CN111009339A - Conductive structure, preparation method thereof, touch panel and display device - Google Patents
Conductive structure, preparation method thereof, touch panel and display device Download PDFInfo
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- CN111009339A CN111009339A CN201911343480.0A CN201911343480A CN111009339A CN 111009339 A CN111009339 A CN 111009339A CN 201911343480 A CN201911343480 A CN 201911343480A CN 111009339 A CN111009339 A CN 111009339A
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- conductive
- grid
- substrate
- conductive structure
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
- H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
- H01B13/0026—Apparatus for manufacturing conducting or semi-conducting layers, e.g. deposition of metal
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K9/00—Screening of apparatus or components against electric or magnetic fields
- H05K9/0073—Shielding materials
- H05K9/0081—Electromagnetic shielding materials, e.g. EMI, RFI shielding
- H05K9/009—Electromagnetic shielding materials, e.g. EMI, RFI shielding comprising electro-conductive fibres, e.g. metal fibres, carbon fibres, metallised textile fibres, electro-conductive mesh, woven, non-woven mat, fleece, cross-linked
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2202/00—Materials and properties
- G02F2202/22—Antistatic materials or arrangements
Abstract
The embodiment of the invention discloses a conductive structure, a preparation method of the conductive structure, a touch panel and a display device. One of the conductive structures comprises: a substrate; the conducting layer is arranged on at least one side of the substrate and comprises a plurality of grid units, and the grid units are closed structures formed by cross connection of conducting metal wires; the grid cells form a conductive pattern, wherein the conductive pattern of at least one side is a random grid pattern. According to the conductive structure, the metal grid adopts a random Thiessen pattern, and the Moire fringe phenomenon is eliminated by regulating and controlling the optical interference effect through the disordered grid-shaped structure; when the conductive structure is used for a touch screen or is additionally arranged on a liquid crystal display, the superposition of the conductive silk threads and a black shading matrix in the liquid crystal display can be effectively reduced, so that the moire fringes are weakened; the structure is simple, and the weather resistance is strong; the preparation method is simple and the finished product rate is high.
Description
Technical Field
The invention relates to the technical field of displays, in particular to a conductive structure, a preparation method of the conductive structure, a touch panel and a display device.
Background
The metal grid transparent conductive film is widely applied as a novel conductive film for replacing an ITO (Indium tin oxide) process, and has an extremely wide market space due to the fact that the transparent conductive film has ultralow resistance and high transmittance, and the transparent conductive film is widely applied to the fields of flat panel display, photovoltaic devices, electromagnetic shielding and the like.
Particularly in the field of electromagnetic shielding application of conductive films, the conventional electromagnetic shielding material is made by adhering a metal conductive layer on the surface of an insulating material to prepare a corresponding electromagnetic shielding material, or is made by weaving a metal mesh with a high-conductivity material, and although the conventional metal material has excellent electromagnetic shielding performance, the most important problem is that the conventional metal material is opaque; the subsequent conductive polymer electromagnetic shielding materials, ITO films, nano silver wires and carbon nano tubes solve the problem of light impermeability of the traditional metal electromagnetic materials, but the low shielding effectiveness still cannot meet the use in some environments. The electromagnetic shielding film made of the metal grid can be compatible with the advantages of the metal grid, and can transmit light and have a higher electromagnetic shielding effect, but when the shielding effectiveness meets a high requirement, the line width of the metal line is inevitably increased, generally, the metal grid is composed of grid units regularly arranged, when the electromagnetic shielding film is applied to Display equipment, a pixel unit of an LCD (Liquid Crystal Display) is also a rectangular unit with a regular shape, so that when the conductive film is attached to the surface of the LCD, more serious moire fringes can be generated, the integral visual effect is influenced, and the wider the width of a single metal line is, the more serious the moire fringes are. In addition, when the line is used in the sight glass, the regular grid has obvious visual effect and the irregular grid has better consistency.
Disclosure of Invention
In order to solve the technical problem, embodiments of the present invention provide a conductive structure, a method for manufacturing the conductive structure, a touch panel and a display device.
An embodiment of the present invention provides a conductive structure, which includes:
a substrate;
the conducting layer is arranged on at least one side of the substrate and comprises a plurality of grid units, and the grid units are closed structures formed by cross connection of conducting metal wires;
the grid cells form a conductive pattern, wherein the conductive pattern of at least one side is a random grid pattern.
Further, the random grid pattern is a Thiessen polygon.
Further, the substrate is PET, PP, PE, PMMA, PC, PEN, PI or glass.
Further, the conductive metal wire is gold, silver, copper, nickel or iron.
Further, the transparent protective layer is arranged on the conductive layer and is made of ultraviolet light curing glue, stamping glue or polycarbonate.
A touch panel comprising the conductive structure of any one of the above.
A liquid crystal display device, comprising:
a substrate, a first electrode and a second electrode,
the liquid crystal layer comprises a plurality of liquid crystal molecules, and the conductive film is in conductive connection with the liquid crystal layer so as to apply an electric field to the liquid crystal layer;
the conductive film is the conductive structure as described in any one of the above.
A method of making a conductive structure comprising the steps of:
preparing a substrate, and coating a photoresist coating on the surface of the substrate;
calculating a random grid pattern according to a Thiessen polygon method, and inputting the pattern of the random grid into a laser;
laser etching the substrate, and removing the photoresist outside the irregular grid pattern on the substrate to obtain a photoresist mask with the irregular grid pattern;
plating a metal film layer on the photoresist mask;
and removing the photoresist on the substrate plated with the metal film layer.
Further, when the irregular grid pattern is calculated according to the Thiessen polygon method, the distribution density of random points on a unit area and the grid side line diameter of the irregular grid pattern are taken as variables.
Further, the metal film layer is plated by a vacuum coating method.
According to the conductive structure, the metal grid adopts a random Thiessen pattern, and the Moire fringe phenomenon is eliminated by regulating and controlling the optical interference effect through the disordered grid-shaped structure; when the conductive structure is used for a touch screen or is additionally arranged on a liquid crystal display, the superposition of the conductive silk threads and a black shading matrix in the liquid crystal display can be effectively reduced, so that the moire fringes are weakened; the structure is simple, and the weather resistance is strong; the preparation method is simple and the finished product rate is high.
Drawings
FIG. 1 is a schematic diagram of a diamond patterned grid conductive film in the prior art;
FIG. 2 is a schematic diagram of a rectangular grid conductive film in the prior art;
FIG. 3 is a schematic diagram of a random quad-grid patterned grid conductive film in the prior art;
FIG. 4 is a schematic diagram of a cross-lapped patterned grid conductive film in the prior art;
FIG. 5 is a schematic structural diagram of a display device according to an embodiment of the present invention;
fig. 6 is a schematic structural diagram of a thiessen polygon mesh conductive film in an embodiment of the present invention.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Referring to fig. 1-4, a conventional conductive film structure is shown, in which a conductive film in the prior art uses a conductive grid as its conductive layer, where the conductive grid is a grid with a regular shape, such as a square, a diamond, a hexagon, etc., formed by crossed linear conductive wires, and when the transparent conductive film is attached to a surface of a liquid crystal display, moire fringes can appear more clearly, thereby affecting the visual effect of a user.
As shown in fig. 1-3, the metal mesh conductive film in the prior art is a schematic structural diagram, and specifically includes the problems that diamond patterns, rectangular patterns, and random quadrilateral mesh patterns are all cross-lapped, and appearance light and dark spots are caused by an excessively large shadow area of a cross region caused by the cross-lapping. While the conventional random quadrilateral in fig. 4 is formed based on random intersection point dithering, the four sides are still formed into a trend quadrilateral.
Therefore, the conductive film patterns in fig. 1-4 have a diamond shape, a rectangular shape, and a random quadrilateral mesh which is matched with the liquid crystal, and moire fringes are still easily caused within a certain angle, thereby affecting the display effect of the display device, i.e. the mesh needs to be rotated by a certain angle to match the liquid crystal.
Referring to fig. 5, an embodiment of the present invention describes a liquid crystal display device, which includes a substrate 1, and a liquid crystal layer 2 and a conductive structure disposed on the substrate 1, wherein the liquid crystal layer 2 includes a plurality of liquid crystal molecules (not shown in the figure), the conductive structure in this embodiment is a transparent conductive film 3, and the conductive film 3 is conductively connected to the liquid crystal layer 2 to apply an electric field thereto.
Referring to fig. 6, the conductive structure of the present invention includes a substrate 4 and a conductive layer 5, where the substrate 4 is a transparent film or transparent glass, the conductive structure in this embodiment is specifically a conductive film 3, and the substrate 4 is a transparent film, such as PET (polyethylene terephthalate), PP (polypropylene), PE (polyethylene), PMMA (polymethyl methacrylate), PC (polycarbonate), PEN (polyethylene naphthalate), or PI (polyimide).
Wherein at least one side of said substrate 4 is provided with a conductive layer 5, as shown in fig. 5, in this embodiment a conductive layer 5 is provided at one side of the substrate 4. As shown in fig. 6, the conductive layer 5 includes a plurality of grid cells 52, and the grid cells 52 are closed structures formed by cross-connecting conductive wires 51; wherein the grid cells 52 together form a conductive pattern, wherein the conductive pattern of at least one side is a random grid pattern. Wherein the conductive wire 51 is gold, silver, copper, nickel or iron.
As shown in fig. 6, the random mesh pattern in the present embodiment is a tesson polygon.
As shown in fig. 5, the conductive film 3 of this embodiment further includes a transparent protection layer 6 disposed on the conductive layer, and the transparent protection layer 6 is an ultraviolet light curing adhesive, an imprint adhesive, or a polycarbonate.
Of course, as an alternative implementation manner, the conductive film of the embodiment of the invention may also be applied to a touch panel, so as to obtain a touch panel including the conductive film of the thiessen polygonal metal mesh of the embodiment.
The method for manufacturing a conductive structure in this embodiment, specifically taking glass as the substrate 4 as an example, includes the following steps:
preparing a substrate 4, and coating a positive photoresist coating on the surface of the substrate 4; calculating a random grid pattern according to a Thiessen polygon method, inputting the obtained random grid pattern into a laser by taking the distribution density of random points on a unit area and the side line diameter of the grid as variables, for example, the side line diameter of the grid is 10 mu m, and the distribution density of the random points on the unit area is equivalent to 100 meshes, controlling a galvanometer by a computer to perform laser direct writing etching on a photoresist coating, and removing photoresist on the periphery of the random grid pattern on a substrate 4 to obtain a photoresist mask with the random grid pattern;
plating a metal film layer on a photoresist mask by using a vacuum coating method, then uniformly spraying a NaOH solution with the mass concentration of 50% on the photoresist surface of the plated metal film layer, soaking, quickly washing with deionized water to remove the NaOH solution after the photoresist is dissolved, soaking with acetone to remove residual photoresist, and soaking a substrate in 95% absolute ethyl alcohol for ultra-clean to obtain the metal grid conductive structure.
According to the conductive structure, the metal grid adopts a random Thiessen pattern, and the Moire fringe phenomenon is eliminated by regulating and controlling the optical interference effect through the disordered grid-shaped structure; when the conductive structure is used for a touch screen or is additionally arranged on a liquid crystal display, the superposition of the conductive silk threads and a black shading matrix in the liquid crystal display can be effectively reduced, so that the moire fringes are weakened; the structure is simple, and the weather resistance is strong; the preparation method is simple and the finished product rate is high.
The above examples are only intended to illustrate the technical solution of the present invention, but not to limit it; although the present invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some technical features may be equivalently replaced; and such modifications or substitutions do not depart from the spirit and scope of the corresponding technical solutions of the embodiments of the present invention.
Claims (10)
1. An electrically conductive structure, comprising:
a substrate;
the conducting layer is arranged on at least one side of the substrate and comprises a plurality of grid units, and the grid units are closed structures formed by cross connection of conducting metal wires;
the grid cells form a conductive pattern, wherein the conductive pattern of at least one side is a random grid pattern.
2. The conductive structure of claim 1, wherein: the random grid pattern is a Thiessen polygon.
3. The conductive structure of claim 2, wherein: the substrate is PET, PP, PE, PMMA, PC, PEN, PI or glass.
4. The conductive structure of claim 3, wherein: the conductive metal wire is gold, silver, copper, nickel or iron.
5. The conductive structure of claim 3, wherein: the transparent protective layer is arranged on the conductive layer and is made of ultraviolet light curing glue, stamping glue or polycarbonate.
6. A touch panel characterized by comprising the conductive structure according to any one of claims 1 to 5.
7. A liquid crystal display device, comprising:
a substrate, a first electrode and a second electrode,
the liquid crystal layer comprises a plurality of liquid crystal molecules, and the conductive film is in conductive connection with the liquid crystal layer so as to apply an electric field to the liquid crystal layer;
the method is characterized in that:
the conductive film is the conductive structure according to any one of claims 1 to 5.
8. A method for preparing a conductive structure, comprising the steps of:
preparing a substrate, and coating a photoresist coating on the surface of the substrate;
calculating a random grid pattern according to a Thiessen polygon method, and inputting the pattern of the random grid into a laser;
laser etching the substrate, and removing the photoresist outside the irregular grid pattern on the substrate to obtain a photoresist mask with the irregular grid pattern;
plating a metal film layer on the photoresist mask;
and removing the photoresist on the substrate plated with the metal film layer.
9. The method of claim 8, wherein: when the irregular grid pattern is calculated according to the Thiessen polygon method, the distribution density of random points on a unit area and the grid side line diameter of the irregular grid pattern are taken as variables.
10. The method of claim 9, wherein: and plating the metal film layer by adopting a vacuum coating method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911343480.0A CN111009339A (en) | 2019-12-24 | 2019-12-24 | Conductive structure, preparation method thereof, touch panel and display device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911343480.0A CN111009339A (en) | 2019-12-24 | 2019-12-24 | Conductive structure, preparation method thereof, touch panel and display device |
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| CN111009339A true CN111009339A (en) | 2020-04-14 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201911343480.0A Pending CN111009339A (en) | 2019-12-24 | 2019-12-24 | Conductive structure, preparation method thereof, touch panel and display device |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2022166650A1 (en) * | 2021-02-02 | 2022-08-11 | 广州视源电子科技股份有限公司 | Laser splicing method, conductive film, touch module, capacitive touch screen and electronic device |
| CN115035810A (en) * | 2021-03-05 | 2022-09-09 | 江西华创触控科技有限公司 | LED film screen |
-
2019
- 2019-12-24 CN CN201911343480.0A patent/CN111009339A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2022166650A1 (en) * | 2021-02-02 | 2022-08-11 | 广州视源电子科技股份有限公司 | Laser splicing method, conductive film, touch module, capacitive touch screen and electronic device |
| CN115035810A (en) * | 2021-03-05 | 2022-09-09 | 江西华创触控科技有限公司 | LED film screen |
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