CN209338652U - A kind of equipment for plastic part surface magnetron sputtering plating - Google Patents
A kind of equipment for plastic part surface magnetron sputtering plating Download PDFInfo
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- CN209338652U CN209338652U CN201821899855.2U CN201821899855U CN209338652U CN 209338652 U CN209338652 U CN 209338652U CN 201821899855 U CN201821899855 U CN 201821899855U CN 209338652 U CN209338652 U CN 209338652U
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- 239000004033 plastic Substances 0.000 title claims abstract description 71
- 229920003023 plastic Polymers 0.000 title claims abstract description 71
- 238000007747 plating Methods 0.000 title claims abstract description 42
- 238000001755 magnetron sputter deposition Methods 0.000 title claims abstract description 37
- 230000005291 magnetic effect Effects 0.000 claims abstract description 49
- 238000004544 sputter deposition Methods 0.000 claims abstract description 26
- 238000001771 vacuum deposition Methods 0.000 claims abstract description 26
- 238000007740 vapor deposition Methods 0.000 claims abstract description 22
- 238000010438 heat treatment Methods 0.000 claims abstract description 20
- 238000000034 method Methods 0.000 claims abstract description 19
- 230000008569 process Effects 0.000 claims abstract description 17
- 238000000576 coating method Methods 0.000 claims abstract description 6
- 239000011248 coating agent Substances 0.000 claims abstract description 5
- 238000004140 cleaning Methods 0.000 claims description 14
- 229910001220 stainless steel Inorganic materials 0.000 claims description 13
- 239000010935 stainless steel Substances 0.000 claims description 13
- 238000004519 manufacturing process Methods 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 11
- 238000012545 processing Methods 0.000 claims description 10
- 230000004048 modification Effects 0.000 claims description 5
- 238000012986 modification Methods 0.000 claims description 5
- 238000009434 installation Methods 0.000 claims description 4
- 238000004506 ultrasonic cleaning Methods 0.000 claims description 4
- 230000003373 anti-fouling effect Effects 0.000 claims description 3
- 239000000498 cooling water Substances 0.000 claims description 3
- 238000005192 partition Methods 0.000 claims description 2
- 238000005086 pumping Methods 0.000 claims description 2
- 239000004744 fabric Substances 0.000 claims 1
- 238000000465 moulding Methods 0.000 claims 1
- 238000005507 spraying Methods 0.000 abstract description 3
- 150000002500 ions Chemical class 0.000 description 28
- 239000007789 gas Substances 0.000 description 14
- 239000010410 layer Substances 0.000 description 14
- 230000008859 change Effects 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 4
- 230000008020 evaporation Effects 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 238000005253 cladding Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000012528 membrane Substances 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 230000009471 action Effects 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 230000003666 anti-fingerprint Effects 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000005422 blasting Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 230000005389 magnetism Effects 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- 238000005491 wire drawing Methods 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000000338 in vitro Methods 0.000 description 1
- 238000010849 ion bombardment Methods 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 239000002990 reinforced plastic Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 238000010025 steaming Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
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Abstract
The utility model relates to film coated plastic technical fields, it discloses a kind of equipment for plastic part surface magnetron sputtering plating, including magnetic control sputtering vacuum coating machine, the magnetic control sputtering vacuum coating machine includes vacuum cavity, the vacuum cavity is the vacuum cavity with tube structure, twin rotary magnetron target is installed in the vacuum cavity, the quantity of the twin rotary magnetron target has four groups and is uniformly distributed along the circumferential direction of the cylinder inboard wall, the middle position for being located at four groups of twin rotary magnetron targets is provided with turret system, the twin rotary magnetron target of described four groups is separated into four individual plated film spaces；Be respectively arranged in the vacuum cavity heating device, intermediate frequency ion source module, vapor deposition module, the heating device, intermediate frequency ion source module, vapor deposition module be separately positioned between two adjacent plated film spaces and with the plated film spaced apart.The utility model overcomes the drawbacks of existing plastic part surface spraying process, and coating quality is good.
Description
Technical field
The utility model relates to film coated plastic technical fields, and in particular to one kind is used for plastic part surface magnetron sputtering plating
Equipment.
Background technique
Traditional plastic part surface spraying process, it is most of to be all directly related to environmental issue, in addition after plastic shaping
Surface aqueous vapor and since the dirt problems of Electrostatic Absorption can all directly influence the quality of film layer.
Therefore, it is necessary to develop one kind new plastic part plating process and equipment to solve the above problems.And ion is infused
Entering technology is a big research direction, it is typical as low temperature magnetic sputtering coating technique (its using magnetic field and electric field reciprocation come
The directed movement of electronics is controlled, and makes electronic impact argon gas generate ion, then by argon ion bombardment target, so that target material surface
Sputter, sputtering particle directive piece surface forms film layer), key problem in technology is ensured that its film layer after plastic part plated film
Quality and adhesive force.
Utility model content
To solve the above-mentioned problems, the utility model proposes a kind of equipment for plastic part surface magnetron sputtering plating,
It is intended to the drawbacks of overcoming existing plastic part surface spraying process, the adhesive force of its film layer after reinforced plastics part plated film improves plated film
Quality.Specific technical solution is as follows:
A kind of equipment for plastic part surface magnetron sputtering plating, including magnetic control sputtering vacuum coating machine, the magnetic control
Sputtering vacuum coating equipment includes vacuum cavity, and the vacuum cavity is the vacuum cavity with tube structure, the vacuum cavity
Cylinder both ends be provided with closing door, in the vacuum cavity and be parallel to the direction of the tubular axis twin rotation be installed
Turn magnetic control target, the quantity of the twin rotary magnetron target there are four groups and is uniformly distributed along the circumferential direction of the cylinder inboard wall, in place
The middle position of four groups of twin rotary magnetron targets is provided with the turret system for positioning and installing plastic part, it is described
Turret system is rotatably arranged relative to the central axis of the cylinder, the twin rotary magnetron target of described four groups by it is antifouling every
Plate is spaced from each other and the twin rotary magnetron target of described four groups is made to be separated into four individual plated film spaces；The vacuum cavity
In be separately provided for the heating device that plastic part is preheated, for plastic part surface carry out vacuum plasma cleaning
Or the intermediate frequency ion source module of surface modification treatment, the vapor deposition module for being deposited, the heating device, intermediate frequency ion source
Module, vapor deposition module be separately positioned between two adjacent plated film spaces and with the plated film spaced apart.
Due to being provided with heating device, intermediate frequency ion source module and steaming in the vacuum cavity of magnetic control sputtering vacuum coating machine
Module is plated, so that can first carry out using heating device to plastic part in same vacuum cavity when magnetron sputtering plating
Preheating carries out vacuum plasma cleaning using surface of the intermediate frequency ion source module to plastic part after preheating, carries out magnetic control after cleaning
Vacuum coating is sputtered, vapor deposition module is reused after plated film, coated surface is deposited, or use intermediate frequency ion source module pair
Coated surface is modified processing, so that forming one layer of fingerprint proof membrane on the surface of plastic part.Therefore the magnetic control of the utility model
Sputtering vacuum coating equipment has high production efficiency, the advantage that binding force of cladding material is strong, coated surface quality is good.
The plasma cleaning process of above-mentioned plastic part is using intermediate frequency ion source module, in the high vacuum of vacuum cavity
Under the conditions of be passed through Ar gas, under the action of high voltage realize Ar gas ionization at Ar ion, Ar ion under the traction in magnetic field,
Workpiece surface is directly bombarded, the dust that frosting adsorbs is cleaned up.
When above-mentioned use heating device preheats plastic part, the temperature of preheating is preferably arranged to 90-100 DEG C.
A kind of equipment for plastic part surface magnetron sputtering plating of the utility model, relative to conventional flat target,
Twin rotary magnetron target is used on magnetic control sputtering vacuum coating machine, and the utilization rate and sputter rate of target can be improved, and
It is also greatly improved in the stability and plasma ionization effect of plated film.
In the utility model, pass through four groups of reasonable layout twin rotary magnetron targets, the heating devices, intermediate frequency in vacuum cavity
Ion source module, vapor deposition module and turret system, part preheating, the plasma for realizing magnetic control sputtering vacuum coating machine are clear
It washes, that magnetron sputtering plating, vapor deposition and intermediate frequency ion source surface are modified is multi-functional, compact-sized, high production efficiency, at film quality
It measures.
One of as a preferred embodiment of the present invention, the vapor deposition module is AF evaporation source (anti-fingerprint evaporation source) mould
Block.
As a preferred embodiment of the present invention two, the twin rotary magnetron target of described four groups has different targets.
When magnetron sputtering plating, different process gas can be passed through inside vacuum cavity to realize that different magnetic controls is anti-
It should sputter, so that the surface of plastic part obtains different types of film plating layer.
As a preferred embodiment of the present invention three, for described four individual plated film spaces, each of which plated film
Independent process gas system is arranged in space, to form mixed membranous layer for realizing in plastic part surface.
As a preferred embodiment of the present invention three, the turret system is numerical control turret system, and passes through digital control rotating
Frame system realizes the control of plating film location and the control of different location coating film thickness.
As a preferred embodiment of the present invention four, the vacuum cavity is 316L stainless-steel vacuum cavity, and described
Stainless-steel vacuum cavity is that its inner cavity is successively processed by shot blasting, ultrasonic cleaning processing and vacuum plasma are cleaned during fabrication
The stainless-steel vacuum cavity of processing.
In view of the characteristic that material surface is deflated, the material for the 316L stainless steel that the vacuum cavity in the utility model uses
Matter, outer surface wire drawing polishing, inner surface require to be polished to 400 mesh (being equivalent to 0.1~0.2 μm of roughness Ra).And weld seam is wanted
It is fully welded on the inside of cavity body of looking for the truth, intermittent weld mode can be used in atmosphere survey.
Above-mentioned 316L stainless steel material belongs to weak magnetic material, and magnetism will not be generated after welding, does not interfere with vacuum chamber
The magnetic line of force distribution in internal portion.
As a preferred embodiment of the present invention five, the vacuum cavity is the vacuum chamber with octagonal tube structure
Body.Twin rotary magnetron target is separately fixed on door closed at both ends, is convenient for routine maintenance.
It is above-mentioned more convenient using the vacuum cavity manufacture of octagonal tube structure, and be conducive to each component and vacuum cavity
Installation connection.
As a preferred embodiment of the present invention six, the turret system is numerical control turret system, the numerical control pivoted frame
It is rotated in system for positioning and installing the pivoted frame of plastic part and driven by stepper motor.
Above-mentioned turret system uses numerical control turret system, drives the pivoted frame of rotation can be in plated film mistake by stepper motor
Change the velocity of rotation of pivoted frame in journey in real time, so as to control film thickness, realizes gradual change film thickness, meet special plastic part
Plated film requirement.
As a preferred embodiment of the present invention seven, in the twin rotary magnetron target of described four groups, adjacent two groups twin
Raw its magnetic direction of rotary magnetron target is reversed.
In the twin rotary magnetron target of above-mentioned four groups, twin its magnetic direction of rotary magnetron target of adjacent two groups is set on the contrary
Set, make the magnetic line of force between any two can with connection, to form the magnetic circuit of a closure in the periphery of workpiece, prevent etc. from
Body is lost to enhance the concentration of the plasma of workpiece surface, to improve the consistency and binding force of film layer.
In the utility model, the magnetic control sputtering vacuum coating machine further include process gas system, cooling water recirculation system,
Vacuum-pumping system, control system.
As a preferred embodiment, plastic part can also carry out preceding processing, the pre-treatment before entering vacuum gas
Including ultrasonic cleaning and drying and processing.
The beneficial effects of the utility model are:
First, a kind of equipment for plastic part surface magnetron sputtering plating of the utility model, due in magnetron sputtering
Heating device, intermediate frequency ion source module and vapor deposition module are provided in the vacuum cavity of vacuum coating equipment, so that magnetic control splashes
When penetrating plated film, plastic part can first be preheated in same vacuum cavity using heating device, after preheating using intermediate frequency from
Component module carries out vacuum plasma cleaning to the surface of plastic part, carries out magnetic control sputtering vacuum coating after cleaning, after plated film again
Coated surface is deposited using vapor deposition module, or processing is modified to coated surface using intermediate frequency ion source module,
So that forming one layer of fingerprint proof membrane on the surface of plastic part.Therefore the magnetic control sputtering vacuum coating machine of the utility model has production
Advantage high-efficient, that binding force of cladding material is strong, coated surface quality is good.
Second, a kind of equipment for plastic part surface magnetron sputtering plating of the utility model is put down relative to conventional
Face target uses twin rotary magnetron target on magnetic control sputtering vacuum coating machine, the utilization rate and sputter rate of target can be improved,
And it is also greatly improved in the stability of plated film and plasma ionization effect.
Third, a kind of equipment for plastic part surface magnetron sputtering plating of the utility model, by vacuum cavity
The twin rotary magnetron target of four groups of interior reasonable layout, heating device, intermediate frequency ion source module, vapor deposition module and turret system, it is real
Part preheating, plasma cleaning, magnetron sputtering plating, vapor deposition and the intermediate frequency ion source surface of magnetic control sputtering vacuum coating machine are showed
Modified is multi-functional, and compact-sized, high production efficiency, quality of forming film are good.
4th, a kind of equipment for plastic part surface magnetron sputtering plating of the utility model, there are four individually for setting
Plated film space, independent process gas system, which is arranged, in each plated film space may be implemented to form hybrid films in plastic part surface
Layer.
5th, a kind of equipment for plastic part surface magnetron sputtering plating of the utility model, what vacuum cavity used
The material of 316L stainless steel and the vacuum degree for being conducive to raising vacuum cavity with lower roughness by polishing.
6th, a kind of equipment for plastic part surface magnetron sputtering plating of the utility model, using octagonal cylinder
The vacuum cavity manufacture of structure is more convenient, and the installation for being conducive to each component and vacuum cavity connects.
7th, a kind of equipment for plastic part surface magnetron sputtering plating of the utility model, turret system uses number
Turret system is controlled, drives the pivoted frame of rotation that can change in real time the rotation speed of pivoted frame in coating process by stepper motor
Degree realizes gradual change film thickness, meets the plated film requirement of special plastic part so as to control film thickness.
8th, a kind of equipment for plastic part surface magnetron sputtering plating of the utility model, four groups of twin rotary magnetics
It controls in target, twin its magnetic direction of rotary magnetron target of adjacent two groups is reversed, and makes the magnetic line of force between any two can be with connection
Get up, to form the magnetic circuit of a closure in the periphery of workpiece, prevent it is equal in vitro be lost to enhance workpiece surface etc.
The concentration of gas ions, to improve the consistency and binding force of film layer.
Detailed description of the invention
Fig. 1 is a kind of main structure signal of equipment for plastic part surface magnetron sputtering plating of the utility model
Figure；
Fig. 2 is the process flow chart that plastic part surface plated film is carried out using the equipment of the magnetron sputtering plating in Fig. 1.
In figure: 1, vacuum cavity, 2, heating device, 3, intermediate frequency ion source module, 4, twin rotary magnetron target, 5, vapor deposition mould
Block, 6, turret system.
Specific embodiment
With reference to the accompanying drawings and examples, specific embodiment of the present utility model is further described.Implement below
Example is only used for clearly illustrating the technical solution of the utility model, and cannot be used as a limitation the protection model of limitation the utility model
It encloses.
As Fig. 1 to 2 show a kind of implementation of equipment for plastic part surface magnetron sputtering plating of the utility model
Example, including magnetic control sputtering vacuum coating machine, the magnetic control sputtering vacuum coating machine include vacuum cavity 1, the vacuum cavity 1 is
The cylinder both ends of vacuum cavity with tube structure, the vacuum cavity 1 are provided with closing door, in the vacuum cavity 1
And the direction for being parallel to the tubular axis is equipped with twin rotary magnetron target 4, the quantity of the twin rotary magnetron target 4 has
It four groups and is uniformly distributed along the circumferential direction of the cylinder inboard wall, in the middle position for being located at four groups of twin rotary magnetron targets 4
It is provided with the turret system 6 for positioning and installing plastic part, the turret system 6 can relative to the central axis of the cylinder
Rotation setting, the twin rotary magnetron target 4 of described four groups are spaced from each other by antifouling partition and make four groups of twin rotations
Turn magnetic control target 4 and is separated into four individual plated film spaces；It is separately provided for carrying out plastic part in the vacuum cavity 1 pre-
The heating device 2 of heat, the intermediate frequency ion source mould for carrying out vacuum plasma cleaning or surface modification treatment to plastic part surface
Block 3, the vapor deposition module 5 for being deposited, the heating device 2, intermediate frequency ion source module 3, vapor deposition module 5 are separately positioned on
Between two adjacent plated film spaces and with the plated film spaced apart.
Due to being provided with heating device 2, intermediate frequency ion source module 3 in the vacuum cavity 1 of magnetic control sputtering vacuum coating machine
With vapor deposition module 5 so that when magnetron sputtering plating, can in same vacuum cavity using heating device 2 to plastic part
It is first preheated, vacuum plasma cleaning is carried out using surface of the intermediate frequency ion source module 3 to plastic part after preheating, is cleaned laggard
Row magnetic control sputtering vacuum coating reuses vapor deposition module 5 after plated film and coated surface is deposited, or uses intermediate frequency ion source
Module 3 is modified processing to coated surface, so that forming one layer of fingerprint proof membrane on the surface of plastic part.Therefore the present embodiment
Magnetic control sputtering vacuum coating machine has high production efficiency, the advantage that binding force of cladding material is strong, coated surface quality is good.
The plasma cleaning process of above-mentioned plastic part is using intermediate frequency ion source module 3, in the Gao Zhen of vacuum cavity 1
It is passed through Ar gas under empty condition, realizes Ar gas ionization under the action of high voltage into Ar ion, traction of the Ar ion in magnetic field
Under, workpiece surface is directly bombarded, the dust that frosting adsorbs is cleaned up.
When above-mentioned use heating device 2 preheats plastic part, the temperature of preheating is preferably arranged to 90-100 DEG C.
A kind of equipment for plastic part surface magnetron sputtering plating of the present embodiment, relative to conventional flat target, magnetic
Twin rotary magnetron target 4 is used on control sputtering vacuum coating equipment, the utilization rate and sputter rate of target, Er Qie can be improved
It is also greatly improved in the stability and plasma ionization effect of plated film.
In the present embodiment, by vacuum cavity 1 four groups of reasonable layout twin rotary magnetron targets 4, heating device 2, in
Frequency ion source module 3, vapor deposition module 5 and turret system 6, realize magnetic control sputtering vacuum coating machine part preheating, etc. from
Sub cleaning, magnetron sputtering plating, vapor deposition and the modification of intermediate frequency ion source surface it is multi-functional, compact-sized, high production efficiency, at
Film quality is good.
One of preferred embodiment as the present embodiment, the vapor deposition module 5 are AF evaporation source (anti-fingerprint evaporation source) module.
Two of preferred embodiment as the present embodiment, the twin rotary magnetron target 4 of described four groups have different targets.
When magnetron sputtering plating, different process gas can be passed through inside vacuum cavity 1 to realize different magnetic controls
Reactive sputtering, so that the surface of plastic part obtains different types of film plating layer.
Three of preferred embodiment as the present embodiment, for described four individual plated film spaces, each of which plated film is empty
Between independent process gas system is set, with for realizing plastic part surface formed mixed membranous layer.
Three of preferred embodiment as the present embodiment, the turret system 6 is numerical control turret system, and passes through numerical control pivoted frame
System 6 realizes the control of plating film location and the control of different location coating film thickness.
Four of preferred embodiment as the present embodiment, the vacuum cavity 1 be 316L stainless-steel vacuum cavity, and it is described not
Rust steel vacuum cavity is that its inner cavity is successively processed by shot blasting, at ultrasonic cleaning processing and vacuum plasma cleaning during fabrication
The stainless-steel vacuum cavity of reason.
In view of the characteristic that material surface is deflated, the material for the 316L stainless steel that the vacuum cavity 1 in the present embodiment uses,
Outer surface wire drawing polishing, inner surface require to be polished to 400 mesh (being equivalent to 0.1~0.2 μm of roughness Ra).And weld seam will look for the truth
It is fully welded on the inside of cavity body, intermittent weld mode can be used in atmosphere survey.
Above-mentioned 316L stainless steel material belongs to weak magnetic material, and magnetism will not be generated after welding, does not interfere with vacuum chamber
Magnetic line of force distribution inside body 1.
Five of preferred embodiment as the present embodiment, the vacuum cavity 1 are the vacuum chamber with octagonal tube structure
Body.Twin rotary magnetron target 4 is separately fixed on door closed at both ends, is convenient for routine maintenance.
It is above-mentioned more convenient using the vacuum cavity manufacture of octagonal tube structure, and be conducive to each component and vacuum cavity
Installation connection.
Six of preferred embodiment as the present embodiment, the turret system 6 are numerical control turret system, numerical control pivoted frame system
It is rotated in system 6 for positioning and installing the pivoted frame of plastic part and driven by stepper motor.
Above-mentioned turret system 6 uses numerical control turret system, drives the pivoted frame of rotation can be in plated film by stepper motor
Change the velocity of rotation of pivoted frame in real time in the process, so as to control film thickness, realizes gradual change film thickness, meet special plastic
The plated film requirement of part.
Seven of preferred embodiment as the present embodiment, in the twin rotary magnetron target 4 of described four groups, adjacent two groups twin
Its magnetic direction of rotary magnetron target 4 is reversed.
In the twin rotary magnetron target 4 of above-mentioned four groups, twin its magnetic direction of rotary magnetron target 4 of adjacent two groups is set on the contrary
Set, make the magnetic line of force between any two can with connection, to form the magnetic circuit of a closure in the periphery of workpiece, prevent etc. from
Body is lost to enhance the concentration of the plasma of workpiece surface, to improve the consistency and binding force of film layer.
In the present embodiment, the magnetic control sputtering vacuum coating machine further includes process gas system, cooling water recirculation system, true
Empty extract system, control system.
The above is only the preferred embodiment of the utility model, it is noted that for the common skill of the art
For art personnel, without deviating from the technical principle of the utility model, several improvements and modifications can also be made, these change
It also should be regarded as the protection scope of the utility model into retouching.
Claims (10)
1. a kind of equipment for plastic part surface magnetron sputtering plating, which is characterized in that including magnetic control sputtering vacuum coating machine,
The magnetic control sputtering vacuum coating machine includes vacuum cavity, and the vacuum cavity is the vacuum cavity with tube structure, described
The cylinder both ends of vacuum cavity are provided with closing door, in the vacuum cavity and be parallel to the tubular axis direction installation
There is twin rotary magnetron target, the quantity of the twin rotary magnetron target there are four groups and uniformly divides along the circumferential of the cylinder inboard wall
Cloth is provided with the pivoted frame system for positioning and installing plastic part in the middle position for being located at four groups of twin rotary magnetron targets
System, the turret system are rotatably arranged relative to the central axis of the cylinder, and the twin rotary magnetron target of described four groups is logical
Antifouling partition is crossed to be spaced from each other and the twin rotary magnetron target of described four groups is made to be separated into four individual plated film spaces；It is described
The heating device preheated to plastic part is separately provided in vacuum cavity, for carrying out vacuum etc. to plastic part surface
Ion Cleaning or the intermediate frequency ion source module of surface modification treatment, the vapor deposition module for being deposited, the heating device, in
Frequency ion source module, vapor deposition module are separately positioned between two adjacent plated film spaces and are separated by with the plated film space
It opens.
2. a kind of equipment for plastic part surface magnetron sputtering plating according to claim 1, which is characterized in that described
It is that AF evaporates source module that module, which is deposited,.
3. a kind of equipment for plastic part surface magnetron sputtering plating according to claim 1, which is characterized in that described
Four groups of twin rotary magnetron targets have different targets.
4. a kind of equipment for plastic part surface magnetron sputtering plating according to claim 1, which is characterized in that for
Independent process gas system is arranged in the individual plated film space of described four, each of which plated film space, with for realizing moulding
Materials and parts surface forms mixed membranous layer.
5. a kind of equipment for plastic part surface magnetron sputtering plating according to claim 1, which is characterized in that described
Turret system is numerical control turret system, and control and the different location coating film thickness of plating film location are realized by numerical control turret system
Control.
6. a kind of equipment for plastic part surface magnetron sputtering plating according to claim 1, which is characterized in that described
Vacuum cavity is 316L stainless-steel vacuum cavity, and the stainless-steel vacuum cavity is that its inner cavity is successively polished during fabrication
The stainless-steel vacuum cavity of processing, ultrasonic cleaning processing and vacuum plasma cleaning treatment.
7. a kind of equipment for plastic part surface magnetron sputtering plating according to claim 1, which is characterized in that described
Vacuum cavity is the vacuum cavity with octagonal tube structure.
8. a kind of equipment for plastic part surface magnetron sputtering plating according to claim 5, which is characterized in that described
Turret system is numerical control turret system, is used to position and install the pivoted frame of plastic part in the numerical control turret system by stepper motor
Drive rotation.
9. a kind of equipment for plastic part surface magnetron sputtering plating according to claim 1, which is characterized in that described
Four groups of twin rotary magnetron targets in, twin its magnetic direction of rotary magnetron target of adjacent two groups is reversed.
10. a kind of equipment for plastic part surface magnetron sputtering plating according to claim 1, which is characterized in that institute
Stating magnetic control sputtering vacuum coating machine further includes process gas system, cooling water recirculation system, vacuum-pumping system, control system.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821899855.2U CN209338652U (en) | 2018-11-19 | 2018-11-19 | A kind of equipment for plastic part surface magnetron sputtering plating |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821899855.2U CN209338652U (en) | 2018-11-19 | 2018-11-19 | A kind of equipment for plastic part surface magnetron sputtering plating |
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| CN209338652U true CN209338652U (en) | 2019-09-03 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111304615A (en) * | 2020-04-01 | 2020-06-19 | 昆山浦元真空技术工程有限公司 | Physical vapor deposition equipment for surface of glass cover of cockpit of fighter |
| CN111650676A (en) * | 2020-07-01 | 2020-09-11 | 华东师范大学 | A vacuum degree superior to 1 × 10-8Pa full-glass optical atomic cavity and preparation method thereof |
-
2018
- 2018-11-19 CN CN201821899855.2U patent/CN209338652U/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111304615A (en) * | 2020-04-01 | 2020-06-19 | 昆山浦元真空技术工程有限公司 | Physical vapor deposition equipment for surface of glass cover of cockpit of fighter |
| CN111650676A (en) * | 2020-07-01 | 2020-09-11 | 华东师范大学 | A vacuum degree superior to 1 × 10-8Pa full-glass optical atomic cavity and preparation method thereof |
| CN111650676B (en) * | 2020-07-01 | 2023-07-14 | 华东师范大学 | Vacuum degree is better than 1 multiplied by 10 -8 Pa all-glass optical atomic cavity and preparation method thereof |
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Address after: 225400 He Han 1 and 6 Groups, Hanzhuang Village, Huangqiao Town, Taixing City, Taizhou City, Jiangsu Province Patentee after: Jiangsu Guangke Precision Equipment Co.,Ltd. Country or region after: China Address before: 214400 Changshan Road, Jiangyin High-tech Park, Wuxi City, Jiangsu Province Patentee before: JIANGYIN GKVAC MACHINERY Co.,Ltd. Country or region before: China |
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