CN111020587A - 一种用于铜表面去除镍层的退镀液及其退镀工艺 - Google Patents
一种用于铜表面去除镍层的退镀液及其退镀工艺 Download PDFInfo
- Publication number
- CN111020587A CN111020587A CN201911333052.XA CN201911333052A CN111020587A CN 111020587 A CN111020587 A CN 111020587A CN 201911333052 A CN201911333052 A CN 201911333052A CN 111020587 A CN111020587 A CN 111020587A
- Authority
- CN
- China
- Prior art keywords
- parts
- oxidant
- deplating
- nickel layer
- sodium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims abstract description 82
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 52
- 229910052802 copper Inorganic materials 0.000 title claims abstract description 52
- 239000010949 copper Substances 0.000 title claims abstract description 52
- 229910052759 nickel Inorganic materials 0.000 title claims abstract description 41
- 238000000034 method Methods 0.000 title claims description 25
- 230000008569 process Effects 0.000 title description 14
- 239000007788 liquid Substances 0.000 title description 8
- 239000007800 oxidant agent Substances 0.000 claims abstract description 84
- 230000001590 oxidative effect Effects 0.000 claims abstract description 76
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims abstract description 48
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 claims abstract description 42
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 claims abstract description 38
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 claims abstract description 27
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims abstract description 27
- 239000004202 carbamide Substances 0.000 claims abstract description 27
- 229940011182 cobalt acetate Drugs 0.000 claims abstract description 27
- QAHREYKOYSIQPH-UHFFFAOYSA-L cobalt(II) acetate Chemical compound [Co+2].CC([O-])=O.CC([O-])=O QAHREYKOYSIQPH-UHFFFAOYSA-L 0.000 claims abstract description 27
- 235000002906 tartaric acid Nutrition 0.000 claims abstract description 27
- 239000011975 tartaric acid Substances 0.000 claims abstract description 27
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims abstract description 21
- 238000002156 mixing Methods 0.000 claims abstract description 21
- 229910052708 sodium Inorganic materials 0.000 claims abstract description 21
- 239000011734 sodium Substances 0.000 claims abstract description 21
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 20
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 claims abstract description 19
- 239000012964 benzotriazole Substances 0.000 claims abstract description 19
- 239000002994 raw material Substances 0.000 claims abstract description 19
- 239000000758 substrate Substances 0.000 claims abstract description 10
- 230000000052 comparative effect Effects 0.000 description 35
- 238000012360 testing method Methods 0.000 description 12
- 238000007747 plating Methods 0.000 description 11
- 230000007797 corrosion Effects 0.000 description 7
- 238000005260 corrosion Methods 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 5
- 239000003112 inhibitor Substances 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000001035 drying Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000009713 electroplating Methods 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 2
- 229910000990 Ni alloy Inorganic materials 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical group NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000031709 bromination Effects 0.000 description 1
- 238000005893 bromination reaction Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005536 corrosion prevention Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- ZNNZYHKDIALBAK-UHFFFAOYSA-M potassium thiocyanate Chemical compound [K+].[S-]C#N ZNNZYHKDIALBAK-UHFFFAOYSA-M 0.000 description 1
- 229940116357 potassium thiocyanate Drugs 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- XUXNAKZDHHEHPC-UHFFFAOYSA-M sodium bromate Chemical compound [Na+].[O-]Br(=O)=O XUXNAKZDHHEHPC-UHFFFAOYSA-M 0.000 description 1
- LJRGBERXYNQPJI-UHFFFAOYSA-M sodium;3-nitrobenzenesulfonate Chemical compound [Na+].[O-][N+](=O)C1=CC=CC(S([O-])(=O)=O)=C1 LJRGBERXYNQPJI-UHFFFAOYSA-M 0.000 description 1
- 230000004936 stimulating effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/28—Acidic compositions for etching iron group metals
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Detergent Compositions (AREA)
- ing And Chemical Polishing (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Abstract
Description
Claims (3)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201911333052.XA CN111020587B8 (zh) | 2019-12-23 | 2019-12-23 | 一种用于铜表面去除镍层的退镀液及其退镀工艺 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201911333052.XA CN111020587B8 (zh) | 2019-12-23 | 2019-12-23 | 一种用于铜表面去除镍层的退镀液及其退镀工艺 |
Publications (3)
Publication Number | Publication Date |
---|---|
CN111020587A true CN111020587A (zh) | 2020-04-17 |
CN111020587B CN111020587B (zh) | 2022-02-22 |
CN111020587B8 CN111020587B8 (zh) | 2022-03-15 |
Family
ID=70211477
Family Applications (1)
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CN201911333052.XA Active CN111020587B8 (zh) | 2019-12-23 | 2019-12-23 | 一种用于铜表面去除镍层的退镀液及其退镀工艺 |
Country Status (1)
Country | Link |
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CN (1) | CN111020587B8 (zh) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3479293A (en) * | 1966-09-26 | 1969-11-18 | Conversion Chem Corp | Process and composition for etching ferrous metal surfaces |
CN101101861A (zh) * | 2002-05-17 | 2008-01-09 | 株式会社荏原制作所 | 衬底加工设备和衬底加工方法 |
CN105177578A (zh) * | 2015-10-19 | 2015-12-23 | 江苏理工学院 | 用于铜基钯镍合金镀层退镀的退镀液及退镀方法 |
CN107447215A (zh) * | 2016-05-30 | 2017-12-08 | 东友精细化工有限公司 | 用于铜基金属膜的蚀刻液组合物和利用其制造液晶显示装置用阵列基板的方法 |
CN108315739A (zh) * | 2018-02-10 | 2018-07-24 | 深圳市祥盛兴科技有限公司 | 一种化学抛光液及化学抛光工艺 |
-
2019
- 2019-12-23 CN CN201911333052.XA patent/CN111020587B8/zh active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3479293A (en) * | 1966-09-26 | 1969-11-18 | Conversion Chem Corp | Process and composition for etching ferrous metal surfaces |
CN101101861A (zh) * | 2002-05-17 | 2008-01-09 | 株式会社荏原制作所 | 衬底加工设备和衬底加工方法 |
CN105177578A (zh) * | 2015-10-19 | 2015-12-23 | 江苏理工学院 | 用于铜基钯镍合金镀层退镀的退镀液及退镀方法 |
CN107447215A (zh) * | 2016-05-30 | 2017-12-08 | 东友精细化工有限公司 | 用于铜基金属膜的蚀刻液组合物和利用其制造液晶显示装置用阵列基板的方法 |
CN108315739A (zh) * | 2018-02-10 | 2018-07-24 | 深圳市祥盛兴科技有限公司 | 一种化学抛光液及化学抛光工艺 |
Also Published As
Publication number | Publication date |
---|---|
CN111020587B (zh) | 2022-02-22 |
CN111020587B8 (zh) | 2022-03-15 |
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Legal Events
Date | Code | Title | Description |
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PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
TA01 | Transfer of patent application right | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20220130 Address after: 511500 floor 3, building B, Jinbaili electroplating Co., Ltd., No. A14, Longwan industrial park, Taiping Town, Qingxin District, Qingyuan City, Guangdong Province Applicant after: Qingyuan Hongrun Surface Treatment Technology Co.,Ltd. Address before: 230088 building A1, innovation industrial park, high tech Zone, Hefei, Anhui Applicant before: Zhou Zhaomei |
|
GR01 | Patent grant | ||
GR01 | Patent grant | ||
CI03 | Correction of invention patent | ||
CI03 | Correction of invention patent |
Correction item: Patentee Correct: Qingyuan Hongrun Surface Treatment Technology Co.,Ltd. False: Qingyuan Honggui Surface Treatment Technology Co.,Ltd. Number: 08-01 Page: The title page Volume: 38 Correction item: Patentee Correct: Qingyuan Hongrun Surface Treatment Technology Co.,Ltd. False: Qingyuan Honggui Surface Treatment Technology Co.,Ltd. Number: 08-01 Volume: 38 |
|
PE01 | Entry into force of the registration of the contract for pledge of patent right | ||
PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of invention: A Stripping Solution and Stripping Process for Removing Nickel Layer on Copper Surface Effective date of registration: 20230721 Granted publication date: 20220222 Pledgee: Bank of China Limited Qingyuan Branch Pledgor: Qingyuan Hongrun Surface Treatment Technology Co.,Ltd. Registration number: Y2023980049344 |