CN110531531B - Method for assembling and adjusting primary and secondary reflectors of Cassegrain optical system - Google Patents
Method for assembling and adjusting primary and secondary reflectors of Cassegrain optical system Download PDFInfo
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- CN110531531B CN110531531B CN201910923731.6A CN201910923731A CN110531531B CN 110531531 B CN110531531 B CN 110531531B CN 201910923731 A CN201910923731 A CN 201910923731A CN 110531531 B CN110531531 B CN 110531531B
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/62—Optical apparatus specially adapted for adjusting optical elements during the assembly of optical systems
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
- G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
- G02B7/1822—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors comprising means for aligning the optical axis
Abstract
A method for adjusting a primary reflector and a secondary reflector of a Cassegrain optical system belongs to the optical adjusting technology, and particularly relates to a method for adjusting the primary reflector and the secondary reflector of the Cassegrain optical system. The method comprises the steps of adjusting the main reflector, adjusting the secondary reflector and adjusting the interval between the main reflector and the secondary reflector. According to the technology, on one hand, the secondary reflector is designed with a process spherical surface, and centering adjustment of the secondary reflector is converted into centering adjustment of the lens, so that the limitation of the working principle of a central deviation measuring instrument is avoided, and the technology is suitable for high-precision adjustment of the aspheric reflector. And on the other hand, the interval between the primary reflector and the secondary reflector is accurately measured by using the non-contact measuring function of the central deviation measuring instrument. The optical system is generally suitable for optical systems of various wave bands such as visible light, infrared and the like, and has high installation and adjustment efficiency.
Description
Technical Field
The invention belongs to an optical adjusting technology, and particularly relates to an adjusting method of a primary mirror and a secondary mirror of a Cassegrain optical system.
Background
The Cassegrain optical system has the advantages of large caliber, long focal length, wide spectrum range, easy light weight, strong temperature adaptability and the like, and is widely applied to the fields of aerospace, military and the like. The Cassegrain optical system comprises two reflectors, wherein a primary reflector is a concave aspheric surface, a secondary reflector is a convex aspheric surface, two reflector axial centers are arranged on an optical axis, and the center of the mirror surface of the primary reflector is provided with a hole for light to pass through. The quality of the adjustment of the primary mirror and the secondary mirror of the Cassegrain optical system can greatly influence the imaging quality of the whole system. Therefore, the primary and secondary mirror adjustment technology of the cassegrain optical system is one of the research hotspots in the optical field.
At present, the debugging of the Cassegrain system at home and abroad is mainly realized by the following method: a collimator alignment method, a centering turning alignment method, a method for performing centering alignment by using a three-coordinate measuring instrument, a computer-aided alignment method, an interferometer alignment method, a centering alignment method for a decentration measuring instrument, and the like. The central deviation measuring instrument is a common assembling and adjusting device due to high measuring precision and high assembling and adjusting efficiency, but the central deviation measuring instrument can only measure the spherical center deviation corresponding to the spherical surface but cannot measure the optical axis deviation of the aspherical surface, so that the assembling and adjusting precision is limited under the condition of error accumulation of optical parts and structural parts, and the assembling and adjusting precision requirement of a high-precision Cassegrain system is often difficult to meet.
Disclosure of Invention
The invention aims to overcome the limitation that a central deviation measuring instrument can only measure a spherical surface, and provides a high-precision assembling and adjusting method for a primary reflector and a secondary reflector of a Cassegrain optical system.
The invention relates to a method for assembling and adjusting primary and secondary reflectors of a Cassegrain optical system, which comprises the steps of assembling and adjusting the primary reflectors, assembling and adjusting the secondary reflectors, and assembling and adjusting the primary reflectors and the secondary reflectors at intervals, and is characterized in that a process spherical surface is required to be designed on the secondary reflectors; wherein the content of the first and second substances,
the assembly and adjustment of the primary mirror includes the steps of:
s1: leveling the main reflector, placing a parallel flat crystal right above the main reflector, and enabling the parallel flat crystal to be vertical to a rotating reference shaft of a workbench by adjusting the inclination of the workbench;
s2: centering the main reflector, removing the parallel flat crystal, selecting a proper additional objective lens, measuring the deviation of the curvature center of the surface of the main reflector relative to a rotating reference axis, and controlling the deviation of the curvature center to be within the requirement of adjustment precision by adjusting the translation of a worktable;
the interval adjustment of the primary and secondary reflectors comprises the following steps:
s1: the secondary reflector is placed on the corresponding mounting surface in the middle through a support frame;
s2: connecting a measuring tool with an upper light path measuring head, adjusting the height of the measuring tool to stop at a position 50mm above the process spherical surface, displaying a reflected image on the process spherical surface, adjusting focus to make the image clear and thinnest, and marking the height of the measuring tool as h, wherein h = 0;
s3: removing the secondary reflector and the support frame, placing a parallel flat crystal right above the main reflector, reducing the height of the measuring tool to stop at a position 50mm above the parallel flat crystal, displaying a parallel flat crystal reflection image, adjusting to make the image clear and thinnest, wherein the height of the tool is H, the interval from the lower surface of the secondary reflector to the edge of the main reflector is H + D-E, D is the thickness of the parallel flat crystal, and E is the central thickness of the secondary reflector;
s4: checking whether the interval meets the requirement, if so, adjusting the interval to be qualified, and if not, adjusting the interval by a gasket between the support frame and the main reflector to meet the requirement;
the secondary reflector adjustment comprises the following steps:
s1: setting two measuring heads, selecting proper additional objective lenses, and measuring the curvature centers O of the upper and lower surfaces of the secondary reflector1And O2The amount of deviation from the reference axis of rotation;
s2: adjusting the position of the secondary reflector until the curvature centers O corresponding to the upper and lower surfaces of the secondary reflector1And O2The deviation of the relative rotation reference axis meets the requirement of the installation and adjustment precision;
s3: and filling the gap between the secondary reflector and the support frame with glue to fix the reflector.
The technical spherical surface and the secondary reflector are integrally processed, the technical spherical surface is designed for assembly and adjustment, and the technical spherical surface does not participate in imaging of the optical system. The primary and secondary reflectors are generally made of opaque aluminum alloy.
The additional objective lens is an accessory on the central deviation measuring instrument, and the additional objective lens with proper focal length is used for helping the central deviation measuring instrument to find a reflection image of the curvature center of the measured curved surface so as to measure the deviation amount of the curvature center relative to the rotating reference axis.
The position of the secondary reflector is adjusted by finely adjusting the inclination and translation of the secondary reflector, the inclination state can be realized by filling ultrathin adhesive tape paper on the dragging plane of the secondary reflector, and the translation state can be realized by horizontally moving the secondary reflector.
According to the technology, on one hand, the secondary reflector is designed with a process spherical surface, and centering adjustment of the secondary reflector is converted into centering adjustment of the lens, so that the limitation of the working principle of a central deviation measuring instrument is avoided, and the technology is suitable for high-precision adjustment of the aspheric reflector. And on the other hand, the interval between the primary reflector and the secondary reflector is accurately measured by using the non-contact measuring function of the central deviation measuring instrument. The optical system is generally suitable for optical systems of various wave bands such as visible light, infrared and the like, and has high installation and adjustment efficiency.
Drawings
FIG. 1 is a schematic view of a secondary radial surface configuration.
FIG. 2 is a schematic view of a sub-mirror structure with an added process sphere.
FIG. 3 is a schematic view of the primary mirror being leveled.
FIG. 4 is a schematic view of the centering of the primary mirror.
FIG. 5 is a schematic view of a height measurement of the upper surface of the secondary mirror.
FIG. 6 is a schematic view of a parallel plate top surface height measurement.
Fig. 7 is a schematic view of the secondary mirror adjustment.
FIG. 8 is an enlarged view of the secondary mirror and the support frame in the secondary mirror adjustment diagram.
The device comprises a secondary reflector 1, a technical spherical surface 2, a measuring head 3, an additional objective 4, a parallel flat crystal 5, a main reflector 6, a support frame 7, a rotating reference shaft 8, a measuring tool 9, a workbench 10 and glue 11.
Detailed Description
Example 1: the method for assembling and adjusting the primary reflector and the secondary reflector of the Segren optical system specifically comprises assembling and adjusting the primary reflector, assembling and adjusting the secondary reflector and assembling and adjusting the primary reflector and the secondary reflector at intervals.
Firstly, a process spherical surface is required to be designed on the secondary reflector, the process spherical surface and the secondary reflector are integrally processed, the process spherical surface is designed to meet the requirement of using a central deviation measuring instrument, and the process spherical surface does not participate in imaging of an optical system. The primary and secondary reflectors are made of lightproof aluminum alloy, the process sphere is made of aluminum alloy, and polishing treatment is carried out after the processing.
Secondly, the main reflector is assembled and adjusted, and the method comprises the following specific steps:
s1: starting the visible light double-light-path center deviation measuring instrument, and fixing the main reflector on the workbench 10;
s2: leveling the main reflector, placing a parallel flat crystal 5 right above the main reflector 6, and enabling the parallel flat crystal 5 to be vertical to a rotating reference shaft 8 of a workbench 10 by adjusting the inclination of the workbench 10;
s3: centering the main reflector, removing the parallel flat crystal 5, selecting a proper additional objective 4, measuring the deviation of the curvature center of the surface of the main reflector relative to a rotating reference shaft 8, and controlling the deviation of the curvature center to be within the adjustment precision requirement by adjusting the translation of a workbench 10.
Thirdly, the primary and secondary reflectors are adjusted at intervals, and the method specifically comprises the following steps:
s1: mounting a support frame 7;
s2: the secondary reflector 1 is placed on the corresponding mounting surface through a support frame 7 in the center;
s3: connecting the measuring tool 9 with the upper light path measuring head 3, adjusting the height of the measuring tool 9 through control software carried by a central deviation measuring instrument to enable the measuring tool to stop at a position 50mm above the secondary reflector, displaying a reflected image on a process spherical surface through a display screen in a software interface at the moment, adjusting focusing to enable the image to be clear and thinnest, marking the height of the measuring tool at the moment as h, and enabling h = 0;
s4: removing the secondary reflector and the support frame, placing a parallel flat crystal 5 right above the primary reflector 6, reducing the height of the measuring tool 9 to stop at a position 50mm above the parallel flat crystal 5, displaying a reflected image of the parallel flat crystal 5 by a display screen in a software interface at the moment, adjusting to make the image clear and thinnest, wherein the height of the tool is H, the interval from the lower surface of the secondary reflector to the edge of the primary reflector is H + D-E, D is the thickness of the parallel flat crystal, and E is the central thickness of the secondary reflector;
s5: and checking whether the interval meets the requirement, if so, adjusting the interval to be qualified, and if not, adjusting the interval by a gasket between the support frame 7 and the main reflector 6 to meet the requirement.
Fourthly, the secondary reflector is adjusted, and the method specifically comprises the following steps:
s1: an upper measuring head and a lower measuring head 3 are arranged, additional objective lenses 4 with proper focal lengths are respectively selected, and curvature centers O corresponding to the upper surface and the lower surface of the secondary reflector 1 are respectively measured1And O2The amount of deviation from the rotation reference axis 8;
s2: the position of the secondary reflector 1 is adjusted until the curvature centers O corresponding to the upper and lower surfaces of the secondary reflector 11And O2The deviation of the relative rotation reference shaft 8 meets the installation and adjustment requirements;
s3: the gap between the sub-mirror 1 and the support 7 is filled with a glue 11, and the sub-mirror 1 is fixed.
Through the steps, the primary and secondary reflectors of the Cassegrain optical system are adjusted.
Different optical systems have different requirements on the interval between the primary reflector and the secondary reflector and the adjustment precision, so that the method of the embodiment of the invention can be adopted for adjustment according to the requirements of designers to realize high-efficiency adjustment.
Claims (2)
1. The method for assembling and adjusting the primary and secondary reflectors of the Cassegrain optical system comprises the steps of assembling and adjusting the primary reflectors, assembling and adjusting the secondary reflectors and assembling and adjusting the primary reflectors and the secondary reflectors at intervals, and is characterized in that a process spherical surface is required to be designed on the secondary reflectors; wherein the content of the first and second substances,
the assembly and adjustment of the primary mirror includes the steps of:
s1: leveling the main reflector, placing a parallel flat crystal right above the main reflector, and enabling the parallel flat crystal to be vertical to a rotating reference shaft of a workbench by adjusting the inclination of the workbench;
s2: centering the main reflector, removing the parallel flat crystal, selecting a proper additional objective lens, measuring the deviation of the curvature center of the surface of the main reflector relative to a rotating reference axis, and controlling the deviation of the curvature center to be within the requirement of adjustment precision by adjusting the translation of a worktable;
the interval adjustment of the primary and secondary reflectors comprises the following steps:
s1: the secondary reflector is placed on the corresponding mounting surface in the middle through a support frame;
s2: connecting a measuring tool with an upper light path measuring head, adjusting the height of the measuring tool to stop at a position 50mm above the process spherical surface, displaying a reflected image on the process spherical surface, adjusting focus to make the image clear and thinnest, and marking the height of the measuring tool as h, wherein h = 0;
s3: removing the secondary reflector and the support frame, placing a parallel flat crystal right above the main reflector, reducing the height of the measuring tool to stop at a position 50mm above the parallel flat crystal, displaying a parallel flat crystal reflection image, adjusting to make the image clear and thinnest, wherein the height of the tool is H, the interval from the lower surface of the secondary reflector to the edge of the main reflector is H + D-E, D is the thickness of the parallel flat crystal, and E is the central thickness of the secondary reflector;
s4: checking whether the interval meets the requirement, if so, adjusting the interval to be qualified, and if not, adjusting the interval by a gasket between the support frame and the main reflector to meet the requirement;
the secondary reflector adjustment comprises the following steps:
s1: setting up two measuring heads, respectively selecting additional objective lenses with proper focal length, and respectively measuring the correspondence of upper and lower surfaces of secondary reflectorCenter of curvature O of1And O2The amount of deviation from the reference axis of rotation;
s2: adjusting the position of the secondary reflector until the curvature centers O corresponding to the upper and lower surfaces of the secondary reflector1And O2The deviation of the relative rotation reference axis meets the requirement of the installation and adjustment precision;
s3: and filling the gap between the secondary reflector and the support frame with glue to fix the reflector.
2. The method of claim 1, wherein the process sphere and the secondary mirror are integrally formed.
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| CN115166970A (en) * | 2022-07-27 | 2022-10-11 | 茂莱（南京）仪器有限公司 | Method for precisely adjusting wavefront of high-reflection system by using interferometer |
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