CN110470442A - The lossless caliberating device of normal direction elastic constant needle point and application method of atomic force microscope probe - Google Patents
The lossless caliberating device of normal direction elastic constant needle point and application method of atomic force microscope probe Download PDFInfo
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- CN110470442A CN110470442A CN201910744619.6A CN201910744619A CN110470442A CN 110470442 A CN110470442 A CN 110470442A CN 201910744619 A CN201910744619 A CN 201910744619A CN 110470442 A CN110470442 A CN 110470442A
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M5/00—Investigating the elasticity of structures, e.g. deflection of bridges or air-craft wings
- G01M5/0041—Investigating the elasticity of structures, e.g. deflection of bridges or air-craft wings by determining deflection or stress
- G01M5/005—Investigating the elasticity of structures, e.g. deflection of bridges or air-craft wings by determining deflection or stress by means of external apparatus, e.g. test benches or portable test systems
- G01M5/0058—Investigating the elasticity of structures, e.g. deflection of bridges or air-craft wings by determining deflection or stress by means of external apparatus, e.g. test benches or portable test systems of elongated objects, e.g. pipes, masts, towers or railways
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N3/00—Investigating strength properties of solid materials by application of mechanical stress
- G01N3/20—Investigating strength properties of solid materials by application of mechanical stress by applying steady bending forces
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
- G01Q60/24—AFM [Atomic Force Microscopy] or apparatus therefor, e.g. AFM probes
- G01Q60/38—Probes, their manufacture, or their related instrumentation, e.g. holders
Abstract
The invention discloses the lossless caliberating devices of normal direction elastic constant needle point and application method of a kind of atomic force microscope probe, the lossless caliberating device of normal direction elastic constant needle point includes: Sensitivity Calibration micro-, bending force demarcates micro- and two-dimensional electricity driving displacement platform, micro- of Sensitivity Calibration and bending force demarcate micro- and are respectively mounted on a two-dimensional electricity driving displacement platform or are mounted on the same two-dimensional electricity driving displacement platform, wherein, Sensitivity Calibration micro- includes one first inclination silicon wafer substrate, it includes: the gentle second inclination silicon wafer substrate in day that bending force, which demarcates micro-, the top of first inclination silicon wafer substrate and the second inclination silicon wafer substrate is respectively formed with a rib.Relative to the previous system demarcated using bending method to atomic force microscope probe normal direction elastic constant, the lossless caliberating device of normal direction elastic constant needle point of the invention will not generate any damage and pollution to the needle point of micro-cantilever beam probe.
Description
Technical field
The invention belongs to precision instrument technical fields, relate in particular to a kind of normal direction elasticity of atomic force microscope probe
The lossless caliberating device of constant needle point and application method.
Background technique
Atomic force microscope (Atomic Force Microscope, AFM) is on micro-nano-scale structure or the surface of material
It is had a wide range of applications in topography measurement and characterization.In the mechanical test based on atomic force microscope, micro-cantilever beam probe is risen
Vital effect is arrived.The normal direction elastic constant calibration of micro-cantilever beam probe is to carry out micro-nano-scale structure or material table
Necessary work before face topography measurement and characterization.In the measuring surface form and characterization for carrying out micro-nano-scale structure or material
In, probe tip tip directly interacts with sample surfaces, the radius at needle point tip determine imaging quality and
Resolution ratio.Needle point and sample interact in measurement process, repeatedly measurement after, needle point may generate abrasion or by
Pollution, causes subsequent image quality poor, causes the pattern of the micro-nano-scale structure or material surface that measure inaccurate, this
When just need replacing new probe, original probe will be dropped recycling.In addition, micro-cantilever beam probe complex manufacturing technology, valence
Lattice are expensive, and the cost of needle member from several hundred to thousands of differs, and the cost of the probe of some specific uses even wants members up to ten thousand.This
When requiring to demarcate probe, under the premise of not influencing calibration accuracy, the damage of probe tip is the smaller the better, as far as possible
Subsequent use when formally testing sample is not influenced.Over nearly twenties years, there are a variety of calibration micro-cantilevers
The method of probe elastic constant.These methods can be divided into dimensional parameters method, the resonance method, bending method etc. from principle.It is above-mentioned various
Method has respective advantage and disadvantage.Using will not be to spy when the normal direction elastic constant of size method and the resonance method survey calculation probe
Needle needle point has any damage and pollution, but both methods has respective limitation, and uncertainty is larger, generally exists
Between 10%~25%, even more greatly.Hooke's law makes cantilever beam by the effect of external force for basic principle in bending method
It bends, while measuring the amount of bow of cantilever beam by every means, pass through formula
K=F/ Δ X formula (1)
Wherein K is the normal direction elastic constant of probe, and F is external force, and Δ X is the amount of bow of cantilever beam
The normal direction elastic constant of cantilever beam is calculated.The calibration uncertainty of this method can achieve 2% hereinafter, to each
Plant shape, the micro-cantilever of size can be carried out relatively accurate normal direction elastic constant calibration.But this method middle probe needle point
As stress point.The needle point of general atomic force microscope probe is taper, about 5-20 μm of tip height, needle point tip radius about 5-
40nm.In practical calibration process, downward, the point using probe tip as main stress drives micro-cantilever to occur curved to probe tip
It is bent.Simultaneously in order to obtain the data of high s/n ratio, the accuracy of measurement is improved, the uncertainty of measurement is reduced, micro-cantilever
Amount of bow can sometimes reach several microns, and it is micro- to can achieve several to dozens of for the active force at micro-cantilever needle point at this time
Abrasion, fracture easily occur for ox, probe tip tip.And micro-cantilever needle point is directly contacted with calibration substrate, in substrate
Particle is also possible to be attached on needle point, pollutes to needle point.
Summary of the invention
In view of the deficiencies of the prior art, the purpose of the present invention is to provide a kind of normal direction of atomic force microscope probe elasticity
The lossless caliberating device of constant needle point, the lossless caliberating device of normal direction elastic constant needle point make probe (micro-cantilever beam probe) micro-cantilever
Beam back side stress, needle point are not contacted with any object, and the position of micro-cantilever back side stress and needle point present position substantially phase
Together, which can carry out macrobending amount to any micro-cantilever beam probe and original is repeated several times
Position calibration, without generating any damage and pollution to probe tip.
It is a further object of the present invention to provide the application methods of the above-mentioned lossless caliberating device of normal direction elastic constant needle point, this makes
The amount of bow and bending of the cantilever beam of micro-cantilever beam probe are obtained by the lossless caliberating device of normal direction elastic constant needle point with method
Power, and find out according to Hooke's law the normal direction elastic constant of micro-cantilever.
The purpose of the present invention is what is be achieved by following technical proposals.
A kind of lossless caliberating device of normal direction elastic constant needle point of atomic force microscope probe, comprising: Sensitivity Calibration is micro-
Platform, bending force demarcate micro- and two-dimensional electricity driving displacement platform, and micro- of the Sensitivity Calibration and bending force are demarcated micro- and be respectively mounted on
On one two-dimensional electricity driving displacement platform or it is mounted on the same two-dimensional electricity driving displacement platform, for mobile in horizontal plane,
Wherein, the Sensitivity Calibration micro- includes one first inclination silicon wafer substrate, and it includes: day gentle that the bending force, which demarcates micro-,
The top of two inclination silicon wafer substrates, the first inclination silicon wafer substrate and the second inclination silicon wafer substrate is respectively formed with a rib.
In the above-mentioned technical solutions, further includes: optical texture, the optical texture include: laser light source, polarization light splitting
Mirror, pellicular beamsplitters, object lens, three-D electric displacement platform, piezoelectric ceramic piece and photoelectric detector swash in laser light source transmitting
An aperture diaphragm is provided in the optical path of light, for the laser to be constrained to directional light, the polarization spectroscope is arranged in institute
It states in the optical path of directional light, so that the directional light forms P light after penetrating the polarization spectroscope, in the optical path of the P light
A quarter slide is installed, so that the P light becomes elliptically polarized light after a quarter slide, in the elliptical polarization
Pellicular beamsplitters are installed in the optical path of light, so that the elliptically polarized light is reflected to form the first light through the pellicular beamsplitters
Beam；The micro-cantilever beam probe is mounted in a probe clamper, and the probe clamper and three-D electric displacement platform are solid respectively
Mounted in the opposite sides of the piezoelectric ceramic piece, the micro-cantilever beam probe is located at the focal plane of the object lens, and described first
Light beam reflects to form the second light beam through the object lens and by the micro-cantilever beam probe, and second light beam penetrates the object lens
And third light beam is formed, the third light beam forms linear polarization after reflexing to a quarter slide by the pellicular beamsplitters
Light, the linearly polarized light reflex to the photoelectric detector by the polarization spectroscope.
In the above-mentioned technical solutions, further includes: length travel device, the laser light source, aperture diaphragm, polarization spectroscope,
A quarter slide, pellicular beamsplitters, object lens, three-D electric displacement platform and photoelectric detector are fixedly mounted with a fixing piece, described
Fixing piece is fixedly mounted with the length travel device.
In the above-mentioned technical solutions, further includes: observation system, the observation system include: white light source, Guan Jing, light splitting
Prism and CCD camera, the Amici prism is arranged in the white light beam of the white light source transmitting, so that by the light splitting rib
Successively successively through the 4th light beam is formed after the pellicular beamsplitters and object lens, the 4th light beam exposes to the white light of mirror reflection
The object lens, pellicular beamsplitters, light splitting are successively successively penetrated on the micro-cantilever beam probe and by micro-cantilever beam probe reflection
Rib mirror and tube mirror simultaneously forms the 5th light beam, and the 5th light beam is obtained by the CCD camera.
In the above-mentioned technical solutions, the white light source, Guan Jing, Amici prism and CCD camera are solid with the fixing piece
Dress.
The application method of the above-mentioned lossless caliberating device of normal direction elastic constant needle point, comprising the following steps:
1) needle point for making micro-cantilever beam probe upward, moves the two-dimensional electricity driving displacement platform, so that the first inclination silicon
The rib of piece substrate is located at the 400-600nm of the underface of the needle point, makes the micro-cantilever beam probe under the amount of moving down Δ Z'
The rib for pressing the first inclination silicon wafer substrate, the normal direction voltage output amount of the micro-cantilever beam probe is obtained by photoelectric detector
ΔUy', by normal direction voltage output amount Δ Uy' and the amount of moving down Δ Z' substitution formula (1), obtain the feed rod of the micro-cantilever beam probe
Bar sensitivity Sy；
Sy=Δ Uy'/ΔZ' (1)
2) needle point for making micro-cantilever beam probe upward, moves the two-dimensional electricity driving displacement platform, so that the second inclination silicon
The rib of piece substrate is located at the 400-600nm of the underface of the needle point, pushes the micro-cantilever beam probe, makes the micro-cantilever
Beam probe pushes the rib of the second inclination silicon wafer substrate with the amount of moving down Δ Z', obtains the micro-cantilever by photoelectric detector
The normal direction voltage output amount Δ U of probey" and the registration changes delta M for pushing the front and back balance is obtained by the balance, by institute
State normal direction voltage output amount Δ Uy" and optical lever sensitivity SyIt substitutes into formula (2), obtains micro-cantilever amount of bow Δ Z "；
Δ Z "=Δ Uy″/Sy (2)
3) the registration changes delta M and micro-cantilever amount of bow Δ Z " is substituted into formula (3), obtains normal direction elastic constant
Kn, wherein the G is acceleration of gravity；
Kn=Δ MG/ Δ Z " (3).
Relative to the previous system demarcated using bending method to atomic force microscope probe normal direction elastic constant, originally
The normal direction elastic constant needle point lossless caliberating device of invention the needle point of micro-cantilever beam probe will not be generated any damage and
Pollution.From average probe to special socle beam probe or the micro-cantilever beam probe with special needle point can all carry out it is accurate lossless
Calibration, ensure that the integrity of probe tip.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of the lossless caliberating device of normal direction elastic constant needle point in embodiment 3；
Fig. 2 is that needle point stress carries out the calibrated SEM figure of normal direction elastic constant；
Fig. 3 is that needle point after the calibration of normal direction elastic constant is carried out according to application method in embodiment 3 (cantilever beam back side stress)
SEM figure.
1: length travel device, 2:CCD camera, 3: Guan Jing, 4: Amici prism, 5: white light source, 6: pellicular beamsplitters, 7: three
Wei electricity Dong Weiyitai, 8: piezoelectric ceramic piece, 9: probe clamper, 10: micro-cantilever beam probe, 11: the first inclination silicon wafer substrates,
12: two-dimensional electricity driving displacement platform, 13: fixing piece, 14: photoelectric detector, 15: a quarter slide, 16: polarization spectroscope, 17: hole
Diameter diaphragm, 18: laser light source, 19: object lens, 20: load column, 21: balance, 22: the second inclination silicon wafer substrates.
Specific embodiment
Technical solution of the present invention is further illustrated combined with specific embodiments below.
Embodiment 1
As shown in Figure 1, a kind of lossless caliberating device of normal direction elastic constant needle point of atomic force microscope probe, comprising: spirit
Sensitivity demarcate micro-, bending force demarcate micro- and two-dimensional electricity driving displacement platform 12, micro- of Sensitivity Calibration and bending force demarcate micro-
It is respectively mounted on a two-dimensional electricity driving displacement platform 12 or is mounted on the same two-dimensional electricity driving displacement platform 12, for being moved in horizontal plane
It is dynamic, wherein Sensitivity Calibration micro- includes one first inclination silicon wafer substrate 11, and it includes: balance 21 and that bending force, which demarcates micro-,
The top of two inclination silicon wafer substrates 22, the first inclination silicon wafer substrate 11 and the second inclination silicon wafer substrate 22 is respectively formed with a rib.
The application method of the above-mentioned lossless caliberating device of normal direction elastic constant needle point, comprising the following steps:
1) the needle point bottom surface radius of micro-cantilever beam probe 10 is 5-8 μm, and the needle point for making micro-cantilever beam probe 10 upward, moves
Two-dimensional electricity driving displacement platform 12, so as to make micro- at the 400-600nm for the underface that the rib of the first inclination silicon wafer substrate 11 is located at needle point
Socle beam probe 10 pushes the rib of the first inclination silicon wafer substrate 11 with the amount of moving down Δ Z', obtains micro-cantilever by photoelectric detector 14
The normal direction voltage output amount Δ U of beam probe 10y', by normal direction voltage output amount Δ Uy' and the amount of moving down Δ Z' substitution formula (1), it obtains
Obtain the optical lever sensitivity S of micro-cantilever beam probe 10y；
Sy=Δ Uy'/ΔZ' (1)
2) needle point for making micro-cantilever beam probe 10 upward, moves two-dimensional electricity driving displacement platform 12, so that the second inclination silicon wafer base
The rib at bottom 22 is located at the 400-600nm of the underface of needle point, pushes micro-cantilever beam probe 10, makes 10 or less micro-cantilever beam probe
Shifting amount Δ Z' pushes the rib of the second inclination silicon wafer substrate 22, and the normal direction voltage of micro-cantilever beam probe 10 is obtained by photoelectric detector
Output quantity Δ Uy" and the registration changes delta M for pushing the front and back balance 21 is obtained by balance 21, by normal direction voltage output amount Δ
Uy" and optical lever sensitivity SyIt substitutes into formula (2), obtains micro-cantilever amount of bow Δ Z "；
Δ Z "=Δ Uy″/Sy (2)
3) registration changes delta M and micro-cantilever amount of bow Δ Z " is substituted into formula (3), obtains normal direction elastic constant Kn,
In, G is acceleration of gravity；
Kn=Δ MG/ Δ Z " (3).
Embodiment 2
In order to more easily realize the measurement of normal direction elastic constant, on the basis of embodiment 1, further includes: optical texture,
Optical texture includes: laser light source 18, polarization spectroscope 16, pellicular beamsplitters 6, object lens 19, three-D electric displacement platform 7, piezoelectricity
Potsherd 8 and photoelectric detector 14 are provided with an aperture diaphragm 17 in the optical path that laser light source 18 emits laser, for that will swash
Light is constrained to directional light, and polarization spectroscope 16 is arranged in the optical path of directional light, so that after directional light is through polarization spectroscope 16
P light is formed, a quarter slide 15 is installed in the optical path of P light, so that P light becomes oval after a quarter slide 15
Polarised light is equipped with pellicular beamsplitters 6 in the optical path of elliptically polarized light, so that elliptically polarized light is through 6 quilt of pellicular beamsplitters
Reflect to form the first light beam；Micro-cantilever beam probe 10 is mounted in a probe clamper 9, probe clamper 9 and three-D electric position
Moving stage 7 is packed in the opposite sides of piezoelectric ceramic piece 8 respectively, and micro-cantilever beam probe 10 is located at the focal plane of object lens 19, and first
Light beam reflects to form the second light beam through object lens 19 and by micro-cantilever beam probe 10, and the second light beam is through object lens 19 and forms third
Light beam, third light beam are reflexed to after a quarter slide 15 by pellicular beamsplitters 6 and form linearly polarized light, and linearly polarized light is polarized point
Light microscopic 16 reflexes to photoelectric detector 14.
Preferably, the second inclination silicon wafer substrate 22 and balance 21 are fixed with a load column 20.
Embodiment 3
In order to more easily realize the measurement of normal direction elastic constant, on the basis of embodiment 2, further includes: length travel
Device 1, laser light source 18, aperture diaphragm 17, polarization spectroscope 16, a quarter slide 15, pellicular beamsplitters 6, object lens 19, three-dimensional
Electricity driving displacement platform 7 and photoelectric detector 14 are fixedly mounted with a fixing piece 13, and fixing piece 13 is fixedly mounted with length travel device 1.
Embodiment 3
In order to more easily realize the measurement of normal direction elastic constant, on the basis of embodiment 2, further includes: observation system,
Observation system includes: white light source 5, Guan Jing 3, Amici prism 4 and CCD camera 2, and the setting of Amici prism 4 emits in white light source 5
White light beam on so that the white light for the reflection of prism 4 that is split is successively successively through forming the after pellicular beamsplitters 6 and object lens 19
Four light beams, the 4th light beam are exposed on micro-cantilever beam probe 10 and are reflected successively by the micro-cantilever beam probe 10 successively through object lens
19, pellicular beamsplitters 6, Amici prism 4 and pipe mirror 3 and the 5th light beam is formed, the 5th light beam obtained by CCD camera 2.White light source
5, Guan Jing 3, Amici prism 4 and CCD camera 2 are fixedly mounted with fixing piece 13.
The application method of the lossless caliberating device of the present embodiment normal direction elastic constant needle point, comprising the following steps:
1) micro-cantilever beam probe 10 upward, i.e., is reversely attached on probe clamper 9 by the needle point for making micro-cantilever beam probe 10.
Three-D electric displacement platform 7 is adjusted, so as to which micro-cantilever beam probe 10 can be clearly apparent from CCD camera 2, and irradiates the first light beam
On micro-cantilever beam probe 10.Mobile two-dimensional electricity driving displacement platform 12 makes the first inclination silicon wafer substrate 11 be located at micro-cantilever beam probe 10
Lower section, control length travel device 1, make micro-cantilever beam probe 10 slowly close to first immediately below micro-cantilever beam probe 10
The rib of silicon wafer substrate 11 being tilted, while observing CCD camera 2, when by secretly gradually brightening, keeping 12 progress of two-dimensional electricity driving displacement platform horizontal
Micro-displacement, it is seen that 2 visual field of CCD camera is roughly divided into two parts of light and shade, then controls length travel device 1 until clear simultaneously
The rib and micro-cantilever beam probe 10 for seeing the first inclination silicon wafer substrate 11.Control two-dimensional electricity driving displacement platform 12 and piezoelectric ceramic piece
8 so as to pass through three-D electric displacement platform 7 at the 400-600nm for the underface that the rib of the first inclination silicon wafer substrate 11 is located at needle point
So that micro-cantilever beam probe 10 is pushed the rib of the first inclination silicon wafer substrate 11 with the amount of moving down Δ Z', is obtained by photoelectric detector micro- outstanding
The normal direction voltage output amount Δ U of arm beam probe 10y', by normal direction voltage output amount Δ Uy' and the amount of moving down Δ Z' substitution formula (1),
Obtain the optical lever sensitivity S of micro-cantilever beam probe 10y；
Sy=Δ Uy'/ΔZ' (1)
2) length travel device 1 is controlled, micro-cantilever beam probe 10 is driven to move up about 5mm, far from the first inclination silicon wafer base
Bottom 11.Three-D electric displacement platform 7 is finely tuned, the position for guaranteeing that the first light beam is radiated on micro-cantilever beam probe 10 is constant.Mobile two
Dimension electricity driving displacement platform 12 makes the second inclination silicon wafer substrate 22 be located at the lower section of micro-cantilever beam probe 10, controls length travel device 1, makes
Micro-cantilever beam probe 10 slowly close to the rib of the second inclination silicon wafer substrate 22 immediately below micro-cantilever beam probe 10, is seen simultaneously
CCD camera 2 being examined, when by secretly gradually brightening, making the micro-displacement of 12 progress level of two-dimensional electricity driving displacement platform, it is seen that CCD camera 2 regards
Be roughly divided into two parts of light and shade, then control length travel device 1 until and meanwhile clearly see the second inclination silicon wafer substrate 22
Rib and micro-cantilever beam probe 10.Two-dimensional electricity driving displacement platform 12 and piezoelectric ceramic piece 8 are controlled so that the second inclination silicon wafer substrate 22
The rib underface that is located at needle point 400-600nm at, micro-cantilever beam probe 10 is pushed by three-D electric displacement platform 7, is made micro-
Socle beam probe 10 pushes the rib of the second inclination silicon wafer substrate 22 with the amount of moving down Δ Z', obtains micro-cantilever by photoelectric detector
The normal direction voltage output amount Δ U of probe 10y" and the registration changes delta M for pushing the front and back balance 21 is obtained by balance 21, it will
Normal direction voltage output amount Δ Uy" and optical lever sensitivity SyIt substitutes into formula (2), obtains micro-cantilever amount of bow Δ Z "；
Δ Z "=Δ Uy″/Sy (2)
3) registration changes delta M and micro-cantilever amount of bow Δ Z " is substituted into formula (3), obtains normal direction elastic constant Kn,
In, G is acceleration of gravity；
Kn=Δ MG/ Δ Z " (3).
In the above-described embodiments, CCD camera, the CMOS camera of the DCC1545M model of Thorlabs company, U.S. production,
Resolution ratio be 1280 × 1024 pixels, 5.6 × 5.6 μm of single pixel size；
Object lens select the object lens of M Plan Apo 20X, the NA=0.42 model of the rich company's production of Japan three, operating distance
For 20mm, objective lens diameter 29.2mm；
Length travel device 1 uses the electric precise lifting platform of the PSA100-11-Z model by Han Guang company production of standing upright, in
The heart loads 5kg, 8 2.5 μm of open loop resolution ratio of subdivisions；
Probe clamper, the production of Bruker company with the probe clamper on Dimension ICON, groove and water
Plane included angle is 12 degree；
First inclination silicon wafer substrate is fixed on glass slide by one piece of rectangle polished silicon slice inclination, and rectangle polished silicon slice inclines
About 15 degree of rake angle angle with horizontal plane.10 × 10mm of die size, thickness are about 1mm, and corner angle are 90 degree；
Column is loaded, 30mm, weight about 1g or so are about, load top end is a scarf, scarf angle with horizontal plane
About 15 degree.The chip of polishing is posted in load top end, and upward, corner angle are 90 degree and form the second inclination silicon wafer substrate corner angle
Rib.
1 probe elastic constant of table demarcates needle point stress and micro-cantilever back side stress Comparative result
It can be seen that, use probe tip stress and probe cantilevers beam back side stress method to three kinds respectively by table 1
The probe of different model has carried out multiple calibration, and the elastic constant result of calibration is almost consistent, and uncertainty is smaller.So probe
The normal direction elastic constant method that micro-cantilever back side stress method demarcates probe is feasible, as a result accurately.
As shown in Fig. 2, as seen from the figure, carrying out ten needle point stress to versatility atomic force microscope probe OTESPA-R3
After calibration, tip diameter reaches 126.3nm, and apparent wear and rupture has occurred in needle point tip.According to application method in embodiment 3
Ten micro-cantilever back side stress calibration are carried out to versatility atomic force microscope probe OTESPA-R3, as shown in figure 3, micro- outstanding
Tip diameter about 38.96nm after the calibration of arm beam back side stress, does not generate any damage and pollution to needle point.
Illustrative description has been done to the present invention above, it should explanation, the case where not departing from core of the invention
Under, any simple deformation, modification or other skilled in the art can not spend the equivalent replacement of creative work equal
Fall into protection scope of the present invention.
Claims (6)
1. a kind of lossless caliberating device of normal direction elastic constant needle point of atomic force microscope probe characterized by comprising sensitive
Scale is micro- fixed, bending force demarcates micro- and two-dimensional electricity driving displacement platform (12), and micro- of the Sensitivity Calibration and bending force are demarcated
Micro- is respectively mounted on the two-dimensional electricity driving displacement platform (12) or is mounted on the same two-dimensional electricity driving displacement platform (12)
On, for mobile in horizontal plane, wherein the Sensitivity Calibration micro- includes one first inclination silicon wafer substrate (11), described curved
It includes: balance (21) and the second inclination silicon wafer substrate (22), first inclination silicon wafer substrate (11) and that bent power, which demarcates micro-,
The top of two inclinations silicon wafer substrate (22) is respectively formed with a rib.
2. the lossless caliberating device of normal direction elastic constant needle point according to claim 1, which is characterized in that further include: optics
Structure, the optical texture include: laser light source (18), polarization spectroscope (16), pellicular beamsplitters (6), object lens (19), three-dimensional
Electricity driving displacement platform (7), piezoelectric ceramic piece (8) and photoelectric detector (14), in the optical path of the laser light source (18) transmitting laser
On be provided with an aperture diaphragm (17), for the laser to be constrained to directional light, the polarization spectroscope (16) is arranged in institute
It states in the optical path of directional light, so that the directional light forms P light through the polarization spectroscope (16) afterwards, in the light of the P light
Road is equipped with a quarter slide (15), so that the P light becomes elliptically polarized light, In after a quarter slide (15)
Pellicular beamsplitters (6) are installed, so that the elliptically polarized light is through the pellicular beamsplitters (6) in the optical path of the elliptically polarized light
Reflected to form the first light beam；The micro-cantilever beam probe (10) is mounted in a probe clamper (9), the probe clamper
(9) and three-D electric displacement platform (7) is packed in the opposite sides of the piezoelectric ceramic piece (8), the micro-cantilever beam probe respectively
(10) it is located at the focal plane of the object lens (19), first light beam is visited through the object lens (19) and by the micro-cantilever
Needle (10) reflects to form the second light beam, and second light beam is through the object lens (19) and forms third light beam, the third light
Beam reflexes to a quarter slide (15) by the pellicular beamsplitters (6) and forms linearly polarized light, the linearly polarized light quilt afterwards
The polarization spectroscope (16) reflexes to the photoelectric detector (14).
3. the lossless caliberating device of normal direction elastic constant needle point according to claim 2, which is characterized in that further include: it is longitudinal
Shifter (1), the laser light source (18), aperture diaphragm (17), polarization spectroscope (16), a quarter slide (15), film
Beam splitter (6), object lens (19), three-D electric displacement platform (7) and photoelectric detector (14) are fixedly mounted with a fixing piece (13), described
Fixing piece (13) is fixedly mounted with the length travel device (1).
4. the lossless caliberating device of normal direction elastic constant needle point according to claim 3, which is characterized in that further include: observation
System, the observation system include: white light source (5), Guan Jing (3), Amici prism (4) and CCD camera (2), the light splitting rib
Mirror (4) is arranged in the white light beam that the white light source (5) emit, so that the white light reflected by the Amici prism (4) is first
The 4th light beam is successively formed afterwards through the pellicular beamsplitters (6) and object lens (19) afterwards, and the 4th light beam exposes to described micro-
The object lens (19), pellicular beamsplitters are successively successively penetrated on socle beam probe (10) and by the micro-cantilever beam probe (10) reflection
(6), Amici prism (4) and Guan Jing (3) and the 5th light beam of formation, the 5th light beam is by the CCD camera (2) acquisition.
5. the lossless caliberating device of normal direction elastic constant needle point according to claim 4, which is characterized in that the white light source
(5), Guan Jing (3), Amici prism (4) and CCD camera (2) are fixedly mounted with the fixing piece (13).
6. the application method of the lossless caliberating device of normal direction elastic constant needle point as described in claim 1, which is characterized in that including with
Lower step:
1) needle point for making micro-cantilever beam probe (10) upward, moves the two-dimensional electricity driving displacement platform (12), so that described first inclines
At the 400-600nm for the underface that the rib of oblique silicon wafer substrate (11) is located at the needle point, make the micro-cantilever beam probe (10) with
The amount of moving down Δ Z' pushes the rib of first inclination silicon wafer substrate (11), obtains the micro-cantilever by photoelectric detector (14)
The normal direction voltage output amount Δ U of probe (10)y', by normal direction voltage output amount Δ Uy' and the amount of moving down Δ Z' substitution formula (1), it obtains
Obtain the optical lever sensitivity S of the micro-cantilever beam probe (10)y；
Sy=Δ Uy'/ΔZ' (1)
2) needle point for making micro-cantilever beam probe (10) upward, moves the two-dimensional electricity driving displacement platform (12), so that described second inclines
At the 400-600nm for the underface that the rib of oblique silicon wafer substrate (22) is located at the needle point, the micro-cantilever beam probe (10) are pushed,
So that the micro-cantilever beam probe (10) is pushed the rib of second inclination silicon wafer substrate (22) with the amount of moving down Δ Z', is examined by photoelectricity
Survey the normal direction voltage output amount Δ U that device (14) obtain the micro-cantilever beam probe (10)y" and by the balance (21) obtain
The registration changes delta M for pushing the front and back balance (21), by the normal direction voltage output amount Δ Uy" and optical lever sensitivity SyIt substitutes into
Formula (2) obtains micro-cantilever amount of bow Δ Z "；
Δ Z "=Δ Uy”/Sy (2)
3) the registration changes delta M and micro-cantilever amount of bow Δ Z " is substituted into formula (3), obtains normal direction elastic constant Kn,
In, the G is acceleration of gravity；
Kn=Δ MG/ Δ Z " (3).
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