CN111304615A - Physical vapor deposition equipment for surface of glass cover of cockpit of fighter - Google Patents
Physical vapor deposition equipment for surface of glass cover of cockpit of fighter Download PDFInfo
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- CN111304615A CN111304615A CN202010250488.9A CN202010250488A CN111304615A CN 111304615 A CN111304615 A CN 111304615A CN 202010250488 A CN202010250488 A CN 202010250488A CN 111304615 A CN111304615 A CN 111304615A
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- 239000011521 glass Substances 0.000 title claims abstract description 37
- 238000005240 physical vapour deposition Methods 0.000 title claims abstract description 20
- 239000007789 gas Substances 0.000 claims abstract description 47
- 238000010849 ion bombardment Methods 0.000 claims abstract description 17
- 238000001816 cooling Methods 0.000 claims abstract description 10
- 238000004140 cleaning Methods 0.000 claims abstract description 8
- 230000005540 biological transmission Effects 0.000 claims description 15
- 238000002156 mixing Methods 0.000 claims description 6
- 239000000725 suspension Substances 0.000 claims description 5
- 230000001360 synchronised effect Effects 0.000 claims description 3
- 238000000151 deposition Methods 0.000 abstract description 17
- 230000008021 deposition Effects 0.000 description 17
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 229910052786 argon Inorganic materials 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- 206010033799 Paralysis Diseases 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 210000001503 joint Anatomy 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000012840 feeding operation Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a physical vapor deposition device for the surface of a glass cover of a cockpit of a fighter, wherein a vacuum gauge can measure the vacuum degree in a vacuum cavity pumped by a vacuum pump and transmit the vacuum degree to a control system, an inflation system can fill different gases into the vacuum cavity, the inner side surface of a workpiece can be detachably arranged on a workpiece positioning device in the vacuum cavity, an ion bombardment plate in the vacuum cavity can carry out plasma cleaning on the outer side surface of the workpiece, a magnetron cathode in the vacuum cavity can just cover the outer side surface of the workpiece and keep a set distance with the outer side surface of the workpiece, the magnetron cathode can sputter a deposited film on the surface of the workpiece, a cooling system can cool the magnetron cathode and the vacuum pump, the control system controls the operation of the vacuum pump, the magnetron cathode, the ion bombardment plate, the inflation system and the cooling system, the full-automatic control of the invention has high efficiency of depositing a transparent conductive film on the surface of, the film thickness uniformity is good, and the film and the glass cover are high in combination firmness.
Description
Technical Field
The invention relates to magnetron sputtering film deposition equipment, in particular to physical vapor deposition equipment for the surface of a glass cover of a cockpit of a fighter.
Background
The glass covers are arranged on the cockpit of the fighter, the cockpit of the fighter is a multi-curved-surface organic or inorganic glass cover, and if an enemy plane or a ground electronic troops sends out strong electromagnetic waves in the mission process of the fighter, all electronic systems such as a level meter on an airplane can be paralyzed, even lines on the fighter are possibly short-circuited due to the paralysis of the electronic systems, so that the flight safety of the fighter is threatened;
when the fighter flies at high altitude, vapor fog is easily formed on the surface of the glass cover of the cockpit of the fighter due to the cold and hot temperature difference, so that the sight of a driver is influenced, and further, the flying safety hidden danger is generated.
Disclosure of Invention
In order to overcome the defects, the invention provides the physical vapor deposition equipment for the surface of the glass cover of the cockpit of the fighter, which can deposit a transparent conductive film layer on the surface of the glass cover of the cockpit of the fighter, so that the glass cover of the cockpit of the fighter has the effects of electromagnetic interference resistance and vapor fog resistance.
The technical scheme adopted by the invention for solving the technical problem is as follows: a physical vapor deposition device for the surface of a glass cover of a cockpit of a fighter comprises a vacuum cavity, a vacuum pump, a magnetic control cathode, an ion bombardment plate, a workpiece positioning device, an inflation system, a cooling system and a control system, wherein the vacuum pump can vacuumize the vacuum cavity, a vacuum gauge in the vacuum cavity can measure the vacuum degree in the vacuum cavity and transmit the vacuum degree to the control system, the inflation system can selectively fill different gases in the vacuum cavity, the workpiece positioning device can be fixedly positioned in the vacuum cavity, the inner side surface of a workpiece can be detachably arranged on the workpiece positioning device, the ion bombardment plate is fixedly arranged in the vacuum cavity, the ion bombardment plate can carry out plasma cleaning on the outer side surface of the workpiece, the magnetic control cathode is arranged in the vacuum cavity, the magnetic control cathode can be just coated outside the outer side surface of the workpiece and keeps a set distance with the outer side surface, the magnetron cathode can sputter a deposited film on the surface of a workpiece, the cooling system can cool the magnetron cathode and the vacuum pump, and the control system controls the vacuum pump, the magnetron cathode, the ion bombardment plate, the inflation system and the cooling system to operate.
As a further improvement of the invention, the magnetron cathode comprises a first magnetron cathode target, a second magnetron cathode target, a cathode base, a corner driving device and a feeding driving device, the cathode base can be arranged in a vacuum cavity in a moving way along the length direction of a workpiece, the feeding driving device drives the cathode base to move, the first magnetron cathode target and the second magnetron cathode target are respectively hinged on the cathode base, the corner driving device drives the first magnetron cathode target and the second magnetron cathode target to synchronously rotate in opposite directions or in reverse directions, a V-shaped space matched with the shape of any section of the workpiece can be formed between the first magnetron cathode target and the second magnetron cathode target, the workpiece just can pass through the V-shaped space, and a control system controls the feeding driving device and the corner driving device to operate.
As a further improvement of the invention, the first magnetic control cathode target and the second magnetic control cathode target are respectively of a bent plate-shaped structure matched with the shapes of two sides of a workpiece, the first magnetic control cathode target and the second magnetic control cathode target are coaxially hinged with the cathode base, the corner driving device comprises a first servo motor and a transmission gear mechanism, meshing gears are respectively arranged on the first magnetic control cathode target and the second magnetic control cathode target, the first servo motor is in meshing transmission with the meshing gears on the first magnetic control cathode target and the second magnetic control cathode target through gears with different rotation directions on the transmission gear mechanism, synchronous reverse rotation of the first magnetic control cathode target and the second magnetic control cathode target is realized, and the control system controls the start, stop and rotation of the first servo motor.
As a further improvement of the invention, a cathode rail extending along the length direction of the workpiece is also arranged in the vacuum cavity, a cathode trolley is arranged on the cathode rail, the feeding driving device drives the cathode trolley to move along the extending direction of the cathode rail, and the cathode seat is fixedly arranged on the cathode trolley.
As a further improvement of the invention, the feeding driving device comprises a ball screw transmission mechanism and a second servo motor, the second servo motor drives the cathode trolley to move through the ball screw transmission mechanism, and the control system controls the second servo motor to start, stop and turn.
As a further improvement of the invention, the workpiece positioning device comprises a support, chain wheels, a chain and a third servo motor, wherein the two ends of the support along the length direction of the workpiece are respectively provided with one chain wheel in a rotatable manner, the chain is meshed with the two chain wheels, the two ends of the chain are respectively connected with the two ends of the inner side of the workpiece along the length direction of the workpiece, the third servo motor drives one chain wheel to rotate, and a control system controls the third servo motor to start, stop and turn.
As a further improvement of the invention, the bracket is also provided with a suspension point, and the center of the workpiece can be rotatably suspended on the suspension point.
As a further improvement of the invention, a transverse rail horizontally extending from an inlet of the vacuum cavity to the interior of the vacuum cavity is also arranged in the vacuum cavity, a workpiece frame trolley capable of horizontally moving is arranged on the transverse rail, and the workpiece positioning device is arranged on the workpiece frame trolley.
As a further improvement of the vacuum chamber, the vacuum chamber is further provided with an external trolley, the external trolley is provided with an external rail connected with the inside of the vacuum chamber, and the workpiece frame trolley can slide onto the external trolley along the external rail.
As a further improvement of the invention, the inflation system comprises gas paths for providing different gases, a gas mixing device, a valve body and a gas flowmeter, each gas path is communicated with the vacuum cavity through the gas mixing device, the valve body and the gas flowmeter are arranged on each gas path, the gas flowmeter can detect the flow rate value of the gas flow in the gas path and transmit the flow rate value to the control system, and the control system controls the opening and closing of the valve body on each gas path.
The invention has the beneficial effects that: the invention can deposit a transparent conductive film layer on the surface of the glass cover of the cockpit of the fighter, so that the glass cover of the cockpit of the fighter has the functions of preventing electromagnetic interference and forming steam fog on the surface of the cockpit due to cold-hot temperature difference to influence the sight of a driver, the invention ensures that a relatively equal distance is kept between a magnetic control cathode and the surface of the glass cover when a magnetic control cathode works and the surface of the glass cover by adjusting the included angle and the height of the first magnetic control cathode target and the second magnetic control cathode target and adjusting the front and back inclination angles of a workpiece, thereby ensuring the technical performance of the film layer on the surface of the glass cover of the cockpit, and the invention also carries out plasma cleaning on the surface of the glass cover before film deposition through an ion bombardment plate, greatly improves the bonding force between the film layer and the glass cover, and improves the convenience for mounting and dismounting the workpiece through the matching of a workpiece carrier trolley and an external trolley, and the invention is fully automatically controlled, has high efficiency, the film thickness uniformity is good, and the film and the glass cover are high in combination firmness.
Drawings
FIG. 1 is a front view of the structural principle of the present invention;
FIG. 2 is a left side view of the structural principle of the present invention;
FIG. 3 is a diagram showing the state of the workpiece in butt joint with an external trolley after film deposition;
FIG. 4 is a schematic diagram of a magnetron cathode structure;
FIG. 5 is a schematic diagram illustrating a front end of a workpiece being subjected to film deposition according to the present invention;
FIG. 6 is a schematic diagram illustrating a rear end of a workpiece being subjected to film deposition according to the present invention;
FIG. 7 is a front view of a workpiece;
FIG. 8 is a left side view of the workpiece;
fig. 9 is a top view of the workpiece.
Detailed Description
Example (b): a fighter plane cockpit glass cover surface physical vapor deposition device comprises a vacuum cavity 1, a vacuum pump 13, a magnetic control cathode, an ion bombardment plate 8, a workpiece positioning device, an inflation system, a cooling system and a control system, wherein the vacuum pump 13 can vacuumize the vacuum cavity 1, a vacuum gauge in the vacuum cavity 1 can measure the vacuum degree in the vacuum cavity 1 and transmit the vacuum degree to the control system, the inflation system can selectively fill different types of gas in the vacuum cavity 1, the workpiece positioning device can be fixedly positioned in the vacuum cavity 1, the inner side surface of a workpiece 3 can be detachably installed on the workpiece positioning device, the ion bombardment plate 8 is fixedly installed in the vacuum cavity 1, the ion bombardment plate 8 can carry out plasma cleaning on the outer side surface of the workpiece 3, the magnetic control cathode is installed in the vacuum cavity 1, the magnetic control cathode can be coated outside the outer side surface of the workpiece 3 and keeps a set distance with the outer side surface of the workpiece 3, the magnetron cathode can sputter a deposited film on the surface of the workpiece 3, the cooling system can cool the magnetron cathode and the vacuum pump 13, and the control system controls the vacuum pump 13, the magnetron cathode, the ion bombardment plate 8, the inflation system and the cooling system to operate.
Installing a workpiece 3 needing magnetron sputtering film deposition on a workpiece positioning device, positioning the workpiece by the inner side surface of the workpiece, enabling the outer side surface to be completely opposite to a magnetron cathode, then closing a vacuum cavity 1, starting a vacuum pump 13 to vacuumize the vacuum cavity 1 all the time, after the vacuum cavity reaches the required vacuum degree, filling a certain amount of argon into the vacuum cavity by an inflation system, starting a power supply of an ion bombardment plate 8 to carry out plasma cleaning on the outer side surface of the workpiece 3 so as to improve the bonding force between a film layer and a glass cover, then closing the inflation system, starting the power supply of the magnetron cathode when the vacuum cavity 1 reaches the vacuum degree required by film deposition, simultaneously opening the inflation system to fill a certain amount of argon and oxygen into the vacuum cavity 1 so as to realize film deposition on the outer surface of the glass cover, and the equipment realizes physical vapor deposition of a transparent conductive film layer on the outer side surface of the workpiece 3, the glass cover of the cockpit has the functions of electromagnetic interference resistance and the influence of vapor fog formed on the surface of the cockpit cover on the sight of a driver due to cold and hot temperature difference.
The magnetic control cathode comprises a first magnetic control cathode target 4, a second magnetic control cathode target 5, a cathode base 6, a corner driving device and a feeding driving device, wherein the cathode base 6 can be installed in a vacuum cavity in a moving mode along the length direction of a workpiece, the feeding driving device drives the cathode base 6 to move, the first magnetic control cathode target 4 and the second magnetic control cathode target 5 are respectively hinged to the cathode base 6, the corner driving device drives the first magnetic control cathode target 4 and the second magnetic control cathode target 5 to synchronously rotate in opposite directions or in reverse directions, a V-shaped space matched with the shape of any section of the workpiece can be formed between the first magnetic control cathode target 4 and the second magnetic control cathode target 5, the workpiece just can penetrate through the interior of the V-shaped space, and the feeding driving device and the corner driving device are controlled by a control system to operate. After the workpiece is cleaned by plasma, the control system enters a film deposition program, the cathode base 6 drives the first magnetic control cathode target 4 and the second magnetic control cathode target 5 to move along the length direction of the workpiece, and simultaneously, the first magnetic control cathode target 4 and the second magnetic control cathode target 5 synchronously rotate to adjust the included angle between the two to match the appearance of any cross section of the workpiece, so that the first magnetic control cathode target 4 and the second magnetic control cathode target 5 are always deposited with the outer side surface of the workpiece in an equidistant parallel state, the uniform physical vapor deposition of a transparent conductive film layer at any position of the surface of the workpiece can be realized, the thickness of the film layer is prevented from being uneven, and the combination between any position of the film layer and the surface of the workpiece is firm.
The first magnetic control cathode target 4 and the second magnetic control cathode target 5 are respectively of a bent plate-shaped structure matched with the shapes of two sides of a workpiece, the first magnetic control cathode target 4 and the second magnetic control cathode target 5 are coaxially hinged with a cathode base 6, the corner driving device comprises a first servo motor 10 and a transmission gear mechanism, meshing gears are respectively arranged on the first magnetic control cathode target 4 and the second magnetic control cathode target 5, the first servo motor 10 is in meshing transmission with the meshing gears on the first magnetic control cathode target 4 and the second magnetic control cathode target 5 through gears which are arranged on the transmission gear mechanism and rotate in different directions, synchronous reverse rotation of the first magnetic control cathode target 4 and the second magnetic control cathode target 5 is achieved, and the control system controls the first servo motor 10 to start, stop and turn.
According to the workpiece drawing surface led into the control system, the control system controls the first servo motor 10 to operate, and then the included angle between the first magnetic control cathode target 4 and the second magnetic control cathode target 5 can be adjusted to be increased or decreased to adapt to the included angle between the outer side surfaces of different cross sections of the workpiece, so that the first magnetic control cathode target 4 and the second magnetic control cathode target 5 are ensured to be in a parallel equidistant state with any position of the outer side surface of the workpiece, the magnetic control cathode is ensured to always work at a certain distance from the surface of the glass cover, and the coating thickness of the outer side surface of the workpiece is ensured to be uniform.
The vacuum chamber 1 is also internally provided with a cathode rail extending along the length direction of the workpiece, the cathode rail is provided with a cathode trolley 7, the feeding driving device drives the cathode trolley 7 to move along the extending direction of the cathode rail, and the cathode base 6 is fixedly arranged on the cathode trolley 7. The feeding motion of the first magnetic control cathode target 4 and the second magnetic control cathode target 5 is realized by the back and forth motion of the cathode trolley 7 along the cathode track, so that the comprehensive film deposition of the workpiece is realized.
The feeding driving device comprises a ball screw transmission mechanism 9 and a second servo motor 12, the second servo motor 12 drives the cathode trolley 7 to move through the ball screw transmission mechanism 9, and the control system controls the second servo motor 12 to start, stop and turn. The control system controls the running speed of the second servo motor 12 to be matched with the running speed of the first servo motor 10 according to the workpiece drawing surface led into the control system, and therefore the magnetron cathode and any position on the surface of the glass cover can work equidistantly.
The workpiece positioning device comprises a support, chain wheels 14, a chain 15 and a third servo motor 11, the chain wheels 14 are respectively arranged at two ends of the support in the length direction of the workpiece in a rotatable mode, the chain 15 is meshed with the two chain wheels 14, two ends of the chain 15 are respectively connected with two ends of the workpiece in the length direction of the workpiece in a rotatable mode, the third servo motor 11 drives one chain wheel 14 to rotate, and a control system controls the third servo motor 11 to start, stop and turn. Two ends of a workpiece are connected by a chain 15, a chain wheel 14 drives a third servo motor 11, and two ends of the glass cover can move up and down under the control of a control system, so that the film deposition can be ensured to be kept in a parallel equidistant state with the surface of any cross section part of the glass cover all the time in the feeding operation process of the magnetic control cathode.
The bracket is also provided with a suspension point 19, and the center of the workpiece can be rotatably suspended on the suspension point 19. The outer surface of the workpiece is hung on the bracket downwards, and the center of the workpiece rotates by taking the hanging point 19 as a fulcrum.
The vacuum chamber body 1 is also internally provided with a transverse rail 16 which horizontally extends from the inlet of the vacuum chamber body 1 to the inside of the vacuum chamber body 1, the transverse rail 16 is provided with a workpiece frame trolley 2 which can horizontally move, and the workpiece positioning device is arranged on the workpiece frame trolley 2. Fixing a glass cover on the workpiece frame trolley 2, pushing the vacuum cavity 1, then closing a door of the vacuum cavity 1, starting the vacuum pump 13 group for vacuumizing, and easily and quickly conveying workpieces into the vacuum cavity 1 through the workpiece frame trolley 2.
The vacuum chamber is also provided with an external trolley 17, the external trolley 17 is provided with an external rail 18 connected with the inside of the vacuum chamber 1, and the workpiece frame trolley 2 can slide to the external trolley 17 along the external rail 18. The workpiece frame trolley 2 is in butt joint with the external trolley 17 through the external rail 18, so that workpieces can be loaded and unloaded outside the vacuum cavity 1, and the convenience of workpiece installation and disassembly is improved.
The inflation system comprises gas circuits for providing different gases, a gas mixing device, a valve body and a gas flowmeter, wherein each gas circuit is communicated with the vacuum cavity 1 through the gas mixing device, the valve body and the gas flowmeter are arranged on each gas circuit, the gas flowmeter can detect the flow value of the gas flow in the gas circuit and transmit the flow value to the control system, and the control system controls the opening and closing of the valve body on each gas circuit.
The work flow of the physical vapor deposition equipment on the surface of the workpiece is as follows:
1. fixing a glass cover workpiece of a cockpit of a fighter on a workpiece carrier trolley 2, pushing a vacuum cavity 1, closing a door of the vacuum cavity 1, and starting a vacuum pump 13 to vacuumize the vacuum cavity 1;
2. after the vacuum cavity 1 reaches the required vacuum degree, the gas filling system is controlled by the control system to fill a certain amount of argon gas into the vacuum cavity 1 according to the detection data of the gas flowmeter, the power supply of the ion bombardment plate 8 is started, and the ion bombardment plate 8 is used for carrying out plasma cleaning on the glass cover;
3. after the plasma cleaning is finished, the gas charging system is closed, the vacuum pump 13 keeps vacuumizing, when the vacuum cavity 1 reaches the vacuum degree required by film deposition, the control system controls the power supply of the magnetic control cathode to be turned on, and simultaneously controls the first servo motor 10, the second servo motor 12 and the third servo motor 11 to be started, and simultaneously the gas charging system is opened, a certain amount of argon and oxygen are charged into the cavity, and the film deposition procedure is started;
4. during film deposition, the magnetic control cathode and the glass cover are controlled by a control system, the front end of a workpiece descends firstly, then the front end slowly ascends, the rear end gradually descends, meanwhile, the magnetic control cathode runs and feeds along the length direction of the workpiece, and the included angle between a first magnetic control cathode target 4 and a second magnetic control cathode target 5 is automatically adjusted along with the fact that the magnetic control cathode is opposite to different parts of the workpiece, so that the film deposition is carried out on the outer side parts of the target surface of the magnetic control cathode and any cross section of the workpiece in a parallel equal target base distance state all the time, and finally, the deposition of all film layers on the;
5. the magnetic control cathode target power supply, the first servo motor, the second servo motor, the third servo motor and the gas flowmeter are turned off, the cathode trolley 7 is reset, the chain 15 drives the workpiece to reset, the vacuum pump 13 is turned off, the inflation valve on the vacuum cavity 1 is opened to break vacuum, then the large door of the vacuum cavity 1 is opened, the workpiece frame trolley 2 is pushed out of the vacuum cavity 1 and is supported by a trolley 17 which is pushed to the outside, and finally the glass cover is taken down;
6. and finishing the film deposition work.
Claims (10)
1. The utility model provides a fighter plane cockpit glass cover surface physical vapor deposition equipment which characterized in that: the vacuum pump can vacuumize the vacuum cavity, a vacuum gauge in the vacuum cavity can measure the vacuum degree in the vacuum cavity and transmit the vacuum degree to the control system, the inflation system can selectively charge different types of gas into the vacuum cavity, the workpiece positioning device can be fixedly positioned in the vacuum cavity, the inner side surface of a workpiece (3) can be detachably mounted on the workpiece positioning device, the ion bombardment plate is fixedly mounted in the vacuum cavity, the ion bombardment plate can carry out plasma cleaning on the outer side surface of the workpiece, the magnetron cathode is mounted in the vacuum cavity, the magnetron cathode can be coated outside the outer side surface of the workpiece and keeps a set distance with the outer side surface of the workpiece, and the magnetron cathode can sputter a deposited film on the surface of the workpiece, the cooling system can cool the magnetic control cathode and the vacuum pump, and the control system controls the vacuum pump, the magnetic control cathode, the ion bombardment plate, the inflation system and the cooling system to operate.
2. The fighter plane cockpit glass cover surface physical vapor deposition apparatus of claim 1, wherein: the magnetic control cathode comprises a first magnetic control cathode target (4), a second magnetic control cathode target (5), a cathode base (6), a corner driving device and a feeding driving device, the cathode base can be installed in a vacuum cavity in a moving mode along the length direction of a workpiece, the feeding driving device drives the cathode base to move, the first magnetic control cathode target and the second magnetic control cathode target are respectively hinged to the cathode base, the corner driving device drives the first magnetic control cathode target and the second magnetic control cathode target to synchronously rotate in opposite directions or in reverse directions, a V-shaped space matched with the shape of any cross section of the workpiece can be formed between the first magnetic control cathode target and the second magnetic control cathode target, the workpiece can just penetrate through the interior of the V-shaped space, and the control system controls the feeding driving device and the corner driving device to operate.
3. The apparatus of claim 2, wherein the physical vapor deposition apparatus comprises: the first magnetic control cathode target and the second magnetic control cathode target are respectively of a bent plate-shaped structure matched with the shapes of two sides of a workpiece, the first magnetic control cathode target and the second magnetic control cathode target are coaxially hinged with a cathode base, the corner driving device comprises a first servo motor (10) and a transmission gear mechanism, meshing gears are respectively arranged on the first magnetic control cathode target and the second magnetic control cathode target, the first servo motor is in meshing transmission with the meshing gears on the first magnetic control cathode target and the second magnetic control cathode target through gears which are in different steering directions on the transmission gear mechanism, synchronous reverse rotation of the first magnetic control cathode target and the second magnetic control cathode target is achieved, and the control system controls the first servo motor to start, stop and steer.
4. The apparatus of claim 2, wherein the physical vapor deposition apparatus comprises: the vacuum cavity is also internally provided with a cathode rail extending along the length direction of the workpiece, the cathode rail is provided with a cathode trolley (7), the feeding driving device drives the cathode trolley to move along the extending direction of the cathode rail, and the cathode base is fixedly arranged on the cathode trolley.
5. The apparatus of claim 4, wherein the physical vapor deposition apparatus comprises: the feeding driving device comprises a ball screw transmission mechanism (9) and a second servo motor (12), the second servo motor drives the cathode trolley to move through the ball screw transmission mechanism, and the control system controls the second servo motor to start, stop and turn.
6. The apparatus of claim 2, wherein the physical vapor deposition apparatus comprises: the workpiece positioning device comprises a support, chain wheels (14), a chain (15) and a third servo motor (11), wherein the two ends of the support in the length direction of the workpiece can be respectively provided with one chain wheel in a rotating mode, the chain is meshed with the two chain wheels, the two ends of the chain are respectively connected with the two ends of the workpiece in the length direction of the workpiece, the third servo motor drives one chain wheel to rotate, and a control system controls the third servo motor to start, stop and turn.
7. The apparatus of claim 6, wherein the physical vapor deposition apparatus comprises: the bracket is also provided with a suspension point (19) on which the center of the workpiece can be rotatably suspended.
8. The physical vapor deposition apparatus for the surface of a glass cover of a cockpit of a fighter plane as set forth in claim 1 or 6, wherein: the vacuum cavity is internally provided with a transverse track (16) which horizontally extends from the inlet of the vacuum cavity to the inside of the vacuum cavity, the transverse track is provided with a workpiece frame trolley (2) which can horizontally move, and the workpiece positioning device is arranged on the workpiece frame trolley.
9. The apparatus of claim 8, wherein the physical vapor deposition apparatus comprises: the vacuum chamber is also provided with an external trolley (17), the external trolley is provided with an external track (18) connected with the inside of the vacuum chamber, and the workpiece frame trolley can slide to the external trolley along the external track.
10. The fighter plane cockpit glass cover surface physical vapor deposition apparatus of claim 1, wherein: the gas charging system comprises gas circuits for providing different gases, a gas mixing device, a valve body and a gas flowmeter, wherein each gas circuit is communicated with the vacuum cavity through the gas mixing device, the valve body and the gas flowmeter are arranged on each gas circuit, the gas flowmeter can detect the flow value of the gas flow in the gas circuit and transmit the flow value to the control system, and the control system controls the opening and closing of the valve body on each gas circuit.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010250488.9A CN111304615B (en) | 2020-04-01 | 2020-04-01 | Physical vapor deposition equipment for surface of glass cover of fighter aircraft cockpit |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010250488.9A CN111304615B (en) | 2020-04-01 | 2020-04-01 | Physical vapor deposition equipment for surface of glass cover of fighter aircraft cockpit |
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| Publication Number | Publication Date |
|---|---|
| CN111304615A true CN111304615A (en) | 2020-06-19 |
| CN111304615B CN111304615B (en) | 2024-07-30 |
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| CN202010250488.9A Active CN111304615B (en) | 2020-04-01 | 2020-04-01 | Physical vapor deposition equipment for surface of glass cover of fighter aircraft cockpit |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19830223C1 (en) * | 1998-07-07 | 1999-11-04 | Techno Coat Oberflaechentechni | Magnetron sputtering unit for multilayer coating of substrates especially in small to medium runs or in laboratories |
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| US20160053366A1 (en) * | 2014-08-22 | 2016-02-25 | Applied Materials, Inc. | High power impulse magnetron sputtering process to achieve a high density high sp3 containing layer |
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