquid particle counter 60;
a delivery pump 70;
a drying structure 80;
a reservoir 90.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the drawings of the embodiments of the present invention. It is to be understood that the embodiments described are only a few embodiments of the present invention, and not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the described embodiments of the invention, are within the scope of the invention.
The following specifically describes a cleaning apparatus according to an embodiment of the present invention.
As shown in fig. 1 to 2, the washing apparatus according to the embodiment of the present invention includes a washing bath 10, a support bar 20, a tray, a supply pipe 40, a collector 50, and a liquid particle counter 60.
Specifically, the cleaning tank 10 defines a chamber therein, the support rod 20 is disposed in the chamber, the tray is disposed on the support rod 20 for carrying the box 30 to be cleaned, the supply pipe 40 is provided with a nozzle for cleaning the box 30, the collector 50 is disposed below the tray for collecting the cleaning liquid flowing out from the tray, and the inlet of the liquid particle counter 60 is communicated with the outlet of the collector 50 for detecting the particle content in the cleaning liquid flowing into the liquid particle counter 60.
That is, the cleaning device mainly comprises a cleaning tank 10, a support rod 20, a tray, a supply pipe 40, a collector 50 and a liquid particle counter 60, wherein a chamber is defined in the cleaning tank 10, the support rod 20 can be arranged in the chamber, the support rod 20 can be parallel to or coincident with the axis of the chamber, the tray is arranged on the support rod 20, the tray can be used for bearing a box body 30 to be cleaned, the tray can be arranged in an inclined manner, when the box body 30 is arranged on the tray, the opening of the box body 30 is inclined downwards, the cleaning of the box body and the inner side wall of the box body is facilitated, a nozzle can be arranged on the supply pipe 40 to clean the box body 30, the collector 50 is arranged below the tray to collect the cleaning liquid flowing out from the tray, the inlet of the liquid particle counter 60 is communicated with the liquid outlet of the collector 50, the cleaning liquid after the box body is cleaned by the collector 50, the, the particle content in the cleaning liquid flowing into the liquid particle counter 60 is detected by the liquid particle counter 60. In the use, place the box body in the tray on, wash the box body through the nozzle, wash the back that the washing liquid after the box body flows down from the tray, detect the particle in the washing liquid after wasing the box body through liquid particle counter, and then judge whether the box body has washd thoroughly, can accurately judge whether there is the pollutant particle in the box body to satisfy the washing requirement, avoid not thorough to the washing of box body, influence the quality of silicon chip when avoiding transporting the silicon chip.
In some embodiments of the present invention, the supply tube 40 is rotatable along the axis of the supply tube 40 to facilitate cleaning from different directions, and the supply tube 40 may supply deionized water or a cleaning solution. The supply line 40 may be provided with a regulating valve 42, the flow rate of the spray being controlled by the regulating valve 42, the regulating valve 42 being connected to a controller 43, the regulating valve 42 being adjustable by the controller 43. The lower end of the supply pipe 40 may be further connected to a first motor 11, and the supply pipe 40 is driven to rotate along the axis of the supply pipe 40 by the first motor 11.
In other embodiments of the present invention, the supporting rod 20 is rotatable along the axis of the supporting rod 20, so that the tray can be driven by the supporting rod 20 to rotate, and the position angle of the box body on the tray can be changed, thereby facilitating the cleaning from different angles. Alternatively, the support rod 20 may have an axis parallel to the axis of the supply tube 40, and the support rod 20 may be disposed adjacent to the supply tube 40 to facilitate cleaning of the cartridge. The upper end of the support rod 20 may be connected to the second motor 12, and the support rod 20 may be driven to rotate along the axis of the support rod 20 by the second motor 12.
In the embodiment of the present invention, the tray includes a first tray 21 and a second tray 22, the first tray 21 may be used for carrying the box body 30, the second tray 22 may be used for carrying the box cover 31 of the box body 30, the second tray 22 is spaced apart from the first tray 21 along the length direction of the support rod 20, and the second tray 22 is located above the first tray 21, so as to facilitate cleaning of the box body 30 and the box cover 31.
Optionally, the upper side of the first tray 21 may be formed with an inclined plane, and the box body 30 is placed on the inclined plane, so that the opening of the box body is inclined downwards, and the cleaning liquid in the box body flows out when the cleaning is performed, so that the cleaning is more thorough. After the cleaning is finished, the deionized water or cleaning liquid remained on the box body is convenient for the liquid on the box body to be remained due to the inclined box body.
In an embodiment of the present invention, a plurality of nozzles 41 may be provided on the supply pipe 40, the plurality of nozzles 41 being spaced apart along a length direction of the supply pipe 40, at least one nozzle 41 may be provided above the second tray 22 for cleaning the box cover 31, and at least one nozzle 41 may be provided above the first tray 21 and below the second tray 22 for cleaning the box body 30, by which the cleaning of the box body 30 and the box cover 31 can be facilitated by the nozzles 41. In addition, an overflow hole can be formed in the second tray 22, and cleaning liquid on the second tray 22 after cleaning the box cover 31 can flow to the first tray 21 through the overflow hole and then flow into the collector 50 together, and can be detected through the liquid particle counter 60, so that whether the box body and the box cover are thoroughly cleaned is determined, and the quality of the silicon wafer is prevented from being influenced during transportation.
Optionally, the cleaning apparatus further comprises a delivery pump 70, an inlet of the delivery pump 70 is communicated with the liquid outlet of the collector 50, and an outlet of the delivery pump 70 is communicated with an inlet of the liquid particle counter 60, so as to facilitate delivery of the cleaning liquid in the collector 50 after cleaning the cartridge to the liquid particle counter 60. The liquid particle counter 60 may be connected to a PC, and may transmit data detected by the liquid particle counter 60 to a terminal or a data analyzer, and may monitor the number of particles in the deionized water or cleaning solution according to the cartridge cleaning time, and may monitor the variation relationship between the cartridge cleaning time and the number of particles.
According to some embodiments, the washing device further includes a drying structure 80, the drying structure 80 may extend along a length direction of the support rod 20, and the drying structure 80 is provided in the chamber for drying the cartridge 30. The drying structure 80 may include a heater or a heating wire, and may further include an air duct capable of blowing high-temperature gas, such as an air duct capable of blowing high-temperature nitrogen gas, so as to facilitate drying of the box body 30 by the drying structure 80, and also dry the cover 31, and other structures.
According to other embodiments, the cleaning device further comprises a reservoir 90, the bottom of the collector 50 is provided with a bottom opening, and the bottom opening of the collector 50 and the outlet of the liquid particle counter 60 are respectively communicated with the reservoir 90, so that the waste liquid in the collector 50 and the waste liquid in the liquid particle counter 60 can be collected together through the reservoir 90.
In the use, can place box body 30 in first tray 21 earlier on, wash box body 30 through nozzle 41, the back is flowed down from the tray to the washing liquid after wasing the box body, detect the particle in the washing liquid after wasing the box body through liquid particle counter 60, can accurately judge whether there is the pollutant particle in the box body, avoid the washing incomplete to the box body, wash the completion back, can dry box body 30 through dry construction 80, unload box body 30 after the drying is accomplished and get off the use, influence the quality of silicon chip when avoiding transporting the silicon chip.
Unless defined otherwise, technical or scientific terms used herein shall have the ordinary meaning as understood by one of ordinary skill in the art to which this invention belongs. The use of "first," "second," and similar terms in the present application do not denote any order, quantity, or importance, but rather the terms are used to distinguish one element from another. The terms "connected" or "coupled" and the like are not restricted to physical or mechanical connections, but may include electrical connections, whether direct or indirect. "upper", "lower", "left", "right", and the like are used merely to indicate relative positional relationships, and when the absolute position of the object being described is changed, the relative positional relationships are changed accordingly.
While the foregoing is directed to the preferred embodiment of the present invention, it will be understood by those skilled in the art that various changes and modifications may be made without departing from the spirit and scope of the invention as defined in the appended claims.

Claims (10)

1. A cleaning device, comprising:
a cleaning tank, wherein a cavity is limited in the cleaning tank;
a support rod disposed in the chamber;
the tray is arranged on the supporting rod and used for bearing the box body to be cleaned;
a supply pipe provided with a nozzle to clean the cartridge body;
the collector is arranged below the tray to collect the cleaning liquid flowing out of the tray;
a liquid particle counter having an inlet in communication with the outlet of the collector to detect the particle content in the cleaning liquid flowing into the liquid particle counter.
2. The cleaning device of claim 1, wherein the supply tube is rotatable along an axis of the supply tube.
3. The cleaning apparatus defined in claim 1, wherein the support rod is rotatable along an axis of the support rod.
4. The cleaning apparatus defined in claim 1, wherein the support rod has an axis that is parallel to an axis of the supply tube.
5. The cleaning device of claim 1, wherein the tray comprises:
the first tray is used for bearing the box body;
the second tray is used for bearing the box cover of the box body, the second tray and the first tray are arranged at intervals along the length direction of the supporting rod, and the second tray is positioned above the first tray.
6. The cleaning device as claimed in claim 5, wherein an upper side of the first tray is formed with an inclined surface.
7. The cleaning apparatus in accordance with claim 5, wherein a plurality of the nozzles are provided on the supply pipe, the plurality of the nozzles are provided at intervals along a length direction of the supply pipe, at least one of the nozzles is provided above the second tray for cleaning the box cover, and at least one of the nozzles is provided above the first tray and below the second tray for cleaning the box body.
8. The cleaning device of claim 1, further comprising:
and the inlet of the conveying pump is communicated with the liquid outlet of the collector, and the outlet of the conveying pump is communicated with the inlet of the liquid particle counter.
9. The cleaning device of claim 1, further comprising:
a drying structure provided in the chamber for drying the cartridge.
10. The cleaning device of claim 1, further comprising a reservoir, wherein the bottom of the collector is provided with a bottom port, and the bottom port and the outlet of the liquid particle counter are respectively communicated with the reservoir.
CN202010201126.0A 2020-03-20 2020-03-20 Cleaning device Pending CN111318503A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202010201126.0A CN111318503A (en) 2020-03-20 2020-03-20 Cleaning device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202010201126.0A CN111318503A (en) 2020-03-20 2020-03-20 Cleaning device

Publications (1)

Publication Number Publication Date
CN111318503A true CN111318503A (en) 2020-06-23

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN202010201126.0A Pending CN111318503A (en) 2020-03-20 2020-03-20 Cleaning device

Country Status (1)

Country Link
CN (1) CN111318503A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112057013A (en) * 2020-08-25 2020-12-11 陈瑜 Multi-angle particle cleaning equipment

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5224503A (en) * 1992-06-15 1993-07-06 Semitool, Inc. Centrifugal wafer carrier cleaning apparatus
CN105381978A (en) * 2015-11-27 2016-03-09 全椒县新华机械有限责任公司 Automatic cleaning control equipment for diesel engine air cylinder heads
US20160243593A1 (en) * 2015-02-18 2016-08-25 Ebara Corporation Substrate cleaning apparatus,substrate cleaning method, and substrate processing apparatus
CN107665832A (en) * 2016-07-27 2018-02-06 上海新昇半导体科技有限公司 Brilliant box cleaning equipment
CN109786210A (en) * 2017-11-14 2019-05-21 台湾积体电路制造股份有限公司 The system of monitoring cleaning processing procedure
CN209491104U (en) * 2019-01-25 2019-10-15 重庆红江机械有限责任公司 A kind of parts cleanliness detector

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5224503A (en) * 1992-06-15 1993-07-06 Semitool, Inc. Centrifugal wafer carrier cleaning apparatus
US20160243593A1 (en) * 2015-02-18 2016-08-25 Ebara Corporation Substrate cleaning apparatus,substrate cleaning method, and substrate processing apparatus
CN105381978A (en) * 2015-11-27 2016-03-09 全椒县新华机械有限责任公司 Automatic cleaning control equipment for diesel engine air cylinder heads
CN107665832A (en) * 2016-07-27 2018-02-06 上海新昇半导体科技有限公司 Brilliant box cleaning equipment
CN109786210A (en) * 2017-11-14 2019-05-21 台湾积体电路制造股份有限公司 The system of monitoring cleaning processing procedure
CN209491104U (en) * 2019-01-25 2019-10-15 重庆红江机械有限责任公司 A kind of parts cleanliness detector

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
张福学等: "《载体驱动陀螺》", 30 November 2015, 国防工业出版社 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112057013A (en) * 2020-08-25 2020-12-11 陈瑜 Multi-angle particle cleaning equipment

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PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
TA01 Transfer of patent application right
TA01 Transfer of patent application right

Effective date of registration: 20211101

Address after: 710000 room 1-3-029, No. 1888, Xifeng South Road, high tech Zone, Xi'an, Shaanxi Province

Applicant after: Xi'an yisiwei Material Technology Co.,Ltd.

Applicant after: XI'AN ESWIN SILICON WAFER TECHNOLOGY Co.,Ltd.

Address before: Room 1323, block a, city gate, No.1 Jinye Road, high tech Zone, Xi'an, Shaanxi 710065

Applicant before: XI'AN ESWIN SILICON WAFER TECHNOLOGY Co.,Ltd.

RJ01 Rejection of invention patent application after publication
RJ01 Rejection of invention patent application after publication

Application publication date: 20200623