CN110434681A - The two-sided high-precision polishing method of heavy caliber sapphire window element - Google Patents
The two-sided high-precision polishing method of heavy caliber sapphire window element Download PDFInfo
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- CN110434681A CN110434681A CN201910671137.2A CN201910671137A CN110434681A CN 110434681 A CN110434681 A CN 110434681A CN 201910671137 A CN201910671137 A CN 201910671137A CN 110434681 A CN110434681 A CN 110434681A
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- polishing
- polishing disk
- disk
- uniaxial
- machine
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B13/00—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor
- B24B13/01—Specific tools, e.g. bowl-like; Production, dressing or fastening of these tools
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
Abstract
A kind of two-sided high-precision polishing method of heavy caliber sapphire window element, the present invention not only can satisfy the double-sided reflecting face shape of heavy caliber sapphire window element better than 1/3 λ, surface roughness is better than 0.3nm, and the depth of parallelism is better than 0.009, and surface smoothness is better than III grade of processing request, and simple process, it can directly be applied on uniaxial polishing machine, it is low for equipment requirements, it is wide that bore range can be processed, high production efficiency, production cost are low.
Description
Technical field
The present invention relates to optical element Ultra-precision Turning, especially a kind of heavy caliber sapphire window element it is two-sided high-precision
Spend polishing method.
Background technique
Sapphire hardness is high, and chemical stability is good, and thermal conductivity is excellent, it is critical that and sapphire has excellent optical characteristics,
Good light transmission rate is shown in visible light and MWIR wave band.Sapphire high-wearing feature can be applied to harsh environments, energy
The ultraviolet radiation to middle infrared band effectively to be transmitted, there is good optical characteristics, optical scattering is small, and index of refraction homogeneity is good,
And it is able to satisfy the requirement of large scale window.These sapphire good characteristics are that other optical materials can not be compared, and are mostly light
Compose the ideal material of watch window.
But the window that such equipment uses is when reducing thermal gradient to the greatest extent, it is necessary to keep window thin, light, reduce set as far as possible
Standby total weight.Therefore, the sapphire window physical size used in such equipment is typically larger than 500mm, in addition 800mm with
On, while its thickness, less than 10mm, in the case where this heavy caliber thin thickness, the optical manufacturing of sapphire window is quite tired
It is difficult.Eyeglass easily deforms during optical manufacturing, and high-precision surface shape control is difficult, and marginal distortion is serious, and the process-cycle is long, cost
It is high.
There are two types of the polishing processes of sapphire material optical element general at present:
One is conventional single side polishing techniques, first paste the face B of fixing element, the face polishing A, then conversely, this technique
Long processing time, there are great stress deformations for component affixing, and surface figure accuracy is very poor after being detached from tooling.
Another kind is common two-sided polishing, element is placed in the wandering star polishing wheel between upper and lower two polishing disks, two
Polishing disk reversely rotates polishing, and this method, there are biggish security risk, is easily made for heavy caliber sapphire wafer element
At element chipping, product qualification rate is reduced；It is right and because this method is a kind of process based on Twp-sided polishing machine
Monomer size is more than that the heavy-calibre element of 300mm or more is difficult to realize apply, and device dependence is excessive.
Summary of the invention
Technical problem solved by the present invention is providing a kind of two-sided high-precision polishing side of heavy caliber sapphire window element
Method, this method not only can satisfy the double-sided reflecting face shape of heavy caliber sapphire window element better than 1/3 λ, and surface roughness is excellent
In 0.3nm, the depth of parallelism is better than 0.009, and surface smoothness is better than III grade of processing request, and simple process, can be directly in list
It is applied on axis polishing machine, low for equipment requirements, processable bore range is wide, high production efficiency, and production cost is low.
Technical solution of the invention is as follows:
A kind of two-sided high-precision polishing method of heavy caliber sapphire window element, this method use uniaxial polishing machine,
Feature is, method includes the following steps:
1) heavy caliber sapphire window element (hereinafter referred to as element) is placed in the lower polishing disk of uniaxial machine polishing machine
On, then upper polishing disk is pressed onto the upper surface of element, while the element is placed in the centre of the workpiece ring with circular hole connecting rod,
It keeps workpiece ring to be placed on lower polishing pad, and is connected with upper polishing pad main shaft；
2) start uniaxial polishing machine, lower polishing disk rotating speed increases to 30rpm by 0, and upper polishing disk pressure increases to 10g/cm by 02,
Upper polishing disk, the lower polishing disk of uniaxial polishing machine respectively polish the member top surface, lower surface, in element surface
When roughness is higher than 3nm, the diamond dust polishing fluid partial size used is 1 μm, and keeping the adding speed of polishing fluid is 30mL/min,
It enters step after a period of time 3)；
3) revolving speed of lower polishing disk (2) is increased into 40rpm by 30, upper polishing disk pressure increases to 10g/cm2, the holding of this process
The diamond dust for the use of partial size being 1 μm, and keeping the adding speed of polishing fluid is 30mL/min；
4)) the roughness on measuring cell two sides, when the roughness of element surface at this time is lower than 3nm, into next step,
Otherwise, return step 3)；
5) the lower polishing disk that the element is placed in another uniaxial polishing machine is removed from current uniaxial polishing machine
On, then upper polishing disk is pressed onto the upper surface of element, while the element is placed in the centre of the workpiece ring with circular hole connecting rod,
It keeps workpiece ring to be placed on lower polishing pad, and is connected with upper polishing pad main shaft；Start the single shaft polishing machine, by turning for lower polishing disk
Speed increases to 50rpm by 40, and upper polishing disk pressure increases to 15g/cm2, the diamond dust for the use of partial size being 0.5 μm is kept to throw during this
Light liquid, and keeping the adding speed of polishing fluid is 40mL/min；
6) roughness on measuring cell two sides enters next when the roughness on two surface of element is all satisfied processing request
It walks, otherwise return step 5)；
7) the two-sided high-precision polishing of heavy caliber sapphire window element is completed.
The lower polishing disk of the uniaxial polishing machine is active rotation, and upper polishing disk is passive type rotation, workpiece ring with
Upper polishing disk connection performs relative motion；Upper and lower polishing disk is resin copper dish, and workpiece ring thickness need to be slightly larger than component thickness, workpiece
Ring diameter of bore need to be greater than element longest catercorner length, and upthrow cd diameter should be slightly less than element longest catercorner length, institute
The uniaxial polishing machine stated is equipped with groove equipped with peristaltic pump and filter screen, lower polishing disk surrounding, with the use of achievable polishing fluid
Recycle fluid injection.
Advantages of the present invention:
1) it present invention can be suitably applied to the polishing of heavy caliber thin slice sapphire window element, it is wide that bore range can be processed；
2) element that the present invention processes can realize double-sided reflecting face shape better than 1/3 λ, and surface roughness is better than 0.3nm, in parallel
Degree is better than 0.009, and surface smoothness is better than III grade；
3) present invention can directly be implemented on uniaxial machine, not need Special two-side polishing machine；
4) mode of present invention replacement polishing fluid, by the way of removing element replacement equipment, it is ensured that same equipment
The polishing fluid of same partial size is used, the decline of element surface quality caused by polishing fluid pollutes mutually does not occur, further mentions
High polishing fluid utilization rate, reduces cost.
5) present invention is high in machining efficiency, and consumptive material usage amount is small, and overall cost is low.
Detailed description of the invention
Two-sided high-precision polishing method element of the Fig. 1 for heavy caliber sapphire window element of the present invention, upper and lower polishing disk,
Structural solid figure between workpiece ring.
The upper polishing disk of 1-, polishing disk under 2-, 3- have the connecting rod of annulus, 4- workpiece ring, 5- sapphire window element
Specific embodiment
The present invention is further explained in the light of specific embodiments.
The two-sided high-precision polishing method of heavy caliber sapphire window element of the present invention, this method use uniaxial polishing machine,
Method includes the following steps: referring to Fig. 1
1) heavy caliber sapphire window element (hereinafter referred to as element) 5 is placed in the lower polishing disk of uniaxial machine polishing machine
On 2, then upper polishing disk 1 is pressed onto the upper surface of element 5, while the element 5 is placed in the workpiece ring 4 with circular hole connecting rod 3
Centre, keep workpiece ring 4 to be placed on lower polishing pad, and be connected with upper polishing pad main shaft；
2) start uniaxial polishing machine, lower 2 revolving speed of polishing disk increases to 30rpm by 0, and upper polishing disk pressure increases to 10g/ by 0
cm2, upper polishing disk 1, the lower polishing disk 2 of uniaxial polishing machine respectively polish 5 upper surface of element, lower surface, In
When element surface roughness is higher than 3nm, the diamond dust polishing fluid partial size used is 1 μm, and the adding speed of holding polishing fluid is
3) 30mL/min is entered step after a period of time；
3) revolving speed of lower polishing disk 2 is increased into 40rpm by 30, upper polishing disk pressure increases to 10g/cm2, this process holding make
The diamond dust for being 1 μm with partial size, and keeping the adding speed of polishing fluid is 30mL/min；
4)) the roughness on measuring cell two sides, when the roughness of element surface at this time is lower than 3nm, into next step,
Otherwise, return step 3)；
5) the lower polishing disk 2 that the element is placed in another uniaxial polishing machine is removed from current uniaxial polishing machine
On, then upper polishing disk 1 is pressed onto the upper surface of element 5, while the element 5 is placed in the workpiece ring 4 with circular hole connecting rod 3
Centre keeps workpiece ring 4 to be placed on lower polishing pad, and is connected with upper polishing pad main shaft；Start the single shaft polishing machine, by lower polishing
The revolving speed of disk 2 increases to 50rpm by 40, and upper polishing disk pressure increases to 15g/cm2, kept during this using partial size being 0.5 μm
Diamond dust polishing fluid, and keeping the adding speed of polishing fluid is 40mL/min；
6) roughness on measuring cell two sides enters next when the roughness on two surface of element is all satisfied processing request
It walks, otherwise return step 5)；
7) the two-sided high-precision polishing of heavy caliber sapphire window element is completed.
The lower polishing disk of the uniaxial polishing machine is active rotation, and upper polishing disk is passive type rotation, workpiece ring with
Upper polishing disk connection performs relative motion；Upper and lower polishing disk is resin copper dish, and workpiece ring thickness need to be slightly larger than component thickness, workpiece
Ring diameter of bore need to be greater than element longest catercorner length, and upthrow cd diameter should be slightly less than element longest catercorner length, institute
The uniaxial polishing machine stated is equipped with groove equipped with peristaltic pump and filter screen, lower polishing disk surrounding, with the use of achievable polishing fluid
Recycle fluid injection.
The present invention replaces the mode of polishing fluid, by the way of removing element replacement equipment, it is ensured that same equipment makes
It is the polishing fluid of same partial size, the decline of element surface quality caused by polishing fluid pollutes mutually does not occur, further increases
Polishing fluid utilization rate, reduces cost.
The element bore that the present invention is processed depends on uniaxial machine bore used, therefore is suitable for all kinds of big-and-middle small-bore
The polishing of sapphire window element is particularly suitable for the two-sided high-precision polishing of heavy caliber (>=500mm) sapphire window element.
It is 500mm with a leaf length in embodiment, the sapphire window of width 140mm, thickness 8mm are polishing object.
Experiment shows the present invention not only and can satisfy the double-sided reflecting face shape of heavy caliber sapphire window element better than 1/3 λ, and surface is thick
Rugosity is better than 0.3nm, and the depth of parallelism is better than 0.009, and surface smoothness is better than III grade of processing request, and simple process, can be straight
It connects and is applied on uniaxial polishing machine, low for equipment requirements, processable bore range is wide, high production efficiency, and production cost is low.
Claims (2)
1. a kind of two-sided high-precision polishing method of heavy caliber sapphire window element, this method is special using uniaxial polishing machine
Sign is, method includes the following steps:
1) heavy caliber sapphire window element (hereinafter referred to as element) (5) is placed in the lower polishing disk of uniaxial machine polishing machine
(2) on, then upper polishing disk (1) is pressed onto the upper surface of element, while the element is placed in the workpiece with circular hole connecting rod (3)
The centre of ring (4) keeps workpiece ring (4) to be placed on lower polishing pad, and is connected with upper polishing pad main shaft；
2) start uniaxial polishing machine, lower polishing disk (2) revolving speed increases to 30rpm by 0, and upper polishing disk pressure increases to 10g/cm by 02, single
Upper polishing disk (1), the lower polishing disk (2) of axis polishing machine respectively polish described element (5) upper surface, lower surface, In
When element surface roughness is higher than 3nm, the diamond dust polishing fluid partial size used is 1 μm, and the adding speed of holding polishing fluid is
3) 30mL/min is entered step after a period of time；
3) revolving speed of lower polishing disk (2) is increased into 40rpm by 30, upper polishing disk pressure increases to 10g/cm2, the holding use of this process
The diamond dust that partial size is 1 μm, and keeping the adding speed of polishing fluid is 30mL/min；
4)) the roughness on measuring cell two sides, it is no into next step when the roughness of element surface at this time is lower than 3nm
Then, return step 3)；
5) the lower polishing disk (2) that the element is placed in another uniaxial polishing machine is removed from current uniaxial polishing machine
On, then upper polishing disk (1) is pressed onto the upper surface of element, while the element is placed in the workpiece ring with circular hole connecting rod (3)
(4) centre keeps workpiece ring (4) to be placed on lower polishing pad, and is connected with upper polishing pad main shaft；Start the single shaft polishing machine,
The revolving speed of lower polishing disk (2) is increased into 50rpm by 40, upper polishing disk pressure increases to 15g/cm2, holding uses partial size during this
Adding speed for 0.5 μm of diamond dust polishing fluid, and holding polishing fluid is 40mL/min；
6) roughness on measuring cell two sides enters in next step when the roughness on two surface of element is all satisfied processing request, no
Then return step 5)；
7) the two-sided high-precision polishing of heavy caliber sapphire window element is completed.
2. the two-sided high-precision polishing method of heavy caliber sapphire window element according to claim 1, which is characterized in that
The lower polishing disk of the uniaxial polishing machine is active rotation, and upper polishing disk is passive type rotation, workpiece ring and upper polishing disk
Connection performs relative motion；Upper and lower polishing disk is resin copper dish, and workpiece ring thickness need to be slightly larger than component thickness, and workpiece ring inner hole is straight
Diameter need to be greater than element longest catercorner length, and upthrow cd diameter should be slightly less than element longest catercorner length, the single shaft
Polishing machine is equipped with groove equipped with peristaltic pump and filter screen, lower polishing disk surrounding, recycles fluid injection with the use of polishing fluid can be achieved.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910671137.2A CN110434681B (en) | 2019-07-24 | 2019-07-24 | Double-side high-precision polishing method for large-caliber sapphire window element |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910671137.2A CN110434681B (en) | 2019-07-24 | 2019-07-24 | Double-side high-precision polishing method for large-caliber sapphire window element |
Publications (2)
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| CN110434681A true CN110434681A (en) | 2019-11-12 |
| CN110434681B CN110434681B (en) | 2021-09-07 |
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Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5571041A (en) * | 1995-04-21 | 1996-11-05 | Leikam; Josh K. | Refinishing compact disks |
| CN101069958A (en) * | 2007-05-09 | 2007-11-14 | 浙江工业大学 | Crystal-chip polishing method |
| CN103909465A (en) * | 2014-04-02 | 2014-07-09 | 天通控股股份有限公司 | Method for grinding and polishing large-size sapphire substrate slice |
| CN104015122A (en) * | 2014-06-18 | 2014-09-03 | 蓝思科技股份有限公司 | Double-sided copper disc grinding process for sapphire panel |
| CN205703670U (en) * | 2016-04-07 | 2016-11-23 | 东莞市兰光光学科技有限公司 | A kind of optical elements of large caliber Twp-sided polishing machine |
| CN106903559A (en) * | 2017-04-18 | 2017-06-30 | 山西中聚晶科半导体有限公司 | A kind of sapphire substrate preparation method |
| CN107309784A (en) * | 2017-09-03 | 2017-11-03 | 湖北天宝光电科技有限公司 | A kind of two-sided fine grinding technology of sapphire cover plate |
| CN107695796A (en) * | 2016-08-08 | 2018-02-16 | 蓝思科技（长沙）有限公司 | A kind of sapphire crystalline substance tile polishing method |
| CN108214260A (en) * | 2016-12-22 | 2018-06-29 | 蓝思科技（长沙）有限公司 | A kind of polishing process of ultra-thin sapphire wafer |
-
2019
- 2019-07-24 CN CN201910671137.2A patent/CN110434681B/en active Active
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5571041A (en) * | 1995-04-21 | 1996-11-05 | Leikam; Josh K. | Refinishing compact disks |
| CN101069958A (en) * | 2007-05-09 | 2007-11-14 | 浙江工业大学 | Crystal-chip polishing method |
| CN103909465A (en) * | 2014-04-02 | 2014-07-09 | 天通控股股份有限公司 | Method for grinding and polishing large-size sapphire substrate slice |
| CN104015122A (en) * | 2014-06-18 | 2014-09-03 | 蓝思科技股份有限公司 | Double-sided copper disc grinding process for sapphire panel |
| CN205703670U (en) * | 2016-04-07 | 2016-11-23 | 东莞市兰光光学科技有限公司 | A kind of optical elements of large caliber Twp-sided polishing machine |
| CN107695796A (en) * | 2016-08-08 | 2018-02-16 | 蓝思科技（长沙）有限公司 | A kind of sapphire crystalline substance tile polishing method |
| CN108214260A (en) * | 2016-12-22 | 2018-06-29 | 蓝思科技（长沙）有限公司 | A kind of polishing process of ultra-thin sapphire wafer |
| CN106903559A (en) * | 2017-04-18 | 2017-06-30 | 山西中聚晶科半导体有限公司 | A kind of sapphire substrate preparation method |
| CN107309784A (en) * | 2017-09-03 | 2017-11-03 | 湖北天宝光电科技有限公司 | A kind of two-sided fine grinding technology of sapphire cover plate |
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| CN110434681B (en) | 2021-09-07 |
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