CN110586527A - Substrate cleaning device - Google Patents

Substrate cleaning device Download PDF

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Publication number
CN110586527A
CN110586527A CN201910499457.4A CN201910499457A CN110586527A CN 110586527 A CN110586527 A CN 110586527A CN 201910499457 A CN201910499457 A CN 201910499457A CN 110586527 A CN110586527 A CN 110586527A
Authority
CN
China
Prior art keywords
cleaning
substrate
liquid crystal
crystal substrate
brush
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201910499457.4A
Other languages
Chinese (zh)
Inventor
中岛峻兵
松本龙儿
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Publication of CN110586527A publication Critical patent/CN110586527A/en
Pending legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
    • B08B1/12—Brushes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/20—Cleaning of moving articles, e.g. of moving webs or of objects on a conveyor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
    • B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
    • B08B11/04—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto specially adapted for plate glass, e.g. prior to manufacture of windshields
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • B08B3/022—Cleaning travelling work
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67046—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Liquid Crystal (AREA)
  • Cleaning In General (AREA)

Abstract

Provided is a substrate cleaning device which has a simple structure and an excellent substrate cleaning effect, and in which a brush in which foreign matter such as dust is hard to remain or adhere during cleaning standby is provided. Substrate cleaning apparatus, comprising: a conveying roller for conveying the liquid crystal substrate along a conveying direction; a cleaning chamber for cleaning the liquid crystal substrate carried in by the carrying roller; the cleaning chamber is provided with: a cleaning liquid supply unit for supplying a cleaning liquid to the liquid crystal substrate; and a rotary brush having a rotary shaft extending in a direction along the liquid crystal substrate and orthogonal to the conveying direction and rotating while contacting the liquid crystal substrate, the rotary brush being movable by a moving mechanism between a cleaning position where the rotary brush contacts the liquid crystal substrate for cleaning and a standby position where the rotary brush does not contact the liquid crystal substrate 30 for cleaning, the rotary brush being capable of rotating while contacting the liquid crystal substrate and a discharge mechanism for discharging the cleaning liquid supplied to the cleaning auxiliary substrate being provided at the standby position.

Description

Substrate cleaning device
Technical Field
The technology disclosed in the present specification relates to a cleaning apparatus for substrates such as glass substrates, semiconductor wafers, and printed circuit boards for flat panel displays such as liquid crystal displays and plasma displays.
Background
For example, a transparent substrate used for a display panel of a display device, a substrate such as a silicon wafer for manufacturing a semiconductor, or the like is cleaned many times in the middle of the manufacturing process in order to remove foreign matters such as fine dust and shavings adhering to the surface. Specifically, the roller-shaped brush is brought into contact with and rotated relative to each substrate carried into the cleaning tank by the carrier, and the cleaning liquid is supplied while being moved relative to the substrate surface, thereby removing foreign matter such as fine dust and shavings adhering to the substrate surface. When one substrate is cleaned, the rotation speed of the brush is lower than that in cleaning until the next substrate is carried in, and a standby state is provided in which a small amount of cleaning liquid is supplied while slowly rotating.
In this way, the foreign matter removed from the substrate surface by the cleaning is mostly washed away with the cleaning liquid while the substrate is cleaned by the brush, but if the brush is in a standby state, part of the foreign matter may remain on the brush. Further, dust floating in the cleaning tank may adhere to the brush during standby. Further, the foreign matter may be dried and adhered to the brush. Thus, the foreign matter remaining or adhering to the brush may adhere to the substrate when the next substrate is cleaned, which may cause the display quality of the display substrate to be degraded.
Therefore, a substrate cleaning apparatus having a function of a brush during standby for cleaning has been proposed. For example, patent document 1 discloses a substrate cleaning apparatus with a brush cleaning function, in which compressed gas is injected into a brush on standby to blow off foreign matter attached to the brush, and the brush is then immersed in a cleaning liquid to clean the brush.
Documents of the prior art
Patent document
[ patent document 1]
Japanese unexamined patent publication No. 2002-307023
Disclosure of Invention
Problems to be solved by the invention
However, the substrate cleaning apparatus with a brush cleaning function has the following problems: the air knife for injecting compressed gas, the gas supply mechanism, the brush cleaning tank for soaking the brush, the filter for capturing and collecting foreign matters removed by the brush, and the like have complicated structures, and the cleaning apparatus itself is large in size and consumes manufacturing cost.
The technology disclosed in the present specification has been made in view of the above circumstances, and an object thereof is to provide a substrate cleaning apparatus in which foreign matter is less likely to remain or adhere to a brush during a cleaning standby, the structure is simple, and a substrate cleaning effect is excellent.
Means for solving the problems
(1) One embodiment of the technology disclosed in the present specification is a substrate cleaning apparatus for cleaning a plate-like substrate, including: a conveying mechanism for conveying the substrate along a conveying direction; a cleaning chamber configured to clean the substrate carried in by the carrying mechanism, the cleaning chamber including: a cleaning liquid supply unit for supplying a cleaning liquid to the substrate; and a rotary brush having a rotary shaft extending in a direction orthogonal to the conveying direction along a plate surface direction of the substrate and rotating while contacting the substrate, the rotary brush being movable by a moving mechanism between a cleaning position where the rotary brush contacts the substrate to be cleaned and a standby position where the rotary brush does not contact the substrate to be cleaned, the rotary brush being in standby, the rotary brush rotating while contacting the substrate to be cleaned, and a discharge mechanism discharging a cleaning liquid supplied to the cleaning auxiliary substrate.
According to the above configuration, the rotating brush in standby without cleaning the substrate is moved to the standby position and rotated while being in contact with the auxiliary cleaning substrate. In addition, at this time, a cleaning liquid is also supplied. That is, since the rotating brush in standby is in a state similar to or the same as the state in which the substrate is being cleaned, foreign substances such as fine dust and shavings remaining when the substrate is cleaned are washed away and removed together with the cleaning liquid.
In addition, dust and the like in the cleaning chamber are also difficult to adhere to the rotary brush.
Further, such a configuration can be made smaller and simpler than a conventional configuration in which compressed gas is injected into the rotary brush or the rotary brush is directly immersed in the cleaning liquid.
(2) In addition to the structure of the above (1), the substrate cleaning apparatus disclosed in the present specification may further include: a receiving unit which is disposed above the substrate transfer path, supports the auxiliary cleaning substrate from below, and receives the cleaning liquid; and a drainage path for discharging the cleaning liquid received by the receiving portion to the outside of the cleaning chamber.
(3) In addition, the substrate cleaning apparatus disclosed in the present specification may include, in addition to the structure of the above (1) or (2), the moving mechanism including a first moving mechanism that moves the rotating brush in a separating direction from the cleaning position to a separating position where the rotating brush does not contact the substrate; and a second moving mechanism that moves the rotating brush from the separating position to the standby position in a direction intersecting the separating direction.
(4) In addition to the structure of the above (1), (2), or (3), the substrate cleaning apparatus disclosed in the present specification may be configured such that the cleaning liquid supplied to the substrate and the cleaning liquid supplied to the cleaning auxiliary substrate are supplied from one cleaning liquid supply unit.
Effects of the invention
According to the technology disclosed in the present specification, a substrate cleaning apparatus can be obtained in which a brush in which foreign matter is less likely to remain or adhere during cleaning standby is provided, the structure is simple, and the substrate cleaning effect is excellent.
Brief description of the drawings
Fig. 1 is a schematic view of a substrate cleaning apparatus according to one embodiment, in which a substrate is disposed at a cleaning position.
Fig. 2 is a schematic view of a state in which the substrate is similarly disposed at the separation position.
Fig. 3 is a schematic view of a state in which the substrate is similarly disposed at the standby position.
Fig. 4 is a perspective view of the substrate cleaning apparatus.
Modes for carrying out the invention
One embodiment is described with reference to fig. 1 to 4. The substrate cleaning apparatus 10 of the present embodiment is used to clean a rectangular liquid crystal substrate 30 in a state where foreign matter such as fine dust and shavings adhere to the surface thereof.
In the following description, the X-axis direction in fig. 1 is defined as the transport direction (front-back direction) of the liquid crystal substrate 30, the Y-axis direction perpendicular to the paper surface is defined as the left-right direction (width direction of the liquid crystal substrate 30 to be transported), and the Z-axis direction is defined as the up-down direction. The left side of fig. 1 is set as the upstream side in the conveyance direction, and the right side of fig. 1 is set as the downstream side in the conveyance direction. In the substrate cleaning apparatus 10, the liquid crystal substrate 30 is carried into the upstream side in the carrying direction in a horizontal state in which the cleaning surface 30A faces upward, and is carried from the upstream side to the downstream side in the carrying direction so that the longitudinal direction thereof is along the X-axis direction and the short-side direction thereof is along the Y-axis direction.
The substrate cleaning apparatus 10 includes a conveying device having a plurality of conveying rollers 12, and the conveying rollers 12 convey the liquid crystal substrate 30 in a conveying direction (X-axis direction) by a conveying motor (not shown). The liquid crystal substrate 30 is intermittently supported by the conveying roller 12 on the plate surface (lower surface) opposite to the cleaning surface 30A, and is subjected to cleaning processing while being conveyed into the cleaning chamber 11 in the conveying direction.
A cleaning liquid supply portion 14 for ejecting the cleaning liquid 13 in a shower shape is provided above the inside of the cleaning chamber 11. The cleaning liquid supply unit 14 is provided in plural (two in the present embodiment) along the transport path of the liquid crystal substrate 30, and is arranged in a direction (Y-axis direction) orthogonal to the transport direction of the liquid crystal substrate 30. These cleaning liquid supply portions 14 supply the cleaning liquid 13 through a plurality of branch pipes 16 branched from a pipe 15 extending from a cleaning liquid storage tank, not shown. The pipe 15 extends along the outer surface of the ceiling wall 11A of the cleaning chamber 11 and in a direction (Y-axis direction) orthogonal to the transport direction of the liquid crystal substrate 30, and the branch pipes 16 branch forward from the pipe 15 and are connected to the cleaning liquid supply unit 14 to supply the cleaning liquid 13 into the cleaning chamber 11.
The rotary brush 17 is disposed between the cleaning liquid supply unit 14 and the conveyance path of the liquid crystal substrate 30. The rotary brush 17 is substantially cylindrical in shape, in which bristles are implanted around a rotary shaft extending in a direction (Y-axis direction) perpendicular to the conveying direction along the conveying path of the liquid crystal substrate 30. The rotating brush 17 is connected to a rotating motor, not shown, at both ends of the rotating shaft, and is rotated about the rotating shaft by driving the rotating motor. The rotary brush 17 is brought into contact with the surface (cleaning treatment surface 30A) of the liquid crystal substrate 30 carried into the cleaning chamber 11 while rotating in the same direction as the carrying direction of the liquid crystal substrate 30, and removes foreign substances such as fine dust and shavings adhering to the surface of the liquid crystal substrate 30 together with the cleaning liquid 13 supplied from the cleaning liquid supply unit 14.
The rotary brush 17 stays at a fixed position in the cleaning chamber 11 while being in contact with the liquid crystal substrate 30 (during cleaning). Hereinafter, the fixed position shown in fig. 1 where the rotary brush 17 stays during cleaning is referred to as a cleaning position.
The rotary brush 17 is connected to a moving mechanism not shown. When one liquid crystal substrate 30 is cleaned at the cleaning position, the rotating brush 17 of the present embodiment is moved from the conveying path of the liquid crystal substrate 30 to the separation position shown in fig. 2 where the substrate is separated by a fixed height by a first moving mechanism (not shown) that moves the rotating brush 17 in the vertical direction (Z-axis direction) in the moving mechanism while reducing the rotation speed. At the separated position, foreign matter adhering to the liquid crystal substrate 30 during cleaning may remain in the rotary brush 17.
Then, the rotary brush 17 is moved from the separation position shown in fig. 2 to a predetermined position (standby position) on the downstream side in the transport direction by a second movement mechanism (not shown) that moves the rotary brush 17 in the front-rear direction (X-axis direction) along the transport path of the liquid crystal substrate 30 by the movement mechanism (see fig. 3).
In addition, in the movement from the cleaning position to the separation position of the rotary brush 17 and from the separation position to the standby position, the same amount of the cleaning liquid 13 as that in the cleaning period may be supplied, or the supply amount may be reduced. In addition, the rotation speed of the rotary brush 17 may be changed to a low speed as described above or may be stopped in order to suppress scattering of the cleaning liquid 13 during the movement from the cleaning position to the separation position and from the separation position to the standby position.
In the standby position shown in fig. 3 to which the rotary brush 17 is moved by the second moving mechanism, the rotary brush 17 is set in contact with the cleaning auxiliary substrate 20 disposed immediately below. The cleaning auxiliary substrate 20 is formed in a flat plate shape having the same width as the liquid crystal substrate 30, and the rotary brush 17 is set to be almost in contact with the cleaning auxiliary substrate 20 in the width direction at the standby position.
The cleaning auxiliary substrate 20 is fixed to the receiving portion 21. The receiving portion 21 is arranged above the transfer path of the liquid crystal substrate 30 and on the downstream side of the cleaning position of the rotary brush 17, supports the cleaning auxiliary substrate 20 from below, and is formed in a rectangular shallow plate shape that receives the cleaning liquid 13 supplied from the cleaning liquid supply portion 14 to the cleaning auxiliary substrate 20.
Further, a discharge path for discharging the cleaning liquid 13 supplied to the cleaning auxiliary substrate 20 to the outside of the cleaning chamber 11 is provided on the downstream side of the receiving portion 21. The discharge path includes: an inclined portion 22 extending in a state of being inclined downward from one side edge portion on the downstream side in the bottom portion 21A of the receiving portion 21: and a discharge portion 23 extending from a side edge portion on the downstream side of the inclined portion 22 substantially along the transport path of the liquid crystal substrate 30, and having a slight inclination for guiding the cleaning liquid 13 flowing out from the receiving portion 21 side to a discharge pipe, not shown, for discharging to the outside without being suspended from the liquid crystal substrate 30 after the cleaning. In the inclined portion 22 and the discharge portion 23, a standing wall (not shown) is provided at a side edge portion thereof so that the cleaning liquid 13 does not flow into the transport path of the liquid crystal substrate 30. The cleaning liquid 13 supplied to the cleaning auxiliary substrate 20 is discharged from the cleaning chamber 11 to the outside by a discharge mechanism including a receiving portion 21, an inclined portion 22, and a discharge portion 23.
The receiving portion 21 is provided at a position that does not prevent the cleaning liquid 13 supplied from the cleaning liquid supply portion 14 from being sufficiently supplied to the liquid crystal substrate 30 where the rotary brush 17 disposed at the cleaning position is in contact with the rotary brush 17, and the rotary brush 17 and the cleaning auxiliary substrate 20 disposed at the standby position.
The rotary brush 17 is rotated at a high speed at a standby position in contact with the cleaning auxiliary substrate 20, as in the case of being disposed at a cleaning position of the liquid crystal substrate 30. The cleaning liquid 13 is supplied in the same manner as during cleaning of the liquid crystal substrate 30. That is, the rotary brush 17 is set to a state of pseudo-cleaning the cleaning auxiliary substrate 20. This prevents foreign matter such as dust and shavings remaining in the rotary brush 17 from being washed away together with the cleaning liquid 13 and dust floating in the cleaning chamber 11 from adhering to the rotary brush 17.
The rotary brush 17 is moved by the second moving mechanism from the standby position to the separated position, and further moved by the first moving mechanism from the separated position to the cleaning position, in accordance with the time when a new liquid crystal substrate 30 is carried into the cleaning chamber 11. In this movement, the same amount of the cleaning liquid 13 as in the cleaning period may be supplied, or the supply amount may be reduced. The rotation speed of the rotary brush 17 may be low or may be stopped. This suppresses scattering of the cleaning liquid 13.
The substrate cleaning apparatus 10 of the present embodiment has the above configuration, and the operation and effect will be described below.
The substrate cleaning apparatus 10 of the present embodiment includes: a conveying roller 12 for conveying the liquid crystal substrate 30 in a conveying direction; a cleaning chamber 11 for cleaning the liquid crystal substrate 30 carried in by the carrying roller 12, wherein the cleaning chamber 11 is provided with: a cleaning liquid supply unit 14 for supplying a cleaning liquid 13 to the liquid crystal substrate 30; and a rotary brush 17 having a rotary shaft extending in the plate surface direction of the liquid crystal substrate 30 and in the direction orthogonal to the conveying direction, the rotary brush 17 being capable of rotating while contacting the liquid crystal substrate 30, the rotary brush 17 being movable by a moving mechanism between a cleaning position where the rotary brush is in contact with the liquid crystal substrate 30 to clean the liquid crystal substrate and a standby position where the rotary brush is not in contact with the liquid crystal substrate 30 to not clean the liquid crystal substrate, the standby position being provided with a cleaning auxiliary substrate 20 where the rotary brush 17 is in contact with the liquid crystal substrate while rotating, and a discharge mechanism for discharging the cleaning liquid 13 supplied to the cleaning auxiliary substrate 20.
According to the above configuration, the rotary brush 17 is moved to the standby position when not being cleaned without contacting the liquid crystal substrate 30, and contacts the cleaning auxiliary substrate 20 while rotating. In this case, the cleaning liquid 13 is supplied in the same manner as during cleaning of the liquid crystal substrate 30. That is, since the rotating brush 17 during standby is in a state similar to or the same as the state in which the liquid crystal substrate 30 is being cleaned, foreign substances such as fine dust and shavings remaining when the liquid crystal substrate 30 is cleaned are washed away together with the cleaning liquid 13 and discharged by the discharge mechanism. Further, dust and the like in the cleaning chamber 11 are less likely to adhere to the rotary brush 17, and the rotary brush 17 can be kept clean.
Further, such a configuration can be made smaller and simpler than a conventional configuration in which compressed gas is injected into the rotary brush or the rotary brush is directly immersed in the cleaning liquid.
The liquid crystal substrate 30 is transported in a vertical direction on a plate surface, and the discharge mechanism includes: a receiving unit 21 that is disposed above the transfer path of the liquid crystal substrate 30, supports the cleaning auxiliary substrate 20 from below, and receives the cleaning liquid 13; and a drainage path (the inclined portion 22, the discharge portion 23, and the like) for discharging the cleaning liquid 13 received by the receiving portion 21 to the outside of the cleaning chamber 11.
With such a configuration, the entire substrate cleaning apparatus 10 can be made compact, compared to a configuration in which, for example, the discharge mechanism is provided in parallel beside the conveyance path of the liquid crystal substrate 30.
In addition, the moving mechanism may include: a first moving mechanism that moves the rotary brush 17 from the cleaning position to a separation position where the rotary brush does not contact the liquid crystal substrate 30 in the up-down direction (an example of the separation direction); and a second moving mechanism that moves the rotary brush 17 from the separated position to the standby position in the front-rear direction (direction intersecting the separation direction).
With this configuration, the liquid crystal substrate 30 can be smoothly moved from the cleaning position to the standby position via the separation position.
Further, the cleaning liquid 13 supplied to the liquid crystal substrate 30 and the cleaning liquid 13 supplied to the auxiliary cleaning substrate 20 may be supplied from one cleaning liquid supply unit 14. With such a configuration, the entire configuration of the substrate cleaning apparatus 10 can be simplified as compared with the case where the cleaning liquid supply units 14 for the liquid crystal substrate 30 and the auxiliary substrate 20 are separately provided.
As described above, according to the present embodiment, foreign matter is less likely to remain or adhere to the rotating brush 17 during standby, and the substrate cleaning apparatus 10 having a simple structure and an excellent cleaning effect for the liquid crystal substrate 30 can be obtained.
< other embodiments >
The technology disclosed in the present specification is not limited to the embodiments described above and illustrated in the drawings, and for example, the following embodiments are also included in the technical scope.
(1) The method of transporting the liquid crystal substrate 30 is not limited to the method of transporting the plate surface in the horizontal direction, and may be, for example, a vertical direction or an inclined transportation method.
(2) The standby position of the liquid crystal substrate 30 may be, for example, beside the transfer path, instead of being above the transfer path.
(3) In the above embodiment, the rotary brush 17 is configured to stay at a fixed position in the cleaning chamber 11 when contacting the liquid crystal substrate 30, but the rotary brush 17 may move within a specific range when contacting the liquid crystal substrate 30. In this case, the cleaning position is not one position, but is configured to have a specific range.
(4) In the above embodiment, the rotation shaft of the rotary brush 17 is configured to extend along the transport path of the liquid crystal substrate 30 and in the direction (Y-axis direction) orthogonal to the transport direction, but may be configured to intersect obliquely even if not orthogonal to the transport direction.
(5) The discharge direction of the discharge path may not be the downstream side, and for example, the side surface in the conveyance direction may be appropriately changed.
(6) In the above embodiment, the cleaning liquid supply unit 14 is configured to supply the cleaning liquid 13 to both the liquid crystal substrate 30 and the cleaning auxiliary substrate 20, that is, the cleaning liquid supply unit 14 is configured to supply the cleaning liquid 13 to both the liquid crystal substrate 30 and the cleaning auxiliary substrate 20 during conveyance, but the cleaning liquid supply unit 14 may be provided separately as a cleaning liquid supply unit for the liquid crystal substrate 30 and a cleaning liquid supply unit for cleaning the auxiliary substrate 20. Alternatively, the same cleaning liquid supply unit 14 may be switched to supply both the cleaning position and the standby position.
(7) The form of the cleaning liquid supply unit 14 is not limited to the above embodiment, and may be a nozzle or a tubular shower, for example.
(8) In the above embodiment, the rotating brush 17 is moved to the standby position in the gap between the cleaning of the one liquid crystal substrate 30 and the cleaning of the next liquid crystal substrate 30, but the time for moving the rotating brush to the standby position is not limited to the gap between the cleaning of the one liquid crystal substrate 30 and the cleaning of the next liquid crystal substrate 30.
Description of the figures
10: substrate cleaning apparatus, 11: cleaning chamber, 12: conveying roller (conveying mechanism), 13: cleaning solution, 14: cleaning liquid supply portion, 17: rotating brush, 20: cleaning auxiliary substrate, 21: receiving unit (discharge mechanism), 22: inclined portion (drainage path, discharge mechanism), 23: discharge unit (drainage path, discharge mechanism), 30: a liquid crystal substrate (substrate).

Claims (4)

1. A substrate cleaning apparatus for cleaning a plate-like substrate, comprising:
a conveying mechanism for conveying the substrate in a conveying direction;
a cleaning chamber for cleaning the substrate carried in by the carrying mechanism,
the cleaning chamber is provided with: a cleaning liquid supply unit for supplying a cleaning liquid to the substrate; a rotary brush having a rotary shaft extending in a direction orthogonal to the conveying direction along the plate surface direction of the substrate and rotating while contacting the substrate,
the rotary brush is movable by a moving mechanism between a cleaning position where cleaning is performed by contacting the substrate and a standby position where cleaning is not performed by not contacting the substrate,
the standby position is provided with a cleaning auxiliary substrate that the rotating brush in standby rotates and contacts, and a discharge mechanism that discharges the cleaning liquid supplied to the cleaning auxiliary substrate.
2. The substrate cleaning apparatus according to claim 1,
the substrate plate surface is conveyed in the vertical direction,
the discharge mechanism includes: a receiving unit which is arranged above the substrate conveying path, supports the auxiliary cleaning substrate from below, and receives the cleaning liquid; and a drainage path that discharges the cleaning liquid received by the receiving portion to the outside of the cleaning chamber.
3. The substrate cleaning apparatus according to claim 1 or 2,
the moving mechanism includes a first moving mechanism that moves the rotating brush in a separating direction from a cleaning position to a separating position where the rotating brush is not in contact with the substrate; and a second moving mechanism that moves the rotating brush from the separating position to the standby position in a direction intersecting with a separating direction.
4. The substrate cleaning apparatus according to claim 1 or 2, wherein the cleaning liquid supplied to the substrate and the cleaning liquid supplied to the cleaning auxiliary substrate are supplied from one cleaning liquid supply portion.
CN201910499457.4A 2018-06-13 2019-06-11 Substrate cleaning device Pending CN110586527A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201862684591P 2018-06-13 2018-06-13
US62/684591 2018-06-13

Publications (1)

Publication Number Publication Date
CN110586527A true CN110586527A (en) 2019-12-20

Family

ID=68852590

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201910499457.4A Pending CN110586527A (en) 2018-06-13 2019-06-11 Substrate cleaning device

Country Status (1)

Country Link
CN (1) CN110586527A (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10223583A (en) * 1997-02-06 1998-08-21 Yuasa Seisakusho:Kk Brush scrubber
JPH10323631A (en) * 1997-05-23 1998-12-08 Ebara Corp Device for self-cleaning cleaning member
JP2001054765A (en) * 1999-08-19 2001-02-27 Dainippon Screen Mfg Co Ltd Substrate cleaning device
CN202217649U (en) * 2011-09-09 2012-05-09 科技视野有限公司 Cleansing device for substrate
CN105097615A (en) * 2014-05-20 2015-11-25 株式会社荏原制作所 Substrate cleaning apparatus and method executed in the same

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10223583A (en) * 1997-02-06 1998-08-21 Yuasa Seisakusho:Kk Brush scrubber
JPH10323631A (en) * 1997-05-23 1998-12-08 Ebara Corp Device for self-cleaning cleaning member
JP2001054765A (en) * 1999-08-19 2001-02-27 Dainippon Screen Mfg Co Ltd Substrate cleaning device
CN202217649U (en) * 2011-09-09 2012-05-09 科技视野有限公司 Cleansing device for substrate
CN105097615A (en) * 2014-05-20 2015-11-25 株式会社荏原制作所 Substrate cleaning apparatus and method executed in the same

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