CN110618148B - Adjusting device and method based on monochromatic X-ray single crystal stress measurement - Google Patents
Adjusting device and method based on monochromatic X-ray single crystal stress measurement Download PDFInfo
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- CN110618148B CN110618148B CN201910884185.XA CN201910884185A CN110618148B CN 110618148 B CN110618148 B CN 110618148B CN 201910884185 A CN201910884185 A CN 201910884185A CN 110618148 B CN110618148 B CN 110618148B
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L1/00—Measuring force or stress, in general
- G01L1/25—Measuring force or stress, in general using wave or particle radiation, e.g. X-rays, microwaves, neutrons
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L5/00—Apparatus for, or methods of, measuring force, work, mechanical power, or torque, specially adapted for specific purposes
- G01L5/0047—Apparatus for, or methods of, measuring force, work, mechanical power, or torque, specially adapted for specific purposes measuring forces due to residual stresses
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/20008—Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
- G01N23/20025—Sample holders or supports therefor
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Abstract
The invention discloses an adjusting device based on monochromatic X-ray single crystal stress measurement and a concentric height adjusting method, wherein in the adjusting device, a tilting platform comprises a supporting part for supporting and a tilting part tilting and connecting the supporting part, the tilting part tilts around a concentric point, a lifting platform capable of lifting is arranged on the horizontal top surface of the tilting part, a sample platform is rotatably arranged on the lifting platform, a rotating shaft of the sample platform passes through the concentric point, and the height of the lifting platform is adjusted to enable a single crystal sample on the sample platform to be positioned on the concentric point; the X-ray generator generates monochromatic X-rays to irradiate the single crystal sample, the X-ray generator performs circular motion along a circumference with a concentric point as a rotation center, when the X-ray generator rotates, the irradiation point is always located at the concentric point, the detector receives diffraction signals from the single crystal sample, the detector performs circular motion along the circumference with the concentric point as a circle center, and when the detector rotates, the rotation center is always located at the concentric point.
Description
Technical Field
The invention belongs to the technical field of single crystal measurement, and particularly relates to an adjusting device and a concentric height adjusting method based on monochromatic X-ray single crystal stress measurement.
Background
The residual stress is an important influence factor of the service performance of the single crystal blade. Quantification of residual stress is of great importance to blade machining processes and service life estimation. At present, monochromatic X-rays are used for measuring residual stress, or the monochromatic X-rays are used for forming a diffraction ring on a detector at a certain angle aiming at a polycrystalline sample, and a line detector can easily capture a diffraction peak, so that the change of the interplanar spacing is calculated according to the diffraction angle. Unlike a polycrystalline sample, a diffraction signal of a single crystal sample does not form a diffraction ring, and therefore how to spatially capture the diffraction signal becomes an urgent problem to be solved.
In a conventional stress meter, an X-ray generator and a detector can only swing in a plane, the captured area is limited, the X-ray generator and the detector are only suitable for polycrystalline samples, the X-ray generator and the detector are not suitable for large-grain samples or single-crystal samples, and diffraction signals cannot be acquired in the swing range. Therefore, the means for large grain samples or single crystal samples is to rotate the sample so that the diffraction signal can be projected onto the detector. The swing of the sample is the swing of a three-dimensional space, and comprises the rotation around a shaft and the tilting in a plane, so that the deviation of an observation point is easily caused in the motion process, and the uncertainty is brought to the measurement of the corresponding force. Therefore, the sample needs to be placed at a position with a constant observation point, namely the concentric height of the sample table and the detector during the movement. In addition, the measurement of the concentric height is often directed at one position, and the sample stage needs to be readjusted when the sample is moved to another position, and if the heights of a plurality of positions can be recorded at the same time, the automatic adjustment of the concentric height can be realized. The measuring steps are simplified, and the efficiency is improved.
Based on the proposed deficiencies of the prior art and the technical requirements, we aim to provide an adjustment device and a method for adjusting the concentricity height based on monochromatic X-ray single crystal stress measurement. The device and the method realize accurate adjustment and automatic adjustment of the center height in the single crystal stress measurement process. Therefore, the observation point is ensured not to change position in the measurement process, and the measurement result is not influenced.
The above information disclosed in this background section is only for enhancement of understanding of the background of the invention and therefore it may contain information that does not form the prior art that is already known in this country to a person of ordinary skill in the art.
Disclosure of Invention
Aiming at the problems in the prior art, the invention provides a device and a method for adjusting the concentricity height based on monochromatic X-ray single crystal stress measurement, which realize accurate adjustment of the concentricity height in the single crystal stress measurement process, realize that an observation point is unchanged in the sample tilting process, realize contour line acquisition and point selection measurement, simplify the detection requirement and conveniently obtain the single crystal stress only by using low laboratory energy level monochromatic X-rays.
The invention aims to realize the technical scheme that an adjusting device based on monochromatic X-ray single crystal stress measurement comprises,
an adjustment seat module comprising
A tilting table comprising a bearing portion for bearing and a tilting portion tilt-connected to the bearing portion, the tilting portion tilting concentrically around the adjustment seat,
a lifting platform capable of lifting and being arranged on the horizontal top surface of the tilting part, and the height of the lifting platform is adjusted to ensure that the single crystal sample on the sample platform is positioned on the concentric point
The sample stage is rotatably arranged on the lifting stage, and a rotating shaft of the sample stage passes through a concentric point of the adjusting seat;
an X-ray module comprising
An X-ray generator that generates monochromatic X-rays to irradiate the single crystal sample, the X-ray generator performing a circular motion along a circle having the concentric point as a rotation center, when the X-ray generator rotates, an irradiation point being always located at the concentric point of the X-ray module,
the detector receives diffraction signals from the single crystal sample, performs circular motion along a circle with the concentric point of the X-ray module as a circle center, and when the detector rotates, the rotation center is always located at the concentric point of the X-ray module.
In the stress measurement process, the concentric height of the adjusting seat is coincided with the concentric point of the X-ray module, and the observation surface of the sample is located at the coincident concentric point.
In the adjusting device, the adjusting device also comprises,
an optical lens disposed directly above and perpendicular to an upper surface of the single crystal sample on which an observation point is marked,
and the image acquisition unit acquires an observation point image from the optical lens, wherein the optical lens is imaged by adjusting the heights of the tilting table and the lifting table for multiple times to observe the observation point mark until the observation point acquired by the image acquisition unit is kept unchanged.
In the adjusting device, the optical lens comprises a long depth-of-field optical lens.
The adjusting device also comprises a control device which is provided with a control device,
a laser ranging unit arranged right above the single crystal sample, the laser ranging unit measuring the height of each point on the surface of the single crystal sample,
and the image processing unit receives the heights of all points on the surface of the single crystal sample to generate a contour line, and the selected observation points on the contour line are adjusted to the coincident concentric points.
The adjusting device, wherein, laser rangefinder unit includes two-dimensional laser range finder, adjusting device still includes the control unit, and it connects and verts platform, elevating platform, sample platform, X ray generator, detector, laser rangefinder unit and image processing unit, and the control unit sends range finding instruction to laser rangefinder unit in order to measure single crystal sample surface each point height, and image processing unit receives single crystal sample surface each point height is in order to generate the contour line, and the control unit sends adjusting instruction to verting platform, elevating platform and sample platform and makes the predetermined observation point on the contour line adjust to coincidence concentric point.
According to another aspect of the invention, the method for adjusting the concentric height based on the monochromatic X-ray single crystal stress measurement comprises the following steps:
the tilting part tilts around a concentric point of the adjusting seat, the lifting platform is lifted and adjusted on the tilting part, the sample platform is rotatably arranged on the lifting platform, the rotating shaft passes through the concentric point of the adjusting seat, and the height of the lifting platform is adjusted to enable the single crystal sample on the sample platform to be positioned on the concentric point of the adjusting seat, so that the height of the observation point is not changed when the single crystal sample tilts and rotates;
the detector is arranged in a circumferential rotating mode, monochromatic X rays are generated to irradiate the X ray generator of the single crystal sample, the detector obtains diffraction signals, the detector takes the concentric point of the X ray module as a rotating center, when the X ray generator rotates, the irradiating point is always located at the concentric point of the X ray module, when the detector rotates, the rotating center is always located at the concentric point of the X ray module, and the observation surface of the single crystal sample is located at the coincident concentric point of the X ray module and the adjusting seat module.
In the method, a long-depth-of-field optical lens is arranged right above a single crystal sample and is vertical to the surface of the sample which is adjusted to be horizontal, the optical path of the long-depth-of-field optical lens is overlapped with the rotating shaft of a sample table, an observation point is marked, the heights of a tilting table and a lifting table are adjusted to enable the optical lens to be clear in imaging, the observation point is moved to the center of a picture, tilting is repeatedly performed, the height of the lifting table is adjusted until the observation point cannot be changed in the tilting process, and then the single crystal sample on the sample table is determined to be located on the concentric.
In the method, in the process of adjusting the concentric height of the single crystal sample on the tilting table, the height of the single crystal sample is adjusted by a clamp or a lifting table on the tilting table, the single crystal sample is adjusted to the concentric high position of an adjusting seat based on the adjustment of an optical lens, and then the whole adjusting seat is adjusted in a lifting way, so that the sample observation point reaches the concentric point of the X-ray module.
In the method, a single low-depth-of-field optical lens is arranged above a single crystal sample, the intersection point of the light path of the single low-depth-of-field optical lens and the light path of a long-depth-of-field lens is ensured to be the concentric point of an X-ray module, and the height of the single crystal sample is directly increased to the position where the low-depth-of-field optical lens clearly collects a clear sample image so as to reach the concentric point of the X-ray.
In the method, after a single crystal sample is adjusted to a concentric high position, the height of each point on the surface of the sample is measured through point laser ranging to generate a contour line, and the selected observation point on the contour line is automatically adjusted to the concentric point based on the control of a sample table.
Compared with the prior art, the invention has the following advantages:
the method overcomes the defects of the existing single crystal stress detection, provides a mode with higher efficiency and lower cost, is suitable for the flow line detection of a large-batch single crystal sample, realizes the accurate adjustment of the concentric height in the single crystal stress measurement process, realizes the invariability of an observation point in the sample tilting process, realizes the contour line acquisition and point selection measurement, simplifies the detection requirement, can conveniently detect the single crystal stress in a large batch and does not need the synchronization of X rays with high energy level and neutron diffraction.
Drawings
Various other advantages and benefits of the present invention will become apparent to those of ordinary skill in the art upon reading the following detailed description of the preferred embodiments. The drawings are only for purposes of illustrating the preferred embodiments and are not to be construed as limiting the invention. It is obvious that the drawings described below are only some embodiments of the invention, and that for a person skilled in the art, other drawings can be derived from them without inventive effort. Also, like parts are designated by like reference numerals throughout the drawings.
In the drawings:
FIG. 1 is a schematic view of an adjustment device based on monochromatic X-ray single crystal stress measurement according to one embodiment of the present invention;
fig. 2 is a schematic step diagram of a concentric height adjustment method according to an embodiment of the present invention.
The invention is further explained below with reference to the figures and examples.
Detailed Description
Specific embodiments of the present invention will be described in more detail below with reference to fig. 1 to 2. While specific embodiments of the invention are shown in the drawings, it should be understood that the invention may be embodied in various forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art.
It should be noted that certain terms are used throughout the description and claims to refer to particular components. As one skilled in the art will appreciate, various names may be used to refer to a component. This specification and claims do not intend to distinguish between components that differ in name but not function. In the following description and in the claims, the terms "include" and "comprise" are used in an open-ended fashion, and thus should be interpreted to mean "include, but not limited to. The description which follows is a preferred embodiment of the invention, but is made for the purpose of illustrating the general principles of the invention and not for the purpose of limiting the scope of the invention. The scope of the present invention is defined by the appended claims.
For the purpose of facilitating understanding of the embodiments of the present invention, the following description will be made by taking specific embodiments as examples with reference to the accompanying drawings, and the drawings are not to be construed as limiting the embodiments of the present invention.
For better understanding, as shown in fig. 1, an adjustment device based on monochromatic X-ray single crystal stress measurement includes,
an adjustment seat module comprising
A tilting table comprising a bearing portion for bearing and a tilting portion tilt-connected to the bearing portion, the tilting portion tilting concentrically around the adjustment seat,
the lifting platform capable of lifting is arranged on the horizontal top surface of the tilting part, the height of the lifting platform is adjusted to enable the single crystal sample on the sample platform to be positioned on the concentric point,
the sample stage is rotatably arranged on the lifting stage, and a rotating shaft of the sample stage passes through a concentric point of the adjusting seat;
an X-ray module comprising
An X-ray generator that generates monochromatic X-rays to irradiate the single crystal sample, the X-ray generator performing a circular motion along a circle having the concentric point as a rotation center, when the X-ray generator rotates, an irradiation point being always located at the concentric point of the X-ray module,
the detector receives diffraction signals from the single crystal sample, performs circular motion along a circle with the concentric point of the X-ray module as a circle center, and when the detector rotates, the rotation center is always located at the concentric point of the X-ray module.
In the stress measurement process, the concentric height of the adjusting seat is coincided with the concentric point of the X-ray module, and the observation surface of the sample is located at the coincident concentric point.
The invention can realize accurate adjustment of the concentricity height in the single crystal stress measurement process, realize the invariance of an observation point in the sample tilting process, and realize contour line acquisition and point selection measurement.
A preferred embodiment of the adjustment device further comprises,
an optical lens disposed directly above and perpendicular to an upper surface of the single crystal sample on which an observation point is marked,
and the image acquisition unit acquires an observation point image from the optical lens, wherein the optical lens is imaged by adjusting the heights of the tilting table and the lifting table for multiple times to observe the observation point mark until the observation point acquired by the image acquisition unit is kept unchanged.
In a preferred embodiment of the adjustment device, the optical lens comprises a long depth of field optical lens.
In a preferred embodiment of the adjustment device described,
a laser ranging unit arranged right above the single crystal sample, the laser ranging unit measuring the height of each point on the surface of the single crystal sample,
and the image processing unit receives the heights of all points on the surface of the single crystal sample to generate a contour line, and the selected observation points on the contour line are adjusted to the coincident concentric points.
In the preferred embodiment of the adjusting device, the laser ranging unit comprises a two-dimensional laser range finder, the adjusting device further comprises a control unit, the control unit is connected with the tilting table, the lifting table, the sample table, the X-ray generator, the detector, the laser ranging unit and the image processing unit, the control unit sends a ranging instruction to the laser ranging unit to measure the heights of all points on the surface of the single crystal sample, the image processing unit receives the heights of all points on the surface of the single crystal sample to generate a contour line, and the control unit sends an adjusting instruction to the tilting table, the lifting table and the sample table to enable a preset observation point on the contour line to be adjusted to a coincident concentric point.
As shown in FIG. 2, a method for adjusting the concentric height of the adjusting device based on the monochromatic X-ray single crystal stress measurement comprises the following steps:
the tilting part tilts around a concentric point of the adjusting seat, the lifting platform is lifted and adjusted on the tilting part, the sample platform is rotatably arranged on the lifting platform, the rotating shaft passes through the concentric point of the adjusting seat, and the height of the lifting platform is adjusted to enable the single crystal sample on the sample platform to be positioned on the concentric point of the adjusting seat, so that the height of the observation point is not changed when the single crystal sample tilts and rotates;
the detector is arranged in a circumferential rotating mode, monochromatic X rays are generated to irradiate the X ray generator of the single crystal sample, the detector obtains diffraction signals, the detector takes the concentric point of the X ray module as a rotating center, when the X ray generator rotates, the irradiating point is always located at the concentric point of the X ray module, when the detector rotates, the rotating center is always located at the concentric point of the X ray module, and the observation surface of the single crystal sample is located at the coincident concentric point of the X ray module and the adjusting seat module.
For further understanding of the present invention, in one embodiment, the method for adjusting the concentric height includes adjusting the concentric height of the adjustment base module at one position and the concentric height of the X-ray module at another position, wherein the adjusting method is based on an optical lens adjusting method, and after the position of the optical lens is adjusted, the low depth-of-field optical lens is used as a scale to directly mark the concentric point of the X-ray module. In one embodiment, the adjusting method is based on a point laser ranging and image acquisition mode, the distance measured by laser is used as a ruler mark X-ray module concentric point, and the concentric point of the adjusting seat is judged in cooperation with image transmission to directly adjust the height of the sample to the concentric height. In one embodiment, the adjusting method is based on a laser contour line and an image acquisition mode, the height of each point on a two-dimensional contour line of a sample is acquired, and the designated point is adjusted to be concentric high. The three modes can exist in the single crystal stress measuring device alone or in combination.
In a preferred embodiment, the concentric height refers to the position where the sample is tilted and rotated without changing the height of the observation point, and is the position where the sample rotation axis and the tilt axis pass through. Meanwhile, the position of the irradiation point is not changed when the incident angle of the X-ray is changed, and the position is also the rotation center of the detector when the detector rotates. The concentric position is determined by the instrument itself. In practical operation, two positions are concentric, namely the concentric height of the adjusting seat module and the concentric height of the X-ray module, and the two positions need to be overlapped.
In a preferred embodiment, the observation point is the intersection point of the rotating shaft and the tilting shaft on the surface of the sample when the sample is adjusted to be concentric high of the adjusting seat.
In a preferred embodiment, the adjusting base can be lifted and lowered integrally by means of laser ranging or low-depth-of-field optical lens, so that the surface of the sample reaches the concentric height of the X-ray module.
In a preferred embodiment, the tilt table has a center of rotation during adjustment of the concentric height of the adjustment base, and the height of the sample is adjustable by means of a fixture or a lift table mounted on the tilt table, to which height the sample can be adjusted by means of a scale according to the detailed dimensions given the concentric height position in the design of the tilt table. And then the adjusting seat is moved integrally to ensure that the adjusting seat and the X-ray module are concentric and highly overlapped.
In a preferred embodiment, the adjustment of the concentric height of the adjustment base may be performed by means of a long depth-of-field optical lens, which is used in conjunction with image transmission to place the lens directly above the sample, perpendicular to the surface of the sample, while the surface of the sample is adjusted to be horizontal. Marking the observation point, and adjusting the overall height of the tilting table and the sample to ensure that the optical lens can image clearly and the mark of the observation point can be observed. At the moment, the sample is repeatedly tilted and is matched with the height adjustment of the lifting platform until the change of the mark of the observation point cannot be observed in the tilting process, and the concentric height adjustment of the adjusting seat is completed. And then the adjusting seat is moved integrally to ensure that the adjusting seat and the X-ray module are concentric and highly overlapped.
In a preferred embodiment, if a low depth of field optical lens is used to mark the X-ray module concentric point, the sample height is directly raised to a position where the optical lens can clearly acquire a clear sample image, and the sample surface observation point reaches the X-ray module concentric height.
In a preferred embodiment, after the sample is adjusted to the position where the concentric heights of the adjusting seat module and the X-ray module are overlapped, the height of each point on the surface of the sample can be measured by means of the translation stage under the sample in cooperation with the laser distance of the point, contour line surveying and mapping are completed, and point selection on a contour line is realized to adjust the concentric heights and measure in cooperation with the control of the sample stage.
In a preferred embodiment, laser profile acquisition may use two-dimensional laser ranging.
In an embodiment, a sample is placed on a fixture, the fixture is adjusted to level the surface of the sample to be measured, the observation point is marked with a marker pen, and the marker is moved to the rotation center, so that the marker can be found by rotating the sample stage without changing the position. Then, the concentric height of the adjusting seat is adjusted, the tilting platform and the whole sample are adjusted in height to enable the mark to be clearly observed in the optical lens, then the sample is tilted to observe the mark position captured by the optical lens, if the mark moves to the raised side in the tilting process, the concentric height is indicated to be lower, and if the mark moves to the opposite side, the concentric height is indicated to be far away. Correspondingly, the height of the sample is adjusted through the lifting platform until the position of the mark is unchanged in the tilting process, and at the moment, the sample observation point is positioned on the concentric height of the adjusting seat module.
Then, the second step is performed, and if the concentric height is adjusted by using the optical lens, the tilt table and the entire sample are directly adjusted to a position where the observation point mark can be clearly seen. Due to the use of low depth of field optical lenses, it can be known that the sample has reached the high X-ray module concentricity. If laser ranging is used, the tilt table and the sample are adjusted to be concentric in height as a whole by directly reading the height value. When the point laser source is used, the displacement table is used for displacing the sample, so that the height values of all points on the surface to be measured can be obtained, and then the concentric heights are automatically adjusted to respectively measure the stress according to the selected observation points.
After the concentric height is adjusted, the X-ray is turned on and the acquisition of the X-ray diffraction signal is started.
Although the embodiments of the present invention have been described above with reference to the accompanying drawings, the present invention is not limited to the above-described embodiments and application fields, and the above-described embodiments are illustrative, instructive, and not restrictive. Those skilled in the art, having the benefit of this disclosure, may effect numerous modifications thereto without departing from the scope of the invention as defined by the appended claims.
Claims (1)
1. A method for adjusting the concentric height of an adjusting device based on monochromatic X-ray single crystal stress measurement is characterized by comprising the following steps:
the adjusting device for measuring the stress of the monochromatic X-ray single crystal comprises,
adjust seat module, it includes:
a tilting table comprising a bearing portion for bearing and a tilting portion tilt-connected to the bearing portion, the tilting portion tilting concentrically around the adjustment seat,
the lifting platform capable of lifting is arranged on the horizontal top surface of the tilting part, the height of the lifting platform is adjusted to enable the single crystal sample on the sample platform to be positioned on the concentric point of the adjusting seat,
the sample stage is rotatably arranged on the lifting stage, and the rotating shaft of the sample stage passes through the concentric point of the adjusting seat;
an X-ray module, comprising:
an X-ray generator that generates monochromatic X-rays to irradiate the single crystal sample, the X-ray generator performing a circular motion along a circumference having an X-ray module concentric point as a rotation center, when the X-ray generator rotates, an irradiation point being always located at the X-ray module concentric point,
a detector for receiving diffraction signals from the single crystal sample, wherein the detector performs circular motion along a circle with a concentric point of the X-ray module as a circle center, and when the detector rotates, the rotation center is always positioned at the concentric point of the X-ray module,
in the stress measurement process, the concentric point of the adjusting seat is superposed with the concentric point of the X-ray module, the observation surface of the sample is positioned at the superposed concentric point of the adjusting seat and the concentric point of the X-ray module,
an optical lens disposed directly above and perpendicular to an upper surface of the single crystal sample, the single crystal sample having an observation point marked thereon, the optical lens comprising a long depth of field optical lens,
an image collecting unit for collecting observation point images from the optical lens, wherein the optical lens is imaged by adjusting the heights of the tilting table and the lifting table for multiple times to observe the observation point marks until the observation point collected by the image collecting unit is kept unchanged,
a laser ranging unit arranged right above the single crystal sample, the laser ranging unit measuring the height of each point on the surface of the single crystal sample, the laser ranging unit comprising a two-dimensional laser range finder,
an image processing unit which receives the heights of the points on the surface of the single crystal sample to generate a contour line, wherein the selected observation points on the contour line are adjusted to the coincident concentric points,
the adjusting device for measuring the stress of the X-ray single crystal further comprises a control unit, wherein the control unit is connected with the tilting table, the lifting table, the sample table, the X-ray generator, the detector, the laser ranging unit and the image processing unit, the control unit sends a ranging instruction to the laser ranging unit to measure the height of each point on the surface of the single crystal sample, and the control unit sends an adjusting instruction to the tilting table, the lifting table and the sample table to enable a selected observation point on a contour line to be adjusted to a coincident concentric point;
the method for adjusting the concentric height of the adjusting device based on monochromatic X-ray single crystal stress measurement comprises the following steps:
the concentric height refers to the position of the sample where the height of an observation point is not changed during tilting and rotation, and is the position where the sample rotation shaft and the tilting shaft pass;
the tilting part tilts around a concentric point of the adjusting seat, the lifting platform is lifted and adjusted on the tilting part, the sample platform is rotatably arranged on the lifting platform, the rotating shaft passes through the concentric point of the adjusting seat, and the height of the lifting platform is adjusted to enable the single crystal sample on the sample platform to be positioned on the concentric point of the adjusting seat, so that the height of the observation point is not changed when the single crystal sample tilts and rotates;
the X-ray generator and the detector are arranged in a circumferential rotating mode, the concentric point of the X-ray module is used as a rotating center, when the X-ray generator rotates, an irradiation point is always located at the concentric point of the X-ray module, when the detector rotates, the rotating center is always located at the concentric point of the X-ray module, and the single crystal sample observation surface is located at the coincident concentric point of the X-ray module and the concentric point of the adjusting seat module;
the long-depth-of-field optical lens is arranged right above the single crystal sample and is vertical to the surface of the single crystal sample which is adjusted to be horizontal, the optical path of the long-depth-of-field optical lens is overlapped with the rotating shaft of the sample table, an observation point is marked, the heights of the tilting table and the lifting table are adjusted to enable the long-depth-of-field optical lens to be clear in imaging, the observation point is moved to the center of a picture, the tilting and the lifting table are repeatedly adjusted until the observation point is not changed in the tilting process, and then the single crystal sample on the sample table is determined to be located on the concentric point;
in the process of adjusting the concentric height of the single crystal sample on the tilting table, the height of the single crystal sample is adjusted by a fixture or a lifting table on the tilting table, the single crystal sample is adjusted to the concentric high position of an adjusting seat based on the adjustment of a long-depth-of-field optical lens, and then the whole adjusting seat is subjected to lifting adjustment, so that the single crystal sample observation point reaches the concentric point of the X-ray module;
a single low-depth-of-field optical lens is arranged above a single crystal sample, the intersection point of a light path of the single low-depth-of-field optical lens and a light path of a long-depth-of-field lens is ensured to be the concentric point of the X-ray module, and the height of the single crystal sample is directly raised to the position where the low-depth-of-field optical lens collects a clear sample image so as to reach the concentric point of the X-; after the single crystal sample is adjusted to the concentric high position, the height of each point on the surface of the single crystal sample is measured through point laser ranging to generate a contour line, and the selected observation point on the contour line is automatically adjusted to the coincident concentric point based on the control of the sample table.
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