CN111204987B - 一种玻璃型热控涂层及其制备方法 - Google Patents

一种玻璃型热控涂层及其制备方法 Download PDF

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CN111204987B
CN111204987B CN201811388287.4A CN201811388287A CN111204987B CN 111204987 B CN111204987 B CN 111204987B CN 201811388287 A CN201811388287 A CN 201811388287A CN 111204987 B CN111204987 B CN 111204987B
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孟政
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Abstract

本发明涉及涂层技术领域，特别是涉及一种玻璃型热控涂层及其制备方法。一种玻璃型热控涂层，包括:玻璃基体、缓冲层和种子层；所述玻璃基体，包括相对的第一表面和第二表面；所述缓冲层和所述种子层依次层叠于所述第一表面。上述玻璃型热控涂层的制备方法，包括在玻璃基体的第一表面上通过溅射法或蒸镀法依次沉积缓冲层、种子层、金属反射层、防氧化层；在玻璃基体的第二表面上通过溅射法或蒸镀法沉积导电膜层。本发明玻璃型热控涂层至少具有下列优点：有效地解决了涂层由于玻璃基底与金属反射层膨胀系数不匹配的问题，减少了热控涂层中膜层脱落的发生，改善了热控涂层的效果。

Description

一种玻璃型热控涂层及其制备方法
技术领域
本发明涉及涂层技术领域，特别是涉及一种玻璃型热控涂层及其制备方法。
背景技术
被动热控涂层中能够满足长寿命、全反射要求，具有低吸收率(α)、低α/ε比的涂层，主要有玻璃型和薄膜型镀银(铝)二次表面镜。传统的二次表面镜有对红外线有较强吸收的透明基体、对光有很强反射的金属反射层和保护层以及防静电层组成。通过选用合适的金属底层和一定厚度的基体层，可得到符合要求的热控涂层。
人造卫星在离地球赤道300公里的轨道上运行时，有65-70％的时间，都受到太阳光的强烈辐射，致使卫星向阳的一面，温度可达到200℃以上。而在阴影区域，卫星表面温度会下降至-200度左右，冷热循环导致材料膨胀收缩，特别是当玻璃基底与金属反射层直接接触时，石英的膨胀系数(5.3～5.8)×10-7/K，金属铝的膨胀系数23.6×10-6/K，银的膨胀系数19.5×10-6/K，两者相差两个数量级，极易发生热控涂层中膜层的脱落，造成热控涂层失效。
发明内容
本发明的主要目的在于，提供一种新型结构的玻璃型热控涂层及其制备方法，所要解决的技术问题是热控涂层中膜层脱落，热控涂层失效。
本发明的目的及解决其技术问题是采用以下技术方案来实现的。依据本发明提出的一种玻璃型热控涂层，包括:玻璃基体、缓冲层和种子层；
所述玻璃基体，包括相对的第一表面和第二表面；
所述缓冲层和所述种子层依次层叠于所述第一表面。
本发明的目的及解决其技术问题还可采用以下技术措施进一步实现。
优选的，前述的玻璃型热控涂层，其中所述缓冲层为氮化物或氧化物的涂层；
所述缓冲层的厚度为10-100nm。
优选的，前述的玻璃型热控涂层，其中所述氮化物为Si3N4、AlN。
优选的，前述的玻璃型热控涂层，其中所述氧化物为BiOx、SnO2、TiO2、ZnO；
其中，1.4≤x≤1,7。
优选的，前述的玻璃型热控涂层，其中所述种子层为金属或不完全氧化金属；
所述种子层的厚度为2-10nm。
优选的，前述的玻璃型热控涂层，其中所述种子层采用NiCr合金、Al2/3O1-x、ZnO1-x或Ti1/2O1-x；
其中，0.1﹤x≤1。
优选的，前述的玻璃型热控涂层，其中还包括金属反射层和防氧化层，在所述种子层的相对于所述缓冲层的另一表面依次层叠所述金属反射层和所述防氧化层。
优选的，前述的玻璃型热控涂层，其中所述的防氧化层为NiCr。
优选的，前述的玻璃型热控涂层，其中在所述玻璃基体的所述第二表面设有导电膜层。
本发明的目的及解决其技术问题还采用以下的技术方案来实现。依据本发明提出的一种上述玻璃型热控涂层的制备方法，包括在玻璃基体的第一表面上通过溅射法或蒸镀法依次沉积缓冲层、种子层、金属反射层、防氧化层；
在玻璃基体的第二表面上通过溅射法或蒸镀法沉积导电膜层。
借由上述技术方案，本发明玻璃型热控涂层至少具有下列优点：
有效地解决了涂层由于玻璃基底与金属反射层膨胀系数不匹配的问题，减少了热控涂层中膜层脱落的发生，改善了热控涂层的效果。
上述说明仅是本发明技术方案的概述，为了能够更清楚了解本发明的技术手段，并可依照说明书的内容予以实施，以下以本发明的较佳实施例并配合附图详细说明如后。
附图说明
图1是本发明的实施例的玻璃型热控涂层的结构示意图。
具体实施方式
为更进一步阐述本发明为达成预定发明目的所采取的技术手段及功效,以下结合附图及较佳实施例，对依据本发明提出的玻璃型热控涂层其具体实施方式、结构、特征及其功效，详细说明如后。在下述说明中，不同的“一实施例”或“实施例”指的不一定是同一实施例。此外，一或多个实施例中的特定特征、结构、或特点可由任何合适形式组合。
如图1所示，本发明的一个实施例提出的一种玻璃型热控涂层，其包括:玻璃基体1、缓冲层2和种子层3；所述玻璃基体1，包括相对的第一表面11和第二表面12；所述缓冲层2和所述种子层3依次层叠于所述第一表面11。
通过增加缓冲层、种子层，大大增强了膜层间的结合力，提高了涂层的耐高低温能力，有效地解决涂层由于玻璃基底与金属反射层膨胀系数不匹配的问题，减少了热控涂层中膜层脱落的发生，改善了热控涂层的效果，延长了涂层寿命。
作为优选方式，所述缓冲层2为氮化物或氧化物的涂层；所述缓冲层2的厚度为10-100nm。
通过将氮化物或氧化物涂敷在玻璃基体的第一表面上，并且形成10-100nm厚度的缓冲层，有效地提高了玻璃基体与膜层的结合力，解决膨胀系数不匹配的问题，从而有效地减少了热控涂层中膜层脱落的发生。
作为一个实施例，所述氮化物为Si3N4、AlN。
提高了缓冲层与玻璃表面的结合力,节省了材料成本。
作为一个实施例，所述氧化物为BiOx、SnO2、TiO2、ZnO；
其中，1.4≤x≤1.7。
提高了缓冲层与玻璃表面的结合力,节省了材料成本。
作为优选方式，所述种子层3为金属或不完全氧化金属；所述种子层3的厚度为2-10nm。
上述优选方式一方面提高膜层间的结合力，另一方面提高银膜或铝膜的膜层平整度，有利于铝或者银膜的结晶有序性，减少晶体缺陷造成的散射，从而提高反射率。
作为优选方式，所述种子层3采用NiCr合金、Al2/3O1-x、ZnO1-x或Ti1/2O1-x；其中，0.1﹤x≤1。
优选形成种子层的上述材料，均为金属或欠氧氧化物,易成膜,不易形成岛状结构，与Ag，Al等金属反射层、缓冲层材料结合性能好。
作为优选方式，还包括金属反射层4和防氧化层5，在所述种子层3的相对于所述缓冲层2的另一表面依次层叠所述金属反射层4和所述防氧化层5。
通过在玻璃基体、缓冲层和种子层的基础上继续形成金属反射层和防氧化层，构成了完整的玻璃型二次表面镜热控涂层，有效地解决了涂层由于玻璃基底与金属反射层膨胀系数不匹配的问题，减少了热控涂层中膜层脱落的发生，改善了热控涂层的效果。
作为优选方式，所述的防氧化层5为NiCr。
采用NiCr形成防氧化层易成膜,不易形成岛状结构，并且与Ag，Al等金属反射层结合性能好。
作为优选方式，在所述玻璃基体的所述第二表面设有导电膜层。
通过在第二表面设置导电膜层满足了玻璃型二次表面镜热控涂层对导电性的要求。
本发明的另一实施例提出一种上述玻璃型热控涂层的制备方法，在玻璃基体1的第一表面11上通过溅射法或蒸镀法依次沉积缓冲层2、种子层3、金属反射层4、防氧化层5；在玻璃基体1的第二表面12上通过溅射法或蒸镀法沉积导电膜层6。
以下以具体实施例说明上述玻璃型热控涂层的制备方法。
实施例一
本实施例提出的一种玻璃型热控涂层，其结构采用厚度为2mm的石英玻璃作为玻璃基体、厚度为20nm的Si3N4作为缓冲层、厚度为2nm的NiCr作为种子层、厚度为200nm的Ag作为金属反射层以及厚度为500nm的NiCr作为防氧化层。
上述涂层制备方法，包括以下步骤：
(1)在市购的2mm石英玻璃表面以硅靶材为镀膜材料制备氮化硅(Si3N4)薄膜，设定磁控溅射的功率为200W功率，Ar流量为20sccm，N2流量为20sccm，工作气压为0.4Pa，溅射时间为200s，获得缓冲层；
(2)在缓冲层的表面利用NiCr靶材制备种子层，设定磁控溅射的功率为200W功率，Ar流量为20sccm，工作气压为0.4Pa，溅射时间为20s，获得种子层；
(3)在种子层的表面利用金属银靶材制备金属发射层，设定磁控溅射的功率为200W功率，Ar流量为20sccm，工作气压为0.4Pa，溅射时间为2000s，获得金属发射层；
(4)在金属反射层的表面利用金属NiCr靶材制备防氧化层，设定磁控溅射的功率为200W功率，Ar流量为20sccm，工作气压为0.4Pa，溅射时间为5000s，获得防氧化层；
(5)以氧化铟锡靶材为镀膜材料制备ITO薄膜，设定磁控溅射的功率为200W功率，Ar流量为20sccm，O2流量为1.0sccm，工作气压为0.4Pa，溅射时间为200s，获得导电膜层。
实施例二
本实施例提出的一种玻璃型热控涂层，其结构采用通过厚度为2mm的石英玻璃作为玻璃基体1、厚度为20nm的TiO2作为缓冲层2、厚度为2nm的Ti作为种子层3、厚度为200nm的Ag作为金属反射层4以及厚度为200nm的Ti1/2O1-x作为防氧化层5。
上述涂层制备方法，包括以下步骤：
(1)在市购的2mm石英玻璃表面以二氧化钛颗粒为镀膜材料制备二氧化钛(TiO2)薄膜，镀膜背景真空2×10-4Pa，采用定流量模式设置补充氧流量为10sccm，结合离子源辅助沉积，蒸发速率0.2nm/s，镀膜时间100s，获得缓冲层TiO2；
(2)在缓冲层的表面利用金属钛为镀膜材料制备种子层，镀膜背景真空2×10-4Pa，采用定真空模式，工作气压2×10-4Pa，蒸发速率0.1nm/s，镀膜时间20s，获得种子层Ti；
(3)在种子层的表面利用金属银为镀膜材料制备金属发射层，镀膜背景真空2×10-4Pa，采用定真空模式，工作气压2×10-4Pa，蒸发速率1nm/s，镀膜时间200s，获得金属发射层Ag；
(4)在金属反射层的表面利用二氧化钛为镀膜材料制备防氧化层，镀膜背景真空2×10-4Pa，采用定流量模式设置补充氧流量为4sccm，结合离子源辅助沉积，蒸发速率0.4nm/s，镀膜时间500s，获得防氧化层Ti1/2O1-x；
(5)以氧化铟锡靶材为镀膜材料制备ITO薄膜，设定磁控溅射的功率为200W功率，Ar流量为20sccm，O2流量为1.0sccm，工作气压为0.4Pa，溅射时间为200s，获得导电膜层。
以上所述，仅是本发明的较佳实施例而已，并非对本发明作任何形式上的限制，依据本发明的技术实质对以上实施例所作的任何简单修改、等同变化与修饰，均仍属于本发明技术方案的范围内。

Claims (9)

1.一种玻璃型热控涂层，其特征在于，包括:玻璃基体、缓冲层和种子层；
所述玻璃基体，包括相对的第一表面和第二表面；
所述缓冲层为氮化物或氧化物的涂层；
所述种子层为金属或不完全氧化金属；
所述缓冲层和所述种子层依次层叠于所述第一表面；
所述种子层采用NiCr合金、Al2/3O1-x、ZnO1-x或Ti1/2O1-x，其中，0.1﹤x≤1，用于提高所述种子层与其相邻膜层间的结合力。
2.根据权利要求1所述的玻璃型热控涂层，其特征在于，
所述缓冲层的厚度为10-100nm。
3.根据权利要求2所述的玻璃型热控涂层，其特征在于，
所述氮化物为Si3N4、AlN。
4.根据权利要求2所述的玻璃型热控涂层，其特征在于，
所述氧化物为BiOx、SnO2、TiO2、ZnO；
其中，1.4≤x≤1.7。
5.根据权利要求1所述的玻璃型热控涂层，其特征在于，
所述种子层的厚度为2-10nm。
6.根据权利要求1所述的玻璃型热控涂层，其特征在于，
还包括金属反射层和防氧化层，在所述种子层的相对于所述缓冲层的另一表面依次层叠所述金属反射层和所述防氧化层。
7.根据权利要求6所述的玻璃型热控涂层，其特征在于，
所述的防氧化层为NiCr。
8.根据权利要求1所述的玻璃型热控涂层，其特征在于，
在所述玻璃基体的所述第二表面设有导电膜层。
9.一种如权利要求1至8任一所述的玻璃型热控涂层的制备方法，其特征在于，在玻璃基体的第一表面上通过溅射法或蒸镀法依次沉积缓冲层、种子层、金属反射层、防氧化层；
在玻璃基体的第二表面上通过溅射法或蒸镀法沉积导电膜层。
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