CN110724913A - Resistance thermal evaporation coating device for large-diameter reflector - Google Patents
Resistance thermal evaporation coating device for large-diameter reflector Download PDFInfo
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- CN110724913A CN110724913A CN201911079503.1A CN201911079503A CN110724913A CN 110724913 A CN110724913 A CN 110724913A CN 201911079503 A CN201911079503 A CN 201911079503A CN 110724913 A CN110724913 A CN 110724913A
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- vacuum
- evaporation
- chamber
- evaporation source
- resistance thermal
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/546—Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention belongs to the field of vacuum coating, and provides a resistance thermal evaporation coating device for a large-aperture reflector. The technical scheme provided by the invention is as follows: the device comprises a vacuum-pumping system, a vacuum evaporation chamber, an evaporation source chamber, an ion beam auxiliary device and a film thickness control device; the evaporation source chambers are a plurality of independent evaporation source chambers and are uniformly arranged on the wall of the vacuum evaporation chamber, and a vacuum valve is arranged between each evaporation source chamber and the vacuum evaporation chamber; the workpiece rotating device is arranged at the center of the bottom of the vacuum evaporation chamber and consists of a reflector supporting mechanism, a rotating shaft 10 and a rotating motor; the ion beam auxiliary device is composed of a plurality of ion sources and is arranged on the inner wall of the vacuum evaporation chamber cavity. The device of the invention avoids the influence of metal liquid drop splashing, dropping and the like on the quality of the film layer, and greatly reduces the risk in the film coating process of the large-caliber reflector.
Description
Technical Field
The invention relates to the field of vacuum coating, in particular to a resistance thermal evaporation coating device for a large-aperture reflector.
Background
The development of the telescope extends the limit of human visual field, so that the human can be directed at the vast universe and the foundation is laid for the continuous progress of astronomy. For an optical system, the resolution of the system depends on the size of a clear aperture, the resolution of the optical system is higher when the clear aperture is larger, the aperture of the astronomical telescope is gradually developed to 2.4m or even 8.4m from the initial 4.2cm, and in order to meet the requirements of observing more remote targets and obtaining clearer images, the manufacturing capability of large-aperture optical elements is continuously broken through, and the rapid development is obtained.
The reflective telescope is the most widely used type of large-aperture optical system, and the large-aperture reflector is one of the key elements in the large reflective optical system. The optical performance of the large-aperture reflector depends on the performance of a reflecting film plated on the reflecting surface of the reflector body. The metal reflecting film system is simple, the preparation process is relatively low in requirement, the working wavelength range is wide, very high reflectivity can be achieved under very wide working wavelength, and the design and use requirements of a large-caliber optical system are met to the greatest extent, so that the metal reflecting film is widely applied to the currently used large-caliber optical system.
The commonly used film material for preparing metal reflective films is aluminum, because aluminum has high reflectivity in a wide wavelength band and a dense Al layer is rapidly formed on the surface of aluminum in air2O3The protective film prevents further corrosion damage to Al. The aluminum high-reflection film has a reflectivity of about 90% in a visible near-infrared band.
At present, most of aluminum high-reflection films are prepared by adopting a thermal evaporation deposition technology, but in the process of coating a large-caliber reflector, if an upper mounting mode is adopted, namely a mode that a coating film of the reflector faces downwards, the reflector needs to be reversed and hoisted in the process of coating the reflector due to overlarge and overweight of the reflector, and the operations are difficult to implement and increase the manufacturing cost. At present, a downward mounting mode, namely a coating mode with an upward reflecting mirror surface is adopted, but in the mode, as an evaporation source is arranged above, the quality of a film layer can be seriously influenced by splashing and dripping of an evaporation material, and even the reflecting mirror is damaged.
Disclosure of Invention
The invention aims to provide a resistance thermal evaporation coating device for a large-diameter reflector, which solves the problems of difficult operation during upper mounting, increased manufacturing cost and difficult guarantee of coating quality during lower mounting in the prior art.
In order to achieve the purpose, the invention provides the following technical scheme:
a large-aperture reflector resistance thermal evaporation coating device comprises a vacuum pumping system 1, a vacuum pumping system 2, a vacuum evaporation chamber 3, an evaporation source chamber, an ion beam auxiliary device and a film thickness control device; the evaporation source chambers are a plurality of independent evaporation source chambers 4, the evaporation source chambers 4 are uniformly arranged on the wall of the vacuum evaporation chamber 3, and a vacuum valve 5 is arranged between each evaporation source chamber 4 and the vacuum evaporation chamber 3; the workpiece rotating device is arranged at the center of the bottom of the vacuum evaporation chamber 3 and consists of a reflector supporting mechanism 9, a rotating shaft 10 and a rotating motor 11; the ion beam auxiliary device is composed of a plurality of ion sources 8 and is arranged on the inner wall of the vacuum evaporation chamber cavity.
The number of the evaporation source chambers is 3-9.
The evaporation device of the evaporation source chamber consists of a heating electrode 6 and a heating boat 7.
The heating boat is made of tungsten stranded wires.
The ion sources 8 for the ion beam auxiliary device are uniformly distributed on the wall of the vacuum evaporation chamber and emit ion beams downwards.
The film thickness control device adopts a quartz crystal oscillator film thickness gauge 12.
The rotary electric machine 11 is a stepping motor.
Compared with the prior art, the invention has the beneficial effects that:
1. the invention adopts a bottom-mounted mode, has reasonable structure and reduces the risk of reflector reflection;
2. because the coating state is consistent with the processing and using state of the reflector, the reflector faces upwards, and the influence of gravity deformation on the surface shape precision during the coating hoisting and hanging support of the large-caliber reflector is reduced;
3. because the vacuum evaporation chamber is separated from the evaporation source chamber, the influence of metal liquid drop splashing, dropping and the like on the quality of the film layer can be avoided although a downloading mode is adopted;
drawings
FIG. 1 is a schematic front view of the device of the present invention.
Wherein: the device comprises a vacuum pumping system 1, a vacuum pumping system 2, a vacuum evaporation chamber 3, an evaporation source chamber 4, a vacuum valve 5, a heating electrode 6, a heating boat 7, an ion source 8, a reflector supporting mechanism 9, a rotating shaft 10, a stepping motor 11 and a quartz crystal oscillator film thickness instrument 12.
FIG. 2 is a schematic top view of the apparatus of the present invention.
Detailed Description
The technical solutions in the embodiments of the present invention will be fully described below with reference to the accompanying drawings in the embodiments of the present invention, and the described embodiments are only a part of the embodiments of the present invention, but not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Referring to fig. 1-2, in the embodiment of the present invention, a large-aperture mirror resistance thermal evaporation coating apparatus includes a vacuum pumping system 1, a vacuum pumping system 2, and a vacuum evaporation chamber 3, where the vacuum pumping system 1 is connected to the vacuum evaporation chamber 3 through a pipeline, used for vacuumizing a vacuum evaporation chamber 3, the vacuum evaporation chamber 3 is used for installing a plated large-caliber reflector, 3-9 small evaporation source chambers 4 are uniformly distributed on the cavity wall of the vacuum evaporation chamber 3, the vacuum pumping system 2 is connected with a plurality of uniformly distributed evaporation source chambers 4 through pipelines, used for simultaneously vacuumizing a plurality of evaporation source chambers, the vacuum evaporation chamber 3 is connected with the evaporation source chamber 4, a corresponding number of vacuum valves 5 are arranged between the vacuum evaporation chamber and the evaporation source chamber, and heating electrodes 6 and heating boats 7 are arranged in the evaporation source chambers 4 and used for heating the film material; the ion beam auxiliary device consists of a plurality of ion sources 8, is arranged on the inner wall of the cavity of the vacuum evaporation chamber and is used for ion beam auxiliary deposition and bombardment of film material molecules or molecules to provide downward kinetic energy for the film material molecules or atoms; the workpiece rotating device consists of a reflector supporting mechanism 9, a rotating shaft 10 and a stepping motor 11; the film thickness control device adopts a quartz crystal oscillator film thickness meter 12.
And in the preparation stage before film coating, the vacuum evaporation chamber and the evaporation source chamber are inflated to the atmospheric state, the vacuum valve 5 is opened, film materials are loaded on the evaporation systems of the evaporation source chambers, then the vacuum valve 5 is closed, the film coating surface of the large-aperture reflector is pushed upwards to the inside of the vacuum evaporation chamber, and positioning and fixing are well performed. And closing the chamber door of the vacuum evaporation chamber, opening the vacuum-pumping system 1 and the vacuum-pumping system 2, and respectively vacuumizing the vacuum evaporation chamber and the evaporation source chamber to a high vacuum state.
During the evaporation process, a workpiece (large-aperture reflector) rotating motor 11 and an ion source 8 are firstly turned on, ion beam bombardment before film coating is carried out on the large-aperture surface, meanwhile, the film material in an evaporation source chamber 4 is heated, after the film material with the evaporation source chamber is melted, a vacuum valve 5 is turned on, at this time, a part of film material molecules in the evaporation source chamber 4 can move towards the lower part of a vacuum evaporation chamber 3, in addition, because the air pressure in the vacuum evaporation chamber 3 is lower than the air pressure in the evaporation source chamber 4, the film material molecules in the evaporation chamber can also move towards the coated surface of the large-aperture reflector at an accelerated speed under the action of air pressure difference and the ion beam bombardment, a layer of film is finally formed on the surface of the large-aperture reflector, and a film thickness control device is used for controlling the thickness of the coated film layer.
The working principle of the invention is as follows: under the condition that the large-caliber reflector adopts a downward installation mode, namely the coating surface faces upwards, the vacuum evaporation chamber is separated from the evaporation source chamber and is provided with a vacuum valve, so that the coating material in the evaporation source chamber can be heated and evaporated firstly, because each point on the tungsten stranded wire of the heating device can be regarded as a point evaporation source, after the vacuum valve is opened, a part of molecules or atoms of the coating material can be naturally and directly conveyed to the surface of the reflector to form a film, and in addition, under the action of the air pressure difference of the evaporation source chamber and the vacuum evaporation chamber and the ion beam bombardment, a part of molecules or atoms of the coating material conveyed to other directions can also be conveyed to the surface of the reflector to form a film.
Claims (7)
1. A large-aperture reflector resistance thermal evaporation coating device comprises a vacuum pumping system 1, a vacuum pumping system 2, a vacuum evaporation chamber 3, an evaporation source chamber, an ion beam auxiliary device and a film thickness control device; the method is characterized in that: the evaporation source chambers are a plurality of independent evaporation source chambers 4, the evaporation source chambers 4 are uniformly arranged on the wall of the vacuum evaporation chamber 3, and a vacuum valve 5 is arranged between each evaporation source chamber 4 and the vacuum evaporation chamber 3; the workpiece rotating device is arranged at the center of the bottom of the vacuum evaporation chamber 3 and consists of a reflector supporting mechanism 9, a rotating shaft 10 and a rotating motor 11; the ion beam auxiliary device is composed of a plurality of ion sources 8 and is arranged on the inner wall of the vacuum evaporation chamber cavity.
2. The resistance thermal evaporation coating device for the large-aperture reflector according to claim 1, wherein: the number of the evaporation source chambers is 3-9.
3. A large-aperture reflector resistance thermal evaporation coating device according to claim 1 or 2, characterized in that: the evaporation device of the evaporation source chamber consists of a heating electrode 6 and a heating boat 7.
4. The resistance thermal evaporation coating device for the large-aperture reflector according to claim 3, wherein: the heating boat is made of tungsten stranded wires.
5. The resistance thermal evaporation coating device of the large-aperture reflector according to claim 3, wherein the ion source 8 for the ion beam auxiliary device is uniformly distributed on the wall of the vacuum evaporation chamber and emits ion beams downwards.
6. The resistance thermal evaporation coating device for the large-aperture reflector according to claim 3, wherein: the film thickness control device adopts a quartz crystal oscillator film thickness meter 12.
7. The resistance thermal evaporation coating device for the large-aperture reflector according to claim 3, wherein: the rotating motor 11 is a stepping motor.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911079503.1A CN110724913A (en) | 2019-11-07 | 2019-11-07 | Resistance thermal evaporation coating device for large-diameter reflector |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911079503.1A CN110724913A (en) | 2019-11-07 | 2019-11-07 | Resistance thermal evaporation coating device for large-diameter reflector |
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| Publication Number | Publication Date |
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| CN110724913A true CN110724913A (en) | 2020-01-24 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201911079503.1A Pending CN110724913A (en) | 2019-11-07 | 2019-11-07 | Resistance thermal evaporation coating device for large-diameter reflector |
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| CN (1) | CN110724913A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113322445A (en) * | 2021-06-01 | 2021-08-31 | 中国科学院长春光学精密机械与物理研究所 | Heavy-calibre basement coating film frock |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1178263A (en) * | 1996-08-30 | 1998-04-08 | 三菱电机株式会社 | Apparatus and method for forming thin diamond-like films |
| JP2000026969A (en) * | 1998-07-10 | 2000-01-25 | Anelva Corp | Continuous feeding method of vaporizing source into vapor depositing chamber in inline type vapor depositing device |
| CN2619451Y (en) * | 2003-05-08 | 2004-06-02 | 深圳市创欧科技有限公司 | Evaporation plating device for producing organic electroluminescent display |
| CN102808153A (en) * | 2012-08-27 | 2012-12-05 | 中国科学院光电技术研究所 | Preparation method of medium protective film layer of aluminum reflection primary mirror of large telescope |
| CN104862656A (en) * | 2015-06-10 | 2015-08-26 | 光驰科技(上海)有限公司 | Bidirectional deposition coating device and coating method |
| CN105154832A (en) * | 2015-10-15 | 2015-12-16 | 京东方科技集团股份有限公司 | Evaporation coating equipment and evaporation coating method |
| CN207567335U (en) * | 2017-11-29 | 2018-07-03 | 信利（惠州）智能显示有限公司 | A kind of linear evaporation source evaporated device |
| CN209636307U (en) * | 2018-07-23 | 2019-11-15 | 成都中建材光电材料有限公司 | A kind of large scale cadmium telluride solar battery coating apparatus |
-
2019
- 2019-11-07 CN CN201911079503.1A patent/CN110724913A/en active Pending
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1178263A (en) * | 1996-08-30 | 1998-04-08 | 三菱电机株式会社 | Apparatus and method for forming thin diamond-like films |
| JP2000026969A (en) * | 1998-07-10 | 2000-01-25 | Anelva Corp | Continuous feeding method of vaporizing source into vapor depositing chamber in inline type vapor depositing device |
| CN2619451Y (en) * | 2003-05-08 | 2004-06-02 | 深圳市创欧科技有限公司 | Evaporation plating device for producing organic electroluminescent display |
| CN102808153A (en) * | 2012-08-27 | 2012-12-05 | 中国科学院光电技术研究所 | Preparation method of medium protective film layer of aluminum reflection primary mirror of large telescope |
| CN104862656A (en) * | 2015-06-10 | 2015-08-26 | 光驰科技(上海)有限公司 | Bidirectional deposition coating device and coating method |
| CN105154832A (en) * | 2015-10-15 | 2015-12-16 | 京东方科技集团股份有限公司 | Evaporation coating equipment and evaporation coating method |
| CN207567335U (en) * | 2017-11-29 | 2018-07-03 | 信利（惠州）智能显示有限公司 | A kind of linear evaporation source evaporated device |
| CN209636307U (en) * | 2018-07-23 | 2019-11-15 | 成都中建材光电材料有限公司 | A kind of large scale cadmium telluride solar battery coating apparatus |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113322445A (en) * | 2021-06-01 | 2021-08-31 | 中国科学院长春光学精密机械与物理研究所 | Heavy-calibre basement coating film frock |
| CN113322445B (en) * | 2021-06-01 | 2022-07-22 | 中国科学院长春光学精密机械与物理研究所 | Heavy-calibre basement coating film frock |
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Application publication date: 20200124 |
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