CN110491846A - A kind of chip using low-grade fever generator - Google Patents

A kind of chip using low-grade fever generator Download PDF

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Publication number
CN110491846A
CN110491846A CN201910638453.XA CN201910638453A CN110491846A CN 110491846 A CN110491846 A CN 110491846A CN 201910638453 A CN201910638453 A CN 201910638453A CN 110491846 A CN110491846 A CN 110491846A
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China
Prior art keywords
chip
type semiconductor
semiconductor film
conductive metal
film
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CN201910638453.XA
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Chinese (zh)
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CN110491846B (en
Inventor
周世武
黄琳
王柱
郭新宇
高聪
李笑
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Guangdong Evan Low Carbon Technology Co Ltd
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Guangdong Evan Low Carbon Technology Co Ltd
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Priority to CN201910638453.XA priority Critical patent/CN110491846B/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/36Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
    • H01L23/373Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
    • H01L23/3738Semiconductor materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/38Cooling arrangements using the Peltier effect
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N10/00Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
    • H10N10/10Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects operating with only the Peltier or Seebeck effects
    • H10N10/17Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects operating with only the Peltier or Seebeck effects characterised by the structure or configuration of the cell or thermocouple forming the device

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)

Abstract

The present invention relates to a kind of chips using low-grade fever point generator, including operation chip, N-type semiconductor film, P-type semiconductor film, nano-sized carbon heat dissipation film, conductive metal paillon, operation chip at least three, by being electrically connected to each other to a conductive metal paillon between the N-type semiconductor film and a P-type semiconductor film for setting at least one N-type semiconductor film and at least one P-type semiconductor film between adjacent two layers operation chip respectively, and being in the same plane;Nano-sized carbon heat dissipation is respectively coated by the upper surface for being located at the operation chip of the top in each operation chip and the operation chip lower end surface positioned at bottom.One aspect of the present invention can effectively realize whole lowering ability when chip operation, and help to improve temperature reduction performance when chip operation, on the other hand convenient for carrying out accurate convenient monitoring to chip running temperature, while Integrated Energy recovery utilization rate when chip operation is also improved.

Description

A kind of chip using low-grade fever generator
Technical field
The present invention relates to a kind of flue gas inspection devices, more particularly to a kind of chip using low-grade fever generator.
Background technique
Now with the diminution of circuit system and chip structure size, the especially development of 3D IC technology, cause current Chip structure is smaller and smaller, chip power density is increasing, although being effectively simplified circuit structure, also chip is caused to run When calorific value it is relatively high, to easily cause circuit arrangement to break down because of high temperature, seriously affected electrical equipment fortune Capable stability and reliability is currently mostly to be increased by reducing chip operational efficiency for chip exterior for this problem The cooling systems such as cooling fan, water cooling heat exchanger, air cooling heat exchanger, although can meet to a certain extent to chip cooling The needs of cooling, but chip circuit operational efficiency on the one hand has been seriously affected, on the other hand result in current chip circuit needs It is equipped with complicated cooling system, leading to circuit arrangement, structure is complicated, for this problem, although also developing in chip knot Reach the chip structure of cooling purpose by increasing thermo-electric generation mechanism in structure, as application No. is " 2016205099272 " The patent of " using the 3D chip of low-grade fever electric generator " reaches although can realize that chip itself directly converts heat into electric energy The purpose of chip running temperature is reduced, but the thermo-electric generation system structure used in the patent is opposite with chip array structure multiple It is miscellaneous, and heat exchanger effectiveness is relatively poor, while the electric energy that thermo-electric generation obtains when running to chip lacks effective management, therefore Larger inconvenience is caused to actual use.
Therefore it is directed to this status, there is an urgent need to develop a kind of completely new chip structures, to meet the needs of actual use.
Summary of the invention
In view of the shortcomings of the prior art, the present invention provides a kind of chip using low-grade fever generator, the invention compared with On the one hand traditional chipset can effectively realize whole lowering ability when chip operation, and help to improve chip fortune Temperature reduction performance when row, prevented while improving chip overall operation performance high temperature high temperature thermal conductivity cause failure of chip situations such as hair It is raw, the convenience of chip operation supervision operation is effectively raised, on the other hand convenient for accurate just to the progress of chip running temperature Victory monitoring, while also improving Integrated Energy recovery utilization rate when chip operation.
To achieve the goals above, the present invention is to realize by the following technical solutions:
A kind of chip using low-grade fever point generator, including operation chip, N-type semiconductor film, P-type semiconductor film, Nano-sized carbon heat dissipation film, conductive metal paillon and encapsulating shell, wherein operation chip at least three, and each operation chip chamber is coaxially distributed And it is uniformly distributed from top to bottom, at least one N-type semiconductor film and at least one p-type half are set between adjacent two layers operation chip respectively Conductor thin film, N-type semiconductor film, P-type semiconductor film respectively with two adjacent operation chip upper surfaces and lower end surface phase It supports, and is spaced apart from each other distribution between N-type semiconductor film, P type semiconductive thin film, and be in the same plane a N-type is partly led By being electrically connected to each other to a conductive metal paillon between body thin film and a P-type semiconductor film, and constitute a temperature Poor generating set passes through the mutual mixed connection of conductive metal paillon between thermo-electric generation group;It nano-sized carbon heat dissipation film totally two, is respectively coated by each It is located at the upper surface of the operation chip of the top and the operation chip lower end surface positioned at bottom, the encapsulating shell in operation chip For airtight cavity structure, be respectively coated by each operation chip, N-type semiconductor film, P-type semiconductor film, nano-sized carbon heat dissipation film, Outside conductive metal paillon.
Further, the encapsulating shell outer surface is evenly distributed with several pins, the operation chip respectively with several pin phases It is mutually electrically connected, at least one pin is electrically connected to each other by conductive metal paillon and each thermo-electric generation group in the pin.
Further, in the thermo-electric generation group, pass through conductive gold between each thermo-electric generation group being in the same plane Belong to paillon to be serially connected, and constitute a working group, passes through conductive metal paillon phase between each working group in Different Plane It is mutually in parallel, and be electrically connected by conductive metal paillon and pin.
Further, contact surface area is between the operation chip and N-type semiconductor film, P-type semiconductor film 50%-the 80% of operation chip and N-type semiconductor film, P-type semiconductor film contact surface area.
On the one hand the present invention can effectively realize whole lowering ability when chip operation compared with traditional chipset is passed, and Temperature reduction performance when chip operation is helped to improve, prevents high temperature high temperature thermal conductivity from causing while improving chip overall operation performance Situations such as failure of chip, occurs, and effectively raises the convenience of chip operation supervision operation, on the other hand convenient for transporting to chip Trip temperature carries out accurate convenient monitoring, while also improving Integrated Energy recovery utilization rate when chip operation.
Detailed description of the invention
The following describes the present invention in detail with reference to the accompanying drawings and specific embodiments.
Fig. 1 is schematic structural view of the invention.
Specific embodiment
To be easy to understand the technical means, the creative features, the aims and the efficiencies achieved by the present invention, below with reference to Specific embodiment, the present invention is further explained.
A kind of chip using low-grade fever point generator as described in Figure 1, including operation chip 1, N-type semiconductor film 2, P Type semiconductive thin film 3, nano-sized carbon heat dissipation film 4, conductive metal paillon 5 and encapsulating shell 6, wherein operation chip 1 at least three, and it is each It is coaxially distributed between operation chip 1 and uniformly distributed from top to bottom, sets at least one N-type respectively between adjacent two layers operation chip 1 and partly lead Body thin film 2 and at least one P-type semiconductor film 3, N-type semiconductor film 2, P-type semiconductor film 3 are respectively with adjacent two A 1 upper surface of operation chip and lower end surface offset, and distribution is spaced apart from each other between N-type semiconductor film 2, P-type semiconductor film 3, And by a conductive gold between the N-type semiconductor film 2 and a P-type semiconductor film 3 being in the same plane Belong to paillon 5 to be electrically connected to each other, and constitutes a thermo-electric generation group, it is mutually mixed by conductive metal paillon 1 between thermo-electric generation group Connection;Nano-sized carbon heat dissipation film 4 totally two, it is respectively coated by the upper surface for being located at the operation chip 1 of the top in each operation chip 1 With 1 lower end surface of operation chip for being located at bottom, encapsulating shell 6 is airtight cavity structure, is respectively coated by each operation chip 1, N-type Semiconductive thin film 2, P-type semiconductor film 3, nano-sized carbon heat dissipation film 4, outside conductive metal paillon 5.
Wherein, 6 outer surface of encapsulating shell is evenly distributed with several pins 7, the operation chip 1 respectively with several 7 phases of pin It is mutually electrically connected, at least one pin 7 is mutually electrically connected by conductive metal paillon 5 with each thermo-electric generation group in the pin 7 It connects.
In addition, passing through conductive metal foil between each thermo-electric generation group being in the same plane in the thermo-electric generation group Piece 5 is serially connected, and constitutes a working group, mutual by conductive metal paillon 5 between each working group in Different Plane Parallel connection, and be electrically connected by conductive metal paillon 5 and pin 7.
Meanwhile contact surface area is to make between the operation chip and N-type semiconductor film 2, P-type semiconductor film 3 50%-the 80% of industry chip and N-type semiconductor film 2,3 contact surface area of P-type semiconductor film.
It needs to illustrate, the conductive metal paillon 5 is respectively positioned on outside 1 side surface of operation chip, and is embedded in encapsulating shell 6 Inner surface.
The present invention in specific implementation, partly lead by operation chip of the invention to composition first, N-type semiconductor film, p-type Body thin film, nano-sized carbon heat dissipation film, conductive metal paillon and encapsulating shell are assembled, and the present invention after assembling is then passed through encapsulation The pin of shell is connect with the circuit system of the external circuit board and circuit board, assembly thereby completing the present invention.
In when by pin with being connect with the circuit system of the external circuit board and circuit board, draw with what operation chip was connect Foot is directly electrically connected between the operation circuit system of the circuit system of circuit board, thin with N-type semiconductor film, P-type semiconductor Film constitute thermo-electric generation group connection pin and circuit system power circuit and in temperature monitoring circuit any one or Two kinds are electrically connected simultaneously.
When the present invention is run, each operation chip can generate a large amount of waste heat at runtime, and the heat a part generated is logical The nano-sized carbon heat dissipation film crossed positioned at end positions operation chip outer surface carries out radiating and cooling, and another part is in being gathered in and being located at Between position each operation chip position at, and then temperature is higher closer to center, so as to cause operation core each in the present invention There are the biggish temperature difference when piece is run, the N-type semiconductor film, p-type under temperature difference condition, positioned at two neighboring operation chip chamber DC current, and the electricity by the way that electric current to be transported to circuit system in conductive metal paillon by pin are generated between semiconductive thin film In source circuit and temperature monitoring circuit, on the one hand achieve the purpose that cool down to chip by converting heat into electric energy, separately On the one hand the accurate temperature of current chip operation can be directly obtained by the size produced electricl energy, convenient for being protected to chip, It prevents from leading to failure of chip because temperature is excessively high, furthermore the electric energy that chip generates can separately be recycled, and conduct Other electric equipment operation electric energy are utilized, to reach the mesh for improving comprehensive resource utilization rate and reducing equipment operation energy consumption 's.
On the one hand the present invention can effectively realize whole lowering ability when chip operation compared with traditional chipset is passed, and Temperature reduction performance when chip operation is helped to improve, prevents high temperature high temperature thermal conductivity from causing while improving chip overall operation performance Situations such as failure of chip, occurs, and effectively raises the convenience of chip operation supervision operation, on the other hand convenient for transporting to chip Trip temperature carries out accurate convenient monitoring, while also improving Integrated Energy recovery utilization rate when chip operation.
It should be understood by those skilled in the art that the present invention is not limited to the above embodiments.Above-described embodiment and explanation It is merely illustrated the principles of the invention described in book.Without departing from the spirit and scope of the present invention, the present invention also has Various changes and modifications.These changes and improvements all fall within the protetion scope of the claimed invention.The claimed scope of the invention It is defined by the appending claims and its equivalent thereof.

Claims (4)

1. a kind of chip using low-grade fever point generator, it is characterised in that: the chip using low-grade fever generator includes making Industry chip, N-type semiconductor film, P-type semiconductor film, nano-sized carbon heat dissipation film, conductive metal paillon and encapsulating shell, wherein described Operation chip at least three, and each operation chip chamber is coaxially distributed and is evenly distributed with from top to bottom, divides between adjacent two layers operation chip At least one N-type semiconductor film and at least one P-type semiconductor film, the N-type semiconductor film, P-type semiconductor are not set Film offsets with two adjacent operation chip upper surfaces and lower end surface respectively, and N-type semiconductor film, P-type semiconductor film Between be spaced apart from each other distribution, and pass through between be in the same plane N-type semiconductor film and a P-type semiconductor film It is electrically connected to each other to a conductive metal paillon, and constitutes a thermo-electric generation group, pass through conduction between the thermo-electric generation group The mutual mixed connection of metal foil;The nano-sized carbon heat dissipation film totally two, it is respectively coated by the work for being located at the top in each operation chip The upper surface of industry chip and operation chip lower end surface positioned at bottom, the encapsulating shell are airtight cavity structure, are respectively coated by Outside each operation chip, N-type semiconductor film, P-type semiconductor film, nano-sized carbon heat dissipation film, conductive metal paillon.
2. a kind of chip using low-grade fever generator according to claim 1, it is characterised in that: the encapsulating shell appearance Face is evenly distributed with several pins, and the operation chip is electrically connected to each other with several pins respectively, at least one pin in the pin It is electrically connected to each other by conductive metal paillon and each thermo-electric generation group.
3. a kind of chip using low-grade fever generator according to claim 1 or 2, it is characterised in that: the temperature difference hair It in electric group, is serially connected between each thermo-electric generation group being in the same plane by conductive metal paillon, and constitutes a job Group, it is parallel with one another by conductive metal paillon between each working group in Different Plane, and by conductive metal paillon and draw Foot electrical connection.
4. the chip that a kind of invention according to claim 1 uses low-grade fever generator, it is characterised in that: the operation core Contact surface area is operation chip and N-type semiconductor film, p-type half between piece and N-type semiconductor film, P-type semiconductor film 50%-the 80% of conductor thin film contact surface area.
CN201910638453.XA 2019-07-16 2019-07-16 Chip adopting micro-thermal generator Active CN110491846B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201910638453.XA CN110491846B (en) 2019-07-16 2019-07-16 Chip adopting micro-thermal generator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201910638453.XA CN110491846B (en) 2019-07-16 2019-07-16 Chip adopting micro-thermal generator

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CN110491846A true CN110491846A (en) 2019-11-22
CN110491846B CN110491846B (en) 2021-01-15

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN204131895U (en) * 2013-12-11 2015-01-28 中扬动力股份有限公司 Heat transfer catalysis heat dissipation structure
CN105870083A (en) * 2016-05-31 2016-08-17 福州大学 Three-dimensional chip adopting micro-thermal electric generator and implementation method of chip
CN106489201A (en) * 2014-05-27 2017-03-08 美光科技公司 There is interconnection structure and related system and the method for redundancy electric connector

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN204131895U (en) * 2013-12-11 2015-01-28 中扬动力股份有限公司 Heat transfer catalysis heat dissipation structure
CN106489201A (en) * 2014-05-27 2017-03-08 美光科技公司 There is interconnection structure and related system and the method for redundancy electric connector
CN105870083A (en) * 2016-05-31 2016-08-17 福州大学 Three-dimensional chip adopting micro-thermal electric generator and implementation method of chip

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Effective date of registration: 20201224

Address after: No. 201, building 5, Tian'an headquarters center, 555 Panyu Avenue North, Donghuan street, Panyu District, Guangzhou, Guangdong 510000

Applicant after: Guangdong Evan Low Carbon Technology Co.,Ltd.

Applicant after: Guangzhou Evan new energy Co.,Ltd.

Address before: No. 201, building 5, Tian'an headquarters center, 555 Panyu Avenue North, Donghuan street, Panyu District, Guangzhou, Guangdong 510000

Applicant before: Guangdong Evan Low Carbon Technology Co.,Ltd.

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Denomination of invention: A Chip Using Micro thermal Generator

Effective date of registration: 20221220

Granted publication date: 20210115

Pledgee: Agricultural Bank of China Limited Guangzhou Sanyuanli Sub-branch

Pledgor: Guangdong Evan Low Carbon Technology Co.,Ltd.

Registration number: Y2022980028105

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PC01 Cancellation of the registration of the contract for pledge of patent right

Granted publication date: 20210115

Pledgee: Agricultural Bank of China Limited Guangzhou Sanyuanli Sub-branch

Pledgor: Guangdong Evan Low Carbon Technology Co.,Ltd.

Registration number: Y2022980028105

PE01 Entry into force of the registration of the contract for pledge of patent right
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Denomination of invention: A chip using a micro thermal generator

Granted publication date: 20210115

Pledgee: Agricultural Bank of China Limited Guangzhou Sanyuanli Sub-branch

Pledgor: Guangdong Evan Low Carbon Technology Co.,Ltd.

Registration number: Y2024980003780