CN110724913A - A large-diameter mirror resistance thermal evaporation coating device - Google Patents
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- 238000000576 coating method Methods 0.000 title claims abstract description 23
- 239000011248 coating agent Substances 0.000 title claims abstract description 22
- 238000002207 thermal evaporation Methods 0.000 title claims abstract description 14
- 238000001704 evaporation Methods 0.000 claims abstract description 43
- 230000008020 evaporation Effects 0.000 claims abstract description 43
- 238000007738 vacuum evaporation Methods 0.000 claims abstract description 34
- 238000010884 ion-beam technique Methods 0.000 claims abstract description 14
- 238000010438 heat treatment Methods 0.000 claims description 10
- 239000013078 crystal Substances 0.000 claims description 4
- 239000010453 quartz Substances 0.000 claims description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical group [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 3
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- 239000010937 tungsten Substances 0.000 claims description 2
- 238000000034 method Methods 0.000 abstract description 8
- 229910052751 metal Inorganic materials 0.000 abstract description 5
- 239000002184 metal Substances 0.000 abstract description 5
- 238000004544 sputter deposition Methods 0.000 abstract description 2
- 238000001771 vacuum deposition Methods 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 32
- 239000000463 material Substances 0.000 description 13
- 230000003287 optical effect Effects 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 238000011068 loading method Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000002310 reflectometry Methods 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 2
- 238000005086 pumping Methods 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000007735 ion beam assisted deposition Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/546—Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
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Abstract
本发明属真空镀膜领域,提供一种大口径反射镜电阻热蒸发镀膜装置。本发明提供的技术方案是:包括抽真空系统和抽真空系统、真空蒸镀室、蒸发源室,离子束辅助装置,膜厚控制装置;蒸发源室为多个独立的蒸发源室,均匀设置在真空蒸镀室的室壁上,每个蒸发源室和真空蒸镀室之间设置真空阀门;所述工件旋转装置设置在真空蒸镀室的底部中心处,工件旋转装置由反射镜支撑机构和旋转轴10和旋转电机组成;所述离子束辅助装置由多个离子源组成,设置于真空蒸镀室腔体的内壁上。采用本发明的装置避免了金属液滴喷溅、滴落等对膜层质量的影响,极大地降低了大口径反射镜镀膜过程中的风险。
The invention belongs to the field of vacuum coating, and provides a large-diameter mirror resistance thermal evaporation coating device. The technical scheme provided by the present invention is: including a vacuuming system and a vacuuming system, a vacuum evaporation chamber, an evaporation source chamber, an ion beam auxiliary device, and a film thickness control device; the evaporation source chambers are a plurality of independent evaporation source chambers, which are evenly arranged On the chamber wall of the vacuum evaporation chamber, a vacuum valve is arranged between each evaporation source chamber and the vacuum evaporation chamber; the workpiece rotation device is arranged at the bottom center of the vacuum evaporation chamber, and the workpiece rotation device is supported by a mirror support mechanism It is composed of a rotary shaft 10 and a rotary motor; the ion beam auxiliary device is composed of a plurality of ion sources and is arranged on the inner wall of the vacuum evaporation chamber cavity. The use of the device of the invention avoids the influence of metal droplet sputtering, dripping, etc. on the quality of the film layer, and greatly reduces the risk in the process of coating large-diameter mirrors.
Description
技术领域technical field
本发明涉及真空镀膜领域,特别是适用于一种大口径反射镜电阻热蒸发镀膜装置。The invention relates to the field of vacuum coating, and is particularly suitable for a large-diameter mirror resistance thermal evaporation coating device.
背景技术Background technique
望远镜的发展延伸了人类视野的极限,得以让人类领略宇宙的浩瀚,也为天文学的不断进步奠定了基础。对于光学系统,系统的分辨率取决于通光孔径的大小,通光孔径越大则光学系统的分辨率越高,天文望远镜的口径已从最初的4.2cm逐渐发展到2.4m甚至8.4m,为了满足观测更加遥远目标和获得更清晰图像的要求,大口径光学元件的制造能力不断取得突破,获得了飞速发展。The development of telescopes has extended the limits of human vision, allowing humans to appreciate the vastness of the universe and laying the foundation for the continuous progress of astronomy. For an optical system, the resolution of the system depends on the size of the clear aperture. The larger the clear aperture, the higher the resolution of the optical system. The aperture of the astronomical telescope has gradually developed from the initial 4.2cm to 2.4m or even 8.4m. To meet the requirements of observing more distant targets and obtaining clearer images, breakthroughs have been made in the manufacturing capabilities of large-diameter optical components and rapid development has been achieved.
反射式望远镜是目前应用最广泛的大口径光学系统的类型,而大口径反射镜则是大型反射式光学系统中的核心关键元件之一。大口径反射镜的光学性能依赖于镜体反射面镀制的反射膜的性能。金属反射膜膜系简单,制备工艺相对需求低,工作波长范围宽,可以在很宽的工作波长下都能达到非常高的反射率,最大程度的满足了大口径光学系统的设计和使用需求,因此在目前使用的大口径光学系统中金属高反射膜得到了大范围的应用。Reflecting telescopes are the most widely used type of large-aperture optical systems, and large-aperture mirrors are one of the key elements in large-scale reflective optical systems. The optical performance of large-diameter mirrors depends on the performance of the reflective film coated on the reflective surface of the mirror body. The metal reflective film is simple, the preparation process is relatively low, and the working wavelength range is wide, which can achieve a very high reflectivity under a wide working wavelength, which satisfies the design and use requirements of large-diameter optical systems to the greatest extent. Therefore, metal high-reflection films have been widely used in large-diameter optical systems currently used.
常用于制备金属反射膜的膜层材料为铝,这是因为铝在宽波段有较高的反射率,而且其表面在空气中迅速形成一层致密的Al2O3保护膜防止Al被进一步腐蚀破坏。铝高反射膜在可见到近红外波段,反射率在90%左右。The film material commonly used to prepare metal reflective films is aluminum, because aluminum has a high reflectivity in a wide band, and its surface rapidly forms a dense Al 2 O 3 protective film in the air to prevent further corrosion of Al. destroy. The aluminum high-reflection film has a reflectivity of about 90% in the visible to near-infrared band.
目前,制备铝高反射膜大多数采用热蒸发沉积技术,但是在大口径反射镜镀膜过程中,如果采用上装方式,即反射镜的镀膜面向下的方式,则由于反射镜过大、过重,在反射镜镀膜过程中要进行反转和吊装,这些操作,存在着实施操作困难,制造成本加大的问题。目前也有采用下装方式,即反射镜面向上的镀膜方式,但这种方式由于蒸发源在上,蒸发材料的喷溅、滴落将会严重影响膜层质量,甚至导致反射镜损坏。At present, most of the aluminum high-reflection films are prepared by thermal evaporation deposition technology. However, in the process of coating large-diameter mirrors, if the top-loading method is used, that is, the coating of the mirror faces downwards, the mirror is too large and heavy. In the process of mirror coating, it is necessary to perform reversal and hoisting. These operations have the problems of difficulty in implementation and increased manufacturing cost. At present, there is also a bottom-mounted method, that is, a coating method with the mirror facing up. However, in this method, since the evaporation source is on the top, the sputtering and dripping of the evaporation material will seriously affect the quality of the film layer, and even cause the mirror to be damaged.
发明内容SUMMARY OF THE INVENTION
本发明的目的在于提供一种大口径反射镜电阻热蒸发镀膜装置,以克服现有技术存在的上装时实施操作困难、制造成本加大和下装时镀膜质量难以保证的问题。The purpose of the present invention is to provide a large-diameter mirror resistance thermal evaporation coating device to overcome the problems in the prior art that the operation is difficult to implement, the manufacturing cost increases, and the coating quality is difficult to guarantee when the bottom is installed.
为实现上述目的,本发明提供如下技术方案:To achieve the above object, the present invention provides the following technical solutions:
一种大口径反射镜电阻热蒸发镀膜装置,包括抽真空系统1和抽真空系统2、真空蒸镀室3、蒸发源室,离子束辅助装置,膜厚控制装置;所述的蒸发源室为多个独立的蒸发源室4,多个蒸发源室4均匀设置在真空蒸镀室3的室壁上,每个蒸发源室4和真空蒸镀室3之间设置真空阀门5;所述工件旋转装置设置在真空蒸镀室3的底部中心处,工件旋转装置由反射镜支撑机构9和旋转轴10和旋转电机11组成;所述离子束辅助装置由多个离子源8组成,设置于真空蒸镀室腔体的内壁上。A large-diameter mirror resistance thermal evaporation coating device, comprising a
上述的多个蒸发源室为3-9个。The number of the above-mentioned multiple evaporation source chambers is 3-9.
上述的蒸发源室的蒸发装置由加热电极6和加热舟7组成。The above-mentioned evaporation device of the evaporation source chamber is composed of a heating electrode 6 and a heating boat 7 .
上述的加热舟为钨绞丝。The above heating boat is tungsten stranded wire.
上述用于离子束辅助装置的离子源8均布与真空蒸镀室腔壁上,且向下发射离子束。The above-mentioned
上述膜厚控制装置采用石英晶振膜厚仪12。The above-mentioned film thickness control device uses a quartz crystal
上述旋转电机11为步进电机。The above-mentioned rotary
与现有技术相比,本发明的有益效果是:Compared with the prior art, the beneficial effects of the present invention are:
1.本发明采用下装方式,结构合理,降低了反射镜反转风险;1. The present invention adopts the down-loading method, the structure is reasonable, and the risk of mirror reversal is reduced;
2.由于镀膜状态与反射镜的加工和使用状态一致,都是反射面向上,减小了大口径反射镜镀膜吊装、悬挂支撑时重力变形对面形精度的影响;2. Since the coating state is consistent with the processing and use state of the reflector, the reflecting surface is upward, which reduces the influence of gravity deformation on the surface shape accuracy of the large-diameter reflector when it is hoisted and supported by suspension;
3.由于真空蒸镀室与蒸发源室分离,虽采用下装方式,却可避免金属液滴喷溅、滴落等对膜层质量的影响;3. Due to the separation of the vacuum evaporation chamber and the evaporation source chamber, although the down-loading method is adopted, the influence of metal droplet splashing and dripping on the quality of the film can be avoided;
附图说明Description of drawings
图1为本发明装置主视结构示意图。FIG. 1 is a schematic structural diagram of the front view of the device of the present invention.
其中:抽真空系统1、抽真空系统2、真空蒸镀室3、蒸发源室4、真空阀门5、加热电极6、加热舟7、离子源8、反射镜支撑机构9、旋转轴10、步进电机11、石英晶振膜厚仪12。Among them:
图2为本发明装置俯视结构示意图。FIG. 2 is a schematic top view of the structure of the device of the present invention.
具体实施方式Detailed ways
下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行完整地描述,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性工作前提下所获得的所有其他实施例,都属于本发明保护的范围。The technical solutions in the embodiments of the present invention will be completely described below with reference to the accompanying drawings in the embodiments of the present invention, and the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative work fall within the protection scope of the present invention.
如图1-2,本发明实施例中,一种大口径反射镜电阻热蒸发镀膜装置,包括抽真空系统1和抽真空系统2,真空蒸镀室3,所述抽真空系统1通过管道和真空蒸镀室3连接,用于对真空蒸镀室3抽真空,所述真空蒸镀室3用于安装被镀的大口径反射镜,所述真空蒸镀室3的腔壁上均布3-9个较小的蒸发源室4,所述抽真空系统2通过管道与均布的多个蒸发源室4连接,用于对多个蒸发源室同时抽真空,所述真空蒸镀室3与蒸发源室4相连接,并在真空蒸镀室和蒸发源室之间设置有相应个数的真空阀门5,所述多个蒸发源室4内部安装有加热电极6和加热舟7,用于膜料的加热;所述离子束辅助装置由多个离子源8组成,并安装于真空蒸镀室腔体的内壁上,用于离子束辅助沉积并轰击膜料分子或分子,给膜料分子或原子一个向下的动能;所述工件旋转装置由反射镜支撑机构9和旋转轴10和步进电机11组成;所述膜厚控制装置采用石英晶振膜厚仪12。As shown in Figures 1-2, in the embodiment of the present invention, a large-diameter mirror resistance thermal evaporation coating device includes a
镀膜前准备阶段,真空蒸镀室和蒸发源室充气至大气状态,打开真空阀门5,首先对多个蒸发源室的蒸发系统上加载膜料,然后关闭真空阀门5,将大口径反射镜镀膜面向上推送到真空蒸镀室内部,并做好定位和固定。关闭真空蒸镀室的室门,打开抽真空系统1和抽真空系统2,分别对真空蒸镀室和蒸发源室抽真空至高真空状态。In the preparation stage before coating, the vacuum evaporation chamber and the evaporation source chamber are inflated to the atmospheric state, the
蒸发过程时,先打开工件(大口径反射镜)旋转电机11和离子源8,对大口径表面进行镀膜前离子束轰击,同时对蒸发源室4内的膜料开始加热,带蒸发源室的膜料融化后,打开真空阀门5,这时,蒸发源室4内的膜料分子本省一部分就会向真空蒸镀室3的下方运动,此外,由于真空蒸镀室3内的气压低于蒸发源室4内的气压,蒸发室内的膜料分子在气压差以及离子束轰击的作用下,也会加速向大口径反射镜的被镀面运动,最终在大口径反射镜表面形成一层薄膜,膜厚控制装置用于控制所镀制的膜层厚度。During the evaporation process, the workpiece (large-diameter mirror) rotating
本发明的工作原理是:在大口径反射镜采用下装方式,即镀膜面向上的情况下,所述真空蒸镀室与蒸发源室分离,并设有真空阀门,这样就可以使蒸发源室内的膜料先加热蒸发,由于加热装置钨绞丝上每一点可以看作是点蒸发源,当真空阀门打开后,自然会有一部分膜料分子或原子直接输运到反射镜表面并成膜,此外,在蒸发源室和真空蒸镀室气压差和离子束轰击的作用下,部分向其他方向输运的膜料分子或原子也会向反射镜表面输运并成膜。The working principle of the present invention is as follows: when the large-diameter reflector adopts the bottom-mounted method, that is, the coating film faces upward, the vacuum evaporation chamber is separated from the evaporation source chamber, and a vacuum valve is provided, so that the evaporation source chamber can be The film material is first heated and evaporated. Since each point on the tungsten wire of the heating device can be regarded as a point evaporation source, when the vacuum valve is opened, a part of the film material molecules or atoms will naturally be transported directly to the surface of the mirror and form a film. In addition, under the action of the pressure difference between the evaporation source chamber and the vacuum evaporation chamber and the bombardment of the ion beam, some molecules or atoms of the film material transported in other directions will also be transported to the surface of the mirror and form a film.
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CN209636307U (en) * | 2018-07-23 | 2019-11-15 | 成都中建材光电材料有限公司 | A kind of large scale cadmium telluride solar battery coating apparatus |
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CN1178263A (en) * | 1996-08-30 | 1998-04-08 | 三菱电机株式会社 | Diamond-like thin film forming apparatus and forming method |
JP2000026969A (en) * | 1998-07-10 | 2000-01-25 | Anelva Corp | Continuous feeding method of evaporation source to evaporation chamber in in-line evaporation equipment |
CN2619451Y (en) * | 2003-05-08 | 2004-06-02 | 深圳市创欧科技有限公司 | Evaporation plating device for producing organic electroluminescent display |
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CN104862656A (en) * | 2015-06-10 | 2015-08-26 | 光驰科技(上海)有限公司 | Bidirectional deposition coating device and coating method |
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CN207567335U (en) * | 2017-11-29 | 2018-07-03 | 信利(惠州)智能显示有限公司 | A kind of linear evaporation source evaporated device |
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Cited By (2)
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CN113322445A (en) * | 2021-06-01 | 2021-08-31 | 中国科学院长春光学精密机械与物理研究所 | Heavy-calibre basement coating film frock |
CN113322445B (en) * | 2021-06-01 | 2022-07-22 | 中国科学院长春光学精密机械与物理研究所 | Heavy-calibre basement coating film frock |
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