CN113752534A - Aspheric surface reflector coating method based on low-temperature plasma surface modification - Google Patents
Aspheric surface reflector coating method based on low-temperature plasma surface modification Download PDFInfo
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- CN113752534A CN113752534A CN202110815221.4A CN202110815221A CN113752534A CN 113752534 A CN113752534 A CN 113752534A CN 202110815221 A CN202110815221 A CN 202110815221A CN 113752534 A CN113752534 A CN 113752534A
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- electron beams
- plasma
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- 238000000576 coating method Methods 0.000 title claims abstract description 17
- 238000012986 modification Methods 0.000 title claims abstract description 9
- 230000004048 modification Effects 0.000 title claims abstract description 9
- 238000010894 electron beam technology Methods 0.000 claims abstract description 28
- 239000011248 coating agent Substances 0.000 claims abstract description 11
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims abstract description 11
- 239000004926 polymethyl methacrylate Substances 0.000 claims abstract description 11
- 239000012495 reaction gas Substances 0.000 claims abstract description 11
- 238000000034 method Methods 0.000 claims abstract description 7
- 239000000126 substance Substances 0.000 claims description 6
- 238000001514 detection method Methods 0.000 claims description 3
- 230000000694 effects Effects 0.000 claims description 3
- 239000000758 substrate Substances 0.000 abstract description 7
- 239000010410 layer Substances 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 239000007888 film coating Substances 0.000 description 3
- 238000009501 film coating Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052681 coesite Inorganic materials 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/14—Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
- B29L2011/00—Optical elements, e.g. lenses, prisms
- B29L2011/0016—Lenses
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- General Chemical & Material Sciences (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
A coating method of an aspheric surface reflector based on low-temperature plasma surface modification belongs to the technical field of coating processing, and aims to solve the problem that a PMMA substrate is easy to absorb moisture to cause film layer shedding in the existing coating process, and the method comprises the following steps: the support system is connected with a control computer, the control computer firstly controls the vacuum system to provide a vacuum environment for coating, and then controls the main computer, the main computer enables the electron gun to emit electron beams by controlling the high-voltage power supply, the speed of the electron beams is changed by changing the voltage of the high-voltage power supply, the main computer controls the electron beam control unit, the electron beam control unit controls the motion direction of the electron beams by changing the voltage between the polar plates, the electron gun is positioned in the high-vacuum chamber, generates the electron beams by the electron gun and enters the low-vacuum chamber through the incident window; the electron beam ionizes the reaction gas to generate plasma, or the reaction gas in the reaction chamber is excited by the radio frequency source to generate plasma cloud; the surface of the PMMA sample is modified.
Description
Technical Field
The invention relates to a film coating method for an aspheric reflector, and belongs to the technical field of film coating processing.
Background
At present, the aspheric surface reflector in the panoramic lens is made of plastic materials, and because the plastic lens can be processed by an injection molding method, compared with the traditional processing method of the glass aspheric surface optical element, the aspheric surface optical element needs to be prepared with a high reflection film.
The metal reflection film is designed by adopting metal, common metal coating materials comprise Al, Ag, Au and Cu, and the Al is adopted as the coating material in consideration of excellent performance and economy of the Al. However, when only a single-layer Al reflective film is prepared, the reflectivity of the film in the visible light range is only about 90%, and the film cannot meet the use requirements. Therefore, the reinforced aluminum reflective film design should be adopted to meet the use requirement of high reflection. Reinforcing an aluminum reflective film base film system: p | LALHL | Air, wherein P stands for PMMA substrate, L stands for SiO2, H stands for TiO2, A stands for Al, and the first layer SiO2 is set to 20nm as a connecting layer, which does not participate in the optimization of the film system and mainly aims at improving the bonding force of Al and PMMA.
The total number of layers of the high-reflection film designed by the all-dielectric material is large, the total thickness is too thick, the preparation difficulty is high, and meanwhile, the substrate temperature is increased, the color of the PMMA substrate is changed, and the film layer falls off due to overlong film deposition time in consideration of the particularity of PMMA substrate film coating.
Disclosure of Invention
The invention provides a coating method of an aspheric surface reflector based on low-temperature plasma surface modification, aiming at solving the problem that a PMMA substrate is easy to absorb moisture to cause film layer falling in the existing coating process.
A method for coating a film on an aspheric surface reflector based on low-temperature plasma surface modification is characterized by comprising the following steps:
firstly, a support system is connected with a control computer to keep fast and normal operation, the control computer firstly controls a vacuum system to provide a vacuum environment for coating, and then controls a main computer, the main computer enables an electron gun to emit electron beams by controlling a high-voltage power supply, the speed of the electron beams is changed by changing the voltage of the high-voltage power supply, the main computer controls an electron beam control unit, the electron beam control unit controls the moving direction of the electron beams by changing the voltage between polar plates, the electron gun is positioned in a high-vacuum chamber, generates the electron beams by the electron gun and enters a low-vacuum chamber through an incidence window;
secondly, filling a reaction gas O in the low vacuum chamber2At the moment, the electron beam ionizes the reaction gas to generate plasma, or the reaction gas in the reaction chamber is excited by the radio frequency source to generate plasma cloud; detecting the concentration of the generated plasma in real time through a plasma detection system;
and step three, carrying out complex physical and chemical actions on the high-chemical-activity plasma and the surface of the sample to modify the surface of the PMMA sample.
The invention has the beneficial effects that:
the first is that the temperature is low, and the low-temperature plasma is adopted to modify the PMMA substrate to improve the film adhesion;
secondly, only surface nano-scale modification is involved, and the damage to the surface of the material is small;
and thirdly, the surface is uniformly modified and is suitable for surface type treatment of the high-order aspheric surface reflector adopted in the method.
Drawings
FIG. 1 is a working system diagram of a method for coating a non-spherical reflector based on low-temperature plasma surface modification according to the present invention.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings.
As shown in fig. 1, a method for coating an aspheric mirror based on low-temperature plasma surface modification includes the following steps:
firstly, a support system is connected with a control computer to keep fast and normal operation, the control computer firstly controls a vacuum system to provide a vacuum environment for coating, and then controls a main computer, the main computer enables an electron gun to emit electron beams by controlling a high-voltage power supply, the speed of the electron beams is changed by changing the voltage of the high-voltage power supply, the main computer controls an electron beam control unit, the electron beam control unit controls the moving direction of the electron beams by changing the voltage between polar plates, an electron gun 1 is positioned in a high-vacuum chamber, generates electron beams 2 by the electron gun, and enters a low-vacuum chamber 3 through an incidence window 4.
Secondly, filling a reaction gas O in the low vacuum chamber2At this time, the electron beam ionizes the reaction gas to generate plasma 6, or the reaction gas in the reaction chamber is excited by the radio frequency source to generate plasma cloud. The concentration of plasma generation is detected in real time by a plasma detection system.
And step three, carrying out complex physical and chemical actions on the high-chemical-activity plasma and the surface of the sample to modify the surface of the PMMA sample 7.
Claims (1)
1. A method for coating a film on an aspheric surface reflector based on low-temperature plasma surface modification is characterized by comprising the following steps:
firstly, a support system is connected with a control computer to keep fast and normal operation, the control computer firstly controls a vacuum system to provide a vacuum environment for coating, and then controls a main computer, the main computer enables an electron gun to emit electron beams by controlling a high-voltage power supply, the speed of the electron beams is changed by changing the voltage of the high-voltage power supply, the main computer controls an electron beam control unit, the electron beam control unit controls the moving direction of the electron beams by changing the voltage between polar plates, the electron gun is positioned in a high-vacuum chamber, generates the electron beams by the electron gun and enters a low-vacuum chamber through an incidence window;
secondly, filling a reaction gas O in the low vacuum chamber2At the moment, the electron beam ionizes the reaction gas to generate plasma, or the reaction gas in the reaction chamber is excited by the radio frequency source to generate plasma cloud; detecting the concentration of the generated plasma in real time through a plasma detection system;
and step three, carrying out complex physical and chemical actions on the high-chemical-activity plasma and the surface of the sample to modify the surface of the PMMA sample.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110815221.4A CN113752534A (en) | 2021-07-19 | 2021-07-19 | Aspheric surface reflector coating method based on low-temperature plasma surface modification |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110815221.4A CN113752534A (en) | 2021-07-19 | 2021-07-19 | Aspheric surface reflector coating method based on low-temperature plasma surface modification |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN113752534A true CN113752534A (en) | 2021-12-07 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202110815221.4A Pending CN113752534A (en) | 2021-07-19 | 2021-07-19 | Aspheric surface reflector coating method based on low-temperature plasma surface modification |
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| Country | Link |
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| CN (1) | CN113752534A (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1526753A (en) * | 2003-03-04 | 2004-09-08 | 後晓淮 | Apparatus and method for plasma modification of polymer material surface |
| CN1662298A (en) * | 2002-02-12 | 2005-08-31 | 奥特格里托埃·阿克特赛恩艾尔诺·奥布舍斯特武“Tvel”公司 | Method for carrying out homogeneous and heterogeneous chemical reactions using plasma |
| TWI273026B (en) * | 2005-09-16 | 2007-02-11 | Atomic Energy Council | Method of low-temperature surface modification of plastic substrate |
| CN105093852A (en) * | 2015-08-28 | 2015-11-25 | 沈阳仪表科学研究院有限公司 | Precise dielectric film reflector for exposure system of ultraviolet photoetching machine and plating method of precise dielectric film reflector |
| CN111041413A (en) * | 2019-12-11 | 2020-04-21 | 中国工程物理研究院激光聚变研究中心 | Method for improving surface shape precision of large-aperture reflector coating film |
-
2021
- 2021-07-19 CN CN202110815221.4A patent/CN113752534A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1662298A (en) * | 2002-02-12 | 2005-08-31 | 奥特格里托埃·阿克特赛恩艾尔诺·奥布舍斯特武“Tvel”公司 | Method for carrying out homogeneous and heterogeneous chemical reactions using plasma |
| CN1526753A (en) * | 2003-03-04 | 2004-09-08 | 後晓淮 | Apparatus and method for plasma modification of polymer material surface |
| TWI273026B (en) * | 2005-09-16 | 2007-02-11 | Atomic Energy Council | Method of low-temperature surface modification of plastic substrate |
| CN105093852A (en) * | 2015-08-28 | 2015-11-25 | 沈阳仪表科学研究院有限公司 | Precise dielectric film reflector for exposure system of ultraviolet photoetching machine and plating method of precise dielectric film reflector |
| CN111041413A (en) * | 2019-12-11 | 2020-04-21 | 中国工程物理研究院激光聚变研究中心 | Method for improving surface shape precision of large-aperture reflector coating film |
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Application publication date: 20211207 |