CN108195859A - A kind of X ray crystal orientation and residual stress analysis device - Google Patents
A kind of X ray crystal orientation and residual stress analysis device Download PDFInfo
- Publication number
- CN108195859A CN108195859A CN201711386224.0A CN201711386224A CN108195859A CN 108195859 A CN108195859 A CN 108195859A CN 201711386224 A CN201711386224 A CN 201711386224A CN 108195859 A CN108195859 A CN 108195859A
- Authority
- CN
- China
- Prior art keywords
- ray
- crystal
- measurement device
- manipulator
- half loop
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
Landscapes
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
The present invention discloses a kind of X ray crystal orientation measurement device.The measurement device includes manipulator, X-ray emitter, X-ray receptor, three-shaft linkage platform, half loop orbit, rangefinder and computer；Manipulator is used to capture and discharge crystal；Half loop orbit is located at the lower section of manipulator, and X-ray emitter and X-ray emitter are arranged on half loop orbit；X-ray emitter and X-ray receptor are symmetrical about the main shaft of half loop orbit；Three-shaft linkage platform is for adjustment X-ray emitter respectively and the distance of X-ray receptor and crystal tested surface；Rangefinder demarcates the distance between crystal and rangefinder；Computer controlled machine tool hand completes crawl and the action of release crystal and scanning crystal deviates the angle of different orientation.The measure of the measure of the full-automatic deviation angle for realizing crystal different orientation and brilliant residual stress in the measurement device of the present invention improves the measuring speed of crystal and industrialization flowing water degree.
Description
Technical field
The present invention relates to crystal testing field, more particularly to a kind of X ray crystal orientation, residual stress analysis device.
Background technology
Diffractive technology is widely applied and material structure analysis field.Information leads some as obtained by the technology
Domain is critically important, such as crystal orientation, stress analysis, constituent analysis.The performance-critical for improving aero gas turbine engine exists
In the material property for improving military service.And crystal orientation is an important index of current certain single crystal product articles, different crystal takes
To suffering from very big influence to the mechanical property of single crystal product article, electric property, thermodynamic property, magnetic performance.And at present should
The equipment measured used in single-crystal orientation is partial to experimental study mostly, and precision is high and poor operability, efficiency are low.And with high-precision end
Sci-tech product deepens continuously to basis research and development, the pursuit of high end performance of material, and market is to having the rigidity for determining orientation product
Demand constantly expands.The production of single crystal product article not only requires higher in quality, the requirement to yield be also it is growing day by day, finally
Cause current most single-crystal orientation testers that cannot meet the requirements.
Invention content
The object of the present invention is to provide a kind of X ray crystal orientation measurement devices for improving crystal yield.
To achieve the above object, the present invention provides following schemes：
A kind of X ray crystal orientation measurement device, the measurement device include manipulator, X-ray emitter, X ray and connect
Receive device, three-shaft linkage platform, half loop orbit, rangefinder and computer；
The manipulator is used to capture and discharge crystal；
Half loop orbit is located at the lower section of the manipulator, and half loop orbit is used to adjust the X-ray emitter
With the spatial attitude of the X-ray emitter；
The X-ray emitter is located on half loop orbit, and the X-ray emitter is used to emit X ray；
The X-ray receptor is located on half loop orbit, and the X-ray receptor is used to receive X-ray emitter
The X ray sent out；The X-ray emitter and the X-ray receptor are symmetrical about the main shaft of half loop orbit；
The three-shaft linkage platform is located at the lower section of half loop orbit, and the three-shaft linkage platform is used to adjust the X
Distance of the ray emitter with the distance of the crystal and for adjusting the X-ray receptor and the crystal；
The rangefinder is located on half loop orbit, and the rangefinder is used to ensure that the crystal is surveyed with X ray light path
Fixed point is always on the measure plane of crystal；
The computer is connect with the manipulator, the computer for control the manipulator complete crawl crystal and
It discharges the action of crystal and the scanning crystal deviates the analysis of the angle and completion of different orientation to brilliant residual stress.
Optionally, the measurement device further includes a servo motor, the servo motor respectively with the X-ray emission
Device is connected with the X-ray receptor, described for the angle that adjusts the X-ray emitter and the crystal and for adjusting
The angle of X-ray receptor and the crystal.
Optionally, the measurement device further includes the first servo motor and the second servo motor, first servo motor
It is connected with the X-ray emitter, for adjusting the angle of the X-ray emitter and the crystal；The second servo electricity
Machine is connected with the X-ray receptor, for adjusting the angle of the X-ray receptor and the crystal.
Optionally, the measurement device further includes first substrate, and the first substrate includes first step and second step,
The height of the first step is more than the height of the second step, sets the manipulator on the first step, and described the
The three-shaft linkage platform is set on two steps.
Optionally, the measurement device further includes second substrate, and the second substrate is set to the three-shaft linkage platform
On, half loop orbit is set on the second substrate.
Optionally, the manipulator is six axis robot, and mating pneumatic pawl is included on the six axis robot.
Optionally, the elevation coverage of the manipulator is 60 ° of -30 °~﹢.
Optionally, the performance number of the X-ray emitter is less than 20W.
Optionally, the rangefinder is infrared ambulator.
According to specific embodiment provided by the invention, the invention discloses following technique effects：
The X ray crystal orientation measurement device of the present invention completes the requirement of different crystal Determination of Orientation by computer programming
Parameter, by manipulator teaching machine program complete measure it is required action program, manipulator will be complete by computer software
Into crawl automatically, measure and the release of crystal, so as to quickly realize the measure of crystal different orientation and to brilliant residual stress
Analysis, improve the efficiency of crystal orientation measure and the full-automatic engineering demand measured.
Description of the drawings
It in order to illustrate more clearly about the embodiment of the present invention or technical scheme of the prior art, below will be to institute in embodiment
Attached drawing to be used is needed to be briefly described, it should be apparent that, the accompanying drawings in the following description is only some implementations of the present invention
Example, for those of ordinary skill in the art, without having to pay creative labor, can also be according to these attached drawings
Obtain other attached drawings.
Fig. 1 is a kind of X ray crystal orientation assay device structures figure of the embodiment of the present invention.
Fig. 2 is the structure chart that manipulator of the embodiment of the present invention is connect with computer.
Specific embodiment
Below in conjunction with the attached drawing in the embodiment of the present invention, the technical solution in the embodiment of the present invention is carried out clear, complete
Site preparation describes, it is clear that described embodiment is only part of the embodiment of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, those of ordinary skill in the art are obtained every other without making creative work
Embodiment shall fall within the protection scope of the present invention.
The object of the present invention is to provide a kind of X ray crystal orientation measurement devices for improving crystal yield.
In order to make the foregoing objectives, features and advantages of the present invention clearer and more comprehensible, it is below in conjunction with the accompanying drawings and specific real
Applying mode, the present invention is described in further detail.
Specific embodiment 1：
Fig. 1 is a kind of 1 X ray crystal orientation assay device structures figure of the embodiment of the present invention.As shown in Figure 1, a kind of X ray
Crystal orientation measurement device, the measurement device include：Manipulator 1, half loop orbit 2, X-ray emitter 3, X-ray receptor
4th, three-shaft linkage platform 5, rangefinder 6 and computer 7；
The manipulator 1 is for capturing and discharge crystal and the rotation and swing for the crystal；
Half loop orbit 2 is located at the lower section of the manipulator 1, and half loop orbit 2 is used to set the X-ray emission
The spatial attitude of device 3 and the X-ray emitter 4；
The X-ray emitter 3 is located on half loop orbit 2, and the X-ray emitter 3 is used to emit X ray；
The X-ray receptor 4 is located on half loop orbit 2, and the X-ray receptor 4 is used to receive X-ray emission
The X ray that device 3 is sent out；The main shaft pair of the X-ray emitter 3 and the X-ray receptor 4 about half loop orbit 2
Claim；
The three-shaft linkage platform 5 is located at the lower section of half loop orbit 2, and the three-shaft linkage platform 5 is used to adjust institute
State X-ray emitter 3 and the distance of X-ray receptor 4 and the crystal；
The rangefinder 6 is located on half loop orbit 2, and the rangefinder 6 is used to ensure the crystal and X ray light path
Always on the measure plane of crystal, rangefinder is used to measure and adjust between the crystal and the rangefinder measuring point
Distance；
Fig. 2 is the structure chart that manipulator of the embodiment of the present invention is connect with computer.As shown in Fig. 2, the computer 7 and institute
Manipulator 1 is stated to connect, the computer 7 be used to controlling the manipulator 1 complete crawl crystal and the action for discharging crystal and
It scans the crystal and deviates the analysis of the angle and completion of different orientation to brilliant residual stress.
A branch of dot laser is sent out in the rangefinder 6, central ray is adjusted to overlap with main shaft, fall in crystal
The point on surface is used to indicate orientation tested point；6 distance of rangefinder is adjusted to the X that incident X ray is reflected with reception
Distance when 4 center line intersection point of ray receiver is overlapped with plane of crystal tested point, the three-shaft linkage platform 5 will monitor always
This distance.The parameter completed different crystal Determination of Orientation and required is programmed by the computer 7, is compiled by manipulator teaching machine
Journey is completed to measure required action programming.The manipulator 1 can take the automatic of sample is completed by computer software, survey
Fixed and release.
The X ray crystal orientation measurement device of the present invention is programmed by computer 7 and completes the requirement of different crystal Determination of Orientation
Parameter, program to complete to measure required action by 1 teaching machine of manipulator and program, manipulator 1 will pass through computer software
The crawl automatically of completion crystal is measured with discharging, so as to quickly realize the measure of crystal different orientation and brilliant remnants are answered
The analysis of power improves the efficiency of crystal orientation measure and the full-automatic engineering demand measured.
Specific embodiment 2:
The measurement device further includes a servo motor 8, the servo motor 8 respectively with the X-ray emitter 3 and
The X-ray receptor 4 connects, for the angle for adjusting the X-ray emitter 3 and the crystal and for adjusting the X
The angle of ray receiver 4 and the crystal.
One group of crystal to be measured is positioned over the manipulator 1 predetermined location nearby, the manipulator 1 will be according to program
First crystal of selection is captured.For the crystal after the manipulator 1 crawl, surface to be measured will be by the manipulator 1
The vertical intersection point for being positioned over the X-ray emitter 3 and 4 light path of X-ray receptor.Particularly, the rangefinder 6 is logical
The height for crossing three-shaft linkage platform 5 described in 7 closed-loop control of computer so that no matter each crystal prototype just can
Its surface is made to be located at the point of intersection of the X-ray emitter and 34 light paths of X-ray receptor.
The 2 θ angles of crystal diffraction angle of orientation to be measured are inquired according to material crystals diffraction handbook, input computer 7, Ke Yishe
Determine incident X-rays and moved with receiving 4 center line of reflection X-ray receiver by the servo motor 8 with circular arc main shaft simultaneously
Into (90- θ) °, at this point, incident X-rays are with receiving 4 center line of the X-ray receptor of reflection X-ray into (180-2 θ) °.
Sweep parameter Ψ and Φ angles needed for crystal orientation measure to be measured are completed by the programming of computer 7.When starting test, institute
State manipulator 1 by script perpendicular to ground location along using the intersection point of x-ray light path as the center of circle, justify by radius work of a certain distance
Week swings, and gripper will be further continued for swinging 1 ° for 360 ° along sample center with rotation after often swinging 1 °, until ferry-boat to Ψ.X is penetrated
The intersection point on linear light road locating in plane of crystal always.When sample scans finish, manipulator puts back to crystal along original route,
The data that X-ray detector records when computer records different angle automatically, and automatic peak-seeking marks deviation setting orientation
Angle.
Specific embodiment 3:
The measurement device further includes the first servo motor and the second servo motor, first servo motor and the X
Ray emitter 3 connects, for adjusting the angle of the X-ray emitter 3 and the crystal；Second servo motor and institute
It states X-ray receptor 4 to connect, for adjusting the angle of the X-ray receptor 4 and the crystal.
Specific embodiment 4：
One group of crystal to be measured is positioned over the manipulator 1 predetermined location nearby, the manipulator 1 is used will be according to journey
Sequence selects first crystal to be captured.
Crystal after the manipulator 1 crawl, surface to be measured by by the manipulator 1 it is vertical be positioned over the X
Ray emitter 3 and the intersection point of 4 light path of X-ray receptor.Particularly, the rangefinder 6 passes through 7 closed loop of computer
The height of the three-shaft linkage platform 5 is controlled so that no matter each crystal prototype can just make its surface be located at the X
The point of intersection of ray emitter and 34 light paths of X-ray receptor.
It is inquired according to material crystals diffraction handbook<420>、<331>The 2 θ angles of crystal diffraction angle in direction are respectively θ1、θ2,
Input computer 7.First, incident X-rays pass through servo motor movement and circular arc with receiving 4 center line of reflection X-ray receiver
Main shaft is simultaneously into (90- θ1) °, at this point, incident X-rays are with receiving 4 center line of reflection X-ray receiver into (180-2 θ1)°.It is logical
It crosses the programming of computer 7 and completes crystal<420>Sweep parameter Ψ and Φ angles needed for Determination of Orientation.When starting test, manipulator 1 is by original
This, along using the intersection point of X ray light path as the center of circle, makees circle swing by radius of a certain distance, often swings perpendicular to ground location
Gripper will be further continued for swinging 1 ° for 360 ° along sample center with rotation after 1 °, until ferry-boat to Ψ.The intersection point of X ray light path begins
Locating in plane of crystal eventually.When sample scans finish, manipulator puts back to crystal along original route, and the computer 7 is certainly
The data that X-ray receptor 4 records during dynamic record different angle, and automatic peak-seeking marks specimen surface deviation<420>It takes
To 4 angles.
Secondly, incident X-rays are passed through into servo motor movement and circular arc master with receiving 4 center line of reflection X-ray receiver
Axis trimming is into (90- θ2) °, at this point, incident X-rays are with receiving the detector center line of reflection X-ray into (180-2 θ2)°.It is logical
It crosses the programming of computer 7 and completes crystal<331>Sweep parameter Ψ and Φ angles needed for Determination of Orientation.When starting test, manipulator is by original
This, along using the intersection point of x-ray light path as the center of circle, makees circle swing by radius of a certain distance, often swings perpendicular to ground location
Gripper will be further continued for swinging 1 ° for 360 ° along sample center with rotation after 1 °, until ferry-boat to Ψ.The intersection point of X ray light path begins
Locating in plane of crystal eventually.When sample scans finish, manipulator puts back to crystal along original route, and computer 7 is remembered automatically
The data of X-ray detector record when recording different angle, and automatic peak-seeking marks specimen surface deviation<331>The 6 of orientation
A angle.Computer is by calculating the residual stress of the automatically derived measurement plane of crystal.
Each embodiment is described by the way of progressive in this specification, the highlights of each of the examples are with other
The difference of embodiment, just to refer each other for identical similar portion between each embodiment.
Specific case used herein is expounded the principle of the present invention and embodiment, and above example is said
The bright method and its core concept for being merely used to help understand the present invention；Meanwhile for those of ordinary skill in the art, foundation
The thought of the present invention, in specific embodiments and applications there will be changes.In conclusion the content of the present specification is not
It is interpreted as limitation of the present invention.
Claims (9)
1. a kind of X ray crystal orientation measurement device, which is characterized in that the measurement device includes manipulator, X-ray emission
Device, X-ray receptor, three-shaft linkage platform, half loop orbit, rangefinder and computer；
The manipulator is for capturing and discharge crystal and the rotation and swing for the crystal；
Half loop orbit is located at the lower section of the manipulator, and half loop orbit is used to set the X-ray emitter and institute
State the spatial attitude of X-ray emitter；
The X-ray emitter is located on half loop orbit, and the X-ray emitter is used to emit X ray；
The X-ray receptor is located on half loop orbit, and the X-ray receptor sends out for receiving X-ray emitter
X ray；The X-ray emitter and the X-ray receptor are symmetrical about the main shaft of half loop orbit；
The three-shaft linkage platform is located at the lower section of half loop orbit, and the three-shaft linkage platform is used to adjust the X ray
The distance of transmitter and X-ray receptor and the crystal；
The rangefinder is located on half loop orbit, and the rangefinder is used to ensure the crystal and X ray light path measuring point
Always on the measure plane of crystal；
The computer is connect with the manipulator, and the computer is used to that the manipulator to be controlled to complete crawl crystal and release
The action of crystal and the scanning crystal deviate the analysis of the angle and completion of different orientation to brilliant residual stress.
2. a kind of X ray crystal orientation measurement device according to claim 1, which is characterized in that the measurement device is also
Including a servo motor, the servo motor connect with the X-ray emitter and the X-ray receptor, is used for respectively
Adjust the angle of the X-ray emitter and the crystal and the angle for adjusting the X-ray receptor and the crystal.
3. a kind of X ray crystal orientation measurement device according to claim 1, which is characterized in that the measurement device is also
Including the first servo motor and the second servo motor, first servo motor is connected with the X-ray emitter, for adjusting
The angle of the X-ray emitter and the crystal；Second servo motor is connected with the X-ray receptor, for adjusting
The angle of the whole X-ray receptor and the crystal.
4. a kind of X ray crystal orientation measurement device according to claim 1, which is characterized in that the measurement device is also
Including first substrate, the first substrate includes first step and second step, and the height of the first step is more than described the
The height of two steps sets the manipulator on the first step, the three-shaft linkage platform is set on the second step.
5. a kind of X ray crystal orientation measurement device according to claim 1, which is characterized in that the measurement device is also
Including second substrate, the second substrate is set on the three-shaft linkage platform, and the semi-ring is set on the second substrate
Track.
6. a kind of X ray crystal orientation measurement device according to claim 1, which is characterized in that the manipulator is six
Axis robot includes mating pneumatic pawl on the six axis robot.
7. a kind of X ray crystal orientation measurement device according to claim 1, which is characterized in that the manipulator is bowed
Elevation coverage is 60 ° of -30 °~﹢.
A kind of 8. X ray crystal orientation measurement device according to claim 1, which is characterized in that the X-ray emitter
Performance number be less than 20W.
9. a kind of X ray crystal orientation measurement device according to claim 1, which is characterized in that the rangefinder is red
Outside line rangefinder, the rangefinder are used for the position to be measured of plane of crystal described in Automatic-searching.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711386224.0A CN108195859A (en) | 2017-12-20 | 2017-12-20 | A kind of X ray crystal orientation and residual stress analysis device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711386224.0A CN108195859A (en) | 2017-12-20 | 2017-12-20 | A kind of X ray crystal orientation and residual stress analysis device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108195859A true CN108195859A (en) | 2018-06-22 |
Family
ID=62577015
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201711386224.0A Pending CN108195859A (en) | 2017-12-20 | 2017-12-20 | A kind of X ray crystal orientation and residual stress analysis device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108195859A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108613641A (en) * | 2018-07-23 | 2018-10-02 | 安徽创谱仪器科技有限公司 | Two-dimentional orientation error precision measurement method for thin plate crystals |
| CN110044527A (en) * | 2019-03-25 | 2019-07-23 | 成都航大新材料有限公司 | A kind of method of quick measurement nickel-base high-temperature single crystal alloy internal stress |
| CN110618148A (en) * | 2019-09-19 | 2019-12-27 | 西安交通大学 | Adjusting device and method based on monochromatic X-ray single crystal stress measurement |
| CN116878707A (en) * | 2023-07-31 | 2023-10-13 | 浙江航工智能科技有限公司 | Residual stress detection method and detection device thereof |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1551601A1 (en) * | 2002-07-18 | 2005-07-13 | Oceaneering International, Inc. | End effector |
| CN202486072U (en) * | 2012-02-23 | 2012-10-10 | 朱史胜 | Sapphire crystal X-ray automatic orientation material bonding machine |
| US20140044237A1 (en) * | 2012-08-08 | 2014-02-13 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Micro-gripper for Automated Sample Harvesting and Analysis |
| CN104155321A (en) * | 2014-09-09 | 2014-11-19 | 北京理工大学 | X-ray cabin manipulator nondestructive testing method |
| CN104764758A (en) * | 2015-04-07 | 2015-07-08 | 中国工程物理研究院核物理与化学研究所 | Method for achieving neutron diffraction measurement of crystal interior texture by utilizing mechanical arm |
| CN105510366A (en) * | 2016-02-03 | 2016-04-20 | 中国工程物理研究院材料研究所 | Portable X-ray diffractometer |
| CN205748263U (en) * | 2015-12-31 | 2016-11-30 | 徐州德坤电气科技有限公司 | The online detection unit of artificial intelligence's sheet metal component production system |
-
2017
- 2017-12-20 CN CN201711386224.0A patent/CN108195859A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1551601A1 (en) * | 2002-07-18 | 2005-07-13 | Oceaneering International, Inc. | End effector |
| CN202486072U (en) * | 2012-02-23 | 2012-10-10 | 朱史胜 | Sapphire crystal X-ray automatic orientation material bonding machine |
| US20140044237A1 (en) * | 2012-08-08 | 2014-02-13 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Micro-gripper for Automated Sample Harvesting and Analysis |
| CN104155321A (en) * | 2014-09-09 | 2014-11-19 | 北京理工大学 | X-ray cabin manipulator nondestructive testing method |
| CN104764758A (en) * | 2015-04-07 | 2015-07-08 | 中国工程物理研究院核物理与化学研究所 | Method for achieving neutron diffraction measurement of crystal interior texture by utilizing mechanical arm |
| CN205748263U (en) * | 2015-12-31 | 2016-11-30 | 徐州德坤电气科技有限公司 | The online detection unit of artificial intelligence's sheet metal component production system |
| CN105510366A (en) * | 2016-02-03 | 2016-04-20 | 中国工程物理研究院材料研究所 | Portable X-ray diffractometer |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108613641A (en) * | 2018-07-23 | 2018-10-02 | 安徽创谱仪器科技有限公司 | Two-dimentional orientation error precision measurement method for thin plate crystals |
| CN110044527A (en) * | 2019-03-25 | 2019-07-23 | 成都航大新材料有限公司 | A kind of method of quick measurement nickel-base high-temperature single crystal alloy internal stress |
| CN110044527B (en) * | 2019-03-25 | 2021-01-15 | 成都航大新材料有限公司 | Method for rapidly measuring internal stress of nickel-based single crystal superalloy |
| CN110618148A (en) * | 2019-09-19 | 2019-12-27 | 西安交通大学 | Adjusting device and method based on monochromatic X-ray single crystal stress measurement |
| CN110618148B (en) * | 2019-09-19 | 2021-07-06 | 西安交通大学 | Adjusting device and method based on monochromatic X-ray single crystal stress measurement |
| CN116878707A (en) * | 2023-07-31 | 2023-10-13 | 浙江航工智能科技有限公司 | Residual stress detection method and detection device thereof |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN108195859A (en) | A kind of X ray crystal orientation and residual stress analysis device | |
| CN110333191B (en) | Spectral magneto-optical ellipsometry analysis device of rotary compensator and application thereof | |
| CN103630761A (en) | Multi-probe spherical near field channel calibration device and method | |
| CN107238825A (en) | RCS method of testing when a kind of utilization vector network instrument realizes antenna transmitting | |
| CN103842766A (en) | Measurement method | |
| CN110455498A (en) | A kind of composite shaft pointing system performance testing device and test method | |
| CN103675795A (en) | Device and method for automatically matching laser radar receiving and transmitting optical axes | |
| CN107560585B (en) | The detection method of large scale correction-plate surface shape error in ring throwing | |
| CN105223029B (en) | A kind of automobile driving running deviation track automatic measurement system based on laser scanning | |
| Hills et al. | ALMA: status report on construction and early results from commissioning | |
| CN105424024B (en) | A kind of position and orientation scaling method of the extraterrestrial target based on total powerstation | |
| CN107481960B (en) | Device and method for measuring and calibrating offset of square wafer | |
| CN103528676A (en) | Light distribution test method of semiconductor laser and device of test method | |
| CN113671271A (en) | Antenna test data acquisition method for three-dimensional space automatic trajectory control | |
| CN106918309A (en) | The measurement apparatus and its measuring method of electro-optic crystal light pass surface normal and Z axis deflecting angle | |
| CN110044527A (en) | A kind of method of quick measurement nickel-base high-temperature single crystal alloy internal stress | |
| CN110849918A (en) | Nondestructive detection method and system for welding spot defects of flip chip bonding device | |
| CN104764758B (en) | A kind of utilization mechanical arm realizes the neutron diffraction measuring method of crystals texture | |
| CN116520035A (en) | Two-dimensional pattern testing method adopting plane near-field rapid inversion method | |
| CN108981746A (en) | Turntable Calibration Method and device | |
| CN107421964A (en) | A kind of scanning system | |
| CN101526420A (en) | Device simulating laser target of small-angle movement | |
| CN102506902A (en) | Device and method for evaluating accuracy of prism-free distance measurement of total station | |
| CN102841097B (en) | High-accuracy resetting technology-based damage threshold measuring method and device | |
| CN108445779A (en) | Simulator and analog simulation method are monitored on space flight optical camera intrinsic parameter star |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20180622 |
|
| RJ01 | Rejection of invention patent application after publication |